Generic Lithography Modeling with Dual-band Optics-Inspired Neural
  Networks
  Lithography simulation is a critical step in VLSI design and optimization for
manufacturability. Existing solutions for highly accurate lithography
simulation with rigorous models are computationally expensive and slow, even
when equipped with various approximation techniques. Recently, machine learning
has provided alternative solutions for lithography simulation tasks such as
coarse-grained edge placement error regression and complete contour prediction.
However, the impact of these learning-based methods has been limited due to
restrictive usage scenarios or low simulation accuracy. To tackle these
concerns, we introduce an dual-band optics-inspired neural network design that
considers the optical physics underlying lithography. To the best of our
knowledge, our approach yields the first published via/metal layer contour
simulation at 1nm^2/pixel resolution with any tile size. Compared to previous
machine learning based solutions, we demonstrate that our framework can be
trained much faster and offers a significant improvement on efficiency and
image quality with 20X smaller model size. We also achieve 85X simulation
speedup over traditional lithography simulator with 1% accuracy loss.
