Machine learning and atomic layer deposition: predicting saturation times from reactor growth profiles using artificial neural networks
In this work we explore the application of deep neural networks to the
optimization of atomic layer deposition processes based on thickness values
obtained at different points of an ALD reactor. We introduce a dataset designed
to train neural networks to predict saturation times based on the dose time and
thickness values measured at different points of the reactor for a single
experimental condition. We then explore different artificial neural network
configurations, including depth (number of hidden layers) and size (number of
neurons in each layers) to better understand the size and complexity that
neural networks should have to achieve high predictive accuracy. The results
obtained show that trained neural networks can accurately predict saturation
times without requiring any prior information on the surface kinetics. This
provides a viable approach to minimize the number of experiments required to
optimize new ALD processes in a known reactor. However, the datasets and
training procedure depend on the reactor geometry.