On the Construction of Distribution-Free Prediction Intervals for an
  Image Regression Problem in Semiconductor Manufacturing
  The high-volume manufacturing of the next generation of semiconductor devices
requires advances in measurement signal analysis. Many in the semiconductor
manufacturing community have reservations about the adoption of deep learning;
they instead prefer other model-based approaches for some image regression
problems, and according to the 2021 IEEE International Roadmap for Devices and
Systems (IRDS) report on Metrology a SEMI standardization committee may endorse
this philosophy. The semiconductor manufacturing community does, however,
communicate a need for state-of-the-art statistical analyses to reduce
measurement uncertainty. Prediction intervals which characterize the
reliability of the predictive performance of regression models can impact
decisions, build trust in machine learning, and be applied to other regression
models. However, we are not aware of effective and sufficiently simple
distribution-free approaches that offer valid coverage for important classes of
image data, so we consider the distribution-free conformal prediction and
conformalized quantile regression framework.The image regression problem that
is the focus of this paper pertains to line edge roughness (LER) estimation
from noisy scanning electron microscopy images. LER affects semiconductor
device performance and reliability as well as the yield of the manufacturing
process; the 2021 IRDS emphasizes the crucial importance of LER by devoting a
white paper to it in addition to mentioning or discussing it in the reports of
multiple international focus teams. It is not immediately apparent how to
effectively use normalized conformal prediction and quantile regression for LER
estimation. The modeling techniques we apply appear to be novel for finding
distribution-free prediction intervals for image data and will be presented at
the 2022 SEMI Advanced Semiconductor Manufacturing Conference.
