Inferring topological transitions in pattern-forming processes with
  self-supervised learning
  The identification and classification of transitions in topological and
microstructural regimes in pattern-forming processes is critical for
understanding and fabricating microstructurally precise novel materials in many
application domains. Unfortunately, relevant microstructure transitions may
depend on process parameters in subtle and complex ways that are not captured
by the classic theory of phase transition. While supervised machine learning
methods may be useful for identifying transition regimes, they need labels
which require prior knowledge of order parameters or relevant structures.
Motivated by the universality principle for dynamical systems, we instead use a
self-supervised approach to solve the inverse problem of predicting process
parameters from observed microstructures using neural networks. This approach
does not require labeled data about the target task of predicting
microstructure transitions. We show that the difficulty of performing this
prediction task is related to the goal of discovering microstructure regimes,
because qualitative changes in microstructural patterns correspond to changes
in uncertainty for our self-supervised prediction problem. We demonstrate the
value of our approach by automatically discovering transitions in
microstructural regimes in two distinct pattern-forming processes: the spinodal
decomposition of a two-phase mixture and the formation of concentration
modulations of binary alloys during physical vapor deposition of thin films.
This approach opens a promising path forward for discovering and understanding
unseen or hard-to-detect transition regimes, and ultimately for controlling
complex pattern-forming processes.
