Deep learning based inverse method for layout design
  Layout design with complex constraints is a challenging problem to solve due
to the non-uniqueness of the solution and the difficulties in incorporating the
constraints into the conventional optimization-based methods. In this paper, we
propose a design method based on the recently developed machine learning
technique, Variational Autoencoder (VAE). We utilize the learning capability of
the VAE to learn the constraints and the generative capability of the VAE to
generate design candidates that automatically satisfy all the constraints. As
such, no constraints need to be imposed during the design stage. In addition,
we show that the VAE network is also capable of learning the underlying physics
of the design problem, leading to an efficient design tool that does not need
any physical simulation once the network is constructed. We demonstrated the
performance of the method on two cases: inverse design of surface diffusion
induced morphology change and mask design for optical microlithography.
