text:
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[0001] The present invention is directed to a composition and method for reducing or preventing formation of organic residue and scum derived from photolithographic compositions from a substrate or a solution. More specifically, the present invention is directed to a composition and method for reducing or preventing the formation of organic residue and scum derived from photolithographic compositions from a substrate or a solution where the composition contains an aromatic alkoxylate in combination with a polyol.
[0002] Contaminants such as built-up organic residue and scum from photolithographic compositions present difficult cleaning problems for the electronics industry. Photolithographic residue and scum such as from photoresist developer solutions, stripper solutions and the like can build-up on various products and apparatus. Photoresist materials are employed in the manufacturing of semiconductor devices, and electronic components such as integrated circuits, photomasks for the manufacturing of integrated circuits, printed wiring boards and the like as well as planographic printing plates. In photolithographic processing, a substrate surface is coated with a photoresist, i.e., a coating composition that is sensitive to actinic radiation, e.g., ultraviolet light, X-rays, electron beams and the like, to give a layer that is sensitive to actinic radiation which is irradiated pattern-wise with the actinic radiation. The irradiated photoresist is then developed with a developer solution to form a patterned photoresist layer that serves to selectively protect the substrate surface from etching, plating or diffusion of dopants.
[0003] Photoresists may be positive-working, or negative-working. Such photoresists may be liquid, or dry film. A photoresist composition of the positive-working type has such a photosensitivity that solubility of the composition in the developer solution is increased by exposure to light so that the patterned photoresist layer is formed on the areas unexposed to ultraviolet light where the composition is left undissolved. A negative-working photoresist composition exhibits behavior of a sensitivity and solubility that is the reverse of the positive-working photoresist.
[0004] Along with recent progress in the technology of semiconductor devices with a requirement for finer and finer high-fidelity patterning of a line width of 1 micron or even finer to comply with the trend of increased density of integration in semiconductor devices, photolithographic processes of patterning using a positive-working photoresist also envisages a difficult problem. When patterning is desired of an extremely fine contact hole in a fine pattern, alkaline developer solution is admixed with a surface active agent with an object to increase the wettability of the substrate surface with the aqueous developer solution. One of the problems in the addition of a surface active agent to the developer solution, is that film residues and scums sometimes occur on the exposed areas where the photoresist layer is desirably dissolved away as completely and cleanly as possible. Although the film residues and scums can be removed by gently treating the surface with oxygen plasma or sputtering, no complete solution to the problem can be obtained by such methods because such treatments must be performed under well controlled troublesome conditions, and is not efficient in respect of smooth removal of the scums, or gives no uniform effect of treatment in finely patterned areas having contact holes of about 1 micron or smaller in diameter.
[0005] U.S. Pat. No. 4,820,621 to Tanaka et al. has addressed the problem of residue and scum formation by modifying a developer solution with the addition of a non-ionic surface active agent that is a polyoxyethylene alkyl-substituted phenyl ether. The ether is included in the developer solution in an amount of from 50 to 5000 ppm (parts per million). The developer solution is employed in patterning using a positive-working photoresist composition composed of an alkali-soluble novolac resin and a naphthoquinone diazide compound. The '621 patent alleges that patterning the positive photoresist with the developer containing the polyoxyethylene alkyl-substituted phenyl ether prevents formation of residues and scums after development.
[0006] Similar residue and scum formation also occur when negative-working photoresists are employed. For example, in manufacturing printed circuit boards UV curable negative-working photoresists may be used. Exposed portions of the photoresist become insoluble in alkaline developer solution and form a protective barrier to other processing chemicals such as etching and plating solutions. Unexposed portions of the photoresist are to rinse freely from the circuit board with an alkaline solution such as a 1% sodium carbonate, monohydrate in water. Development occurs because polymers in the photoresist contain acid functionality. Such acid functionality within the polymers are neutralized in alkaline solution forming a water soluble organic salt. As the dissolved photoresist builds up in solution (developer loading), insoluble organic materials, such as uncured photoresist, begin to form in the developing tank eventually forming a water insoluble residue or scum. Presence of anti-foam additives (conventionally added to developing solutions to minimize foaming) greatly increases the tendency for residue and scum to form. As the level of scum builds, chances increase for an inadvertent redeposit of these water insoluble residues onto the developed circuit board. Such redeposited residues cause a retardation of the etching solution (etching chemistries have difficulty penetrating any organic residues). Where etch is retarded, circuit shorts form causing a defective circuit board. In addition to increasing the potential for defective circuit boards, the residue also makes cleaning equipment difficult, thus increasing maintenance time. Such residue and scum can adhere to developer apparatus surfaces, plug nozzles, and redeposit onto surfaces of printed wiring boards causing defects in the boards.
[0007] In addition to the problem of built-up residue and scum formation from primary photoresists, there also is a residue and scum build-up problem from secondary photoresists. Such secondary photoresists may be employed in soldermasks. Residue and scum are deposited on a substrate as a result of component separation in the soldermask. Such component separation may be exacerbated when an improperly balanced soldermask developer solution, i.e., improper developing conditions and/or soldermask developer solution chemistry, contact the soldermask. Built-up residue and scum from secondary photoresists often appear as a bright green coating on a substrate such as a developer apparatus.
[0008] Cleaners used to remove residue and scum may vary in composition. Typically, cleaners include as active ingredients a strong base such as sodium hydroxide, and chelating agents such as ethylene diamine tetraacetate (EDTA). Surfactants, solvents and emulsifying agents may also be included in the cleaners. Cleaners are employed at temperature ranges from about 45° C. to about 55° C. Many cleaners are primarily used because of the low cost of their ingredients. However, workers in the field using such cleaners have discovered that the residue problem is often made worse. Often the equipment has to be manually cleaned to remove the residue from the photoresist as well as from the cleaners. Such manual cleaning is both a labor and time intensive operation that can cause a significant loss of production time. Further, many cleaners are not effective enough for removing residue and scum from new generation photoresists that have many hydrophobic aromatic materials.
[0009] U.S. Pat. No. 5,922,522 to Barr et al.; U.S. Pat. No. 6,063,550 to Lundy et al.; and U.S. Pat. No. 6,248,506 B1 to Lundy et al. disclose surfactant and surfactant mixtures added to developer solutions that prevent or inhibit the formation of residues and scum on circuit boards and circuit board manufacturing equipment. Such surfactants are composed of a hydrophobic group, an alkoxylated hydrophilic group and a nonionic or anionic capping group. Examples of suitable hydrophobic groups include nonylphenol, octylphenol and tristyrylphenol. Examples of suitable alkoxylated hydrophilic groups include ethylene oxide, propylene oxide and ethylene oxide/propylene oxide groups. Examples of suitable capping groups include hydroxyl, carboxyl, sulfonyl, phosphonyl, or mixtures thereof. Such residue and scum reducing compounds are included in developer solutions in amounts of from about 0.05% to about 1.0% by weight.
[0010] Although the developer solutions disclosed in U.S. Pat. No. 5,922,522; U.S. Pat. No. 6,063,550; and U.S. Pat. No. 6,248,506 B1 provide an effective means of reducing the amount of build-up of residue and scum on substrates containing photoresist, such as circuit boards, and equipment used in the manufacture of electronic components, there is still a need for an improved composition and method for reducing or preventing formation of residue and scum on various substrates such as developer apparatus as well as developer solutions. Regardless of the efforts to prevent build-up of residue and scum in developer apparatus, such as a conventional spin developer, or a spray developer where developer solution is sprayed onto a substrate surface, repeated use of such apparatus inevitably results in the build-up of residue and scum. At a certain point, the residues and scum accumulate to such an extent that the equipment is shut down for cleaning, thus reducing product output. Such residue and scum may include hydrophobic aromatic materials such as photoinitiators, dyes, (meth)acrylic monomers and other organic materials that make up photoresists as well as antifoam agents and surfactants. Such built-up residue and scum are often difficult to re-emulsify with many developer apparatus cleaners.
[0011] In addition to residue and scum formation, excessive foaming is another problem. When photoresist is removed from a substrate with a developer solution, foaming occurs. Excessive foaming during photoresist removal may cause developer solution levels to go below their effective minimum threshold levels. Such a condition results in developer equipment shutdown and reduced product out-put. Foaming may also obscure a workers field of view during manufacturing of printed wiring boards making it difficult to determine photoresist break points, and to monitor printed wiring board panels in developing chambers resulting in printed wiring board defects. Additionally, cleaning equipment that contains large amounts of foam is difficult. Rinsing a foam contaminated apparatus with water aggravates foam formation.
[0012] Accordingly, there is a need for a composition and method that reduces or prevents residue and scum formation from photolithographic compositions as well as reducing or preventing foam formation during development of photoresist.
[0013] The present invention is directed to a composition composed of an aromatic alkoxylate in combination with a polyol in sufficient amounts to reduce or prevent residue and scum formation derived from photolithographic compositions.
[0014] Advantageously, the composition of the present invention which contains an aromatic alkoxylate in combination with a polyol reduces or prevents residue and scum derived from photolithographic compositions such as organic residues deposited by both positive-working and negative-working photoresist from a substrate. Such substrates include, but are not limited to, developer apparatus used in applying developer solution to a photoresist as well as other apparatus used in the manufacture of printed wiring boards, and the printed wiring boards themselves. Examples of developer apparatus include, but are not limited to, spray developers where developer is sprayed onto a photoresist, or conventional spin developers, immersion developers, or a batch or feed-and-bleed operation apparatus, and the like. Additionally, the composition of the present invention also reduces or prevents residue and scum from forming in developer solutions during development of photoresist.
[0015] Continuous or prolonged use of equipment employed in applying photoresist or that contacts photoresist during the manufacture of photolithographic devices such as printed wiring boards results in the build-up of undesirable residue on the equipment. The built-up residue may block or clog lines or movable parts on the equipment resulting in production shutdown. Additionally, the residue build-up on printed wiring boards causes defects in the boards such as electrical shorts. Cleaning done with cleaners is not always effective because residue and scum contain chemicals that are difficult to re-emulsify. Cleaning, within the scope of the present invention, means removing built-up residue and scum from a substrate, such as by re-emulsification Also, cleaners may further contaminate the equipment and manufactured articles by depositing difficult to remove antifoam agents and surfactants. The compositions of the present invention eliminate cleaning or at least reduce the difficulty of cleaning built-up residue and scum from a substrate. Residues and scum that form on substrates or in solutions treated with compositions of the present invention are easier to re-emulsify with cleaners, thus improving the cleaning process.
[0016] Another problem that the compositions of the present invention solve is foaming. When photoresist is removed from a substrate with a developer solution, foaming often occurs. Excessive foaming during photoresist removal may cause developer solutions to go below their effective minimum levels. Such a condition results in developer equipment shutdown and reduced product out put. Foaming may also obscure a workers field of view during manufacturing of printed wiring boards making it difficult to determine photoresist break points, and to monitor printed wiring board panels in developing chambers resulting in defective printed wiring boards and inefficient manufacturing processes. By the addition of anti-foaming agents compatible with aromatic alkoxylates and polyols, the compositions of the present invention also reduce or prevent foaming.
[0017] By adding the compositions of the present invention to developer solutions, both foaming and residue formation can be reduced or prevented during printed wiring board manufacturing processes without any reduction in developer performance. Accordingly, the present invention also is directed to developer compositions and to a method of developing photoresist.
[0018] A primary objective of the present invention is to provide for an improved residue and scum reducing composition.
[0019] Another objective of the present invention is to provide for an improved antifoam composition.
[0020] A further objective of the present invention is to provide for a composition that reduces or inhibits residue and scum formation caused by positive-working and negative working photoresist.
[0021] An additional objective of the present invention is to provide for an improved developer solution.
[0022] Still yet, an additional objective of the present invention is to provide for an improved method of developing photoresist.
[0023] Other advantages may be ascertained by a person of skill in the art reading the following description of the invention and the appended claims.
[0024] The composition of the present invention is composed of an aromatic alkoxylate in combination with a polyol to reduce or prevent formation of residue and scum caused by photolithographic compositions.
[0025] Aromatic alkoxylates within the scope of the present invention include, but are not limited to, compounds having the following formula:
[0026] where R is phenyl, mono-, di, or tri-substituted phenyl, a phenyl (C
[0027] Salts of the foregoing aromatic alkoxides also may be employed. Suitable salts include, but are not limited to, sulfate and phosphate salts, including esters thereof, such as metal salts, such as alkali metal or alkaline earth metal salts, for example sodium, potassium, calcium or magnesium salts, or salts of ammonia or an organic amine, such as morpholine, piperidine, pyrrolidine, a mono-, di-, or tri-hydroxy-lower alkylamine, for example mono-, di-, or tri-ethanolamine.
[0028] Illustratvie R groups include nonylphenyl, octylphenyl, monostyrylphenyl, distyrylphenyl and tristyrylphenyl with tristyrylphenyl a preferred R group. Illustrative of suitable alkylene oxide units include ethylene oxide and propylene oxide. Alkylene oxide units within the scope of the present invention also may be a radical —CH
[0029] A particularly preferred tristyrylphenol alkoxylate is a tristyrylphenol ethoxylate having the general formula:
[0030] where m is an integer of from 8 to 40, preferably from 10 to 20 and most preferably from 14 to 18. Salts of the tristyrylphenol ethoxylate also may be employed such as the sulfate or phosphate, including esters thereof, for example, metal salts, such as alkali metal or alkaline earth metal salts, for example sodium, potassium, calcium, or magnesium salts or salts with ammonia or an organic amine, such as morphiline, piperidine, pyrrolidine, a mono-, di-, or tri-hydroxy-lower alkylamine, for example mono, di, or tri-ethanolamine.
[0031] Illustrative of suitable tristyrylphenol ethoxylates that may be used to practice the present invention include tristyrylphenol ethoxylate (8 moles of ethylene oxide), tristyrylphenol ethoxylate (16 moles of ethylene oxide), tristyrylphenol ethoxylate (20 moles of ethylene oxide), tristyrylphenol ethoxylate (25 moles of ethylene oxide), tristyrylphenol ethoxylate (40 moles of ethylene oxide), tristyrylphenol ethoxylate/propoxylate, tristyrylphenol ethoxylate phosphate ester (free acid), tristyrylphenol ethoxylate phosphate ester (potassium salt), and ammonium tristytrylphenol ethoxy sulfate. Such compounds may be prepared by known methods in the art, or obtained commercially under the trade name product Soprophor® (obtainable from Rhodia). Examples of commercially available Soprophor® include Soprophor® BSU where m=16, and Soprophor® S/40-P where m=40. U.S. Pat. Nos. 5,463,101 and 5,874,495 disclose methods of preparing tristyrylphenols, the entire disclosures of which are incorporated herein by reference.
[0032] Polyols within the scope of the present invention include polyols that reduce or prevent residue and scum formation or at least reduce foaming such polyols include linear and cyclic polyols including esters and ethers thereof. A wide variety of polyols are useful in the present invention and can include, without limitation, diols (e.g. ethylene glycol, propylene glycol, etc.), triols (e.g. glycerol, butanetriol, etc.), tetraols (e.g. erythritol, threitol, pentaerythritol, etc.), pentaols (e.g. xylitol, arabitol, ribitol, etc.), hexaols (e.g. sorbitols, mannitol, galactitol, etc.), aldo- or keto-triose, -tetrose, -pentaose, -hexose, -heptose, etc. (e.g. glyceraldehyde, erythrose, threose, ribose, arabinose, fructose, sorbose, glucose, galactose, mannose), di-, tri-, oligo- or polysaccharides, such as sucrose, cellobiose, isomaltose, maltose, maltotriose, starch, cellulose, hemicellulose, and the like. Additionally, non-reducing sugars derived from mono-, di-, tri-, oligo- or polysaccharides, e.g. alkyl glycosides like methyl-glycoside, other sugars such as trehalose, isotrehalose, raffinose, stachyose, etc.) can also be used. Other useful polyols include aldonic acid, aldonic acid salts (e.g. methyl gluconate, sodium gluconate, etc.), aldonic lactones (e.g. gluconolactone, etc.), aldaric acid esters or salts (e.g. dimethyltartarate, diamonium tartarate, etc.). Also, mixtures of any of the above polyols may be used. The polyols that are useful in the present invention can also include polyols which have been reacted with ethylene oxide or other alkylene oxides to provide alkoxylated polyols. Also included are ethers and esters of polyols.
[0033] Polyols such as glycoside and polyglycoside compounds including alkoxylated glycosides may be used. A useful polyglycoside is one according to the formula:
[0034] where Z is derived from glucose, R
[0035] A further alkyl glycoside suitable for use in the practice of the present invention may be represented by the formula below:
[0036] where R
[0038] group); b is a number of from 0 to 3k+1 preferably an average of from 0.5 to 2 per glycosal group; k is an integer of from 1 to 10; M
[0039] Examples of such alkylglycosides as described above include, but are not limited to, APG™ 325 CS Glycoside® which is described as being a 50% C
[0040] Exemplary alkyl glycosides suitable for use in the practice of this invention include those represented by the formula:
[0041] where R
[0042] Examples of such alkylpolyglycoside compounds according to structure VII include: where R is C
[0043] Another useful alkylglycoside is GLUCOPON 325N which is described as being a C
[0044] Other suitable alkyl polyglycosides that are commercially available include, but are not limited to, GLUCOPON®, or PLANTAREN® surfactants from Henkel Corporation, Ambler, Pa., 19002. Examples of such surfactants include but are not limited to:
[0045] 1. GLUCOPON® 225 Surfactant—an alkyl polyglycoside in which the alkyl group contains 8 to 10 carbon atoms and having an average degree of polymerization of 1.7.
[0046] 2. GLUCOPON® 425 Surfactant—an alkyl polyglycoside in which the alkyl group contains 8 to 16 carbon atoms and having an average degree of polymerization of 1.6.
[0047] 3. GLUCOPON® 625 Surfactant—an alkyl polyglycoside in which the alkyl groups contains 12 to 16 carbon atoms and having an average degree of polymerization of 1.6.
[0048] 4. APG® 325 Surfactant—an alkyl polyglycoside in which the alkyl groups contains 9 to 11 carbon atoms and having an average degree of polymerization of 1.6.
[0049] 5. GLUCOPON® 600 Surfactant—an alkyl polyglycoside in which the alkyl groups contains 12 to 16 carbon atoms and having an average degree of polymerization of 1.4.
[0050] 6. PLANTAREN® 2000 Surfactant—a C
[0051] 7. PLANTAREN® 1300 Surfactant—a C
[0052] Other suitable polyols include, but are not limited to, alcohol alkoxylates, fatty alcohol alkoxylates, fatty sorbitan esters and their alkoxylates, and the like. Examples of two commercially available surfactants are the ethylene oxide and propylene oxide surfactants Pluronic® and Tetronic® (obtainable from BASF).
[0053] In addition to the compounds described above, the compositions of the present invention optionally may contain auxiliary surfactants, auxiliary antifoam agents and a solvent. Examples of such auxiliary surfactants include, but are not limited to, quaternary ammonium salts, water soluble or water dispersable polymers, or surfactants having the following general formula:
[0054] where R
[0055] Optional antifoam agents that may be employed include, but are not limited to, such agents as silicon compounds such as siloxanes with glycols, acetylenics and block alkoxy copolymers.
[0056] Concentrations of aromatic alkoxylates and polyols each may range from about 0.1% by weight to about 30% by weight of the compositions. Preferably, aromatic alkoxylates and polyols each may range from about 0.5% by weight to about 15% by weight of the composition. The remainder of the composition includes, but is not limited to, a solvent, auxiliary surfactants or antifoams or mixtures thereof. Auxiliary surfactants may be employed in conventional amounts such as from about 0.001% by weight to about 30% by weight of the composition. Optional antifoam agents may be employed in amounts of from about 0.001% by weight to about 1.0% by weight of the composition. The compositions may contain an alkaline component in the amounts of from about 0.1% to about 15% by weight of the composition, preferably from about 1% to about 10% by weight. Such alkaline components act as developers. The balance of the composition is a solvent. Water is a preferred solvent, however any suitable organic solvent, such as alcohols and ketones and the like, also may be employed.
[0057] A preferred composition of the present invention consists essentially of an aromatic alkoxylate in combination with a polyol, an auxiliary surfactant, an antifoam agent and a solvent. A more preferred composition consists of an aromatic alkoxylate in combination with a polyol, an antifoam agent, an alkaline component, and water. Preferably the solvent is water. A most preferred composition consists of a tristyryl alkoxylate, an alkyl glycoside, an antifoam agent, an alkaline component, and water. Preferably, the weight ratio of tristyryl alkoxylate to the alkyl glycoside in the composition is from about 1:1 to about 3:1 respectively, most preferably about 1:1.
[0058] Surprisingly, the compositions of the present invention reduce or prevent residue and scum from both positive-working (both liquid and dry film) and negative-working photoresist (both liquid and dry film). Such residue and scum on a substrate are difficult to remove with many cleaners because of the types of chemicals used in photoresists, in particular the new generation of photoresists which contain many compounds of a hydrophobic aromatic character.
[0059] Additionally, the compositions of the present invention also reduce or prevent formation of residues on a substrate deposited by secondary photoresists. Such photoresist may be employed in soldermasks. Residue and scum are deposited on a substate as a result of component separation in the soldermask. Such component separation may be exacerbated when an improperly balanced soldermask developer solution, i.e. improper developing conditions and/or soldermask developer solution chemistry, contact the soldermask. Residue and scum build-up on such substrates as printed wiring boards and soldermask developer apparatus. Built-up residue and scum may appear as a bright green coating on developer apparatus surfaces. The bright green coating comes from an oily layer of water insoluble material from the secondary photoresists in which pigment from the photoresists concentrate. Generally, there is a higher level of hydrophobic aromatic compounds in secondary photoresist formulations than primary photoresist formulations. Thus reducing or preventing residue and scum deposited by secondary photoresists is a further improvement of the compositions of the present invention.
[0060] Residues and scum from photoresist include, but are not limited to, such chemical materials as hydrophobic aromatic materials such as photoinitiators, thermoinitiators, dyes, acrylic, and methacrylic monomers. Photoinitiators such as photoacid generators, photobase generators or free-radical generators once built-up as residue or scum on a substrate are more difficult to remove, i.e., clean, than many of the other components that compose the residue and scum. Such materials do not readily re-emulsify, i.e., clean, once they build-up on a substrate such as photolithographic manufacturing apparatus.
[0061] Photoresists vary in composition. Generally, a photoresist composition may compose from about 20% to about 90% by weight of a binder polymer, about 15% to about 50% by weight of α,β-ethylenically unsaturated compounds (cross-linkers) such as monomers and short-chain oligomers and from about 0.1% to about 25% by weight of a photoinitiator or photoinitiator chemical system, preferably from about 5% to about 15% by weight. Liquid photoresists may contain a larger concentration of monomers or short-chain oligomers in relation to polymer binders whereas dry film may contain larger concentrations of polymer binders. Such concentrations are known in the art. Other components employed in a photoresist that may contribute to residue and scum build-up are discussed below. Built-up residue and scum from liquid photoresist appears as crystalline material on a substrate.
[0062] Examples of components that compose a photoresist that may cause undesirable built-up residue or scum on a substrate include, but are not limited to, polymeric binders such as those containing as polymerized units one or more ethylenically or acetylenically unsaturated monomers. Examples of monomers include, but are not limited to: (meth)acrylic acid, (meth)acrylamides, alkyl (meth)acrylates, alkenyl (meth)acrylates, aromatic (meth)acrylates, vinyl aromatic monomers, nitrogen-containing compounds and their thio-analogs, substituted ethylene monomers, cyclic olefins, substituted cyclic olefins, and the like. Preferred monomers include (meth)acrylic acid, alkyl (meth)acrylates and vinyl aromatic monomers. Such polymeric binders may be homopolymers or copolymers and preferably copolymers.
[0063] Cross-linkers that may cause residue or scum build-up include di-, tri-, tetra-, or higher multi-functional ethylenically unsaturated monomers. Examples of such cross-linkers include, but are not limited to: trivinylbenzene, divinyltoluene, divinylpyridine, divinylnaphthalene and divinylxylene; and such as ethyleneglycol diacrylate, trimethylolpropane triacrylate ("TMPTA"), diethyleneglycol divinyl ether, trivinylcyclohexane, allyl methacrylate ("ALMA"), ethyleneglycol dimethacrylate ("EGDMA"), diethyleneglycol dimethacrylate ("DEGDMA"), propyleneglycol dimethacrylate, propyleneglycol diacrylate, trimethylolpropane trimethacrylate ("TMPTMA"), divinyl benzene ("DVB"), glycidyl methacrylate, 2,2-dimethylpropane 1,3 diacrylate, 1,3-butylene glycol diacrylate, 1,3-butylene glycol dimethacrylate, 1,4-butanediol diacrylate, diethylene glycol diacrylate, diethylene glycol dimethacrylate, 1,6-hexanediol diacrylate, 1,6-hexanediol dimethacrylate, tripropylene glycol diacrylate, triethylene glycol dimethacrylate, tetraethylene glycol diacrylate, polyethylene glycol 200 diacrylate, tetraethylene glycol dimethacrylate, polyethylene glycol dimethacrylate, ethoxylated bisphenol A diacrylate, ethoxylated bisphenol A dimethacrylate, polyethylene glycol 600 dimethacrylate, poly(butanediol) diacrylate, pentaerythritol triacrylate, trimethylolpropane triethoxy triacrylate, glyceryl propoxy triacrylate, pentaerythritol tetraacrylate, pentaerythritol tetramethacrylate, dipentaerythritol monohydroxypentaacrylate, ethoxylated diacrylates, ethoxylated triacrylates such as ethoxylated TMPTA and ethoxylated TMPTMA, ethoxylated tetraacrylates, divinyl silane, trivinyl silane, dimethyl divinyl silane, divinyl methyl silane, methyl trivinyl silane, diphenyl divinyl silane, divinyl phenyl silane, trivinyl phenyl silane, divinyl methyl phenyl silane, tetravinyl silane, dimethyl vinyl disiloxane, poly(methyl vinyl siloxane), poly(vinyl hydro siloxane), poly (phenyl vinyl siloxane), glycosyl ureas including di-, tri- and tetra-glycosyl ureas, epoxies and mixtures thereof. Such cross-linking agents are generally commercially available.
[0064] Photoimageable compositions contain one or more photoactive components. The photoactive components may be photoacid generators, photobase generators or free-radical generators. Such photoactive components are a major source of scum formations.
[0065] Example of photoacid generators include halogenated triazines, onium salts, sulfonated esters, halogenated sulfonyloxy dicarboximides, diazodisulfones, α-cyanooxyaminesulfonates, imidesulfonates, ketodiazosulfones, sulfonyldiazoesters, 1,2-di(arylsulfonyl)hydrazines and the like.
[0066] Free-radical generators include, but are not limited to, n-phenylglycine, aromatic ketones such as benzophenone, N,N′-tetramethyl-4,4′-diaminobenzophenone [Michler's ketone], N,N′-tetraethyl-4,4′-diaminobenzophenone, 4-methoxy-4′-dimethylaminobenzophenone, 3,3′-dimethyl-4-methoxybenzophenone, p,p′-bis(dimethylamino)benzophenone, p,p′-bis(diethylamino)-benzophenone, anthraquinone, 2-ethylanthraquinone, naphthaquinone and phenanthraquinone, benzoins such as benzoin, benzoinmethylether, benzoinethylether, benzoinisopropylether, benzoin-n-butylether, benzoin-phenylether, methylbenzoin and ethybenzoin, benzyl derivatives such as dibenzyl, benzyldiphenyldisulfide and benzyldimethylketal, acridine derivatives such as 9-phenylacridine and 1,7-bis(9-acridinyl)heptane, thioxanthones such as 2-chlorothioxanthone, 2-methylthioxanthone, 2,4-diethylthioxanthone, 2,4-dimethylthioxanthone and 2-isopropylthioxanthone, acetophenones such as 1,1-dichloroacetophenone, p-t-butyldichloro-acetophenone, 2,2-diethoxyacetophenone, 2,2-dimethoxy-2-phenylacetophenone, and 2,2-dichloro-4-phenoxyacetophenone, 2,4,5-triarylimidazole dimers such as 2-(o-chlorophenyl)-4,5-diphenylimidazole dimer, 2-(o-chlorophenyl)-4,5-di(m-methoxyphenyl imidazole dimer, 2-(o-fluorophenyl)-4,5-diphenylimidazole dimer, 2-(o-methoxyphenyl)-4,5-diphenylimidazole dimer, 2-(p-methoxyphenyl)-4,5-diphenylimidazole dimer, 2,4-di(p-methoxyphenyl)-5-phenylimidazole dimer, 2-(2,4-dimethoxyphenyl)-4,5-diphenylimidazole dimer and 2-(p-methylmercaptophenyl)-4,5-diphenylimidazole dimer, and the like. Though, not a free-radical generator, triphenylphosphine may be included in the photoactive chemical system as a catalyst.
[0067] Optional additives that may be used in photoimageable compositions and that cause residue and scum include, but are not limited to: anti-striation agents, plasticizers, speed enhancers, fillers, dyes, film forming agents, non-polymerizable organic acids and the like. Suitable plasticizers include esters such as dibenzoate esters. Non-polymerizable organic acids may also be added to photoresist compositions. Such organic acids are substantially non-polymerizable with the polymeric binders, optional cross-linking agents or both. A wide variety of organic acids may suitably be added to photoresist compositions. Suitable organic acids include, but are not limited to, alkanecarboxylic acids and arylcarboxylic acids, sulfonic acids such as alkanesulfonic acids and arylsulfonic acids, phosphonic acids such as alkylphosphonic acids and arylphosphonic acids, and the like. Exemplary carboxylic acids include, but are not limited to, (C
[0068] A wide variety of photoresist strip enhancers also may be used in photoresists. Such strip enhancers may contribute to residue and scum build-up. Examples of photoresist strip enhancers are compounds containing one or more trihalomethyl-substituents in an alpha position relative to a group capable of stabilizing a negative charge.
[0069] Aromatic alkoxylates in combination with polyols may be added to developer solutions in sufficient amounts to reduce or prevent residue and scum formation during photoresist development. Alkaline aqueous developer solution may be a solution of sodium carbonate, e.g., about 1% sodium carbonate monohydrate. Other bases, such as NaOH, KOH, triethanolamine, sodium metasilicate, potassium carbonate, and the like may be used to provide the alkalinity necessary for developing photoresists. The alkalinity of the developing solution forms salts with the acid functionality of the binder polymer, typically carboxylic acid functionality, rendering the binder polymer soluble in the alkaline aqueous solution. Alkalinity of developer solutions range from a pH of from about 8.0 to about 14.0, preferably from about 10.0 to about 12.0.
[0070] The residue and scum reducing compositions of the present invention are highly suitable in printed wiring board manufacturing methods. Using a method for forming a printed circuit board for purposes of exemplification, a photoimageable composition may be applied to a substrate having a pattern of conductive material disposed thereon. The substrate may be a copper laminate substrate prepared by known methods in the art, or any other suitable metal laminate. Other suitable substrates include those prepared by laminating multilayer boards for the manufacture of printed circuit boards with vias (through-holes) and interconnections which may contain solder.
[0071] The photoimageable composition may be coated onto the substrate using conventional techniques. The coating may be deposited so as to yield a film thickness of at least about 0.50 mil. After coating, the film formed may be dried to remove solvent using a suitable method known in the art.
[0072] A process of transferring an image to the coating involves exposing the coating to a source of patterned activating radiation to initiate the photoreaction in exposed areas. Suitable sources of activating radiation include actinic radiation, x-rays, etc. Following exposure, the layer is subjected to a low temperature bake to initiate crosslinking of the exposed portions of the binder by the liberation of the photogenerated catalyst. The bake conditions comprise heating to a temperature capable of initiating the curing reaction but the temperature should be below that temperature where thermal crosslinking would occur in unexposed areas of the film. Bake temperatures may vary from about 85° to about 120° C.
[0073] Areas not exposed to activating radiation are readily dissolved by aqueous alkali solutions if a negative-working photoresist is used. Positive-working photoresist works opposite to that of negative-working photoresists. An example of a developer is a metal hydroxide with concentrations between about 0.5 to about 5% of alkaline hydroxide or an alkali metal carbonate in water. A typical development time is 30 to 60 seconds. Residue and scum reducing compositions of the present invention are added to the developer prior to developing in a sufficient amount to reduce or prevent residue and scum formation and reduce or prevent foam formation. Developer solutions are maintained at pH ranges of from about 8.0 to about 14.0, preferably about 10.0 to about 12.0 during development. After development of the image, the remainder of the photoresist coating is characterized by a partial cure whereby most of the binder components are crosslinked. A second cure may be desirable to achieve full thermal and electrical solder mask properties.
[0074] Advantageously, the residue and scum reducing compositions and methods of the present invention provide for a means of reducing or preventing the formation of residue and scum deposited by photolithographic compositions on substrates or in solutions such as developer solutions. Thus cleaning the residue and scum from substrates such as printed wiring boards or developer apparatus is made easier or eliminated. In addition to reducing residue and scum formation, the compositions and methods of the present invention also reduce or prevent foam formation during developing processes. Foam formation, especially excessive foam formation, can result in defects in the manufacturing of printed wiring boards. Foam formation obstructs the view of a worker's filed of vision during manufacturing processes which in turn can lead to defects in printed wiring boards. Additionally, foam is difficult to clean from manufacturing apparatus. Cleaning away the foam with water usually aggravates foam formation, and many antifoam agents deposit residues which are difficult to clean. The present invention provides for a more efficient manufacturing process since less time is involved in cleaning equipment, and less waste is generated thus providing for a more environmentally friendly cleaning composition and method.
[0075] Another advantage of the present invention is the synergistic action of the combination of an aromatic alkoxylate with a polyol. The combination of the aromatic alkoxylate with the polyol provides for at least a two fold efficiency in preventing residue and scum formation over the individual components of the residue and scum reducing compositions. Combinations of aromatic alkoxylates in combination with polyols may have efficiencies of as high as eight fold to as high as ten fold. Accordingly, the compositions and methods of the present invention are an improvement in the manufacturing of printed wiring boards.
[0076] In addition to reducing residue and scum formation, the aromatic alkoxylate and polyol compositions of the present invention make cleaning of substrates with cleaners easier. Residue and scum are more readily re-emulsified by cleaners. While the aromatic alkoxylate and polyol compositions reduce residue and scum formation, to further minimize residue and scum build-up, substrates such as developer apparatus may be cleaned on a regular schedule to further reduce the build-up of residue and scum formation. Such schedules may be weekly, biweekly or monthly. Thus, the method of the present invention reduces equipment maintenance and the cost of waste treatment.
[0077] While the present invention is described in the context of cleaning organic residue and scum deposited by photolithographic compositions, the compositions of the present invention may be employed to reduce or prevent formation of organic residue and organic scum on any substrate or in solutions in general.
[0078] The following Examples are intended to further illustrate the present invention but are not intended to limit the scope of the invention.
[0079] Modified gas washing bottles were provided for each experiment with about 200 ml of an alkaline developer solution (diluted, per standard practice, to 10.0 gm/liter of total sodium carbonate) with about 3.53 gm of dry film photoresist dissolved (about 23 mil*sqft/gal). Additives added to each bottle are disclosed in the table below. Total emulsifier concentration in each bottle was about 2000 ppm (part per million). Each solution was bubbled for about 5 hours with air through a submerged glass frit at about 1000 cc/min. Each aerated solution was allowed to stand overnight and then was filtered through a weighed 3μPTFE (polyethylene terephthalate) membrane filter to retrieve any scum formed overnight. The filter with the scum was dried in a conventional oven, and reweighed. The data illustrated that the residue and scum reducing activity of the combinations within the scope of the invention reduced residue formation in contrast to the control samples. The amount of scum is in grams. The control samples did not contain any emulsifiers but just alkaline developer, antifoam agents and dry film photoresist. Antifoam PI-53® is a mixture of glycols and siloxanes, and antifoam DF-66® is an acetylenic.
[0080] Based on the data that was collected in the table below, the control samples had an average scum generation of 38.9 grams (gms). Soprophor® BSU in combination with Glucopon® 425N had an average scum generation of 24.6 gms. Soprophor® BSU had an average scum generation value of 36.4 gms. The combination of Soprophor® BSU and Glucopon® 425N had a reduced scum reduction lower than that of Soprophor® BSU by itself when the weight ratio of the Soprophor® BSU to Glucopon® 425N was 1:1 (compositions 13 and 14) and when the weight ratio was 3:1 (composition 19 and 20). Overall best results were obtained from the mixtures of Soprophor® BSU with Tween 80 (ethoxylated sorbitan fatty acid ester) and Tetronic® 90R4 (alkoxylated block components) with an average scum generation of 14.1 gms. Accordingly, the compositions within the scope of the present invention reduced scum formation.
Composition Emulsifer 1 Emulsifier 2 Emulsifier 3 Ratio Antifoam AF Loading Scum 1 Soprophor ® BSU 100% PI-53 250 ppm 29.3 2 Soprophor ® BSU 100% PI-53 500 ppm 43.5 3 (none) PI-53 250 ppm 37.7 4 (none) PI-53 500 ppm 57.3 5 Soprophor ® BSU Glucopon ® 425N 1/1 PI-53 250 ppm 31.8 6 Soprophor ® BSU Glucopon ® 425N 1/1 PI-53 500 ppm 57.8 7 (none) PI-53 250 ppm 43.4 8 (none) PI-53 500 ppm 60.2 9 Soprophor ® BSU Glucopon ® 425N 3/2 PI-53 125 ppm 23.6 10 Soprophor ® BSU Glucopon ® 425N 3/2 PI-53 250 ppm 40.2 11 Soprophor ® BSU Tween ® 80 Tetronic ® 90R4 33/17/50 PI-53 125 ppm 10.9 12 Soprophor ® BSU Tween ® 80 Tetronic ® 90R4 33/17/50 PI-53 250 ppm 10 13 Soprophor ® BSU Glucopon ® 425N 1/1 PI-53 125 ppm 13.5 14 Soprophor ® BSU Glucopon ® 425N 1/1 PI-53 250 ppm 16.3 15 (none) PI-53 125 ppm 24 16 (none) PI-53 250 ppm 26.1 17 Soprophor ® BSU Glucopon ® 425N 2/1 PI-53 125 ppm 33.7 18 Soprophor ® BSU Glucopon ® 425N 2/1 PI-53 250 ppm 18 19 Soprophor ® BSU Glucopon ® 425N 3/1 PI-53 125 ppm 16.6 20 Soprophor ® BSU Glucopon ® 425N 3/1 PI-53 250 ppm 26.7 21 Soprophor ® BSU Tween ® 80 Tetronic ® 90R4 33/33/33 PI-53 125 ppm 17.9 22 Soprophor ® BSU Tween ® 80 Tetronic ® 90R4 33/33/33 PI-53 250 ppm 17.5 23 (none) PI-53 125 ppm 19.3 24 (none) PI-53 250 ppm 43
Effectiveness of Surfactant and Mixture of Siloxane with Glycols at Various Levels of Use Test run in alkaline developer at 10.0 gms total carbonate per liter in deionized water Solution loaded with dry film photoresist at 23 mil*sqft/gal Foam Rise (ml in 250 ml cylinder) Addition (ml/gal) 1 minutes 2 minutes 4 minutes 10 minutes 0 228 212 194 188 3 126 116 134 150 6 112 112 116 130 9 98 100 106 120 Addition (ml/gal) scum (mgs) 0 48.8 3 33.3 6 34.6 9 31.9 Emulsifier and Antifoam Blend (parts by weight) Soprophor ® BSU 40 Glucopon ® 425N 40 Antifoam Agent (mixtures of glycols and siloxanes) 20
[0082] Four test samples were prepared containing mixtures of the above-identified emulsifiers and antifoam agent to test foam inhibition of compositions of the present invention. Four additional graduate cylinders were used to test scum formation overnight. The control contained sodium carbonate developer and dissolved dry film photoresist. The blends were added to separate graduate cylinders in concentrations of 3, 6 and 9 ml/gallon. Air was bubbled through the solution over a period of about 10 minutes, and foam heights were measured in milliliters (ml) at 1, 2, 4 and 10 minute intervals for all of the samples. The data showed that compositions Soprophor® BSU, Glucopon® 425N and the mixture of siloxane with glycols reduced foam in contrast to a composition without the blends. In addition, the composition with the additives reduced scum formation. The control formed 48.8 mgs of scum while the blends formed 33.3 mgs, 34.6 mgs and 31.9 mgs of scum. Thus the compositions of the present invention reduced both foam generation and scum formation. The antifoam agents appeared compatible with the emulsifiers.


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How to Clean Shutters
One of the benefits of having shutters in a home is the brightness it brings to the home especially in the downstairs and kitchen areas when open. Shutters, whether metal or wooden, are normally used for several reasons which include protection from a stormy weather, light and, also can protect one's privacy from the outside world. Shutters, in essence, are necessary but many still find it very hard to maintain and use it.
Remember, shutters can be used in both interior and exterior of a building and it is very easy to maintain and care for this window shutters so far as one get the tips on how to do it.
One thing is very clear when cleaning shutters, DO NOT USE SOAP AND WATER ON WOOD SHUTTERS TO AVOID WARPING.
According to an expert contributor Mr Jim Jones of Mr. Maid, a Pittsburgh, Pennysylvania cleaning service, he said;
- Cleaning shutters regularly with feather or microfiber duster to ensure maximum cleanliness.
- For those in need of the last minute and fast method, slip a sock into each of your hands to dust a shutter quickly when expecting a visitor.
- Rub a fabric dryer sheet onto both sides of the slats to help in cutting down the amount of dust that lingers on your shutter.
- Use a toothbrush to remove dust from hard and high places your hands cannot reach.
- Use a paintbrush to remove specks of dirt from extremely dirty shutters. in this case, dip the paintbrush in a hot soapy water or a clean water and clean. Note that you have to clean the brush often to avoid transferring dirt from one shutter to the other.
- In a shutter that has been left unattended for a while, place a paper under the shutter and clean, this is to avoid a double work thereby catching the dirt before it stains the floor.
- A dust remover can be used with a dry towel to remove dirt, just close the shutters, use your towel and rub from side to side for an easy and simple cleaning.
- For metal blinds that are fragile and easy to bend, wrap a sock around a ruler to clean thin, narrow blinds.
With the above tips, you cannot go wrong on keeping and tidying up your shutters. Shutters requires care which can be easily attained once some of these methods are applied. Cleaning your shutters is vital for a fresh breathe and look for your home. We hope you found some valuable information on this blog.

subset: commoncrawl


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Apple avvia produzione iPhone in India
In Italia i prezzi sono invece nettamente più alti e gli stessi formati sono acquistabili a 509 e 619 euro. Secondo quanto riportato dal Wall Street Journal , i funzionari governativi ritengono che iPhone SE venderà ancora meno di quanto fa negli Stati Uniti. [Full Article...]
YouTube Bringing 360-Degree Video to the Big Screen
I can't say I watch 360-degree videos much on YouTube. or at all. Google's 360-degree video obsession is coming to your TV. With this new API, not only will viewers of the live video be able to pay money to highlight their own comments in the chat feed, but milestones can be created to trigger real world actions. [Full Article...]
OnePlus 5, fotocamere migliori con l'aiuto di DxO
Un'area dove recentemente abbiamo investito molte risorse è quella della fotocamera . Per chi non lo sapesse, DxO è un'azienda che fornisce tool e software utili per il mondo della fotografia, in particolare anche mobile e se comunque il settore ti appasiona, ti sarù pure capitato di imbatterti in qualche report o test di DxOMark, un sito web legato appunto al brand principale che provvede a... [Full Article...]
Singer Chris Cornell dead
The cause of his death is unknown. Woody sid the friend forced open a hotel room door and found Cornell on the bathroom floor. His representative released a short statement on Thursday morning explaining that his death was " sudden and unexpected ". [Full Article...]
Rumor has it that Microsoft is trying to salvage Scalebound
And after some Twitter users have echoed this news, the comments seems to be coming in a lot, since the development of the game could have already started again, although, this time, without Platinum in between. The most likely explanation is that Microsoft is preventing others from using the Scalebound name, retaining ownership of the IP. A simple renewal isn't indicative of continued develop... [Full Article...]
Premier League deals that could define the summer
Victories for Manchester City and Arsenal on Tuesday night confirmed that Manchester United will finish sixth this season - but the three places above them are still up for grabs. This year Arsenal must again rely on an upset to finish in the top four. For the hosts, winger Nathan Redmond will be determined to get on the scoresheet in successive Premier League fixtures after netting at the... [Full Article...]
Facebook Messenger design update brings tabs to the home screen
The new home screen is organised around making Messenger the central hub for connecting with both people and businesses. Now, at the top of the Messenger home screen, there are tabs for your messages and a list of who's active on the app now (as indicated by the green dot next to their name), alongside the new groups tab. [Full Article...]
GST rates decided on 1211 items, except gold
Prices of foodgrains, especially wheat and rice, will come down as they will be exempt from the GST. One nation one tax. The goods and services tax (GST ) is slated for launch from 1 July. A leading business daily has reported that 80-90 % of the items have been fitted in 5, 12, 18 or 28 percent brackets. "Only 19% items will be in the 28% tax slab, while 81% of items will be taxed at 18% or ... [Full Article...]
Rumor: Refurbished Galaxy Note 7 to Launch as Galaxy Note FE
And given the rising trend of dual cameras in latest smartphones and statistics released by CounterPoint Research, which states most top selling smartphones in China during Q1 2017 featured dual-camera, strengthen the rumors of Galaxy Note 8 having the same, since the demand in the market for such phones is quite high. [Full Article...]
MNCs, Indian firms; LinkedIn reveals where India wants to work now
According to a study by the professional social network, LinkedIn , Flipkart and Amazon continue to hold top two spots in the annual ratings, the second time in the row. Irfan Abdulla , Director Talent Solutions & Learning Solutions, LinkedIn India in a statement said, "India Inc is thriving, backed by an increasing business friendly sentiment and a positive economic trajectory". [Full Article...]
Microsoft was hoarding patches for WannaCry exploit
Cybersecurity stocks were also climbing in the wake of the incident , with shares for London-based security and hardware software firm Sophos going up 7% yesterday. What versions of Windows are affected? An exploit was stolen from the National Security Agency (NSA) of the US two months ago, and soon after Microsoft patched all supported versions of Windows. [Full Article...]
Google serves machine learning chips in the cloud
Google says each TPU module, as pictured above, can deliver up to 180 teraflops of floating-point performance. Only last month we saw Google ruffle Nvidia's feathers by benchmarking its in-house design Tensor Processing Unit (TPU) chips against Tesla hardware accelerators. [Full Article...]
May the Fourth be with you
Mark Hamill , 65, - yes, Luke Skywalker himself - tweeted a fun fact about May The Fourth, marking how the day is connected to Al Capone , Margaret Thatcher and Will Arnett , 47. Other events in the United States included special Star Wars-themed activities at the Walt Disney Co's Disneyland amusement park in California. The similarity to one of the movie franchise's iconic lines - "May the Fo... [Full Article...]
Tencent reports 58 pct jump in first-qtr profit
Its overall revenue jumped 55 per cent to 49.55 billion yuan year-on-year, while net profit was up 58 per cent at 14.48 billion yuan. Social networks revenues grew 56% to RMB 12,297m, driven by an increase in digital music and video services over the Chinese New Year period. [Full Article...]
Google Store offers free case with a Pixel XL purchase
Since the Pixel 2 will be running Android O right off the bat, we can expect numerous RAM-related optimizations, so it is highly unlikely that the phone will require this much memory. Of course, the relatively comparable scores of the Google Taimen could simply be attributed to the fact that the device utilized in the benchmarking tests was a prototype of the upcoming flagship. [Full Article...]
Indian Student Builds World's Smallest Satellite For NASA
Kalamsat is manufactured using unbreakable carbon fibre polymer and weighs lower than the weight of a smartphone. The flight isn't so much about gathering data but rather checking that everything works as expected. "The main challenge was to design an experiment to be flown to space which would fit into a four-metre cube weighing 64 grammes". The small satellite has been dubbed KalamSat aft... [Full Article...]
Galaxy C10 leaks, Samsung's first dual-camera smartphone
Freshly leaked images of Samsung Galaxy C10 not only suggest that the phone will feature a dual camera setup but also that it will be the first smartphone from the South Korean company to have this camera configuration. However, we have a list of rumours about the phone which reveals the expected features and specs which would come inside this Galaxy C10 phone. The text in the image reads, "Sams... [Full Article...]
War on Piracy! Extratorrents Too Shuts Down Permanently
Users who are hoping that a mirror site (similar to the ones that went online after The Pirate Bay shut down) would emerge are out of luck. The ExtraTorrent admin has asked its users not to fall prey to fake ExtraTorent clones that will spring up after its closure. [Full Article...]
IPhone 8: sarà veramente così il nuovo smartphone di Apple?
Dopo i disegni in CAD degli scorsi giorni e altri concept delle scorse settimane, raffiguranti iPhone 8 come è stato descritto dalle speculazioni di questi mesi, le nuove immagini sembrano ancora una volta confermare quanto detto sino ad oggi. [Full Article...]
Ecco un prototipo di OnePlus 5 con le ultime ipotesi sul prezzo
Per ora si possono fare supposizioni al riguardo, ma nulla di più. Ad accompagnare il processore troveremo 6 GB di memoria RAM e 64 GB di memoria interna . Quello che in effetti sembrava essere molto più di un rumor si è trasformato in una sorta di giallo. Secondo il portale The Verge, l'OnePlus 5 arriverà quest'estate (con annucnio in giugno). [Full Article...]
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Pollinator Friendly Plants
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- Fruit & Nut Trees
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- Landscape Supplies
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text:
Nano-sized sensors that detect volatile organic compounds—harmful pollutants released from paints, cleaners, pesticides and other products—can offer advantages over today's commercial gas sensors.
Modern commercial gas sensors consist of thin, conductive films of metal oxides. When a volatile organic compound like benzene interacts with titanium dioxide, a reaction alters the current running through the film, triggering an alarm. While thin-film sensors are effective, many must operate at temperatures of 200° C (392° F) or higher. Frequent heating can degrade the materials that make up the films and contacts, causing reliability problems.
In addition, most thin-film sensors work within a narrow range: One might catch a small amount of toluene in the air, but fail to sniff out a massive release of the gas. The range of the new nanowire sensors runs from just 50 parts per billion up to 1 part per 100, or 1 percent of the air in a room.
These new sensors, built using the same fabrication processes commonly used for silicon computer chips, operate using the same basic principle, but on a much smaller scale: The gallium nitride wires are less than 500 nanometers across and less than 10 micrometers in length, said researchers from National Institute of Standards and Technology (NIST), George Mason University and the University of Maryland. Despite their microscopic size, the nanowires and titanium dioxide nanoclusters they're coated with have a high surface-to-volume ratio that makes them sensitive.
"The electrical current flowing through our nanosensors is in the microamps range, while traditional sensors require milliamps," said NIST's Abhishek Motayed. "So we're sensing with a lot less power and energy. The nanosensors also offer greater reliability and smaller size. They're so small that you can put them anywhere." Ultraviolet light, rather than heat, promotes the titanium dioxide to react in the presence of a volatile organic compound.
Further, each nanowire is a defect-free single crystal, rather than the conglomeration of crystal grains in thin-film sensors, so they're less prone to degradation. In reliability tests over the last year, the nano-sized sensors have not experienced failures. While the team's current experimental sensors detect benzene as well as the similar volatile organic compounds toluene, ethylbenzene and xylene, their goal is to build a device that includes an array of nanowires and various metal oxide nanoclusters for analyzing mixtures of compounds. They plan to collaborate with other NIST teams to combine their ultraviolet light approach with heat-induced nanowire sensing technologies.


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My Only One (하나뿐인 내편) - Drama - Episode 96 Clip 1
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October 2015: Calafell – Finale (CAT)
The last meeting of OpenArch partnership takes place in October in Calafell (Tarragona). The goal of this activity is to take the last decisions regarding the project and make assessments of the project results. Although the program is mostly focused on internal meetings among the OpenArch partners, there are also parallel activities open to the public like the seminars about museum management and communication on Day 1, a visit to the Archaeological Ensemble of Tarraco (UNESCO World Heritage Site) and the activities scheduled at La Ciutadella Ibèrica of Calafell during the European Heritage Days in Catalonia (9-11 October).
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Beatriz joined Scott Brownrigg Interior Design in 2015. Highly experienced within the commercial interiors sector, Beatriz has project led on a number of high profile schemes including the new headquarters for Pernod Ricard in West London, Hasbro's new headquarters in Stockley Park and the UK hub for Spanish Bank BBVA in Canary Wharf. Having accumulated a wide range of experience and detailed knowledge of providing high quality interior design solutions for clients across the commercial sector, Beatriz also delivered the award-winning headquarters for Jaguar Land Rover which won both BCO and Mixology Awards.
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Obama's America
Unmaking the American DreamBook - 2012
From the critics
Community Activity
CommentAdd a Comment
Obama is too smart to have drastically reduced the United States' influence and respect in the World on accident. He simultaneously accelerated the bankruptcy of America. Read what his mentors taught him and discover his world view.
American Dream: "the ideal that every US citizen should have an equal opportunity to achieve success and prosperity through hard work, determination, and initiative."
After eight years of Obama in office, the American Dream is just merely a dream...
Right wing drivel.
What's so great about the justice system? . . .
"Dinesh D'Souza, conservative filmmaker, pleads guilty to straw donor scheme" http://www.newsday.com/news/new-york/dinesh-d-souza-pleads-guilty-to-felony-for-illegally-funneling-money-into-2012-ny-senate-campaign-1.8092030
Regarding "Opinion - From the Critics" ...
why would anyone care what World Net Daily (WND) thinks?
For some examples of WND trash see: http://www.rightwingwatch.org/category/organizations/worldnetdaily
Everyone should read this book. Get knowledge get to know the real "Obama".
A definite must read. Very good and very insightful.
D'souza' analysis is the most logical explanation of this presidents ideology.which is why he does what he does when he does it.His administration's dogmatic approach toward America and the west in general wreak of all kinds of ism's. Anti-colonialism is probably the kindest description of his american anti-exceptionalism agenda.Think about it, what kind of man would associate with Al Sharpton ?
I think this book would make a really great novel. D'Souza paints this really compelling fiction about the president of the United States, and if I read a similar account about a fictional President I'd think it was a really cool story. Unfortunately, this book is marketed as NON-fiction, which means that the author has the burden of demonstrating that his ideas are true, or at least plausible.
Dinesh D'Souza's whole premise is that Barack Obama really wants America (and the west) to fail, all as part of an elaborate Revenge Fantasy to make America pay for all of colonialism. Every single thing that, in D'Souza's eyes, was either a failure or a bad idea, is attributed to anti-colonialism. His formula is straightforward: Take a policy, explain why it doesn't work. Explain why conservatives don't like it. Explain that Obama isn't actually a socialist or Muslim or whatever, as most conservatives think, but just wants America to fail. D'Souza does a lot of pandering by pretending to be objective by poo-poo-ing conservative criticisms in favor of his own.
D'Souza relies too heavily on Obama Sr.'s criticisms of Colonialism without actually establishing any actual links between Obama Jr. and those philosophies. He talks about both father and son, but does little to show philosophical connections other than by vague insinuation. D'Souza also has a habit of trying to "prove" his theory by using it to make "predictions" about events whose outcome is already known. That's not a prediction, especially when the outcomes were already probable and the situations are cherry-picked. There are a few times where *future* predictions are made, and rather than predicting nefarious actions, D'Souza predicts fairly mundane outcomes, just with secretly nefarious intentions. i.e. Expanding environmental policy, but *not for the reasons you think!*
In the absence of actual facts and evidence, D'Souza relies almost entirely on innuendo and suspicion. There is little to tie Obama's actions and decisions (both good and bad) to any elaborate Anti-Colonial Revenge scheme.
Dinesh D'Souza's books used to be better. Either the election forced a deadline that precluded real research for this, or Dinesh D'Souza is turning into the next Jerome Corsi (a laugable conspiracy theorist who is more a punchline than an author).
EVERY American old enough to vote should read this book before the election in November. It explains why Obama hates Truman, Marshall, and Churchill. It also reveals why Obama did his flip-flop on gay marriage. However, its most important contribution is to explain how Obama's upbringing influenced his world view. This book is not just the narrative that Obama wants us to hear (which is usually what we get in the current media environment), but it is both thoughtful and insightful.
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John Lewis Customer Service Number [Toll-Free] +44 1698545454
John Lewis is the most popular chain of high-end department stores in London, United Kingdom. John Lewis was launched in 1864 by John Lewis in London, United Kingdom. John Lewis has started offering services Retail. John Lewis has 38,100 employees. John Lewis Headquarters is in London, United Kingdom. we have mentioned the complete details of John Lewis Customer Care Number e-mail id phone numbers, toll-free number, address, and much helpful information. We are providing all the available methods to contact the John Lewis Toll-free Helpline or Support Team.
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Young men 'rescue' one of their brothers
This was not your typical rescue mission.
No one streaked thick black paint across their face. No one dove into dangerous water. There were no jets, no parachutes and no secret code names.
The rescue didn't happen at sea, on a mountainside or at the scene of a fiery car crash.
The most important rescue of my life unfolded in a living room.
Thirty years ago, I attended a local congregation of The Church of Jesus Christ of Latter-day Saints in Charlottesville, Va. We were such a small group of young men that we often combined the three classes for Sunday instruction. In the Church, young men are divided into what are called Aaronic Priesthood quorums. They are Deacons (age 12-13), Teachers (age 14-15) and Priests (age 16-18).
Those around me during this time in my life knew that I struggled mightily with the illness and death of my father. The Sabbath was particularly difficult and I remember a stretch of several Sundays when I chose to stay home alone and wonder about the future.
On one of these hot, thick Sunday afternoons, I plopped in my father's papasan chair and let the worry wash over me. The air was so humid my shirt stuck to my skinny frame and I don't know what was more suffocating — the teen angst or the thick Virginia air.
I looked at the clock and imagined our sacrament service ending, then Sunday School and, finally, the start of our third-hour priesthood meeting. I silently wondered if anyone on heaven or earth would even notice I wasn't there.
Suddenly, I was startled to hear a car crunching up our long, loud, gravel driveway. Our family lived just a few miles outside of town, but far enough in the country that we rarely heard our neighbors or traffic.
A minute passed and I'd convinced myself it was someone turning around when I heard footsteps on the noisy deck stairs. They grew louder and multiplied as they moved across the side of the house and toward the sliding glass door.
Then, one at a time, young familiar faces appeared — Robert Snow, Eber Cummings, J.P. Marshall and others. They slid open the heavy door and streamed into my family room. You could have driven their minivan through my gaping mouth.
Andy Huntley, one of the finest priesthood leaders I've ever known, followed them in the door and shook my hand.
What he said was: "We're here for a priesthood meeting."
What I heard was: "We're here for a rescue."
After an opening prayer and some announcements, we discussed an upcoming Scouting activity and had a short message. I don't recall the details, but I remember the unspoken lesson.
Before leaving, we knelt on my living room floor and someone offered a benediction. There was no special mention of me in the prayer and never any questions about where I'd been or what I was missing. There were no sermons and no preaching, just the simple message that I was missed.
As we said goodbye, a couple of them swatted at me playfully the way boys do and one of them dove in the papasan. We laughed as we pried him out.
Andy Huntley, the adviser who'd borrowed a van to get everyone there, shook my hand, looked me in the eye and said, "Hope to see you next Sunday."
And he did.
Recently, I reconnected with Andy and his wonderful wife, Lisa, using social media. They are active, faithful members of a congregation in Centreville, Va. This week I thanked him for his rescue, some three decades too late, and asked what he remembered about the experience.
"I recall feeling that you needed to know that you had members of your quorum and patrol that understood you needed your space; and whatever else you needed — they were there. So, we decided in a quorum meeting to go check on you. Those were tender feelings expressed by young men that typically did not know how to so express themselves. All I did was provide transportation, really."
His memory is crystal clear, at least until that last recollection. I assured him that his contribution was much more significant and eternal than simply driving the rescue van. Whether he knew it or not, his example that day taught that to rescue a brother, sometimes you've got to leave the church.
Perhaps such a real-time rescue isn't realistic or appropriate in every ward or branch around the globe. A similar visit could happen after Sunday meetings, or on a weeknight, or in the morning hours before church services begin.
Exactly what the mission looks like isn't important — especially to the lonely brother or suffering sister waiting on the other end. What matters most is that the rescue team shows up.
I often imagine that one day I might need a second kind of rescue, the one that requires black face paint, a life preserver, a brave fireman or a skilled doctor. But even if I do, I'm not sure it could ever surpass the first.
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Neils Kegg, a business manager for Subway, made headlines in his city last year for something he never saw coming.
The 30-year-old volunteer, who devotes his spare time to helping young people get to and from football sessions from ParkLives, had the idea of taking a regular game and turning it into a 5-a-side league.The result was overwhelming, and earned him an award nomination for his contribution and generosity to the local community.
We caught up with Neils to find out more about his achievement:
How did you hear about ParkLives?
It all started with a google search to find something to do for my younger brother, and we ended up attending a launch for ParkLives. While I was there I met Liz from
What made you want to volunteer?
When I took my brother for the first time I knew all the children there, and I gradually started helping out with the sessions. It wasn't long before Marguerite asked if I wanted to volunteer, and I quickly accepted her offer. I love the feeling of being about to give something positive back to the local community.
How did the Sunday 5-a-side league come about?
During one of our sessions for 6 to 12-year-olds we heard some of the older boys complaining that there was nothing for them. So I decided to try and organise a 5-a-side league for them on a Sunday, expecting maybe two or three teams, but I ended up with a total of six! The league was a huge success in the community, and we now have more than a hundred children attending these sessions.
How did you spread the word about the league?
I used Facebook and created two pages for the sessions, which now have a combined total of 600 fans.
What do you like about football?
Football is an important sport because anyone, no matter what their age, sex, race or sexuality, can participate and have fun.
What three qualities does an aspiring football player need?
Self-respect, teamwork and discipline.
How has ParkLives had an impact on your life?
It's had an impact both physically and mentally, giving me the confidence to keep taking part and keep going. When I oversee the sessions it makes me feel proud of what I've been able to achieve with the help of ParkLives, for if they hadn't started the sessions in the first place I'd never be doing what I am today. There's nothing for children in the area, so seeing their faces when they're playing, meeting new people and enjoying themselves – for free – is great.
Find out more about ParkLives from
More on Journey
- Coca-Cola invites StreetGames to Stamford Bridge: Our report from a very special day of football
This Coke is a Fanta:
Coca-ColaBrazil fights homophobia with a new symbol of Pride
Coca-ColaFoundation Announces $1 Billion Giving Milestone
- Where Everyone Plays: Behind the scenes with Jesse Lingard, Jermaine Jenas and the fans
- Project Last Mile: Delivering a future for those living with HIV and AIDS


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Laporta: Barca could have had Ronaldo
Barcelona could have signed Cristiano Ronaldo in 2003, but the club could not afford him at the time, according to its former president Joan Laporta.
Laporta told Spanish radio show Al Primer Toque on Monday night that he could have signed Ronaldo for less than the €15 million Manchester United paid in 2003, but the Catalan club had already spent its budget on other players.
"(Agent Jorge) Mendes offered him to us, for even cheaper than to Manchester United, due to some transfers we had done for him, including Deco," he said. "But at that moment we did not have the resources after signing Ronaldinho, (Rafael) Marquez and (Ricardo) Quaresma."
The lawyer, who was Barca president from 2003 to 2010 and is currently a member of the Catalan regional parliament, also said AC Milan owner Silvio Berlusconi tried to exchange Kaka for Ronaldinho, before the Serie A club sold the former to Real Madrid for €65 million in 2009.
"Berlusconi tried to swap him (Kaka) for Ronaldinho, but at that moment it was not an option for us as he was a key player," Laporta claimed. "It was an offer made during a directors meal. It was half in joke and half serious, but he wanted to see if we would be interested. It seemed a pity as it then looked like he was going to be a success at Madrid, but that has not happened, although he is an excellent player."
The decision of his friend Pep Guardiola to turn down more lucrative offers to take over at Bayern Munich next season was a "wise" one, Laporta said, and it was unlikely he would try and persuade his former Barcelona colleagues to join him in the Bundesliga.
"It is a wise decision, the most correct of all," he said. "I like that a person with as much integrity as Pep has told all the clubs with money that he prefers a serious project like Bayern. I am sure he will respect Barca, he has many options in Germany to bring through players and does not need to 'come fishing' here."
Laporta said it looked as if current Barcelona goalkeeper Victor Valdes was set on leaving the club, but if he were still in charge he would try and get him to stay, as he did when Valdes last renewed his contract in 2009.
"(Valdes) is a man with a lot of personality," Laporta said. "He is a restless character who wants to get to know other cultures. He is sincere and not trying to second guess anyone. I would try to persuade him to stay at Barca, but Victor will be the one who decides."
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The Luke Dow Law Firm may be able to help you recover damages from the truck driver or trucking company. This compensation can pay for health-care costs and lost income - which can easily add up to several hundred-thousand dollars.
Austin personal-injury attorney Luke Dow will evaluate the circumstances of your accident and fight for the maximum compensation. Call us today at 512-518-4104 to schedule an appointment.
In the meantime, read on to learn about five common truck accidents that are easy to avoid:
1. Changing Lanes
Changing lanes or making an unexpected move in front of a truck is particularly dangerous.SafeRoads.com reminds readers that it is important to indicate their intention to change lanes clearly. Trucks require more stopping distance than regular vehicles, and any sudden moves may result in a serious crash.
2. Driving in Blind Spots
Commercial trucks have large blind spots due to their size and structure. If you cannot see the truck driver or the mirrors, then it is very likely that he cannot see you.
While it may not be possible to avoid driving in blind spots at all times - particularly if you are overtaking - it is critical that you limit your time in these zones as much as possible. If a truck does not see you, then he may turn in front of you and cause a catastrophic accident.
3. Misjudging Speed
Do not think that simply because trucks are large, they are travelling slowly. Many drivers misjudge the speed of trucks at intersections and pull directly in front of them. In these cases, the truck driver may have little option but to crash into your vehicle, because trucks are generally unable to stop before or maneuver around obstacles as easily as passenger cars.
4. Turbulence When Overtaking
According to Arrive Alive, trucks have a lot of turbulence around them when travelling at high speeds. If you are overtaking a truck, it is important to keep as much distance from the truck as you feel is safe. This will limit the influence of the turbulence on your car, and will give you room to correct your steering should the wind affect your vehicle's line on the road.
5. Wide Turns
Large trucks need a lot of space to turn. This means their drivers may need to swing wide to make the turn safely. This is particularly true at tight intersections. So be aware of turn signals, and give the truck plenty of space.
If you were in an accident with a truck, call the Luke Dow Law Firm at 512-518-4104. An Austin personal-injury lawyer from our practice will evaluate your accident to determine if you have legitimate grounds for a lawsuit.


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Bethesda Website Leaks Fallout 76 Customer Details
Fallout 76 is off a troubled first month, with issues surround both the game's stability and features, and the marketing of the title.
We've reported about two major patches which are going to introduce more systems and polish the title, and also about a problem with the underwhelming quality of the Power Armor Edition.
It looks like troubles have not ended yet, though, as there's been a customer details leak on the official Bethesda Support.
Basically, people logging into the website have had the opportunity to look at the personal information of the users and their tickets for a relatively short while.
"I went on the support website today, to update a ticket of mine, and surprisingly (or not…) I ended up being able to see all sorts of tickets, with people putting their personal information in them, like receipt screenshots, names, addresses and so on," shared an user on the official forums.
"I'm assuming this is a bug in the website, because I don't see for what reason Bethesda would make tickets public."
Once again, Bethesda's answer to this issue has been rather surprising, if not shocking: "Hi guys, we've resolved this issue."
While we're relived that this issues has been "resolved", it's only obvious that we'd like to have a in-depth explanation about what caused the issue and which were their consequences.
Fallout 76 is now available for PC, PS4 and Xbox One. Are you playing it?


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RAI Amsterdam is the producers and owners of METSTRADE, The Marine Equipment Trade Show. They have announced that they would be purchasing about fifty percent stake in IBEX, International Boat Builder's Exhibition and Conference. This stake is being published from Wooden Boat Publications Inc. It is a magazine publisher for Professional Boat Builder that held stakes in the company previously.
Jim Miller, who is said to be publisher and general manager of the magazine, stated that, their company had helped to form IBEX. Now the same ownership is being sold to RAI. The respect that they have for RAI is long standing.
Hence, the company is confident that they will sustain the excellence levels that have been achieved in the show from the time it was conceived, in 1992. The team looks forward to IBEX continuing in the path of success that it has forged since the time it was launched about 26 years back. The show definitely helped to create a positive impact on boat building as well as repairs. Continue reading "METS Stakes In IBEX"


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How It Works
The Riversol anti-aging trio kit has been scientifically formulated to work together as an integrated, 3-step system. The cleanser provides a deep clean to gently removes impurities. The powerful anti-aging serum restores a healthy radiance to the skin by providing stabilized vitamins along with potent natural antioxidants that penetrate deeply. Finally, following application of the serum, the moisturizer provides lasting, lightweight hydration.
The trio kit includes a three month supply of cleanser, serum and moisturizer.
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By day families, foodies and curious shoppers meander through lane ways of artisan producers, watch live cooking demonstrations, partake in hands-on experiences and delve to an array of all your favourite flavours.
By night, the city skyline lights up the festival as delicious dishes and drinks traverse the festival and the sound stage ignites the atmosphere.
Here are some of the attractions at Taste! Stay Tuned for 2020
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As An Infant
Luke 18:15 People were bringing even infants to him that he might touch them; and when the disciples saw it, they sternly ordered them not to do it. 16 But Jesus called for them and said, "Let the little children come to me, and do not stop them; for it is to such as these that the kingdom of God belongs. 17 Truly I tell you, whoever does not receive the kingdom of God as a little child will never enter it."
Luke is the only gospel writer that refers to the children as infants and it is in this place that we must find ourselves. I think it may be easier to try and put ourselves in the place of children because they are already at a level of independence. Infants on the other hand, are completely and totally dependent upon their parents. Luke's emphasis here is on the need for complete and total dependence upon God when one is living and serving in the kingdom.
I remember with great joy the day that we brought our first-born, Christy, home from the hospital. It's amazing how that little person was able to change our lives. Everything about life had to revolve around caring for her if we wanted her to grow up and be healthy. She had to be fed at regular intervals. She had to be changed when the diapers were wet or dirty. But beyond the physical care, we wanted to sing to her, read books to her, pray with her, play with her, hug her and just generally love on her. She didn't resist any of it and as she began to grow and develop, her response to us gave us great joy. That first little smile was amazing. The first words came quickly and were followed by many, many more. The voracious hunger for books started from an early age and just snuggling with her on the couch was such fun!
|Here's Christy a little older, helping her daddy with the newer infant -- Cara!
Our heavenly father is providing everything we need to be healthy. He loves us and just wants to snuggle on the couch with us! He rejoices in our smiles and laughter and spiritual growth and maturity.
We are to be as an infant, completely dependent upon the sustaining strength and leading of the Holy Spirit in our lives. This is God's desire, not just children, but babes in his arms, looking upward, cooing and smiling at the loving face of the father. He will provide all that we need, if only we relax in his loving arms.
Lord, thank you for what you do for us — which is more than enough. Amen.