text:
|Publication number
|Publication type
|Application number
|Publication date
|Sep 18, 2007
|Filing date
|Dec 13, 2000
|Priority date
|Dec 13, 2000
|Fee status
|Also published as
|Publication number
|David J. Elliott, Kenneth J. Harte, Larry E. Shephard
|Original Assignee
|Uvtech Systems, Inc.
|Export Citation
|BiBTeX, EndNote, RefMan
|Patent Citations (114), Non-Patent Citations (1), Referenced by (2), Classifications (13), Legal Events (5)
|External Links: USPTO, USPTO Assignment, Espacenet
This invention relates to a UV-reactive gas plasma processing apparatus and method for film deposition, etching, doping, UV curing, melting, and other surface processing of a substrate(s), such as a wafer used in integrated circuit (IC) manufacturing.
The manufacturing of semiconductor devices and other small geometry electronic and optical devices, such as thin film heads , printed circuit boards, and compact discs, involves many surface processing operations. Examples of these surface processes include the following: deposition of a metal or dielectric layer onto a surface by energetic decomposition of an excited volume of gas; etching or removal of material from a surface in an excited gas plasma atmosphere; UV polymerization of a coating; crystallization or re-crystallization of a surface by exposure of the surface to a high temperature in an excited gas atmosphere; photochemical treatment of a surface to improve adhesion of a subsequent layer; melting of a surface to fuse or alloy another material into its structure; energetic photochemical surface treatment to implant impurity ions into a surface structure of applied doped layers; oxidation or oxide growth to create a thin dielectric layer; or producing a reduction reaction on a surface to remove an oxide or other layer.
Typically, in prior art reactors, the surface processes previously mentioned are performed in reaction chambers where high energy and gas mixtures are combined to produce a reaction. Many of these processes require a deep vacuum and elevated chamber temperatures. In semiconductor production manufacturing lines worldwide, these chamber-bound, surface treatment process steps (deposition, oxidation, etching, cleaning, photoreactions) constitute the majority of all IC manufacturing process steps.
A fundamental problem with prior art reactors is that the interior volume is filled with gas and energy to drive the reaction, when only the wafer surface needs reacting. Therefore, the amount of gas and energy expended into the volume of a reactor greatly exceeds the amount needed to react a thin (sub-micron) layer at the wafer surface. This large volume of gas and the energy required to excite the large volume of gas is wasteful. This causes unwanted reactions on many surfaces in addition to the substrate being processed.
There are six primary problems associated with prior art reaction chambers. The first problem associated with prior art reaction chambers relates to the deposition of reaction products onto the reaction chamber surfaces. During processing, gas reaction by-products form particles and residues on the chamber walls which, during subsequent processing, re-deposit onto the wafer, causing serious contamination and chip rejects. One method to remove this contamination is to clean the chamber with nitrogen trifluoride (NF3), an expensive toxic gas; the cleaning procedure causes system downtime and reduces productivity. Several methods have been tried to reduce the contamination, such as the use of deflecting shields, containment devices, and a host of variable geometry inserts which re-direct the reactive species in an attempt to minimize the formation of these harmful by-product deposits.
The second problem associated with prior art reaction chambers relates to non-uniformity of the reactions taking place at the wafer surface. A typical reaction chamber produces an energy field which is non-uniform, and also generates a gas distribution which is non-uniform. The interactions of the energy and reactive gases are therefore non-uniform. A wide variety of specially shaped electrodes (for delivering energy) and showerheads (for delivering gases) have been utilized to improve the uniformity of the reactions at the wafer surface. The result of reaction non-uniformity is variations in the thickness of deposited films, or non-uniform removal in etch reactions, or other deviations that impact the quality and yield of IC devices in manufacturing lines.
The third problem associated with prior art reaction chambers relates to their cost efficiency, measured in terms of gas consumption and wafer-per-hour productivity. The typical reactor requires that the volume of the chamber be pumped down to a vacuum, then filled with gases. The energized gas reaction products then interact with the wafer and surrounding chamber surfaces. Since the activating energy and gas volume are not confined or specifically directed to the wafer surface, excess energy and gas is consumed, and excess process time is required to deposit or etch a film layer. High cost of operation results from excess gas and energy consumption, and lower throughput or productivity results from excess process time.
The fourth problem relates to the use of vacuum environments in prior art reactors. Wafer processing, especially in deposition and etching processes, presently requires the use of deep vacuum. First, the time required to pull a vacuum and return to atmosphere causes productivity loss, since it represents a major portion of total process time. Secondly, the equipment (big pumps, load locks, plumbing) required to provide vacuum environments is expensive and complex, thereby reducing both cost efficiency and reliability of the system. Thirdly, the system size and footprint are increased to support deep vacuum processing, and space in IC fabrication clean rooms is extremely expensive.
The fifth problem relates to the use of many types of reactors to perform a variety of wafer surface processes, and the fact that they are not fully integrated. There are many different systems used in IC manufacturing for etching, deposition, doping or ion implantation, annealing, UV curing, and surface conditioning, many of which are dedicated to a single process step. This creates large capital expenses, as well as excess wafer handling from tool to tool; handling adds contamination to the wafer and lowers chip yield.
The sixth problem relates to the high thermal environment inside prior art reactors. Wafers are subjected to high temperatures (800-1100� C.) in many reactors, which induce thermal stress, wafer warp, crystal plane slippage, dopant depth changes, and other undesirable effects. Thermal processing also reduces throughput, since gradual heat-up and cool-down cycles are used to reduce stresses, thereby reducing wafer throughput.
It is therefore an object of this invention to provide a new and improved plasma reactor apparatus and method for semiconductor wafer and other substrate manufacturing processes.
It is a further object of this invention to provide such a plasma reactor which reduces or eliminates the problems of wafer and chamber contamination caused by the deposition of reaction by-products on the interior surfaces of the reactor vessel.
It is a further object of this invention to provide such a plasma reactor which provides a small, uniform and controllable zone of reaction products at the wafer or other substrate surface.
It is a further object of this invention to provide such a reactor with reduced system operating cost by delivering the reactive gas species and excitation energy directly at the wafer surface, and not to the chamber volume.
It is a further object of this invention to provide such a plasma reactor which operates at or near atmospheric pressure, eliminating the need for deep vacuum.
It is a further object of this invention to provide such a plasma reactor which can provide a wide variety of gas chemistries and excitation energy levels to allow for many different types of surface processes within a single reactor. The object is to provide a processing environment for simultaneous and sequential wafer treatment for etching, deposition, doping or ion implantation, re-crystallization, UV curing, oxidation, surface roughening, photochemical modification, reduction reactions and other surface processes used to make IC chips.
It is a further object of this invention to provide such a reactor which does not require heating the entire mass of the chamber or even the wafer substrate holder (vacuum chuck) in order to elevate the wafer to high temperatures, thereby eliminating wafer thermal stresses and loss of productivity from warm-up and cool-down cycles.
This invention results from the realization that both the gas products and the excitation energy can be delivered directly to the surface of the wafer in a productive, controlled, uniform and efficient manner. For a given raw energy input, the effective fluence at the surface of the wafer may be changed by a factor or 4 or greater by changing the area of the beam at the surface of the wafer.
Because reaction products and energy are reacted and localized at the wafer surface, by-product contamination in the chamber is greatly reduced. Also, the UV radiation and gas is closely controlled in a small, blade-shaped reaction zone at or near the wafer surface which produces a high degree of reaction uniformity and process efficiency (wafer throughput and gas usage). The process can operate at or near atmospheric pressure, reducing cycle time and equipment cost and increasing system reliability.
Since many UV wavelengths and energy intensities can be used, along with many gas types in the same system, a high degree of process integration is possible, and fewer individual reactors are required for a given manufacturing process.
Since short wavelength UV radiation produces extremely high surface temperatures and reaction rates, the need to have high bulk temperature thermal processing is greatly reduced or eliminated.
This invention features a scanning plasma reactor with a reaction chamber and beam forming module which transforms a UV radiation source raw output into a rectangular beam. The rectangular beam is projected through a window in the reaction chamber. A substrate to be processed is held in place by a vacuum chuck. A gas injection module delivers at least one reactant gas to the substrate surface in close proximity to the rectangular beam. A gas exhaust module removes reaction by-products and unreacted reactant gas from the substrate surface. The rectangular beam and the gas injection module are moveable relative to the substrate surface.
The UV radiation source may operate at a wavelength between 351 nm and 157 nm. The rectangular beam may have dimension of about 200-300 mm in length and 0.1-10 mm in width. The rectangular beam may have an energy level at the substrate surface of about 0.1-10 Joules/cm2.
The beam forming module may include a plurality of optical elements, of which at least two of the optical elements may be cylindrical refractive elements.
The scanning plasma reactor may provide a number of different reactions, including etching, deposition, oxidation, reduction, melting, surface modification, polymerization, UV curing, and doping reactions.
The exhaust module may comprise a block shaped manifold at one end of the reaction chamber to draw gas across the width of the chamber. The gas injection module and exhaust module may include adjustable slits with maximum length greater than the width of the substrate. The rectangular beam, gas injection module and exhaust module may be translated across a stationary substrate or the substrate may be moved relative to a fixed rectangular beam, gas injection module and exhaust module. The gas injection and exhaust modules may be combined into a gas injection/exhaust system.
The rectangular beam may be focused above the substrate surface to allow interaction with the reactant gas but prevent direct contact the beam and the substrate surface. The beam forming module may include an adjustable mirror which may be repositioned to change the angle of the rectangular beam relative to the substrate surface.
The window in the reaction chamber may be located on a top surface of the chamber or it may be located on a side surface of the chamber.
The scanning plasma reactor may be operated at or near atmospheric pressure.
The scanning plasma reactor may further comprise an electronic control module to programmably select a reactant gas chemistry and an excitation energy level for one or more processes, including etching, deposition, doping, ion implantation, re-crystallization, UV curing, oxidation, surface roughening, photochemical modification, and reduction reactions.
The top surface of the substrate may be transparent to the rectangular beam such that the rectangular beam causes a reaction at a layer of the substrate below the surface.
The vacuum chuck may include a heating element to heat the substrate.
This invention also features a scanning plasma reactor including a beam forming module, a reaction chamber with a window through which the beam forming module projects a rectangular beam, a gas injection module fixed at one end of the chamber and an exhaust module fixed at the opposite end of the chamber. The rectangular beam is moveable relative to the substrate surface.
This invention also features a scanning plasma reactor including a beam forming module, a reaction chamber with a window through which the beam forming module projects a rectangular beam, a gas injection module fixed to deliver at least one reactant gas and at least a second fluid or vapor to the substrate surface and an exhaust module. The rectangular beam and the reactant gas form a reaction zone which is moveable relative to the substrate surface.
This invention also features a scanning plasma reactor including a first beam forming module to form a first rectangular beam, a second beam forming module to for a second rectangular beam, a gas injection module to deliver at least one reactant gas to the substrate surface, a reaction chamber with at least one window through which the first and second rectangular beams are projected, and a gas exhaust module to remove reaction by-products and unreacted reactant gas from the substrate surface. The first and second rectangular beams and the reactant gas form a reaction zone which is moveable relative to the substrate surface. The first rectangular beam may include a UV radiation, and the second rectangular beam may include an infrared radiation. The reaction chamber may include a first window in the top of the chamber through which the first rectangular beam is projected and a second window in the side of the chamber through which the second rectangular beam is projected.
Other objects, features and advantages will occur to those skilled in the art from the following description of a preferred embodiment and the accompanying drawings, in which:
Scanning plasma reactor 10 is described with reference to
The beam forming module 30, containing the beam shaping optics 31, 32 and a mirror 33, receives a raw laser beam 34 and transforms it into a blade-shaped beam which is projected off of mirror 33 through window 35 into the reactor chamber 13 and is focused onto the surface of wafer 11. The incoming raw laser beam is a conventional rectangular cross-sectional beam 34, and the shaping lenses 31 and 32 are cylindrical refractive elements made from high purity fused silica. The mirror 33 which reflects the shaped beam into the chamber 13 can be angle adjusted by a simple pinned rotating assembly 36 permitting various UV laser beam incident angles delivered onto the surface of wafer 11. Beam forming optical elements 31 and 32 are interchangeable with elements of different radii to permit a simple and quick means to change the width of the blade-shaped beam which is focused onto the surface of wafer 11.
The laser source may be an excimer laser (for example a Lambda Physik LPX 200 available from Lambda Physik in Fort Lauderdale, Fla., USA) which generates a pulsed beam 34 at wavelengths of 351 nm, 308 nm, 248 nm, 193 nm, or 157 nm. Solid state lasers could also be used (for example a 266 nm wavelength frequency quadrupled YAG laser available from Spectra Physics in Mountain View, Calif.). High intensity lamps may also be used, such a high pressure (˜230 atmospheres) mercury lamps with metal additives to enhance the output in the ultraviolet portion of the electromagnetic spectrum, or other high intensity lamps with high intensity ultraviolet wavelength output.
The reaction chamber contains vacuum chuck 12 which may include a heating element 17 to increase reaction rates, such as for film deposition, etching, melting or other modification. The controlled atmosphere of reactive gas is provided within a closed reaction chamber 13 which is sufficiently sealed to hold sub-ambient pressure in the ˜700-450 torr range. A stream of reactive gas is injected through injector nozzle 23. Chamber pressure is maintained by balancing the rate and amount of gas injected into the chamber with the amount of gas withdrawn through exhaust nozzle 24 and exhaust port 25.
The gas delivery/exhaust nozzle module 20 and the beam forming module 30 are both connected to a single linear translation stage that is electrically driven to translate both assemblies across the wafer surface from one end of the chamber to the other. The beam forming module 30 is positioned with respect to gas delivery/exhaust nozzle module 20 so that both the gas stream 26 and the focused UV bladed radiation 37 meet at the wafer surface, forming a gas reaction zone 15.
A scanning plasma reactor for film deposition, etching, doping, ion implantation, melting, re-crystallization, deep UV curing and other surface modifications which operates in the following way.
A recipe is established for the particular type of process to be performed. Recipe set up is performed by logging the main process settings into the system computer, including the UV energy level, laser wavelength, laser reprate, gas mixture, gas flow rates, stage scan rate, and substrate type. A specific example could be etching polysilicon on silicon dioxide, where 193 nm wavelength excimer laser pulses photolyze carbonyl di-fluoride into fluorine atoms, and would be set up by setting the gas mixture as 250 Torr of carbonyl difluoride/500 Torr helium, and the UV laser energy at ˜90 mJ/cm2 surface fluence, substrate temperature is 70� C., and the scan rate at 5 mm/second. The equation for this etch reaction is:
In operation, the scanning plasma reactor starts a process cycle when the system robot loads the wafer into the chamber, and the chamber door closes; the controller automatically turns on the laser source, the various control valves to manage gas flow, and the linear stage which begins the scanning of the beam forming module across the chamber window with simultaneous scanning of the gas injection/exhaust nozzle through the chamber. Mechanical pumps control the vacuum to hold the wafer on the vacuum chuck, and also to provide additional draw from the exhaust block on the far end of the chamber to manage chamber pressure.
As soon as the beam forming module and UV blade and gas delivery system finish scanning the length of the chamber, the gas and UV radiation are automatically stopped, the beam forming and gas injection/exhaust nozzle automatically retracts to the starting position, the chamber is automatically purged of gas, the door opened, the processed wafer is removed, and the door closed. This completes the cycle for a single substrate. Additional cycles may be repeated for multiple substrates, or other recipes may be activated for different process conditions.
In addition, the software of the scanning plasma reactor allows the operator to program a wide variety of gas recipes and UV energy values for a wide range of surface applications. This allows the scanning reactor to perform the function of several individual prior art tools, saving the problem of having to transfer wafers from one tool to another and incur the associated handling defects.
The scanning plasma reactor is capable of delivering a wide range of UV energy densities, permitting a wide variety of semiconductor applications to be performed. The ability of UV photons to photochemically dissociate a large number of molecules, from a variety of gases, results in many applications being available for the scanning plasma reactor, which may deliver UV light at high (5-6+ eV) photon energies and wafer plane fluences (from as low as about 2 mJ/cm2 to greater than 1000 mJ/cm2) using conventional 248 nm and 193 nm commercially available excimer lasers. These energy densities will drive most standard reactions need to deposit, dope, etch, condition and surface-modify metal or nonmetallic semiconductor layers. The effects of these UV laser pulses is transient, localized heating which accelerates reactions with gases as well as liquids. The UV energy rapidly photo-dissociates molecules into volatile or more readily reacted products.
Further, UV energy at these wavelengths and below, such as the 157 nm wavelength of a fluorine excimer laser, are very strongly absorbed by complex organics to a typical absorption depth of about 200 nm, making the scanning plasma reactor useful for reaction with, and volatilization of, organically based films.
The typical UV blade according to the present invention has a dimension of about 200 mm across one axis and about 0.5 mm on the other axis, for an area of about 1 cm2. In this area, using a mid-range output, commercially available Lambda Physik laser, a UV intensity of about 30 mJ/cm2 can be achieved with an input pulse of about 300 mJ. Substituting a larger UV laser from Lambda Physik, with a pulse energy of about 600 mJ, the fluence in the UV blade will be about 60 mJ/cm2. This level of energy is sufficient to drive most of the etching, deposition, UV curing and other surface conditioning/modification reactions.
In order to achieve still higher fluences or UV intensities in the UV blade of the scanning plasma reactor, a simple change of one of the optical elements, namely 32 of
To further increase the UV energy density or fluence in the blade, another optical element substitution may be made to further reduce the dimensions of the blade to 200 mm by 0.12 mm, a highly focused blade. Using the same lasers as discussed above, the fluence at the wafer plane is roughly doubled again compared to that of the 200 mm by 0.25 mm blade and quadrupled compared to that of the 200 mm by 0.5 mm blade. Further increases in fluence at the wafer plane may be achieved by using still larger lasers, which are commercially available. However, almost all of the typical reactions required for IC manufacturing can be driven at energy levels provided by the above examples, as will be disclosed in the specific examples following.
The scanning plasma reactor has the flexibility to generate the gas reaction zone at or above the wafer surface. Generating a reaction zone at the wafer surface has the advantage of producing a maximum energy condition but also increases the possibility of damage to the wafer. Generating the reaction zone slightly above the wafer surface minimizes the potential damage to the wafer but may reduce reaction rates. It is, therefore, desirable to controllably move the reaction zone, as shown in
It may also be desirable to introduce the UV light into the gas reaction zone nearly parallel to the wafer surface. As shown in
In general, the UV energy density ranges necessary to drive reactions for specific IC fabrication processes are as follows. For etching, the etch rate is determined in part by the laser energy density, and ranges from 5 to 100 mJ/cm2 are used. For example, a 193 nm laser providing a wafer plane fluence of about 90 mJ/cm2 will etch polysilicon at a rate of about 0.15 angstrom/pulse in a mixture of carbonyl diflouride (260 Torr) and helium (500 Torr). The photolysis of fluorine results in volatile fluorides and provides selective removal over silicon dioxide, which etches very slowly under these conditions. Also, the etch depth increases linearly with exposure time. The laser reprate for this test was 100 Hz.
To etch silicon dioxide, the same 193 nm laser is operated at about 10 mJ/cm2, and gases such as NF3 and CF4/H2 are used, resulting in selective removal of silicon dioxide over silicon. The laser reprate for this test was 80 Hz, with etch rates of about 0.12 to 0.07 nm/second at atmospheric pressure.
A blade of infrared energy from a laser source may be injected onto the substrate to serve a number of practical purposes in the scanning plasma reactor. The infrared blade, landing in front of the UV blade, may be used to pre-heat the wafer just before the UV blade is injected. This will increase reaction rates and system productivity.
The infrared blade may also be used to anneal out stresses in the substrate, either in films on the surface or below the surface layer. The third use of the infrared blade may be to provide heat directly into the gas reaction zone (GRZ). This will increase the temperature of the gas reaction zone, which will keep reaction products and by-products in a volatile state longer, enabling easy exhaust of volatile by-products and elimination of any solid debris that could potentially re-deposit on the substrate or in the chamber.
As shown in
The following examples illustrate applications for the scanning plasma reactor in IC manufacturing. Each application would benefit from the advantage of having a reactor that delivered a highly controlled, uniform reaction zone, directly at the wafer surface, to perform a specific function.
The UV irradiation of metallic copper will lead primarily to thermal heating for pulse durations on the nanosecond timescale, like those from an excimer laser. When copper films are placed over silicon dioxide, there is very poor thermal transfer to the silicon. This is partly because of the difference in atomic mass between copper and silicon and because there is effectively an interfacial layer at the junction of the two films. When thin copper films are therefore exposed with the scanning plasma reactor, about 68% of the UV radiation is retained within the copper layer, and the balance is reflected. Copper reflects ˜33% of 193 nm radiation; at 157 nm UV laser wavelengths, only 21% is reflected, e.g. more efficient heating. This would result in a temperature rise at the surface to 580� C., or sufficient heat to cause dramatic surface re-arrangement. This is useful in changing the grain structure of the metallic copper layer to enhance conductivity and other physical properties, such as stress relief, in IC chip applications. In an oxygen ambient, an oxide can be simultaneously grown, and in a hydrogen ambient, oxygen can be scavenged or removed as an impurity from the copper. Also, a thin, native copper oxide can be easily removed prior to a deposition step.
The scanning plasma reactor of the present invention was used to modify a thin layer of copper on a silicon wafer. The copper layer was approximately 100 nm in thickness. The UV wavelength was 193 nm. The wafer temperature was set at 50� C. with a heated wafer chuck. The reactant gases used were nitrogen and oxygen. The gas flow into the reaction chamber was 1 SLM, and the gas flow out of the reaction chamber was 1.5 SLM. The chamber pressure was 750 Torr, and the laser pulse energy was 250 mJ. The excimer laser was set to a reprate of 100 Hz and a high voltage of 22 kV.
The wafer was first exposed to the UV energy without moving the scanning optics module. The wafer was thus exposed for a time of less than 1 second to several seconds. The copper film was noticeably melted from these exposures. The wafer was then processed with the scanning optics module and gas delivery module moving across the wafer surface at a rate of about 1 mm/second. This also noticeably re-arranged the physical structure of the copper film. When oxygen was used, an oxide layer was formed on the surface of the copper film. When nitrogen was used, the copper film was physically changed but no copper oxide was formed on the surface.
Another test was run wherein the copper surface was lightly scratched prior to exposure to the UV light. In this test, it was observed that the thin edges of the scratched areas were visibly melted.
These tests suggest that sufficient heat is generated in the UV exposure of thin copper films with either inert or reactive gas, that the copper film, and possibly other metallic films, may be surface modified such that the physical structure is changed. Annealing, re-crystallization, melting and other desired physical changes in copper and other films may be accomplished with the scanning plasma reactor. This experiment also demonstrated that the scanning plasma reactor may be useful in growing thin films using UV light and reactive gas.
This same experiment was performed at 248 nm, and there was no effect noticed on the surface of the copper film. This shows the wavelength dependence of the UV/gas reactions.
As described above, UV radiation at fluences of 30 mJ/cm2 with 17 nanosecond excimer laser pulse durations will heat copper 'seed' layers which are ˜100 nm thick to annealing temperatures, and with increased doses, to melting temperatures.
The 'seed layer' is applied by electroless copper plating, and is used as a base for building up added copper thickness by electroplating. Annealing the seed layer with the scanning plasma reactor will permit increases in the electrical conductivity of the copper film, and would also enhance the uniformity and growth rate of the thicker electroplated layer.
Controllably heating the copper seed layer with the UV pulse is also important because one usually has a 'barrier layer' beneath the seed layer that is made of a material such as tungsten. The barrier layer is critical because it must prevent direct contact of the copper to the underlying silicon, yet enable suitable electrical contact. Damage of the barrier layer by excessive heating cannot be allowed. Therefore, the controlled heating of the seed layer can be critical and is readily performed by pulsed UV irradiation. This pulsed UV laser annealing process should be carried out in a reducing atmosphere such as hydrogen or a hydrogen/nitrogen mixture. This may actually reduce the oxygen content of the copper seed layer and enhance its purity and conductivity, but at a minimum it will maintain the high chemical purity of the seed layer, which is very important for the IC device electrical characteristics.
A test was run to determine the physical change of a copper layer as a function of UV dose. The copper seed layer on silicon was scanned with increasing doses at a fixed intensity of ˜280 mJ/pulse and a fluence of 28 mJ/cm2. Both oxygen and nitrogen gas was used, and this did not seem to change the physical re-arrangement of the copper surface. The test run with oxygen did leave a visible oxide, while the one with nitrogen did not.
The control area had an RMS roughness of 1.103 nm and Rmax of 16.21. The first scan at 1 mm/second produced an RMS roughness of 2.068 and an Rmax of 21.15. The second test, using 2 passes with the same conditions, produced an RMS roughness of 3.317 and an Rmax of 50.801. The conclusion was that the UV energy may be used to physically alter the structure of a metal film by exposure to UV energy with the scanning plasma reactor.
The creation of a shallow but highly doped region of silicon is a common but critical step in the creation of modem IC chips. Control of the doping density and depth of the shallow junction is currently controlled by ion implantation followed by annealing for high quality circuits. The problem with ion implantation is that it generates significant and damaging heat to the bulk of the wafer, thereby requiring a separate annealing step to 'anneal out' the damage. It also converts photoresist layers which are typically present into disordered graphite, which can then only be removed by using a two step process: a microwave low temperature ashing to bum off the majority of the organic film, followed by a chemical step in a highly corrosive mixture of boiling sulfuric acid and hydrogen peroxide.
The scanning plasma reactor can be used to replace this process by simply depositing a thin layer of doped amorphous silicon on the surface of the silicon wafer, and then transform it into crystalline silicon with the pulsed UV bladed radiation of the reactor.
Since the amorphous silicon can be deposited very uniformly using methods developed for making amorphous silicon solar cells, its thickness and properties can be very highly controlled. Introduction of a dopant such as boron or phosphorus may be done at low or ambient temperatures.
Calculations based on the optical properties of amorphous silicon and crystalline silicon (see
Laser light at 193 nm and 248 nm wavelengths, directed through a gas mixture, and impinging on a wafer surface will result in deposition rates of ˜7 nm/second. The substrate temperature is in the range of 650-900� C., and epitaxy occurs largely by thermal mechanisms; the UV energy enhances the deposition rate and resulting film quality.
Additional advantages of UV/gas epitaxial film growth are that a highly uniform and very controllably doped silicon layer is created without significant thermal stress being applied to the remaining layers or materials on the wafer, and the process would involve much simpler and lower cost equipment than ion implantation equipment.
Deposited thin layers may have microscopic voids that are undesirable and could detract from good performance. For example, the tungsten barrier layer that is used in copper-metalized IC chips needs to be free of cracks and voids. Rapid heating of this metal layer with a UV pulse could improve film quality and reduce defects by providing instantaneous heat and expansion at the film surface sufficient to close the microscopic voids, and thereby densify the layer.
It is important for deposited layers to maintain excellent electrical contact with underlying layers for performance and reliability. Rapid heating of a layer, either on the surface or a layer below the top surface, with a UV pulse can be used to anneal out stresses and increase bonding by driving out residual moisture between dissimilar materials.
The removal of surface oxides, such as native oxides, prior to the deposition of new layers on IC wafers is a critical step in all manufacturing processes, usually done by running a multi-step process involving hydrofluoric acid, water rinses, alcohol rinses, nitrogen dry steps, all in a large and expensive 'wet' bench. This process requires significant wafer handling which adds defects to devices. A simpler way is to use the scanning plasma reactor; pulsed UV irradiation in a reducing atmosphere will accomplish this more rapidly, at lower cost, with one step and with a dry process that can be immediately followed by deposition in the same reactor chamber. The reaction is:
The scanning plasma reactor allows multi-process-step integration, so the wafer handling is greatly reduced.
A major step in the fabrication of IC devices is deposition of silicon dioxide, typically done in complex reactors with high temperature and pressure. UV pulsed irradiation from the scanning plasma reactor can be used to dissociate SiH4 and O2 molecules into radical atoms and molecules by the mechanism of multiphoton absorption. At 248 nm laser power levels of 3 mW (4�1016 photons) and 100 Hz repetition rate, the dissociated radicals reach the silicon wafer surface and react with adsorbed O2 and oxygen species on the Si surface, forming SiO2. The following are typical test conditions for deposition: substrate temperature of 175� C.; laser wavelength of 248 nm; laser power in the range of 0.5-1.8 Watts; laser repetition rate of 100 Hz; 20 Torr pressure; O2/SiH4 gas ratio of 6:1. The reaction will work over a fairly wide range of O2/SiH4 gas ratios, but ratios in the 7-20:1 range provide highest deposition rates. The minimum substrate temperature for rapid deposition ˜150� C. The deposition reaction occurs minimally at 100 Torr with a SiH4 gas flow rate of 30 sccm. Typical deposition rates are 200-300 angstroms/minute.
The scanning plasma reactor may be used in deep UV curing applications, where the surface of a photoresist layer is treated to a specific flux of UV photons, producing a cross-linking reaction that hardens the coating for subsequent processing, such as etching.
In practice, the photoresist coated wafer is processed through the reactor as it would be for any other application. The UV energy is set to a fluence in the range of about 20-75 mJ/cm2, depending on the specific photoresist that is being cured. Since this is primarily a UV polymerization reaction, the gas used may be an inert gas such as argon or nitrogen. The gas that is selected may be determined by the specific photoresist used.
Other embodiments are within the scope of the claims. For example, the UV radiation can be injected over a range of incident angles in order to create special effects or to cause reactions to occur inside the intricate topography of the semiconductor wafer or other topographically structured surface.
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|Method of fabrication of surface mountable integrated circuits
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|Oct 2, 1995
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|UV curing/drying apparatus with interlock
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|Method of in situ cleaning a vacuum plasma processing chamber
|Oct 11, 1996
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|Technique for improving within-wafer non-uniformity of material removal for performing CMP
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|Organic preclean for improving vapor phase wafer etch uniformity
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|Jan 23, 1996
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|Mattson Technology, Inc.
|Hydrocarbon-enhanced dry stripping of photoresist
|May 26, 1995
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|Mattson Technology, Inc.
|Thermal processing system with supplemental resistive heater and shielded optical pyrometry
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|Lam Research Corporation
|Chuck for substrate processing and method for depositing a film in a radio frequency biased plasma chemical depositing system
|Jul 9, 1996
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|Methods and apparatus for etching semiconductor wafers and layers thereof
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|Lam Research Corporation
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|Mar 31, 1997
|Mar 14, 2000
|Lam Research Corporation
|Method and apparatus for control of deposit build-up on an inner surface of a plasma processing chamber
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|Method of forming a smooth copper seed layer for a copper damascene structure
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|Title not available
|Title not available
|Title not available
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|U.S. Classification
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|International Classification
|Cooperative Classification
|European Classification
|Apr 9, 2001
Owner name: UVTECH SYSTEMS, INC., MASSACHUSETTS
Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:ELLIOTT, DAVID J.;HARTE, KENNETH J.;SHEPHARD, LARRY E.;REEL/FRAME:011690/0424
Effective date: 20010213
|Sep 21, 2001
Owner name: NOVELLUS SYSTEMS, INC., CALIFORNIA
Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNOR:UVTECH SYSTEMS, INC.;REEL/FRAME:012177/0558
Effective date: 20010914
|Sep 24, 2001
Owner name: UVTECH SYSTEMS INC., MASSACHUSETTS
Free format text: LICENSE;ASSIGNOR:NOVELLUS SYSTEMS, INC.;REEL/FRAME:012188/0117
Effective date: 20010914
|Mar 18, 2011
|Fee payment
Year of fee payment: 4
|Mar 18, 2015
|Fee payment
Year of fee payment: 8


text:
AOL reported higher-than-expected revenue and profit on the strongest advertising growth the company has seen in seven years.
AOL said on Tuesday that third-quarter revenue was flat at $531.7 million, ahead of the analysts' average estimate of $521.6 million, according to Thomson Reuters. Advertising revenue rose 7 percent to $340 million, while subscription revenue for AOL's dial-up services fell 10 percent to $173.5 million. Subscription revenue had its lowest rate of decline in six years.
These trends are helping AOL since its turnaround hinges on the success of getting more online advertising dollars and reducing its reliance on the lucrative but moribund dial-up business.
"Things look great," RBC Capital Markets analyst Andre Sequin said. "This company is continuing to make steps in the right direction."
Still, there are troubling signs in the results. Domestic display advertising, where AOL is making a big effort, including with splashy acquisitions such as the Huffington Post, fell 3 percent in the quarter. That compares with the overall U.S. display ad market estimated to grow more than 20 percent to $14.98 billion, according to research firm eMarketer.
AOL's advertising revenue was lifted by search revenue and double-digit growth in third-party network revenue. Display ads are big, pricey units on Web pages favored by brand advertisers. Third-party network consists of AOL's Ad.com, which helps sell ads across other properties. These types of ads usually command lower prices than display-ad units.
"We weren't exactly 100 percent drilled and focused on the advertising strategy the first half of the year. But we are now," AOL CEO Tim Armstrong said on a call with analysts. "I think overall, what you're going to see is an operational improvement around advertising as we get into 2013."
The company, however, has taken a number of steps over the year, including selling some of its patents to Microsoft for $1 billion and returning those proceeds to shareholders.
Net income was $20.8 million, or 22 cents per share, compared with a year-earlier loss of $2.6 million, or 2 cents per share. AOL's third-quarter EPS of 22 cents was well ahead of analysts' forecast of 17 cents. The company raised its estimate for 2012 adjusted OIBDA to about $400 million from $375 million.

subset: commoncrawl


text:
Help bring military service dogs home to retire.
Now they are categorized as civilians in military shelters and non-profits must get them adopted & bear the costs
Now they are categorized as civilians in military shelters and non-profits must get them adopted & bear the costs
America's Military Has Kept Americans Free To Make This The Best Country In World History
Stop American Political Abuse Of Power -Their own special 'Brotherhood'This is just one example, but Justice should
Help Stop the 'Stigma of PTSD'. Veteran Suicide Rate At 22 Each Day Stop the mocking, jokes and harassing of PTSD;
These brave and honorable patriots deserve their "Welcome Home" and "Thank You" parade and more...This campaign is at
The Vietnam memorial in Coos Bay is part of history. With a cross on it or not, it represents ALL Vietnam Veterans from
Demand NBC and Reporter Ayman Mohyeldin apologize for smearing Chris Kyle as a "racist" who went on "killing sprees."
Stop the government takeover of the Internet
The Vet Hunters Project effort to help Chris "Guardian of Marines" Kyle Navy Seal obtain our nations highest honor
Call on Congress to end any discussion of a gas tax hike and to immediately begin reforming the Highway Trust Fund.
Remove Pages from Facebook threating the lives of our Men & Woman in Blue
It helps ensure the practice of our Second Amendment Rights as Granted by our Constitution.
22 veterans a day die by suicide. But the data also says that getting help, helps.
We must keep the promise we made to veterans who have served and sacrificed to defend our nation.
They all stood up and gave all the could...they did not fall in another country but they still died for their country. I
Sign the petition to allow families and friends of the fallen to grieve in peace without unnecessary suffering.
Because we should all support our countrys armed forces as they are the ones putting their lives on the line.
Save our Flag from beig removed from Schools and National Places ! 1. Admin. Debra Robinson./ Creator 2. Should the


text:
SOCIAL REINTEGRATION SWG. Is just more than the economic empowerment of the affected women or survivors. LIST OF MEMBERS:. C. Mulindwa-Matovu-Women's Dignity Alice Emasu Seruyange-TERREOWODE-UGANDA Lulleged Beyere HHOJ Francine Egbert-consultant UNFPA Leigh Boyle –HHOJ ETHIOPIA
Download Policy: Content on the Website is provided to you AS IS for your information and personal use and may not be sold / licensed / shared on other websites without getting consent from its author.While downloading, if for some reason you are not able to download a presentation, the publisher may have deleted the file from their server.
Is just more than the economic empowerment of the affected women or survivors
Few members of the group had previously been involved in the group: 3 out of 13. However Ascertained that :
Members felt prior planning was needed to respond to this question but based on WD-Tanzania ,TERREWODE's-Uganda & Fistula Foundations-Nigeria experiences shared, identified the following;
Identify what members wish to come out of the group:
Should be separate, but with membership from other SWG Can not fully develop terms for a different group:


text:
Single Player, Xbox LIVE Multiplayer 2-5, Local Multiplayer 1-4, HD (High Definition). Buy Carcassonne today and become a master of medieval strategy. Own a fully featured version of the board game classic and fulfill the need for challenge any time you want, or play socially, with up to five players on Xbox LIVE, or up to four players on just one Xbox 360. Multiple levels of difficulty offer a challenging experience for players of all ages and levels of experience. There are no refunds for this item. For more information, see www.xbox.com/Live/accounts.
Koop Xbox-content op Xbox.com. Je Xbox 360-console zal de content automatisch downloaden wanneer je de console de volgende keer inschakelt en verbinding maakt met Xbox Live.Meer informatie


text:
Peep Show
Updated: July 9, 2003, 11:29 AM ETBy By Terry Brown | NBA Insider
Sacramento Kings: Notes and statements made by Michigan booster Ed Martin have been ruled inadmissable by a federal judge in the perjury case against Chris Webber. "We are always happy to win any motion that we file," Webber's lawyer, Steve Fishman, said in the N.Y. Times. But Webber's side remained cautious. "The case remains largely a mystery," Mayce Webber's lawyer, Robert Morgan, also told the N.Y. Times. The barred evidence is said to include a record of loans given to other Michigan players and a conversation between Martin and a friend stating the Webber was one of those players who owed him money. "Nothing unexpected happened today," U.S. assistant attorney Keith Corbett said. "I don't think we're any worse off than I anticipated being."
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- Haberstroh: NBA's best duo?
- Ford/Pelton: Is Russell a future Lakers star?
- Pelton: Curry a unanimous MVP?
- 5-on-5: Celtics boast best second-half upside
- Ford: Ben Simmons or Brandon Ingram?


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It has been a long time since I last posted a blog post. The reason for this is that autumn is always the most busy time for me and my bussiness. In automn I try to produce weekly YouTube videos and at the same time I develop a new Android game. Developing Android games is my "day job" so I dedicate most of my time to Android developement. So, I dedicated this autumn in developing Eureka 2017 Quiz Game. It is completely free and you can download it from Google Play Store by clicking here.
Eureka 2017 is ready
After 5 months of developement, at last, my new Android Game is ready. It is called Eureka 2017 and it is a quiz game with thousands of multiple choice questions divided into 16 categories. The game currently supports 6 languages, English, Greek, German, French, Spanish and Indonesian but more languages will be supported in the future as I work more on the game.
The game offers a Leaderboard where you can compare your score with the scores of people from all over the world. It also offers 57 achievements to unlock as you progress through the game. The large amount of questions and the achievement will keep you busy for a long time. If you answer 50% of the questions in the game correctly, you will unlock the "Arhimedes" achievement, which means that you know a lot about the world around us. The "Archimedes" achievement is the most difficult achievement of the game. Can you unlock it?
If you enjoy Quiz Games and learning new stuff I think you will enjoy Eureka 2017. If you download it, I would love to hear your opinion about it. Is there any way to improve it, or are there any features you want me to implement? Thanks!


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Armando PEREZ will head the AFA until the next elections.
FIFA have elected Cordoba's Belgrano president Armando Perez as the head of the AFA until elections are held in the federation. PEREZ has already stated that he will speak to Carlos BILARDO, Alfio BASILE and Cesar Luis MENOTTI. According to PEREZ, "We have the obligation to listen to them".
Regarding a new coach, PEREZ said he doesn't have "a preference regarding the coach of the National Team but it should be an election done quickly."
About the youth teams: "The results show that we have to change some things in youth football."
Related Posts
14 Comments
The Rio Olympics is on the horizon, and Daniel Fraiz-Martinez has put together a who's who look at Argentina's 18 man primary squad going for gold with Jorge Olarticoechea at the helm of the Albiceleste.
Good descriptions. Still some questions mark. If Olarticoechea attacking trio is Correa, Calleri, Lanzini where is place Espinoza who is suggested to be a starter. Or Simeone who is No. 11 (starter?). And who as a partner for Ascacibar? I thought Martinez but ROmero has No.5.
I think:
I don't think authors prediction about starters are 100% right.
Martinez I believe will be Asca's partner and also should be.That guy is underrated for sure,good both in defence and attack,not to mention physically fine.And Lo Celso might be the playmaker,team has none other than him.Actually team is still strong even without star players,may be lack the bench power.
Yup, I wrote long time ago about Martinez here. Still reminds me a bit Enzo Perez when attacking, running. As Enzo he isn't perfect in defence but his phisical strength makes him decent in this point. First of all he is DM who may add some part in attack.
Ascacibar is describing as new Masche, Gattuso, typical No.5, but he really has pace and stamina to running almost like Zanetti.
Yes, I see Lo Celso as starter on credit. Despite his obvious talent still take the guy 'cum grano salis' but I don't see another playmaker.
Put Marinez next to Ascacibar and Lo Celso in the middle. May be you can switch the positions of Lanzini and Correa too.
Another chance to get Maradona, the master of the 86 generation:
That will be a disaster!
As I had expected , the NC will be fast moving ahead to resolve the DT issue first. With Bielsa currently in Argentina and jobless and Sampaoli/Simeone / Gallardo busy in the transfer market to bolster their respective teams, all indications are that Bielsa will be our next DT.
Now, the most important thing, he says in light of the recent results there is a need of change in the coaching the youth. Is he pointing to the loss of consecutive finals and thereby the psychological preparedness and mental training of the players? If yes, then it's going to be a turning point in the history of Argentine football. They never stress on systematic psychological training of the players… The way the Germans and the Italians have been doing for years now… This will indeed be the biggest step for the new FA and its custodians.
2016 is one of the worst years… whom are they going to name?
Menotti – maybe; Bilardo – possibly; Basile – not so sure about that one 🙂
Basile will give a entertaining speech.Refreshment after recent disasters.
at least some thing is happening…I guess…
"We have the obligation to listen to them"
yes but the real test is actually doing more then just paying "lip service" to them.
Atleast he is saying something positive.
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The annual Coxsackie Riverside Festival (PDF) takes over the riverfront on Saturday with a whole lot of music, kids activities, strolling mime and juggler, arts and crafts vendors, karaoke, martial arts demonstrations, family-friendly fun, storytellers, food vendors and, oh yes, a beer truck, too.
The fest kicks off at 11am and runs non-stop til 9pm.
Featured performers include:
Chrissy Budzinski
Dusk Til Dawn
Peaceful Country
Andy the Music Man
For God & Country Gospel Show
Farrell School of Irish Dance
Bad Horse
John Pinder & Bent Rail Blues
Phil Massaro & Mirage
Admission is just $2. And it's all capped off with fireworks at the end of the fest.
Hudson Music Festival @ various locations, Hudson, August 12-14, mostly FREE
Royal Family Affair @ Stratton Mountain, Vermont, August 12-14
Blues, Brews & BBQ @ American Glory BBQ, Hudson, August 13, FREE
Fam Jam Festival @ Lee's Park, Saratoga Lake, August 13
Bluestock Music Festival @ Hunter Mountain, Hunter, August 26-28
Albany Riverfront Jazz Festival @ Corning Preserve's Riverfront Park, Albany, September 10, FREE
LarkFest @ Lark Street, Albany, September 17, FREE
Jazz at the Lake: Lake George Jazz Weekend @ Shepard Park, Lake George, September 17-18, FREE
Hippiefest @ the Palace Theatre, Albany, October 13


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The 21st match of the ongoing 2014 FIFA World Cup will have Colombia facing Ivory Coast scheduled on the 19th day of June at Estadio Nacional located in Brasilia. The match will kickoff at exactly GMT -3 Brazilian time.
This group C match will be an interesting one since both the two teams will be fighting to secure a chance in the next level of the summer tournament. The African giant, Ivory Coast, will have to do their best so as to make their stay in the tournament long lived.
They will therefore maximize on any opportunity that will be in place. Colombia on the other hand will note lag behind, they will showcase the best of their skills as far as world cup is concerned.
Match Details:-
- Colombia vs Ivory Coast Live Stream
- Group C, 2014 FIFA World Cup
- Kick Off: 12.00 pm ET
- Venue: Estádio Nacional de Brasilia
- Top Channels: ESPN, Sony Six HD, Azteca Deportes En Vivo etc
Colombia vs Ivory Coast: Group C Match Preview
When Colombia faced Greece in their opening match, it secured victory. It is quite evident that their morale has received a major boosting as they prepare for the other matches ahead. To be sure of making it to the round 16, Colombia have to win this match. From history, 1990 is the last time Colombia made it past the group stages.
Colombia have to break their own history through winning this match against African giants. Jose Pekerman who is the manager of Colombia has got much confidence in his squad. He is optimistic that his men will absolutely work their best during the match ahead of them.
During the last match, all that was under plans worked out perfectly. It is therefore with great hopes that Colombia will keep on winning even though it will not be an easy task.
Ivory Coast on the other hand will also be coming to this match with three points in store, they won them during their clash with Japan in the opening match. Within the first 99 seconds, Ivory Coast netted twice placing their bar much higher than their counterparts.
Sabri Lamouchi who is the manager of Ivory Coast want to keep the performance of the team consistent all through. Ivory Coast will be hoping to get the other 3 points in the upcoming match.
The team has got quality players who are reliable as far as winning the 19th June match is concerned. Ivory Coast will all have had a boosted morale as they face the South American team.
Colombia vs Ivory Coast: Best Players Of The Match
Colombia is a team that will depend on the skills and efforts of Pablo Armero, Teofilo Gutlerrez and James Rodriguez. The trio players will make a perfect combination as far as Colombia want to win their second match. The boss of Colombia have much confident in the above players who will play an important role in the match.
Ivory Coast, the African based team will have to depend more on Didier Drogba, Wilfred Bony and Serge Aurier. The three player were a center of attention during Ivory Coast's opening match against Japan.
They played very impressive football hence are scheduled to shine even more. They will be used as the greatest weapon against Colombia in the upcoming match.
Colombia vs Ivory Coast: Head-to-Head
From the books of records, the two teams, Ivory Coast and Colombia, have never faced each other before. This is going to be their first match against each other.
Ivory Coast vs Colombia: Match Forecast
Ivory Coast with much vigor and strength they possess will make it a hard time for their counterparts, Colombia. Colombia however is a team that can pull greater surprises. AT the 90th minute, the score line will be 2-1 in favor of Colombia.


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As antiviral drugs have been produced (acyclovir, valacyclovir and famcyclovir, gancyclovir), new possibilities for post-exposure chemoprophylaxis exist [4]. According to current knowledge, long-tailed macaques (cynomolgus, M. Proc. In the initial infection, the incubation period ranges from 2-12 days. Additional contraindications that apply only to vaccination candidates but do not include their close contacts are persons with smallpox vaccine-component allergies, women who are breastfeeding, those taking topical ocular steroid medications, those with moderate-to-severe intercurrent illness, and persons aged 37.7ºC or 100ºF (10%). In this study, we tested the CPV susceptibility of CMV recombinant strains containing pol mutations selected after exposure to current antivirals and examined the UL97 and pol sequences of an error-prone exonuclease mutant (3) after serial propagation under CPV to study the relative frequency and phenotype of pol mutations selected. A psoralen-derivative of d(TpTCCTCCTGCGG) that binds covalently to complementary sequences after exposure to 365 nm irradiation, inhibited HSV-1 growth (86-91%) at a 10-fold lower concentration than the non-derivatized oligomer.
According to current knowledge, long-tailed macaques (cynomolgus, M. Copyright © 2010 by The American Association of Immunologists, Inc. Consequently the majority of donors and recipients have latent CMV infection at the time of transplant (8). Natural killer (NK) cells, which constitute an important cellular component of the innate immune system, play an important role in controlling these infections (6, 14–16, 60, 66). [72] Copathogens, including HHV-6 or HHV-7 viruses and P jiroveci, may lead to complicated severe disease patterns. IFNs suppress the proliferation of many normal and transformed cells through prolongation of the G1 phase of the cell cycle and reduce the rate of entry into the S phase, as well as inducing apoptosis (7). Cortical signs, such as aphasia, apraxia, seizures, or extrapyramidal signs (chorea or rigidity), are observed more rarely.
He was also informed that diligent sunscreen application may help reduce development of HSL lesions.3 To avoid transmission, the patient was advised to avoid kissing and sharing kitchen/bathroom utensils during outbreaks. The global spread of HIV-1 began in the late 1970s, and AIDS was first recognized in 1981. Trade names for aciclovir sodium include Acic, Aciclovir Alonga, Aciclovir-Austropharm, Aciclovir Biochemie, Aciclovir Brahms i.v., Aciclovir Ebewe, Aciclovir Filaxis, Aciclovir Genthon, Aciclovir Intravenous Infusion BP 1998, Aciclovir-ratiopharm p.i., Aciclovir-Sanorania, Aciclovir Tyrol Pharma, Acivir, Acyclovir Alpharma, Cicloviral i.v., Cusiviral, Geavir, Herpesin, Herpotern, Heviran, Mapox, Maynar, Nycovir, Supraviran, Supraviran i.v., Virherpes, Virmen, Virolex, Zovir, Zovirax, Zovirax for Injection and Zyclir (Royal Pharmaceutical Society of Great Britain, 1999; Swiss Pharmaceutical Society, 1999). Further, I discuss how understanding the innate and adaptive immune mechanisms of protection in the genital mucosa could be applied for rational design of vaccines against STIs. In 2000, >8 million inmates of prisons and jails were released and returned to the community (A. Certain PEP drugs can be taken during pregnancy. B, Retinal appearance after …
Virus spread to the central nervous system is an ominous sign, since, even with antiviral therapy and supportive care, most patients die. In this study, we tested the CPV susceptibility of CMV recombinant strains containing pol mutations selected after exposure to current antivirals and examined the UL97 and pol sequences of an error-prone exonuclease mutant (3) after serial propagation under CPV to study the relative frequency and phenotype of pol mutations selected. These findings support the need for large, well-designed studies to assess the safety and effectiveness of these medications during pregnancy. Immediate diagnosis and treatment with antiviral drugs has saved lives. Hull is assistant professor of dermatology at the University of Utah Health Care in Salt Lake City. However, limitations to this approach include the feasibility of collecting multiple biopsies and need to standardize the number and activation status of immune cell populations between samples, which could impact susceptibility of the tissue to HIV infection. There were no significant differences in concentrations of immune mediators or total protein recovered from CVL following oral product compared to baseline (Table 3).
The natural history of herpes labialis in immunocompetent persons imposes limitations on what can be accomplished by acute therapeutic intervention in an evolving recurrent episode. Although the virus is not highly communicable, it can be spread from person to person by direct contact. This article is distributed under the terms of an Attribution–Noncommercial–Share Alike–No Mirror Sites license for the first six months after the publication date (see http://www.rupress.org/terms). The host has multiple immune defense functions that can eliminate virus and/or viral disease. Postexposure prophylaxis has been demonstrated to be effective in an animal model and is likely effective in humans exposed to the virus. However, the specific cellular targets of stress/glucocorticoids, the timing of exposure, the chronology of immunological events, and the underlying mechanisms of this impairment are incompletely understood. These guidelines, produced by the Public Health Laboratory Service (PHLS) aim to help decision making in the investigation and management of pregnant women who have 'a rash compatible with a systemic viral illness', or who have contact with a person with such an illness.


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Prerogatives Sterling Cubic Zirconia Flower Bead
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- Sterling silver
- Flower design; cubic zirconia
- Bead fits most add-a-bead bracelets
- Measures approximately 3/8"L x 1/4"W
- Pouch, romance card
- Made in Thailand
The Prerogatives Story
Life is strung together by moments that define us. With each unique bead you add to your Prerogatives jewelry, you celebrate a time of laughter or learning. You celebrate those challenges that gave you a voice or the moments that took your breath away. This special collection represents not only your distinctive style, but the stories behind it. Truly, these are your Prerogatives.
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We have 16 Hotels throughout the UK with over 600 rooms available on a daily basis.
All of our Hotels offer the same great quality standard you would expect from a leading Hotel brand.
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18 - DOUBLE ROOMS with single sofa
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These spacious rooms are ideal for families to spread out and relax. Enjoy a great night's sleep on our deluxe double bed or the versatile sofa bed. Many of our family rooms offer two twin beds in a separate annex to the main room. Please enquire when booking. All of our rooms come with free Wi-Fi, flat screen TV and complimentary tea and coffee.
These spacious rooms are ideal for single travellers or couples looking for a comfortable place to relax and unwind. Enjoy a great night's sleep on a comfortable double bed and help yourself to the complimentary tea and coffee.
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"My friend Tom Hoefling is a man of principles and character. I believe he is the kind of man our founders had in mind when they established the Presidency and executive branch of the federal government. He is a citizen volunteer. He handles his own home rightly. He has demonstrated leadership ability. He would served honorably and the return to his life at home, just like Washington, Adams, Jefferson, etc."
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Tom Hoefling on Government:
"Just as 'good fences make for good neighbors,' good government is mainly about knowing where the legitimate boundaries are, and having the courage to defend those borders forcefully. This is true in terms of the defense of our territory, our security, and our national sovereignty, but it also applies to the sworn duty of all of those in government to equally protect the God-given, unalienable rights of each individual person, from their creation onward, their sacred obligation to stay well within the enumerated powers of our constitutions, and of the role legitimate government must play in balancing the competing rights and interests of the people, in order to establish justice."


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Car users are sitting on more advanced features than ever before, but increasing demands for "comfort" and other considerations have focused industry brainpower on slimmer seat designs, new trim materials, and innovative technology solutions.
Electronics innovations are behind many of the advances in hybrid, diesel, and conventional gasoline engines.
For many new vehicles, light weight is paramount, and so too is eye-catching design. That's why plastic body panels will become more prevalent.
The company's powertrain strategy follows Toyota President Watanabe's dream that a Toyota car be able to cross the American continent with no refueling while cleansing the atmosphere as it travels.
In the pipeline are a "dedicated hybrid car for family use," a super-clean diesel that meets U.S. Tier 2 BIN 5 standards, and updates to more conventional engines to reduce corporate fleet CO2 averages.
Assembly plants are easy targets for criticism, but not always the right ones.


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Construction Businesses For Sale in Burlington IA
Searched the DealStream database for Construction Businesses For Sale in Burlington IA and found no matches. Expanded the search to nearby areas and found the following matches.
125+ Years Rutledge Nursery & Landscaping #480635 posted Dec 6, 2017
- Alpha, Illinois, United States
- $300,000
Very rare and unique opportunity. 3rd generation owner operator is parting with this century plus old business to enjoy his central Florida golf game more, he's only 91. Beautiful facility, half of which not planted, but available. Rutledge Nursery & Landscaping is a landscape contractor with a large...
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We RARELY go to the movies, but I've actually been to the movies two weekends in a row here recently.
First it was The Hobbit with Adam:
If you love The Lord of the Rings trilogy (which I do), then you'll love The Hobbit. It's a little more lighthearted than The Lord of the Rings. Definitely recommend it.
Next was Les Miserables with my friend Amanda:
Oh.My.Goodness!!! SO good! I had never seen the musical or any of the old movies, so I had no idea what the storyline was. My friend Val recommended reading up on the story before hand, which I did, and that was very helpful.
I must say I enjoyed every single minute of it. I HIGHLY recommend this one, and definitely worth seeing it on the big screen instead of at home. Heck, I'd go see it again. Anyone need a movie date?
Not necessarily a movie, but last weekend Adam and I started the Showtime series Homeland:
We got the first of four disks in the mail from Netflix, and it contained three episodes. Let's just say Adam and I watch all three episodes back-to-back on Friday night. It sucked us right in. I'm officially hooked!
Seen any movies lately that would merit another trip to the movies? I love a good reason to eat buttery popcorn!


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I would like to first off think Saundra for her utmost trust and love that she provided me with to create these two mixes. This was the 1st time I really branched out and tried to do something a little abnormal from my comfort zone. It was a ameliorating experience for my life. I've always really wanted someone to come to me with a serious idea for a mix that means something to them. That's what happened when Saundra reached out. We chopped it up at a mutual friend's birthday event and from there our creative elements got to meet to create these beautiful mixes. It was a real transparent experience I've manage to have with someone and it wasn't as bad as I felt like it would be originally. I'm finding comfort in who I am as a person and I don't mind being available and open for people. I've been working on my consciousness and the things I put into my mind and life. Saundra really helped me sort out these things and put my perspective in a direction worth focusing. To me, these were more than a mix.
I grew up very introverted as a child so it keeps me from exploring certain aspects of life that I wouldn't do naturally. My current journey in life is to try to escape from the subconscious mentalities I've created while in this time and really experience life outside of my norm. I don't like the place I've come to from my thoughts in solitude, therefore breaking my consciousness is a necessity. What was supposed to be just a joining of creatives ended up becoming an awakening of minds. We really got a chance to explore each other in ideas and concepts that we both could speak on with insight and imagination and really be who we are as people. I believe those experiences are necessary in order for you to become who you are. There we've entitled these mixes "Thoughts Create Your Experiences" and "Experience Your Created Thoughts". Hope you enjoy.


text: House committee advances the school bus seat belt bill. Rep. King introduces a sex ed bill. Daily Herald profiles new Utah State Board of Education Member Scott Neilson. Sen. Franken says Betsy DeVos will not get any Democratic votes for confirmation as Education Secretary. All that and more in today's Education News Roundup. . . . → Read More


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Incredibly stormy weather over the previous days (yes, it does rain from time to time) certainly increased
the tension and excitement in Fethiye, as the town waited on tenterhooks for the climax to the 15th Ölüdeniz Air Games.
Rain, rain, go away!
People looked at the gathering clouds and despaired… would it or wouldn't it happen?
Ace pilots
Everyone was waiting for the Turkish Stars. They are Turkey's crack team of aerobatic pilots,
who fly at breathtaking speed in their red and white jets.
Four jets (see headline photograph) had already tested out the area at noon on the Thursday but bad weather had
prevented the Turkish Stars from putting on their full show later in the day.
The main event by the Türk Yıldızları (Turkish Stars) was scheduled for the afternoon of Saturday 25th October.
Would the Turkish Stars fly?
Studying meteorological websites and weather forecasts, it became less and less likely
that the weather would improve sufficiently for Saturday's display.
But Fethiye's weather can always produce surprises, and this was no exception.
Finally, after thunderstorms, rain, wind and low clouds for the previous 48 hours…
the storm clouds cleared just enough…
Crowds began to gather on the beach in Koca Çalış…
First there was an official Turkish Stars shop selling merchandise,
which was particularly popular with children and baseball cap aficionados…
Then there were two motorized paragliders, who flew past bearing enormous Turkish flags…
And finally, what everyone had been waiting for…
The Turkish Stars arrived!
For more than 30 minutes the Turkish Stars soared, wheeled, spun and zoomed above Çalış, Fethiye, the gulf and islands,
performing some incredible feats of aeronautic ability.
It was an awesome spectacle for Fethiye too…
It wasn't quite the same, as the symmetry and focus of the display was designed to be seen from Koca Çalış beach.
Nonetheless it was incredible.
A magical day
Finally, as the incredible Turkish Stars headed off towards the setting sun, a rainbow appeared over the town; marking a magical end to a wonderful afternoon.
The FT team thanks everyone involved in making this a truly awesome day for Çalış and Fethiye.
Many thanks also too Si Cunneen and Sarah Akkaya for letting FT use their brilliant photographs.


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How can these commonly stolen car items -- headlights, airbags, & wheels -- be better protected?
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As is so often the case in law, punishments for theft do not prevent the actual thefts very much; however, potential penalties for purchasing stolen items might intimidate a higher class of customer (there is a parallel in the prostitution problem). Any item that can be detached and stolen must be resold, always by cash, and always by disreputable outlets. Since airbags are difficult to reinstall, and because most new cars come with airbags already, they are usually not resold "on the street," but must be sold to someone who will resell them and install them; so that is where detection and enforcement must begin. Actually, the ingredients of the airbag—gases, electronic sensors, etc.—are probably more valuable than the airbag itself. As for wheels, etc., possession is ownership, and the automobile owner cannot hope to claim otherwise. Registry, tracking devices, and other such "paper trails" are economically infeasible—we would have to have four registration numbers for every wheel or tire on every car, two numbers for headlights, etc. Perhaps some sort of replacement insurance would bring the insurance industry into the problem. Another approach might be to complicate the removal mechanisms (special bolts, special tool needed, etc.) Warnings to the general public about purchasing only from reputable dealers might help, and the threat of dis-licensing to them would make them shy away from the practice. Reputable dealers could throw the packaging into the trunk (as mechanics throw in replaced parts of an engine to prove they actually were replaced) to prove legitimate product purchase.


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SCOTLAND will travel to Twickenham on Saturday to face England in the Six Nations on the back of a rotten run of form.
Not only have they failed to register a win in the tournament so far — Vern Cotter's side has lost to France, Wales and Italy — but they have not won a match against England at Twickenham since 1983, where they won 22-12 in the Five Nations.
So, the last time the Scots beat the English on their own turf, M*A*S*H had just ended, the compact disc had gone on sale in Britain, and the use of seatbelts became a legal requirement. Meanwhile, in Scotland, in the same year...
• Aberdeen beat Real Madrid 2-1 in the European Cup Winner's Cup final after extra-time at the end of the 1982/83 season — they are, to date, the last Scottish team to have won a major European honour, claiming the European Super Cup in the same year, beating Hamburg 2-0 over two legs.
• Killer, a pilot for a Glasgow-set police show screened by ITV and produced by Scottish Television, was screened. Plot twist: when the pilot was deemed a success, it was later called Taggart. The show was finally axed in 2011, but not before more than 100 episodes were broadcast.
• Local Hero, one of Scottish cinema's most well-loved films, was given its big screen debut. Director Bill Forsyth's tale sees an American oil exec visit the fictional Scottish town of Ferness to buy it up on behalf of his firm — only to realise that he quite likes it there.
• Some legendary — though musically disparate — bands formed in Scotland in 1983. Del Amitri came together in Glasgow two years before their self-titled debut album via approval by John Peel; The Jesus and Mary Chain took the same amount of time to release the portentiously-titled Psychocandy in 1985, two years before they began playing (and fighting) on stage; The Proclaimers, an altogether gentler duo, were barely in their twenties when they first forged ahead with their sweet, folky anthems.
C'mon Scotland, get it together.
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text: Well, the building of a real rocket ship would take quite a bit of money and then there's all the permits. So, let's try out a cardboard rocket ship first! You can get it done by using a large box, some spray paint, tape and something to cut with. You can find more information here:


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richard & ashley wedding photobooth!
We celebrated the wedding of Richard & Ashley tonight, a cute couple who now share the same wedding anniversary as us! Here are some of our favorites from the night, with the rest coming in a few days! If you like the Facebook album, you'll be notified when all of the shots are ready for downloading!
Congrats again to Richard & Ashley!
Update: the full album of shots are ready for viewing! Richard & Ashley wedding photobooth album! (note: the password is Richard's last name!)


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easter 2014
Holy Saturday 2014
Jesus is in the grave. Crucified yesterday, he lies wrapped in ribbons of burial cloth, awaiting tomorrow's resurrection. Such is the teaching of the Church, which we recite every Sunday:
For us men and for our salvation
he came down from heaven,
and by the Holy Spirit was incarnate of the Virgin Mary,
and became man.
For our sake he was crucified under Pontius Pilate,
he suffered death and was buried,
and rose again on the third day
in accordance with the Scriptures.
He ascended into heaven
and is seated at the right hand of the Father.
And so he is buried.
The Polish tradition — and the tradition of other cultures, I'm sure — is to create a tomb for Jesus's body in the church. One of the figures is taken from the cross and laid in the tomb, and parishioners — usually firemen — stand watch until Sunday morning.
One of the vicars in our parish is Polish — this year, he decided, with the pastor's blessing, to bring the tradition of Jesus's tomb to the parish of St. Mary Magdalene. And so the Paschal Triduum feels a little more like we're in Poland every year.
Past years involved the pastor, who had never performed the traditional Holy Saturday basket blessing, coming for a quick prayer of the baskets of perhaps fifteen Polish families. Our pastor, however, has fallen in love with the tradition, has it announced several times before Holy Saturday, and has put it on the altar servers' schedule so that we have a full procession.
The number attending has grown as well. After an opening prayer in Polish, Father W asked, "How many of you don't speak Polish?" At least a third of the assembled raised their hands. Seeing so many, Father W, like last year, turned it into a primarily-Polish-but-quite-bilingual-blessing-nonetheless.
There are some things still missing, though. No crucifix lay at the front of the grave, with parishioners standing in a line, dropping to their knees at the fourth or fifth pew and continuing the rest of the way on their knees, all bending to kiss various parts of the crucifix. Blocks of wood have not replaced bells during the Lenten Mass. The day was not preceded with a Good Friday of manic baking and cleaning, just baking and cleaning. More reminders that the Polish community here is a distinct minority, a group that has largely assimilated into mainstream culture but still managed to keep the most important of traditions. In other words, it didn't feel Polish; it felt American-Polish.
And then there are the things that would never occur in Poland: the fascination with the custom (after all, custom often becomes merely customary), the eagerness for photos of the regionally dressed (after all, if you see it almost every day in one form or another — especially when you live near a tourist region — it's nothing special, merely every day)
But when it's something you see once a year? Well, who can blame us all?


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All Italian final attracts novelty interest
Paolo Maldini, the captain of AC Milan, is 50-1 to score an own goal in Wednesday night's European Cup final against Juventus. That is just one of the novelty bets offered by Paddy Power, which is celebrating the Italian showdown with a range of wagers.
David Trezeguet is 3-1 to score more goals than Filippo Inzaghi, with the latter offered at the same price to score more than Trezeguet. Both players must start for the bet to stand. They are 6-1 to both find the back of the net.
Del Piero is 6-1 to score two or more goals and 8-1 to score direct from a free kick - excluding a penalty. Any Milan player to score direct from a free kick is chalked up at…


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Watch the Full Length Video
Blond cutie Donny is back after a bit of an absence, and boy have we missed him and his huge cock!
Joey was lucky enough to get paired with him and was really excited to get that long rod inside of him.
Watch All of Sean Cody Videos


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Situated in rural Kent, the YHA Medway is opposite Capstone Country Park. With a restaurant, this traditional oast house is also just 10 minutes' drive from the Chatham Historic Dockyard Trust Museum. The hostel offers both private rooms and dormitory rooms. Each room benefits from shared bathroom facilities. Guests are welcome to relax in the communal lounge and make use of the self-catering kitchen. Ideal for outdoor pursuits, the YHA is just a few miles from both walking routes of North Downs Way and Sustrans Route 1. The Chatham Ski and Snowboard Centre is only a 5-minute walk away. YHA Medway guests can visit Charles Dicken's former home, at Eastgate House in Rochester. The historic Leeds Castle is just 12 miles away.
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Cameras intended to be permanently mounted inside a car and used to record evidence of crashes aren't exactly common, at least as far as we're aware, so it comes as something of a surprise to find the Dash Cam Dually described as "the final answer to all car cameras". Ridiculous name aside, the DCD has two 1.3-megapixel cameras and is packed with GPS, a digital compass and a shock-sensor, and automatically records what's going on inside and outside the vehicle in the case of a collision.
There are also four infrared LEDs used to illuminate nighttime scenes, and everything is recorded to an SD card complete with time/date logs, speed, location and other details.
Included viewing software shows both camera angles at once, plus automatically pulls up a Google Maps location for any point during playback. A 2GB card is included, but if you have enough storage you can set it to continuously save video; they say that's handy to monitor teenage drivers or employees.
Of course, there's always a downside to any gadget, and here it's the crazy-high pricing. The Dash Cam Dually is priced at $385, which seems madly high frankly.
[via Red Ferret Journal]