text:
livescience.com "Why Religion Makes People Happier (Hint: Not God)"
*Religious people are more satisfied with their lives than nonbelievers.
*It's not the relationship with god that makes them happy.
*The satisfaction boost may come from closer ties to earthly neighbors.
"According to a study published today (Dec. 7) in the journal American Sociological Review, religious people gain life satisfaction thanks to social networks they build by attending religious services. The results apply to Catholics and mainline and evangelical Protestants."
""We show that [life satisfaction] is almost entirely about the social aspect of religion, rather than the theological or spiritual aspect of religion," Lim told LiveScience. "We found that people are more satisfied with their lives when they go to church, because they build a social network within their congregation."
The linked article is short and readable. I like livescience.com and read their articles frequently. They discuss scientific research in an accessible way.
I think this article hints at why I like Atheist Nexus: even though it's remote and virtual, I have a network of friends here who have mutual interests. It makes life a little better. It's also why I promote our local meetup. Not out of some theory that it will make life more satisfying, but because I've made friends who I admire and who think a lot of me, and because I really enjoy the time we spend together. I can be myself, open and relaxed about it, and I suspect the same is true for others who attend. Currently we meet at a "Church of Pizza" so to speak. It's great.
Other groups have come together at least partly because of Atheist Nexus as well. There have been some local groups, and the Black Freethought group met last year. I would like to think of Atheist Nexus as a catalyst to bring people together, bullding the kind of social networks that christians find in their churches.
This fall there was a small exodus of disgruntled members from Nexus, I guess for ideological or personality reasons. I really miss some of them, and this is why. They were part of my network of friends. Even so, looking at the bigger picture, I feel some purpose here, and coose to stay.
Comments appreciated. It's nice to see what people think, or if they are inspired, or if they think it's BS. Well, that last part can sting, but everyone is free to their opinion.
Views: 170
Thanks for the article. I'm happy overall and don't attend religious services. In fact I wouldn't be surprised if part of the reason I'm happy is because is *don't* go to church. No hearing about how nasty we lowly humans are, no one trying to convince me I'm going to hell if I don't do X, Y, or Z.
I think it's good that this article points out the social aspect of religion as being the likely source of the alleged beneficial results of church-going. But how much do you want to bet that's not what many/most people will get out of the article? They'll think "Going to church makes you happy, so that means my religion must be true!"
i feel inclined to say: Ignorance is Bliss.
seriously though, the bullshit believers spew is rediculous, for all we know they feel forced to say they're extremely satisfied because that's what their religion teaches them.
"we are right, we are good, we are happy, we are good christians"
that's my opinion anyways.
What struck me most about the article was that it identified community, and not beleif, as a source of happiness for religious people. I suspect that atheists are less likely to focus on communicty, compared to christians, for a numbe rof reasons. It's also all relative, anyway, and there are religious ascetics or monks who can sit on a mountain alone and not want anyone around, and there are social butterfly atheists too.
If there was a scale of "nonsocial / social", with nonsocial "I want to live in the Mount St. Helens wilderness and raise goats and never see another person again" as a "1" and "I want to surround myself with people 24/7 and have hug parties and never spend a moment alone" as a "10" I'm probably a 3. Also Im much more social on the internet than in person. Crowds make me nervous. People in my face make me want to cover my head with a paper bag and pretend to be asleep. But there are individuals and some small groups that I can't get enough of and Im almost giddy in those situations. That's my "church" and I understand what people say about valuing their church because of the sense of community that it gives.
@Sentient Biped "People in my face make me want to cover my head with a paper bag and pretend to be asleep." I often feel the same way, as you may have guessed from my profile pic!
I would say for me, it depends on the day. Some days I'd like to be invisible and do my own thing (a "1" or even a "-2" some days), other days I really need and like interacting with people in person or online. So I can definitely see a sense of community as helping people.
But I don't think of the socializing I do though as being instead of church. They have their things, I have mine. Some people go for hockey, some don't. I don't go for hockey or religion, but if it makes them happy, fine with me just as long as they don't shove it in my face (bagged or not) or force me to talk about hat tricks or the trinity all day.
And no, I'm not saying that hockey is as crazy as religion is. Extreme ironing, on the other hand...
Hey Ryan, morphine is something I know a little about. I can't say about, say, people on pot - maybe they are happym I don't know.
I've managed narcotics for many people who have (or had) pain problems. You can find an occasional person on chronic narcotics who is happy, but the overwhelming are miserable! The body adapts to the euphoric effects, so it takes more and more to get that effect. On the other hand, the body does not adapt to side effects like constipation, loss of libido, urinary retention, slowed stomach function, increased anxiety / panic attacks, and asthenia - a vague sensation of ill being, fatigue, lack of energy, lack of will to do anything. Plus, the brain's pleasure receptors re-set, such that in absence of narcotic, there is a sense of "not-right" that can persist for months or years after stopping. Plus, withdrawal is a real bitch - which is why these are so addictive, even if people aren't enjoying being on them. I could go on.....
Maybe your metaphor still applies - religion has plenty of side effects too, and is addictive even when the sense of euphoria ends....
© 2019 Atheist Nexus. All rights reserved. Admin: The Nexus Group. Powered by


text:
Good Life
'Garbage' chemical threatens water in California's San Joaquin Valley
A 1974 memo from Dow Chemical describes several chemicals in a widely used farm fumigant as "garbage." Today, one of those useless chemicals threatens drinking water for more than 1 million people across the San Joaquin Valley.
Now linked to cancer, the toxin was waste from a plastic-making process. Chemical companies often mix such leftovers to create other products to avoid the cost of disposal, says one long-time chemical engineer.
The fumigant manufacturers, Dow and Shell Oil Co., discovered decades ago that 1,2,3-trichloropropane, or TCP, was not effective against worms called nematodes, according to documents in lawsuits filed by a dozen Valley cities against the companies. But they apparently left it in a fumigant anyway.
"TCP was a hazardous waste, not a pesticide," said lawyer Todd Robins, who represents several Valley cities and water agencies. "It did nothing for farmers, but Shell and Dow knowingly used their fumigants as a way to dispose of it."
Read the full story at fresnobee.com.

subset: commoncrawl


text:
| The new Waze Wiki, aka Wazeopedia, is now live at Wazeopedia.waze.com! While this legacy wiki will remain accessible for the time being, it is no longer updated by the community. For the most up-to-date guidance, please visit your local Wazeopedia.
Please do not make any more updates to these legacy wiki pages, all future updates should be made in your country's local Wazeopedia.
About Waze
Australian Roads
- The Australian road network covers more than 817,000 kilometres.
- Approximately 657,000 kilometres are controlled by local government - although state-controlled roads account for about three quarters of all vehicle kilometres travelled.
- There are more than 37,000 road bridges across Australia.
- More than three quarters of all passenger kilometres travelled in Australia occur on roads.
- Public transport is a major user of our road network. In Melbourne, for example, more than 80 per cent of all public transport kilometres are travelled on roads.
- Source: Roads Australia
New to Waze?
How to add Toll Roads to the map
How to add Service Stations to the map
What The Australian Community Expects From You
This para serves as a guideline for all Wazers, willing to contribute to the Australian map.
In our style guide we have written and refered to many pages in the Wiki, showing and telling what has to be done to edit the map. We here in Australia decided to also state, how we would like to see the work done.
- Every Wazer, regardless of their rank or origin, is encouraged and welcome to contribute to the Australian map. Nonetheless everyone is required to act in the here-stated manner and to follow the rules as stated in the Australian Wiki. Any rules/guidelines not covered herein will be available in the global Wiki
WME Map Editor
Wiki Main Page
- Contributers to the Australian map are also welcome to add the graphic to their (forum)signature to show their affiliation to the Australian Waze Community
- We expect all map editors to regularly visit the Australian forum. Though we would appreciate a post from you too, you're not required to participate in the forum, but to keep in touch with the thoughts and various projects running in our community (i.e Servos, that's what we call a Petrol/Gas station here)
Australian Forum
- Always keep in mind, that everyone of us is voluntarily giving their time to Waze. No-one is a Waze employee, so please respect that everybody has a private life too and consider this when expecting an answer - be it in the Forum or PM.
- Work together and not against one another. Always look at the time stamp, when considering to change existing elements. If it has been edited recently, it might still be under construction by the last editor. If you think, something has to be done immediately please get in contact with the last editor via PM.
- Don't leave "loose ends". The last editor of a segment is responsible for it. So if you choose to create a new segment or edit an existing make sure that you make it ready by adding street- and city name, proper label, turn restrictions. We don't expect you to do all at once - sometimes you will have to look for additional information or a feedback from the editor before you, but ensure to make all necessary adjustments at least within a month. Just performing slight geometry changes to snap off some points and edits is not our style here.
- Special note: Special note: In accordance with the implementation of Google search and to get a working road grid as soon as possible, guest editors, wide area managers and country managers may choose to use the "no name" option when naming a street (or lower) to make them routeable. To prevent smudged cities the city names are to be applied all times. Local editors are encouraged to add the proper street names as they see able to.
- We expect that all activities concerning Waze in Australia are carried out in a spirit of mutual respect and we want you to show it. So keep the wording nice and friendly - and don't be shy using the "thank you"-button if you get an answer to a question or help with a problem.
We are serious with this and already hired a guy to enforce this rules if necessary:
Style Guide for Map Editing
Useful Sites for Map Editing:
Roads and Maritime Services N.S.W.
Your local shire and state may also provide maps which show in greater detail for features other than roads.
Make Waze Better
Add Roads to Western Australia
Add Roads to Northern Territory
Add Roads to Australian Capital Territory
Add Australian Toll Roads to the map
Add Australian Service Stations to the map
Something's Wrong!
Updates on Waze status, service, currently known issues, and completed processes


text:
Fumihiko Okabe
—01 & 02. Looks from a recent story in Go Out.
I discovered Fumihiko Okabe's work at the beginning of last year through an editorial he did for Go Out entitled Anti-Nostalgic. I liked the neatness of his styling, the brand mix he used and the underlying sense of humour with which he approached the story. A year and a lot of emails later, I'm really pleased to say that Issue 06 will feature an incredible editorial that he shot for us with photographer Arata Suzuki. I sincerely hope it's the first of many.


text:
Manuel Bartual is a Spanish comic artist, editor and graphic artist from Valencia. He created the comic books 'Morón el Pollastre', 'Álex' and 'Con amigos como estos' in cooperation with Manuel Castaño, that he published through 7 Monos, the publishing collective of which he is co-founder. He works on a regular base for Grupo Editorial Santillana, El País, Ediciones Sinsentido, Dibbuks and Astiberri Ediciones. He is responsible for the image headers of such publications as TRAMA, Buen provecho, Noroeste and El Manglar. He was co-editor of the 7 Monos fanzine 9e Arte with Sergio Córdoba and is the director and designer of the online cultural publication Nomagazine since 2003.
Bartual has worked with Lorenzo Gómez on the series 'Reflexiones de un Oficinista' , that was published in TOS. He draws the 'Sexorama' section in El Jueves since 2007, and started the ¡Escucha esto! weblog for MTV Spain in that same year. He is also editor of the fanzine ¡Caramba! and the publishing firm of the same name.
El detective de la SGAE (2008)


text:
Antihalation compositions
Antihalation compositions and methods for reducing the reflection of exposure radiation of a photoresist overcoated said compositions. The antihalation compositions of the invention comprise a resin binder and material capable of causing a thermally induced crosslinking reaction of the resin binder.
Latest Shipley Company, L.L.C. Patents:
1. Field of the Invention
The present invention relates to compositions that reduce the reflection of exposure radiation from a substrate back to an overcoated resist layer. More particularly, the invention relates to an antihalation composition characterized in one aspect by containing a thermally activated crosslinking agent.
2. Background Art
Photoresists are used for transfer of an image to a substrate. A coating layer of a photoresist is formed on a substrate, and the resist layer is then selectively exposed through a photomask to a source of activating radiation. The photomask has areas that are opaque to activating radiation and other areas that are transparent to activating radiation. Exposure to activating radiation provides a photoinduced chemical transformation of the photoresist coating to thereby transfer the pattern of the photomask to the resist coated substrate. Following exposure, the photoresist is developed to provide a relief image that permits selective processing of the substrate.
A photoresist can be either positive-acting or negative-acting. For most negative photoresists, those containing layer portions that are exposed to activating radiation polymerize or crosslink in a reaction between a photoactive compound and polymerizable reagents of the resist composition. Consequently, the exposed coating portions are rendered less soluble in a developer solution than unexposed portions. For a positive-acting photoresist, exposed portions are rendered more soluble in a developer solution while areas not exposed remain comparatively less developer soluble. The background of photoresists are described by Deforest, Photoresist Materials and Processes, McGraw Hill Book Company, New York, ch 2, 1975, and by Moreay, Semiconductor Lithography Principles, Practices and Materials, Plenum Press, New York, ch. 2 and 4, both incorporated herein by reference for their teaching of photoresists and methods of making and using same.
A major use of photoresists is in semiconductor manufacture where an object is to convert a highly polished semiconductor slice, such as silicon or gallium arsenide, into a complex matrix of electron conducting paths, preferably of micron or submicron geometry, that perform circuit functions. Proper photoresist processing is a key to attaining this object. While there is a strong interdependency among the various photoresist processing steps, exposure is believed to be one of the most important steps in attaining high resolution photoresist images.
Reflection of the activating radiation used to expose a photoresist often poses notable limits on resolution of the image patterned in the resist layer. Reflection of radiation from the substrate/resist interface can produce variations in the radiation intensity in the resist during exposure, resulting in non-uniform photoresist linewidth upon development. Radiation also can scatter from the substrate/resist interface into regions of the resist where exposure is not intended, again resulting in linewidth variations. The amount of scattering and reflection will typically vary from region to region, resulting in further linewidth non-uniformity.
Reflection of activating radiation also contributes to what is known in the art as the "standing wave effect". To eliminate the effects of chromatic aberration in exposure equipment lenses, monochromatic or quasimonochromatic radiation is commonly used in resist projection techniques. Due to radiation reflection at the resist/substrate interface, however, constructive and destructive interference is particularly significant when monochromatic or quasi-monochromatic radiation is used for photoresist exposure. In such cases the reflected light interferes with the incident light to form standing waves within the resist. In the case of highly reflective substrate regions, the problem is exacerbated since large amplitude standing waves create thin layers of underexposed resist at the wave minima. The underexposed layers can prevent complete resist development causing edge acuity problems in the resist profile: The time required to expose the photoresist is generally an increasing function of resist thickness because of the increased total amount of radiation required to expose an increased amount of resist. However, because of the standing wave effect, the time of exposure also includes a harmonic component which varies between successive maximum and minimum values with the resist thickness. If the resist thickness is non-uniform, the problem becomes more severe, resulting in variable linewidth control.
Variations in substrate topography also give rise to resolution-limiting reflection problems. Any image on a substrate can cause impinging radiation to scatter or reflect in various uncontrolled directions, affecting the uniformity of resist development. As substrate topography becomes more complex with efforts to design more complex circuits, the effects of reflected radiation become more critical. For example, metal interconnects used on many microelectronic substrates are particularly problematic due to their topography and regions of high reflectivity.
Such radiation reflection problems have been addressed by the addition of certain dyes to photoresist compositions, the dyes absorbing radiation at or near the wavelength used to expose the photoresist. Exemplary dyes that have been so employed include the coumarin family, methyl orange and methanil yellow. Some workers have found that use of such dyes can limit resolution of the patterned resist image.
Another approach has been to use a radiation absorbing layer interposed between the substrate surface and the photoresist coating layer. See, for example, PCT Application WO 90/03598, and U.S. Pat. Nos. 4,910,122, 4,370,405 and 4,362,809, all of which are incorporated herein by reference for their teaching of antireflective (antihalation) compositions and use of the same. At least some prior antireflective coatings, however, suffer from poor adhesion to the overcoated photoresist layer and/or the underlying substrate surface. Such adhesion problems can severely compromise the resolution of the patterned photoresist image.
Thus, it would be desirable to have an antihalation coating composition that absorbs significantly incident and reflective exposure radiation, and that provides substantial standing wave attenuation. It would be further desirable to have an antihalation composition that can be coated on a microelectronic substrate and adhere well to both a subsequently applied photoresist coating layer and the underlying substrate surface.SUMMARY OF THE INVENTION
The present invention provides an antihalation composition suitable for use with a photoresist, the antihalation composition in general comprising a resin binder and a compound capable of causing a thermally induced crosslinking reaction of the resin binder. Components of the antihalation composition preferably can crosslink with an overcoated layer of the photoresist composition, thereby increasing adhesion between the two coating layers and avoiding notable problems of at least some prior antireflective systems. The antihalation compositions of the invention may further comprise an acid or acid generator compound to catalyze the reaction between the resin binder and the crosslinking compound, enabling the crosslinking reaction to proceed at relatively lower temperatures. As used herein, the term acid generator refers to a compound that generates an acid upon appropriate treatment of the compound, for example, upon exposure to activating radiation or thermal treatment. The thermally active crosslinker can be a variety of materials and, preferably, is an amine-based material such as a benzoguanamine-based or melamine-based resin. To enhance radiation absorption properties, the antihalation compositions of the invention may further include one or more dye compounds that absorb radiation at or near the exposure wavelength of the overcoated photoresist.
The invention further provides a method for application and use of the antihalation coating composition with a photoresist. Thus, in a preferred aspect, a method is provided comprising (a) applying a layer of an antihalation composition of the invention on a substrate; (b) at least partially curing the antihalation coating layer; (c) applying a layer of a photoresist on the coated substrate; (d) exposing selected portions of the photoresist layer; (e) baking the applied antihalation and photoresist coating layers; and (f) developing the exposed photoresist layer. When a suitable photoresist is employed, baking of the two coating layers results in crosslinking between components of the antihalation and photoresist compositions, thereby providing excellent adhesion between the two coating layers. It has also been found that the antihalation compositions of the invention adhere well to substrate surfaces, including substrates used in microelectronic applications.
The invention further provides methods for forming a relief image and novel articles of manufacture consisting of substrates coated with an antihalation composition of the invention alone or in combination with a photoresist composition. In particular, a coated substrate is provided, the substrate having an antihalation composition of the invention coated thereon, and a photoresist coated over said antihalation composition, the photoresist comprising a resin binder and a radiation sensitive component.
The FIGURE illustrates schematically processes of the invention.
A preferred antihalation composition of the invention comprises a mixture of materials that will crosslink, cure or harden upon thermal treatment. More particularly, a preferred composition comprises a resin binder and a material capable of undergoing a thermally induced crosslinking reaction with said resin binder. Preferably the resin binder and the thermal crosslinking compound are materials which, in an uncured state, are soluble in a nonreactive solvent or solvent mixture and are capable of forming a homogeneous, nontacky, adherent film on a substrate surface onto which it is applied.
A particularly preferred antihalation composition comprises an amine-based thermal crosslinker and a phenol-based resin binder. Suitable amine-based thermal crosslinkers include melamine-formaldehyde resins, glycoluril-formaldehyde resins, and urea-based resins. Suitable melamine resins include the melamine resins manufactured by American Cyanamid Company of Wayne, N.J. and sold under the trade names Cymel® 300, 301, 303, 350, 370, 380, 1116 and 1130. Suitable glycoluril resins include those sold by the American Cyanamid Company under the trade names of Cymel® 1170, 1171, 1172. Suitable urea-based resins include those sold by the American Cyanamid Company under the trade names of Beetle® 60, 65 and 80. A particularly preferred amine-based crosslinker is a benzoguanamine-based material, including the benzoguanamine resins sold by the American Cyanamid Company under the trade names of Cymel® 1123 and 1125. Additionally, combinations of the above amine-based crosslinkers will be suitable, including combinations that comprise a benzoquanamine-based material. In addition to the above resins available from the American Cyanamid Company, a large number of similar resins are commercially available from other suppliers. Additionally, such amine based resins may be prepared by the reaction of acrylamide or methacrylamide copolymers with formaldehyde in an alcohol-containing solution, or alternatively by the copolymerization of N-alkoxymethyl acrylamide or methacrylamide with other suitable monomers. The crosslinker component of the antihalation compositions of the invention in general are used in an amount of between about 5 and 50 weight percent of total solids of the composition, more typically in amount of 30 weight percent of total solids of the composition.
As noted above, the amine-based crosslinker compound of the antihalation composition is preferably used in combination with a phenol-based resin binder. Suitable phenol-based resin binders include, for example, novolak resins; poly(vinylphenols) and copolymers of the same with styrene, alpha-methylstyrene; acrylic resins; polyglutarimides; polyacrylic acid or polymethacrylic acid copolymers; alkali-soluble polyacrylamides and polymethacrylamide copolymers; copolymers containing 2-hydroxyethylmethacrylate and 2-hydroxypropylmethacrylate; polyvinyl alcohols such as those prepared from partially hydroxylated polyvinyl acetates; alkali-soluble styrene-allyl alcohol copolymers; and mixtures thereof.
Of the above, poly(vinylphenol) and its copolymers and novolak resins containing hydroxyl groups and sites for the electrophilic substitution of aromatic rings at positions ortho- or para-relative to the hydroxyl group are preferred. Novolak resins that are useful in conjunction with amine-based resins in the acid hardening resin system are alkali-soluble film forming phenolic resins having a molecular weight (weight average) ranging from about 300 to about 100,000 daltons, and preferably from about 1000 to 20,000 daltons. These novolak resins may be prepared by the condensation reaction of a phenol, a naphthol or a substituted phenol, such as, cresol, xylenol, ethylphenol, butylphenol, oxypropyl methoxyphenol, chlorophenol, bromophenol, resorcinol, naphthol, chloronaphthol, bromonaphthol or hydroquinone with formaldehyde, acetaldehyde, benzaldehyde, furfural acrolein, or the like. Blends of suitable novolak resins may also be used in order to adjust the dissolution rate of the exposed coating in aqueous base solutions as well as for adjusting the viscosity, hardness and other physical properties of the coating. Suitable novolak resins are disclosed in numerous patents including U.S. Pat. Nos. 3,148,983; 4,404,357; 4,115,128; 4,377,631; 4,423,138, and 4,424,315, the disclosures of which are incorporated by reference herein.
Poly(vinylphenols) are thermoplastic materials that may be formed by block polymerization, emulsion polymerization or solution polymerization of corresponding monomers in the presence of a cationic catalyst. Vinylphenols used for the production of poly(vinylphenol) resins may be prepared, for example, by hydrolysis of commercially available coumarins or substituted coumarins, followed by decarboxylation of the resulting hydroxy cinnamic acids. Useful vinyl phenols also may be prepared by dehydration of the corresponding hydroxy alkyl phenol or by decarboxylation of hydroxy cinnamic acids resulting from the reaction of substituted or non-substituted hydroxy benzaldehydes with malonic acid. Preferred poly(vinylphenol) resins prepared from such vinyl phenols have a molecular weight range of from about 2,000 to about 100,000 daltons. Procedures for the formation of poly(vinylphenol) resins can be found in U.S. Pat. No. 4,439,516, incorporated herein by reference.
Another suitable phenol-based resin binder for use in the antihalation compositions of the invention are copolymers of phenolic units and cyclic alcohol units analogous in structure to novolak resins and poly(vinylphenol) resins. Such copolymers are described in U.S. patent application Ser. No. 07/354,800, incorporated herein by reference. These copolymers may be formed in several ways. For example, in the conventional preparation of a poly(vinylphenol) resin, a cyclic alcohol may be added to the reaction mixture as a comonomer during the polymerization reaction which is thereafter carried out in a normal manner. The cyclic alcohol is preferably aliphatic, but may contain one or two double bonds. The cyclic alcohol is preferably one closest in structure to the phenolic unit. For example, if the resin is a poly(vinylphenol), the comonomer would be vinyl cyclohexanol.
The preferred method for formation of the copolymer comprises hydrogenation of a preformed poly(vinylphenol) resin. Hydrogenation may be carried, out using art recognized hydrogenation procedures, for example, by passing a solution of the phenolic resin over a reducing catalyst such as a platinum or palladium coated carbon substrate or preferably over Raney nickel at elevated temperature and pressure. The specific conditions are dependent upon the polymer to be hydrogenated. More particularly, the polymer is dissolved in a suitable solvent such as ethyl alcohol or acetic acid, and then the solution is contacted with a finely divided Raney nickel catalyst at a temperature of from about 100 to 300° C. at a pressure of from about 50 to 300 atmospheres or more. The finely divided nickel catalyst may be a nickel-on-silica, nickel-on-alumina, or nickel-on-carbon catalyst depending on the resin to be hydrogenated.
Another suitable resin binder for the antihalation compositions of the invention is a polymer comprising anthracene units. This polymer may contain other units such as carboxy and/or alkyl ester units pendant from the polymer backbone. In particular, a preferred resin binder has a structure of formula (I):
wherein R is a hydrogen or an alkyl group (e.g., an alkyl group having from 1 to 6 carbon atoms); and x is the mole fraction of anthracene ester units in the polymer, and wherein x is suitably a value of from 0.1 to 1.0. The anthracene groups may be unsubstituted or substituted at one or more available positions by substituents such as, for example, halo, alkoxy and alkyl. Suitably the anthracene moiety can be substituted to a carboxyl group at any available position of the anthracene ring, as shown above in formula (I). Preferably, the resin binder contains 9-anthracene ester units. These anthracene resin binders can be prepared, for example, by condensation of anthranol with methacryloyl chloride, followed by condensation of the vinyl anthracene ester reaction product to form the homopolymer, or condensation of the vinyl ester reaction product with other polymerizable compounds to form a mixed polymer.
For enhanced etch resistance of the antihalation composition, a silicon-containing material can be employed, such as poly(vinylsilsesquioxane). Such a silicon-containing resin can be used as the sole resin binder of the composition, or in combination with other resin binders, such as the phenolic resins described above.
The concentration of the resin binder component of the antihalation compositions of the invention may vary within relatively broad ranges, and in general the resin binder is employed in a concentration of from about 50 to 95 weight percent of the total of the dry components of the composition, more typically from about 60 to 80 weight percent of the total dry components.
As indicated above, the antihalation compositions of the invention may further comprise an acid or acid generator compound for catalyzing the crosslinking reaction between the resin binder and crosslinker compound. Preferably an acid generator compound is employed. Suitable acid generator compounds include compounds that liberate acid upon photolysis or thermal treatment. Preferably a thermal acid generator is employed, i.e., a compound that generates acid upon thermal treatment. A variety of known thermal acid generator compounds are suitably employed in the antireflective compositions of the invention such as, for example, 2,4,4,6-tetrabromocyclohexadienone, benzoin tosylate, 2-nitrobenzyl tosylate, and alkyl esters of organic sulfonic acids. Typically a thermal acid generator is present in an antihalation composition in concentration of from about 1 to 15 percent by weight of the total of the dry components of the composition, more preferably about 5 percent by weight of the total dry components. Photoacid generators may also be employed in an antihalation composition, for example onium salts, halogenated non-ionic photoacid generators such as 1,1-bis[p-chlorophenyl]-2,2,2-trichloroethane, and other photoacid generators disclosed herein for use in photoresist compositions. Suitable amounts of a photoacid generator in an antihalation composition in general range from about 1 to 15 percent by weight of the total of dry components of the composition. For an antihalation composition containing a photoacid generator, a coating layer of the composition is exposed to an effective amount of activating radiation to generate the photoacid, followed by a post-exposure bake at a temperature sufficient to at least partially cure the coating layer.
It should be appreciated that an antihalation composition of the invention can be non-photoimageable, e.g., by not employing an acid catalyst or employing a non-photoactive acid catalyst such as a thermal acid generator; or an antihalation composition can be rendered photoimageable (and hence developable) by incorporating an effective amount of a suitable photoacid generator into the composition and then exposing a coating layer of the composition through a photomask. Suitable photoacid generators include the non-ionic halogeneted photoacid generators as described herein.
Another optional additive of the compositions of the invention are compounds that serve as dyes and absorb radiation used to expose an overcoated photoresist layer. The dye should absorb well at the wavelength at which the overcoated photoresist is exposed and, therefore, selection of a suitable dye for a specific antihalation composition in large part will be determined by the particular photoresist that is employed. For example, if an antireflective composition is used in combination with a deep U.V. photoresist (i.e., a resist that is exposed at between 100 and 300 nm), the dye compound should strongly absorb in the deep U.V. region. Suitable dyes are known in the art and include, for example, the curcumin family and derivatives thereof, anthracene, anthrarobin, Sudan-orange, benzophenothiazine and naphthol-AS. Typically a dye is present in an antihalation composition in a concentration of from about 2 to 30 percent by weight of the total of the dry components of the composition, more preferably from 5 to 15 percent by weight of the total dry components.
Other optional additives include surface leveling agents, for example, the leveling agent available under the tradename Silwet 7604 from Union Carbide.
To make a liquid coating composition, the components of the antihalation composition are dissolved in a suitable solvent such as, for example, one or more of the glycol ethers such as 2-methoxyethyl ether (diglyme), ethylene glycol monomethyl ether, and propylene glycol monomethyl ether; N-methyl pyrrolidinone; esters such as methyl cellosolve acetate, ethyl cellosolve acetate, propylene glycol monomethyl ether acetate, dipropylene glycol monomethyl ether acetate and other solvents such as dibasic esters, propylene carbonate and gamma-butyrolactone. The concentration of the dry components in the solvent will depend on several factors such as the method of application. In general, the solids content of an antihalation composition varies from about 1 to 50 weight percent of the total weight of the antihalation composition, preferably the solids content varies from about 5 to 35 weight percent of the total weight of the antihalation composition.
A variety of photoresist compositions can be employed with the antihalation compositions of the invention. Preferably, a photoresist is employed that, when coated over a film layer of antihalation composition, is capable of crosslinking with the antihalation composition at the interface of the two coating layers. More specifically, preferred photoresists for use with the antihalation compositions of the invention include positive-acting and negative-acting photoacid-generating compositions that comprise a resin system that can crosslink with one or more components of the antihalation composition.
A particularly preferred group of photoresists for use with the compositions of the invention comprise a radiation sensitive component such as photoacid generator compound and a mixture of materials that will cure, crosslink or harden upon heating and exposure to acid. A preferred mixture comprises a phenol-based resin binder and an amine-based crosslinker. Suitable phenol-based resins include novolak resins, poly(vinylphenols) and various copolymers thereof. Suitable amine-based crosslinkers include those described above for the antihalation compositions, in particular the melamine-formaldehyde Cymel resins available from American Cyanamid. Suitable photoacid generator compounds include the onium salts, such as those disclosed in U.S. Pat. Nos. 4,442,197, 4,603,101, and 4,624,912, each incorporated herein by reference; and non-ionic organic photoactive compounds such as the halogenated photoactive compounds disclosed in the below referenced European Patent Applications. These photoactive compounds should be present in a photoresist in an amount sufficient to enable development of a coating layer of the resist following exposure to activating radiation. Preferred negative-acting photoresists for use in accordance with the invention include the acid-hardening photoresists as disclosed, for example, in European Patent Applications Nos. 0401499 and 0423446, both incorporated herein by reference. As used herein, the term "acid-hardening photoresist" refers to photoresist compositions of the general type described above and in these referenced European Patent Applications.
Other preferred photoresists include positive-acting photoresists that contain components that can crosslink with one or more components of the antihalation compositions of the invention. Such photoresists suitably comprise a phenol-based resin binder in combination with a radiation sensitive component. Suitable resin binders include novolak resins, poly(vinylphenols) and various copolymers thereof. Suitable radiation sensitive components can comprise a variety of photoacid generator compounds including the naphthoquinone diazide sulfonic acid esters such as 2,1,4-diazonaphthoquinone sulfonic esters and 2,1,5-diazonaphthoquinone sulfonic acid esters; the onium salts; and other known acid generators such as those disclosed in European Patent Application Nos. 0164248 and 0232972, both incorporated herein by reference. In addition to "conventional" positive-acting resists, chemically amplified positive resists are particularly suitable for use with the antihalation compositions of the invention. As with the above described acid-hardening resists, a chemically amplified positive resist generates a catalytic photoproduct upon exposure to activating radiation. In a positive system, this photoproduct (e.g., acid) renders the exposed regions of the resist more developer soluble, for example by catalyzing a deprotection reaction of one or more of the resist components to liberate polar functional groups such as carboxy. See, Lamola, et al., "Chemically Amplified Resists". Solid State Technology, 53-60 (August 1991), incorporated herein by reference.
Reference is now made to the FIGURE of the Drawing which shows a preferred method for use of an antihalation composition of the invention. In Step A, an antihalation composition is applied to substrate 10 to provide antihalation coating layer 12. The antihalation composition may be applied by virtually any standard means including spin coating. The antireflective composition in general is applied on a substrate with a dried layer thickness of between about 0.05 and 0.5 μm, preferably a dried layer thickness of between about 0.10 and 0.20 μm. The substrate is suitably any substrate conventionally used in processes involving photoresists. For example, the substrate can be silicon, silicon dioxide or aluminum-aluminum oxide microelectronic wafers. Gallium arsenide, ceramic, quartz or copper substrates may also be employed. Substrates used for liquid crystal display applications are also suitably employed, for example glass substrates, indium tin coated substrates and the like.
In Step B the antihalation layer is at least partially cured. Cure conditions will vary with the components of the antireflective composition. Thus, if the composition does not contain an acid catalyst, cure temperatures and conditions will be more vigorous than those of a composition containing an acid or acid generator compound. For example, for a composition containing a novolak resin binder and the benzoquanamine-formaldehyde resin Cymel 1123 as a crosslinker, typical cure conditions are heating at about 200° C. for about 30 minutes. If the thermal acid generator 2,4,4,6-tetrabromocyclohexadienone is added to this composition, cure temperatures of about 150° C. for about 30 minutes will be suitable for at least partially curing the composition coating layer. Cure conditions preferably render coating layer 12 substantially developer insoluble. Additionally, as discussed above, if the antihalation composition includes a photoacid generator, the composition coating layer can be at least partially cured by exposing the coating layer to an effective amount of activating radiation (e.g., between about 10 to 300 mJ/cm2), followed by a post-exposure bake of from 50 to 140° C.
In Step C a photoresist is applied over the surface of the crosslinked antihalation layer 12. As with application of the antihalation composition, the photoresist can be applied by any standard means such as by spinning, dipping or roller coating. When spin coating, the solids content of the photoresist composition can be adjusted to provide a desired film thickness based upon the specific spinning equipment utilized, the viscosity of the solution, the speed of the spinner and the amount of time allowed for spinning. Following application, the photoresist coating layer 14 is typically dried by heating to remove solvent preferably until layer 14 is tack free. Optimally, no intermixing of the antihalation layer and photoresist layer should occur.
In Step D coating layer 14 is imaged with activating radiation through a mask in conventional manner. The exposure energy is sufficient to effectively activate the photoactive component of the radiation sensitive system to produce a patterned image 16 in coating layer 14 and, more specifically, the exposure energy typically ranges from about 10 to 300 mJ/cm2, dependent upon the exposure tool.
Step E is an optional step and is employed if the photoresist requires post-exposure heating to create solubility differences between exposed and unexposed regions of a coating layer. For example, acid-hardening photoresists typically require post-exposure heating to induce the acid-catalyzed crosslinking reaction, as depicted in Step E′; and many chemically amplified positive-acting resists require post-exposure heating to induce an acid-catalyzed deprotection reaction as shown in Step E″. Typically the coated substrate 10 is subjected to a post-exposure bake at temperatures of from about 50° C. or greater, more specifically a temperature in the range of from about 50° C. to 140° C.
In Step F, the exposed resist coating layer 14 is developed, preferably with an aqueous based developer such as an inorganic alkali exemplified by sodium hydroxide, potassium hydroxide, sodium carbonate, sodium bicarbonate, sodium silicate, sodium metasilicate, aqueous ammonia or the like. Alternatively, organic developers can be used such as choline based solutions; quaternary ammonium hydroxide solutions such as a tetra-alkyl ammonium hydroxide solution; various amine solutions such as ethyl amine, n-propyl amine, diethyl amine, di-n-propyl amine, triethyl amine or, methyldiethyl amine; alcohol amines such as diethanol amine or triethanol amine; cyclic amines such as pyrrole, piperidine, etc. In general, development is in accordance with art recognized procedures.
Following development, a final bake of an acid-hardening photoresist is often employed at temperatures of from about 100 to 150° C. for several minutes to further cure the developed exposed areas 16.
The developed substrate may then be selectively processed on those substrates areas bared of photoresist, for example chemically etching or plating substrate areas bared of photoresist in accordance with procedures well known in the art. Suitable etchants include a hydrofluoric acid etching solution and a plasma gas etch such as an oxygen plasma etch. In particular, a plasma gas etch readily penetrates the crosslinked antihalation coating layer.
It should be appreciated that the same removal chemistry can be employed to strip both an antihalation composition of the invention and many photoresists used in combination therewith. For example, an acid-hardening photoresist used in combination with a preferred antihalation composition of the invention comprising a phenol-based resin binder and an amine-based crosslinker as described above, is readily stripped with a single stripper solution after selective substrate treatment. For removing such coating layers, a preferred stripper solution contains about 90 weight percent dimethylsulfoxide and 10 weight percent para-toluenesulfonic acid. Preferably this composition is used at about 70 to 90° C.
The following examples are presented to better illustrate the invention, but are not to be construed as limiting the invention to the specific embodiments disclosed. In the antihalation compositions disclosed in the examples, the novolak resin component was a formaldehyde-phenol condensate, the phenol component being 95 weight percent cresol and 5 weight percent ethylphenol, and the resin having a molecular weight (weight average) of about 11,000 daltons and a dispersity of about 20.EXAMPLE 1
A preferred antihalation composition was prepared by mixing the components set forth below, with component amounts expressed as parts by weight:
This antihalation composition was examined to determine the curing temperature necessary to render a film layer of the composition insoluble in aqueous developer. The solution was spin coated at 4000 r.p.m. onto seven vapor-primed (HMDS vapor, room temperature and pressure, 3 minutes) 4 inch silicon wafers. These wafers were softbaked for 60 seconds on a vacuum hotplate, each wafer baked at different temperatures, specifically each wafer was baked at 20° C. temperature increments in a range of from 80-200° C. Film thickness was determined from seven measurements on a Nanometrics Nanospec 215 using a refractive index of 1.64. The seven wafers were batch-developed for 60 seconds in room temperature MicropositR MF-321 developer (an aqueous-tetramethylammonium hydroxide (TMAH) solution available from Shipley Co., Newton, Mass.) at a normality of 0.21 and then again measured for film thickness again, as described above using a Nanospec 215. It was found that a bake temperature of 120° C. or greater was sufficient to crosslink the antihalation coating layer so as to make it insoluble in the 0.21 N TMAH developer.EXAMPLE 2
The antihalation composition of Example 1 was tested for absorbance in the deep U.V. region. The composition was spin-coated at 3000 r.p.m. onto a 3-inch quartz wafer and softbaked at 120° C. for 60 seconds on a vacuum hotplate. Thickness was estimated by coating a 4 inch silicon wafer under the same conditions and measuring its thickness on a Nanospec 215, as described in Example 1 above. The coated wafer was analyzed on a Hewlett-Packard HP8452A UV-Visible Spectrophotometer and then corrected for the absorbance of the quartz wafer. At an exposure wavelength of 248 nm, the formulation was found to have an absorbance of 1.371 absorbance units per micron of thickness.EXAMPLE 3
The antihalation composition of Example 1 was coated at 3000 r.p.m. onto 4 vapor-primed (HMDS, by procedures described in Example 1) 4 inch silicon wafers; the wafers were softbaked for 60 seconds on a vacuum hotplate. Two wafers were baked at 140° C., and the other two wafers were baked at 160° C. The four wafers were then each overcoated with Megaposit SNR248-1.0 deep UV photoresist (an acid-hardening photoresist sold by the Shipley Co.), using a 30 second spin at 3660 r.p.m., followed by a 60 second softbake at 90° C. on a vacuum hotplate in order to generate a resist layer thickness of approximately 1.025 microns. The wafers were exposed on a GCA Laserstep excimer laser stepper operating at the wavelength of 248 nm; an 8×8 array of patterns was utilized, covering a wide range of both exposure and focus to ensure that the optimum exposure was attained. The wafers were split up into two groups, each group containing one coated wafer cured at 140° C., and another coated wafer cured at 160° C.; one group of wafers was processed with a 60 second vacuum hotplate post-exposure bake at 110° C. while the other group was baked at 140° C. All of the wafers were developed with 0.14 N TMAH MF-319 developer (Shipley Co.) in double puddle mode, using 25 and 50 second puddles and a total developer contact time of 100 seconds. Well resolved lines/spaces (including lines having essentially vertical sidewalls) of down to 0.34 μm were patterned on the antihalation coating layer.EXAMPLE 4
Another preferred antihalation composition was prepared by mixing the components set forth below, with component amounts expressed as parts by weight:
This antihalation composition was spin coated at 4600 r.p.m. onto vapor-primed (HMDS, room temperature and pressure, 3 minutes) 4 inch silicon wafers and unprimed 4 inch quartz wafers; each wafer was softbaked at 125° C. for 60 seconds on a vacuum hotplate. The wafers were then baked for 30 minutes in a Blue M convection oven. Thickness analysis of the antihalation composition coated silicon wafers on a Nanometrics Nanospec 215 showed an average film thickness of 1733 angstroms. The quartz wafers were analyzed on a Cary3 UV-Visible Spectrophotometer; after correcting for the absorbance of the quartz wafer, the absorbance of the 1733 angstroms thick antihalation coated quartz wafer was found to be 0.719 (absorbance units) at the wavelength of 248 nm. Next, one coated silicon wafer was overcoated with MegapositR SNR248-1.0 photoresist, and another coated silicon wafer was overcoated with MicropositR XP-89131 photoresist, both said photoresists available from the Shipley Co. The coating of the Megaposit SNR248 resist required a 30 second spin at 3680 r.p.m. and a 60 second softbake at 90° C. on a vacuum hotplate in order to generate a thickness of approximately 1.014 microns, whereas the Microposit XP-89131 resist utilized a 3760 r.p.m. spin and a 110° C. softbake temperature to achieve a coating layer thickness 1.017 microns. The two wafers were exposed on a GCA Laserstep excimer laser stepper operating at the wavelength of 248 nm; a 7-by-15 array of patterns was utilized, covering a wide range of both exposure and focus to ensure that the optimum exposure was attained. All of the wafers were post-exposure baked at 130° C. for 60 seconds on a vacuum hotplate and then developed with XP-89114 developer aqueous (TMAH developer available from the Shipley Co.) in double puddle mode, using 25 and 50 second puddles and a total developer contact time of 100 seconds. Well resolved lines/spaces (including lines having essentially vertical sidewalls) of down to 0.36 μm were patterned on the antihalation coating layer.
The foregoing description of the invention is merely illustrative thereof, and it is understood that variations and modifications can be effected without departing from the scope or spirit of the invention as set forth in the following claims.
1-35. (canceled)
36. A coated substrate comprising:
- a substrate having thereon;
- a layer of a coating composition comprising a thermal acid generator compound prior to thermal treatment of the layer;
- a layer of a photoresist composition above the coating composition.
37. The substrate of claim 36 wherein the coating composition is crosslinked.
38. The substrate of claim 36 wherein the coating composition comprises an anthracene material.
39. The substrate of claim 36 wherein the coating composition comprises a resin comprising phenyl groups.
40. The substrate of claim 36 wherein the substrate is a microelectronic wafer.
41. The substrate of claim 36 wherein the photoresist is a chemically-amplified positive resist.
42. A method for forming a photoresist relief image comprising:
- applying on a substrate a layer of a coating composition comprising a thermal acid generator compound;
- applying a layer of a photoresist composition above the coating composition comprising a thermal acid generator compound.
43. The method of claim 42 wherein the coating composition comprising a thermal acid generator compound is thermally treated prior to applying the photoresist composition.
44. The method of claim 42 wherein the coating composition comprises an anthracene material.
45. The method of claim 42 wherein the substrate is a microelectronic wafer.
46. The method of claim 42 wherein the photoresist composition is a chemically-amplified positive resist.
47. The method of claim 42 wherein the photoresist composition is imaged with activating radiation and the imaged photoresist composition is treated with a developer to provide a photoresist relief image.
48. The method of claim 47 wherein areas bared of photoresist composition upon treatment with the developer are etched.
49. The method of claim 47 wherein areas bared of photoresist composition upon treatment with the developer are exposed to plasma gas.
Type: Application
Filed: Oct 31, 2007
Publication Date: Oct 9, 2008
Patent Grant number: 7776508
Applicant: Shipley Company, L.L.C. (Marlborough, MA)
Inventors: James W. Thackeray (Braintree, MA), George W. Orsula (Avon, MA)
Application Number: 11/981,621
International Classification: G03F 7/20 (20060101); B05D 1/36 (20060101); G03F 7/004 (20060101);


text:
The phrase progress hacking is at alone a proof that marketing techniques for startups and companies have considerably matured and possess been improvised. Marketing and advertising at a in the future phase is not really as challenging as obtaining your label available the first time and here is where development hacking can be purchased in. Growth Hacking ROI
One should be really artistic and at the same time knowledgeable of your data base programming to efficiently development get into in order to make a tremendous big difference. Listed here are the 6 most effective approaches for expansion hacking.
To efficiently development get into in order
- Growth Hacking LCV.
- Create a questionnaire to see simply how much of your respective market really values this.
- Even though there are no free lunches in your life, yet the phrase 'Free' is always.
- Equally large and small businesses have benefitted from your referrer program plus.
- Growth Hacking A/B Split Tests.
- Adopt a method that can make your merchandise stick.
Follow a technique that can make your merchandise stick out and be instantaneously available to a big group straight away. It is actually consumer psychology that men and women always desire to be part of something special and special.
Even though there are no totally free meals in daily life, yet the word 'Free' is always in a position to bring in people and if the phrase is planted purposefully they then are willing to neglect the charge they really need to pay for the product or service/assistance that they are receiving totally free. Growth Hacking Tips
A position to bring
Each large and small businesses have benefitted from the recommendation plan and yes it seems to work for both ways so establish a affiliate software which means that your client instantly interests some other clients on their own without having you needing to a single thing regarding this.
Other clients
Within the essential things that you must know about your client is exactly what specifically they look out for in your merchandise. Publicize that, make use of that; do what you have to, to project that very thing in your product.
When you have fully understood and recognized the objective market place, you should become familiar with the tradition they are accustomed to and follow so that you reach out to them in a terminology that they can understand so therefore connect back to you. Growth Hacking UI
Create a survey to see just how much of your respective target audience actually appreciates the item that you will be giving. The one who coined this expression believes that at least 40Percent should in fact would like merchandise.
Giving The one who
There is absolutely no comprehensive way of progress hacking your startup or web site. Expansion hacking breaks the natural regulation of organic and natural development, that's why it will require imagination and ingenuity to interrupt the initial progress shield. Growth Hacking AARRR
- Growth Hacking Conversion Optimization.
- Growth Hacking Startups.
- One should be really artistic and concurrently well-informed in the data bank coding to properly expansion get into in.


text:
adjective; satisfied, contented, happy, pleased.
Due to a family emergency we will not be able to process your orders from our site for the foreseeable future. We sincerely apologise for this inconvenience.
New item
A T-shirt for the adventurer!
'Barod am Antur' = Ready for Adventure
Available from 2-12 years, in a bright red colour, and striking landrover design.
Sorry, this item is currently out of stock.
Soft babygrow featuring the Welsh word for 'happy' - HAPUS in colourful letters. Suitable for a b...
Cute blue babygrow with a tractor design by Silibili.
New design for Unicorn lovers!
Hud yr Enfys = Rainbow magic
Available in short and long sleeve...
New design for Unicorn lovers!
Hud yr Enfys = Rainbow magic
The design is now available on a...
All website content & copy: Bodlon 2012. Copying any part of the site or its content is strictly prohibited.
Contact us Bodlon Shop & Coffee Shop, 12 Park Road, Whitchurch, Cardiff CF14 7BQ Email: firstname.lastname@example.com | Telephone: 02920 650 564 | 07825 444 233


text: We now have 3 locations and access to over 50 airplanes; ranging from Light Sport Aircraft to high performance single-engine and multi-engine aircraft, we have something to offer for students and experienced pilots of all levels. Once you have achieved your private pilot rating, we also provide the ability to rent aircraft for fun or to advance your flight training. We are a community of aviators. Our members are always welcome to visit, use the flight training facilities, and enjoy the camaraderie that comes with being around others who are passionate about aviation. More than ten thousand U.S. military and civilian pilots have flown at one of our locations during our last 38 years of operation. We have grown and expanded due to 38 years of word-of-mouth referrals from satisfied pilots. Our commitment to low prices; and the highest level of safety has resulted in our becoming one of the largest flight schools and flying clubs not only in Colorado, but in the United states. We hope you visit us and experience our efficient and effective flight training programs. We invite you to visit any of our locations to experience the thrill of flight training. Our Discovery Flight is a great way to experience the joy of aviation and see for yourself what awaits you during your future flight training program.Contact Western Air Today!


text:
SCC eFile
SCC eFile may be used to search
for Virginia and foreign corporations, limited liability companies, limited partnerships,
and business trusts. Business entity details available in SCC eFile are: entity
name, SCC ID, business entity type, date of formation or registration, status, principal
office address (if required) and registered agent/registered office. You may also
view an entity's eFile history, including images of documents that have been filed
using SCC eFile.
Clerk's Information System
The Clerk's Information System (CIS),
an electronic database, also contains general information on file at the Commission for Virginia and foreign corporations, limited liability companies, limited partnerships, and business trusts. CIS provides more in-depth information than what is currently available in SCC eFile. View images of various business entity documents filed in the Clerk's Office since January 1, 1997, in PDF format, at no charge.
Internet access to CIS performs optimally with Internet Explorer while in the Compatibility View mode. Compatibility View settings for Internet Explorer can be found under the Tools menu option. Other browsers may produce unpredictable results. Scripting options for your browser must be enabled to use CIS. First-time users are encouraged to
review the user documentation.
Name Distinguishability
To receive a preliminary determination of the availability of a business entity
name, see Name Distinguishability.
The business entity Name Search function in CIS should not be used to determine
if a prospective business entity name is distinguishable upon the records of the
Commission. For information regarding the criteria for name availability in Virginia,
see the Frequently Asked Questions regarding Business Entity
Insurance Companies
CIS may not include certain insurance companies that are licensed in Virginia as
reciprocal insurers, such as United Services Automobile Association (USAA). The
names of these companies often include the word "reciprocal," "interinsurer," "interinsurance,"
"exchange," "underwriters," or "underwriting." However, you may be able to obtain
information about such companies from the SCC's Bureau of Insurance
Company Lookup feature.


text:
The National Rifle Association is among three gun rights organizations that have joined forces to challenge Connecticut's new gun control law in court, starting by raising money from gun clubs, gun shops and individuals to finance the planned legal battle.
The National Rifle Association is among three gun rights organizations that have joined forces to challenge Connecticut's new gun control law in court, starting by raising money from gun clubs, gun shops and individuals to finance the planned legal battle.
Scott Wilson, president of the Connecticut Citizens Defense League, said Thursday that his group, the NRA and Coalition of Connecticut Sportsmen believe the new legislation - passed by the General Assembly and signed into law by Gov. Dannel P. Malloy last week - violates the constitutional rights of gun owners. Among other things, it bans the sale of large-capacity ammunition magazines and expands a ban on so-called assault weapons.
"There are a lot of people stunned right now and they don't know what to do. We do not want people to accept what has passed as status quo," said Wilson, whose group is holding a rally at the state Capitol on April 20 to unite gun owners and prepare them for the legal phase of their effort to protect the right to keep and bear arms.
But Malloy and both Democratic and Republican proponents of the new law believe it will withstand a legal challenge.
"I think the package is pretty well thought out," Malloy said. "I will point out that we had an assault weapons ban in the United States for over 10 years, it was never successful challenged. So I think, by and large, this package is on a strong footing. But anybody can sue, even the NRA."
In a message sent this week to Coalition of Connecticut Sportsmen members, Robert Crook, the group's executive director, said a legal team of "preeminent Second Amendment and constitutional lawyers with national reputations, significant trial as well as U.S. Supreme Court experience, and many U.S. Supreme Court victories under their belts" is being assembled.
Crook said the three organizations understand "the urgency of seeking legal vindication of our rights" but stressed it would be unwise to rush to court without fully understanding the new law and crafting the strongest legal challenge possible.
Another group, however, has taken legal action in state court since the new law's passage.
On Thursday, New London resident Scott Ennis, on behalf of the Disabled Americans for Firearms Rights, filed a complaint for declaratory judgment seeking to stop enforcement of the new law. Malloy is the plaintiff in that case.
Ennis suffers from Hemophilia A, a bleeding disorder that has caused him severe joint damage. In his complaint, he points out how the Connecticut constitution guarantees the right to bear arms for personal defense and how the state also prohibits someone's civil rights from being deprived on the basis of their physical disability. By banning certain weapons, including those with customized military characteristics used by people with disabilities, such as telescoping stocks, Ennis argues the new state law unfairly and arbitrarily infringes on his rights as someone who is disabled.
Senate Majority Leader Martin Looney, D-New Haven, who helped to craft the new law, disagreed.
"I think the assumption behind that statement -there is no other way to protect themselves other than an AR-15 - I don't think that's demonstrably true," Looney said, adding how the legislative leaders had conversations with the state attorney general's office throughout their negotiations and no red flags were raised about possible constitutionality problems.
In a statement issued Thursday, Jaclyn Falkowski, a spokeswoman for Attorney General George Jepsen, said the office is reviewing Ennis' complaint and will respond in court.
"However, it is our belief that this legislation is lawful and the Office of the Attorney General is prepared to vigorously defend the law against this and any potential court challenge," she said.
Wilson, however, believes gun rights activists stand a better chance of successfully challenging Connecticut's new law after a landmark 2008 Supreme Court decision ended a 32-year-old handgun ban in Washington, D.C.
"We feel that we have a much better basis to go after guns of common use and protect them," Wilson, who contends many of the more than 100 guns now added to Connecticut's assault weapons ban are commonly used by gun owners in the state. But Looney, an attorney, said that same decision upheld the right of government to impose "reasonable regulations" and that "basically no right is a completely unrestricted right."


text:
Financial Assistance
Financial Aid Basics
It's not so complicated when you take it step by step. Start here and learn the essentials you need to know.
How to Apply
Don't worry—we'll help you through the whole process. Get the facts, the forms and the important deadlines here.
Loan Resources
Learn about requirements of your federal loans and the action steps you need to take to satisfy them.


text:
Zona Gale (26 August 1874 – 27 December 1938) was an American author, and playwright.
Gale was born in Portage, Wisconsin, which she often used as a setting in her writing, and attended Wayland Academy in Beaver Dam, Wisconsin. Later she entered the University of Wisconsin-Madison, from which she received a Bachelor of Literature degree in 1895, and four years later a Master's degree.
After graduation,… (more)


text:
NEW YORK — What the Veterans Administration failed to do for double amputee Michael Sulsona in two years, some New York hardware store workers delivered in an hour: They fixed his broken wheelchair.
The 62-year-old Vietnam veteran said he petitioned the VA for a new chair two years ago and received no reply. Then his wheelchair broke last week.
When Sulsona was in a Lowe's home improvement store on Staten Island, a bolt on the already worn-out wheelchair snapped and a back wheel was about to fall off. Three Lowe's employees stayed late after their 10 p.m. closing time to do the repair, for free.
"They said, 'You're not leaving till it's like new again,'" Sulsona recalled.
The next day, Sulsona wrote a letter to his local newspaper, the Staten Island Advance, to thank the store's employees.
"I kept thanking them and all they could say was, 'It was our honor,'" he wrote. "The actions of these three employees at Lowe's showed me there are some who still believe in stepping to the plate. ... Someone needed help and they felt privileged to be given the opportunity."
Sulsona, an ex-Marine, said he lost his legs in 1971 during an explosion while on patrol.
After his letter to the newspaper, the VA got word of Sulsona and sent him a brand-new wheelchair Tuesday.
Sulsona's new chair arrived in the wake of months of scandal in the VA's health care unit over complaints nationwide of long wait times and poor patient care.
"We were very grateful that this was brought to our attention," said VA spokesman Jim Blue with the VA New York/New Jersey Healthcare Network. "Too many veterans wait too long to receive their health care and benefits and this has never been acceptable."
In a statement, Chris DiMaria, store manager at the Staten Island Lowe's, said he couldn't "be more proud of his team or company."
"Whether a customer needs assistance repairing their home or a wheelchair, our employees are ready to spring into action to help," DiMaria said.


text:
Fed up with the "Rat-Race"? Or the "Matrix" as its entrapment mechanism is now known? Don't know what that is? Watch the video! [13 mins]
I'll tell you in short: stop wasting your money!!! And of course, think beyond the container… really. Easier said than done, of course, but if you are interested in what I have to say in this video (and on this website), then you must be at least starting to think independently.
You can check-out my other money-related posts via the menu at the top of this page.


text:
webpage capture
|Saved from
|Redirected from
|All snapshots
|from host theviewfromhell.blogspot.com
from host theviewfromhell.blogspot.de
|sharedownload .zipreport error or abuse
And re Ennet House resident Kate Gompert and this depression issue:
Some psychiatric patients — plus a certain percentage of people who've gotten so dependent on chemicals for feelings of well-being that when the chemicals have to be abandoned they undergo a loss-trauma that reaches way down deep into the soul's core system — these persons know firsthand that there's more than one kind of so-called 'depression.' One kind is low-grade and sometimes gets called anhedonia or simple melancholy. It's a kind of spiritual torpor in which one loses the ability to feel pleasure or attachment to things formerly important. The avid bowler drops out of his league and stays home at night staring dully at kick-boxing cartridges. The gourmand is off his feed. The sensualist finds his beloved Unit all of a sudden to be so much feelingless gristle, just hanging there. The devoted wife and mother finds the thought of her family about as moving, all of a sudden, as a theorem of Euclid. It's a kind of emotional novocaine, this form of depression, and while it's not overtly painful its deadness is disconcerting and . . . well, depressing. Kate Gompert's always thought of this anhedonic state as a kind of radical abstracting of everything, a hollowing out of stuff that used to have affective content. Terms the undepressed toss around and take for granted as full and fleshy — happiness, joie de vivre, preference, love — are stripped to their skeletons and reduced to abstract ideas. They have, as it were, denotation but not connotation. The anhedonic can still speak about happiness and meaning et al., but she has become incapable of feeling anything in them, of understanding anything about them, of hoping anything about them, or of believing them to exist as anything more than concepts. Everything becomes an outline of the thing. Objects become schemata. The world becomes a map of the world. An anhedonic can navigate, but has no location. I.e. the anhedonic becomes, in the lingo of Boston AA, Unable To Identify. . . .
* * *
Hal isn't old enough yet to know that . . . dead-eyed anhedonia is but a remora on the ventral flank of the true predator, the Great White Shark of pain. Authorities term this condition clinical depression or involutional depression or unipolar dysphoria. Instead of just an incapacity for feeling, a deadening of soul, the predator-grade depression Kate Gompert always feels as she Withdraws from secret marijuana is itself a feeling. It goes by many names — anguish, despair, torment, or q.v. Burton's melancholia or Yevtuschenko's more authoritative psychotic depression — but Kate Gompert, down in the trenches with the thing itself, knows it simply as It.
It is a level of psychic pain wholly incompatible with human life as we know it. It is a sense of radical and thoroughgoing evil not just as a feature but as the essence of conscious existence. It is a sense of poisoning that pervades the self at the self's most elementary levels. It is a nausea of the cells and soul. It is an unnumb intuition in which the world is fully rich and animate and un-map-like and also throughly painful and malignant and antagonistic to the self, which depressed self It billows on and coagulates around and wraps in Its black folds and absorbs into Itself, so that an almost mystical unity is achieved with a world every constituent of which means painful harm to the self. Its emotional character, the feeling Gompert describes It as, is probably the most indescribable except as a sort of double bind in which any/all of the alternatives we associate with human agency — sitting or standing, doing or resting, speaking or keeping silent, living or dying — are not just unpleasant but literally horrible.
It is also lonely on a level that cannot be conveyed. There is no way Kate Gompert could ever even begin to make someone else understand what clinical depression feels like, not even another person who is herself clinically depressed, because a person in such a state is incapable of empathy with any other living thing. This anhedonic Inability To Identify is also an integral part of It. If a person in physical pain has a hard time attending to anything except that pain, a clinically depressed person cannot even perceive any other person or thing as independent of the universal pain that is digesting her cell by cell. Everything is part of the problem, and there is no solution. It is a hell for one.
The authoritative term psychotic depression makes Kate Gompert feel especially lonely. Specifically the psychotic part. Think of it this way. Two people are screaming in pain. One of them is being tortured with electric current. The other is not. The screamer who's being tortured with electric current is not psychotic: her screams are circumstantially appropriate. The screaming person who's not being tortured, however, is psychotic, since the outside parties making the diagnoses can see no electrodes or measurable amperage. One of the least pleasant things about being psychotically depressed on a ward full of psychotically depressed patients is coming to see that none of them is really psychotic, that their screams are entirely appropriate to certain circumstances part of whose special charm is that they are undetectable by any outside party. Thus the loneliness: it's a closed circuit: the current is both applied and received from within.
The so-called 'psychotically depressed' person who tries to kill herself doesn't do so out of quote 'hopelessness' or any abstract conviction that life's assets and debits do not square. And surely not because death seems suddenly appealing. The person in whom Its invisible agony reaches a certain unendurable level will kill herself the same way a trapped person will eventually jump from the window of a burning high-rise. Make no mistake about people who leap from burning windows. Their terror of falling from a great height is still just as great as it would be for you or me standing speculatively at the same window just checking out the view; i.e. the fear of falling remains a constant. The variable here is the other terror, the fire's flames: when the flames get close enough, falling to death becomes the slightly less terrible of two terrors. It's not desiring the fall; it's terror of the flames. And yet nobody down on the sidewalk, looking up and yelling 'Don't!' and 'Hang on!', can understand the jump. Not really. You'd have to have personally been trapped and felt flames to really understand a terror way beyond falling.
But and so the idea of a person in the grip of It being bound by a 'Suicide Contract' some well-meaning Substance-abuse halfway house makes her sign is simply absurd. Because such a contract will constrain such a person only until the exact psychic circumstances that made the contract necessary in the first place assert themselves, invisibly and indescribably. That the well-meaning halfway-house Staff does not understand Its overriding terror will only make the depressed resident feel more alone.
One fellow psychotically depressed patient Kate Gompert came to know at Newton-Wellesley Hospital in Newton two years ago was a man in his fifties. He was a civil engineer whose hobby was model trains — like from Lionel Trains Inc., etc. — for which he erected incredibly intricate systems of switching and track that filled his basement recreation room. His wife brought photographs of the trains and networks of trellis and track into the locked ward, to help remind him. The man said he had been suffering from psychotic depression for seventeen straight years, and Kate Gompert had had no reason to disbelieve him. He was stocky and swart with thinning hair and hands that he held very still in his lap as he sat. Twenty years ago he had slipped on a patch of 3-In-1-brand oil from his model-train tracks and bonked his head on the cement floor of his basement rec room in Wellesley Hills, and when he woke up in the E.R. he was depressed beyond all human endurance, and stayed that way. He'd never once tried suicide, though he confessed that he yearned for unconsciousness without end. His wife was very devoted and loving. She went to Catholic Mass every day. She was very devout. The psychotically depressed man, too, went to daily mass when he was not institutionalized. He prayed for relief. He still had his job and his hobby. He went to work regularly, taking medical leaves only when the invisible torment got too bad for him to trust himself, or when there was some radical new treatment the psychiatrists wanted him to try. They'd tried Tricyclics, M.A.O.I.s, insulin-comas, Selective-Serotonin-Reuptake-Inhibitors, the newand side-effect-laden Quadracyclics. They'd scanned his lobes and affective matrices for lesions and scars. Nothing worked. Not even high-amperage E.C.T. relieved It. This happens sometimes. Some cases of depression are beyond human aid. The man's case gave Kate Gompert the howling fantods. The idea of this man going to work and to Mass and building miniaturized railroad networks day after day after day while feeling anything like what Kate Gompert felt in that ward was simply beyond her ability to imagine. The rationo-spiritual part of her knew this man and his wife must be possessed of a courage way off any sort of known courage-chart. But in her toxified soul Kate Gompert felt only a paralyzing horror at the idea of the squat dead-eyed man laying toy track slowly and carefully in the silence of his wood-panelled rec room, the silence total except for the sounds of the track being oiled and snapped together and laid into place, the man's head full of poison and worms and every cell in his body screaming for relief from flames no one else could help with or even feel.
The permanently psychotically depressed man was finally transferred to a place on Long Island to be evaluated for a radical new type of psychosurgery where they supposedly went in and yanked out your whole limbic system, which is the part of the brain that causes all sentiment and feeling. The man's fondest dream was anhedonia, complete psychic numbing. I.e. death in life. The prospect of radical psychosurgery was the dangled carrot that Kate guessed still gave the man's life enough meaning for him to hang onto the windowsill by his fingernails, which were probably black and gnarled from the flames. That and his wife: he seemed genuinely to love his wife, and she him. He went to bed every night at home holding her, weeping for it to be over, while she prayed or did that devout thing with beads.
The couple had gotten Kate Gompert's mother's address and had sent Kate an Xmas card the last two years, Mr. and Mrs. Ernest Feaster of Wellesley Hills MA, stating that she was in their prayers and wishing her all available joy. Kate Gompert doesn't know whether Mr. Ernest Feaster's limbic system got yanked out or not. Whether he achieved anhedonia. The Xmas cards had had excruciating little watercolor pictures of locomotives on them. She could barely stand to think about them, even at the best of times, which the present was not.
— David Foster Wallace, Infinite Jest, pp. 692-998 (Little, Brown, 1996). Footnotes omitted.