text:
Every day we have many opportunities to help animals. Of course the biggest and best way to help animals is to become a vegan. Vegans save lives at least 3 times a day! (For help going vegan, check out these links.) But what about people who want to do a little more?
Here is a list of little ways to make a big difference! Always remember that if you are doing something – anything – the animals are better off than if you would have done nothing. No action is too small.
I am only one, but still I am one.
I cannot do everything, but still I can do something.
And because I cannot do everything, I will not refuse to do the something that I can do.
Edward Everett Hale
If you think you are too small or insignificant to have an effect, you obviously have never gotten into bed with a mosquito.
Ingrid Newkirk
- Become a PR person for the animals. Wear animal rights/vegetarian T-shirts, or put animal-friendly bumper stickers on your car. By becoming a walking (or driving) billboard for the animals you have the opportunity to educate thousands of people. Get them thinking! It is also a great way to identify yourself to like-minded folks. Get your own AZVegan bumper sticker! 8.5″ by 1.5″ vinyl stickers – smaller than normal bumper stickers. If you live in Arizona and would like one, just email your address to firstname.lastname@example.com and I'll send you one for free! Spread the word…expand the network…widen the circle!
- Get a "pet-friendly" license plate. It shows others how much you love animals – and it pays for spay and neuter services statewide to help end pet overpopulation. This gorgeous, four-color specialty license plate features original work by renowned artist RON BURNS and a tag line that reads, "Pets Enrich Our Lives." Best of all, this specialty plate is just $25 – and $17 from the sale of each pet-friendly license plate is deposited into a fund that pays for spay and neuter services for dogs and cats across Arizona! Order your pet-friendly plate today. The easiest way to get your plate is to visit www.servicearizona.com, (click on personalized /specialized plates) or call the ADOT Motor Vehicles Division office nearest you at:
Phoenix area – (602) 255-0072
Tucson area – (520) 629-9808
Elsewhere in AZ – (800) 251-5866
- Donate a subscription to a vegetarian publication to your local library or doctor's office. Or, donate veg books or videos to your library. (Be sure to talk to someone at the library to make sure they will be added to the permanent collection.)
- Download and print the display fliers for Why Vegan and Even If You Like Meat from Vegan Outreach! 8.5″ x 11″ flyers with tear-off tabs, perfect for hanging around your college campus.
- Give your money a voice! Several organizations offer personalized checks and credit cards. These not only speak out for the animals but a donation is made every time you use the credit card, so you are helping two ways with each purchase!. (Farm Sanctuary, PETA, Vegan Outreach) Every time someone sees your checks & credit cards it is another opportunity to get people thinking.
Check out www.messageproducts.com for checks and return address labels that benefit and advertise for a number of animal rights organizations.
Internet Purchases, Long Distance, etc. Vegan Outreach has several affiliates that make it easy to donate.
Surf for the animals! The ECO ISP (internet service provider) donates a full 50% of your monthly $15.95 charge to charity – refer them to Farm Sanctuary or your favorite group.
- Distribute animal rights literature. Carry literature with you at all times. You never know when someone is going to ask "Why do you eat like that?" Vegan Outreach and PETA both have great sites full of downloadable literature!Click here to read Compassion Over Killing's excellent "Tips For Successful Vegan Leafleting".
- Distribute copies of the audio cd, "Veganism in a Nutshell" and the video cd, "Meet Your Meat" from PETA. AZVegan.com will make a copy of either or both of these cds and mail them to you free of charge. Just send your name and address to email@example.com.
- Recycle the literature you receive! Many of us are on several animal-friendly mailing lists. If you already know about the suffering in the materials sent to you, pass them on to someone who might not. Enclose them in with your bills every month. Send them back to non-animal-related companies that enclose self-addressed stamped envelopes with their junk mail.
- Check PETA's Action Alerts page for current issues.Letters to the editor are a great way to have your voice heard! Click here for more info on sending a letter to the Arizona Republic.
Email is a great way to take action for the animals. But before you fire off your next angry letter, check out DawnWatch's page on e-mail etiquette. It has some great reminders on how to get your point across without alienating the recipient. Then, check out their e-mail action page to put some of those helpful hints to work!
Amazing website for activists: Find and contact national and local media quickly and easily. Check out http://www.congress.org/congressorg/dbq/media/ and get those letters flowing!
Government officials, heads of corporations, and legislators are most interested in hearing from average citizens, not obvious activists. So instead of lifting language directly from form letters, please always instead try composing a few, heartfelt sentences of your own.
- Start your own seasonal letter-writing campaigns. For Christmas, send letters to companies that test on animals asking them to "Celebrate the season with compassion!" or for Mother's Day, send No Veal literature to restaurants. Get creative! Tie this in with a letters to the editors at the same time.
- Help Farm Sanctuary raise needed funds for rescued farm animals by sponsoring a collection box. The collection boxes are a simple and easy way to raise much needed funding and educate thousands of people about the need to rescue and protect farm animals. To sponsor a collection box, please send $20 per box (to cover the cost of the box) to Farm Sanctuary, PO Box 150, Watkins Glen, NY 14891 and mark "Collection Box" on your check or money order. The box should then be displayed in an establishment with a good flow of traffic. Health food stores and vegetarian restaurants are good locations. If you have any questions on the collection box program or would like more information on Farm Sanctuary, please email firstname.lastname@example.com
- For more ideas, check out PETA's New Year's Resolutions – and be an effective animal advocate all year long!
- Visit IDA's Online Resource Center – your resource for animal rights materials and information. Whether you want to start your own animal rights group, document animal abuse at laboratories, distribute informational brochures to the public, or embark on a cruelty-free lifestyle, we hope you will find what you need to get started here. Be sure to check out the great media info under "How to Make the News".
- Check out the list of links under Activist Resources and Teen Activism for more ideas and info.


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The 60-inch water main that burst in Chevy Chase Monday is back in service after repairs were made late last week, and water restrictions have been lifted.
A 20-foot section of the five-foot pipe at the intersection of Connecticut Avenue and Chevy Chase Lake Drive had to be replaced, according to officials from the Washington Suburban Sanitary Commission.
The cause of the break is still being investigated and may take months to determine, officials said, who noted the incident resulted in the loss of nearly 60 million gallons of water.
Mandatory water restrictions set by WSSC when the break occurred have been lifted.
While the pipe underwent repairs, WSSC mandated that Prince George's and Montgomery County residents limited their water use to ensure enough available water for fire departments and emergencies.
WSSC officials had advised residents not to run washers and dryers, to take shorter showers and to turn off faucets when brushing teeth.
Damages to the area surrounding the water main break will take weeks to repair, WSSC officials said. Restoration is needed to roadways and sidewalks and damages trees will also have to be removed, officials said.
As a result, the far right northbound lane on Connecticut Avenue remains closed near the break, according to WSSC officials.
WSSC general manager and CEO Jerry N. Johnson issued a statement to thank customers and employees for their cooperation.
"We thank our customers for their conservation efforts and patience as we repaired this important transmission main, and we deeply regret the inconvenience this caused," Johnson said in a statement. "And I thank our people who worked tirelessly to be sure the repairs were made quickly and safely."

subset: commoncrawl


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- Description
- View Full Specifications
Wide Beam Broward
- Year:
- 1993
- Length:
- 108'
- Engine/Fuel Type:
- Twin / diesel
- Located In:
- Ft LAUDERDALE., FL
- Hull Material:
- Aluminum
- 76298-2429271
- Current Price:
This 108' Broward Motor Yacht with Raised Pilothouse is one of the few wide beam models built, A four stateroom layout with a tremendous full beam width salon, and open country kitchen galley, complement this fine Broward.
Her hull is painted a signature Whisper Gray color scheme, with white upper decks.some of the upgrades include, new decking in the aft section, new flatscreen in the salon, new grill topsides, new windshield upper helm, new deck furniture, and a custom carbon fiber boarding stair.
Independence II has completed some recent upgrades;
- Freshly painted hull June 2013
- 1 Engine majored June 2013
- New Salon headliner installed
- Flat screen TVs thoughout
This yacht has a great charter history, with many repeat clientele. Make sure this one is on the list to consider in a well maintained, well managed yacht.
Exclusive Yacht Sales
phone: 860.883.49041 fax: 860.388.4532
Please contact at 860-883-4904
Additional Specs, Equipment and Information:
Boat Name
Independence 2
Builder: BROWARD
LOA: 108 ft 0 in
Beam: 24 ft 0 in
Maximum Draft: 6 ft 0 in
Displacement: 175000 lbs
Engine 1:
Engine Brand: Detriot Diesel
Year Built: 1993
Engine Model: 16v92
Engine Type: Inboard
Engine/Fuel Type: Diesel
Location: Starboard
Engine Hours: 427
Drive Type: Direct Drive
Engine 2:
Engine Brand: Detriot Diesel
Year Built: 1993
Engine Model: 16v92
Engine Type: Inboard
Engine/Fuel Type: Diesel
Location: Port
Engine Hours: 2400
Drive Type: Direct Drive
Cruising Speed: 18 knots
Maximum Speed: 24 knots
Fresh Water Tanks: (1030 Gallons)
Fuel Tanks: 1 (10000 Gallons)
Number of cabins: 4
Number of heads: 5
- Aft deck alfresco dining for 8 at a new teak inlaid marketry table
- Couch at forward bulkhead seats 4
- Starboard forward bulkhead has water-tight engine room access and ladder
- Aft deck removable 42' plasma TV
- 4 overhead speaker(new 2007) and lighting in the overhead
- All new canvas covers 2007
- Custom Harley tie downs on deck
- Warping winches and cleats for stern to docking or dock assistance in high current or wind conditions
- Freshwater wash down on deck
Updates in 2013
NEW Headliner in salon
NEW hull paint
Deck touch-up
NEW Nu-Teak decking (2012)
Cap rails varnished
NEW Air Chiller
Bottom job
NEW Water Chest and thru hull valving
NEW Flatscreen TV's throughout (2012)
NEW Carbon Fiber Gangway (2012)
- Port Aft Built-In Couch
- Starboard Entertainment center with pop-up TV and niles remote system
- Lighted accent columns for decor
- Custom padded headliner
- Forward Staroard Business center with desk and two chairs and phone and computer
- Port full wet bar with seating for three, sub zero fridges in stainless steel and ice machine, wunderbar soda dispenser, perma pub, liquor cabinets built in to bar
- Forward centerline custom made table that convert from dining to cocktail size,two built-in couches (seating for 8)
- Port companionway has wet lockr and access to main deck
- Starboard grand foyer has access from main deck, and 4 steps up to the raised pilot house, day head access, and 8 steps down to guest accommodations
Alfresco dining on the aft deck, formal dining in the salon, breakfast areas in the country kitchen, and nook stye dining on the flybridge.
Powder Room
- Custom Vanity with decorative sink
- Microphor head
- Black stone surfaces for deck and counters
- 32 Flat screeen TV on port bulkhead
- All new granite counters and table tops (Ubba Tuba)
- New oven/stove/and commercia hood with plumbing to exterior (Summer 2007)
- New Microwave, subzero fridge, undercounter subzero fridges int eh island and port counter
- Kitchen aid ice maker
- Trash compactor under island counter
- Island single vegetable sink (new 2007)
- Additional double stainless steel sink for chef on outboard por countertop
- All new hinges, drawer boxes, and new Blue Motion hardware for all galley cabinetry allowing full extension of drawers
- Behind pocket door-aft galley walk-in pantry on port side of galley ith deep freeze top loader and plentiful pantry storage
- Breakfast area has new cushions and table top in Ubba Tuba t match galley counters
- Wood floors throughout couuntry kitchen area
Master Suite
- King bed accommodations with built-instorage underneath
- Port side sitting couch with ottoman foot rest
- Port and starboard bulkheads house 12-drawer dressers
- 6 book case shelves on starboard side of stateroom
- Entertainment center with lockbox safe and full entertainment electronics
- Phones on both bedsides that are both pBX and cell configured
- Every stateroom has individual receivers for TV and satellite
- Starboard walk-in closet with locking owner's area
Master Bath
- His/hers bath with walk-thru steam and multi=nozzle shower (new May 2007)
- Mirrored medicine cabinets with magnetic locks for privacy
- His and hers heads, vanity sinks and cabinetry
Port Fwd Guest Suite
- Twin with Pullman berth sleeps total of 3 guests
- Ensuite head shower and sink
- TV, DVD and stereo
- Hanging cedar closet
The Company offers the details of this vessel in good faith but cannot guarantee or warrant the accuracy of this information nor warrant the condition of the vessel. A buyer should instruct his agents, or his surveyors, to investigate such details as the buyer desires validated. This vessel is offered subject to prior sale, price change, or withdrawal without notice.
Other Boats from Island Cove Marina, LLC
Back Cove
Old Saybrook, CT, United States
Nor-Tech Nortech
340 Sport Open
Old Saybrook, CT, United States
Nortech Nor-Tech
340 Sport Center Console
Old Saybrook, CT, United States
340 Sport
Old Saybrook, CT, United States
400 Super Sport
OLD SAYBROOK, CT, United States
Old Saybrook, CT, United States


text:
Interpretive Handbook
81359 :
SS-B/La Antibodies, IgG, Serum
Clinical Information Discusses physiology, pathophysiology, and general clinical aspects, as they relate to a laboratory test
SS-B/La is an extractable nuclear antigen (ENA) composed of a 48-kD protein combined with RNA species. SS-B/La antibodies are found primarily in patients with Sjogren's syndrome or lupus erythematosus (LE), where they occur with frequencies of approximately 60% and 15%, respectively.(1,2) SS-B/La antibodies occur only infrequently in the absence of SS-A/Ro antibodies.
SS-B/La is 1 of 4 autoantigens commonly referred to as extractable nuclear antigens (ENAs). The other ENAs are SS-A/Ro, RNP, and Sm. Each ENA is composed of 1 or more proteins associated with cytoplasmic or small nuclear RNA species (snRNP) ranging in size from 80 to 350 nucleotides. Antibodies to ENAs are common in patients with connective tissue diseases (systemic rheumatic diseases) including LE, mixed connective tissue disease, Sjogren's syndrome, scleroderma (systemic sclerosis), and polymyositis/dermatomyositis.
See Connective Tissue Disease Cascade (CTDC) in Special Instructions and Optimized Laboratory Testing for Connective Tissue Diseases in Primary Care: The Mayo Connective Tissue Diseases Cascade in Publications.
Useful For Suggests clinical disorders or settings where the test may be helpful
Evaluating patients with signs and symptoms of a connective tissue disease in whom the test for antinuclear antibodies is positive
Interpretation Provides information to assist in interpretation of the test results
A positive result for SS-B/La antibodies is consistent with connective tissue disease, including Sjogren's syndrome and lupus erythematosus.
Cautions Discusses conditions that may cause diagnostic confusion, including improper specimen collection and handling, inappropriate test selection, and interfering substances
Testing for SS-B/La antibodies is not useful in patients without demonstrable antinuclear antibodies.
Reference Values Describes reference intervals and additional information for interpretation of test results. May include intervals based on age and sex when appropriate. Intervals are Mayo-derived, unless otherwise designated. If an interpretive report is provided, the reference value field will state this.
<1.0 U (negative)
> or =1.0 U (positive)
Reference values apply to all ages.
Clinical References Provides recommendations for further in-depth reading of a clinical nature
1. Homburger H, Larsen S: Detection of specific antibodies. In Clinical Immunology: Principles and Practice. First edition. Edited by R Rich, T Fleisher, B Schwartz, et al. St. Louis, Mosby-Year Book, 1996, pp 2096-2109
2. Kotzin B, West S: Systemic lupus erythematosus. In Clinical Immunology Principles and Practice. Second edition. Edited by R Rich, T Fleisher, W Shearer, et al. St. Louis, Mosby-Year Book, 2001, pp 60.1-60.24


text:
New Source Review
Related Links
- RACT/BACT/LAER Clearinghouse (RBLC) database contains information distilled from early notification submittals and air permits received from State and local air pollution control programs in the United States. The RBLC Web site also contains summary information on air pollution emission standards. The data assists State/local agency personnel and private companies in determining what types of controls and pollution prevention measures have been applied to and/or are required for various sources and the effectiveness of these technologies
- New Source Review Policy and Guidance Database is a searchable database which contains EPA-issued policy and guidance documents
- Support Center for Regulatory Air Models (SCRAM) has information on atmospheric dispersion (air quality) models used in NSR permitting
- National
Park Service PSD page.
This site contains information about Class I areas and air quality related
- Forest Service site on the Federal Land Managers' AQRV Work Group (FLAG ). FLAG is an interagency workgroup whose objective is to achieve greater consistency in the procedures Federal Land Managers use in identifiying air quality related values (AQRVs) and for evaluating the effects of air pollution on AQRVs in Federal Class I air quality areas and some Class II areas
- EPA's Region 4 NSR Permits Page has national spreadsheets on combustion turbines and coal-fired utilities
- Operating
Permits Program discusses the kind of operating permit (called a
title V operating permit) that most large sources and some smaller sources
of air pollution are required to obtain
- Environmental Appeals Board is the final Agency decisionmaker on administrative appeals under all major environmental statutes that the Agency administers.
- Section 112(g) of the Clean Air Act requires some sources of air toxics to get a permit before starting construction
- EPA's Environmental Justice Web site provides information about EPA's efforts to involve people of all race, color, national origin, and income in the development, implementation, and enforcement of environmental regulations like NSR
- Compliance and enforcement information
- EPA's Enforcement and Compliance History Online (ECHO) database allows you to find pollution sources near you and their compliance history.
- Enforcement
contains links to Clean Air Act guidance documents pertaining to NSR
and PSD
- The Air Quality Index (AQI) - Air Now tells you how clean the air is and whether it will affect your health. EPA, state, and local agencies work together to report current and forecast conditions for ozone and particle pollution.
- AirData gives you access to air pollution data for the entire United States including the location on nonattainment areas
- National Ambient Air Quality Standards
- Clean Air Act


text:
June 2011
AMA president's promo of Mar town hall raises eyebrows
Thursday afternoon, just before 2 pm, Patrick (P.J.) White, the president of the Alberta Medical Association, sent a rather unusual email to the association's 10,000 physician members. The email, which appears to have been cut-and-pasted from the Gary Mar Progressive … Continue reading
And the nominees are …
At least eight Edmonton acts are nominated for the 2011 edition of the Western Canadian Music Awards: * Hey Romeo, That's What I Am: Country Recording of the Year * Manuela, A Different Kind of Fire: … Continue reading
Day 4 of Sled Island: CVG, Dandy Warhols, Of Montreal
Without further ado, here are some of Aaron Gryschuk-Vanimere's photos from the final day of Calgary's Sled Island extravaganza. (I didn't have time to post them sooner, sorry.) Above, you'll notice a few snaps of Cowtown's indie hero, Chad … Continue reading
Revving up the fun
Their hopes for a downtown party tent were dashed by the city of Edmonton, but the owners and staff of Oil City Hospitality Group refuse to let the setback ruin their Edmonton Indy fun. The company will now host four … Continue reading
Will the Oilers have to sweeten the pot in the Ryan Smyth trade?
Contradictory reports on whether Oilers will have to take back Colin Fraser and give a different play to the Kings… Continue reading
GreatStuff@noon – June 30 – Drive for sight, PA announcers wanted, and, THEY'RE HERE!
Drive for Sight is the perfect summer afternoon charity event featuring exotic cars, friendly competition, and great food & wine. On Sunday, July 10th at 2:30 pm teams of cars will meet at Jack's Grill in Edmonton for a group … Continue reading
Remembering Todd Marchant, the little Oiler that could
* * * The quality of the above video is terrible, best I could find on short notice. Oiler fans of a certain vintage won't mind, as the sequence is emblazoned in their minds like "Henderson has scored for Canada!" … Continue reading
The Black Keys get glittery
This is one of my favourite moments from The Black Keys' show at Rexall Place … a huge mirrorball, lighting up the arena like a glittery moon, during Everlasting Light. Click here for my review of the concert.… Continue reading
Game, set and match, but no pooch for Wimbledon star
Novak Djokovic has advanced to the semifinals at Wimbledon but he's still stewing over the absence of his beloved pooch, Pierre, who was not allowed to travel to London with him. The two apparently go everywhere together, but bureaucratic red … Continue reading
Caernarvon. What? How do you even pronounce that?
How on earth do neighbourhoods got their names? Take Caernarvon, or Overlanders, for that matter – Meyonohk, Sakaw. What? How do you even pronounce Caernarvon? Apparently there's a committee for that. Here's an email I got from Cory Sousa, … Continue reading


text:
Covenant Health serves over 1.2 million people – and always strives to do it with the highest caliber of medical care. With one of the largest health systems in the entire region, our Christian mission of healing is accomplished with the help of the highly trained and distinguished doctors that make up our medical staff.
Use our online physician search to find the right doctor for you.
You can Pre-Register for a number of services online.
We provide a number of classes & events, click here to see them.
4000 24th Street
Lubbock, TX 79410
Click here for more information.
Learn about the many ways to help us at Covenant.
Give the gift of time!Click here to learn more.
Covenant Health is a member of St. Joseph Health, one of the most successful not-for-profit health systems in the United States. It was founded in 1998 through the merger of two of Lubbock's most venerable heath care facilities, St. Mary of the Plains Hospital and Lubbock Methodist Hospital System.
St. Mary Hospital was founded in 1937 as the 10-bed Plains Hospital and Clinic, becoming St. Mary of the Plains Hospital in 1939, when the Sisters of St. Joseph of Orange, California, purchased the facility. Today, St. Mary of the Plains Hospital is known as Covenant Medical Center–Lakeside.
The facility now known as Covenant Medical Center began as the 25-bed Lubbock Sanitarium in 1918. The facility became known as Lubbock General Hospital in 1941, then Lubbock Memorial Hospital in 1945. In 1954, it became Methodist Hospital.
For Patient Information:
Billing & Patient Accounts:
806.725.5773 or 800.378.4189
Find a Physician |
Calendar |
Newsroom |
Health Resource Center |
Physicians Only |
For Employees |
Privacy Policy


text:
Brand New is an American rock band from Long Island, New York. Formed in 2000, the band currently consists of vocalist/guitarist/lyricist Jesse Lacey, guitarist/vocalist/lyricist Vincent Accardi, bassist Garrett Tierney, drummer Brian Lane, and guitarist/keyboardist Derrick Sherman. In the late 1990s, Jesse Lacey, Garrett Tierney, and Brian Lane were all members of the band The Rookie Lot. They eventually split off from the other members of the group, and in 2000 formed Brand New in Merrick, New York. The band signed to Triple Crown Records and in 2001 released their debut studio album, Your Favorite Weapon. Their second album, Deja Entendu, was released in 2003 and marked a stylistic change for the band. The album's first two singles, "The Quiet Things That No One Ever Knows" and "Sic Transit Gloria... Glory Fades", both received airplay on MTV2 and Fuse TV, entering the top 40 on the United Kingdom Singles Chart. Deja Entendu was eventually certified gold in the United States. Brand New moved to Interscope Records and released The Devil and God Are Raging Inside Me in 2006. "Jesus Christ" became their highest charting single in the US, peaking at number 30 on the Alternative Songs chart. In March 2008, the band started their own record label, named Procrastinate! Music Traitors. Their fourth album, Daisy, was released in 2009 and became their highest charting album in the US, reaching number six on the Billboard 200.
This area is intended for discussion only. If you have a question about your order, or require customer service you can get in touch via our Customer Service Area. Comments enquiring about existing orders, including personal details, or with questions will be deleted.


text:
When I move up to a higher tier, how long do I keep the benefits for?
Regardless of how many Tier Miles you have earned or flights you have flown, your card validity and benefits are extended beyond the tier review date by an extra two months, even if you have not qualified to stay in your tier.
For example, if you achieve Silver membership on 17th October 2014, your tier review date will be at the end of October 2015, but you can still use your Silver card to enjoy extended benefits until the end of December 2015, even if you do not retain your tier.
Tier reviews always take place at the end of a month.
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text:
Solution: Create a portable storage container for camping related eating, cooking and cleanup tasks that:
1. fits in the bed of my pickup.
2. folds down for easy storage.
3. expands at the camp site to provide more work space.
4. contains all the basic eating, cooking and cleanup equipment.
5. built from common on-hand materials and keep costs to a minimum.
and lastly,
6. stores easily at home ready for the next adventure.
Too good to be true? well let's give it a shot. This is a prototype version and depending on how it performs out in the field, may go through some changes.
I've attached a working drawing with dimensions that work for me. You may need to alter them to fit your needs. Good luck!
Difficulty scale: Depending on your carpentry skills, I'm rating this a 6 out of 10.
I'm looking to replicate yours, or something similar, great job! 1 Question, with all the 3/4" ply, what's it weigh? In other words, is it a 1-man lift, or 2-man?
Love this! Thanks for sharing! As I look at the plans for the base, I think I am going to attempt to build it with all the hinges in the corners intact and add two more hinges in the middle of the right and left sides so the sides can fold inwards and the whole box "flattens." Wish me luck!
Good Job, well thought out design
Us Boy Scouts have been using things like this for many, many yrs. I believe we originally borrowed the design from the military. Back when the Boy Scouts were originally formed. It was a British military officer that formed the Boy Scouts in England.
really a good job and a good idea.... to make one!
In one of the photos on the last page, it looked like the fold out table tops were starting to bend. Did you have any issues with weight in testing?
For latches, did you consider rare earth magnets? There's a couple of products out there that use the magnet to hold the door shut, and then a wand you apply to the back of the latch area (another magnet inside) that pulls the metal away from the latch magnet so you can open it. This wand can be connected via string and stored by the handles.
Still a nice job!
Wonderful instructable! Keep 'em coming!


text:
|Publication number
|Publication type
|Application number
|Publication date
|Mar 16, 2006
|Filing date
|Jul 27, 2005
|Priority date
|Mar 16, 2002
|Also published as
|Publication number
|Hongmei Zhang, Mukundan Narasimhan, Ravi Mullapudi, Richard Demaray
|Original Assignee
|Symmorphix, Inc.
|Export Citation
|BiBTeX, EndNote, RefMan
|Referenced by (10), Classifications (34), Legal Events (7)
|External Links: USPTO, USPTO Assignment, Espacenet
1. Field of the Invention
The present invention relates to deposition of oxide and oxynitride films and, in particular, to deposition of oxide and oxynitride films by pulsed DC reactive sputtering.
2. Discussion of Related Art
Deposition of insulating materials and especially optical materials is technologically important in several areas including production of optical devices and production of semiconductor devices. In semiconductor devices, doped alumina silicates can be utilized as high dielectric insulators.
The increasing prevalence of fiber optic communications systems has created an unprecedented demand for devices for processing optical signals. Planar devices such as optical waveguides, couplers, splitters, and amplifiers, fabricated on planar substrates, like those commonly used for integrated circuits, and configured to receive and process signals from optical fibers are highly desirable. Such devices hold promise for integrated optical and electronic signal processing on a single semiconductor-like substance.
The basic design of planar optical waveguides and amplifiers is well known, as described, for example, in U.S. Pat. No. 5,119,460 and U.S. Pat. No. 5,563,979 to Bruce et al., U.S. Pat. No. 5,613,995 to Bhandarkar et al., U.S. Pat. No. 5,900,057 to Buchal et al., and U.S. Pat. No. 5,107,538 to Benton et al., to cite only a few. These devices, very generally, include a core region, typically bar shaped, of a certain refractive index surrounded by a cladding region of a lower refractive index. In the case of an optical amplifier, the core region includes a certain concentration of a dopant, typically a rare earth ion such as an erbium or praseodymium ion which, when pumped by a laser, fluoresces, for example, in the 1550 nm and 1300 nm wavelength ranges used for optical communication, to amplify the optical signal passing through the core.
As described, for example in the patents by Bruce et al., Bhandarkar et al, and Buchal et al., planar optical devices may be fabricated by process sequences including forming a layer of cladding material on a substrate; forming a layer of core material on the layer of cladding mater; patterning the core layer using a photolighotgraphic mask and an etching process to form a core ridge; and covering the core ridge with an upper cladding layer.
The performance of these planar optical devices depends sensitively on the value and uniformity of the refractive index of the core region and of the cladding region, and particularly on the difference in refractive index, Δn, between the regions. Particularly for passive devices such as waveguides, couplers, and splitters, Δn should be carefully controlled, for example to values within about 1%, and the refractive index of both core and cladding need to be highly uniform, for some applications at the fewer than parts per thousand level. In the case of doped materials forming the core region of planar optical amplifiers, it is important that the dopant be uniformly distributed so as to avoid non-radiative quenching or radiative quenching, for example by upconversion. The refractive index and other desirable properties of the core and cladding regions, such as physical and chemical uniformity, low stress, and high density, depend, of course, on the choice of materials for the devices and on the processes by which they are fabricated.
Because of their optical properties, silica and refractory oxides such as Al2O3, are good candidate materials for planar optical devices. Further, these oxides serve as suitable hosts for rare earth dopants used in optical amplifiers. A common material choice is so-called low temperature glasses, doped with alkali metals, boron, or phosphorous, which have the advantage of requiring lower processing temperatures. In addition, dopants are used to modify the refractive index. Methods such as flame hydrolysis, ion exchange for introducing alkali ions in glasses, sputtering, and various chemical vapor deposition processes (CVD) have been used to form films of doped glasses. However, dopants such as phosphorous and boron are hygroscopic, and alkalis are undesirable for integration with electronic devices. Control of uniformity of doping in CVD processes can be difficult and CVD deposited films can have structural defects leading to scattering losses when used to guide light. In addition, doped low temperature glasses may require further processing after deposition. A method for eliminating bubbles in thin films of sodium-boro-silicate glass by high temperature sintering is described, for example, in the '995 patent to Bhandarkar et al.
Typically, RF sputtering has been utilized for deposition of oxide dielectric films. However, RF sputtering utilizes ceramic targets which are typically formed of multiple smaller tiles. Since the tiles can not be made very large, there may be a large problem of arcing between tiles and therefore contamination of the deposited film due to this arcing. Further, the reactors required for RF sputtering tend to be rather complicated. In particular, the engineering of low capacitance efficient RF power distribution to the cathode is difficult in RF systems. Routing of low capacitance forward and return power into a vacuum vessel of the reaction chamber often exposes the power path in such a way that diffuse plasma discharge is allowed under some conditions of impedance tuning of the matching networks.
Therefore, there is a need for new methods of depositing oxide and oxynitride films and for forming planar optical devices.
In accordance with the present invention, a sputtering reactor apparatus for depositing oxide and oxynitride films is presented. Further, methods for depositing oxide and oxynitride films for optical waveguide devices are also presented. A sputtering reactor according to the present invention includes a pulsed DC power supply coupled through a filter to a target and a substrate electrode coupled to an RF power supply. A substrate mounted on the substrate electrode is therefore supplied with a bias from the RF power supply.
The target can be a metallic target made of a material to be deposited on the substrate. In some embodiments, the metallic target is formed from Al, Si and various rare-earth ions. A target with an erbium concentration, for example, can be utilized to deposit a film that can be formed into a waveguide optical amplifier.
A substrate can be any material and, in some embodiments, is a silicon wafer. In some embodiments, RF power can be supplied to the wafer. In some embodiments, the wafer and the electrode can be separated by an insulating glass.
In some embodiments, up to about 10 kW of pulsed DC power at a frequency of between about 40 kHz and 350 kHz and a reverse pulse time of up to about 5 μs is supplied to the target. The wafer can be biased with up to about several hundred watts of RF power. The temperature of the substrate can be controlled to within about 10� C. and can vary from about −50� C. to several hundred degrees C. Process gasses can be fed into the reaction chamber of the reactor apparatus. In some embodiments, the process gasses can include combinations of Ar, N2, O2, C2F6, CO2, CO and other process gasses.
Several material properties of the deposited layer can be modified by adjusting the composition of the target, the composition and flow rate of the process gasses, the power supplied to the target and the substrate, and the temperature of the substrate. For example, the index of refraction of the deposited layer depends on deposition parameters. Further, in some embodiments stress can be relieved on the substrate by depositing a thin film of material on a back side of the wafer. Films deposited according to the present invention can be utilized to form optical waveguide devices such as multiplexers and rare-earth doped amplifiers.
These and other embodiments, along with examples of material layers deposited according to the present invention, are further described below with respect to the following figures.
In the figures, elements having the same designation have the same or similar function.
Reactive DC magnetron sputtering of nitrides and carbides is a widely practiced technique, but the reactive dc magnetron sputtering of nonconducting oxides is done rarely. Films such as aluminum oxide are almost impossible to deposit by conventional reactive DC magnetron sputtering due to rapid formation of insulating oxide layers on the target surface. The insulating surfaces charges up and result in arcing during process. This arcing can damage the power supply, produce particles and degrade the properties of deposited oxide films.
RF sputtering of oxide films is discussed in application Ser. No. 09/903,050 (the '050 application) by Demaray et al., entitled "Planar Optical Devices and Methods for Their Manufacture," assigned to the same assignee as is the present invention, herein incorporated by reference in its entirety. Further, targets that can be utilized in a reactor according to the present invention are discussed in U.S. application Ser. No. {Attorney Docket No. M-12247 US} (the '247 application), filed concurrently with the present disclosure, assigned to the same assignee as is the present invention, herein incorporated by reference in its entirety. A gain-flattened amplifier formed of films deposited according to the present invention are described in U.S. application Ser. No. {Attorney Docket No. M-12652 US} (the '652 application), filed concurrently with the present disclosure, assigned to the same assignee as is the present invention, herein incorporated by reference in its entirety. Further, a mode size converter formed with films deposited according to the present invention is described in U.S. application Ser. No. {Attorney Docket No. M-12138 US} (the '138 application), filed concurrently with the present disclosure, assigned to the same assignee as is the present invention, herein incorporated by reference in its entirety.
Apparatus 10 includes a target 12 which is electrically coupled through a filter 15 to a pulsed DC power supply 14. In some embodiments, target 12 is a wide area sputter source target, which provides material to be deposited on substrate 16. Substrate 16 is positioned parallel to and opposite target 12. Target 12 functions as a cathode when power is applied to it and is equivalently termed a cathode. Application of power to target 12 creates a plasma 53. Substrate 16 is capacitively coupled to an electrode 17 through an insulator 54. Electrode 17 can be coupled to an RF power supply 18. Magnet 20 is scanned across the top of target 12.
For pulsed reactive dc magnetron sputtering, as performed by apparatus 10, the polarity of the power supplied to target 12 by power supply 14 oscillates between negative and positive potentials. During the positive period, the insulating layer on the surface of target 12 is discharged and arcing is prevented. To obtain arc free deposition, the pulsing frequency exceeds a critical frequency that depend on target material, cathode current and reverse time. High quality oxide films can be made using reactive pulse DC magnetron sputtering in apparatus 10.
Pulsed DC power supply 14 can be any pulsed DC power supply, for example an AE Pinnacle plus 10K by Advanced Energy, Inc. With this example supply, up to 10 kW of pulsed DC power can be supplied at a frequency of between 0 and 350 KHz. The reverse voltage is 10% of the negative target voltage. Utilization of other power supplies will lead to different power characteristics, frequency characteristics and reverse voltage percentages. The reverse time on this embodiment of power supply 14 can be adjusted between 0 and 5 μs.
Filter 15 prevents the bias power from power supply 18 from coupling into pulsed DC power supply 14. In some embodiments, power supply 18 is a 2 MHz RF power supply, for example can be a Nova-25 power supply made by ENI, Colorado Springs, Co.
Therefore, filter 15 is a 2 MHz band rejection filter. In some embodiments, the band width of the filter can be approximately 100 kHz. Filter 15, therefore, prevents the 2 MHz power from the bias to substrate 16 from damaging power supply 18.
However, both RF and pulsed DC deposited films are not fully dense and most likely have columnar structures. These columnar structures are detrimental for optical wave guide applications due to the scattering loss caused by the structure. By applying a RF bias on wafer 16 during deposition, the deposited film can be dandified by energetic ion bombardment and the columnar structure can be substantially eliminated.
In the AKT-1600 based system, for example, target 12 can have an active size of about 675.70�582.48 by 4 mm in order to deposit films on substrate 16 that have dimension about 400�500 mm. The temperature of substrate 16 can be held at between −50C and 500C. The distance between target 12 and substrate 16 can be between about 3 and about 9 cm. Process gas can be inserted into the chamber of apparatus 10 at a rate up to about 200 sccm while the pressure in the chamber of apparatus 10 can be held at between about 0.7 and 6 millitorr. Magnet 20 provides a magnetic field of strength between about 400 and about 600 Gauss directed in the plane of target 12 and is moved across target 12 at a rate of less than about 20-30 sec/scan. In some embodiments utilizing the AKT 1600 reactor, magnet 20 can be a race-track shaped magnet with dimension about 150 mm by 600 mm.
A top down view of magnet 20 and wide area target 12 is shown in
In some embodiments, magnet 20 extends beyond area 52 in one direction, the Y direction in
The combination of a uniform target 12 with a target area 52 larger than the area of substrate 16 can provide films of highly uniform thickness. Further, the material properties of the film deposited can be highly uniform. The conditions of sputtering at the target surface, such as the uniformity of erosion, the average temperature of the plasma at the target surface and the equilibration of the target surface with the gas phase ambient of the process are uniform over a region which is greater than or equal to the region to be coated with a uniform film thickness. In addition, the region of uniform film thickness is greater than or equal to the region of the film which is to have highly uniform optical properties such as index of refraction, density, transmission or absorptivity.
Target 12 can be formed of any materials, but is typically metallic materials such as, for example, combinations of Al and Si. Therefore, in some embodiments, target 12 includes a metallic target material formed from intermetalic compounds of optical elements such as Si, Al, Er and Yb. Additionally, target 12 can be formed, for example, from materials such as La, Yt, Ag, Au, and Eu. To form optically active films on substrate 16, target 12 can include rare-earth ions. In some embodiments of target 12 with rare earth ions, the rare earth ions can be pre-alloyed with the metallic host components to form intermetalics. See the '247 application.
In several embodiments of the invention, material tiles are formed. These tiles can be mounted on a backing plate to form a target for apparatus 10.
Several useful examples of target 12 that can be utilized in apparatus 10 according to the present invention include the following targets compositions: (Si/Al/Er/Yb) being about (57.0/41.4/0.8/0.8), (48.9/49/1.6/0.5), (92/8/0/0), (60/40/0/0), (50/50/0/0), (65/35/0/0), (70/30/0,0), and (50,48.5/1.5/0) cat. %, to list only a few. These targets can be referred to as the 0.8/0.8 target, the 1.6/0.5 target, the 92-8 target, the 60-40 target, the 50-50 target, the 65-35 target, the 70-30 target, and the 1.5/0 target, respectively. The 0.8/0.8, 1.6/0.5, and 1.5/0 targets can be made by pre-alloyed targets formed from an atomization and hot-isostatic pressing (HIPing) process as described in the '247 application. The remaining targets can be formed, for example, by HIPing. Targets formed from Si, Al, Er and Yb can have any composition. In some embodiments, the rare earth content can be up to 10 cat. % of the total ion content in the target. Rare earth ions are added to form active layers for amplification. Targets utilized in apparatus 10 can have any composition and can include ions other than Si, Al, Er and Yb, including: Zn, Ga, Ge, P, As, Sn, Sb, Pb, Ag, Au, and rare earths: Ce, Pr, Nd, Pm, Sm, Eu, Gd, Th, Dy Ho, Er, Tm Yb and Lu.
Optically useful materials to be deposited onto substrate 16 include oxides, fluorides, sulfides, nitrides, phosphates, sulfates, and carbonates, as well as other wide band gap semiconductor materials. To achieve uniform deposition, target 12, itself can be chemically uniform and of uniform thickness over an extended area.
Target 12 can be a composite target fabricated from individual tiles, precisely bonded together on a backing plate with minimal separation, as is discussed further with respect to
Substrate 16 can be a solid, smooth surface. Typically, substrate 16 can be a silicon wafer or a silicon wafer coated with a layer of silicon oxide formed by a chemical vapor deposition process or by a thermal oxidation process. Alternatively, substrate 16 can be a glass, such as Corning 1737 (Corning Inc., Elmira, N.Y.), a glass-like material, quartz, a metal, a metal oxide, or a plastic material. Substrate 16 can be supported on a holder or carrier sheet that may be larger than substrate 16. Substrate 16 can be electrically biased by power supply 18.
In some embodiments, the area of wide area target 12 can be greater than the area on the carrier sheet on which physically and chemically uniform deposition is accomplished. Secondly, in some embodiments a central region on target 12, overlying substrate 16, can be provided with a very uniform condition of sputter erosion of the target material. Uniform target erosion is a consequence of a uniform plasma condition. In the following discussion, all mention of uniform condition of target erosion is taken to be equivalent to uniform plasma condition. Uniform target erosion is evidenced by the persistence of film uniformity throughout an extended target life. A uniformly deposited film can be defined as a film having a nonuniformity in thickness, when measured at representative points on the entire surface of a substrate wafer, of less than about 5% or 10%. Thickness nonuniformity is defined, by convention, as the difference between the minimum and maximum thickness divided by twice the average thickness. If films deposited from a target from which more than about 20% of the weight of the target has been removed continue to exhibit thickness uniformity, then the sputtering process is judged to be in a condition of uniform target erosion for all films deposited during the target life.
As shown in
In addition, region 52 in which deposition provides uniformity of deposited film can be larger than the area in which the deposition provides a film with uniform physical or optical properties such as chemical composition or index of refraction. In some embodiments, target 12 is substantially planar in order to provide uniformity in the film deposited on substrate 16. In practice, planarity of target 12 can mean that all portions of the target surface in region 52 are within a few millimeters of a planar surface, and can be typically within 0.5 mm of a planar surface.
Other approaches to providing a uniform condition of sputter erosion rely on creating a large uniform magnetic field or a scanning magnetic field that produces a time-averaged, uniform magnetic field. For example, rotating magnets or electromagnets can be utilized to provide wide areas of substantially uniform target erosion. For magnetically enhanced sputter deposition, a scanning magnet magnetron source can be used to provide a uniform, wide area condition of target erosion.
As illustrated in
The process gas utilized in reactor 10 includes an inert gas, typically argon, used as the background sputtering gas. Additionally, with some embodiments of target 12, reactive components such as, for example, oxygen may be added to the sputtering gas. Other gasses such as N2, NH3, CO, NO, CO2, halide containing gasses other gas-phase reactants can also be utilized. The deposition chamber can be operated at low pressure, often between about 0.5 millitorr and 8-10 millitorr. Typical process pressure is below about 3-5 millitorr where there are very few collisions in the gas phase, resulting in a condition of uniform "free molecular" flow. This ensures that the gas phase concentration of a gaseous component is uniform throughout the process chamber. For example, background gas flow rates in the range of up to about 200 sccm, used with a pump operated at a fixed pumping speed of about 50 liters/second, result in free molecular flow conditions.
The distance d, in
The speed at which a scanning magnet 20 can be swept over the entire target can be determined such that a layer thickness less than about 5 to 10 Å, corresponding roughly to two to four monolayers of material, is deposited on each scan. Magnet 20 can be moved at rates up to about 30 sec/one-way scan and typically is moved at a rate of about 4 sec/one-way scan. The rate at which material is deposited depends on the applied power and on the distance d, in
Substrate bias has been used previously to planarize RF sputtered deposited quartz films. A theoretical model of the mechanism by which substrate bias operates, has been put forward by Ting et al. (J. Vac. Sci. Technol. 15, 1105 (1978)). When power is applied to the substrate, a so-called plasma sheath is formed about the substrate and ions are coupled from the plasma. The sheath serves to accelerate ions from the plasma so that they bombard the film as it is deposited, sputtering the film, and forward scattering surface atoms, densifying the film and eliminating columnar structure. The effects of adding substrate bias are akin to, but more dramatic than, the effects of adding the low frequency RF component to the sputter source.
Biasing substrate 16 results in the deposited film being simultaneously deposited and etched. The net accumulation of film at any point on a surface depends on the relative rates of deposition and etching, which depend respectively, on the power applied to the target and to the substrate, and to the angle that the surface makes with the horizontal. The rate of etching is greatest for intermediate angles, on the order of 45 degrees, that is between about 30 and 60 degrees.
Powers to target 12 and substrate 16 can be adjusted such that the rates of deposition and etching are approximately the same for a range of intermediate angles. In this case, films deposited with bias sputtering have the following characteristics. At a step where a horizontal surface meets a vertical surface, the deposited film makes an intermediate angle with the horizontal. On a surface at an intermediate angle, there will be no net deposition since the deposition rate and etch rate are approximately equal. There is net deposition on a vertical surface.
Target 12 can have an active size of about 675.70�582.48 by 4 mm, for example, in a AKT-1600 based system in order to deposit films on a substrate 16 that is about 400�500 mm. The temperature of substrate 16 can be held at between −50C and 500C. The distance between target 12 and substrate 16 can be between 3 and 9 cm. Process gas can be inserted into the chamber of apparatus 10 at a rate of between about 30 to about 100 sccm while the pressure in the chamber of apparatus 10 can be held at below about 2 millitorr. Magnet 20 provides a magnetic field of strength between about 400 and about 600 Gauss directed in the plane of target 12 and is moved across target 12 at a rate of less than about 20-30 sec/scan.
Therefore, any given process utilizing apparatus 10 can be characterized by providing the power supplied to target 12, the power supplied to substrate 16, the temperature of substrate 16, the characteristics and constituents of the reactive gasses, the speed of the magnet, and the spacing between substrate 16 and target 12.
Sputtered oxide films according to some embodiments of the present invention can be deposited onto a Si wafer or thermal oxide wafers at pressure of between about 3 and about 6 mTorr. The ratio of O2/Ar gas flow can be set at a value to ensure that target 12 is operating within a poison mode. The poison mode is defined as the ratio where the oxide is etched from the surface of target 12 as fast as the oxide layer is formed. Operating in the poison mode results in the stoichiometric film. Sub-stoichiometric oxides may not be optically transparent. The pulsing frequency range for power supply 14 can be from about up to about 250 KHz. The frequency 40 KHz is approximately the lowest frequency at which no arcing will occur during deposition in, for example, the AKT 1600 based system. The reverse pulsing time is determined by the amount of arcing generated during the process. Longer reverse time means longer discharge time and thus less arcs. However, if the reverse time is too long, the deposition rate will decrease. Power supply 18 is a 2 MHz RF power supply operated at powers up to several hundred Watts.
Reactive sputtering from a metal or metallic alloy target 12 can be characterized by two modes of operation. In the first mode, which is sometimes referred to as the 'metallic mode' the surface of target 12 is substantially metallic. This mode is characterized by a small addition of reactive gas to the inert gas flow of apparatus 10 as well as a higher impedance magnetron discharge. It is also characterized by incomplete oxidation of film deposited on substrate 16 and therefore higher index films. As the proportion of reactive to inert gas is increased, the sputter voltage at target 12 begins to fall at constant power.
As shown in
At slightly higher oxygen flow during deposition, the oxide layer on target 12 forms a continuous layer and the voltage of target 12 during deposition falls rapidly to the range of about 190 to about 270 Volts, indicating complete coverage of the surface of target 12 with an oxide that is at least as thick as the material removed during one scan of the magnetron. Under this condition, the rate of oxide formation on the surface of target 12 equals or exceeds the rate of sputter removal of the surface of target 12 by the moving magnetron 20. This condition is sometimes referred to as the 'poisoned mode'.
Under steady state DC voltage conditions, the oxide layer on target 12 soon charges up, leading to reduced rate of sputtering and increased micro-arc discharging in apparatus 10. This discharging leads to particulation of the oxide layer on target 12, which degrades the quality of a film deposited on substrate 16. In the example shown with
In the case of a magnetron configuration of magnet 20 having a significant deep local target erosion (rather than a configuration of magnet 20 described above which yields uniform target erosion), the change in the target voltage of target 12 is more gradual with increasing oxygen flow since it is more difficult to establish an oxide condition at the center of an intense region of local erosion. The resulting deposited film, however, will be rich in metallic sputtered flux to the substrate in the region of higher sputter erosion, leading to non uniform stoicheometry and non-uniform indices of refraction in a film deposited on substrate 16. In the case of a scanning magnetron 20 with uniform target erosion, the change in the surface condition from metallic to poisoned is more abrupt, as the formation rate of the oxide increases to equal the sputter removal of the oxide over a wide area of the target. In this case, there is uniform distribution of sputtered oxide from the target. Uniform stoicheometry and uniform indices of refraction result for the film deposited on substrate 16.
At the opposite extreme, a pure aluminum embodiment of target 12 (100% Al) can be utilized to deposit films on substrate 16 under similar process conditions as is utilized to deposit pure silica films on substrate 16. In the case of the pure aluminum reactive deposition, the dependence of the index of refraction of the film deposited on substrate 16 on oxygen flow as well as on the frequency of the pulsed DC process can be examined. As a result, a larger range of effective index of refraction is achieved together with a reduced or zero dependence of the index on the subsequent anneal process. Six targets having differing aluminum composition were utilized to evaluate the index of refraction of sputtered films on substrate 16 of related composition. The largest change of index with the sputtering conditions is achieved for composition near the middle of the Al/Si composition range (about 50% Al and 50% Si).
In step 402 of
In step 404, the substrate temperature is set. Substrate 16 may be brought to temperature over a period of time. In step 405, the scan characteristics of magnet 20 are fixed. In step 406, the power setting for power supply 18 is set. Finally, in step 407, the parameters of pulsed DC power supply 14 is set, including the power, frequency, and reverse pulsing time. In step 408, then, a film that depends on the parameters of reactor apparatus 10 is deposited on substrate 16. In some embodiments, films deposited by procedure 400 are thermally annealed after deposition.
In some embodiments, films deposited by a pulsed DC biased method according to the present invention are uniformly amorphous throughout their thickness. As has been discussed above, biasing of substrate 16 leads to densification and uniformity in the deposited film.
Deposition of films according to the present invention can be utilized to deposit cladding layers, active core layers, and passive core layers of an optical amplifier structure or optical waveguide structure. In some applications, for example multiplexer structures, the separation between adjacent waveguides can be small, for example about 8 μm. In some embodiments, the deposition parameters of the upper cladding layer can be adjusted to not only adjust the index of refraction of the layer, but also to insure that the spacing between adjacent waveguides is small.
The time for planarization can be estimated as
where W is the width of structure 2201, H is the height of structure 2201, aflat refers to the accumulation rate on the flat surface, amin refers to the accumulation rate on the minimum accumulation slope, and α is the surface angle from the horizontal plane of the minimum accumulation slope.
Therefore, as illustrated in
Therefore, depositions of various films in embodiments of apparatus 10 according to the present invention with several embodiments of target 12 and the effects on index of refraction, uniformity of films, and fill characteristics of varying several of the process parameters has been discussed above. In some embodiments, stress effects due to wafer bowing of substrate 16 can also be reduced. Wafer bowing of substrate 16 can be reduced, reducing the stress in a film deposited on substrate 16, by, for example, depositing a film on the backside of substrate 16 before deposition of a film on substrate 16. In some embodiments, a film having a similar thickness of a similar layer of material can be deposited on backside of substrate 16 prior to deposition of the film on substrate 16 according to the present invention. The wafer bowing resulting from differing thermal expansions of the film and substrate 16 is therefore countered by a similar stress from another film deposited on the backside of substrate 16.
Several specific examples film depositions utilizing apparatus 10 are discussed below. Further, examples of optical amplifiers produced utilizing the ceramic tiles according to the present invention are presented. These examples are provided for illustrative purposes only and are not intended to be limiting. Unless otherwise specified, apparatus 10 utilized in the following examples was based on the AKT 1600 reactor. Further, unless otherwise specified, the temperature of substrate 16 was held at about 200� C. and the distance between substrate 16 and target 12 was 4 s/scan. The separation between substrate 16 and target 12 is about 6 cm.
An AKT 1600 based reactor can be utilized to deposit a film. In this example, a wide area metallic target of dimension 550�650 mm with composition (Si/Al/Er/Yb) being about 57.0 cat. % Si, 41.4 cat. % Al, 0.8 cat. % Er, and 0.8 cat. % Yb (a "0.8/0.8" target) was fabricated as described in the '247 patent.
In step 402, a 150 mm P-type silicon wafer substrate was placed in the center of a 400�500 mm glass carrier sheet 17. Power supply 14 was set to supply 6000 watts of pulse DC power at a frequency of 120 KHz with a reverse pulsing time of about 2.3 us. Magnet 20, which is a race-track shaped magnet of approximate dimension 150 mm�600 mm, was swept over the backside of the target at a rate of about 4 seconds per one-way scan. The temperature of substrate 16 was held at 200C and 100 W of 2 MHz RF power was applied to substrate 16. The target 12 to substrate 16 distance was about 6.5 cm. The sputtering gas was a mixture of Argon and Oxygen. Substrate 16 and carrier 17 was preheated to 350� C. for at least 30 min prior to deposition. The active film was deposited in the poison mode. Deposition efficiency was approximately 1 um/hr.
Tables 1A through 1C shows some effects on the deposited films of depositions with the 0.8/0.8 target under different operating conditions. Table 1A includes photoluminescence (pumped at 532 nm) and index of refraction for films deposited on substrate 16 with different Ar/O2 gas flow ratios with no bias power applied to substrate 16.
TABLE 1A Target Reverse Power Frequency Pulsing Bias PL/um (KW) Ar/O2 (KHz) Time (us) (W) (532 nm) Index 6 30/42 200 2.3 0 1973 1.5142 6 30/36 200 2.3 0 2358 1.5215 6 60/30 200 2.3 0 3157 1.5229 6 60/28 200 2.3 0 3421 1.5229
Table 1B shows the variation in photoluminescence (pumped at 532 nm) and index of refraction of the film deposited on substrate 16 with deposition processes having with the same Ar/O2 ratios but different pulsed DC power frequencies from power supply 14.
TABLE 1B Target Reverse Power Frequency Pulsing Bias PL/um (KW) Ar/O2 (KHz) Time (us) (W) (532 nm) Index 3 60/28 100 2.3 100 1472 1.5146 4 60/28 75 3.5 100 2340 1.5189 6 60/28 120 2.3 100 5178 1.5220
Table 1C shows the photoluinescence and index as deposited where the bias power to substrate 16 is varied.
TABLE 1C Target Reverse Power Frequency Pulsing Bias PL/um (KW) Ar/02 (KHz) Time (us) (W) (532 nm) Index 6 60/28 200 2.3 0 3657 1.5230 6 60/28 200 2.3 100 2187 1.5244 6 60/28 200 2.3 200 3952 1.5229 6 60/28 200 2.3 300 5000 1.5280
The photoluminescence values can be measured with a Phillips PL-100. The deposited film can be pumped with a 532 nm laser and the luminescence at 980 is measured. The index is the index of refraction. Typically, films deposited are annealed in order to activate the erbium.
A waveguide amplifier can be deposited according to the present invention. An embodiment of target 12 having composition 57.4 cat. % Si, 41.0 cat. % Al, 0.8 cat. % Er 0.8 cat. % Yb (the "0.8/0.8 target") can be formed as disclosed in the '245 application. The Er—Yb (0.8/0.8) co-doped Alumino-Silicate film was deposited onto a 6 inch wafer of substrate 16 which includes a 10 μm thick thermal oxide substrate, which can be purchased from companies such as Silicon Quest International, Santa Clara, Calif. Target 12 was first cleaned by sputtering with Ar (80 sccm) only in the metallic mode. Target 12 was then conditioned in poison mode by flowing 60 sccm of Argon and 40 sccm of oxygen respectively. The power supplied to target 12 during conditioning was kept at about 6 kW.
An active core film was then deposited on substrate 16. The thickness of the deposited film is approximately 1.2 μm. The deposition parameters are shown in Table 2.
TABLE 2 Pulsing Reverse Target Power Frequency pulsing (KW) Ar/O2 (sccm) (KHz) Bias (W) time (us) 6 60/28 120 100 2.3
A straight waveguide pattern can then formed by standard photolithography techniques. The active core was etched using reactive ion etch followed by striping and cleaning. Next, a 10 μm top cladding layer is deposited using a similar deposition process according to the present invention. An embodiment of target 12 with composition 92 cat. % Si and 8 cat. % Al as shown in
The erbium excited-state lifetime and the up-conversion coefficient were measured to be 3 ms and 4.5�10−18 cm3/s, respectively. A net gain of about 4 dB for small signal (about −20 dBm) with fiber to waveguide and to fiber coupling was obtained. Waveguide length was 10 cm and the width was about 1.5 to 8 μm. The coupling loss between the fiber and the waveguide is 3-4 dB/facet, and passive excess loss is 0.1-0.2 dB/cm for 3 um waveguide. The waveguide was both co- and counter pumped with 150 mW 980 nm laser per facet.
This example describes production of a dual core Erbium/Yttrbium co-doped amplifier according to the present invention. In one example, substrate 16 is a silicon substrate with an undercladding layer of thermally oxidized SiO2 of about 15 μm thick. Substrate 16 with the thermal oxide layer can be purchased from companies such as Silicon Quest International, Santa Clara, Calif. A layer of active core material is then deposited on substrate 16 with a Shadow Mask as described in the '138 application. Use of a shadow mask results in a vertical taper on each side of a finished waveguide which greatly enhances the coupling of light into and out of the waveguide.
Active core layer is deposited from a 0.8/0.8 target as described in the '247 application having composition 57.4 cat. % Si, 41.0 cat. % Al, 0.8 cat. % Er, and 0.8 cat. % Yb. The deposition parameters are identical to that of Example 2 described above. The active layer is deposited to a thickness of about 1.2 μm.
A passive layer of aluminasilicate is then deposited over the active layer. A passive layer of about 4.25 μm thickness can be deposited with an embodiment of target 12 having composition of Si/Al of about 87 cat. % Si and about 13 cat. % Al. The passive layer and active layer are then patterned by standard lithography techniques to form a core that has a width of about 5.0 μm for the active core and tapering to about 3.5 μm at the top of the passive core with an effective length of about 9.3 cm.
Upper cladding layer is then deposited from a Si/Al target of 92 cat. % Si and 8 cat. % Al. Deposition of the upper cladding layer is shown in
The as-deposited Erbium and Ytterbium concentrations in the active layer of core 303 is 2.3�1020 cm−3 Erbium concentration and 2.3�1020 cm−3 Ytterbium concentration. The index of the core is 1.508 and the index of cladding layers are 1.4458 for undercladding layer 302 and 1.452 for uppercladding layer 304. The parameter Δn/n is therefore about 5.0%.
A reverse taper mode size converter, see the '138 application, is utilized for coupling light into waveguide amplifier 300. The insertion loss at 1310 nm is about 2 dB.
Another example of production of a waveguide amplifier is described here. Again, substrate 16 can be a Si wafer with about a 15 μm thick thermal oxide as can be purchased from Silicon Quest International, Santa Clara, Calif. The embodiment of target 12 for the deposition of the active core can have a composition of about 50 cat. % Si, 48.5 cat. % Al, 1.5 cat. % Er (the "1.5/0" target), which can be fabricated as discussed in the '138 application. Target 12 was first cleaned by sputtering with Ar (80 sccm) only in the metallic mode. Target 12 was then conditioned in poison mode by flowing 60 sccm of Argon and 40 sccm of oxygen respectively.
The pulsed DC power supplied to target 12 was about 6 kW. Whenever a brand new target was used or when the target has been expose to atmosphere, a long time of condition (for example more than 30 hrs of conditioning) may be necessary to ensure films with the best active core property (longest life time and highest photoluminescence) are deposited. Substrate 16 is then preheat at about 350� C. for about 30 min before deposition.
The active core film was deposited onto a 6 inch thermal oxide wafer, which has been previously discussed, from the 1.5/0 target. The thermal oxide thickness was about 10 μm as described in previous examples. The active core is deposited to a thickness of about 1.2 μm with a deposition time of approximately 1 hr. The process condition are as listed in Table 4 below.
TABLE 3 Pulsing Target Power Frequency Reverse pulsing (KW) Ar/02 (sccm) (KHz) Bias (W) time (us) 6 60/28 120 100 2.3
A straight waveguide pattern can then be formed by a standard photolithography procedure. The active core was etched using reactive ion etch followed by striping and cleaning. Finally, a 10 μm top cladding layer is deposited using a similar process. A target having composition 92 cat. % Si and 8 cat. % Al with deposition parameters as described in
In this example, annealing of the amplifier structure was performed at various anneal temperatures. The results of the various anneals are shown graphically in
One of the problems encountered during the reactive sputtering from an alloy metallic target is that the film composition drifts from run to run due to the difference in sputtering yields from the elements that forms the target alloy. For example, with Ar as a sputtering gas, the sputtering yield of Aluminum is about 3-4 times that of Silicon, while sputtering yield of Alumina is only about 50% that of Silica. Therefore, during the metal burn in, more Aluminum is sputtered from the target, resulting in a Si rich target surface. When sputtering in the poison mode, more Silica will be removed from target. Thus, as deposition goes on, the composition of the film deposited on substrate 16 will drift from lower Alumina concentration to higher Alumina concentration. This results in the index of refraction of a film drifting up with subsequent depositions from a target 12, as is shown for the deposition described in Example 4 in
The drift can be stabilized by recondition target 12 prior to deposition. The recondition process (or burn in) consists of both sputtering in metallic mode and then sputtering in poison mode to condition target 12. The burn in time in metallic mode needs to be as short as possible and at the same time insure no arcing during the poison mode deposition.
This example describes the fabrication of another Er—Yb codoped waveguide amplifier according to the present invention. The active core is deposited with an embodiment of target 12 with composition about 49 cat. % Si, 48 cat. % Al, 1.6 cat. % Er and 0.5 cat. % Yb, which can be fabricated as described in the '247 application. Target 12 was first cleaned by sputtering with Ar (80 sccm) only in the metallic mode. Target 12 was then conditioned in poison mode by flowing 60 sccm of Argon and 40 sccm of oxygen respectively. The pulsed DC power supplied to target 12 was kept at 5 kW. Table 4 shows photoluminescence and index of refraction of as-deposited films from this example at some typical process conditions. The units for photoluminescence are the number of counts per micron. Lifetime and photoluminescence measured after annealing at various different temperatures are shown in Table 5.
Target 4 Target Pulsing Reverse Power Ar/O2 Frequency Bias pulsing time 532 nm (KW) (sccm) (KHz) (W) (us) PL/um Index 5 60/34 120 100 2.3 3367 1.5333 5 60/30 120 100 2.3 3719 1.5334 TABLE 5
Anneal Temperature � C.
Life Time (ms)
PL (532 nm)/um
A waveguide amplifier was fabricated using this material in the similar fashion as described in examples 2-4. The active core was first deposited on substrate 16, which includes a 10 um thermal oxide layer, using the following deposition parameters: target power 5 KW, pulsing frequency 120 KHz, bias 100 W, reverse time 2.3 us, Argon and Oxygen flow are 60 sccm and 30 sccm respectively. The active core thickness is deposited to a thickness about 1.2 μm, which takes approximately 1 hr. All wafers are preheated at about 350� C. for 30 min before deposition. A straight waveguide pattern is then formed by standard photolithography procedure. The active core was etched using reactive ion etch following by striping and cleaning. Next, a 10 μm top cladding layer is deposited using similar process. The "92/8" (92 cat. % Si and 8 cat. % Al) metallic target was used to deposit top clad according to deposition parameters shown in
This waveguide was tested for gain using the method described in previous examples. However no net gain was observed from this waveguide since the passive loss was too high.
In addition to active material layers (i.e., layers having rare-earth ion concentrations), passive layers can also be deposited.
Apparatus 10 can be based on an AKT 1600 reactor and deposited with about 1 to 3 kW of pulsed DC target power supplied to target 12. Particular depositions have been accomplished at 2.5 kW and 1.5 kW. The frequency of the pulsed DC power is between about 100 and 200 Khz. Some depositions were performed at 200 kHz while others were performed at 100 kHz. The reverse time was varied between about 2 μs and about 4 μs with particular depositions performed at 2.3 μs and 3.5 μs. The bias power to substrate 16 was set to zero.
Index variation of SiO2 films with bias to substrate 16 and deposition rates as a function of bias power to substrate 16 is shown in
The process gas included a mixture of Ar, N2 and O2. The Ar flow rates was set at 20 sccm while the O2 flow rate was varied between about 5 and about 20 sccm and the N2 flow rate was varied from about 2 to about 35 sccm.
Alternatively, films can be deposited on substrate 16 from a pure alumina target. In an example deposition with an embodiment of target 12 of alumina in an embodiment of apparatus 10 based on the AKT 1600 reactor, the pulsed DC target power was set at 3 kW and the frequency was varied between about 60 kHz and 200 kHz. The reverse time was set at 2.5 μs. Again, no bias power was supplied to substrate 16. The O2 flow rate was varied from about 20 to about 35 sccm, with particular depositions performed at 22 and 35 sccm. The Ar flow rate was set at 26 sccm. A post deposition anneal of substrate 16 at 800� C. for 30 min. was performed.
Additionally, passive films can be deposited from targets having a composition of Si and Al. For example, layers have been deposited from embodiments of target 12 with composition 83% Si and 17% Al. About 4.5 kW of pulsed DC power at about 200 kHz frequency was supplied to target 12. The reverse time was about 2.2 μs. A bias power of about 150 W was supplied to substrate 16 during deposition.
The examples and embodiments discussed above are exemplary only and are not intended to be limiting. One skilled in the art can vary the processes specifically described here in various ways. Further, the theories and discussions of mechanisms presented above are for discussion only. The invention disclosed herein is not intended to be bound by any particular theory set forth by the inventors to explain the results obtained. As such, the invention is limited only by the following claims.
|Citing Patent
|Filing date
|Publication date
|Aug 27, 2003
|Nov 2, 2010
|Springworks, Llc
|Optically coupling into highly uniform waveguides
|Sep 2, 2005
|Nov 23, 2010
|Springworks, Llc
|Deposition of perovskite and other compound ceramic films for dielectric applications
|Mar 10, 2009
|Dec 11, 2012
|4Wave, Inc.
|Thin films and methods and machines for forming the thin films
|Aug 11, 2009
|Dec 9, 2014
|Infinite Power Solutions, Inc.
|Energy device with integral collector surface for electromagnetic energy harvesting and method thereof
|Aug 27, 2003
|Jun 3, 2004
|David Dawes
|Optically coupling into highly uniform waveguides
|May 20, 2004
|Dec 23, 2004
|Demaray Richard E.
|Energy conversion and storage films and devices by physical vapor deposition of titanium and titanium oxides and sub-oxides
|May 20, 2004
|Jan 6, 2005
|Demaray Richard E.
|Transparent conductive oxides
|Feb 26, 2004
|Jan 13, 2005
|Mukundan Narasimhan
|Dielectric barrier layer films
|Oct 1, 2004
|Mar 3, 2005
|Symmorphix, Inc.
|Biased pulse DC reactive sputtering of oxide films
|Apr 6, 2005
|Aug 11, 2005
|Tao Pan
|Mode size converter for a planar waveguide
|U.S. Classification
|427/569, 118/722, 204/298.01
|International Classification
|Cooperative Classification
|European Classification
|Nov 19, 2007
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Why do we (ashkenazim) not do birchas kohanim in chutz la'aretz (except on yom tov), but in Israel, we do?
Take the 2-minute tour ×
Mi Yodeya is a question and answer site for those who base their lives on Jewish law and tradition and anyone interested in learning more. It's 100% free, no registration required.
Tha Rama in Orach Chaim Siman 128 says we do not do Nesias Kapayim as we are only in proper Simcha on Yom Tov. During the rest of the year, even on Shabbos we are worried about our sustanance and our work.


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Good point Squirming! I have long hair...and wear a braid...but hadn't thought of the dust that will get in my hair. I will put it up and wear a mask and a shower cap! How about that! I guess I won't be flirting with any construction workers Monday! Won't I be cute? hey! Maybe Captaincrab?
Captaincrab ...... soooo funny girl!
You know why I thought of covering the hair? Yup, me too, down past my derriere. And I was going to say shower cap but if it's hot where you are you could end up with steambath head or a hot head one --- or BOTH!
And I was thinking about a bandanna over your mouth & nose UNDERNEATH the mask. Double protection? Those masks don't always fit tight but the cloth you can pull tight. Might be uncomfortable but better than itching uncomfortable.


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Style Number: 642330-100 Color: White / Black-University Red
Originally released in 1994, the Nike Air Raid is a basketball sneaker specifically designed for the outdoor game. They feature durable materials with diamond plate detail, "FOR OUTDOOR USE ONLY" instructions on the heel and outsole, heel pull tab, and crossing midfoot straps.
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Thursday, May 17, 2012
The Ideal Book
The concept of a book is largely irrelevant to networked devices, and one big reason that book-related words (page, library) are making the transition to the online world is because books are easy to use. (This is in addition to the reason that books have so far been a common frame of reference.) Taken a step further, e-books exist because printed books are so easy to use.
A hybrid book has the potential to be best of both worlds, in that it could exist both as a physical object and an online object. Most media are being forced to choose between one or the other type of existence, but I think books are fundamentally different and may not have to make that reckoning. Yes, the internet makes it unnecessary to print something out in order to interact with it. But at times, a printed version of a book -- not reliant on a power source or a network connection -- is the most desirable thing to have, no matter how smart your phone is. (Or maybe I'm crazy. After all, I'm still buying CDs because I can digitize them and also have a nicely packaged version to put on my shelf. When I purchase digital music, I'm irritated that I don't get the object. Unless I make the effort of burning it to a blank CD. Which I don't, and which wouldn't be the same anyway.)
So, is anyone selling a printed book with an access key that provides a digital copy for the consumer's preferred reading platform? Are textbooks doing this? Would the book-buying public be willing to pay slightly more to have both formats? I think a similar feature is available on certain Blu-Ray DVDs, but from my cursory reading this effort is meant to prod consumers toward the digital version rather than to support use of the disc.
3 comments:
I have to admit, I'm beginning to shun physical media. I just personally feel "more free" if I own fewer items. If I bought a physical CD (which I haven't done in years) and ripped the music on my computer, my strong impulse would be to throw away the CD. To me, it seems like packaging.ReplyDelete
That said, I still do 95% of my book-reading using physical books, but that's just because it's not convenient to borrow e-books from the library--I'm used to being able to get whatever book I want.
It's funny because I've comfortably moved online with almost everything except books. Calendars, work-related files and documents, yes music, even films -- I expect all of those online. But not books, or at least not fully.ReplyDelete
Textbooks have been offering online "extras" for some time, but I don't know whether they are much used or whether they're just an excuse to charge more money. (Cynical about textbooks? Me?) I'm not sure whether the whole book is often available--hmm.ReplyDelete
Anyway, for myself, I don't like the conditions under which e-books are offered, and I'm still a fan of the affordances of print (non-sequential navigation, anyone?). When it comes to the ownership/access question, one thing I know is that I am not, not, NOT paying for access on an individual basis. Paying for access collectively, through a library--great! Paying for ownership individually--sure, that's, you know, the whole concept of exchange. But paying on an individual basis for something I then don't own makes no sense to me. Call me paranoid.
Netflix is an exception--I do love Netflix. But that's because TV isn't important to me in the same way books are, and if it went away tomorrow, the disappointment I'd feel wouldn't be even *vaguely* analogous to how I'd feel if I lost all my books, or heck, even one of them.
But you're right to point out that I'm in a privileged position because I have easy, convenient access to libraries. Certainly, that affects the equation...


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Juice, is an on-demand web service built on intelligent discovery for rich and contextually relevant information for web users. To translate that down to people outside of the PR world – it is a nice search engine, with perks.
The add-on for Firefox will continually run in a sidebar, and can be activated by selecting a chunk of text and dragging it over to the sidebar. You then get tons of information about that person, place, thing you are searching about. When dropping text into Juice, we'll try to understand its meaning and serve you with context-relevant information.
How can you turn the sidebar on and off? After installing Juice, you get a new toolbar button to do just that (or setup your own hotkey). You can save things for later too.
All in all, Juice is well worth trying out if you need a new way (or perhaps better way) to search for basic information intelligently.


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mr.disc wrote:good thing you worked on the red tees ? .... NT event is playin reds !
Dale H wrote:Dave, Keith, et. al.;
It is rare for me to miss a workday, didn't know this one was coming until I stumbled upon Terry and Keith mid-beautification on #4. Please give me a heads up on date and time for next work session. I will bring the usual suspects and power tools.
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Anybody seen/heard from Dreday in the last couple of months? Been silent for a while now.
Anybody seen/heard from Dreday in the last couple of months? Been silent for a while now.
There must be a Finheaven killer on the loose lol:
WeVie, Myles, BobDole, Dreday....it was the butler in the kitchen with the wrench!
"Frank's Redhot - I Put That **** On Everything!" ~ Ethel
Has there been some mass exodus from the site that I'm not aware of? Do I need to demand to become a mod in Kud fashion to find out the truth?
dont forget mrmagoo.....havent seen him in a while either
I just chatted with him on here a few days ago, so I think he's fine. He just hasn't made any posts recently.
All I know is, if you ever see a thread titled, "Where's the damned vote whore?" ... The answer is: dead.
Either that, or chained to the wall as Gwen Stefani's love slave.
So, basically, yeah dead.
2015 Goals:
1) Win the next game.
2) See goal #1
"The problem with internet quotes lies in verifying their authenticity."
-Abraham Lincoln
All I know is that something very Warren Commissiony is going on here and I want some answers.


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Women's Lacrosse
Duke Women's Lacrosse BIO
1 Sarah Bullard
2011: Played in and started 13 games as a senior ... missed seven contests (Mar. 5 - Apr.2) due to injury ... still ranked fourth on the team with 28 goals and fifth on the squad with 16 draw controls ... recorded on season-high five points on four goals and an assist against Richmond on Feb. 18 ... registered six games with three or more goals on the season, including hat tricks in three of the last four contests of the year ... in the Duke record books, tied for eighth all-time with 141 career goals and sits in 11th place with 167 career points ... also ranks in the top-20 in school history in career draw controls (12th, 91), caused turnovers (14th, 64) and assists (t-16th, 26).
2010: Selected first team All-America by the IWLCA/U.S. Lacrosse after leading Duke in goals (48) and caused turnovers (27) for the season … third team WomensLacrosse.com All-America pick … named a Tewaaraton Trophy candidate for the second straight season … earned first team All-South distinction in addition to All-ACC Tournament and all-conference accolades … chosen to the ESPN the Magazine/CoSIDA Academic All-District second team … started all 20 games as a junior, totaling 59 points on 48 goals and 11 assists, both career highs … along with Lindsay Gilbride, one of two Devils to reach double figures in goals, assists, caused turnovers, draw controls and ground balls for the season … ranked second on the team in draw controls (27) and fourth in ground balls (33) … ranked fifth in the ACC, averaging 2.4 goals per game … tied for the team lead with 13 multi-goal contests … scored the game-tying goal with three minutes remaining in Duke's 16-15 win over No. 9 Vanderbilt in the opening round of the NCAA Tournament … netted a career-high five goals on two occasions (at No. 7 Princeton and at Richmond) … against the Spiders, set a career high with seven points as well … selected ACC Player of the Week following Duke's win over Princeton ... named to the ACC Academic Honor Roll.
2009: Second-team IWLCA/U.S. Lacrosse All-America selection … earned WomensLax.com and WomensLacrosse.com third team All-America honors … first team All-South honoree as well as a Tewaaraton Trophy nominee … named to the All-ACC Academic and All-ACC Tournament squads … started all 21 games for the Blue Devils … was fourth on the team with 39 goals … dished out seven assists to total 46 points … second on the team with 31 ground balls … tallied three goals in the Blue Devils' NCAA win over No. 10 Virginia … netted a season-high four goals against No. 2 Maryland in the ACC Tournament finals … also a member of the U.S. National Women's Lacrosse Team that won the 2009 World Cup Championship … scored a goal in the finals in the United States' 8-7 win over Australia … totaled seven goals on nine shots for the World Cup tournament, including two-goal games against England and Japan ... named to the ACC Academic Honor Roll.
2008: Earned a spot on the 2008-09 World Cup Training Team after being selected to the national team player pool … one of two Blue Devil freshmen named to the ACC All-Academic team … named to the WomensLacrosse.com all-rookie squad … ACC All-Tournament team selection after scoring two goals against Virginia Tech and three against Virginia … started all 21 games in her freshman campaign … netted 26 goals and added four assists for 30 points … took 51 shots, 44 on goal, for an .863 SOG percentage … her 32 ground balls was the second-highest total among field players … captured 24 draw controls and caused 11 turnovers … found the back of the net in 13 contests, while notching multiple tallies in 10 … posted hat tricks against No. 2 Virginia, No. 18 Richmond and Virginia Tech ... named to the ACC Academic Honor Roll.
Prior to Duke: Four-year letterwinner at Buckingham, Browne & Nichols … served as captain of the U.S. Under-19 National Team that captured the World Championship in August of 2007 … named first team All-America three consecutive years … Under Armour All-America choice … three-time Lower New England team member … named All-Independent School League three years in a row … tallied 227 goals and 60 assists … two-time team captain … played for the Revolution Lacrosse club team … captain and multiple year all-league team choice in soccer and ice hockey … awarded Craig B. Stonestreet prize for excellence in academics, athletics and extracurricular activities … president of Student Athletic Association ... earned Nichols Prize as the student-athlete that maintained the highest GPA.
Personal: Sarah Babineau Bullard ... daughter of Julie and Lyman Bullard … has one brother (Lyman) … father ('77) played soccer and ice hockey at Harvard … mother ('78) played tennis, squash and field hockey at Trinity College and was nationally ranked in squash and an All-America in tennis ... majoring in Sociology with a certificate in Markets and Management Studies.
Bullard's Career Statistics:
Sarah Photos:
Duke Athletics Teams
Athletic Department
Get InvolvedIron Dukes
Junior Iron Dukes
Legacy Fund
Varsity Club
Young Iron Dukes


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Sunday, February 21, 2010
Interesting Feedback...
8 comments:
I agree with your sentiments re: comments. It's a bit harsh to have someone criticize your blog after only browsing it for a short while. I enjoy following you anyways, so keep up the good work!!ReplyDelete
I hope you saw all of the other posts that had very complimentary things to say about your blog too (you can click on the Exercise 2 tag under his post to see other blog posts from students that week)! The students last week were assigned to read your blog (and four others) to get a sense of the different styles of blogs. I thought yours is a great example of the more personal, more thoughtful essay-type blog post. Some people really enjoyed your style of posting, some loved In the Library with the Lead Pipe's more researched, peer-reviewed style, some liked blogs that had very brief posts, and some preferred the blogs that contained mostly links to useful articles and technologies.ReplyDelete
While I agree with you that some of his criticisms of your blog (especially the anti-social software and lack of comments=unsuccessful blog) are unfounded, I think what he was trying to say about "personal diaries" was not about you writing personal things but that your posts are more like personal essays than something from say the Distant Librarian or Mashable which are more about sharing cool resources. Some people like your style of posting (and mine, and Karen's, and Jenica's) and some people don't. Some people read blogs to find useful news and resources and some people like to read other people's thoughts on issues. That's a personal taste thing.
If you want to communicate with Marc directly, you can comment on his post -- all you have to do is register for an account on the site (which I'll approve as soon as I see it) and then you can comment on any post in there.
Actually you're better looking at the list of tags for the course to see the other posts http://sociallibraries.com/sp10/tagadelic as I notice that some tagged their post Exercise #2 and some Exercise 2 and others Exercise2. Clicking on each of those tags will give you the posts that used that tag.ReplyDelete
Meredith, I'm flattered :-)ReplyDelete
And I really should get on top of writing some kind of 'who I am and what I'm doing here' statement now that I know this is being assigned in a class!
My "About Me" page is lame and woefully out of date, so I can relate. Your blog does exactly what I tell my students they need to do if they blog -- it perfectly captures your unique voice. To me, that's just the kind of blog that I want to read, because I get so much about hearing someone else's thoughts on things that interest me. There's a place for resource blogs (and I love those too), but it's blogs like yours, Jenica's, Karen's, etc. that really get me thinking and are always the ones whose posts I save for when I have time to really think about what I'm reading (rather than just skim like I usually do).ReplyDelete
I just took some time to read through the other reactions to the Librarian's Commute, and I'm heartened to see some positive reactions too!ReplyDelete
It's kinda funny how the only one that Google Alerts notified me about was Marc's!
- Marc SchatkunFebruary 24, 2010 at 3:51:00 PM EST
My apologies, Olivia, for reading just a few of your posts and coming to the wrong conclusions. When I read your Dec. 2008 blogs, "as i mentioned in the previous post, i have not always been a fan of twitter…i set up an account a while ago, but i never used it and concluded it was a waste of time," I took it out of context and concluded that you were anti-social software. Unfortunately, with two jobs (one as a full-time middle school librarian and a second as a math/auto instructor at a community college), two courses at SJSU SLIS and long reading lists, about all I have time for is getting the jist of a site or article.ReplyDelete
It's also easy to forget that everything we write in Meredith's course is public, which is entirely new for me (all 10 of my previous SJSU SLIS courses were private). I never intended or expected to "get a reaction," but the fact that you got a great review from Meredith and others is very positive. I'm sure that I will also have positive things to say about your ideas when I get a chance to fully read what you have to say (perhaps when my courses are over?).
Best wishes,
Thanks for commenting Marc -- I too was surprised to be able to peer into your course. It's a brave new world for everyone.ReplyDelete
Good luck with your studies and jobs, and maybe we'll have the opportunity to work together in the future!