text:
Women's Cross Country
Jenessa Rose.
Oct. 16, 2011
SAN DIEGO, Calif. - The University of San Diego cross country team joined many nationally ranked competitive West Coast programs on Saturday afternoon in the Bronco Cross Country Invitational, hosted by Santa Clara University. The Bronco Invite is noted as the last "fast race" for distance teams as they prepare for their final tune up before heading into their championship season.
The Toreros kicked off competition with the women's 5k run, led by senior Jenessa Rose (67th) whom delivered an outstanding first race of the season by leading her Torero pack and racing a personal best with a time of 18:21. Rose was closely pushed by Tracy Vargo (67th), and Lauren Rice (70th) whom also equally ran an 18:21 time. Sophomore Gillian Gorelik (74th) and senior Kirsten Allan (76th) followed the Torero pack by running 18:25 and 18:26. Rounding the 6th and 7th spots for the team were where Jessica McCarthy (80th) with a time of 18:30, and Emerald Raney (107th) with a time of 18:47.
"The women's side executed the best pack running plan that I have ever seen in any of our school races. I am so proud of them for they showed the importance of team racing" said head coach Will Guarino. "The spread between our first and fifth was five seconds and from our first to seventh was 26 seconds. This again shows how selfless they truly are and I loved the way that they encouraged one another to fight as a team. The results speak for themselves as they beat several very competitive conference schools and where able to beat some other schools that they have not beaten in the past." The Torero placed 13th out of 20 teams. They were behind Cal, University of Colorado B team, and John Hopkins University, but ahead of UC Davis, UCLA, and Nevada.
Following the women's 5k was the men's 8k run, which was once again led by junior John Cutter (76th) with a time of 25:34.1. Cutter was pushed by teammate freshman Johnathan Garcia (78th) whom set a personal best and a freshmen 8k record with a time of 25:36.1. "We are pleased to see team work on the men's side" said assistant coach Lena Nilsson. "This is a developing year for us for we have several new people running in our Varsity and Johnathan Garcia has stepped up for us and delivered a strong performance for his team."
The Torero runners return to action on Saturday, October 29th, for the West Coast Conference Championship at the last curtain call of the mighty historical Crystal Springs course.
2011 Bronco Cross Country Invitational Results:
Women's 5k Invite Race (13th of 20 teams)
65. Jenessa Rose 18:21.0
67. Tracy Vargo 18:21.5
70. Lauren Rice 18:21.9
74. Gillian Gorelik 18:25.2
76. Kirsten Allan 18:26.5
80. Jessica McCarthy 18:30.2
107. EmeraldRaney 18:47.6
160. Rita Kuckertz 19:30.8
171. Taylor Paschen 20:25.7
Women's 5k Open Race
54. Melissa Lupinacci 19:43.9
83. Maddie Levine 20:15.2
Men's 8k Invite Race (18th of 19 teams)
76. John Cutter 25:34.1
78. Johnathan Garcia 25:36.2
115. Jacob Bruce 26:47.2
116. Kyle Carruthers 26:47.9
119. Connor Gideon 7:04.9
121. Benjamin Condrea 27:37.7
125. Ashish Agrawal 27:56.4
128. Ciano Ordinola 29:27.1
129. Rudy Mendoza 29:45.1
Men's 8k Open Race
87. John Maheu 27:27.9
121. Justin Pinnizotto 28:34.6
LMU Preview
Help Set a New Attendance Record
ITA All-American's Preview
Petronijevic, Angus, & Vittek Prepare
Marist Preview
USD Looks to Extend Home Win Streak
Valparaiso Preview
Toreros First True Road Game of 2015
CSUN and UCSB Preview
Toreros Look to Extend Win Streak
Aztec Invite Recap
Both Squads Finish Second
SDSU Preview
Toreros Take on Cross-town Rival
WNMU Recap
Highlights from 45-21 win
2015 Home Opener
Previewing Western New Mexico
Volleyball Tournament Preview
A preview of the USD Tournament
Men's Soccer Season Opener
Previewing No. 16 Cal
Training Camp Update
Coach Lindsey Recaps the First Two Weeks
2015 WSOC Preview
A brief preview of the 2015 Toreros.


text:
I just built up a Sette Reken frame into a 650b! It's set it up as a 1x9, with a XFusion Fork. I took it out saturday for a 7 mile ride and so far I like it. This was my first time with a 650b.
Results 1 to 24 of 24
Thread: Sette Reken as 650B
Similar Threads
Interbike Featured Booths
Check out hottest mountain bike products from these brands!
See All Interbike Coverage - Click Here »
Hot Deals See All Hot Deals >>
Latest Mountain Bike Articles

subset: commoncrawl


text:
Podnova Player
Windows library
Podnova home
SAMSUNG Intelli-studio
3.8/5 (17)
Uniblue Systems Ltd
Latest version:
Last updated:
December 19th, 2011
Related programs:
Samsung Media Studio 5.2
Samsung Media Studio was developed to manage audio, video, photo collections.
tangible T4 editor plus modeling tools 2010 1.9
Quickly write your own Code Generator via T4 Text-Templates (.tt-Files).
Intelli-SMART 3.0
Will predict up to 70% of disk failures before they happen.
Nidesoft Samsung Video Converter 2.6
Nidesoft Samsung Video Converter is video converting utility for Samsung devices
Samsung Master 1.1
It is a multimedia software which helps to give a new touch to the photos.
WP7 Emulator Skin Switcher 1.2
An application that gives you multiple skins to use on your Windows Phone 7.
MultiScreen 3.0
MultiScreen is a utility designed to make multiple monitor computing even easier
NET-i ware 1.3
The Net-i ware is high performance recording software.
Samsung Control Center 1.0
A program that makes using and configuring Samsung systems easier.
MagicTuneLiteMain 1.0
It allows you to configure various aspects of your Samsung monitor
online guitar tuner microphone
microsoft office word paint
game tunnel
samsung pc studio internet access
avi cut portable
photo editor sharpen
super video effect maker
hp quick launch buttons alternative
tiff multi page viewer
download hike in nokia c3 00
rockwell super key download
channel tv online film semi
give deer essay in hindi language
free video mgr song.com
mp3 minus one maker.apk
ea fifa 15 320 by 240 java game
a list of animals sounds in tamil
weather themes 320x240 temperature
fb video player n73
bruce banner mod for gta sa
heat light play download 3gp
duke bike stunts videos download.in
game domino qq
tamil actor movie download
samsung intelli studio 3.0 download
samsung intelli-studio 3.0 download
samsung intelli-studio 22.214.171.124
samsung intelli studio download
samsung intelli-studio 3.0
samsung intelli-studio
samsung intelli studio
© Podnova Windows Library, 2015
Software library


text:
Frozen Toys
Anna and Elsa Ice Skating Doll Set
from The Disney Store $24.99
Disney Animators' Collection Anna Doll
from The Disney Store $24.95
Disney Animators' Collection Frozen Anna Mini Doll Playset
from The Disney Store $19.95
Disney Animators' Collection Frozen Elsa Mini Doll Playset
from The Disney Store $19.95
Disney Frozen 2-in-1 Convertible Easel
from Kids Only $49.99
Disney Frozen 8 Puzzle Pack
from Cardinal Industries $24.99
Disney Frozen Activity Tray
from Kids Only $14.27
Disney Frozen Alpine Adventure Playland
from Moose Mountain $17.99
Disney Frozen Anna and Elsa Fold N' Go Chair
from Kids Only $9.98
Disney Frozen Anna and Elsa's Musical Bicycle
from Mattel $29.96
Disney Frozen Anna and Elsa's Royal Closet
from Mattel $27.00
Disney Frozen Anna Classic Costume
from Disguise $13.99
Disney Frozen Anna Dress
from Jakks Pacific $11.50
Disney Frozen Anna Musical Light-Up Dress
from Jakks Pacific $20.35
Disney Frozen Anna Soft Doll
from Just Play $15.86
Disney Frozen Anna Styling Head
from Jakks Pacific $11.23
Disney Frozen Anna Tiara
from Jakks Pacific $6.93
Disney Frozen Anna Wig
from Jakks Pacific $16.99
Disney Frozen Baby Anna
from Tollytots $16.99
Disney Frozen Baby Elsa
from Tollytots $17.79
Disney Frozen Carry & Go! 3 Puzzle Pack
from Cardinal Games $6.83
Disney Frozen Castle & Ice Palace Playset
from Mattel $67.04
Disney Frozen Cool Tunes Sing-Along Boombox
from KIDdesigns $26.99
Disney Frozen Elsa Bear
from Build-A-Bear Workshop $3.76
Disney Frozen Elsa Classic Costume
from Disguise $5.78
Disney Frozen Elsa Costume
from Build-A-Bear Workshop $3.76
Disney Frozen Elsa Dress
from Jakks Pacific $9.31
Disney Frozen Elsa Musical Light-Up Dress
from Jakks Pacific $14.62
Disney Frozen Elsa Musical Snow Wand
from Jakks Pacific $7.98
Disney Frozen Elsa of Arendelle
from Mattel $12.64
Disney Frozen Elsa Soft Doll
from Just Play $10.57
Disney Frozen Elsa Styling Head
from Jakks Pacific $11.23
Disney Frozen Elsa Tiara
from Jakks Pacific $6.99
Disney Frozen Elsa Wig
from Jakks Pacific $16.99
Disney Frozen Elsa's Ice Skating Rink
from Mattel $19.95
Disney Frozen Fever Mini Snowman Chatterback
from Just Play $9.99
Disney Frozen Figurine Playset
from The Disney Store $14.95
Disney Frozen Flip n Switch Castle
from Mattel $9.51
Disney Frozen Hopper
from Hedstrom $11.11
Disney Frozen Ice Power Elsa Doll
from Mattel $10.02
Disney Frozen Ice Skating Anna
from Mattel $20.99
Disney Frozen Ice Skating Elsa
from Mattel $16.35
Disney Frozen Kristoff
from Mattel $14.88
Disney Frozen Light Vines Snow & Ice String Lights
from Uncle Milton $13.49
Disney Frozen Magical Lights Palace
from Mattel $28.62
Disney Frozen Musical Magic Anna
from Mattel $2.00
Disney Frozen Musical Magic Elsa
from Mattel $29.99
Disney Frozen Musical Winter Coach
from Moose Mountain $29.99
Disney Frozen Olaf
from Build-A-Bear Workshop $25.00
Disney Frozen Olaf Aloha Plush
from The Disney Store $2.99
Disney Frozen Olaf and the Snowgies
from Just Play $16.90
Disney Frozen Olaf Fold N' Go Chair
from Kids Only $9.98
Disney Frozen Olaf Plush
from Just Play $19.99
Disney Frozen Olaf Shirt & Hat
from Build-A-Bear Workshop $13.50
Disney Frozen Olaf's in Trouble Game
from Hasbro $12.99
Disney Frozen Olaf's Summer Tea Set
from Jakks Pacific $11.99
Disney Frozen Olaf-A-Lot Figure
from Jakks Pacific $7.29
Disney Frozen Operation Game
from Hasbro $18.39
Disney Frozen Pop-Up Magic Game
from Hasbro $10.19
Disney Frozen Pull Apart & Talkin' Olaf
from Just Play $9.98
Disney Frozen Royal Color Anna
from Mattel $11.09
Disney Frozen Shaped Puzzle with Glitter
from Ravensburger $9.07
Disney Frozen Sing & Swing Olaf
from Just Play $8.34
Disney Frozen Sing-A-Long Elsa
from Jakks Pacific $37.99
Disney Frozen Sing-Along Storybook
from Disney Press $9.89
Disney Frozen Singing Anna
from Mattel $21.47
Disney Frozen Singing Elsa
from Mattel $18.30
Disney Frozen Sisters Always Puzzle Box
from Ravensburger $7.94
Disney Frozen Sno-Speedster
from Hedstrom $23.99
Disney Frozen Snow Glow Elsa
from Jakks Pacific $20.28
Disney Frozen Snowflake Light Dance
from Uncle Milton $14.98
Disney Frozen Snowgie
from Just Play $8.70
Disney Frozen Snowgie
from Just Play $7.99
Disney Frozen Spinning Olaf
from Just Play $7.98
Disney Frozen Stuffed Olaf
from The Disney Store $19.95
Disney Frozen Switch 'Em Up Olaf
from Jakks Pacific $12.43
Disney Frozen Table and Chair Set
from Delta Children's Products $39.98
Disney Frozen Table and Chairs Set
from Kids Only $29.98
Disney Frozen Tiara Bicycle Helmet
from Bell Sports $22.47
Disney Frozen Toddler Anna
from Tollytots $24.99
Disney Frozen Toddler Elsa
from Tollytots $24.99
Disney Frozen Toddler Elsa 12-inch Plush Doll
from The Disney Store $14.95
Disney Frozen Travel Bag Set
from Jakks Pacific $9.97
Disney Frozen Upholstered Chair
from Delta Children's Products $69.99
Disney Frozen XXL 100 Piece Puzzle
from Ravensburger $9.12
Disney Karaoke: Frozen
from Disney Publishing Worldwide $7.99
Elsa Singing Doll
from The Disney Store $29.95
Frozen 3 Puzzle Pack
from Cardinal Industries $9.99
Frozen 300-Piece Puzzle
from Ravensburger $11.18
Frozen Anna & Kristoff
from Mattel $17.98
Frozen Anna Build-A-Bear
from Build-A-Bear Workshop $25.00
Frozen Anna Build-A-Bear Costume
from Build-A-Bear Workshop $18.00
Frozen Anna Deluxe Singing Doll Set
from The Disney Store $24.15
Frozen Big Wheel
from Kids Only $39.97
Frozen Chill n Chat Walkie Talkies
from eKids $16.72
Frozen Elsa Bubbles
from Imperial Toy $3.99
Frozen Elsa Lights and Sounds Wall Decor
from Uncle Milton $17.99
Frozen Elsa's Sparkling Ice Castle
from LEGO $35.00
Frozen Fever Anna Plush
from The Disney Store $19.95
Frozen Fever Birthday Party Anna
from Mattel $11.99
Frozen Fever Birthday Party Elsa
from Mattel $13.88
Frozen Fever Elsa & Anna Summer Solstice Gift Set
from The Disney Store $34.95
Frozen Fever Elsa Plush
from The Disney Store $19.95
Frozen Fever Snowgie
from Just Play $9.99
Frozen Ford Mustang
from Fisher-Price $262.49
Frozen Giant Coloring Pages
from Crayola $5.99
Frozen Magical MP3 Microphone
from eKids $9.66
Frozen Mobo Tot
from ASA Products $129.99
Frozen Panorama Puzzle
from Cardinal Industries $9.99
Frozen Royal Color Elsa
from Mattel $13.98
Frozen Scooter
from KidTrax $179.99
Frozen Slope Racer
from Hedstrom $6.99
Frozen Summer Singing Olaf
from Mattel $5.50
Frozen Wagon
from Moose Mountain $10.57
Frozen Wall Decals with Glitter
from RoomMates $9.67
Frozen Window Markers
from Crayola $2.48
Frozen: Storybook Deluxe
from Disney $6.99
iHome Frozen Headphones
from KIDdesigns $28.98
Inkoos Frozen Color and Create Anna
from The Bridge Direct $14.87
Inkoos Frozen Color and Create Elsa
from The Bridge Direct $19.33
Inkoos Frozen Color and Create Olaf
from The Bridge Direct $15.49
Inkoos Frozen Color and Go Anna
from The Bridge Direct $9.90
Inkoos Frozen Color and Go Elsa
from The Bridge Direct $8.48
Inkoos Frozen Color and Go Olaf
from The Bridge Direct $9.99
itty bittys Anna
from Hallmark $6.95
itty bittys Elsa
from Hallmark $9.50
Monopoly Junior Frozen Edition
from Hasbro $10.58
Olaf Snow Cone Maker
from Jakks Pacific $18.99
Paw Patrol Fold N' Go Chair
from Kids Only $14.99
Play-Doh Disney Frozen Sparkle Snow Dome
from Hasbro $7.99
Power Wheels Frozen Jeep Wrangler
from Fisher-Price $249.99
Spot It Olaf Numbers and Shapes
from Blue Orange Games $10.25
Spot It! Disney Frozen Alphabet
from Blue Orange Games $9.51


text:
The Sac-Joaquin Section Division I girls basketball playoff game between No. 4 Nevada Union and No. 13 St. Francis has been rescheduled due to weather. The round one contest will be played at 7 p.m. Wednesday at Nevada Union's Albert Ali Gymnasium.
Back to: Entertainment
February 19, 2013
Follow Entertainment
Nevada Union girls basketball playoff game rescheduled
Trending in: Entertainment
Trending Sitewide
- Man arrested after crashing into Cottage Hill School playground
- Couple charged in gold, welfare fraud cases offered plea deal
- Homeless people in Nevada County discuss their problems, offer possible solutions to their plight
- PREP FOOTBALL: Bear River outlasts Sutter, 21-14
- Beyond the county: France scolds Putin, Oregon shooting veteran gunned down


text:
Arbor Shims
1 Result Found that Includes 1 Product
How can we improve the Search Experience?
Product availability based on selecting either shipping or pick up and a location. Dismiss
Ship or Pickup Enter Location
- Arbor Shim, Low Stl, 0.1250x1ID, Pk10Arbor Shim,Low Stl,0.1250x1ID,Pk10
- Item # 5GA63
- Mfr. Model # 25219
Arbor Shim, Low Carbon Steel, Full Hard Temper, Thickness 0.125 In, Thickness 3.175mm, Thickness Tolerance...More
Price $49.10 / pkg. of 10
+Add to list
Catalog Page # 3093
Note: Product availability is real-time basis and adjusted continuously. The product will be reserved for you when you complete your order. More


text:
Bayview is an attractive and spacious apartment with pleasant views from the balcony. Set within easy walking distance of the sand dunes and beautiful sandy beaches, Beadnell Harbour is a short stroll away. A peaceful location for a relaxing holiday and an ideal base to discover the wonders of the Northumberland castles, Holy Island, Farne Islands, and wonderful market towns of Morpeth, Amble and Alnwick. Easy driving distance to visit the Borders or even Scotland.
All on first floor: Living/dining room. Kitchen. 2 bedrooms: 1 double (5ft), 1 twin. Bathroom with shower over bath and toilet.
Elec heaters, elec, bed linen and towels inc. Freeview TV. DVD. CD. Elec cooker. M/wave. W/machine. D/washer. F/freezer. Shared lawned area. Balcony and furniture. Parking (2 cars). No smoking please.


text:
With No Rings Till The End Of The Year Star Wars saga has new secrets Drew Goddart opened 3 mysteries about Martian MORE ›
Lyrics/song texts are property and copyright of their owners and provided for educational purposes only.
I hold your hand in mine Lyrics by Tom Lehrer
I hold your hand in mine by Tom Lehrer
I hold your hand in mine, dear,
I press it to my lips.
I take a healthy bite
From your dainty fingertips.
My joy would be complete, dear,
If you were only here,
But still I keep your hand
As a precious souvenir.
The night you died I cut it off.
I really don't know why.
For now each time I kiss it
I get bloodstains on my tie.
I'm sorry now I killed you,
For our love was something fine,
And till they come to get me
I shall hold your hand in mine.


text:
OSI-Approved Open Source (105)
- GNU General Public License version 2.0 (17)
- Academic Free License (10)
- Common Public License 1.0 (8)
- GNU Library or Lesser General Public License version 2.0 (8)
- GNU General Public License version 3.0 (4)
- Mozilla Public License 1.1 (4)
- BSD License (3)
- Educational Community License, Version 2.0 (3)
- Open Software License 3.0 (3)
- Apple Public Source License (2)
- Computer Associates Trusted Open Source License 1.1 (2)
- GNU General Public License with Classpath exception (2)
- Qt Public License (2)
- Adaptive Public License (1)
- Affero GNU Public License (1)
- Other License (2)
- Windows (97)
- Grouping and Descriptive Categories (72)
- Linux (54)
- Mac (37)
- Modern (37)
Top Apps
- Audio & Video
- Business & Enterprise
- Communications
- Development
- Home & Education
- Games
- Graphics
- Science & Engineering
- Security & Utilities
- System Administration
Radium Collaboration System
Radium Collaboration System is an open-source project management and time tracking solution designed to deliver enterprise class features in an open-source package. Its main goal is to provide a base set of features across platforms without bias.0 weekly downloads
Node based image and video compositor.0 weekly downloads
SGE Framework
Simple Game Engine framework to simplify games development with DirectX.0 weekly downloads
SUNC soll ein Chatprogramm werden, dass so ähnlich wie ICQ arbeitet, aber auch Funktionen von SKYPE enthält.0 weekly downloads
Get a saxophone without the high cost of getting a real one! This program will allow you to actually-and virtually-play your "saxophone!"0 weekly downloads
Science Book
Server/Client System for managing a Scientific Journal. Cross platform wxWidgets based.0 weekly downloads
Shadow death by NW games
Shadow death is an online/offline 4D game! It features 4D sound, and mutch more!0 weekly downloads
Smart Auto Replier
This is MirandaIM Plugin that works as autoreplier - it's able to reply on all incoming messages, making possible use of rules that are applied to specific contacts.0 weekly downloads
Speech Text Reader
The Speech Text Reader Application Is A Screen And Speech Text Reading Software For The Screen Reading technologie, I Use The MSAA Tools For Objects Inspection And Discovrie0 weekly downloads
Converts subtitle files for videos from the .sub format to the .srt format.0 weekly downloads
Tactical Resistance Online/Offline
In the year of 2600, war is based on 3 different Empires after one planet with valuable resources. This is a MMO/rpg/RTS/FPS. Please visit our site/wiki for more info.0 weekly downloads
The Money Making Games
multi player money making business game0 weekly downloads
An OpenSource OTserver. Always based on the lastest CVS relased by the Official Developers.0 weekly downloads
UCOS is a micro kernel OS which is orinially intended for teaching. Yet the free UCOS kernel has it's limitations such as limited task quantity, priority reversion. There are tremendous work to be done!0 weekly downloads
This project is to design an application to use the pwlib and ophenh323 lib0 weekly downloads
basic idea :real time video transfer between a mobile and a pc using bluetooth or serial cables. in other words our software converts your mobile to a webcam all you need is a mobile device that support bluetooth and a bluetooth card on your pc and our s0 weekly downloads
Virtual-Info aims to promote the development and creation of open content (programmes, games ...), free and legally downloadable. And a mutual aid through a website, forum, wiki engine, webradio, free pro hosting...0 weekly downloads
Winds Online
Still in a planning/pre-alpha status. This game is an 0pen-Source game aimed for the common public to have fun in a good community well moderated. This project is currently seeking staff members.0 weekly downloads
WireWasp .NET Agent for Quake II.
WireWast is a .NET C++/CLI wrapper around the well known and loved Q2BotCore engine developed by Ben Swartzlander in 1998. It is pet project for developers who are interested in developing agents, managed wrappers or just have too much free time.0 weekly downloads
XMLDataStudio is ODBC based data transfer tool to different databases in XML format developed in C++ and Java. It designed to put minimum effort to use and usable to layman based on wizard developed in Java Swing desktop application.0 weekly downloads
allxmyself is the name used for the Ultima Online 2 re-creation project. Planned to use RunUO and Iris2 for first stage and then development of a custom client and server based from these will be created.0 weekly downloads
a combination of gis and ifc using third part ifc engine0 weekly downloads
framework for common utilities0 weekly downloads
game development library
It is a library which consist of large number of classes made by easy-to-use development strategy. It allows you to program games writing in language very similar to technical descriptions.0 weekly downloads
The iStormIM project intends to create a cross-platform IM architecture for user in different platform to communication easily with native interface. And It also provide SDK for developers to add their own IM protocols.0 weekly downloads


text:
Performance Art
News about Performance Art, including commentary and archival articles published in The New York Times.
Review: Ali Moini's 'Lives' Tracks an Artist's Personal History
Mr. Moini's "Lives," a solo work of performance art full of biographical facts, had its United States premiere at New York Live Arts.
October 2, 2015, Friday
MORE ON PERFORMANCE ART AND: Dancing , New York Live Arts , Performance Art , Festivals , Art , Moini, Ali
Tate Modern Announces Opening Date for New Extension
The addition is to open June 17, 2016, and a tour of the building suggested that the Tate Modern will add a new tourist attraction to the city in the form of a wide balcony running around the entire 10th level.
September 22, 2015, Tuesday
MORE ON PERFORMANCE ART AND: Browne, John , Serota, Nicholas , London (England) , Tate Modern , Art , Museums
Review: Gilbert & George in the Early Days, Sending Up a Religion Called Art
This exhibition surveys the couple's work from 1969 to 1975, when they routinely mocked the art world's grandiosity.
September 4, 2015, Friday
MORE ON PERFORMANCE ART AND: Art , Museum of Modern Art , Gilbert and George
Things to Do in the Hudson Valley, Aug. 30 to Sept. 6, 2015
A guide to cultural and recreational events in the Hudson Valley.
August 30, 2015, Sunday
MORE ON PERFORMANCE ART AND: Art , Culture (Arts) , Theater , Music , Westchester County (NY) , Hudson River Valley (NY)
Museum & Gallery Listings for Aug. 14-20
A critical guide to exhibitions and installations in the New York area.
August 14, 2015, Friday
MORE ON PERFORMANCE ART AND: Art , Sculpture , Museums , Photography
Museum & Gallery Listings for Aug. 7-13
A critical guide to exhibitions and installations in the New York area.
August 7, 2015, Friday
MORE ON PERFORMANCE ART AND: Art , Culture (Arts) , Museums
Review: 'Drawing Waves' and 'Borne Frieze,' a Robin Rhode Twofer
This South African artist shows his signature participatory artwork in two shows, one at the Drawing Center, in SoHo, and one at Lehmann Maupin, in Chelsea.
August 7, 2015, Friday
MORE ON PERFORMANCE ART AND: Art , Drawing Center , Lehmann Maupin Gallery , Rhode, Robin
Spare Times for Aug. 7-13
A listing of discussions, film screenings, cultural activities and walking tours in New York City.
August 7, 2015, Friday
Art Listings for July 31-Aug. 6
A guide to the visual arts in New York City and selected regional institutions.
July 31, 2015, Friday
Looking at How Performers Are Paid for Performance Art
The artists Gerard & Kelly have worked with the Guggenheim to hammer out labor standards.
July 31, 2015, Friday
MORE ON PERFORMANCE ART AND: Art , Guggenheim, Solomon R, Museum , Wages and Salaries , Gerard, Brennan , Kelly, Ryan
Shot in the Name of Art
This short documentary celebrates the late conceptual artist Chris Burden's landmark work "Shoot," in which a friend shot him in the arm.
Off Color Comedy: Kristina Wong
The performance artist Kristina Wong says that marrying herself and stalking the basketball star Jeremy Lin offer opportunities to entertain as well as to question stereotypes about race and gender.
Artists Claim Responsibility for Flags
The German artists Mischa Leinkauf and Matthias Wermke submitted this video as proof that they hoisted two white flags atop the Brooklyn Bridge earlier this summer.
From Street Art to High Art
Caledonia Curry started her career as a street artist, but leapfrogged to museums and galleries. Now she has expanded her work to include installation and performance art, often with an activist bent.
A Man Takes His Cabbage for a Walk
The Chinese performance artist Han Bing drags a cabbage through city centers as a social commentary on people's relationships with objects in their lives.
Rss Feeds On Performance Art
Subscribe to an RSS feed on this topic. What is RSS?
Get Alerts On Performance Art
Receive My Alerts e-mails on topics covered on this page.More Alerts >>


text:
|Publication number
|Publication type
|Application number
|PCT number
|Publication date
|Jan 8, 2009
|Filing date
|Oct 20, 2004
|Priority date
|Oct 27, 2003
|Also published as
|Publication number
|Roger Anton Marie Timmermans, Johannes Hubertus Antonius Van De Rijdt
|Original Assignee
|Koninklijke Philips Electronics N.V.
|Export Citation
|BiBTeX, EndNote, RefMan
|Referenced by (4), Classifications (8), Legal Events (1)
|External Links: USPTO, USPTO Assignment, Espacenet
The invention relates to an apparatus for forming an optical image in a radiation-sensitive layer, which apparatus comprises:
The invention also relates to a method of forming optical images in a radiation sensitive layer and to a process for manufacturing a device using this method and apparatus.
An array of light valves, or optical shutters, is understood to mean an array of controllable elements, which can be switched between two states. In one of the states radiation incident on such an element is blocked and in the other states the incident radiation is transmitted or reflected to follow a path that is prescribed in the apparatus of which the array forms part. Such an array may be a transmission- or reflective liquid crystal display (LCD), a digital mirror device (DMD) or any other device comprising micron-sized light valves. These arrays usually are two-dimensional arrays. Is also possible to use a linear array, such as a grating light valve, which is discussed in U.S. Pat. No. 6,177,980. A grating light valve array can be switched with very high frequencies. Such a linear array may be combined with a beam scanner, for example a rotating mirror, which is arranged between the array of light valves and the converging plate to scan the sub-beams from the individual light valves across the converging plate in direction perpendicular to the length direction of the linear array. The radiation sensitive layer is, for example a resist layer used in optical lithography, or an electrostatic charged layer used in a printing apparatus. The term light valve is quite current and will be used in this description, although in the present apparatus the light valves will be mostly used for switching other radiation than visible light. In the lithographic imaging apparatus the array of light valves may be used to form an image with electromagnetic radiation in a broad wavelength range covering visible light as well as ultraviolet (UV) radiation and deep UV (DUV) radiation. The converging elements may be of the type refractive lens or of the type diffraction element, such as a diffraction lens.
As described in PCT patent application WO 03/052515 A1, such an apparatus and method may be used, inter alia, in the manufacture of devices such as liquid crystalline display (LCD) panels, customized-ICs (integrated circuits) and PCBs (printed circuit board). The apparatus may be a proximity printing apparatus, wherein the array of converging elements is arranged at a short distance, called the proximity gap, from the radiation-sensitive layer on top of the substrate. The apparatus may also be a projection apparatus, wherein a projection system, such as a projection lens system, is arranged between the array of light valves and the array of converging elements, to image each light valve on its corresponding converging element of the array.
The apparatus utilising an array of individually switchable light valves was proposed as a better alternative to a lithographic projection apparatus of the type wafer stepper or of the type wafer step-and scanner. In a wafer stepper, a whole mask pattern, for example an IC pattern is imaged at one go by a projection system, such as a lens system or a mirror system, on a first IC area of the substrate. Then the mask and substrate are moved (stepped) relative to each other until a second IC area is positioned below the projection lens. The mask pattern is then imaged on the second IC area. These steps are repeated until all IC areas of the substrate are provided with an image of the mask pattern. This is a time consuming process, due to the sub-steps of moving, aligning and imaging. The latter sub-step is also called exposure.
In a wafer step-and-scanner, only a small portion of the mask pattern is illuminated at once. During illumination, the mask and the substrate are synchronously moved with respect to the illumination beam until the whole mask pattern has been illuminated and a complete image of this pattern has been formed on an IC area of the substrate. Then the mask and substrate are moved relative to each other until the next IC area is positioned under the projection lens and the mask pattern is again scan-illuminated, so that a complete image of the mask pattern is formed on said next IC area. These steps are repeated until all IC areas of the substrate are provided with a complete image of the mask pattern. The step-and-scanning process is even more time consuming than the stepping process.
For the manufacture a device such as an IC by means of a wafer stepper or a wafer step-and-scanner a number of masks is needed corresponding to the number of substrate layers, which have to be configured with specific device features. The manufacture of each of these masks is a time consuming and cumbersome process, which renders such a mask costly. If re-design of a mask is needed, which is often the case in practice, or in case customer-specific devices, i.e. a relative small number of the same device, have to be manufactured, the lithographic manufacturing method using masks is an expensive method. Similar remarks can be made with respect to the manufacture of LCD panels or other display panels.
An array of individually switchable light valves, when used in a lithographic apparatus, functions as a flexible, in the sense of programmable, mask. The image content of such a mask can easily be changed by switching each individual light valve such that the image element, or pixel, formed by a light valve is light or dark. The lithographic imaging apparatus using an array of light valves is a multiple spot scanning apparatus wherein a large number of spots simultaneously scan the radiation-sensitive, or resist, layer to simultaneously write portions of the required image in this layer. Thereby different scan modes can be used. For example, each of the spots may write an area having dimensions up to some tens times the spot size, or a group of spots may be used to write the same area of the resist layer.
Experiments have learned that for a successful use of the combination of a light valve array and an array of converging elements in a lithographic or other printing apparatus and method, additional means are needed
It is an object of the invention to provide such means. According to a first aspect of the invention, an apparatus as defined in the opening paragraph is characterized by monitoring means for individually monitoring the spots formed by the convergent elements and/or determining the positions of these spots with respect to the radiation sensitive layer, which means are arranged downstream the array of converging elements and use the exposure beam radiation.
These means allow determining accurately the position of the exposure spots, formed by the two arrays, and the radiation-sensitive layer very accurate with respect to each other. The exposure spots are the spots by means of which a required pattern is written in the radiation-sensitive layer. Moreover, the means allow determining the parameters of the exposure spots so that possible deviations in these parameters can be compensated for during writing of the pattern. The spot parameters are the spot presence, the spot shape, the spot size, the spot intensity etc.
It should be noted that U.S. Pat. No. 6,133,986 discloses a lithographic projection apparatus of the type described in the opening paragraph wherein the converging elements are micro lenses, which apparatus comprises position-detecting means. This means is used to provide feedback to a closed-looped wafer-positioning servomechanism. However, this means uses a Moir� technique in which the periodic pattern of the micro lenses is measured on a periodic tracking pattern, i.e. a grating etched in the wafer. Radiation that has passed the micro lens and is reflected by the grating structure shows Moir� pattern. This pattern is projected by a projection lens system on an optical detector array, which is arranged at the same side of the projection lens system as the array of light valves. The optical detector array is a position encoder, which is arranged at a position remote from the array of micro lenses. The optical detector array is not used to monitor parameters of the individual spots formed by the array of micro lenses and the spot position measurement is based on another principle than that used in the apparatus of the present invention. Moreover, for position encoding radiation is used that has a wavelength different from the wavelength of the exposure radiation, so that a correction of the micro lenses for the encoder radiation is necessary.
Preferably, the apparatus is further characterized in that the monitoring means comprises a movable module, which is provided with a slit plate comprising an array of slits and a corresponding array of radiation detectors in register with the slits.
The radiation detectors may be constituted by the cells of a CCD sensor or C-MOS sensor, which are currently used in a digital camera. The sensing monitor may be moved in a direction perpendicular to the scan direction to successively scan all exposure spots arranged along a line in this direction. In the scan direction the slit plate then comprises a number of slits equal to the number of spots one wants to scan simultaneously. The scan direction is understood to mean the direction in which the spots and the radiation-sensitive layer are moved with respect to each other for writing the required image in the radiation-sensitive layer. By moving the module across the array of spots the position and/or parameters of all spots within a surface area, which in one direction is determined by the number of slits and their interspacing and in the perpendicular direction is determined by the module scan length, are successively measured.
Preferably, the sensing module is a separate unit, which is arranged in the apparatus such that the array of spots, before arriving at the radiation-sensitive layer, firstly pass the area wherein the module is moved. The time required for spot measurement is then minimum. In case the invention is implemented in a lithographic apparatus, the sensing module may also be integrated in the substrate stage.
To determine the positions of the spots in both the scan direction and in the direction perpendicular thereto, the apparatus is further characterized in that the slit plate comprises a first and a second series of slits whereby the slits of the first and second series extend in different directions with respect to the direction of movement of the sensing module.
The slits of the first series and the slits of the second series may extend in a direction perpendicular and in a direction at a sharp angle, respectively to the said direction of movement and the slits of the second series may extend in a direction at a sharp angle to the scan.
Then the first series of slits, and corresponding detector cells is used to determine the spot positions in the direction of movement, which direction may be called X-direction, whilst the second series of slits is used to determine the spot positions in the direction, perpendicular to the direction of movement, which direction may be called Y-direction.
Preferably, the apparatus is characterized in that the slits of the first series and the slits of the second series extend in a direction at a first sharp angle and in a direction at a second sharp angle, opposed to the first sharp angle, respectively the said direction of movement.
This configuration allows determining, not only the spot positions with respect to the module, but also the parameters of the exposure spots.
To allow determining the spot positions with respect to the plate equipped with the converging elements, the apparatus is further characterized in that the sensing module comprises at least one X-position encoder and at least one Y-position encoder, and in that the converging plate is provided with at least one X-tracking configuration and at least one Y-tracking configuration.
Position encoders are well known in the art and encoders of a known type may be built in the sensing module outside the area where the slits for measurement of the spots are arranged. Such an encoder may comprise a periodic structure of transparent strips, e.g. a grating, and a radiation sensitive detector in the path of radiation from the strips. For the X-encoder the strips extend in the Y-direction and for the Y-encoder the strips extend in the X-direction. The X- and Y-tracking configuration may be formed by gratings having their grating strips extending in the Y- and X-direction, respectively and having the same periodicity, or pitch, as the corresponding encoder gratings. Upon illumination of the tracking gratings, by exposure radiation or radiation of another wavelengths, radiation from the grating strips is incident on the encoder gratings. The position of the sensing module with respect to the converging plate in the direction of movement of the module can be determined by counting the number of pulses supplied by the encoder for this direction. The mutual position in the direction perpendicular to the direction of movement of the sensing module and the converging plate can be determined by counting the number of pulses supplied by the encoder for this perpendicular direction.
The tracking gratings may be amplitude gratings or phase gratings and they may be arranged on separate elements, which elements may be fixed to the converging plate. Preferably the tracking grating are integrated with the converging plate, for example the may be etched in the substrate of the converging plate. This allows more accurate position measuring.
The use of position encoders and tracking configurations allows relieving the mechanical requirements for the moving sensing module.
Preferably, this apparatus is characterized in that the sensing module comprises two X-position encoders and two Y-position encoders, and in that the converging plate is provided with two X-tracking configurations and two Y-tracking configurations.
Combining the signals from the two X-position encoders allows determining a rotation of the module in its own plane, i.e. on a Z-axis. Combining the signals from the two Y-position encoders allows determining a possible expansion of the array of converging elements so that the measured spot position can be corrected for such expansion.
By means of the measuring system described so far the positions of the exposure spots with respect to the converging plate gratings can be measured. If the apparatus is further characterized in that the converging plate comprises a number of alignment marks to co-operate with corresponding alignment marks on the substrate, the spot positions with respect to the alignment marks on the converging plate and thus with respect to the alignment marks on the substrate can be determined accurately.
Preferably the apparatus is further characterized in that the alignment marks are arranged close to the tracking configurations in the converging plate.
Thus arrangement allows even more accurate spot position measuring.
This measuring system provides the advantages that it is not sensitive to a non-uniform expansion of the converging plate or to a non-accurate movement of the module and that the position of the spots with respect to the alignment marks on the converging plate can be determined accurately, because these alignment marks are arranged closed to the tracking configurations.
The apparatus may be further characterized in that the converging elements are diffractive elements.
As described in WO 03/052515-A1 the diffraction elements may have at least two transmission levels and at least three phase levels, which allows considerably increasing the diffraction efficiency of the elements. Diffraction efficiency is understood to mean the percentage of the incident radiation that is diffracted in the required diffraction order, for example a first order.
Alternatively and preferably, the apparatus is further characterized in that the converging elements are refractive lenses.
Refractive lenses provide the advantage that their performance is considerably less sensitive to wavelength variations than that of diffractive elements. The refractive lenses have a sharper focus than diffraction elements, because they show no diffraction order splitting.
A first embodiment of the invention is characterized in that the array of converging elements faces the array of light valves without intervening imaging elements.
This embodiment is a type of proximity printing apparatus and the array of converging elements is separated from the radiation-sensitive layer by a small gap, for example an air gap.
A second embodiment of the apparatus is characterized in that an optical projection system is arranged between the array of light valves and that array of converging elements.
The projection system, which may be a projection lens system or a mirror projection system, images each light valve on its associated converging element in the converging plate so that the effects of cross-talk, optical aberrations and temperature variations on the written pattern are eliminated or at least substantially reduced. The projection system matches the size and sub-sizes of the light valve array to those of the converging plate. Moreover, inserting a projection system allows making the substrate of the converging plate relatively thick so that the stability of the apparatus is increased.
The apparatus can be used in several applications. In a first application the apparatus constitutes a lithographic tool for producing a device in at least one layer of a substrate. For this application the apparatus is characterized in that the radiation-sensitive layer is a resist layer on top of a substrate layer to be configured, in that the image corresponds to the pattern of device features to be configured in said substrate layer and in that the positioning means is a substrate holder carried by a substrate stage.
The apparatus may also be used for printing data on a sheet of paper. For this application the apparatus is characterized in that the radiation-sensitive layer is a layer of electrostatic charged radiation-sensitive material and in that the positioning means are means for moving said layer with respect to the array of light valves and the array of converging elements and for sustaining said layer at the location of the image field of this array.
The invention also relates to a method of forming an optical image in a radiation sensitive layer, the method comprising the steps of:
Depending on the circumstances the control process can be carried out before exposure of each substrate or before exposure of a batch of substrates or only at regular longer time intervals, for example at the beginning of each production day. Monitoring the exposure spots before exposure of each substrate renders the method insensitive to temperature drift and allows performing a complete control of the total optical system used with the method. It is also possible that monitoring of the spot parameters is carried out more frequently than determining the spot positions.
Preferably this method is further characterized in that the control process comprises the step of scanning the array of spots and a measuring module comprising an array of slits and a corresponding array of radiation detectors with respect to each other.
The method is further preferably characterized in that the control process comprises the step of determining the position of the measuring module with respect to the lens array by measuring the positions of linear encoders included in the module with respect to tracking configurations provided on the converging plate.
The method is still further preferably characterized in that the control process comprises the step of determining the positions of the spots with respect to the radiation sensitive layer by measuring the positions of alignment marks, which are included in the converging plate with respect to corresponding alignment marks in the substrate.
A first embodiment of the method is characterized in that said scanning is such that each spot scans its own associated layer area, which area has dimensions corresponding to the pitch of the matrix of spots formed by array of converging elements.
According to this method each light valve is used to write only one layer area, hereinafter called light valve area, by two-dimensionally scanning the spot from this light valve across this associated light valve area. After a spot has scanned a line within the light valve area, this spot and the area are moved relative to each other in a direction perpendicular to the scanning direction, where after a next line within this area is scanned etc until the full light valve area has been written.
A second embodiment of the method is characterized in that the matrix of spots and the radiation sensitive layer are scanned relative to each other in a direction at a small angle to the direction of the lines of spots in the matrix and in that the scanning is carried out over a length substantially larger than the matrix pitch.
According to this embodiment all spots of all lines are used to scan different lines and a layer area, having a width corresponding to the total number of spots times the size of a spot and having an arbitrary length, can be scanned by means of one scanning action, without movement in a direction perpendicular to the scanning direction.
The method of the present invention may be further characterized in that between successive sub-illuminations the radiation-sensitive layer and the arrays are displaced relative to each other over a distance, which is at most equal to the size of the spots formed in the radiation sensitive layer.
In this way image, i.e. pattern, features can be written with a constant intensity across the whole feature. The spots may have a circular, square, diamond or rectangular shape, dependent on the design of a beam-shaping aperture present in the apparatus. The size of the spot is understood to mean the size of the largest dimension within this spot.
If features of the image to be written are very close to each other, these features may broaden and flow into each other, which phenomenon is known as proximity effect. An embodiment of the method, which prevents proximity effects from occurring, is characterized in that the intensity of a spot at the border of an image feature is adapted to the distance between this feature border and a neighbouring feature.
The method can be used in several applications. A first application is in the field of optical lithography. An embodiment of the method, which is suitable to form part of a lithographic process for producing a device in at least one layer of a substrate is characterized in that the radiation sensitive layer is a resist layer provided on the substrate and in that image pattern corresponds to the pattern of device features to be configured in the substrate layer.
This embodiment of the method may be further characterized in that the image is divided in sub-images each belonging to a different level of the device to be produced and in that during formation of the different sub-images the resist layer surface is set at different distances from the array of refractive lenses.
This embodiment of the method allows imaging on different planes of the substrate and thus producing multiple level devices.
A second application of the method is in the field of printing. An embodiment of the method, which is suitable to form part of a process for printing a sheet of paper, is characterized in that the radiation sensitive layer is a layer of electrostatic charged material.
The invention also relates to a method of manufacturing a device in at least one layer of a substrate, the method comprising the steps of:
forming an image in a radiation-sensitive layer provided on the substrate layer, which image comprises features corresponding to device features to be configured in the substrate layer and
Devices, which can be manufactured by means of this method and apparatus, are liquid crystalline display devices, polymer LED (Polyled) display devices, customer-specific ICs, electronic modules, printed circuit boards MEMS (integrated micro-electrical-mechanical systems) and MOEMS (integrated micro-optical-electrical-mechanical systems) etc. An example of such a system is and integrated optical telecommunication devices comprising a diode laser and/or detector, a light guide, an optical switch and possibly a lens between the light guide and the diode laser, or the detector. The method and apparatus can also be used for patterning mask for several applications.
These and other aspects of the invention are apparent from and will be elucidated, by way of non-limitative example, with reference to the embodiments described hereinafter.
The pattern to be imaged is generated by means of a light valve device 16 comprising an array of light valves. The device 16 is for example a two-dimensional liquid crystal display (LCD) or digital mirror device (DMD), which devices are well known for displaying information. The LCD display may be a transmission or a reflective display. The pattern may also be generated by means of a linear array of light valves, such as a grating light valve (GLV) array in combination with a scanning element, which scans the sub-beams from the light valve array in a direction perpendicular to the length direction of the linear array. Device 16 comprises a large number of light valves, also called pixels (picture elements). Only a few of them, 18-22 is shown in
Between the array of light valves and the resist layer 6 an imaging, or converging, plate 40 is arranged. This plate comprises a transparent substrate 42 and an array 44 of radiation converging elements 44. The number of these elements corresponds to the number of light valves and the array 44 is aligned with the array of light valves so that each converging element belongs to a different one of the light valves. The converging elements 46 may be diffractive elements, such as Fresnel zone lenses. Preferably, the elements 46 are refractive lenses. Such lenses allow focusing of radiation from corresponding light valves in spots, which are smaller than those obtained with diffraction lenses. Moreover the optical performance of these lenses is substantially less dependent on the wavelength of the radiation than that of a diffraction element.
As the radiation source, the substrate holder and the mask holder are less relevant for understanding the new method; these elements will not be described in detail.
Usually, the micro lenses 46 are spherical lenses; i.e. their curved surface is a portion of a perfect sphere. If necessary, aspherical lenses may be used. An aspherical lens is understood to mean a lens, which basic surface is spherical, but which actual surface deviates from spherical in order to correct for spherical aberrations a spherical lens may produce.
The spots 52 shown in
In case diffractive elements are used for the converging elements 46, the parameters of these elements, such as the periodicity, or pitch of an element structure, the phase difference introduced by this structure and the duty cycle of the structure, can be adapted to obtain the required exposure spot size and shape. The duty cycle of a periodic structure is understood to mean the ratio of the width of an (annular) strip of the structure and the local pitch, i.e. the sum of the width of a strip and the neighbour intermediate strip.
As discussed in the PCT application IB 03/01372 (PHNL020310), the array of micro lenses may produced by a lithographic technique or by a replication-from-a-mould technology.
As shown in
The exposure process of flashing and stepping is illustrated in
By the successive steps of displacing the resist layer and opening or closing light valves individually any required pattern can be written. Scanning of a valve area with a spot can be performed serpentine wise, i.e. a first line of the area is scanned from left to right, a second line from right to left, a third line from left to right again, etc.
Instead of the stepping mode, illustrated in
Instead of a lamp, also other radiation sources may be used, preferably lasers, especially lasers used currently or to be used in the near future in wafer steppers and wafer-step-and scanners, emitting radiation with a wavelength of 248, 193 and 157 nm, respectively. Lasers provide the advantage that they emit a beam, which has a single wavelength and is collimated to the required degree. Essential for the present imaging method is that the illumination beam is substantially a collimated beam. With a fully collimated beam, i.e. a beam having an aperture angle of 0�, the best results are obtained. However also with a beam having an aperture angle smaller than 1� satisfactorily results can be obtained.
The required movement, with respect to each other, of the resist layer at the one hand and the array of light valves and the array of micro lenses at the other hand is most practically performed by movement of the substrate stage. Substrate stages currently used in wafer steppers are very suitable for this purpose, because they are more than accurate enough. It will be clear that movement of the substrate stage, for either the stepping mode or the scanning mode, should be synchronized with switching of the light valves. To that end, the computer 30 of
An image pattern larger than the illumination field of one array of light valves and one array of refractive lenses can be produced by dividing, in the software, such a pattern into sub-patterns and successively transferring the sub-patterns to neighbouring resist areas having the size of the image field. By using an accurate substrate stage the sub-image patterns can be put together precisely so that one non-interrupted large image is obtained.
A large image pattern can also be produced by using a composed light valve array and a composed refractive lens array. The composed light valve array comprises, for example, five LCD's, each having 1000�1000 light valves. The LCD's are arranged in series to cover, for example, the width of the image pattern to be produced. The composed refractive lens array is constructed in a corresponding way to fit to the composed light valve array. The image pattern is produced by first scanning and exposing a resist area having a length covered by a single array of light valves and a width covered by the series of light valve arrays. Subsequently the substrate with the resist layer and the series of arrays are displaced relative to each other in the length direction over a distance covered by a single array. Then a second resist area, which now faces the composed arrays is scanned and exposed, etc until the whole image pattern has been produced.
Instead of scanning its own light valve area, each of the spots may also scanningly write a resist area, which in one direction has a dimension considerably larger than that of said light valve area, whilst a number of spots are used to write said resist area in the other direction. This principle shown in
For a matrix of 100�100 spots each having a dimension of 1�1 μm2, which matrix covers an image field of 10�10 mm2, the spot period is 100 μm in the X and Y direction. In order to achieve that the hundred spots of one row scan hundred successive lines in the resist layer, the angle γ between the scan direction and the direction of lines of the spots should be: γ=arctan (1/100)=0.57�. By scanning each spot in the X-direction over 10 mm the whole field of 10�10 mm2 can be written, without moving the spots and the resist layer relative to each other in the Y direction. Due to run-in and run-out of the spots the total scanning distance is larger, for example 20 mm, than the effective scanning distance of 10 mm. The scanning distance needed for run-in and run-out is dependent on said angle γ. For a larger matrix of spots, for example 1000�1000 spots, the ratio of effective scanning distance and total scanning distance is considerably increased.
By decreasing the distance between the spots, the centres of the strips written by the spots can be decreased and the density of the written pattern can be increased. This allows to impart redundancy to the system and to avoid that a spot failure results in a hard error.
Skew scanning may also be used in a system for imaging a large pattern and comprising a composed light valve array and a corresponding composed refractive lens array. For example, with a system comprising five LCD arrays arranged in series in the Y-direction and each producing, within an image field of 100�100 mm2, 1000�1000 spots with lines of spots at the above-mentioned angle of 0.57� a resist area of 500�100 mm2 can be written by scanning the resist layer 10 mm in the X-direction. After the resist layer has been moved 90 mm in the X direction, the same scan can be repeated. In this way a resist area of 500�1000 mm2 can be written by scanning and moving ten times in the x direction only.
The number of scans and intermediate movements needed for writing a given area depends on the number of light valves, and thus the number of spots, in the X and Y direction. For example with an array of 5000�100 spots a resist area of 500 mm in the y direction can be written by continuously scanning in the X direction without intermediate movement. The scan length determines the length in the X direction of the written area.
The apparatus allows manufacturing a device composed of sub-devices, which are positioned at different levels. Such a device may be a pure electronic device or a device that comprises two or more different types of features out of the diversity of electrical, mechanical or optical systems. An example of such a device is a micro-optical-electrical-mechanical system, known as MOEMS. A more specific example is a device comprising a diode laser or a detector and a light guide and possibly lens means to couple light from the laser into the light guide or from the light guide to the detector. The lens means may be planar diffraction means. For the manufacture of a multilevel device, a substrate is used that has a resist layer deposited on different levels. Preferably a multiple level device is produced by dividing software-wise the total image pattern in a number of sub-images each belonging to a different level of the device to be produced. In a first sub imaging process a first sub-image is produced whereby the resist layer is positioned at a first level. The first sub imaging process is performed according to the, scanning or stepping, method and by the means described herein before. Then the resist layer is positioned at a second level and in a second sub imaging process the sub-image belonging to the second level is produced. The shining of the resist layer in the Z-direction and the sub-imaging processes are repeated until all sub-images of the multiple level device are transferred to the resist layer.
For accurate and reliable imaging a required pattern in a resist layer, the quality of the exposure spots and the positions of these spots with respect to alignment marks in the substrate layer to be configured according to this pattern should be monitored. According to the invention the monitoring comprises switching all light valves in the "on" state so that all spots should be present and scanning the array of spots with a moving sensing module. This module is provided with X- and Y encoders, which co-operate with gratings on the lens plate so that the positions of the spot with respect to this gratings and with respect to alignment marks, which are arranged close to the grating, can be determined accurately.
The sensing module is denoted by reference number 180. During the inspection and alignment mode, this module will be moved in the X-direction as denoted by the arrow 184. The upper side of the module comprises a non-transparent plate, which is provided with one series, but preferably two series of transparent slits 186 and 188, respectively. The upper side may be formed by a transparent plate of glass, or another transparent material, which is coated by a layer of, for example chromium. The slits may be etched in this coating.
If the exposure spots were directly observed by a camera CCD or CMOS sensor, the sub-beams forming these spots would had been focused on the sensor cells and an effective sensor pixel would had been very small, for example of the order of 0.1 μm. By observing a spot via one or two slit(s), i.e. the spot forming sub-beam is focused on the slit(s), the spot illuminates a substantially larger portion of the sensor and the sensor pixel is much larger, for example of the order of 100 μm. The measuring resolution of the system with the slits is determined by the number samples per time unit that are taken in by the electronic processor, which processes the signals from the sensor. The use of the slits allows considerably reducing the amount of measuring data to be processed.
The slits 186 of the first series may extend in the Y-direction and then allow determining the X-position of the individual spots with respect to the sensing module 180. The slits 188 of the second series may be arranged at an angle of, for example 45� with respect to the X- and Y-direction and then allow determining of the Y-position of the individual spots with respect to module
In order to measure the positions of the exposure spots with respect to the tracking configurations, e.g. gratings 171 and 173 on the lens plates, the sensing module is provided with an X-encoder 190 and an Y-encoder 192. Such an encoder comprises a grating having a structure corresponding to the structure of the lens plate grating with which it co-operates and a radiation-sensitive detector arranged below the encoder grating. If the encoder grating moves across the corresponding lens plate grating, the detector supplies a pulsed signal and by counting the pulses the position of sensing module with respect to the lens plate can be determined. It will be clear that the encoder 190 will supply information about the X-position of the module 180, whilst the encoder 192 will provide information about deviations in the Y-direction of the sensor movement. Such deviations can also be determined by a capacitive or inductive sensor, which measures the distances from the sensor to the side of the module facing the sensor. If such a sensor is used, the module does not comprise an Y-encoder and the lens plate does not comprise a tracking configuration 192.
A shown in
In this way the positions of the spots with respect to the positions references, i.e. the gratings, on the lens plate can be determined. The lens plate is further provided with alignment marks 198, two of which are shown in
Instead of a first series of slits 186 extending in the Y-direction and a second series of slits 188 extending at 45� with respect to the slits 186, preferably two series of slits extending at +45� and −45�, respectively are used.
This is shown in
The X-position of a scanned spot can be derived from the time moment t3, i.e. the moment at which the spot is midway the two slits of one pair.
An important parameter in lithography is the so-called exposure dose, i.e. the radiation energy per unit surface area incident on the resist. In order to allow developing the resist after exposure, the exposure dose should be larger than a threshold value called minimum clearance dose. The total exposure dose supplied by an exposure spot is the product of the intensity of the spot and the time interval Tsd during which the spot is present. During measurement of an exposure spot, samples are taken in successive sample times ts. The samples times can be adapted to, for example the type and fines of measurement to be carried out. The smaller the sample time, i.e. the higher the number of samples taken during unit of time, the finer the measurement can be. The minimum sample ts is given by:
t s=1/f frame
wherein fframe is the frame rate of the CCD sensor, i.e. the frequency at which the sensor cells are read out. The sample times may be equal to each other or not. The frame rate may be constant. However, it is also possible to trigger read out of the sensor externally, for example by the signal supplied by a position encoder. The fframe is the no longer constant and the sensor is read out at moments the position encoder is at pre-determined positions. In this way the spot measurement can be made insensitive to the speed of movement of the module.
Usually the spot has a Gaussian type intensity distribution so that in the successive sample times different energy levels are measured, which energy levels may be called grey values GV. The intensity Ist measured during a sample time is given by:
I st =GV/t s
and the mean intensity Isp of the spot is given by:
I sp =ΣGV/n
Whereby the summation is over n, i.e. the number of sample taken during the presence of the spot above the relevant sensor cell or during one of the pulses generated by this spot shown in
Since with the slit configuration shown in
The above-described measurements can also be carried out with the pairs of slits shown in
When used in a lithographic apparatus described herein above, which apparatus is also called mask-less lithographic apparatus, the invention not only allows determining accurately both a number of spot parameters and the position of the spots, but also provides the advantages that production spots, i.e. the spots used for writing in a resist layer are monitored and that production radiation is used so that no wavelength correction is needed.
The invention can also be used in another type of mask-less lithographic apparatus. This apparatus comprises a projection system, for example a projection lens system or, in case deep UV (DUV) radiation or extreme UV (EUV) exposure radiation is used, a mirror projection system. The projection system images the array of light valves on the array of lenses, whereby each light valve is conjugated with a corresponding lens. The use of a projection system allows more freedom of design than allowed in the sandwich design of the
The pixels of the LCD 16 may have a size of 20 μM and the projection lens system 250 may image the LCD pixel structure on the micro lens array with magnification 5�. For such imaging no large numerical aperture (NA) for the projection lens system is required. To improve the collimatation of the illumination beam incident on the micro lens array, a collimator lens 254 may be arranged in front of this array. The projection lens system 250 and a micro lens together image the diaphragm opening into a spot. For example a diaphragm opening of 1 mm is imaged in a spot with a dimension of 1 μm. As the working of the LCD is based on changing the polarization state of incident radiation, a polarizer, which gives the radiation the required initial polarization state is needed. Also needed is a polarization analyzer, which converts a change in polarisation into an intensity change. This polarizer and analyser are denoted by reference numerals 246 and 248, respectively. The polarizer and the analyzer are adapted to the wavelength of the illumination beam. Although not shown in
Since in an apparatus with a projection lens system the radiation from a LCD pixel is focused on the associated micro lens, practically no cross talk will occur in such an apparatus. By means of the projection lens the periodicity of the light valve array can be adapted to that of the micro lens array. Moreover using a projection lens allows provided the possibility to use a thick substrate for the converging plate so that the micro lens array is more stable. The polarizer and analyser used in an apparatus with a LCD light valve array absorb radiation and produce heat. If the polarizer and analyzer are arranged close to the LCD, which is usually the case, this may cause thermal effects. An apparatus wherein a projection lens is arranged between the LCD and the imaging element allows arranging the polarizer 228 remote from the LCD. In this way it is prevented to a high degree that thermal effects will occur. As shown in
When using a projection lens system it becomes easily to replace a transmission light valve array by a reflective array, such as a reflective LCD or a digital mirror device (DMD). An apparatus wherein a DMD is used should be provided with spatial filtering means. These means should ensure that only radiation having a predetermined direction, i.e. radiation which is reflected by mirrors having a predetermined orientation, reaches the micro lens array 40 and the resist layer. A projection lens system provides such filtering function.
The apparatus of
Since the method of the invention for detecting presence or absence, due dust, a light valve failure etc., of exposure spots, determining their the position and monitoring their parameters is very fast, the method can be carried out before each exposure of a substrate. Dependent on the circumstances the method can also be carried less frequently, for example at the beginning of processing a batch of substrates or at the beginning of a working day. The method thus forms a first step in a lithographic printing process for manufacturing a device having device features in at least one process layer of a substrate. Application of the method makes the printing process insensitive for temperature drift. Moreover the method allows total control of the entire optical printing system.
After the required image has been printed in the resist layer on top of the process layer, material is removed from, or added to, areas of the process layer which areas are delineated by the printed image. These process steps of imaging and material removing or adding are repeated for all process layers until the whole device is finished. In those cases where sub-devices are to be formed at different levels and use can be made of multiple level substrates, sub-image patterns associated with the sub-devices can be imaged with different distances between the imaging element and the resist layer.
The invention can be used for printing patterns of, and thus for the manufacture of, display devices like LCD, Plasma Display Panels and Polyled Displays, printed circuit boards (PCB) and micro multiple function systems (MOEMS).
The invention can also be used in a mask-less lithographic apparatus wherein the converging element comprises diffractive elements instead of micro lenses. The invention can not only be used in a lithographic proximity printing apparatus but also in other kinds of image forming apparatus, such as a printing apparatus or a copier apparatus.
In general, most effectively the sensing module is moved in a direction perpendicular to the scan direction, i.e. the direction in which the resist layer is moved with respect to the arrays of converging elements and of light valves during exposure of the resist layer. This allows simultaneously monitoring of the spots and handling of the substrate, i.e. feeding the substrate with resist layer in the apparatus. The information, obtained during such monitoring, about the spot positions can be compared with data in a look-up table and the results of such a comparison can be used to adapt the writing process and apparatus. The intensity measurement supplies information about which spot(s) should not be used and which spot(s) should replace the non-usable spot(s).
|Citing Patent
|Filing date
|Publication date
|Oct 1, 2010
|Jul 12, 2011
|Microvision, Inc.
|Integrated photonics module and devices using integrated photonics modules
|Oct 1, 2010
|Jul 26, 2011
|Microvision, Inc.
|Integrated photonics module and devices using integrated photonics modules
|Feb 28, 2008
|Mar 20, 2012
|Nikon Corporation
|Exposure method, exposure apparatus, light converging pattern formation member, mask, and device manufacturing method
|Jun 10, 2011
|Jan 15, 2013
|Microvision, Inc.
|Integrated photonics module and devices using integrated photonics modules
|U.S. Classification
|355/53, 355/77
|International Classification
|Cooperative Classification
|European Classification
|Apr 12, 2006
Owner name: KONINKLIJKE PHILIPS ELECTRONICS, N.V., NETHERLANDS
Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:TIMMERMANS, ROGER ANTON MARIE;VAN DE RIJDT, JOHANNES HUBERTUS ANTONIUS;REEL/FRAME:017825/0283
Effective date: 20050523


text:
- 41Promote
Art Print
DOGby Monika Strigel
Collect your choice of gallery quality Giclée, or fine art prints custom trimmed by hand in a variety of sizes with a white border for framing.
Samoyed sled dog in the snow
Photography in winter
beautiful dog!
He looks like my aunt's dog frosty! XOXO
Thank you Sylvia :)))
Thank you so much Debbie for your advice :)
Thank you Karol :)
✯ ✯ ✯ ✯ ✯ 👍 !!!
What a cutie, reminds me so much of my white doggie! Beautiful, beautiful photo! :-))
this is great :)
See More Comments


text:
Constitutional Court suspends new bank supervision agencyby DFWatch staff | Oct 13, 2015
TBILISI, DFWatch--Georgia's Constitutional Court has suspended the work of a newly created agency that was to take over the supervision of private banks; previously the responsibility of the National Bank. The ruling was made during a lawsuit against the parliament
Georgia has highest proportion of undernourished in South Caucasusby DFWatch staff | Oct 12, 2015
TBILISI, DFWatch--Georgia has the highest proportion of undernourished among South Caucasus countries, according to a new report. From 2014 to 2016, the level of undernourished is estimated to be 7.4 percent. This is higher than both Armenia (5.8 percent) and
Georgian president appoints new political adviserby DFWatch staff | Oct 12, 2015
TBILISI, DFWatch--President Giorgi Margvelashvili on Monday presented Pikria Chikhradze as his new political adviser. Chikhradze is active in the New Rightists Party and is most known for her work as a youth activist in the National Liberation Movement,
ISIS commander from Pankisi reported to have died in Iraqi air raidby DFWatch staff | Oct 12, 2015
TBILISI, DFWatch--An Iranian news agency reports that Omar Al-Shishani, an ISIS commander who originally comes from Pankisi, Georgia, has died in an Iraqi air raid. The reports have not yet been confirmed. IRNA reports that Iraqi fighter jets wounded
One man dies in landslide in southwestern Georgiaby DFWatch staff | Oct 12, 2015
TBILISI, DFWatch--One man died in a landslide in southwestern Georgia on Sunday. The victim, 58 year old Otar Davitadze, was on night watch supervising machinery in an open pit mine when a landslide hit in the village Akhalsheni, Khelvachauri.


text:
An oversized item surcharge may apply to some heavy or bulky items due to size, weight or special handling required. This item surcharge is in addition to standard shipping rates and not included in shipping promotions.
Attivo offers activewear with comfort and style! This Attivo active wear top features a color blocked design, a back cut out & an internal shelf bra with removable cups. Top length is approximately 25 inches.
Web Id: P000305366


text:
Absolute Paradise Villas at Pineapple Village
No prices found through our partners. Please contact the business directly or check some of our recommended alternatives.
Travelers also recommend:
TripAdvisor Reviews Absolute Paradise Villas at Pineapple Village St. Thomas
Travel Blogs from St. Thomas
Happy New Year
... out on the 7th January to visit their friend in Mexico for a few days before flying home to Sydney via Dallas. Due to the uncertainty with Judy they will drop the Puerto Rico, Dominican Republic/Haiti and Cuba leg of their trip as we did which is a pity but gives us all a reason to return to this part of the world.
St Thomas, like all the Virgin Island group is a beautiful place. More developed than the BVI due to the American influence but not spoilt or over ...
... a my first corner cafe for several hours and only leave minimal tip, but that is what I have to get used to.There is no more "Valet Dan," as Nicolette pointed out. I was happy at least I made the waitress smile quite a few times. I went outside and recognized 8 people outside from my ship and sat down with them for another beer. A few of them were rather sauced, and I was proud of my composure. After making my appearance it was time to venture on to my ...
Turtles, snorkelling and wicked rum punch
We woke to the sight of the island of St Thomas, and the entry to the harbour is a lovely sight. We had a shore tour booked and grabbed some breakfast early so we could watch the entry to the dock from the deck. St Thomas was owned by the Danish before it was bought by the US and there are remains of defence buildings at the entry to the port.
We exited the ship and met up with our tour group. We were booked on a snorkelling tour to Turtle Cove and we enjoyed a ...
Hubba Bubba Fun in St. Thomas
... Caribbean fare of rum punch. It wasn't very strong, but it tasted good and there were plenty of refills (I ended up having six). There was also bread and cheese to eat. I tried pepper jack cheese for the first time ever, and it was really good!
The cruise back was very fun, standing on deck, sipping rum punch, and just enjoying the sunshine. It felt like we went a lot slower on the way back too, which was good. But I still didn't want to get off when we got back ...
Oasis of the Seas Cruise
... so it helps the people living there. We didn't see the poverty that we saw in Nassau or in the South Pacific but the cars and buildings we did see were still pretty run down.
Magen's Bay was simply stunning. The kids didn't take ...


text:
Four locals included in NWCC Who's Who
Northwest Mississippi Community College recently announced its 2013 Who's Who Among Students in American Universities and Colleges. This prestigious organization exists as one of the most highly regarded and long-standing honors programs in the nation. Individual schools make selections to Who's Who each fall. The students are featured in the college's yearbook "The Rocketeer."
Latest News
Harassment cited in SO shake-up A shake-up in the Tunica...
Hollywood appeals 2016 county tax levy As supervisors began...
Preserving our past The 2015 Bankhead Highway...
Accountability is goal of new county website TUNICA COUNTY,...
Postmaster cautions against unpaid mailbox usage Tunica Postmaster Rebecca...
- 1
- 2
- 3
- 4
- 5
- 6
- 7
- 8


text:
Visit our other Wisconsin Historical Society websites!
Refine or narrow your results by clicking any term in the gray boxes below.
Expand your results by removing any breadcrumb in a gray outlined box above. Click on the blue "X" to remove the term.
Narrow your results by entering a keyword into the search box above. Then click the "Search Within" checkbox, then click on the orange "Search" button.
If you did not find what you are looking for or you did not get any results, try changing your search term(s). See our Search Help page for more tips.
Date: 1913-08-15
Description: Men at desks in the Pawling & Harnischfeger advertising department. Large windows on left look out towards another building, and men on equipment can be se...
Date: 1965-10-16
Description: High school boys in industrial drafting class using drafting machines and compasses.
Description: Men working at desks at the Pawling & Harnischfeger shop office. A row of windows is on the left, and another building can be seen through an open window.
Description: Robert Bloch standing in a doorway peers through an ornate picture frame holding a roll of toilet paper in front of his open mouth.
Date: 1937-06-27
Description: Milwaukee Works factory employee uses a microscope to inspect diesel engine pump parts.
Date: date unknown
Description: Elevated view of a demonstration of a nuclear reactor driven energy plant.
Date: 1914-01-01
Description: People sitting at a table in a dance hall wine room at 2:00 a.m.
Date: 1916 ca.
Description: Elevated view of Pawling & Harnischfeger 7.5 ton type "N" bridge with a 15-ton type "A" trolley being assembled on the P&H assembly floor. The crane is sta...
Date: 1903 ca.
Description: Young woman facing to the right with her head turned toward viewer, hand on hip, wearing wire-rimmed eyeglasses, a flower in her hair, in long white dress...
Date: 1864 ca.
Description: Carte-de-visite studio portrait of 1st Lieutenant Richard Cadell seated in a chair and wearing his military uniform. He holds a rifle in his right hand and...
Date: 1914-02-28
Description: =Quarter-length studio portrait of Reverend William Walter Webb, Milwaukee clergyman.
Date: 1946
Description: Workers chipping imperfections from a rough casting.
Description: Three-quarter length seated studio portrait of William Lindsay, Milwaukee merchant.
Date: 1940 ca.
Description: Interior of the People's Bookstore. Close-up of magazine and pamphlet shelves with many titles visible. Titles include "The History of the Communist Manife...
Date: 1937-06-03
Description: Factory worker installs a transmission in a W-30 tractor on an assembly line at Milwaukee Works.
Date: 2009 ca.
Description: Stairway from lobby to lower balcony of Pabst Theater.
Date: 1921-07-14
Description: Quarter-length studio portrait of Herbert N. Laflin, Milwaukee lawyer.
Date: 1963-08-20
Description: Knights of Columbus member celebrates five cent beers at annual "gay nineties" party.
Description: The operator of a nuclear plant sits in the control room.
Date: 1907
Description: Factory workers in the machine shop at International Harvester's Milwaukee Works.
If you didn't find the material you searched for, our Library Reference Staff can help.
Call our reference desk at 608-264-6535 or email us at:
© 1996-2015 Wisconsin Historical Society, 816 State Street, Madison, WI 53706


text:
The site you are connecting to () is not published by YellowPages.ca™, so we cannot guarantee its availability or take responsibility for its content.
Do you wish to continue?
Sorry, we didn't find any business matching "cabinet refacing" in "Saint John NB". We've expanded your search to include associated keywords in hopes of returning listings that may help you.Can't find what you are looking for? Report a missing business.
1 businesses for cabinet refacing surrounding Saint John NB
Were you looking for:Cabinet Makers


text:
Maximus GNOME Shell Extension
The Maximus GNOME Shell Extension attempts to emulate the Maximus package for the Ubuntu Netbook Remix.
That is, it removes decoration (i.e. the title bar) from maximised windows, saving vertical real estate. For example, Google Chrome does this by default. Useful for netbooks with small screens.
|With Maximus
|Without Maximus
NOTE: with the titlebar of a window hidden, you may find it difficult to unmaximise/move a window. In this case, I recommend either remembering your system's keyboard shortcut for un/maximising a window (e.g. Alt+F10 on Fedora), or use the Window Options GNOME shell extension which adds a drop-down menu to the title bar in the top panel with these options (shameless plug, I wrote that one). You might also like the Window Buttons extension which adds the close, minimize, maximize buttons to the top panel.
Changelog (see
Changelog file for further details):
- v10 (e.g.o), v2.2 (tagged):
- changed the default method to hide the titlebar to hopefully be more stable, if the user is not using the Ambiance or Radiance themes (the old
- much code cleaning
- various misc. fixes.
- v4 (e.g.o), v1.3 (tagged):
- added blacklists/whitelists
- fixed bug where Maximus wouldn't work on windows with non EN-utf8 characters in the title (bug
- made it harder to get stuck in fullscreen mode (particularly thunderbird)
- better behaviour when maximizing from fullscreen to halfscreen.
Written 2012 by mathematical.coffee email@example.com.
Project webpage: at bitbucket.
On GNOME 3.4+: use the prefs widget. On GNOME 3.2, modify
Half-maximised windows
By default, only fully-maximised windows are undecorated.
If you also want to undecorate half-maximised windows, edit the line in
extension.js to change this line:
const undecorateHalfMaximised = false;
to this (change the
false to
const undecorateHalfMaximised = true;
Blacklists and whitelists
From dev-version 1.3 onwards (v4 on e.g.o), there is support for a window blacklist/whitelist.
If a window is on the blacklist, then all windows except those in the blacklist will be affected by Maximus. If a window is on the whtielist, then only the windows in the whitelist will be affected by Maximus.
To set whether the list is a blacklist or whitelist, modify this line at the top of
/*** Whitelists/blacklists ***/ const BLACKLIST = true; // if it's a white list, change this to FALSE
To add apps to the blacklist or whitelist, add them to the
APP_LIST variable in
You have to add the window's application name (like 'thunderbird.desktop') for it to work.
To see what an application's window manager class is, open up an instance of it.
Then press
Alt + F2 and type
lg. Go to the 'Windows' tab and note the
app of the window in question (press Esc to exit).
Add this in to
The easy way (recommended):
One-click install from extensions.gnome.org!
From this website:
- Download the .zip file on the Downloads page.
- Open
gnome-tweak-tool, go to "Shell Extensions", "Install Extension" and select the .zip file.
Branch Info (for developers)
- 'stable' branch works with GNOME 3.2+. No fancy prefs widget.
- 'gnome3.4' branch: GNOME3.4+ with prefs widget.
- 'default' branch: the gnome3.4+ development branch (has prefs.js). i.e. dev branch for 'gnome3.4'.
- 'polyglot-dev' branch: the gnome3.2+ development branch (same as above but no prefs.js). i.e. dev branch for 'stable'.


text:
Edit hours
Touch pads at the tables are super convenient
20-25 min wait has turned into 1hr and 15min ridiculous
The food was great. The service was terrible. Won't be back!
Service is bad, not horrible only because our waitress was a sweet heart. It is not her fault it took over an hour to get our food and drinks. The rest room, forget about it, HORRIBLE!
first of all, Amanda was a great server...hope Kionne's pinky has healed...."how TF you pop you pinky out of place....haha!!!" I could do without the electronic contraption...I prefer a human being!!!
Don't come tonight. They have a 25 minute wait.
Come now! Join the fun! Applebee's has devices AT THE TABLE to order from the bar...appetizers and more! ❤
They have cool new computers at the tables. You can play games and order from it
Called to complain about poor service, manager blew me off. How's that for customer-oriented?
Honors Veterans. Great food.
Bartender, Ashley's very personable.
Food sucks
Hope your not thirsty takes forever for someone to greet and get a drink.
good lunch place..
If you are a vegetarian, you are S.O.L.


text:
Star Trek A To Z
View Single Post
September 12 2013, 05:21 AM
Fleet Admiral
Location: With cooleddie74 in the Warped Sector of the Demented Quadrant
Re: Star Trek A To Z
A is for Antares.
B is for Beta Stromgren.
C is for Capella.
D is for Deneb.
E is for Epsilon Indii.
F is for Ferenginar. "Rain, Rain, Go Away" is their national anthem.
G is for Gamma Hydra.
H is for Hayashi.
I is for Izar.
J is for Janus.
K is for Komari.
L is for Lissepia.
M is for Mars.
N is for Nausicaa.
O is for Orgasmia.
P is for Pollux.
Q is for Quadra Sigma.
R is for Regulus.
S is for Sarpeidon.
T is for Talos.
U is for Uranus.
V is for Valt Minor.
On Halloween Night the Great Temporal Pumpkin rises out of his chroniton patch and flies through space with his bag of new timelines for all the children.
View Public Profile
Send a private message to Ghouleddie74
Find More Posts by Ghouleddie74


text:
In the Shadow of the Glen
Rating: Rated: 10 times
Format: PDF, ePub, Kindle, TXT
This one-act play by Irish playwright, J. M. Synge, revolves around a farmer, his wife, and a young herd. Download it today!
Rating: Rated: 7 times
Format: PDF, ePub, Kindle, TXT
Based on the classical myth, Pygmalion plays on the complex web of human relationships in a social world. Download it now!
Rating: Rated: 3 times
Format: PDF, ePub, Kindle, TXT
The extensive commentary on this play touches on matters of all types, but its focus in particular is about the realities of daily life in classical Athens. It also examines the practical problems of staging. Its substantial introduction includes essays on Aristophanes' early career, Greek world...
Every Man out of His Humour
Rating: Rated: 11 times
Format: PDF, ePub, Kindle, TXT
By English Renaissance dramatist, Ben Jonson. A comical satire about envy and aspiration among those in the ambitious middle class, who seek happiness in fame and material fortune. Download it now!
Little Eyolf
Rating: Rated: 1 times
Format: PDF, ePub, Kindle, TXT
By Norwegian playwright, Henrik Ibsen. A two and a half-hour portrait of a marriage so bleak, that it made Nora and Torvald Helmer's doomed union in A Doll's House seem almost enviable. Download it now!
SH Mintardja - Tanah Warisan
Rating: Rated: 8 times
Format: PDF, ePub, Kindle, TXT
Diambil Dari Situs Kedaulatan Rakyat (www.kr.co.id) (07-08-2001 - 02-06-2002)
Caesar and Cleopatra
Rating: Rated: 15 times
Format: PDF, ePub, Kindle, TXT
A five-act play comparing the lives of Caesar and Cleopatra as depicted in Irish playwright George Bernard Shaw's play, "Caesar", and the film classic, "Cleopatra", in contrast to the events that actually took place in their lives.


text: We stayed 2 nights in a 2 room suite in July. The rooms were very clean, comfortable and quiet. There were plenty of electrical outlets for my electronics. The front desk person (Alicia?) was very nice and helpful. I didn't much care for the breakfast they served-the only meat available was sausage and the eggs tasted like they were powdered. I wish the view from the room was better, we looked at the building next to us.


text:
Economics Departments, Institutes and Research Centers in the World
School of Business
East Central UniversityLocation: Ada, Oklahoma (United States)
Homepage: http://www.ecok.edu/colleges/business/
This link seems to be broken. We welcome a better address.
Phone: (580) 310-5274
Handle: RePEc:edi:sbecous
This listing is provided to you by EDIRC at the Economic Research Department, Federal Reserve Bank of St. Louis.
Please send additions and corrections to Christian Zimmermann.


text:
Tags » River Shannon
A Loop in the River
This Blog's title owes itself to the River Shannon. The river meanders its way through the countryside and provides us with some beautiful backdrops. Today the sun was shining brightly which can be rarity hereabouts, at least of late. 767 more words
Interiors: Sean's Bar, Athlone, Ireland, the oldest pub in Europe.
This rather unassuming-looking place, almost seedy with its plain wooden stools, smudged linoleum floor and cheap plaster ceiling, might be any totally forgettable bar in the British Isles. 405 more words
Glin Castle,the end of an era.
There is great sadness in West Limerick that Glin Castle is to be sold. Glin Castle is situated beside the lovely little town of Glin, overlooking the River Shannon. 383 more words
Monday: Merle arrives in Ireland
This morning I picked up my LG tablet prize with my other Smarter Travel Challenge teammates, and we had a tea in Scholars with one of the Smarter Travel guys. 99 more words