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All Courses
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Learn how to use CINEMA 4D to sculpt and retopologize a lightweight, hard-surface model for complex scenes and animation.
Learn how to model, texture, light, and animate 3D objects in CINEMA 4D, and create amazing motion graphics, visual effects (VFX), and animations.
Learn how to create realistic product renderings for print and video advertising with CINEMA 4D.
Take a reference photograph and create a model from its shapes and pieces with the primitive and spline modeling tools in CINEMA 4D and C4D Lite.
Use CINEMA 4D's sculpting tools to sculpt the head of an old man and paint a great-looking texture map with BodyPaint.
Learn how to model realistic 3D characters with the powerful and flexible modeling toolset in CINEMA 4D.
Reviews the most exciting new features in C4D R15, including rendering improvements, kerning controls, beveling, and changes to the sculpting engine.
Chris Korn, character designer at FUSE Animation, explains how he brings his creatures to life with CINEMA 4D and Zbrush.
Introduces MoGraph, a toolset that allows you to model and animate objects without keyframes, and shows how to use MoGraph to quickly get your characters up and running.
Introduces two CINEMA 4D modeling techniques: HyperNURBS, or subdivision modeling, for creating smooth rounded objects, and sculpting.
Covers the basics of the 3D modeling toolkit in CINEMA 4D: splines and polygons.
Introduces the CINEMA environment and illustrates the importance of the object hierarchy.
"I often watch the lynda.com videos on my laptop while working out on a stationary bicycle. The short length of the video segments helps to keep me motivated: "I'll quit at the end of this chapter." So far I have lost 25 pounds!" —Gail P.
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Download 3M™ Littmann® SoundBuilder iPhone iPad iOS
The 3M™ Littmann® SoundBuilder App is a learning tool designed to help improve the auscultation skills of students and practicing clinicians. There are 14 unique lessons - based upon key heart sounds - that combine text, a virtual mannequin, 3D cardiac animation and dynamic waveforms.
This tool is intended for educational purposes only. It is not intended for diagnostic purposes.
Tags : soundbuilder , littmann® , littmann® soundbuilder , 3m™ littmann®
If you are iPhone and iPad owner,you now can download 3M™ Littmann® SoundBuilder for free from Apple Store. The application is designed for use in English language. It weighs in at a hefty 100 MB, so make sure you have plenty of free space on your iOS device. It is highly advisable to have the latest app version installed so that you don`t miss out on the fresh new features and improvements. The current app version 1.01 has been released on 2014-11-08. The Apple Store includes a very useful feature that will check if your device and iOS version are both compatible with the app. Most iPhone and iPad are compatible. Here is the app`s compatibility information: Compatible with iPhone, iPod touch, iPad, and ix.Mac.MarketingName. Requires iOS 3.2 or later
More Info: Find more info about 3M™ Littmann® SoundBuilder in 3M Company`s Official Website : http://solutions.3m.com/wps/portal/3M/en_US/Littmann/stethoscope/service-support/contact-3M/
iOS 3M™ Littmann® SoundBuilder 1.01 Mobile
Customer Reviews
Get rid of the commercials
Plz make a paid version for 99c and without those adds. Also it would be great if you guys added more physical examination (for example mitrial regurgitation can be attenuated by hand grip, expiration, etc...). More heart sounds would be great too. Nice little app for practicing your heart sounds.
Better learning!
I really liked the first version of the app, but now with the looping heart sounds, I can really learn through repetition. It`s great. Thanks, Littmann.
Pretty good
The only things that could make it better is lung sounds and a few more heart sounds but thanks littmann this is awesome for nursing students and I <3 my littmann stethescope!
Related - Medical - 3M™ Littmann® SoundBuilder 1.01
More in Medical - for 3M™ Littmann® SoundBuilder iPhone
More by 3M Company - for 3M™ Littmann® SoundBuilder app ioS

subset: commoncrawl


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Comments (5)
Mine wasn't done recently, but I have had one done. I had my first U/S at 6 weeks 1 day, and so far so good. They want me back at 11 weeks for another U/S specifically to measure my cervix. While my procedure was years ago, my doctor said there was still risk. I am remaining positive, but the thoughts of that part of my medical history in the past still weigh in the back of my mind.
Mom to 5
"What doesn't kill you makes you stronger. Except for bears. Bears will kill you"
Cat & Josh
Kylara (20), Kaitlyn (15), Kadon (12), Krystle (8), Kalvin (5)
I am 36 weeks today. They told me that there is complications of my cervix dialating any further because of the LEEP I had in 2003. They stated that they may have to cut the scar in order for my LO to come. Other then that I have healthy baby.


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Tonight, Tonight: The Young Maths at Andy's Bar in Denton, Chicago at the Meyerson Center
A pretty slow Wednesday evening musically, but at least there's a nice triple-bill of up-and-comers at Andy's for anyone who wants to head to Denton. And, if you're feeling sentimental, you can head to the arts district and catch a Peter Cetera-less Chicago playing with the DSO...
Lovesick Mary, The Young Maths and The Truth About Movie Stars at Andy's Bar in Denton
Headlining tonight's nifty triple bill at Andy's is Denton's own Lovesick Mary. The poppy quintet is fronted by Beth Lutz and sounds a bit like a less salacious version of Garbage. A bit more interesting is one of the opening acts: McAllen's The Young Maths. These guys play jagged indie rock that defies easy comparisons. The band has a couple of good EPs under its belt and is working on a full length. Songs such as "Sheets," "Gay Bars" and "Fingered on the Dance Floor" remind me of Kaiser Chiefs on crystal meth. Lastly, starting things off tonight will be Dallas' own The Truth About Movie Stars, an emo-ish quartet that recently released its debut full-length. Led by Kylan Savage and Tanner Evans, TTAMS is certainly worth getting to the venue a bit early for, as well. All in all, not a bad way to spend a hump day evening.
Chicago with the Dallas Symphony Orchestra at the Morton H. Meyerson Symphony Center
The cheapest seats in the house for this event will run you 50 bones. The most expensive will run you $175. And this is all for a band that's performing without its iconic frontman, Peter Cetera, who left the band in the mid-'80s. Still, they're something of an inspiration.
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- Mötley Crüe Flew Out of Dallas on a Floating Rig of Excess Wednesday
Upcoming Events
The Tragically HipFri., Oct. 9, 9:00pm
Counting Crows With Citizen CopeSat., Oct. 10, 7:00pm
Counting CrowsSat., Oct. 10, 7:00pm
Joe JacksonSat., Oct. 10, 8:00pm
- Tickets
- Denton's Joel Cross Shakes Off the Internet Fame From His Taylor Swift Cover
- Music Festivals Are the Actual Worst


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Your trust is our top concern
Did you know businesses can't pay to alter or remove their reviews from ResellerRatings. When merchants become a merchant member, they have the ability to survey their customers, however cannot ask for positive reviews. Find out how our ratings for a business is calculated. Learn more.×
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"I have mixed feelings for nuts.com, which is why they get a 3 star rating. Most of the food I ordered tasted pretty good. I had to pay the higher shipping and purchase cold packs to ensure my candy wouldn't melt. The order was over $100.00. Five bags of candy were melted. Surprisingly, the taffy was okay. They also forgot to send my 4 samples for free that I used a promo code for. When I contacted customer service, their solution was for me to place another order and that they would then credit the melted items or resend them. Then they gave me a link to add my 4 free samples, as they informed me I was supposed to use on the first order. What was the promo code for then?? I don't understand why they wouldn't just credit the melted items and then send out the 4 samples as a good faith gesture, and to ensure keeping a happy customer? They state that they will do anything to fix any problem, but it's a lie. Plus, the guy from "customer service" said if they sent out replacement bags and they were melted again, there's nothing further they could do. This doesn't sound like going above and beyond to me. Why charge for cold packs then if they don't guarantee their merchandise? It doesn't seem as if they care much about the satisfaction of their customers. The reason I ordered in the first place was due to all of the glowing reviews I read on their website. I should have known they only publish positive reviews. Maybe they are all fake. I just know I'm torn and don't know if I will order from them again or not. I liked a lot of the items I purchased, but their so-called customer service leaves a lot to be desired!"
"Very bad seller, they sale rotten Soy bean to me. "
Been a LOYAL customer for 4 years, UNTIL now! Candy caused extreme food poisoning symptoms to a gift recipient. Nuts.Com REFUSED to stand behind their website's 100% satisfaction guarantee. Customer service representatives were rude, refused to issue refund, or pick up defective product. Opened a disputed with PayPal, and was immediately issued a refund.
Had I known that this is how their customer service worked, I would NEVER have bought from them all this time!
Too many other places to shop.
I ordered Sugar Free Mini Peanut Butter Cups, Old Fashioned chocolate fudge and Old Fashioned Hard Candy, paid for extreme fast delivery and extra heat resistant packaging. It was delivered to the recipient the next day.
The recipient ate four of the mini peanut butter cups, and then proceeded to spend an hour+ unable to leave the bathroom experiencing horrible diarrhea symptoms.
The label on the website and on the sugar free items says "*Warning: Excess consumption may have a laxative effect.*" However, EXCESS, refers to more than a single serving size, and four mini peanut butter cups is NOT EXCESS and should NOT cause that reaction!
When customer service was contacted SAM responded that "unfortunately the amount does vary from person to person". By SAM's definition of EXCESS, "varying from person to person", would mean that some people would get SICK from 1(ONE) piece, which is absolutely absurd and should NOT be the case. NO WHERE does it state on Nuts.Com, NOR on the food packaging, that EXCESS means that it varies from person to person and that it is highly possible that even 1(ONE) bite may result in hours of EXTREME Sickness, immeasurable pain, continual diarrhea, horrendous gas and uncontrollable belching.
SAM agreed to a partial refund. However, I insisted on a Full refund. SAM said items had to be returned, and they would send UPS immediately the next day to pick up the box. UPS Never arrived. Six days later, with multiple phone calls a day to Nut.com asking when UPS would be sent to pick up faulty items in order to process the refund, I finally opened a dispute with PayPal. Within hours I had a refund through PayPal.
Will NEVER, EVER, EVER shop at Nuts.Com again.
"I placed an order with nuts.com and had to pay extra for heat resistant packaging because I live in Florida. When the order arrived all the chocolate in the bags was severely melted. The tin of assorted chocolates was mixed up so bad it took 20 minutes to separate all the different pieces. Needless to say I will never order from NUTS.COM ever again. Horrible company to deal with."
"First time ordering from here and YAAAS I'm so happy and excited. The order shipped so quickly and i got it super fast. The box that it comes in is probably my favorite, cutest thing ever. I got mochi rice cakes (rainbow) and they're so tasty and squishy and just so awesome. (I also got tapioca pearls but haven't tried them yet, so excited to though) Definitely ordering from here more often. "
"Very disappointed with my last order. I ordered on Feb. 12 got a confirmation, shipping date of the 13 and arrival on the 18th. On the 21st I called to see where it was and they said they cancelled it due to not being able to verify my address (no phone call, email, or text)(also same address they sent the last order to....duh). Bottom line I never got the order....they never contacted me....also their solution was that I was more than welcome to place another order...thanks...but I'll shop somewhere where the customer is appreciated and honestly dealt with....goodbye nuts."
"I'm a snack person. I like having healthy options in my desk, car, cupboard, etc. so I'm not tempted to go eat things that aren't so healthy. And these guys met every expectation I could have had.
The website is easy to navigate and understand. Their branding is great! (I'm a designer...so it impressed me). I was thoroughly satisfied with every product I've ever ordered from them. Their shipping is prompt. And the pricing was as good or better than buying locally. Overall, I can honestly say I'll definitely be purchasing again. "
" I am very, very disappointed in the very poor customer service given when my son called in to talk about the large green bug and bug sack found in the products I ordered for him for Christmas !!! A woman named Jane answered and when told my order had bugs she actually laughed. NOT FUNNY ! She said it happens sometimes. IT SHOULD NEVER HAPPEN !!! When asked if someone else to talk to, she said no, she was hired to answer the phone and she was the only one to talk to. I will never order from Nuts.com again. This was just TOO much. It was bad enough getting very poor customer service, but for a Christmas order ? I sent a pic of the bug. Tasty Huh ? I was to get a refund. Finally got a partial refund on 12/29/14. Two refunds of $4.99. Order was $74.44. Threw out the whole bag of product. Stale and unsafe to ingest. Never again purchasing from this store !!!!!"
"I ordered Red Pistachios and I am very pleased. They are so delicious and will purchase from them again in the future. The shipping was very quick had my pistachios in two days. Extremely quick service. I will recommend this company to everyone. One very happy customer."
"I ordered sweet creame almonds from Nuts.com. The almonds have a sweet cream coating and are very crunchy. The order I received was very poor quality. The nuts were stuck together in a big blob and were stale tasting. I called customer service and she grabbed a bag of sweet creme almonds and tasted them and said they tasted bad and to ship them back. Ity cost me $10.00 to ship them back at my costs. This was the worse tasting almonds I have ever tasted. I will never order anything from these jokers again. You got me once but you won't get me again. Don't order anything from these crooks."
"I ordered from this store several times in the last 3 years. Generally I was quite satisfied with the products. Only once or twice nuts were over-roasted and way too salty, and I was given refunds.
The reason why I give only 2 stars is a recent negative experience with a product and subsequent review posting that has undermined trust in this company.
I ordered black sesame seeds that, when added to cereal, revealed that most seeds in the bag were dyed with a black stain that was released, leaving many white and brown seeds, and very few black ones. This is a common problem with batches from other vendors, probably due to shortcuts by producers and wholesalers adding cheaper dyed seeds to make a bigger profit. These seeds, even the organic varieties sold by Nuts.com, originate from India or China. The dye is not listed in the ingredients, so I am not sure whether it is safe. These are raw seeds, so they shouldn't be roasted.
Due to this experience I submitted a negative review on the company's website, but it was never posted. The company only posts positive reviews.
This quality issue and the fact that my negative review was never posted has undermined my trust in the company's products, and especially the organic label (certified by whom ?) that always comes with a steeply higher price. I am sure Nuts.com has been growing fast and is making lots of money from health conscious customers. It seems they are growing too fast and have to make up demand with diluted products.
One more thing. There are multiple 5 star review for the store posted to resellerratings on 11-11-18, very suspicious."
"Update: I think they have resolved this successfully. Time will tell!"
"First, the good. Their proportions are respectable for their pricing. Some items are great as well. Some are just really bad and how do you know when that is going to happen? Toasted coconut that is almost burnt. One order of pumpkin seeds that have so much salt you almost go into shock and I love salt. I complained and was told they are normal. I complained again and was told to order the ones with regular salt not the extreme salt. I have this in writing! If they have extreme salt than why not say that on the web site!!??!! I saw pumpkin seeds in the shell so I ordered, who knew they were extreme salt and not normal?
There are so many businesses' that do not argue with you when you are unhappy, why do business with one that does? After first telling me the salt was normal and then telling me it was extreme salt, then arguing with me about how the wording on the product is misleading I was credited $5 but I had to pay another $10 in shipping to get the order where the $5 was taken off?!?!? Never again for me or anyone I know. In fairness I will point out that their shelled pumpkins seeds are great and their diced coconut is also great. I also really like their resealable and colorful bags. I am sure they have other great items but not worth the crap shoot to me and I do not like retailers that argue with me when I am not happy. Especially when it is just one $5 item from an order, just replace it and ship it for free and keep me happy."
" Perhaps the most overhyped company in the U.S. Lots of rah rah then phone banks of minimum wage people taking orders. Twice in a row, that is two years running they have shipped me fruit pectin that was just BUNK. There is no recourse with these rat sellers. They make you pay return shipping and hand out a line of B.S. about " quote"other people use it. So don& buy the lousy weak pectin from these frauds. Besides they include a bag of over sulphered nuts with each order, big whoop. We throw the lousy preserves away as they stink of sulpher. These folks run a racket, beware..."


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Hi all,
I'm relocating to Perth at the end of September from East London and having looked at all the web sites I can find on the net on Perth I'm thinking of Scarborough as the area of choice. I'm 23 and won't know anyone so just wanted your opinions on the area and whether you think it would a good place for me to move?
Any opinions greatly appreciated!!
Thanks a lot !
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Alternative Titles
English: Kämpfer für die Liebe
Synonyms: Kampfer: Fur die Liebe, Kämpfer episode 13, Kämpfer episode 14
Japanese: けんぷファー für die Liebe
Type: Special
Episodes: 2
Status: Finished Airing
Aired: Mar 6, 2011
Season: Winter 2011
Producers: J.C.Staff, Nomad, Lantis, DAX Production, Sentai FilmworksL
Genres: Action, Comedy, Ecchi, Shoujo Ai, Super Power
Duration: 23 min. per ep.
Rating: R+ - Mild NudityL represents licensing company
Score: 6.771 (scored by 18,779 users)
Ranked: #40122
Popularity: #1235
Members: 30,991
Favorites: 31
1 indicates a weighted score. Please note that 'Not yet aired' titles are excluded.
2 based on the top anime page. Please note that 'Not yet aired' and 'R18+' titles are excluded.


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Reviewed By Richardo W (PARKLAND, FL) Reviewed for a 2004 Dodge Ram —9/7/2015 3:56 AM
These are really sharo looking lights. The one year warranty makes it even better. I had bought a pair from another manufacturer with a 90 day warranty and within a short time the plastic quality degraded and made the truck look terrible. So with these I have a lot more time.


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Interactive Seating Charts
Unfortunately, we do not currently have
a seating chart for Sheldon Concert Hall.
Sheldon Concert Hall3648 Washington Boulevard
Saint Louis, MO 63108
Upcoming Events
Oct 10
Sat 8:00 PM
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Fri 8:00 PM
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Wed 8:00 PM
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About Seatgeek
We scour the web's major ticket sites and aggregate inventory into one place. Our Deal Score helps you identify the best ticket deals available for each event.Learn more about SeatGeek


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Illustration Tutorials
Illustration Skill level
- Beginner (1)
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Illustration Software
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Comic book illustrator and video game artist Daniel Lieske shares the tricks of the trade in this Photoshop training course, designed specifically for artists who want to transition their skills to a digital canvas.
Covers the entire process of creating a digital drawing, from setting up a document and custom brushes to developing and fine-tuning the image itself.
"Since joining lynda.com, my technical skills and creativity have improved tremendously. Kudos for making learning fun." —Jim F.
more from our members »


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European history according to Asterix and Obelix
Menhir, wild boar, magic potion, Unhygenix, Dogmatix. Sound familiar? Probably because you speak the language of the Gauls and of those mustachioed Roman fighters, Asterix and Obelix.
Pfannkuchen pilgrimage through Europe
Intrepid's Christian Schoberl is a self-confessed sugar addict and chocoholic. He's the one to ask about all sorts of sweet treats in Europe, so it was no surprise to find him on a pfannkuchen pilgrimage from Berlin to Venice…
"It was day-one of our trip and already I was eager to try some of the local treats. I went into a bakery and ordered a krapfen. The helpful salesgirl explained that in Berlin they are called pfannkuchen – a pancake. It looks like a donut without a hole and is stuffed with chocolate, vanilla custard or jam. Except beware around carnival time, when some cheeky clowns fill them with mustard or horseradish!
Bright future for Berlin
Many cities have reinvented themselves over the centuries, but few have had to rebuild as much as Berlin. With nearly four million residents from over 190 countries now living in its city centre, the largest city in Germany was a whole new experience for Intrepid Express reader Tori Salman…
"On my last visit, only a few short years after the reunification of Germany, Berlin was just one huge construction site. The Brandenburg Gate seemed like a dreary monument to reunification, set against a background of worksites. All these years later a stop in Berlin revealed a thoroughly refreshed and revitalised city. Now Berlin is almost too cool for school!


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ZOLTEK™ OX is our oxidized PAN fiber that is inherently flame resistant, which makes it an effective heat-blocking and fire barrier material. The largest application for this product is the aircraft brake market, where it holds the dominant position in the marketplace. We have produced these oxidized technical fibers for over 20 years, allowing us to fine tune our process and become the largest oxidized PAN fiber producer in the world.
When put to the test, ZOLTEK™ OX outperforms the competition (see brochure below). It retains its appearance, hand and textile characteristics after open flame exposure. And unlike other fiber, ZOLTEK™ OX fibers do not burn, melt, or drip. Instead, they char and self-extinguish.
» Download ZOLTEK™ OX Brochure
» Download ZOLTEK™ OX Information Sheet


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Shock Value needs to hurry up and drop. this shit bangs!!!
Where can I d/l this?
This track is bannanas. I've been trying to find this since I heard it in the mix on Hot 107
this shit is off the meeeeter. i didnt like the looking ass boy song they made, but this timberland joint is on FIRE!!!!
Chorus is so bad
All the tracks Tim been dropping this year have been fire
Woot Woot...somebody better get her
Major move right cheaa.
Better than that Looking Boy song they had with Yung Joc
hot, but would have been hotter if magoo was on it
What kind of word is "poppish" LOL. If it's dope then WHO GIVES A SHIT
I heard this on his new mixtape, but not sure if it's "poppish" enough to make the final cut for the SV3 album.
but it aint from SV3, no word bout it from Tim ... is hot but it sounds fake.... think Tim would wanna be on one of the verses 4 hiz single for SV3
dx always lying about shit like that for more views
KKKKRRAAAAAAAAAAAAZZZZZZZZZZZYYYYYY STR8 CLUBBB FIREEEEEEEE!!! fuck yall haterzzzzzz were da fuckin cake backkerzzzzzz!!!
This is what happens when you go pop and try to go back...
stop using the word hater you cliche bitch,
thas what happens when ya go hater, you stay waiter
Timbo is not delivering anymore.
This is not IN ANYMORE...
craaazy...you just got to love timbo beats


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Welcome to loopedin.com™, a blog that aims to provide occasional and brief commentary on tech, law, and current topics of interest.
Lenovo: Business Users Showing Interest in Windows 10
According to this article, it appears that Windows 10 is generating great interest from business. Now, the company needs to make sure that it can capture the interest of consumers in order to stop the exodus to Apple's Mac and iOS devices.
Meanwhile, the level of interest in Windows 10 from business customers has come as a surprise, according to McQuarrie
"This is the first time in years that they have evinced an interest in the latest OS. Normally, they are fairly conservative, they wait," he explained."
Windows 8 was a struggle to convert commercial customers to; they saw no compelling reason to move from Windows 7. But we are seeing an increased interest in moving to Windows 10 against the same period in the run up to the Windows 8 release."
Source: Lenovo looks to Windows 10, servers and mobile to grow business – IT Analysis from V3.co.uk
IE continues to harm Microsoft's brand
Having this news hit the wire is unsettling (emphasis added):
Researchers at an HP security division have publicly detailed four code-execution vulnerabilities that can be used to hijack end-user smartphones running the latest versions of Microsoft's Internet Explorer browser.
The disclosures earlier this week came more than six months after researchers from HP-owned TippingPoint first privately reported the bugs to Microsoft security engineers.
The article goes on to say that it remains unclear why Microsoft hasn't issued fixes. I suspect that it may be that top talent at Microsoft is focused on delivering a excellent introductory versions of Windows 10 and Windows 10 Mobile, which will include Microsoft's new browser, Microsoft Edge (aka Project Spartan).
Apparently, Microsoft officials acknowledged the bugs and asked for extensions beyond the four months TippingPoint normally waits before publicly disclosing vulnerabilities. Could it be that Microsoft was hoping to get its new browser on the machines of its users, thereby replacing IE, before the vulnerability went public?
Even so, Microsoft is harming user trust, tarnishing its brand, and losing credibility with unpatched security issues. Apple seems to get the benefit of the doubt with unpatched security issues that arise on OS X and iOS, but Apple currently enjoys the adoration of the masses. Microsoft is not Apple, so it needs to be particularly mindful that security issues affecting its products and services carry greater negativity, at least for now.
Source: Fully patched Internet Explorer for smartphones menaced by whopping 4 code-execution bugs (Updated) | Ars Technica
Beware AWS cloud contract provisions
Unfortunately, few people ever read the end user license agreement (EULA) for software or cloud-based services. Those that do may find surprises like this gem from Amazon's AWS cloud contracts.
From Gigaom:
Basically, AWS is invoking its rights not to be sued for patent infringement by its customers not only for the time you're using its service, but going forward — in theory — in perpetuity.
. . .
First, neither the Microsoft Azure license nor Google Cloud contracts include similar limitations, the lawyers said. The overall "broad covenant not to sue" is not unusual in and of itself, said a Seattle-based attorney, but the extensions of limitations beyond the term of contract was striking.
. . .
What's interesting here is that, in theory, this 8.5 provision could allow Amazon to defend itself against customers (or former customers) if it ends up using their IP down the road.
via In AWS cloud contracts (as in life), read before signing — Tech News and Analysis.
Google chasing Microsoft in realtime speech translation
This is a good example of Microsoft's cutting-edge innovation — something for which it often gets little or no credit.
From Gizmodo:
According to The New York Times, Google isn't going to let Skype runaway with all the high-tech, language barrier-smashing fun. An upcoming update will allow the app to auto-recognize popular languages and translate them into text in real time.
In addition, Google Translate will also let you take snapshots of signs or menus or whatever, and also translate onscreen.
From Neowin:
Six months ago, Microsoft has unveiled Skype Translator, a real time translator tool that can be used to bridge two people from different parts of the world by allowing them to speak with one another using their native language. You can try the feature as part of a preview program, but it is limited to Spanish and English for voice translation, and 40 languages for text messaging.
Google is not being indifferent about Microsoft's move, as it is reportedly working on a significant update for its Google Translate app for Android. Currently the app offers text translation for over 80 languages, including English, Arabic, Chinese, French, German, Hindi, Russian and Spanish, and voice translation for just a few of them.
Unintended consequences; overreaching laws and zealous enforcement impacting important security research
The Computer Fraud and Abuse Act (CFAA) essentially deals with unauthorized access of computers and the Digital Millennium Copyright Act (DMCA), among other things, protects copyrighted material through criminalizing efforts to circumvent digital rights management. Each offers important protections; however, in a recent article, lawyer Jonathon W. Penney writes about how these laws are shaping the ethics of code and security research. For me, this illustrates how difficult it is to balance the legitimate interests of various stakeholders. Legislators, judges, and lawyers routinely struggle with rules and their varied exceptions.
From Slate:
In late July 2014, the information security world was on edge. Researchers from Carnegie Mellon University—who work "closely with the (US) Department of Homeland Security"—were scheduled to give a talk at the Black Hat USA information security conference on a simple method to "de-anonymize" Tor users.
. . .
But the talk never happened. It was pulled from the conference program at the last minute, with the CMU researchers, as reported in the Washington Post, claiming the materials they planned to present had "not yet been approved by CMU/SEI for public release."
. . .
Expansive laws like the Computer Fraud and Abuse Act and the Digital Millennium Copyright Act, coupled with aggressive enforcement by state authorities and corporate interests, have subjected an increasing array of online activities to criminal and civil penalty. What was once considered "full disclosure" may today constitute a criminal act under the CFAA or DMCA.
. . .
"Code is law," the aphorism Larry Lessig popularized, spoke to the importance of computer code as a central regulating force in the Internet age. That remains true, but today, overreaching laws are also increasingly subjugating important social and ethics questions raised by code to the domain of law. Those laws—like the CFAA and DMCA—need to be curtailed or their zealous enforcement reigned; they deter not only legitimate research but also important related social and ethics questions.
via CFAA reform: How laws are determining the ethics of code. Check out Mr. Penney's entire piece — it's worth reading.
Outdated laws contribute to erosion of privacy
From ACLU:
Since 1986, technology has advanced at breakneck speed while electronic privacy law remained at a standstill. The outdated Electronic Communications Privacy Act (ECPA) allows the government to intercept and access a treasure trove of information about who you are, where you go, and what you do, which is being collected by cell phone providers, search engines, social networking sites, and other websites every day.
via Modernizing the Electronic Communications Privacy Act (ECPA) | American Civil Liberties Union.
The ACLU has put together this eye-opening infographic that succinctly demonstrates the need to update outdated laws.
The longer that existing laws remain unchanged, the harder it will be to change them later. A certain inertia develops when the status quo is maintained.
Democracy weakened when free speech is chilled
Free speech is the cornerstone of democratic governments, so it is troubling when a government's actions results in chilling free speech.
From EFF:
The latest survey found that writers living in liberal democratic countries "have begun to engage in self-censorship at levels approaching those seen in non-democratic countries, indicating that mass surveillance has badly shaken writers' faith that democratic governments will respect their rights to privacy and freedom of expression, and that—because of pervasive surveillance—writers are concerned that expressing certain views even privately or researching certain topics may lead to negative consequences."
via PEN America: "The Harm Caused by Surveillance…is Unmistakable" | Electronic Frontier Foundation.
OS X search glitch can expose private details
If you use Apple Mail in Yosemite, beware of the following issue:
A glitch in the search software in Apple's OS X Yosemite can expose private details of Apple Mail users, revealing their IP address as well as other system details to spammers, phishers and online tracking companies.
. . .
At the moment, the only way to work around the issue seems to be to uncheck the "Mail & Messages" box for Spotlight in System Preferences. When this option is disabled no mails are returned in Spotlight's search results, and thus, no preview is shown.
via Glitch in OS X search can expose private details of Apple Mail users | InfoWorld.
Malware threats rise at alarming pace
It's a dangerous, malware infested world out there.
Malware detections by AV-Test, a company that tests the effectiveness of antivirus software, spiked in 2014 to more than 143 million, up 72 percent from last year, according to a report released Thursday.
To put that in perspective: there was more malware found over the last 2 years than in the previous 10 years combined.
. . .
"At the pace we're going, that's just not feasible [to defend against] anymore," said Jérôme Segura, senior security researcher at Malwarebytes.
Making the case for privacy
If you've ever wondered why privacy matters and why you should fight to protect it, just watch this short TED video:
Glenn Greenwald was one of the first reporters to see — and write about — the Edward Snowden files, with their revelations about the United States' extensive surveillance of private citizens. In this searing talk, Greenwald makes the case for why you need to care about privacy, even if you're "not doing anything you need to hide."
via Glenn Greenwald: Why privacy matters | Talk Video | TED.com.


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|Re:11 rear enders
|attached to Google Self-Driving Car Rear-Ended In First Injury Accident
|Re:Do as I say not as I do
|attached to British Government Instituted 3-Month Deletion Policy, Apparently To Evade FOIA
|Re:Simple answer
|attached to David Cameron Says Brits Should Be Taught Imperial Measures
|Requires a definition for Toys
|attached to My toy collection is ...
|Re:Double bind
|attached to Man Shot To Death For Texting During Movie
|Re:Its counter productive
|attached to Federal Judge Rules Chicago's Ban On Licensed Gun Dealers Unconstitutional
|Re:Only moose and squirrel have them
|Re:Only moose and squirrel have them
|attached to Snowden Says He Took No Secret Files To Russia
|attached to Lawmakers Who Upheld NSA Phone Spying Received Double the Defense Industry Cash
|attached to NHS Fined After Computer Holding Patient Records Found On eBay
|Re:Perfect is the enemy of good.
|attached to Employers Switching From Payroll Checks To Prepaid Cards With Fees
|Re:Ha Ha Ha
|attached to Tesla To Build Its Own Battery-Swap Stations
|Re:Blair made this the law in the UK too
|attached to Supreme Court Decides Your Silence May Be Used Against You
|Re:all for it...
|attached to UK Police Now Double As CCTV Cameras
|Re:Not-so-accurate source
|attached to BBC Clock Inaccurate - 100 Days To Fix?
|Re:Firearms (or lack thereof) in the UK (was Re:Ya
|attached to Printable Gun Downloads Top 100k In 2 Days, Thanks to Kim Dotcom
|Re:Google Glasses Problem
|attached to UK Benefits Claimants Must Use Windows XP, IE6
|Re: death to children and teenagers.
|attached to Six Retailers Announce Recall of Buckyballs and Buckycubes
|Re:Good riddance
|Re:Tragic loss
|attached to Margaret Thatcher Dies At 87
|The ballot was down for 14 months.
|attached to Did Google Tip Off EU About Microsoft Browser Ballot?
|Re:I want that!
|attached to Human Rights Watch: Petition Against Robots On the Battle Field
Nonsense. Space is blue and birds fly through it. -- Heisenberg


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Philadelphia, PA (PRWEB) August 30, 2013
While most Americans are spending their Labor Day Weekend relaxing around a family barbeque or their favorite beach spot, a California Air National Guardsman from Fresno, California is busy dotting the nation in his World Record quest to play disc golf (aka Frisbee Golf) in all 50 states in just 50 days.
Find out more about Larry's 50-state tour by clicking here... http://youtu.be/JBJRKHZyFhI
Larry Clifford Kirk began his momentous "50 in 50" tour just two weeks ago by knocking off the most remote of these United States, Alaska and Hawaii, over the week of August 12th. His rapid return to the California mainland was the launch point for his mid-western and northwestern jaunt over the last ten days.
"I'm so energized to complete this awesome challenge," beamed the charismatic Kirk. "My passion for disc golf has taken me throughout the US already, and I have made so many great friends and created lasting memories," Kirk said. "Some people ask why am I doing this, and my answer is simple--to raise awareness for the great game I love: disc golf!"
Stationed as a National Guardsman at the 144th Air National Guard in Fresno, California, Kirk is no stranger to blanketing the United States with his disc golf exploits. With two 50 state tours already under his belt, Kirk wanted to raise his game by squeezing his travels to all 50 states in just 50 days.
This weekend, as Kirk transitions into his fourth week, he will zip through Montana and North Dakota today and tomorrow, then plunging through the Gopher State of Minnesota and heading through South Dakota, Iowa, Nebraska, Missouri and Kansas and further points south into Louisiana by September 7th.
"Larry has a singular perspective to promote disc golf,
|Source: PRWeb
Copyright©2012 Vocus, Inc.
All rights reserved


text:
Rent Auditions Announced
We are excited to announce auditions for Rent, the Tony Award-winning rock opera that took Broadway by storm. Auditions run October 11, 12, and 13, and we'd like you to be part of it! Visit our audition page to sign up for an audition slot and to download an audition packet. We look forward to seeing you there!
Become a Season Subscriber
Join us in 2015-2016 for a Season of Love featuring hit musicals, Sweet Charity, Evita, Disney's Mulan JR and Rent! As a subscriber, you'll enjoy special perks such as reserved seating, a free guest pass, and a free concession coupon. SCP's subscribers get the royal treatment and we'd like you to be part of it! Subscribe now.
Donate or Sponsor
We are so grateful for the support we have received from our donors and sponsors over the past 45 years. Because of your generosity, SCP has been a hub for local talent, teamwork, and creative expression for nearly half a decade. We look forward to continuing this tradition with your support. See our online donation form.


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This job posting is no longer available on Indeed.
Find similar jobs:Speech Language Pathologist jobs
- Encore! Rehabilitation Services jobs
Encore Rehabilitation, a leading rehabilitation provider, is seeking a Speech Language Pathologist to work part-time or PRN in our skilled nursing facility located in Willard, OH. New Grads are welcome to apply!
Benefits include:
Competitive CompensationFree Unlimited CEUs OnlineFront Loaded PTO - Available ImmediatelyLicensure Reimbursement401(k) - With a Company MatchBlue Cross Blue Shield of MIDelta Dental of MI for Dental CoverageVSP for Vision CoverageShort-Term Disability InsuranceLong-Term Disability InsuranceFlexible Spending AccountPrepaid Legal & Identity Theft Shield
If you are dedicated to quality patient care and possess excellent clinical skills and wish to apply, please contact me anytime between 8A-8P weekdays or 9A-3P weekends.
Thank you and I look forward to speaking with you soon!
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text:
Less than 18 months after delivery, our little used Maytag Washer failed. It would not fill with water properly, agitated the clothes dry and deposited water onto clothes already spun dry.
The Maytag repairman replaced the "Water Level and Temperature controller Switch" (Part #W10248240) during a 15 minute visit for a cost of $170.55, almost half the cost of the washer after rebates.
The repairman stated that this part fails frequently as there was a manufacturing defect and the parts are now made by a supplier in the US rather than in China as was originally the case. He also stated that he has replaced this same part up to 3 times in the same washers.
I called, E-mailed and wrote Maytag for some sort of adjustment but was refused. Customer service insists on the 12 month warranty and refuses to help even though there is evidence of a widespread serious manufacturing defect in this sensor relay.
My understanding is that this sensor relay is present in other models of Maytag/Whirlpool as well.


text:
eNotes Homework Help is a way for educators to help students understand their school work. Our experts are here to answer your toughest academic questions! Once it's posted to our site, your question could help thousands of other students.
Popular Titles
Computer Crime
Computer CrimeIt is hard for me to say because I do not know the relative amount of resources being spent on computer crimes as opposed to other kinds of crimes. I also believe that this would be very different...


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Shanghai 5 | Full Length Edit
12 December 2010, 18.50 | Posted in Skateboarding, videos | 2 comments »
We've been waiting for this since we previewed the trailer back in March. Finally here is Charles Lanceplaine's full length edit of his short film Shanghai 5. Xie Xie!
Related posts:


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Nolo's Plain-English Law Dictionary
Need Professional Help? Talk to a Lawyer
Enter Your Zip Code to Connect with a Lawyer Serving Your Area
- On Demand
- In a promissory note, a requirement that the amount due must be paid when the person or company to whom the funds are owed demands payment (rather than upon a certain date or in installments). Such a note is called a demand note.


text:
Sun, 07/01/2012 - 11:23am
His Twitter spree continued this morning, weighing in on the Katie Holmes-Tom Cruise divorce.
Wopular is an
online newspaper rack,
giving you a summary view of the top headlines from the top news sites.
Senh Duong (Founder)Wopular,
Last week, an Ohio judge refused to erase the suspension of a 12-year-old black boy who was punished for staring at his classmate last year. The boy was suspended several days after participating in a staring contest with a white female classmate at St. Gabriel Consolidated School, and allegedly made her feel "fearful." School officials were notified by the girl's parents the day after the contest, claiming she felt intimidated by the boy.
A woman who disguised herself in traditional Muslim dress to abduct and sexually assault a 5-year-old girl from a Philadelphia school was sentenced to 40 years to life imprisonment on Monday, the local district attorney's office said. Christina Regusters, 22, a former childcare worker, was con
An overnight flight from Phoenix to Boston was diverted to Syracuse, New York, on Monday morning after one of the pilots fell ill and died, an American Airlines spokeswoman said. Controls of the Airbus A320 carrying 148 passengers and five crew members were in the hands of a copilot when it touched
Mass shootings are a distinctly American problem. Between 2000 and 2014, there were 33 mass shootings in Argentina, Australia, Canada, China, England, Germany, Finland, Israel, Mexico, Norway, Russia, South Africa and Switzerland combined. Over the same time period, there were 133 mass shootings in the United States, killing 487 people.
Democratic presidential candidate and former Secretary of State Hillary Clinton defended her college affordability initiative Monday by criticizing her opponent Bernie Sanders' proposal and name-dropping Republican front-runner Donald Trump, Politico reported. Speaking at a "Today"
From the October 5 edition of Fox News' Outnumbered:
LOU DOBBS: I don't understand why Christians are not reacting. Our ministry yesterday, in service mentioned the assassination of Christians out in Oregon at that community college. Christians have to understand it's a time to stand up. And Americans have to understand that the first acts of our government, and in our Constitution all pertain to god and the religiosity of our culture, our society, and yes our government.


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1997-07-26 Stevie Johnston w pts 12 Hiroyuki Sakamoto, The Arena, Yokohama, Japan - WBC
From Barry Hugman's History of Championship Boxing
1997-07-26 Steve Johnston w pts 12 Hiroyuki Sakamoto, The Arena, Yokohama, Japan - WBC. Referee: Carlos Padilla. Scorecards: 119-111, 117-111, 113-115. Bobbing and weaving from the start, Johnston (134½) countered Sakamoto's wild attacks with southpaw jabs and solid lefts through the middle as the latter continually came forward. To be fair to Sakamoto (135), who favoured a sweeping hook, he never stopped trying and his stamina was excellent, but Johnston was just too clever for him and how one of the judges saw the challenger as the winner was inexplicable. There were no knockdowns.
[Category: 1997 Lightweight Title Contests]]


text:
- Following Apple, Samsung and Microsoft, Micromax Planning to Develop Android OS
- Samsung Galaxy Folder flip phone with Android 5.0 Lollipop unveiled
- Android mobile operating system bug affects `billion` smartphones
- Oh Great, New Android Flaw Lets Hackers Into Your Phone With Just a Text
- Ouya, video-game console startup, gets scooped up by Razer
- Samsung event invite teases the Galaxy S6 Edge Plus
Download APE Punch Gold Edition Android App
The most intense game in the market has just gotten better with APE Punch Gold Edition! Added is the thrilling new Marathon Mode, as well as the ability to customize what color your name shows up as on the high scores list! Go APE and see how many times you can punch the button before the time runs out!
The APE Punch Gold Edition is now available for for Android owners. The application is supporting English language. It weighs in at only 10MB to download. The new APE Punch Gold Edition app version 1.1 has been updated on 2014-11-07. The Google Store includes a very useful feature that will check if your device and Android version are both compatible with the app. Most iPhone and iPad are compatible. Here is the app`s compatibility information: full Internet access ,
Bottom Line: For more information about APE Punch Gold Edition check developer Brandon A. Stecklein `s website : http://bastecklein.servebeer.com/andoid/ape_punch
Click4more: Related apps ape punch gold edition
Tags : punch , edition , gold edition , punch gold
Android App APE Punch Gold Edition 1.1
R:4.5 - Ratings-
Related apps - like APE Punch Gold Edition 1.1
More in Arcade - Action - like APE Punch Gold Edition
More by Brandon A. Stecklein - for APE Punch Gold Edition 1.1


text:
|Publication number
|Publication type
|Application number
|Publication date
|Jun 16, 2009
|Filing date
|Nov 17, 2005
|Priority date
|Mar 31, 2005
|Fee status
|Also published as
|Publication number
|Uwe Schulze, Martin Mazur, Andreas Becker
|Original Assignee
|Advanced Micro Devices, Inc.
|Export Citation
|BiBTeX, EndNote, RefMan
|Patent Citations (12), Classifications (12), Legal Events (3)
|External Links: USPTO, USPTO Assignment, Espacenet
1. Field of the Invention
The present invention relates to the field of fabrication of integrated circuits, and, more particularly, to the field of so-called advanced process control (APC).
2. Description of the Related Art
Fabrication of integrated circuits requires the precise formation of very small features with a very small tolerance for error. Such features may be formed in a material layer formed above an appropriate substrate, such as a silicon substrate. These features of precisely controlled size are generated by patterning the material layer by performing known photolithography and etching processes, wherein a masking layer is formed over the material layer to be etched to define these features. Generally, a masking layer may consist of or is formed by means of a layer of photoresist that is patterned by a lithographic process. During the lithographic process, the photoresist may be spin-coated onto the wafer surface and is then selectively exposed to ultraviolet radiation. After developing the photoresist, depending on the type of resist, i.e., positive resist or negative resist, the exposed portions or the non-exposed portions are removed to form the required pattern in the layer of photoresist.
Since the dimensions of the patterns in sophisticated integrated circuits are steadily decreasing, the equipment used for patterning device features have to meet very stringent requirements with regard to resolution and overlay accuracy of the involved fabrication processes. In this respect, resolution is considered as a measure of specifying the consistent ability to print images of a minimum size under conditions of predefined manufacturing variations. One important factor in improving the resolution is represented by the lithographic process, in which patterns contained in a photo mask or reticle are optically transferred to the layer of photoresist via an optical imaging system. Therefore, great efforts are made to steadily improve optical properties of the lithographic system and of the material layer to be patterned.
The relevant properties of the lithographic system may be numerical aperture, depth of focus and wavelength of the light source used. The relevant properties of the material layer to be patterned may, for example, be influenced by the type of photoresist used, baking temperature and thickness variations of resist layer, reflectivity of underlying material layer and planarity of underlying layers. The quality of the lithographic imagery is extremely important in creating very small feature sizes.
Of at least comparable importance, however, is the accuracy with which an image can be positioned on the surface of the substrate. Integrated circuits are typically fabricated by sequentially patterning material layers, wherein features on successive material layers bear a spatial relationship to one another. Each pattern formed in a subsequent material layer has to be aligned to a corresponding pattern formed in the previously patterned material layer within specified registration tolerances. This is a particular challenging task due to the typically performed stepper exposure process so that for each exposure field, for example, a single die is exposed separately and the entire substrate is, consequently, exposed step by step in a sequential manner. In addition, not only the exposure process may be affected by non-uniformity problems, but, for example, deposition, etch, implantation and annealing processes may also be concerned.
As the minimum device dimensions, also referred to as critical dimensions (CD), steadily decrease, it is therefore desirable to minimize feature variations not only from wafer to wafer but also across the entire wafer surface to allow semiconductor manufacturers to use processes the tolerances of which may be set more tightly to achieve improved production yield while at the same time enhance device performance in view of, for example, operational speed. Otherwise, the fluctuations across the wafer and the wafer-to-wafer variations may be taken into account, thereby requiring a circuit design that tolerates higher process discrepancies.
In principle, there are two different strategies to overcome the issues caused by the non-uniformities across the wafer and the wafer-to-wafer variations. The non-uniformities may be reduced, for example, by an improved process control or may be compensated for by accordingly modifying a process that may have a compensating effect. An example for compensation of across-wafer non-uniformities is a position-dependent adapted exposure parameter in the gate exposure process to compensate for any position-dependent variations causing variations in the electrical parameters of field effect transistors to be formed. The gate exposure process is typically employed for compensation of non-uniformities across the wafer, as the gate exposure process provides both an effective compensation mechanism and a position-dependent control feasibility, due to the usage of the stepper technique. The position-dependent control may be carried out, for example, by an accordingly adapted so-called exposure map defining exposure parameters for each single exposure step.
On the other hand, for example, gate length variations as patterned may be compensated for position independently, wafer by wafer or lot by lot by adapting the width of subsequently formed gate sidewall spacers accordingly. An example, which does not concern lithography processes, is the compensation of across-wafer non-uniformities during the metallization layer formation, such as the compensation for a non-uniformity of a removal rate of a chemical mechanical polishing (CMP) process by an accordingly adapted plating process forming a corresponding compensating deposition profile.
As mentioned above, an improved process control enables, compared to a compensation technique, a straighter reduction of wafer-to-wafer and across-wafer non-uniformities. Recently, a process control strategy has been introduced and is continuously improved, allowing a high degree of process control, desirably on a run-to-run basis, without the necessity of an immediate response of a measurement tool. In this control strategy, so-called advanced process control, a model of a process or of a group of interrelated processes is established and implemented in an appropriately configured process controller. The process controller also receives information related to the type of process or processes, the product, the process tool or process tools in which the products are to be processed, the process recipe to be used, i.e., a set of required sub-steps for the process or processes under consideration (containing possibly fixed process parameters and variable process parameters), measurement results of previously processed products or test substrates, and the like. From this information, which may also be referred to as history information, and the process model, the process controller determines a controller state or process state that describes the effect of the process or processes under consideration on the specific product.
With reference to
In operation, a photoresist layer is formed on the product substrate 130 in the photo-resist application module 150 according to a conventional technique, typically, by a spin-on technique. In the module 140, the substrate 130 is exposed by well known exposure techniques, typically by a deep ultra-violet light source, and the exposed resist layer is developed. Subsequently, the developed resist layer is subjected to a DICD measurement to assess the quality of the exposure process. In case the DICD tolerances do not meet the requirements, the substrate may be subjected to a rework process, wherein the developed resist is removed from the substrate to repeat the photolithography process with accordingly adapted parameters. The rework of substrates removing a photoresist layer does, in general, not unduly affect the substrate so that the photolithography process may be repeated several times in case of exposure failures. The reflectivity of amorphous carbon, which may be employed in metallization layers of modern semiconductor devices due to their low permittivity, may, however, be modified during the rework process. Thus, the photolithography of reworked substrates comprising amorphous carbon layers may be affected.
The advanced process control of the system shown in
In step 115, the process controller 110 determines a process state on the basis of the process model implemented and the history information received from, for example, the metrology system 170, the photolithography station 100, a further product substrate 130 to be processed and the corresponding CD target values. It should be noted that, in particular, the measurement results obtained from the metrology tool 170 may be delayed or may even not be available unless a plurality of product substrates 130 is completely processed. Thus, the process controller 110 establishes the currently valid process state on the basis of the available information and the process model to "predict" the effect of the photolithography process on the product to be processed and to adjust process parameters correspondingly to achieve the predicted effect. For example, the process controller 110 may estimate the maximum intensity of the exposure light source from the available information, such as the number of products that has already been processed, type of process to be performed and the like, and estimate the "state" of the process and correspondingly adjust a process parameter, for example the exposure time, to obtain the specified process result. In other processes, the process state may represent the removal rate of a CMP tool, the etch rate in an etch tool, the deposition rate in a deposition tool, and so on.
As indicated in step 125, the determination of the process state may require the processing of one or more pilot substrates to improve control quality, since the accuracy of the determined process state may significantly depend on the available history information, the amount and the accuracy of which increases with an increasing number of processed products.
In step 135, the process state is updated, that is, a new or advanced process state is determined on the basis of the previous process states, including the previously obtained history information. Preferably, the advanced process state is established on a run-to-run basis, that is, prior to processing an individual product 130, the corresponding process state is established, and on the basis of the currently valid process state, the process parameter(s) may accordingly be adjusted.
As indicated in step 145, the process flow continuously updates the process state when no reset event occurs. Generally, process control quality improves as the amount of history information increases, unless the history information indicates that predefined specifications are no longer met. For instance, the lifetime of the exposure light source has expired or will soon expire, reworked substrates, in particular when covered with amorphous carbon layers, are processed, the type of photoresist is to be changed, the type of product is to be changed, the CD target value has to be changed and the like. Any of these events may render the process state unpredictable and, therefore, the process controller 110 is re-initialized with the initial state set in advance, and the process continues as depicted in
It should be noted that the system shown and described with reference to
Although the advanced process control, as exemplarily described above, provides significant advantages compared with process controls based on, for example, measurement mean values, the occurrence of abrupt events conventionally requires a re-adaptation lasting a period that may concern several substrates, or a re-initializing (reset events) of the process controller, resulting in a reduced process quality in an early state after the re-initialization and also possibly requiring the processing of additional pilot substrates.
Any adaptation to abrupt events and re-initialization, however, reduces the process capability due to a wider range of tolerances of the process during the period of adaptation or after the re-initialization, and entails a reduced throughput due to the processing of pilot wafers and a reduced yield caused by a higher probability of device failures.
In view of the above-identified problems, a need exists to provide an improved advanced process control strategy, in particular for a lithography process, wherein one or more of the above constraints may be avoided or at least reduced.
The following presents a simplified summary of the invention in order to provide a basic understanding of some aspects of the invention. This summary is not an exhaustive overview of the invention. It is not intended to identify key or critical elements of the invention or to delineate the scope of the invention. Its sole purpose is to present some concepts in a simplified form as a prelude to the more detailed description that is discussed later.
Generally, the present invention is directed to an advanced process control technique that enables taking into account an abrupt but known modification in process parameters by incorporating an corresponding target offset term or error correction term into the process control model.
According to one illustrative embodiment of the present invention, a method comprises providing a processed substrate having a rework status representative of a number of rework processes performed on the substrate and exposing a photoresist layer provided above the substrate, wherein at least one exposure parameter is determined by an advanced process controller at least on the basis of the rework status provided.
According to another illustrative embodiment, a method comprises exposing a photoresist layer formed above a first substrate, developing the photoresist layer and obtaining information about the developed photoresist layer representative of a process status. The method further comprises providing a second substrate having a rework status representative of a number of rework processes being performed on the substrate, and determining at least one exposure parameter for a photoresist layer formed on the second substrate on the basis of the information and of the rework status.
According to yet another illustrative embodiment of the present invention, a method comprises providing an advanced process controller comprising a process model comprising a target term and a target offset term. The method further comprises updating the target offset term on occurrence of an event and determining at least one process parameter from the process model.
The invention may be understood by reference to the following description taken in conjunction with the accompanying drawings, in which like reference numerals identify like elements, and in which:
While the invention is susceptible to various modifications and alternative forms, specific embodiments thereof have been shown by way of example in the drawings and are herein described in detail. It should be understood, however, that the description herein of specific embodiments is not intended to limit the invention to the particular forms disclosed, but on the contrary, the intention is to cover all modifications, equivalents, and alternatives falling within the spirit and scope of the invention as defined by the appended claims.
Illustrative embodiments of the invention are described below. In the interest of clarity, not all features of an actual implementation are described in this specification. It will of course be appreciated that in the development of any such actual embodiment, numerous implementation-specific decisions must be made to achieve the developers' specific goals, such as compliance with system-related and business-related constraints, which will vary from one implementation to another. Moreover, it will be appreciated that such a development effort might be complex and time-consuming, but would nevertheless be a routine undertaking for those of ordinary skill in the art having the benefit of this disclosure.
The present invention will now be described with reference to the attached figures. Various structures, systems and devices are schematically depicted in the drawings for purposes of explanation only and so as to not obscure the present invention with details that are well known to those skilled in the art. Nevertheless, the attached drawings are included to describe and explain illustrative examples of the present invention. The words and phrases used herein should be understood and interpreted to have a meaning consistent with the understanding of those words and phrases by those skilled in the relevant art. No special definition of a term or phrase, i.e., a definition that is different from the ordinary and customary meaning as understood by those skilled in the art, is intended to be implied by consistent usage of the term or phrase herein. To the extent that a term or phrase is intended to have a special meaning, i.e., a meaning other than that understood by skilled artisans, such a special definition will be expressly set forth in the specification in a definitional manner that directly and unequivocally provides the special definition for the term or phrase.
With reference to
The substrate 230 may represent a bulk semiconductor substrate, an insulating substrate having formed thereon a crystalline semiconductor layer (not shown) and the like. For instance, the substrate 230 may represent a bulk silicon substrate having formed thereon, for example as an upper portion thereof, a crystalline semiconductor region (not shown) which may be comprised of silicon, silicon/germanium and the like. The substrate 230 may also be provided as a silicon-on-insulator (SOI) substrate. It should be appreciated that the present invention may readily be applied to any appropriate semiconductor material, such as gallium arsenide, germanium, or any other III-V or II-VI semiconductor materials, although the vast majority of logic circuitry is presently manufactured on the basis of silicon. The substrate may comprise a plurality of devices (not shown), e.g., CMOS devices which may form, for example, an integrated circuit.
In operation, the product substrate 230 may be processed, for example, in the deposition tool 280, for example to form a dielectric material layer, for example of amorphous carbon. An appropriate photoresist layer is subsequently formed on the product substrate 230 in the resist application module 250 according to a conventional technique. In the module 240, the substrate 230 is exposed by well-known exposure techniques, typically by a deep ultra-violet light source, and the exposed photoresist layer is developed. Subsequently, the developed photoresist layer is subjected to a DICD measurement to assess the quality of the exposure process. In case the DICD tolerances do not meet the requirements, the substrate may be subjected to a rework process to repeat the photolithography process with accordingly adapted parameters. A rework status indicating, for instance, the number of rework processes performed on the substrate to be processed in the lithography system 200 may be provided to the APC 210. The corresponding advanced process control of the system shown in
The initialization step, indicated by block 205, the controller state determination step, indicated by block 215, and the pilot wafer processing step, indicated by block 225, may be performed as described with respect to steps indicated by blocks 105, 115 and 125 of
In the step indicated by block 235, the process state is updated, similarly as set forth with respect to the step indicated by block 135 of
As indicated in the step referred to by block 245, the process controller 210 is re-initialized with the initial state set in advance and the process continues as depicted in
As indicated by block 255, when no reset event occurs, contrary to the step indicated by block 145 of
As indicated by block 265, when, however, a known event occurs, i.e., an appropriate target offset value or error correction value for this event is specified, the process model target offset term may be accordingly adjusted and the subsequent process state updates are performed with the new target offset value. In this context, a known abrupt event, for example, may represent a change in the rework status of the substrates 230 to be processed in a photolithography system 200. The rework status is of particular relevance for substrates covered with an amorphous carbon layer since the reflectivity of amorphous carbon layers may be modified by a rework process. The altered reflectivity of an amorphous carbon layer may be taken into account by an accordingly adapted target offset value of the target offset term of the process model. The corresponding target offset values may be determined by data analyses, for example, of DICD measurements of reworked substrates, and by specific test runs. Different target offset values may be obtained for repeated rework processes performed on a single substrate dependent on the number of performed rework processes. Typically, at least a lot of, for instance, 25 reworked substrates is processed to improve the lithography accuracy compared to a single processing of a reworked substrate. In another embodiment, the target offset term may also be employed to account for a known drift of a process parameter of the exposure process, for example, a varying maximum intensity of the light source exposing the resist layer.
The target offset term may also be employed to improve the adaptation of other advanced process control operations performed in semiconductor manufacturing, for example in a CMP process to account for known abrupt events, for example, a variation of the down force and/or of the relative speed between a substrate to be polished and a polishing pad. In another embodiment, the target offset term may also be used to account for a known drift of a process parameter, for example of a decreasing abrasive capability of a conditioning surface of a pad conditioner. In this case, an accordingly varying target offset value may be defined, for example, on the basis of a measurement data analyses of critical dimension measurement of developed photoresist features.
For any process model for advanced process control of a process performed on a plurality of substrates, the process model relates the process input X with the process output Y. A process may, for instance, be described by a linear model
Y(n)=γ(n)*X(n)+b(n+1) (1)
wherein γ is a sensitivity parameter that specifies the effect of a variation of the input X on the process output Y. The sensitivity parameter γ may be fixed at least for a plurality of substrates and may be determined by corresponding test runs. The parameter b represents the actual controller state.
Based on the linear model, a new input parameter X(n+1) for the substrate to be processed subsequently may be determined from the previous input parameter setting X(n) and the resulting previous output value Y(n) by
X(n+1)=X(n)+{T(n+1)−Y(n)}/γ (2)
wherein T is the specified output target value.
A new input parameter X(n+1)* may be calculated by means of a weighted moving average from the new input parameter X(n+1) determined in (2) and the previous input parameter X(n) by
X(n+1)*=λX(n+1)+(1−λ)X(n) (3)
wherein λ is a parameter in the range of 0-1. The choice of λ is usually ad-hoc with higher values resulting in more aggressive control. That means the "speed" of adaptation of the control swing with respect to the foregoing development of the output parameter may be adjusted. Thus, an appropriate weighting parameter λ may improve the stability of the advanced control system.
On the other hand, however, due to the usage of an exponentially-weighted moving average, the system requires a certain adaptation period that may result in a reduced transition performance of the controlled system. For known abrupt events, for example a change in the rework status of a lot of substrates, the transition to the new parameter settings is improved by incorporating a target offset term into the APC process model. An appropriate target offset value TO may be determined by test runs or by measurement data analyses. The process model incorporating the target offset term may be expressed
X(n+1)=X(n)+{T(n+1)+TO(n+1)−TO(n)−Y(n)}/γ (4)
wherein TO(n) and TO(n+1) represent the target offset values for the substrate n and n+1, respectively.
In case the new process model is applied to a advanced process control of an lithography process, the input parameter X may specify an exposure E and the output parameter Y may specify a critical dimension of a developed photoresist feature DICD. The target term T may specify a target DICD and the target offset term TO may specify a target offset DICD value. Thus, equation (4) becomes
E(n+1)=E(n)+{T(n+1)+TO(n+1)−TO(n)−DICD(n)}/γ (5)
and equation (3) becomes
E(n+1)*=λE(n+1)+(1−λ)E(n) (6)
In a notation combining equations (5) and (6), the formula for an exponentially-weighted moving average of an exposure parameter of an advanced process control may be represented by
The process characteristics relating to the target offset value may, in general, vary in dependence of the position on the substrate. The reflectivity of a reworked substrate covered with an amorphous carbon layer, for example, may vary due to thickness or planarity non-uniformities of an underlying layer that may be caused, for example, by a non-uniformity of a previously performed CMP process. Thus, in an embodiment, a position-dependent target value and/or target offset value is provided.
The exposure module 240 is typically provided as a stepper, which performs a step and repeat or step and scan exposure on a substrate, wherein a plurality of die or exposure fields are sequentially exposed. Each exposure step may be carried out on the basis of an individually adjusted set of exposure parameters that are commonly referred to as an exposure map. The exposure map may include one or more tool-specific parameters determining the characteristics of each individual exposure step. Examples of conventional tool-specific parameters may be alignment parameters, depth of focus, exposure time and the like. In addition, the exposure map may be employed to store and provide the position-dependent target and/or target offset values.
The quality of circuit elements may be improved by using a control process in forming circuit features of critical dimension, wherein advantage is taken of the step and repeat or step and scan exposure process that allows adaptation of exposure parameters to specified locations on the substrate. The exposure parameter may be updated in a highly dynamic fashion in that in-line parameters at one or more manufacturing stages of the circuit feature (prior to and/or after the exposure process) are used to re-adjust the exposure parameters, thereby effectively compensating for substrate internal non-uniformities, for example, for reflectivity non-uniformities of reworked substrates.
Moreover, the above control scheme may also be used to improve the quality of circuit elements not only with respect to substrate internal non-uniformities, but also with respect to substrate-to-substrate or lot-to-lot deviations.
The particular embodiments disclosed above are illustrative only, as the invention may be modified and practiced in different but equivalent manners apparent to those skilled in the art having the benefit of the teachings herein. For example, the process steps set forth above may be performed in a different order. Furthermore, no limitations are intended to the details of construction or design herein shown, other than as described in the claims below. It is therefore evident that the particular embodiments disclosed above may be altered or modified and all such variations are considered within the scope and spirit of the invention. Accordingly, the protection sought herein is as set forth in the claims below.
|Cited Patent
|Filing date
|Publication date
|Aug 25, 1986
|Oct 18, 1988
|International Business Machines Corporation
|Photoresist process for reactive ion etching of metal patterns for semiconductor devices
|Nov 1, 1999
|Jun 19, 2001
|Amd, Inc.
|Method and apparatus for automated rework within run-to-run control semiconductor manufacturing
|Jan 11, 2001
|Oct 14, 2003
|Advanced Micro Devices, Inc.
|Automated method of controlling critical dimensions of features by controlling stepper exposure dose, and system for accomplishing same
|Nov 22, 2002
|Mar 29, 2005
|Advanced Micro Devices, Inc.
|Method for reworking a multi-layer photoresist following an underlayer development
|Oct 10, 2002
|Jun 14, 2005
|Taiwan Semiconductor Manufacturing Co., Ltd.
|Method for preventing the etch transfer of sidelobes in contact hole patterns
|Sep 16, 2002
|Aug 1, 2006
|Advanced Micro Devices, Inc.
|Use of multilayer amorphous carbon ARC stack to eliminate line warpage phenomenon
|Apr 30, 2002
|Oct 31, 2002
|Applied Materials, Inc
|AFM-based lithography metrology tool
|Nov 7, 2002
|May 13, 2004
|Silicon Integrated Systems Corporation
|Method for preventing reworked photoresist from collapsing
|Dec 18, 2002
|Jun 24, 2004
|Taiwan Semiconductor Manufacturing Co.; Ltd.
|Method for reworking a lithographic process to provide an undamaged and residue free arc layer
|May 16, 2005
|Nov 16, 2006
|Sheng-Yueh Chang
|Method for reducing critical dimension
|Feb 6, 2008
|Aug 14, 2008
|Samsung Electronics Co., Ltd.
|Method of reworking a semiconductor substrate and method of forming a pattern of a semiconductor device
|Dec 15, 2005
|Aug 24, 2006
|Merrtt Funk
|Fault detection and classification (fdc) using a run-to-run controller
|U.S. Classification
|438/14, 430/327, 438/780, 438/4, 430/935, 438/5
|International Classification
|Cooperative Classification
|European Classification
|Nov 17, 2005
Owner name: ADVANCED MICRO DEVICES, INC., TEXAS
Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:SCHULZE, UWE;MAZUR, MARTIN;BECKER, ANDREAS;REEL/FRAME:017227/0952
Effective date: 20050429
|Aug 18, 2009
Owner name: GLOBALFOUNDRIES INC.,CAYMAN ISLANDS
Free format text: AFFIRMATION OF PATENT ASSIGNMENT;ASSIGNOR:ADVANCED MICRO DEVICES, INC.;REEL/FRAME:023120/0426
Effective date: 20090630
|Oct 1, 2012
|Fee payment
Year of fee payment: 4


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Upcoming DRI Seminars
- SEMINAR Wednesday, October 28, 2015
Insurance Law and Claims ConferenceHilton Hartford 315 Trumbull St Hartford, CT 06103
The Conference was designed by DRI and top Hartford-area carriers to update insurance executives, in-house counsel, and outside counsel in the Northeast on crucial new authority impacting claims handling, coverage decisions, and extra-contractual exposure.
- SEMINAR Tuesday, November 3, 2015
Lawyers Professional Liability InsuranceWhat to Look for in Your Firm's Policy
Unlike many other insurance policies, lawyers professional liability policies are highly customizable, and therefore there is a great opportunity to improve the coverage for your law firm. However, you need to know what is available to know what to ask for. This webinar will discuss what is available in the LPL market today, and how your firm can improve its coverage, often for little to no extra premium.
- SEMINAR Thursday, November 5, 2015
Asbestos MedicineThe Cosmopolitan of Las Vegas 3708 Las Vegas Boulevard South Las Vegas, NV 89109
DRI's 2015 Asbestos Medicine Seminar will be an interactive, dynamic, and informative event that will bring together preeminent asbestos litigation practitioners and experts to share their experiences and knowledge. Lecturers, panelists, and moderators will provide insight into the most current best legal practices. You will be updated on developments in the medical and scientific fields specific to defending asbestos litigation. There will be opportunities to engage with other attendees in spirited and educational discussions about the issues. Attendance at DRI's Asbestos Medicine seminar is essential for those of all experience levels to remain abreast of developing legal, medical, and strategic trends that will directly impact success in defending asbestos cases.
- SEMINAR Thursday, November 5, 2015
Data Breach and Privacy LawInterContinental 505 North Michigan Ave Chicago, IL 60611
Reports of new cyber-attacks and the enormous costs associated with responding to those events continue to make daily headlines. Companies ranging from small "mom & pop" stores to Fortune 100 corporations must remain diligent against these types of attacks. Those companies and their outside counsel must understand the best practices to prevent an intrusion into their systems, how to respond if an intrusion occurs, and what to do if the intrusion results in a data breach. This seminar will focus on all aspects of the life cycle of a security incident - beginning with how to better understand the exposure your company, law firm or client faces and then address how to prevent, respond to, and manage the costs associated with a cyber-security attack. Attendees will participate in real world scenarios presented by outside counsel and cyber-security experts and learn the steps that must be taken when a breach occurs.
- SEMINAR Thursday, November 12, 2015
Strictly AutomotiveSheraton Nashville Downtown 623 Union St Nashville, TN 37219
This industry-focused seminar will delve into the pressing issues faced by clients and outside counsel in the regulatory, warranty, and litigation environment. The seminar will offer you the opportunity to interact with and learn from those on the front lines of these issues. Attendees will benefit not only from the ability to learn from experienced counsel and experts, but also from the numerous opportunities to participate in the networking and social events accompanying the seminar. If all, or even part, of your practice entails the defense of automotive product liability or warranty matters, this is a must-attend event in Music City as we gather in Nashville to chart our path to defend this industry into the future.
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Boot Camp for New Life, Health and Disability LawyersHotel Allegro 171 West Randolph St. Chicago, IL 60601
The DRI Life, Health and Disability Committee is once again sponsoring a program for lawyers who are new to the practice. The program will be taught by highly experienced attorneys and will be aimed at providing a basic understanding of the concepts applicable to life, health and disability litigation. This program receives rave reviews each year it is held. Young lawyers and older lawyers who are new to the practice or who wish to brush up on their skills are encouraged to attend! To encourage the classroom atmosphere, registration will be limited to 50 persons. Please note the Boot Camp will be held at the law offices of Hinshaw & Culbertson LLP, 222 N. LaSalle Street, Suite 300 Chicago, IL
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DRI's Insurance Coverage and Practice Symposium continues its tradition as the premier educational event on the subject of insurance coverage, offering an unparalleled opportunity to hear from a distinguished faculty of lawyers and insurance industry leaders on emerging issues, recent court rulings, and national trends. Don't miss this opportunity to sharpen the tools you need to compete successfully and to network with industry leaders and experienced coverage lawyers from across the country, all in the midst of New York City decked out for the holiday season!
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Professional LiabilityMarriott Marquis New York 1535 Broadway New York, NY 10036
DRI's Professional Liability Seminar provides information that will be useful to all attorneys and insurers involved in representing professionals in malpractice actions. Learn about the emerging issues shaping the professional liability landscape, along with the particular issues facing specific practice lines. In addition to the top quality educational programs, you will have the opportunity to develop relationships with professional liability claims personnel, experts and defense counsel from across the country.
- SEMINAR Thursday, January 28, 2016
Civil Rights and Governmental Tort LiabilityWestin Austin Downtown 310 East 5th Street Austin, Texas 78701
Howdy, partner! The stars at night are big and bright, deep in the heart of Texas, but the stars presenting at DRI's 29th Annual Civil Rights and Governmental Tort Liability Seminar will shine even brighter! This year's star presenters promise critical insight and tips for representing governmental clients in these ever-changing times. You will learn valuable proactive techniques for addressing community relations with your clients in the post-Ferguson and Baltimore era, tips for advising your municipal clients as to their exposure to cyber-attacks and cyber-liability, the science behind reaction times in arrest situations, the ethical decisions we make in our practices, and more. Make plans now to join us in Austin, Texas, to learn about these issues, while obtaining two days of CLE and networking with leading defense attorneys, in-house counsel, and claims professionals from across the United States!
- SEMINAR Wednesday, February 3, 2016
Product LiabilityMarriott New Orleans 310 East 5th Street New Orleans, LA 78701
Detailed information regarding this seminar is not yet available.
- SEMINAR Thursday, February 11, 2016
Appellate AdvocacyScottsdale Resort at McCormick Ranch 7700 E McCormick Pkwy Scottsdale, AZ 85258
Detailed information regarding this seminar is not yet available.
- SEMINAR Wednesday, February 17, 2016
Women in the LawOmni Scottsdale Resort & Spa at Montelucia 4949 E Lincoln Dr Scottsdale, AZ 85253
DRI's Women in the Law Seminar is designed to maximize the legal skills and business acumen of women who work either within corporate legal departments or at law firms. The program tackles legal issues and emerging trends that keep clients up at night and provides concrete practice pointers that will enable in-house lawyers and their outside counsel to partner for success. At the same time, this seminar provides education and career coaching to empower women lawyers to define their optimal career paths and then strive for and attain higher positions within their organizations. This seminar boasts distinguished faculty from around the country, including in-house lawyers from some of the most recognized companies in the world, experienced trial lawyers, and nationally recognized thought leaders on professional development and leadership issues unique to women lawyers. Please join us in Scottsdale to learn from our outstanding speakers and network with colleagues and in-house counsel from
- SEMINAR Wednesday, March 9, 2016
Trial TacticsThe Cambry, Autograph Collection Hotel 2401 E. Camelback Road Phoenix, AZ 85016
Detailed information regarding this seminar is not yet available.


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Book Excerpt: A Bomb in Every Issue
Hunter S. Thompson, a pill-popping monkey, Black Panthers, and CIA dirty tricks: Scenes from the short, crazy life of Ramparts, the muckraking magazine that paved the way for Mother Jones.
Hinckle's style was nothing if not kinetic. Staff writer Adam Hochschild recalled it this way:
He raced through each 18-hour day with dizzying speed. All action at the magazine swirled around him: a pet monkey named Henry Luce would sit on his shoulder while he paced his office, drink in hand, shouting instructions into a speakerphone across the room to someone in New York about a vast promotional mailing; on his couch would be sitting, slightly dazed, a French television crew, or Malcolm X's widow (who arrived one day surrounded by a dozen bodyguards with loaded shotguns), or the private detective to whom Hinckle had given the title Criminology Editor. Then would follow an afternoon-long lunch where Hinckle would consume a dozen Scotches without showing the slightest effect and sketch dummies of the next issue's pages on the restaurant's placemats. Finally he'd be off on the night plane to see new backers in the East.
In New York, the maelstrom continued. James Ridgeway's 1969 profile of Hinckle in the New York Times Magazine described his fantastical performances at the Algonquin Hotel.
In the dining room Hinckle would be recounting his scheme for a publishing empire, expanding Ramparts, starting one, two, or three radio and television stations, starting an author's agency, setting up teams of reporters who would get the goods on LBJ, NATO, the Pope, etc. Ramparts would publish books, set up book clubs, start a syndicate… If one dared to ask where the money was really going to come from, Hinckle would fall back into his chair and suck on a grasshopper while Scheer lunged forward. "What's the matter?" he'd say, "Got no guts?"
Hinckle's effect on his colleagues, especially younger ones, was dazzling. "Hinckle was amazing," said Michael Ansara, a Harvard Students for a Democratic Society leader and Ramparts researcher. "As an undergraduate, I'd visit him at the Algonquin. He'd start talking in the shower, continue the conversation while putting on his tuxedo, and then we'd be off for oysters with Abby Rockefeller." The company Hinckle kept was part of the glamour. "I once had dinner with him and Oriana Fallaci," Ansara said. "I was about eighteen years old. I'd never seen a woman like her, much less had dinner with her. He was the most cosmopolitan, flamboyant, creative guy I'd ever seen."
• • •
Ramparts reported stories that the mainstream press would not touch. In April 1966, Robert Scheer revealed that the CIA had secretly used Michigan State University to train South Vietnamese police and write the country's constitution. The expose led the agency to order a "rundown" on Ramparts. It eventually investigated 127 writers and researchers and 200 other Americans connected to the magazine.
As Ramparts dug into the less savory aspects of America's most powerful institutions, the staff suspected that the government was watching them. One of their colleagues, William Turner, confirmed that suspicion. Raised Catholic in Buffalo, Turner had joined the FBI, received training in wiretapping and burglary, and listened in on telephone conversations in the Bay Area. But he had run afoul of J. Edgar Hoover after objecting to the FBI director's characterization of Martin Luther King as "the most notorious liar in the country." Turner left the FBI after ten years of service, settled in Marin County, and wrote a piece about the bureau's failure to obtain convictions on civil rights violations in the south. After his Ramparts articles appeared, Hoover wrote about him in an internal memo, "It's a shame we can't nail this jackal."
Turner assured his Ramparts colleagues that the government was watching them. "Wiretaps are your tax dollars at work," he told art director Dugald Stermer. "If your phone isn't bugged, we're not doing our job."
There were other indications, too, that the magazine's adversaries were trying to undermine its efforts. Stermer was audited in two consecutive years, and when Turner arrived at the office the morning after Easter 1967, he found shattered windows, fire extinguisher goo covering the furniture, and an IBM Selectric typewriter lying askew in the toilet. Turner suspected that the CIA had ransacked the office but saw no signs of forced entry. Years later, Hinckle telephoned Turner from Cookie Picetti's; a former law enforcement officer and GOP official had just confessed to him about burglarizing the Ramparts office in 1967. Hinckle asked Turner to question his new acquaintance about his burglary story. "But he couldn't have done it," Hinckle added, "because Gene Marine and I did it." Hinckle and Marine, a staff writer, had trashed the office after a drinking session at Tosca, another North Beach bar. But the burglar claimed that his caper had occurred two nights earlier, and he convinced Hinckle by producing the editor's bar receipts from Cookie Picetti's along with some Ramparts files. He told Turner that right-wing organizations had sponsored the burglaries, and that the findings were shared with CIA agents.
Photo courtesy of Guy and Gregory Stilson
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Prologue* Brideshead Revisited is the chronicle of a man named Charles Ryder and his association with an aristocratic English family between World War I and World War II. * The novel begins with Captain Charles Ryder of the British Army organizing his troops to move out to an undisclosed location. * It is 1943 and Ryder is a man with little enthusiasm for his mission or his life in general. He does not even question where he and his men are heading. * An overnight train trip from Scotland positions Ryder and his men at a location in England which Charles has visited before. * Charles is a man plagued by melancholy. Although he is committed to performing his military duties, he takes no interest in strategy or tactics and compares his service to that of a husband who no longer has any affection for a once-beloved wife. * The troops are to set...
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