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Following the success of The Complete Worst-Case Scenario Survival Handbook (more than 150,000 copies sold!), this ruggedly handsome hardcover collection brings together new and classic advice from Worst-Case experts to help readers master the manly arts from wrestling an alligator to calming a crying child to extinguishing backyard barbeque fires with all the contents fully searchable on an accompanying CD.
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Against Race: Imagining Political Culture Beyond the Color Line
Harvard University Press, 2000 - Political Science - 406 pages
After all the "progress" made since World War II in matters pertaining to race, why are we still conspiring to divide humanity into different identity groups based on skin color? Did all the good done by the Civil Rights Movement and the decolonization of the Third World have such little lasting effect?
In this provocative book Paul Gilroy contends that race-thinking has distorted the finest promises of modern democracy. He compels us to see that fascism was the principal political innovation of the twentieth century--and that its power to seduce did not die in a bunker in Berlin. Aren't we in fact using the same devices the Nazis used in their movies and advertisements when we make spectacles of our identities and differences? Gilroy examines the ways in which media and commodity culture have become preeminent in our lives in the years since the 1960s and especially in the 1980s with the rise of hip-hop and other militancies. With this trend, he contends, much that was wonderful about black culture has been sacrificed in the service of corporate interests and new forms of cultural expression tied to visual technologies. He argues that the triumph of the image spells death to politics and reduces people to mere symbols.
At its heart, Against Race is a utopian project calling for the renunciation of race. Gilroy champions a new humanism, global and cosmopolitan, and he offers a new political language and a new moral vision for what was once called "anti-racism."
What people are saying - Write a review
Review: Against Race: Imagining Political Culture Beyond the Color LineUser Review - Tom - Goodreads
There are some insights in this large tome, but it's lack of clarity makes it disappointing. It's written in a ponderous style, post-modernist in some ways, tho not as impenetrable as a lot of pomo ... Read full review
Review: Against Race: Imagining Political Culture Beyond the Color LineUser Review - Christine Theberge Rafal - Goodreads
This is a thick book; I've only read sections of it, preparing for a class in the history of science. But we know race is not biologically real, so this book is good for considering how we can erase ... Read full review
The Crisis of Race and Raciology
Modernity and Infrahumanity
Identity Belonging and the Critique of Pure Sameness
Hitler Wore Khakis Icons Propoganda and Aesthetic Politics
After the Love Has Gone Biopolitics and the Decay of the Black Public Sphere
The Tyrannies of Unanimism
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Against Race: Imagining Political Culture Beyond the Color Line
Paul Gilroy
No preview available - 2001


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The only shares for sale are the hedges. Peeps get ready to make some money?
Hey Snob:
I have to admit that your shams are quite transparent, but I don't give a rats A** what you post because I don't invest based on these boards. Anyhow, I am mostly on the sidelines at this point after shorting the recent fall of the markets in general. (I consider that an educated lucky play). It also helps to have friends that place block trades for big banks.
The markets are such a crap shoot... HLCS is still an itch I like to scratch but I would not bet the family farm on it. I recently pulled everything with the exception of 2.5K that I spread out over four Pharma companies that are so beaten up its not funny. I sleep much better now!
The stars are telling. So Snob's got 5 aliases / henchmen in his court. Not to mention a fragile ego. Bravo.
Pro Monte. I'll listen to anything factual and honest, for or against owning this stock, but I don't want to participate in a pissing contest.
If you think you're bolstering your credibility keep on yammering. This thread will resurface in the future.
LOL. Take your meds and think happy thoughts. It will be OK. I don't work for a trading desk at all.
I'm here because of the connections I've made in the past. They're a good decent people including yourself that maybe don't know all that is going on.
This is a big and crazy world you are in. If your looking for holiness and purity your in the wrong place. You either learn to play the game or suffer. Its a simple equation.
Did you play sports? Think about the referee and how lose or tight he calls the game. You can claim your being hacked but if the calls aren't being made you better stop whinning and just play the game the way its being called. No psycobable just street sense homey.
Spare the psychobabble. My frustration is with liars like you who are so arrogant to think their transparent lies are actually believable. I'm calling you out, publicly.
You should look in the mirror and ask yourself how can you possibly do good in the world with a campaign of lies and deceit?
You definitely work for a trading desk. It's been my hypothesis that you and Mad are in cahoots.
"You can't attack deception with deception."
I have been.I maybe a dummy but I didn't ride this down like you?
"I'm here to share quantitative DD information that can be analyzed for it's merit on a factual basis using rational discussion."
There's a few that are passing on information including yourself. You are acting a little Pompous.
You sound a little like a Madmoonson whom is above reproach? Are you his twin?
I don't work for the hedge. Your frustration with your investment decisions and the fear and anger that follows is leaking out now in your post to me.
Free speech? Your threats create no fear for me. Grow up and accept responsibility for your actions. Its a sign of healthy emotional behavior and its a key indicator that you are maturing and growing into adulthood.
is this really snob??? if so welcome back???
Thanks for the welcome back. That post was for another board. I'm just hovering and posting under aliases to negate the crap from non share holders as they continously try to beat this down. There's got to be something that keeps them here hammering HLCS. If there was no value they wouldn't continously bash. I think It's the traders for the house that are bashing. Just one or 2 with multiple aliases that are short or maybe part of a bigger plan? MCAP of 30 million? Where's Correlgan?
I'm ready snob. Welcome back


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Tottenham Hotspur Message Board
A Yahoo! User Jan 1, 2011 19:28 Flag
bloody hells bells, is Harry suffering from lack of original thought or does he keep looking in the back pages of his WHUFC diary..............come on.........................
bit like us going in for Owen.........hang on theres a thought
ironisticSort: Newest | Oldest | Most Replied Expand all replies
Love the idea of Becks at the lane.
Properly puts Spurs on the map.
Adds a whole new attacking option.
Can fill the Huddlestone shaped whole in Midfield spraying the ball about while Hudds is recovering ;o)
Someone who can actualy score from free kicks!!!
- 1 Reply to Nick
Lol bang on Nick!
not_blonde_really not_blonde_really Jan 3, 2011 05:53 Flag
I've not seen any figure reported anywhere (and I've had a quick look), and I really don't think that it's a major deciding factor - we've all agreed recently that Levy's dealing with his side of proceedings nicely, so let's leave that to him.
You might find this interesting though: m.guardian.co.uk/ms/p/gnm/op/s-JdV-51Zdh7R-DQO91AOkg/view.m?id=15&gid=football/blog/2010/dec/31/should-tottenham-hotspur-sign-david-beckham&cat=football. I don't see "it didn't work for someone else" as a proper reason to not do anything, but who am I to judge?
A Yahoo! User Jan 3, 2011 05:17 Flag
glad a couple of people agree with me.
iv heard some people say we will make the money back in revenue. if thats the case & we dont drop lennon for him then im fine with it.
but if it does end up costing a fortune & we start messing with the team to accomodate him then il be very annoyed!
35yr old beckham is unlikely to be able to cope with the premiership.
as a few others have said, why dont we throw 120k at some other ex legends like ronaldo or zidane.
im sure they will sell levy a few extra shirts in usa.
pires is a good example, far too old & off the pace of the premiership. waste of wages.
its hard to tell potential big new signings sorry, we have a strict wage structure when we break it by at least 50k a wk for beckham.
majority of footballers are money driven so levy is playing a dangerous game.
the reported 120k sounds about right & is being kind to us as beckham has kindly halfed his normal wage which is 250k a wk at la galaxy.
i laughed when i heard harry on MOTD saying he hardly needs the money & he is coming to play football.
so if thats the case why are we paying him such a huge wage!
from a supporters point of view id be pissed if i spend all that money going to watch spurs play & then they throw 120k at a has been to sit on the bench.
i cant complain as i only get to about 5 games a season.
Beckham is an exception in this case. This wont blow the wage structure at Spurs wide open, all the players will understand and respect the move for what it is. Come on guys it's Beckham for christ sake!!!
not_blonde_really not_blonde_really Jan 3, 2011 04:51 Flag
Hold on, where's that figure come from? Sounds like speculation/estimates based in his current earnings, I certainly wouldn't expect us to be paying the lion's share of his wages, and I suspect he wants the practice badly enough to go with less - not least cos of Redknapp's "he doesn't need the money" comments.
I see it as more of a coaching role, but in the more hands on aspects - ordinarily you'd look to your older players for that, but the likes of King, Woodgate and Keane are hardly any use for that lately! In my eyes the playing is a bonus on that, and to keep him sweet. Another assumption, but makes more sense to me.
A Yahoo! User Jan 3, 2011 03:23 Flag
im with you on this one SB................the economic situation in the game doesnt warrant moves like this, unless................theres more to it than meets the eye.hmmmmmmmmmmmmmmmmmm.
isnt ronaldhino (sic) up for 8 mill euros atm........still got some legs left in him, why not have em both and send shirt sales sky high all over the americas.....................................................................
I understand your concerns babe but Im still convinced Becks at the Lane would be hugely beneficial to our status in the transfer market and would give us that extra spark we'll need going into the Champions league final rounds. I bet all the lads at Spurs would love to see him here. Apart from maybe Bentley Lol
A Yahoo! User Jan 2, 2011 23:31 Flag
commercial value. as u said hes only here for a couple of months so id be suprised if millions of ppl start buying spurs shirts with beckhams name on the back.
he will still cost us a few million which we could have put towards signing someone better & who isnt a few yrs away from being 40.
beckham wont be able to handle the premiership. dont forget he has been playing in a joke american league.
im happy enough with VdV set pieces.
im not saying the wage bill is a deal to spurs BUT we have to start being more careful with our money if we do want a new stadium etc.
so that means we could have keane, bentley & beckham sat on the bench every wk at a cost of 250k which is a million a month!
no offence but those 3 arent worth a million a mth.
hoepfully keane & bentley will have been sold by then thou!
Signing Becks on loan would be awesome. He'd only heighten the focus and desire at the club right now and give us the impetus we need going into the latter stages of the Champions League. The fact that we'll be playing AC Milan will make it all the more sweeter. COYS
- 1 Reply to me
I'm all for it. Redknapp knows what he is doing.
I do not believe Beckham is coming in with the expectation of a start. More likely to train and be a fringe player, with the odd league game.
I think his presence will do us wonders. Can provide sound advice to Harry (eg about Milan), provide back up, lift those around him. OK, he may be 35, but you cant take away the superstar status.
Even though England done crap at W.C whilst he was on bench (as a coach?), you can see he has the passion and wants to win, a presence that we require.
not_blonde_really not_blonde_really Jan 2, 2011 01:38 Flag
I'm coming round to the idea. I think we need some one or thing in during the window, and someone with Beckham's professionalism will work wonders to instil a bit more grit - we've started to build the winning mentality, so it's a great time for him to come and reaffirm it. He'll also be a useful person for many of them - not just the midfielders - to train with in terms of the skills and techniques (and again professionalism) they can pick up/observe/get tips on, and finally will be a great role model (for want of a better word) for the many players we have in the fringe of the England set up.
I think it could be really mutually beneficial, and I do think there's space for a cameo from him in the squad (note squad, not necessarily team), my main concern is how it would work with the squad numbers etc - would he be named in our PL squad of 25? What about the CL? Cos it seems a waste to name someone who'll only be there for a couple of months, but I can't imagine he'd just be around for the FA cup...
On a side note, that's 2 consecutive clean sheets - go us!
- 1 Reply to not_blonde_really
First of all - Happy New year to all of the posters on the board - I have high hopes for the New Year and what we can accomplish.
Second - I agree with NBR re: Beckham. I also think that he is perhaps worth inclusion in the CL squad. We know that many of the games - especially away - may end up with penalties, or may swing on a set play - and while there's no doubt Becks is slow (he was never that quick), he is still one of the best strikers of the dead ball - and it would free VdV up to be in the box where he is just as dangerous as he is when he is striking the set pieces.
And I'd still like to see a top striker and a LB!
Hope the upcoming year is good for all of ya!


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Great place for a breakfast, brunch, lunch or just drinks. Locals and tourists can be found here in a relaxed atmosphere. Shop baked breads (try the walnut and raisin bread). Warming soups. Tasty toasties. Boiled eggs! Platters to share. Watch the world go by from a window seat. No cash accepted, just cards.
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text: At every hotel we have stayed in that includes breakfast ketchup is always provided. Not here. Scrambled eggs and sausage but no ketchup. Shame on the manager for skimping on a North American favorite. The staff had to keep explaining they aren't stocking it anymore, and they were asked a lot. Not impressive also was the blanket with cigarette burn holes in it and the sofa with stains on it from botched attempt to remove a stain that made it worse. Comfy bed & pillows though. Clean as well. The officious staff person in the breakfast area was competent but not friendly.


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text:
|Reviews for Everything I Wanted
| Edward's spouse chapter 30 . 9/30
excellent. until next time.
| Guest chapter 30 . 9/23
I love both this and needed and can't wait for more! How will everyone react to the baby news? Will rosa lie get better and be nicer?
| Siriusmunchkin chapter 30 . 8/27
Edward and Tanya can't be blamed for Rosalie's issues. Unfortunately what she is going through is the norm these days. Society and peer pressure bring untold horrors to anyone who doesn't toe their line. The bullies are in control because no one wants to take the necessary steps to stop them. You just have to remember that bullying is not always physical. More girls than you can imagine, or maybe you can, are just like Rosalie and fall into the same pattern she has. Edward is doing the best he can and with Bella's help and encouragement life will get better. That and you're about to have another small person in your household. This should be fun.
| Siriusmunchkin chapter 29 . 8/27
Edward is coping. He just copes a lot better when he listens to Bella. She is one very smart person.
| Siriusmunchkin chapter 27 . 8/27
Not happy with his daughter in the least. Carlisle and Esme leave a lot to be desired at the moment. It will be the girls who suffer if they aren't allowed to see Bella. Charlie, Sue, and Leah approve and that counts more than anything.
| lilmstran chapter 30 . 8/25
loved it
| twiclare chapter 30 . 8/12
Edward is bound to feel guilty, he's labelled Rosalie as a difficult, moody teenager and let it go at that. He and Tanya will both feel awful that this has happened under their noses and they didn't see it. The way that Rosalie spoke to him shows a level of maturity that should help her through this.
| Kathryn L. Malone chapter 30 . 8/6
Loving story! Can't wait till next update!
| Angeldolphin01 chapter 30 . 8/5
Love it.
| Mr.andMrs.EdwardCullen chapter 30 . 8/2
I hope Edward is happy
| CAngell chapter 30 . 8/2
Again, these folks need some peace!
| Guest chapter 30 . 7/31
Oh my i wonder how everyone is going to react to bella being pregnant!? I'm sure that's going to ruffle wane and carlisles feathers even more! What about rosa lie?!
| sujari6 chapter 30 . 8/1
I thought he handled the situation well.
| Cullen Cousin chapter 30 . 8/1
Great chapter!
| That'sMzPeachesTYVM chapter 30 . 8/1
You can't hold Edward responsoblr for not knowing that his
teenage daughter is cutting herself in places that are usually
covered with clothes. Most men do not look closely at the
body if the teenage daughter anyhow! I blame the doctors
from Chicago, and ANY physician she has seen since she
was twelve. He can only try to give her the tools to better, 'cause let's face it...you can lead a
horse to water, but you CANNOT make them drink.


text:
Worst: I am still super sick with strep
It kinda sucks writing the reports when I'm all hopped up on medication and socialized health care. I mean, I forgot at least thirty things I meant to put into the report last week, so I'm just left with a notepad full of half-formed thoughts such as "Why does Bobby Lashley wrestle in his real life underwear," "Does Bobby Lashley know this makes him look like a member of the Pit Crew from RuPaul's Drag Race," "Why does Bobby Lashley have to go fully into Downward Dog to take his shirt off," and, most importantly, "Why Bobby Lashley."
One thing I haven't forgotten, however, is how to spell his name. The same cannot be said for an actual person who gets paid to work at the same place he does:
And look, I don't mean to suddenly get pedantic over wrestling nicknames, however, Ethan Carter III = EC3. It's pretty well established. It even says so on a t-shirt, and we all know t-shirt canon is binding in at least 17 different countries.
Best: Kenny King
Sometimes I rewatch the Hogan-Bog Boss Man cage match because, you know, it's great, but every time I do I get so dang mad that at the end Hogan steal Slick's hat and wears it around the ring because he's a real big jerk. This was 25 years ago and it makes me so freshly angry every single time. During the Bully Ray beatdown, Kenny King loses a shirt, but gains a hat when he steals it from Bully Ray. Just like what happened in 1989, were I in any way on this Bully Ray's side I would be the most mad. A+ dick move, Kenny King.
Worst: Beach Blanket Bully
Bully Ray has set up this frustrating gallery of tables to illustrate his tables "hit list." To the surprise of absolutely no one, this segment is a diagonal winner on the 2014 Bully Ray BINGO sheet:
B – References to balls, being a man, or shoving something up someone's ass
I – Taking off chain, angrily pacing
N – FREE SPACE or THE MOST UNNECESSARY YELLING EVER
G – Character alignment incongruous with long-established character traits/alliances
O – Oh my god can you cling to your past glory any harder with this tables nonsense
I thought we were gonna get a full horizontal line with "mention of violence towards a woman," but the putting something up someone else's butt thing sealed the deal.
Best: Is this the best Spud Suit yet?
Yes. Yes it is.
Worst: Nobody makes EC3 cry his own tears


text:
|Publication number
|Publication type
|Application number
|Publication date
|29 Sep 2005
|Filing date
|17 Dec 2004
|Priority date
|19 Dec 2003
|Also published as
|Publication number
|Paul Zimmerman, Chris K. Peski
|Original Assignee
|Sematech, Inc.
|Export Citation
|BiBTeX, EndNote, RefMan
|Patent Citations (9), Referenced by (5), Classifications (10), Legal Events (2)
|External Links: USPTO, USPTO Assignment, Espacenet
This application claims the benefit of U.S. Provisional Application Ser. No. 60/531,184 filed Dec. 19, 2003, the entire disclosure of which is specifically incorporated herein by reference.
1. Technical Field of the Invention
The present invention relates generally to the fields of semiconductor lithography. More particularly, it concerns methods, compositions, and apparatuses relating to 157 nm and 193 nm soft pellicles.
2. Description of Related Art
In the production of semiconductor devices there are a number of lithographic exposure steps whereby an image is projected onto a photosensitive material coating on a semiconductor wafer. The image is projected using a photomask which must be kept clean because any undesired particles on the surface may alter the image on the wafer and cause a defect.
A common method to achieve this goal has been the application of a protective membrane, which is separated by a few millimeters from the mask itself. At this offset, particles on the protective membrane will be out of focus and not imaged onto the wafer. This membrane, called a "pellicle," has been an integral part of the common practice in the semiconductor industry for two decades. The pellicle typically comprises a polymer membrane approximately one micrometer thick that is stretched over a frame which is affixed to a mask, also referred to as a "reticle." Although the pellicle is in the optical path, the polymer thickness is small so that effect on the imaging performance is negligible.
Currently, there is no mask protection solution available for 157 nm lithography. The expectation is that any solution will be expensive and would likely add difficulty to the lithography process. The creation of a soft pellicle solution for 157 nm lithography would provide immense benefit to semiconductor manufactures by improving the yields and reducing the cost of 157 nm lithography.
Additionally, there are limited choices for 193 nm pellicles, raising the cost of the lithography. Improvements in 193 nm pellicles would provide benefit for semiconductor manufactures by reducing the costs of 193 nm lithography. All semiconductor manufactures and tool suppliers in the semiconductor industry would prefer a soft pellicle solution over a hard pellicle solution.
No pellicle solution currently exists in the prior art for 157 nm semiconductor lithography. The present invention overcomes these deficiencies by providing methods, materials, and apparatuses for soft pellicles for 157 nm lithography. Additionally the soft pellicles may be used for 193 nm semiconductor lithography. The soft pellicles of the present invention are made using perfluorinated polymers that have, in an exemplary embodiment, been irradiated with a high energy electron beam and fluorinated to increase the transparency of the perfluorinated polymer.
In one aspect of the present invention a method is provided for producing a pellicle comprising exposing a perfluorinated polymer to radiation. The perfluorinated polymer may then, in an exemplary embodiment, be exposed to fluorination. In another embodiment, the temperature of the perfluorinated polymer is controlled. This method may comprise heating the perfluorinated polymer to a temperature of at least the melting temperature of the perfluorinated polymer. This method may further comprise heating the perfluorinated polymer above the melting temperature of the perfluorinated polymer. The temperature of the perfluorinated polymer may range from between about 20� C. to about 400� C., more preferably from between about 320� C. and about 385� C. In this method, the irradiation may comprise a high energy electron beam, preferably from about 800kGy to about 10MGy. In an exemplary embodiment, the irradiation occurs in an oxygen-free environment such as in a vacuum or in an environment that contains a noble gas. The noble gas in one exemplary embodiment is argon but may also be helium, neon, krypton, xenon, or radon. The perfluorinated polymer may be exposed to fluorination at least once, and, in one exemplary embodiment, the fluorination comprises exhaustive fluorination.
The perfluorinated polymer comprises in preferred embodiments PTFE, FEP, PFA, and/or polytetraflurorethylene co-perfluoroisobutylene. In preferred embodiments, the perfluorinated polymer has a thickness of less than 100 microns, more preferably less than about 50 microns, more preferably less than about 40 microns, more preferably less than about 30 microns, more preferably less than about 25 microns. In one embodiment, the transparency of the perfluorinated polymer is increased by the irradiation and the fluorination. In exemplary embodiments, the pellicle comprises a pellicle for use with 157 nm lithography and/or 193 nm lithography.
The present invention also provides a pellicle comprising a perfluorinated polymer. In exemplary embodiments, the perfluorinated polymer has a thickness of less than 100 microns, more preferably less than about 50 microns, more preferably less than about 40 microns, more preferably less than about 30 microns, more preferably less than about 25 microns. The perfluorinated polymer may be PTFE, FEP, PFA, and/or polytetraflurorethylene co-perfluoroisobutylene. In certain embodiments, the perfluorinated polymer is irradiated and/or fluorinated. In one embodiment, irradiation comprises a high energy electron beam that is between from about 800kGy to about 10MGy. In exemplary embodiments, the pellicle comprises a pellicle for use with 157 run lithography and/or 193 nm lithography.
In another embodiment, the temperature of the perfluorinated polymer is controlled (e.g., controlled during irradiation). The perfluorinated polymer may be heated to a temperature of equal to or greater than the melting temperature of the perfluorinated polymer. In an exemplary embodiment, the irradiation occurs in an oxygen-free environment such as a vacuum or an environment that contains a noble gas. The noble gas may be argon but may also be helium, neon, krypton, xenon, or radon. The perfluorinated polymer may be exposed to fluorination at least once, and, in one embodiment, the fluorination comprises exhaustive fluorination. The fluorination and the irradiation preferably increase the transparency of the perfluorinated polymer.
The present invention also provides a system, comprising: a) a chamber for irradiation and fluorination of a sample, b) a window coupled to the chamber, the window allowing the irradiation of the sample, c) at least one aperture allowing for the passage of a gas d) a source of fluorination, and e) a radiation source. The chamber is preferably coupled to at least one pressure release valve. The chamber is preferably coupled to at least one heating unit for heating the chamber. The heating unit may allow for regulation of the chamber temperature between from about 20� C. and about 400� C., and the temperature is preferably regulated between from about 320� C. and about 385� C. The sample may comprise a perfluorinated polymer. The irradiation preferably comprises a high energy electron beam. The chamber may be coupled to two apertures. The chamber may also be coupled to two release valves. The window may comprise a replaceable window, including but not limited to a Ti window and an Al window. In a preferred embodiment, the Ti window is about 32 microns thick.
The use of the word "a" or "an" when used in conjunction with the term "comprising" in the claims and/or the specification may mean "one," but it is also consistent with the meaning of "one or more," "at least one," and "one or more than one." As used herein "another" may mean at least a second or more.
It is contemplated that any embodiment discussed in this specification can be implemented with respect to any method or composition of the invention, and vice versa. Furthermore, compositions of the invention can be used to achieve the methods of the invention.
Throughout this application, the term "about" is used to indicate that a value includes the inherent variation of error for the device, the method being employed to determine the value, or the variation that exists among the study subjects.
The use of the term "or" in the claims is used to mean "and/or" unless explicitly indicated to refer to alternatives only or the alternatives are mutually exclusive.
As used in this specification and claim(s), the words "comprising" (and any form of comprising, such as "comprise" and "comprises"), "having" (and any form of having, such as "have" and "has"), "including" (and any form of including, such as "includes" and "include"), or "containing" (and any form of containing, such as "contains" and "contain") are inclusive or open-ended and do not exclude additional, unrecited elements or method steps.
Other objects, features and advantages of the present invention will become apparent from the following detailed description. It should be understood, however, that the detailed description and the specific examples, while indicating specific embodiments of the invention, are given by way of illustration only, since various changes and modifications within the spirit and scope of the invention will become apparent to those skilled in the art from this detailed description.
The following drawings form part of the present specification and are included to further demonstrate certain aspects of the present invention. The invention may be better understood by reference to one or more of these drawings in combination with the detailed description of specific embodiments presented herein.
FIGS. 16A-B: are graphs of XRD data of PTFE and irradiated PTFE in accordance with aspects of the invention.
The present invention overcomes deficiencies in the prior art by providing compositions, methods, and apparatuses for novel soft pellicles that can be used for both 157 nm and 193 nm lithography. Because a soft pellicle solution for 157 nm lithography does not exist in the prior art, the creation of a soft pellicle solution for 157 nm lithography described herein provides immense benefit to semiconductor manufactures. Additionally, the soft pellicles described herein also provide significant benefit to semiconductor manufactures by lowering the costs of 193 nm lithography. In one embodiment, the present invention relates to a method comprising the use of perfluorinated polymers to produce soft pellicles. In another embodiment, the present invention relates to an apparatus and a system for producing soft pellicles. In yet another embodiment, the present invention relates to soft pellicles for 157 nm lithography.
A. Perfluorinated Polymers
As used herein "perfluorinated polymers" include any compound that is composed substantially of carbon and fluorine and any compound that is composed substantially of carbon, fluorine, and oxygen. Examples of perfluorinated polymers include: polytetrafluoroethylene (PTFE), polytetrafluoroethylene-co-hexafluoropropene (FEP), polytetraflurorethylene co-perfluoroisobutylene, and polytetrafloroethylene co-perfluoroalkoxy (PFA). Examples of perfluorinated polymers are shown in
Perfluorinated polymers include compositions that are composed essentially of any combination of perfluorinated polymers. For example, a perfluorinated polymer would include a material that is composed essentially of a combination of PTFE, FEP, and PFA; in this example, this perfluorinated polymer might be a single molecule that includes PTFE, FEP, and PFA moieties that are attached by molecular bonds; alternatively, in this example, the perfluorinated polymer might be a mixture or PTFE, FEP, and PFA.
Previous studies on perfluorinated polymers have been directed towards perfluorinated polymers that are 40-500 microns thick (Oshima et al., 2001; Lappan et al., 2001; Senna et al., 2001). Perfluorinated polymers of this thickness are not useful for pellicle applications. Although the inventors anticipate that perfluorinated polymers of various sizes will be used with the present invention, perfluorinated polymers of a thickness less than about 100 microns, more preferably less than about 50 microns, more preferably less than about 40 microns, more preferably less than about 30 microns, more preferably less than about 25 microns, more preferably less than about 20 microns are used with the present invention as soft pellicle materials for 157 and 193 nm pellicles.
Fluorinated polymers are engineering plastics that are widely used due to their mechanical properties, chemical inertness, heat resistance and low coefficient of friction (Fischer et al., 1998). Irradiation can change the physical and chemical properties of fluorinated polymers (Chapiro, 1962; Yoshi et al., 1987). The degree to which the radiation will affect the polymer depends on many factors, including the chemical structure, morphology, irradiation dose, and irradiation conditions (Franklin, 1982; El-Nemr et al., 1998; Woods et al., 1994). For example, temperature can affect the changes produced by irradiation on perfluorinated polymers (Tabata, 1992; Oshima et al., 1995, 1997a,b; Tabata et al., 1996; Tabata and Oshima, 1999; Ikeda et al., 2000; Katoh, 1999). Additionally, other conditions (e.g., the nature of any gasses in contact with the perfluorinated polymer) can also affect the changes produced in a perfluorinated polymer by irradiation (Lappan et al, 2000; Lovejoy et al., 1965; Oshima et al. 1997c, 1999a,b; Tabata and Oshima, 2000; Sun et al., 1994; Lappan et al. 2000b; Senna et al, 2000.)
B. Methods for Producing 157 nm and 193 nm Pellicles Using Perfluorinated Polymers
The present invention presents and utilizes the idea that a highly cross-linked fluorocarbon material (i.e. a perfluorinated polymer) may be used as a pellicle for semiconductor manufacture. Novel methods have been used herein to remove crystallinity from perfluorinated polymers such as polytetrafluoroethylene (PTFE). This technology and these approaches will be applied to thin films of PTFE and other perfluorinated polymers.
The invention takes a very thin perfluorinated polymer film (preferably less than 50 microns thick, more preferably less than 25 microns thick) and uses a cross linking mechanism followed by fluorination to improve transparency and lifetime of the film, as compared to starting materials. The pellicle is created by first using an extremely thin (preferably less than 50 microns thick, more preferably less than 25 microns thick) layer of perfluorinated polymer that is heated above its melt temperature and irradiated with a high energy electron beam. Adjustments to the film's properties are completed by variation of temperature, radiation dose, pressure and gas type present near and/or contacting the perfluorinated polymer. These properties include: film thickness, cross-linking density, film uniformity, and degree of crystalinity.
The starting material may be mounted onto a frame (e.g., an aluminum frame) in a class 100-1000 clean room and then inserted into a chamber, sealed, and then pressurized to about 1.1 atmospheres with a noble gas (e.g., argon) preferably of high-purity. The temperature of the chamber may be varied from about 20� C. to about 400� C., but will generally be operated between about 320� C. and about 385� C. In one embodiment of the present invention, prior to heating of the chamber, the system is purged with high purity argon (or other noble gas) for about 30 minutes; in this embodiment, under a pressure of about 1.1 atmospheres of argon the system is heated to about 340� C. The pressure relief valve on the process chamber can be set to about 1.1 atm to prevent over-pressurization as heating occurs. During the final heating stage where the system is at equilibrium, vacuum is applied to the system on the order of about 20 mtorr to about 100 mtorr.
Next, the perfluorinated polymer material can be exposed to high energy electrons. Exposure of the material can be carried out through a 32 micron Ti window on the chamber using high energy (e.g., about 1 MeV) electrons with a total dose of from about 800kGy to about 10MGy. A Gray (Gy) is a Joule per Kilogram. The samples may then be cooled slowly to about room temperature (e.g., over a period of about two to about four hours) while maintaining vacuum within the system. After the samples are fully cooled, high-purity argon (or other noble gas) can again be flushed through the system and a slight positive pressure (e.g., about 1.1 atm) can be maintained using a pressure relief valve.
During the electron beam irradiation procedure double bonds are introduced into the polymers. Fluorination, more preferably exhaustive fluorination, is used in this method to eliminate these double bonds and improve the transparency at 157 nm. This fluorination procedure may take place in the same chamber as used for the irradiation. The Ti window can be replaced by an Al window for this process. The substitution of the windows will preferably be done in a clean room. The basic fluorination process (i.e., "fluorination", "exposure to fluorination", or creating a "fluorinated" product) is described in detail in (Vypiel, 1985). In some embodiments of the present invention, once fluorination is completed, the membranes can then be remounted on frames for testing if necessary. In other embodiments of the present invention, remounting of the materials is not necessary and will not be performed.
This method provides several significant advantages. One advantage of this process over current materials is that the starting material is typically inexpensive and readily available from multiple sources. Additionally, the electron bombardment used in certain preferred embodiments is relatively inexpensive since the process typically requires short irradiation periods of about 100 seconds to about 200 seconds. In certain embodiments, 75 membranes/hr may be prepared making the process economically feasible. In certain embodiments, even with the fluorination process, the total estimated cost for pellicles described herein is significantly cheaper than current pellicle costs.
C. The Process Chamber
The process chamber (also referred to as the "polymer exposure system" apparatus or the "process chamber apparatus") allows direct modification of all materials as freestanding films. This process chamber allows for both irradiation and fluorination in the same chamber. Furthermore the process chamber apparatus allows for the introduction of gasses or vacuum, and, in a preferred embodiment, includes a pressure release valve.
The process chamber apparatus comprises a chamber with at least one hole in it to allow for the exchange of gasses. In a preferred embodiment, the chamber possesses two holes for this purpose. This chamber either possesses a window or is coupled to a window through which irradiation can pass. In a preferred embodiment, the process chamber possesses a 32 micron Ti window on the chamber through which exposure of the perfluorinated polymer material to high energy (˜1 MeV) electrons may be carried out. In a preferred embodiment, the Ti window can be replaced by an Al window for this process. The chamber also possesses an area suitable for the placement of a perfluorinated polymer. The chamber may also possess or may be coupled to at least one pressure release valve that allows for the control of the pressure in the chamber. The chamber may also possess or may also be coupled to at least one heating element that can be used to raise and/or lower the temperature of the chamber.
The term "coupled", as used herein, is defined as connected, although not necessarily directly, and not necessarily mechanically.
The following examples are included to demonstrate preferred embodiments of the invention. It should be appreciated by those of skill in the art that the techniques disclosed in the examples which follow represent techniques discovered by the inventor to function well in the practice of the invention, and thus can be considered to constitute preferred modes for its practice. However, those of skill in the art should, in light of the present disclosure, appreciate that many changes can be made in the specific embodiments which are disclosed and still obtain a like or similar result without departing from the spirit and scope of the invention.
Cross-linked polytetrafluoroethylene (PTFE) is presented in this example as a solution for soft pellicles for 157 nm and previous lithography generations. This material is created using an extremely thin (<25 micron) PTFE that is heated above its melting temperature and irradiated with a high energy electron beam. Adjustments to the film's, properties are completed by variation of temperature, radiation dose, pressure and gas type. These properties include: film thickness, cross-linking density, film uniformity, and degree of crystalinity.
The starting material is mounted onto an aluminum frame in a class 100-1000 clean room and then inserted into a chamber, sealed, and then pressurized to 1.1 atmospheres with high-purity argon. The temperature of the chamber may be varied from 20� C.-400� C., but will generally be operated between 320� C. and 385� C. Prior to heating of the chamber, the system is purged with high purity argon (or other noble gas) for 30 minutes. Under a pressure of 1.1 atmospheres of argon the system is heated to 340� C. The pressure relief valve is set to 1.1 atm thereby preventing over pressurization as heating occurs. During the final heating stage where the system is at equilibrium, vacuum is applied to the system on the order of 20-100 mtorr.
Exposure of the material is carried out through a 32 micron Ti window on the chamber using high energy (˜1 MeV) electrons with a total dose of from 800kGy to 10MGy. A Gray (Gy) is a Joule per Kilogram. The samples are then cooled slowly to room temperature over a period of two-four hours while maintaining vacuum within the system. After the samples are fully cooled, high-purity argon (or other noble gas) is again flushed through the system and a slight positive pressure (1.1 atm) is maintained using a pressure relief valve.
During the electron beam irradiation procedure double bonds are introduced into the polymers. Exhaustive fluorination is required to eliminate these double bonds and improve the transparency at 157 nm. This fluorination procedure will take place in the same chamber as used for the irradiation. The Ti window will be replaced by an Aluminum (Al) window for this process.
The results of this procedure are shown in
The materials shown in
The substitution of the windows will be done in a clean room The fluorination process is described in detail in (Chimia, 1985). Once this treatment is completed, the membranes can then be remounted on frames for testing if necessary. However, it is hoped that remounting of the materials is not necessary.
The advantage of this process over current materials is that the starting material is inexpensive and readily available from multiple sources. Additionally, the electron bombardment is relatively inexpensive since it requires short irradiation periods of 100-200 seconds. At a cost of $400/hr, 75 membranes/hr could be prepared making the process economically feasible. The fluorination process will likely add another $25-50/membrane. The total estimated cost for these membranes will be on the order of $150-$200/pellicle. Currently the cost of 193 nm pellicles are about $450.00/membrane and 157 nm pellicles are expected to cost significantly more.
A process chamber apparatus (or "polymer exposure system" apparatus) was created to allow irradiation and fluorination of perfluorinated polymers in the same chamber.
Element 501 (
Element 505 (
Element 506 shows pellicle frames. Multiple pellicle frames may be mounted atop one another on Element 501, with Element 502 holding the frames in place. The pellicle frame may be used during irradiation. In this embodiment, each frame is about 4 mm thick. Polymer films are preferably mounted between two frames and then secured using screws. The frames may be inserted in the chamber with 2 mm spacers put between each frame to prevent the chance of differential pressure.
Element 506 (
Element 507 (
Element 508 (
Element 509 (
Element 510 (
For several years there has been substantial research into the development of a soft pellicle solution for 157 nm lithography and an improved pellicle for 193 nm lithography. A pellicle is a thin, transparent and passive film that protects the reticle (mask plate) from having particles deposited and thus imaged on to the wafer. Companies with extensive backgrounds in fluoropolymer development have spent years and a large amount of resources in an attempt to meet the requirements for a 157 nm and 193 nm soft pellicles. Materials developed for use as soft pellicles have shown remarkable transparency, however, none of these materials have been able to survive under 157 nm irradiation for any significant time (Feiring et al., 2003; Matsukura et al., 2002). Materials for 193 nm lithography are available but show shorter lifetimes than expected and sometimes have problems such as particle production. Research conducted over the past few years has investigated several model systems and polymers to gain an understanding of how systems are breaking down during 157 nm and 193 nm exposures (Zimmerman et al., 2003; Kuo et al., 2003; Luinov et al., 2004. Additional, work on development of a soft pellicle (Tregub et al., 2003; Liberman et al., 2003) has provided further evidence indirectly supporting possible structural components that may allow the creation of a 157 nm soft pellicle material.
Among the rules that were derived from the work discussed above are:
Based on this list two structures were determined to be of highest interest.
Experimental: The starting materials for the synthesized films were obtained from Saint-Gobain Performance Plastics (Wayne, N.J. 07470). The films used were ˜7 μm polytetrafluoroethylene (PTFE), ˜12 μm fluorinated ethylenepropylene (FEP) and Perfluoroalkoxyalkane (PFA). The films thicknesses were confirmed using a Metrocon analysis. The films were irradiated using 800 KeV electrons using an electron beam accelerator at Electron Beam Technologies Inc. (Kankakee, Ill.). The irradiation was carried out using a vessel shown in
After Irradiation the films were exposed to a mixture of fluorine and nitrogen gases from Air Products. Both gases were used without further purification. Electronically controlled flow control valves regulated the flow rates of both gases. Excess fluorine was passed through an alumina oxide column prior to venting to the atmosphere. The reactor containing the irradiated films was placed inside a hood and � inch Teflon lines were connected to the inlet and outlet ports via Swagelok connections. The reactor was purged with N2 for 1 hour at a flow rate of 125 cc/min, after which time the N2 flow rate was set to 25 cc/min and the F2 flow rate was set to 10 cc/min. Films were exposed to the gas mixture for from 4 to 26 hours. After the fluorine was turned off, the N2 flow rate was again set to 125 cc/min and the reactor was left to purge overnight.
The exposed films were characterized using several analytical techniques. The FTIR spectra were obtained from a Nicolet Magma-560 FTIR (Thermo Nicolet Corp. Madison, Wis.). The VUV-spectra were obtained from an Acton CAMS-507 spectrophotometer (Acton Research Corp. Acton, Mass.). Exposures of the films to 157 nm and 193 nm light were completed at MIT/LL. The 157 nm exposure was performed in a nitrogen purged environment. The incident energy and the transmitted energy were monitored using pyroelectric detectors and a ratiometer was used to measure the in situ variation of the relative sample transmission verses laser radiation dose. The procedure has been discussed in greater detail elsewhere (Liberman et al., 2002).
Film Characterization:
The control PTFE film shows poor transmission in the UV due to scattering caused by its intrinsic crystallinity. The control film was about 6.5 microns thick and during this work we were careful to follow some previous procedures on thicker materials9,10 so as to maintain the thickness of the starting materials. This is also the first study doing irradiation with freestanding and very thin (<20 micron) films.
The results indicate that the transmission from >167 nm can be dramatically affected by variation of irradiation dose for PTFE. An additional improvement in transparency can be realized through a fluorination step. FTIR analysis shows that after the fluorination, peaks corresponding to double bonds are eliminated from the spectrum. XRD analysis of the exposed films indicates that the crystallinity has been eliminated and that the films are now completely amorphous. Experiments show that additional irradiation or fluorination fails to shift the transmission cutoff to shorter wavelengths. There are several possible reasons for this cutoff. It is possible that the starting material has been formulated containing species that have a high intrinsic absorbance in the UV below 170 nm. Another possibility is the possible presence of an absorbing trace additive or contaminant in the base material. This additive may be typical for all PTFE grades and has no impact on standard uses but since this use for PTFE was not intended so no care would be taken to eliminate any UV absorbing species. Alternatively, the sharp cutoff could be due to the nature of the bonds formed in the cross-linked PTFE. We are currently trying to obtain "electronic grade" fluoropolymer film to narrow down the possibilities of what is causing such a severe UV cutoff.
Similar work was conducted on FEP and PFA polymer films.
Here the PFA film is 13 microns thick which will contribute to the inferior quality of the transmission observed. Interestingly, however, the cutoff at 167 nm is identical in position to that observed by PTFE. The lower overall transmission of the PFA film is due to the increased thickness of the film.
It should be noted, however, that the initial irradiation of the PFA causes a dramatic decrease in transmission between about 170 nm and 270 nm. A similar effect was seen with a low dose (˜3.5MGy) exposed film of FEP. This effect was not observed with a FEP film that was irradiated with a high (˜7.0 MGy) dose. Again with FEP, the UV cutoff of the film was observed here at about 167 nm.
Another consideration transmission is not better below 170 nm may be because there are not enough crosslinks to fully disturb the σ-localization. If we use the following:
The number of events per 100 units=G(X)*MW(g/mol)*Dose (MRad)*1.036�10−6*100%=3*50*100*1.036�10−6*100=1.55 CF2 units per 100 involved in crosslinks
Therefore at a dose of 7MGy there will be a crosslink every 100/1.55/7˜9.2 units.
This is of course just an approximation based on equations from O'Donnell and Sangster (O'Donnell and Sangster, 1970). However if we assume to first order that it is a reasonable approximation that indication are that we need a much higher crosslinking density if we are to eliminate the impact of σ-conjugation on absorption.
In fact when the composition of the film was evaluated using XPS, the growth of a peak that is associated with the point of 20 minutes of e-beam exposure was observed. This peak is attributed to a tetrahedral type structure as shown in the
A final consideration in disrupting the σ-conjugation that was considered in this work was to insert a heteroatom in the polymer chain. The test material was PFA and it was hoped that even though only a small amount of O was being added that some impact would be seen and thus would allow a push for developing subsequent material containing significantly more oxygen. Unfortunately the result after irradiation shows that over 90% of the oxygen is loss during the irradiation process.
IR spectra for control PFA (Element 1101) and irradiated PFA (Element 1102) indicating the loss of oxygen are shown in
157 nm and 193 nm Film Exposures. After generation of the prospective soft pellicle materials we sought to test the materials under 157 nm and 193 nm irradiation. Even though the materials tested for transmission at 157 nm appeared completely opaque they were still exposed to 157 nm irradiation.
The transmission observed for M-PTFE, M-FEP and M-PFA at 193 nm indicates that these materials may offer promise for use as a soft pellicle at this particular wavelength.
FIGS. 16A-B shows XRD data of PTFE and irradiated PTFE. Irradiated PTFE is shown in
In conclusion, thin polymer films can be irradiated using high-energy electrons in an inert atmosphere to create new classes of materials. Irradiation can be used to create completely amorphous polymers from crystalline starting materials. Modification of fluoropolymer films show distinct improvements in transmission from >200 nm to 167 nm and also that the films maintain their robustness after their treatment. These modified films show promise for use as 193 nm soft pellicles. Further, the films used in this Example were made from materials that were of a standard commercial grade. This grade could contain contaminants and polymer chain end-groups limiting the absolute transmission obtained. An electronic grade material that is one micro thick could give transparencies >99% @ 193 nm. Additionally, increasing the crosslinking density, increasing branch points in the polymer, and/or introducing heteroatoms to further disturb the σ-conjugation may also improve transparency.
All of the compositions and methods and apparatuses disclosed and claimed herein can be made and executed without undue experimentation in light of the present disclosure. While the compositions and methods of this invention have been described in terms of preferred embodiments, it will be apparent to those of skill in the art that variations may be applied to the compositions and methods and apparatuses and in the steps or in the sequence of steps of the method described herein without departing from the concept, spirit and scope of the invention. More specifically, it will be apparent that certain agents which are both chemically and physiologically related may be substituted for the agents described herein while the same or similar results would be achieved. All such similar substitutes and modifications apparent to those skilled in the art are deemed to be within the spirit, scope and concept of the invention as defined by the appended claims.
The following references, to the extent that they provide exemplary procedural or other details supplementary to those set forth herein, are specifically incorporated herein by reference.
|Cited Patent
|Filing date
|Publication date
|20 May 1991
|1 Dec 1992
|E. I. Du Pont De Nemours And Company
|Perfluoropolymer coated pellicle
|27 Aug 1992
|6 Sep 1994
|Hong Gilbert H
|Photochemically stable deep ultraviolet pellicles for excimer lasers
|6 Apr 1994
|20 Feb 1996
|Hong; Gilbert H.
|Method for using glass substrate surface modifiers in the fabrication of photochemically stable deep ultraviolet pellicles
|30 May 2001
|15 Jul 2003
|Micro Lithography, Inc.
|Antistatic optical pellicle
|27 Jan 2003
|9 Dec 2003
|Asahi Glass Company, Limited
|9 Jan 2003
|13 Apr 2004
|Taiwan Semiconductor Manufacturing Company
|Process flow and pellicle type for 157 nm mask making
|15 Jan 2003
|4 Apr 2006
|Asml Netherlands B.V.
|Perfluoropolyether liquid pellicle and methods of cleaning masks using perfluoropolyether liquid
|18 Oct 2002
|18 Apr 2006
|Taiwan Semiconductor Manufacturing Co Ltd
|Reticle with antistatic coating
|7 Nov 2002
|8 May 2007
|Intel Corporation
|Using perfluoropoly-ethers to form pellicles
|Citing Patent
|Filing date
|Publication date
|31 Jan 2007
|26 Aug 2008
|International Business Machines Corporation
|Pellicle film optimized for immersion lithography systems with NA>1
|16 Aug 2005
|30 Jun 2009
|Ming-Lung Chiu
|Pellicle frame
|31 Dec 2008
|26 Feb 2013
|Alcatel Lucent
|Method for manufacturing photomasks and device for its implementation
|16 Aug 2005
|15 Jun 2006
|Gudeng Precision Industrial Co., Ltd.
|[pellicle frame]
|5 Mar 2010
|15 Sep 2010
|Shin-Etsu Chemical Co., Ltd.
|Process for Producing Pellicle
|U.S. Classification
|430/5, 428/14
|International Classification
|Cooperative Classification
|European Classification
|9 Jun 2005
Owner name: SEMATECH, INC., TEXAS
Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:ZIMMERMAN, PAUL A.;VAN PESKI, CHRIS K.;REEL/FRAME:016667/0440;SIGNING DATES FROM 20050603 TO 20050604
|22 Aug 2012
|Fee payment
Year of fee payment: 4


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Howdy everyone!
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The PoliceOne Personal Shields product category is a collection of information, product listings and resources for researching Personal Shields. It covers portable shields made from a variety of materials with different features for different tactical situations.


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This is the root of the common Lisp Directory. The whole tree of tags starts here.
If you are new to the Common Lisp Directory, you should probably first have a look at the "By topic" link below or at the "Tags" and "Index" links above.
The items lists (Libraries, documents, events, etc.) are limited to about 20 items randomly taken from the whole lists. Click on the titles or the "View all (n more)" links to see the full lists of items with their descriptions.
The CLD is written in Common Lisp.
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James E. Prewett | Jens Teich | David Lichteblau | Kevin Raison | Jason Lowdermilk | Edward M. Reingold | Jochen Schmidt | Luís Oliveira | Brad Beveridge | Alan Shields | Zachary Beane | Donald B. Percival | Gregor Kiczales | Marco Baringer | James Wright | Timothy Moore | Robert Read | Lester Vecsey | Sunil Mishra | Timofei Shatrov | Daniel Lowe | Rich Hickey | Will Fitzgerald | Dave Bakhash | Kilian Sprotte | Kenny Tilton | Jean-Philippe Paradis | Frank A. Adrian | Josh Gagnon | Juri Pakaste
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International Lisp Conference 2009 | European Common Lisp Meeting 2008 | International Lisp Conference 2007 | 3rd European Lisp Workshop | LispNYC May 2006 Meeting - Peter Seibel | European Common Lisp Meeting 2006 | LispNYC November 2005 meeting | 2nd European LISP and Scheme Workshop | International Lisp Conference 2005 | European Common Lisp Meeting 2005 | 1st European Lisp and Scheme Workshop | International Lisp Conference 2003 | Japan Lisp User Group Meeting 2000
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Clozure Associates | Cadence Design Systems GmbH | LiLA - LISP LAB AUSTRIA | Association of Lisp Users | Debian | The Tech Co-op | Core Group | Lispworks Ltd. | Gothenburg Lisp User Group | Albuquerque Lisp and Scheme Users | HyperMeta Inc. | LispNYC | The Common Lisp Gardeners | Franz Inc. | RavenPack | Ystok-Systema | Department of Computer Science and Engineering, FE... | bese | Ravenbrook | ITA Software
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YstokCard - smart card API (PC/SC)(Modified)| YstokGrid(Modified)| CL-Typesetting(Modified)| CL-PDF(Modified)| Jean-Philippe Paradis(Added)| Armed Bear Common Lisp(Annotated)| Allegro Common Lisp(Modified)| CLFSWM - A(nother) Common Lisp FullScreen Window M...(Modified)| Ystok-URI - library for representing, parsing, and...(Added)| Clon, the Command-Line Options Nuker(Modified)| Common Lisp Reasoner(Modified)| ASDlite(Modified)| Ystok-Library(Modified)| Ystok-Local-Time(Modified)| YHTML-Template(Modified)| cl-gdata(Added)| Michael Filonenko(Added)| cl-portaudio(Added)| YstokHTML - collection of HTML generator, parser a...(Added)| Common Lisp User Space File System(Added)| cl-btree(Added)
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You can comment and/or add notes to all the tags and items of the Common Lisp Directory.
Submitted by admin 3585 days 17 hours 26 min ago
Comments added to RSS feeds
Now the commented items are added to the RSS feeds so that it's possible to see what have been commented recently.
Submitted by marc.battyani 3525 days 21 hours 16 min ago
unicode possibilities
It would be nice if cl-user would display unicode input for CJK text. With PCL and On Lisp getting new printings in Japan, it might be beneficial to attract more brain-share from that side of the world. Would this be considered out of cl-user.net's scope?
Submitted by charliemac 2621 days 15 hours ago
Perhaps it would be interesting to open up a "universities" category (or subcategory of Organization) to list universities that teach lisp?
Submitted by informatimago 2614 days 6 hours 17 min ago
re: universities
This is a good idea. Done.
Submitted by marc.battyani 2611 days 10 hours 31 min ago
re: unicode possibilities
I have to think about it.
The use of English as the standard language is prefered so that the information is useable by most lispers.
I don't mind some other language content though.
Submitted by marc.battyani 2611 days 10 hours 3 min ago
Change descriptions may accept invalid characters
Attempting to view the "Last Modified Items" RSS feed in the Google Chrome browser gives the error: "error on line 10 at column 2048: PCDATA invalid Char value 12". Adding the feed in Mozilla Thunderbird: "<feed URL> is not a valid feed."
Submitted by WalterGR 1738 days 17 hours 2 min ago
Repository access
Many sites have a link to view the repository such as:
Source code repository http://common-lisp.net/cgi-bin/viewcvs.cgi/?cvsroot=cl-semantic
however, I can't find any place that describes how to convert that link into something that can be used to actually check out the source code. I'm very suppressed this hasn't been an issue before.
Submitted by blake1024 1373 days 5 hours 43 min ago


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I have a love-hate relationship with butternut squash. I love the way it tastes...sweet and smooth with just a hint of veggie flavor. I love it when it is mixed up with other things, like honey and herbs and shallots, especially when I get that whole sweet and salty thing going on. I love it when someone else makes it for me. Read More & Get the Recipe
Mashed Fall Vegetables with Bacon and Thyme
This is one of those recipes that just came out of the blue and kind of made itself, when I had set out to make something completely different. Or so I thought....(cue dramatic music, or just click here.) Anyway, what I thought I was making was roasted fall vegetables. I had me some nice cut up butternut squash, some red potatoes, a couple of onions and some carrots, and I was right in the middle of roasting them to go with some roasted chicken, and that's when it hit me. What if I took all those delicious tender roasted vegetables and mashed them all up together with a little chicken broth? What if I added just enough half and half to make them just the right amount of creamy? What if I mixed in a little but of chopped fresh thyme? What if I added...BACON? Sometimes it pays to just completely ignore whatever recipe you think you are making, and listen to your inner voice. Especially if that inner voice is saying the words "mashed" and "bacon" in the same Read More & Get the Recipe
Butternut Cider Bisque
Okay, so this is one of my blog posts that has a long involved back-story, and since there is nobody here to tell me to cut to the chase except for the dog (who can't talk) and the Southern husband (who is WAY too smart to say anything of this nature) I'm going to go ahead and tell it. Take comfort in the fact that it will be broken up with some entertaining pictures. At least I think they are entertaining. So to start at the beginning, a while back I was invited to take a series of pictures of chefs from restaurants in our area. For a food groupie like me, this was a fabulous assignment, and I met a bunch of terrifically talented people this way (and got to sample some rocking good food along the way.) Here's the first chef I photographed for this project: Chef Chris Calcagno. I know, it was a hard assignment, but someone had to do it. Anyway. Part of the assignment was to photograph each chef holding a copy of their favorite cookbook, which worked out to be double Read More & Get the Recipe
Roasted Vegetable Lasagne
I am always a little skeptical about whether lasagna is really, truly worth it. I mean, we've all had it one million times, and it's always kinda the same. But every once in a while I run across a recipe that restores my faith in lasagna, and this was one of them. Roasted vegetable lasagna that involves a sauce made of roasted tomatoes and a filling that includes roasted butternut squash and sauteed spinach. It all comes together for a beautiful layered look that melts the heart of even a lasagna-doubter like myself... I used lovely fresh mozzarella and ricotta and that helped (and in case you have not heard me go on and on about my adventures in ricotta-making, please click here. Or you can do what normal people do and get your fresh ricotta at Whole Foods.) So if you are looking for a delicious and different lasagna, this ones for you. It also uses those no-boil noodles that I never think are going to work but they always magically DO! It's one of the great mysteries in Read More & Get the Recipe
Butternut Chai Soup
I fell head over heels in love with chai tea several years ago when my friend S took me by the hand, led me into Starbucks, bought me a chai tea latte, put it in my hands and said, "Trust me." Ever since then I have been a complete sucker for anything with the word "chai" in the title. And so when I ran across this recipe for butternut soup cooked with chai spices...well, they had me at hello. When you think about it, it is kind of genius...butternut is a close cousin to pumpkin, chai spices include a lot of the sweet and spicy flavors you find in pumpkin pie...so it kind of was a match made in heaven. And to (literally) top it all off, the recipe also calls for a quick and wonderful topping that you make by stirring together a little creme fraiche, a little apple cider and a little cinnamon. Creme fraiche is usually in whatever part of your supermarket where they keep the refrigerated fancy things, but if you have trouble finding it, sour cream will work for this too. You drizzle Read More & Get the Recipe
Butternut Cheddar Soup
I do love a nice simple soup for supper, don't you? On a cold winter's night? When the wind is blowing outside, but you are safe and warm inside in your cozy little kitchen? I do, and this is a perfect one for that -- quick and easy and creamy and comforting. It is the perfect blend of butternut squash and sharp cheddar cheese, mmmmmmm. Some warm crusty bread, a glass of red wine...I don't think there's a fancy restaurant anywhere that can top this. So here's what you do. Get your hands on a nice piece of butternut squash. If you are really lucky, your supermarket will either have peeled butternut halves that you only have to cut up into chunks, or they will have already peeled and cut up butternut squash chunks. If they do, go for it. Yes, it is more expensive, but you only go around once and you might not want to spend your time cutting up rock hard butternut squash. Or maybe you do, in which case, go for it. Anyway, you simmer the squash chunks in some nice chicken broth until Read More & Get the Recipe


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Notebook: Zenon Konopka Makes his Return to Long Island in Sabres Loss
Christian Arnold, Islanders Point Blank:UNIONDALE, N.Y. – Zenon Konopka was a fan favorite during his time on Long Island and on Saturday night he skated in the barn he once called home when the Sabres lost to the Islanders Saturday night.
The 33-year-old agitator spent the 2010-11 season with the islanders. Konopka only recorded nine points that season, but won over the hearts and minds of the Islanders faithful with his steadfast dedication to the team.
"It was fantastic," Konopka said when asked about his time on Long Island. "It was so great the last couple of days just seeing so many friends and acquaintances over the last two days. Had some great food.
"Enjoyed my time here when I was here and enjoyed my last few days here."
Saturday's meeting was not Konopka's first meeting with his former team – he played against the Islanders during his tenure in Ottawa – but it was the first time he skated at the Coliseum since wearing Isles orange and blue.
After the Sabres morning skate, Konopka agreed it was a special feeling to be on Coliseum ice once again.
"I really enjoyed this arena and rink. Obviously it's not totally up to date, but I think there is a lot of character and a lot of history here that you have to respect. It really is pretty cool being back here," he said.
Konopka wasn't the only member of the Sabres organization making a return to Long Island either on Saturday. Former Isles bench boss Ted Nolan also went against the team he used to call his own.
"It's one of the places where I was very grateful for the opportunity I had here with the Islanders," Nolan said. "Especially at the time… To get a call from Charles [Wang] to come here to coach was certainly an honor. I'm always greatful."
Czuczman to Make NHL Debut 'Real Soon'
After signing with the Islanders on Tuesday college free agent Kevin Czuczman has yet to make his NHL debut, but it could be coming on the horizon.
The Islanders have held off on putting the rookie defenseman into the lineup so that he can get some extra time to practice and learn the team's system some more. Capuano hinted though before Saturday night's win victory over Buffalo that he will make his first appearance soon with the Isles.
"You'll see him shortly," Capuano said referring to Czuczman. "Obviously with back-to-back games, and only having one practice, we'll go through some video and get him in a few practices. We're excited to see him play."
Czuczman could make his Islander debut on Tuesday when the Minnesota Wild visit Nassau Coliseum