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The Hunting of the President: The Ten-Year Campaign to Destroy Bill and Hillary Clinton Hardcover – Mar 9 2000
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Unhappy reading for Republicans or political naïfs, The Hunting of the President is the story of a sustained and well-funded effort to discredit and defeat Bill Clinton, dating from his gubernatorial days in Arkansas and eventually leading to his impeachment trial. Award-winning journalists Joe Conason and Gene Lyons have crafted a tale as compulsively readable as a political thriller--paced, and at times worded, like a summer bestseller. Although they provide ample evidence of backstabbing, revenge, deceit, conniving, and "dirty tricks" in the struggle to oust Clinton, arguing that "the better the president and the country did, the more his adversaries appeared willing to endorse almost anything short of assassination to do him in," they also acknowledge that Clinton's reckless behavior, along with the "panicky, defensive, and occasionally less-than-perfectly-honest" responses of the White House press office, didn't hurt his opponents. Investigative journalism at its juiciest, The Hunting of the President is a surprising valediction to a far-from-angelic public leader who often outmaneuvered his enemies with otherworldly skill. --Regina Marler
From Publishers Weekly
Conason and Lyons (Fools for Scandal), veteran journalists respectively for the New York Observer and the Arkansas Democrat-Gazette, argue that if the opposition to the Clintons didn't quite constitute a "vast right-wing conspiracy," as the First Lady famously alleged, it was at the very least a "loose cabal" of "Clinton adversaries,... an angry gallery of defeated politicians,... right-wing pamphleteers, wealthy eccentrics, zany private detectives, religious fanatics and die-hard segregationists." They reveal how notable right-wingers like Richard Mellon Scaife (heir to the Carnegie Mellon fortune) and Jerry Falwell bankrolled the muckraking that led to scandals like Whitewater and Troopergate, neither of which, the authors claim, ever produced evidence of Clinton misconduct. Conason and Lyons also point out the ultraconservative credentials of Paula Jones's supporters, including Kenneth Starr, who privately abetted the harassment suit before he was appointed as a supposedly independent counsel. But what disturbs Conason and Lyons even more than the zeal of these conservative critics is the conduct of the national press. They make a case that their colleagues at the New York Times, Washington Post and elsewhere colluded with the most unsavory elements of the fringe right to bring unverified and frequently libelous allegations into the center of the mainstream media. The story of the Clinton scandals is a tortuous, labyrinthine puzzle, and Conason and Lyons do their best to simplify it. But their cast of characters is enormous, and their research overwhelming. Readers may not ultimately agree with the authors that the tactics of the Clinton enemies were worse than any mistake made by the president, but they will nevertheless gain a considerably more balanced and complex picture of the road to impeachment. 16 pages b&w photos. (Mar.)
Copyright 2000 Reed Business Information, Inc.
Customer Reviews
Top Customer Reviews
Conason and Lyons have given us one of the great works of modern investigative reporting, fully revealing all the major players who funded and/or assisted the campaign, including Richard Mellon Scaife, Reverend Moon, and the odious Ann Coulter, as well as a slew of corrupt politicians, state troopers, and women with shady pasts who, rather predictably, all ended up much richer for their time and efforts.
THE HUNTING OF THE PRESIDENT has recently been adapted into a much praised documentary film.Read more ›
For the record, I really don't care about how much he philandered.... that has never stopped any president before him from making progress, and it was no reason to stop him. I may not want to be married to the guy, but I still say that my paycheck went farther and my economy was better when he was in charge. If only George Dubya had such a libido, perhaps we would all be better off now.
The ultra-conservative right-wing machine ("The Arkansas Project") designed to bring Clinton to his knees gives new meaning to the term "axis of evil." To h*ll with Iraq, let's bomb the "Council of National Policy." Somebody PLEASE impeach Jerry Falwell, that lousy fat piece of hypocritical (...) matter (my opinion, which I am entitled to) who proclaims to be a "man of God."
Just read the book, if you haven't already. It's a fantastic journey that will make you rethink a lot of what you heard in the press during the past 14-15 years.
Conason and Lyons perform a devastating autopsy on the right's campaign to destroy Clinton before he even announced his candidacy for president in 1991, through both terms of his presidency. As someone who voted for Clinton twice (and would happily do so again), I knew Clinton had enemies, but I didn't know he had this many who were this menacing.
The authors lay out in stunning detail the lies and half truths that were willingly perpetrated by the mainstream media, discussing topics like the Foster suicide (many were convinced/hoping that it was a Clinton-sponsored murder), Troopergate, Filegate, Ken Starr and the wanton abuse of his Independent Council powers and much, much more. The above topics have been discussed ad nauseum in other books and articles, but the authors go further, detailing the many right-wing backed publications such as The American Spectator, the wealthy right wing tycoon Richard Mellon Scaife and his backing of the Arkansas Project, William Renquist and his role in Whitewater and the Starr appointment, and most importantly in this reader's eyes, how the first independent council, Robert Fiske, was ousted after he couldn't find any wrongdoing on the part of the Clintons. This paved the way for Starr's appointment, who would stop at nothing to get something on the Clintons.Read more ›
BUSH'S BRAIN, a documentary about evil Bush fetishist Karl Rove, had its world premiere in Austin the previous week at the same venue, Austin's beautifully restored 1930's era movie palace the Paramount Theater. As good as BRAIN was, THOTP was even better.
This film has everything I ask for when it comes to documentaries about Democrats vs Republicans: heroes (Susan McDougal; the serene Clintons; Conason, Lyons, Begala, and James Carville); villains (Ken Starr, Paula Jones, Jerry Falwell, and various amateur crooks, liars, bimbos, racists, political opportunists, media whores, religious nuts, and the mentally ill); and in-between (David Brock, who wears a white hat these days). The evil that men do to the Clintons lives after them; the bastard child of Paula Jones and Ken Starr currently resides in the White House where he passes his waking time ruining the economy, shredding the Bill of Rights, and cozying up to a dictator in Pakistan who is for God knows what reason not listed as a terrorist for setting up a nuclear Wal-Mart.
But I digress. Thomason has cleverly edited, mise-en-scene-like, into the talking-head segments footage from old films and newsreels that often hysterically complements what's being said. This is, so far as I know, unique to documentary filmmaking and WORKS here quite nicely.
Unless you were unborn, undead, or living in Mousehole, Texas, during the 1990's, you were glued to the TV, wondering how the HELL a freak like Paula Jones could possibly be taken seriously; how Ken Starr could deny without laughing that the OIC (i.e.Read more ›
Most recent customer reviews
Finally, the truth be told...the truth hurts the hateful right wing idiots. They would nevr want you to read this book, but do. Read morePublished on April 11 2004
The title should be the first clue. This is not an "objective" piece of "journalism".
Though that's what they want you to think. Read more
The conspiracy theory was just that. How gullible can one be?!
History will play this one out.
When Hillary Clinton revealed to the media her belief that there was a conspiracy to destroy her husband and topple him from the presidency there was collective laughter from so... Read morePublished on Dec 10 2003 by William Hare
I'm glad this book was written, because it shows that there are people in America who will protect us from liberal Democrat monosters such as Bill and Hilary who wanted nothing... Read morePublished on Nov. 22 2003 by Amazon Customer
'The Hunting of the President' is the candle that finally sheds light in the basement of White House machinations. Read morePublished on Oct. 30 2003 by Conan the Librarian
Thank you Mr. Conason and Mr. Lyons for writing this book. There is no way the people who gave this book one-star even bothered to pick it up, much less read it. Read morePublished on Oct. 25 2003 by M. Love
First, for the record, I'm not a real big Clinton fan. To me he sold out by outsmarting the Republicans with a fairly conservative agenda. Read morePublished on Sept. 29 2003 by Amazon Customer
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|Publication number
|Publication type
|Application number
|Publication date
|May 11, 2010
|Filing date
|Dec 1, 2008
|Priority date
|Apr 14, 2000
|Fee status
|Also published as
|Publication number
|Charles E. Wickersham, Jr., John E. Poole, Alexander Leybovich, Lin Zhu
|Original Assignee
|Tosoh Smd, Inc.
|Export Citation
|BiBTeX, EndNote, RefMan
|Patent Citations (42), Non-Patent Citations (34), Classifications (21), Legal Events (1)
|External Links: USPTO, USPTO Assignment, Espacenet
This application is a continuation of application Ser. No. 11/063,508 filed Feb. 23, 2005, now abandoned, that was, in turn, a divisional of application Ser. No. 10/018,406 filed Dec. 13, 2001, now abandoned, which was a U.S. National Phase filing under 35 USC §365(c) of International PCT Application No. PCT/US01/40473 filed Apr. 9, 2001, which claimed the benefit of prior U.S. Provisional Patent Application Ser. Nos. 60/197,790 filed Apr. 14, 2000; 60/215,037 filed Jun. 29, 2000; and 60/249,978, filed Nov. 20, 2000.
The invention relates to sputter targets and methods of manufacture thereof that result in reduced particulate emission during sputtering.
Macroparticles are generated during sputtering by the presence of dielectric inclusions in the metallic sputter target. Electrical charges build up on the dielectric particle and eventually electrical breakdown occurs. When this electrical breakdown occurs a high current density cathodic arc forms and melts a small section of the target. The arc pressure causes the liquid metal in the cathode to spurt out at high velocity and strike the intended substrate. The droplets solidify on the substrate creating a large defect in the metallization layer.
This problem has been frequently experienced in the sputtering of large flat panel displays that commonly operate at power densities of greater than 16 W/cm2. The appearance of macroparticles on these flat panel displays causes gaps or shorts in the metallization patterns required for addressing the various pixels in the display. Obviously, the gaps or shorts reduce the yield of acceptable display units.
Sputtered aluminum layers are often the initial conductive layer that is coated on the substrate. In addition to the desire in having low inclusion levels in the Al target, the targets must also provide good resistance to hillock formation. It is known that alloying additions of silicon and copper are effective at reducing hillock formation and that these alloying additions to aluminum do not significantly lower the electrical conductivity of the resulting sputtered Al films.
The invention centers around concurrent discoveries pertaining to (1) the size of macroparticles that are especially deleterious in high power sputtering operations such as those employed in flat panel display sputtering operations and (2) improvements in filtering deleterious inclusions from the molten Al during target formation by the addition of small amounts of Si to the alloying mix.
Initially, it was discovered that metallic sputtering target materials with inclusions below 500 μm in size would perform substantially free from macroparticle defect generation at sputtering power densities up to about 20 W/cm2. Further, sputter targets with inclusions below 400 μm in size were found to perform substantially free of macroparticle generation at sputtering densities of about 25-30 W/cm2. This is the sputtering power density range normally encountered in the sputtering of flat panel displays. At sputtering power densities of 40 W/cm2 or greater, dielectric inclusions should be less than 300 μm in size in order to inhibit macroparticle contamination of the deposited film.
Further, during the casting process in which the molten metal, preferably Al, is cast into a sputter target. It has been found that addition of a small amount of Si into the molten metal improves the filtering performance of the ceramic filter element used in the semi-continuous casting method to thereby help to separate the undesirable inclusions from the molten mass before it is solidified.
After the sputter target with reduced inclusions has been prepared, it is tested to ascertain the amount and size of inclusions contained therein. When the target is adapted to sputter coat flat panel displays and the like wherein sputtering power densities of greater than about 25 W/cm2 are commonly encountered, targets are rejected that contain measurable quantities of inclusions having sizes on the order of 400 μm and greater.
Two test methods are in common use today to detect size and quantity of defects in the metal. In the more prevalent ultrasonic method, the Al alloy ingot is immersed in a water tank while a 10 to 15 MHz ultrasonic transducer scans the part. The ultrasonic pulse is able to detect defects in the metal. An inclusion or void in the metal reflects the ultrasonic energy and is detected. Histograms, calibration charts and statistical calculations can be made using the reflected signals to determine the overall quality of the metal.
In the less common dissolution method, a small sample of the aluminum alloy is dissolved in acid and the acid solution is passed through a fine (typically 5 μm pore size) filter. The filter is then examined using optical and scanning electron microscopes to determine the number, composition and size distribution of inclusions in the metal sample.
The invention will be further described in the following detailed description which is to be read in conjunction with the appended drawings.
We have discovered that the cause of macroparticle generation during sputtering is the presence of relatively large dielectric inclusions in the metal sputtering target. Measurements of the relationship between inclusion size and macroparticle generation have shown that the generation of macroparticles depends upon the size of the inclusion. At a sputtering power of 25 W/cm2, inclusions with size greater than around 400 μm are required to produce arcs of sufficient intensity to generate macroparticles. Inclusions with surface areas below this value can generate arcs, but the intensity of the arcs is not sufficient to melt the aluminum target spot and provide a large enough pressure wave to eject molten metal macroparticle droplets. Above this threshold inclusion surface area, the arcs have sufficient energy to melt a small spot on the target and eject molten metal droplets from the target.
Accordingly, one way to reduce the number of macroparticles generated during aluminum target sputtering is to reduce the number of large dielectric inclusions contained in the metal target. In addition to low dielectric inclusion content, the target needs to provide an aluminum film on the substrate that has good electrical conductivity and good resistance to hillock formation. It is well known that alloying additions of silicon and copper are effective at reducing hillock formation and that these alloying additions to aluminum do not significantly lower the electrical conductivity of the sputtered aluminum films. However, it was not known until our work that the addition of silicon significantly reduces the dielectric inclusion density in aluminum alloys. This lower propensity to generate macroparticles is the result of alloying the aluminum target material with silicon. The silicon lowers the macroparticle generation by significantly improving the efficiency of aluminum filtering during sputtering target manufacture.
One aspect of the invention relates to aluminum alloy sputtering targets that contain a small amount of silicon so that the hillock formation is reduced in the film while the electrical conductivity of the film is not significantly reduced from that of pure aluminum. Additionally, the propensity for macroparticle generation during sputtering is greatly reduced.
Table 1 provides detailed inclusion measurements for various Al—Si—Cu alloys. It is clear from the data in Table 1 and
Inclusion Count
Inclusion Count
(wt %)
Table 1. Inclusion counts in aluminum alloy sputtering targets.
The mechanism by which silicon reduces the dielectric inclusion level in the target is thought to be by significantly improving the effectiveness of the ceramic filter in removing dielectric inclusions from the melt during casting.
Since alloying additions usually reduce the electrical conductivity of metals, it is important to use as little alloying addition as is required to achieve desired characteristic. Consequently, the preferred alloy for this invention is Al-0.5Si-0.5Cu. The copper addition is useful for reducing hillock formation in the deposited film, while the silicon addition is useful for reducing dielectric inclusions in the aluminum alloy target. Copper may be added to the alloy in an amount of about 0.01-3.00 wt %.
In accordance with the process used in the invention to inhibit the amount of undesirable inclusion in sputter targets, high purity metal, such as aluminum or aluminum alloy is first melted. From about 0.01 to 2.00 wt % of Si is added to the melt.
Although applicants are not to be bound to any particular theory of operation, it is thought that addition of a small amount of Si into the melt decreases the surface tension of the melt so that the metal, such as Al, will wet the filter better. This, in turn, enhances the efficiency of the filter used in the casting system so that the inclusions better adhere to the filter during processing.
Turning now to
The metal, any alloying element, and Si are admitted to the induction melting furnace 101. The components are melted and degassed in injecting a sparging mixture of high purity argon and trace chlorine. The gas is injected thru a spinning nozzle 102 to shear the bas bubbles to very small size to provide greater surface area contact; thereby increasing the efficiency of the gas.
Degassing is performed for a period of time prior to casting. The dross is skimmed from the top and then the degassing is continued during the casting process. The degassing treatment helps to clean the metal of both dissolved gasses and suspended impurities. It also reduces unwanted alkali elements and Mg.
To initiate the cast, the induction furnace is pressurized using the sparging gas described above, with some additional argon. While closely monitoring metal and system temperatures, the metal is forced out of the furnace via a graphite pipe 103. This is a unique aspect of the invention in that it protects the metal from air contact and turbulence until it reaches the filter box.
The melt is then delivered to a preheated filter box 104 containing a sintered ceramic filter medium 175. Preferably, the filter is a sintered alumina filter of the type available from Mettaullics System Co., L.P., Solon, Ohio. The particular filter element presently preferred is an 8-grit porosity which equates to about 40-50 ppi (pores per linear inch).
Although the sintered alumina is presently preferred when Al metals and alloys are filtered, other ceramics such as Si, C, Ti, B2, B4, C, SI3, N4, SiAlON and zirconia can also be mentioned as exemplary filter components. Filters of the type that may be employed are described in U.S. Pat. No. 5,369,063, (Gee et al.), the disclosure of which is incorporated by reference therein.
Passage of the Si containing melt through the filter element removes a significant number of the inclusions that were not removed in the degassing process. After passing through the filter element, the metal is fed to a distribution trough 105 which evenly distributes and feeds metal to each of the water cooled ingot casting molds 107, 108. During feeding into the molds through the insulated hot top, the metal is vibrated (stirred) via low frequency inductive stirring coils 116, 118 to enhance the grain structure of the ingots.
The molten metal is fed and solidified at a controlled casting rate via contact with the water cooled molds (primary cooling) from which emerge the high quality solidified ingots 190, 192. The casting speed is controlled using computer-controlled hydraulic casting equipment 180. The ingot structure and surface quality are enhanced by advanced secondary cooling provided by the mold cooling water exiting the water-cooled mold and coming into direct contact with the solidified ingot as it emerges from the mold (the vertical direct chill casting process).
In the case of casting of Al and Al alloy, such as Al 0.5% Cu ingots, the ingot is saw cut into the desired target blank size. Then it is pressed and rolled. The blank is then machined, bonding of the target to an Al 6061 backing plate may preferably be conducted as reported in patent applications WO 00/15863 and PCT/US00/18968 filed Jul. 12, 2000. The bonded target/backing plate assembly is then ready for usage in conventional cathodic sputter coating operations preferably those adapted for sputter coating of flat panel displays.
The sputter targets made in accordance with the above process have exhibited reduction in macroparticle generation particularly in high power systems such as those sputter systems employed to coat thin layers on flat panel displays. Such systems commonly operate at high power densities of about 25 W/cm2 and greater and, in the past have been plagued by poor sputtering uniformity due to macroparticle generation during sputtering.
For example, Al and Al targets made by the above process and containing reduced inclusion levels can be used in sputtering processes to form an Al layer in flat panels of the type described in U.S. Pat. No. 6,019,657. As is typical in such structures, the sputter coated Al layer is then coated with a cladding layer such as would be formed with Mo, W, Ti, Nb, Ni, Cr, metal silicide etc. The flat panel displays are used in liquid crystal, electro-luminescent, gas plasma and vacuum fluorescent displays.
The Al targets are sputtered using conventionally available sputtering equipment of the type functioning to coat large flat panel displays. In such systems, the target is attached to the cathode and a power density of at least 25 W/cm2 is imparted to the system, resulting in ionic bombardment of the target from the charged plasma cloud in the apparatus above the target. The ionic bombardment of the target dislodges the desired coating material from the target surface and this material is deposited on the flat panel positioned proximate the anode.
In order to test the targets manufactured by the above process to ensure that inclusion content is reduced, an ultrasonic scanning method is preferably used. Equipment and methods necessary to scan for target inclusions can be seen in U.S. Pat. No. 5,406,850 of common assignment herewith. This disclosure is incorporated by reference herein.
In accordance with the test, target inclusions seen by the scanning process are compared against calibration values. If inclusions are too large, the target is rejected. Scanning can be conducted in both the "race track" and remaining portion of the sputter surface. It is presently preferred to reject targets wherein inclusions of greater than 400 μm are noticed in the "race track." Inclusions of less than 800 μm may be tolerated in the remaining non-race track areas.
Another non-destructive method for characterizing a sputter target material and comprises the steps of sequentially irradiating a test sample of the sputter target material with sonic energy at a plurality irradiating on a surface of the sample; detecting echoes induced by the sonic energy; discriminating texture-related back scattering noise from the echoes to obtain non-rectified radio frequency echo waveform signals; monitoring non-rectified echo waveform signals for the 180° waveform phase inversion, comparing the non-rectified echo waveform signals with said at least one of each: phase inverting and phase non-inverting calibration values, to detect void-like and particle-like flaw data points separately and no-flaw data points; counting the flaw data points for the each flaw type separately as well as all together to determine a total flaw count CFT (without phase inversion), counting the flaw data points and the no-flaw data points to determine a total number of data points CDP; and calculating a total cleanliness factor FCT=(CFT/CDP)×106 as well as cleanliness factors FCI=(CFI/CDP)×106 and FC=(CFN/CDP)×106 for each sort of flaws separately. Cleanliness factor CFI represents phase inverted flaws such as voids contained in the metal. CFN represents non-phase inverted flaws such as inclusions in the metal.
Unlike many prior art methods, this test method provides a characterization of the sputter target material by separate identification of and counting of void-like and particle-like (i.e., inclusion) flaws. A partition of cleanliness factor for components associated with different kinds of flaws defines the rejection criteria more precisely by identifying and sizing the flaws of different kind.
Although the cleanliness factor provides a useful characterization of the sputter target material, quality control information can also be provided by means of a histogram. More specifically, the sputter target may be characterized by defining a plurality of amplitude bands for each type (waveform inverting and non-inverting) of flaws; measuring said modified amplitude signals to determine modified amplitude signal magnitudes; comparing said modified amplitude signal magnitudes with said plurality of amplitude bands to form subsets of said modified amplitude signals; counting said subsets of modified amplitude signals to determine a plurality of modified amplitude signal counts, each modified amplitude signal count of said plurality of amplitude signal counts corresponding to one of said amplitude bands of said plurality of amplitude bands; and constructing a pareto histogram, combining individual histograms for both flaw classes, relating said modified signals counts to said plurality of amplitude bands.
These methods for characterizing sputter target materials may be used in processes for manufacturing sputter targets. The cleanliness of a sputter target and particularly cleanliness from non-phase inverting flaws is the primary factor determining the quality of layers or films produced by the target. By shaping only those sputter target blanks having cleanliness factors or histograms meeting certain reference criteria to form sputter targets, and rejecting blanks not meeting those criteria, one improves the likelihood that the sputter targets so manufactured will produce high quality layers or films.
More specifically, the sample first is compressed along a dimension to form the disc-shaped test sample 52. Preferable, the sample is compressed by forging or rolling, followed by diamond cutting to prepare the planar surfaces 54 and 56. The reduction in the dimension may be anywhere between 0% to 100%. The compression of the sample flattens and widens certain flaws. The target comprises both void-like defects 91 and inclusions or undesirable particles 93.
As illustrated in
The transducer 60 is sold by ULTRAN USA under the designation WS50-10P4.5. This is a long focal length piezoelectric transducer having a fixed focal length of 114 mm (in water). At a peak frequency of approximately 9.15 MHz with 8 MHz (−6 dB) bandwidth, the transducer produces a pulse 62 having a focal zone (−6 dB) of approximately 21 mm in aluminum and a focal spot 0.8-0.9 mm in diameter.
Most preferably, the upper surface 54 of the sample 52 has a width or diameter on the order of approximately 28 cm. Data acquisition steps of approximately 0.9 mm in both the "x"-direction and the "y"-directions permit the detection of 0.25 mm flat bottom holes at a detection level of −6 dB without exposure area overlap. One thereby irradiates approximately 100,000 test points on the upper surface 54.
Most preferably, the transducer 60 is oriented so that the pulse 62 propagates through the deionized water (not shown) in the immersion tank 80 and strikes the test sample 52 approximately normally to the upper surface 54. Furthermore, the transducer 60 is preferably spaced from the upper surface 54 such that the pulse 62 is focused on a zone 86 (
An especially preferred echo acquisition system includes a low noise receiver comprising a low noise gated preamplifier 90; a low noise linear amplifier 92 with a set of calibrated attenuators, a 12-bit (2.44 mV/bit) analog-to-digital converter 94 and digital oscilloscope 95 connected with receiver analog output. When sufficient time has elapsed for the echoes to arrive at the transducer 60, the controller 84 switches the transducer 60 from a transmitting mode to a gated electronic receiving mode. The echoes 64 are received by the transducer 60 and converted into an RF electric signal (not shown). The RF signal is amplified by the preamplifier 90 and by the low noise amplifier 92 to produce modified amplitude signal and displayed on the screen of oscilloscope 95 to extract waveform phase information. The modified amplitude signal then is digitized by the analog-to-digital converter 94 before moving on to the controller 84. The analog-to-digital conversion is performed so as to preserve amplitude information from the analog modified amplitude signal.
Flaws of given nature (void-like or alumina inclusions) are determined by monitoring for waveform phase inversion using digital oscilloscope 95. Flaws of given sizes are detected by comparing the digitized modified amplitude signals obtained from the sample 52 with reference values derived from tests conducted on reference samples (not shown) having composition similar to that of the test sample 10 and either blind, flat-bottomed hole of fixed depth and diameter or alumina particles of given size artificially imbedded into reference sample material.
The especially-preferred PC controller 84 controls the data acquisition process. An especially-preferred software package used in connection with the data acquisition system is available from Structural Diagnostics, Inc. under the designation SDI-5311 Winscan.
The PC controller 84 is also programmed to calculate the total cleanliness factor and the cleanliness factors for the sorted flaws characterizing the material of the sample 52. More precisely, it is programmed to discriminate texture-related back scattering noise and to distinguish "void-like flaw data points from the alumina particle-like flaw data points". The PC controller 84 maintains a count of the flaw data points detected during the testing of a test sample 52 to determine a flaw count "CFT", "CFI", "CFN".
The PC controller 84 also is programmed to distinguish "no-flaw data points," that is, digitized modified amplitude signals representing amplitudes which, after comparison with the calibration values, indicate the absence of flaws.
The PC controller also determines a total number of data points "CDP," that is, the sum of the flaw count CFT and the number of no-flaw data points. Although the total number of data points could be determined by maintaining counts of the flaw data points and the no-flaw data points, it is preferably determined by counting the total number of positions "CI" along the upper surface 54 at which the test sample 52 is irradiated by the transducer 60 and subtracting the number of digitized RF signals "CN" which the data acquisition circuitry was unable, due to noise or other causes, to identify as either flaw data points or no-flaw data points. (Alternatively, the "noise count" CN may be described as the number of positions along the upper surface 54 at which neither a flaw data point nor a no-flaw data point is detected).
Having determined the flaw counts CFT, CFI, CFN, and the total number of data points CDP, the PC controller is programmed to calculate the cleanliness factor FCT=(CFT/CDP)×106, FCI=(CFI/CDP)×106, FCN=(CFN/CDP)×106 to characterize the material comprising the sample 52. Unlike the prior art "flaws per cubic centimeter," the magnitude of the cleanliness factor is not dependent on any estimate of pulse cross-sectional area. Since the cleanliness factor is normalized by the dimensionless coefficient CDP×10−6 rather than by volume, it is more closely related to ppm and ppb units than are units of "flaws per cubic centimeter."
The preparation of a suitable program for determining the cleanliness factor in accordance with the invention as disclosed herein is within the ordinary skill in the art and requires no undue experimentation.
Another way in which to characterize the material comprising the sample 52 is by determining the size distribution of flaws in the test sample 52. More specifically, one may characterize the cleanliness of the sample 52 by defining amplitude bands or ranges; comparing the amplitudes represented by the digitized modified amplitude signal for certain types of flaws (phase inverting and phase non-inverting) with the amplitude bands to form subsets of the modified amplitude signals; counting these subsets of modified amplitude band and for each type of flaws; and constructing a pareto histogram relating the modified signal counts to said plurality of amplitude bands. Since the amplitudes represented by the digitized modified amplitude signals for each type of flaws are related to the sizes of flaws detected in the sample 52, the histogram provides and indication of the flaw size distribution in the sample 52.
The preparation of a suitable program for plotting histograms herein is within the ordinary skill in the art and requires no undue experimentation.
Either the cleanliness factor or histograms may be used as a product quality test. As noted earlier, the cleanliness of a sputter target is one factor determining the quality of the layers or films produced by the target. By shaping only those sputter target blanks having cleanliness factors and particularly CFN less than reference cleanliness factors, or having histograms with selected columns or areas less than reference values, to form sputter targets, and rejecting blanks not meeting those criteria, one improves the likelihood that the sputter targets so manufactured will produce high quality layers or films.
While the form of apparatus herein described constitutes a preferred embodiment of this invention, it is to be understood that the invention is not limited to this precise form of apparatus, and that changes may be made therein without departing from the scope of the invention which is defined in the appended claims.
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|U.S. Classification
|164/134, 164/55.1, 164/358
|International Classification
|Cooperative Classification
|European Classification


text:
These people massively regret the tweets they sent about Leicester in 2015
Well this is awkward.
Well this is awkward.
"We'll send a technician over to fix your cable sometime between May 5 and Nov. 6, can you be home?"
You can't outsmart the Internet.
Twitter Moments, which launched in Australia Wednesday, is not intended for the avid user who refreshes their feed multiple times a day.
Twitter, stop trying to make Twitter Moments happen. It's not going to happen.
Twitter Project Lightning is here. It's called Moments and could change the way the world looks at Twitter. Read our walk-through to understand why.


text:
Have you ever heard about brick or filo pastry?
North African people use it to cook their bricks, Indian people use it to cook their samosas, and I use it to cook my goat cheese Napoleon!
Filo pastry is a wonderful and helpful sheet which gives much character to a meal. Once fried or baked, it's deliciously crispy and it's fun to let guests discover which filling is hidden inside!
Be sure you'll astound any of your guests each time you wrap a mixture in filo pastry.
Goat cheese Napoleon recipe is a mix of Italian, North African and French cultures.
It particularly smells Mediterranean area.
Goat cheese Napoleon can be served whether as a starter or as an appetizer.
It's nicely colored and shaped, and tastes exceptional. Though, it's an easy recipe and it's done in no time.
Be sure to astound any people who share your meal: goat cheese Napoleon tastes and looks like a gourmet elegant starter or appetizer. A crispy filo pastry outside enclosing a smooth and melty cheesy inside.
Well, it's the perfect textures and flavors combo!
It's true goat cheese is much eaten in South of France. People eat goat cheese in every way imaginable by us:
Simply with a slice of baguette as cheese, or as a cooking recipe ingredient such as for or lasagna.
We also often use it with tomato sauce to garnish pizzas or we use goat cheese to give our Mediterranean mixed salads great flavors combo.
There are some delicious combinations as goat cheese with honey, goat cheese with pine nuts or walnuts, and one of my favorites is simply goat cheese with fresh rosemary and olive oil.
Another of my favorites is goat cheese with basil pesto and pureed dried tomatoes in oil. It's the combination I use to cook goat cheese Napoleon.
Why is goat cheese Napoleon recipe magic?
It simply consists in a combination of different tastes and textures:
lays of bread, goat cheese, basil pesto and purred dried tomatoes in olive oil. Next, these lays are wrapped in fill pastry and last, goat cheese Napoleon is fried.
Ingredients 4 servings (12 small goat cheese Napoleon)
- 4 Loaf slices
- 60 gr Pureed dried tomatoes in oil
- 40 gr Basil pesto
- 200 gr Goat cheese
- 6 Filo pastry sheets
- 6 cl Olive oil
- 1 Egg
- Optional: Green salad and balsamic salad dressing
- Cut filo pastry in 2, lay each filo pastry on table work. Cut each loaf slice in 4 and place each in the center of each filo pastry.
- Spread 1 tea spoonful pureed dried tomatoes on each small loaf slice.
- Top with 20/25 gr goat cheese. Then top with 1 tea spoon basil pesto.
- You can now wrap it whether as a small package…
- …or purse shaped. Gather up edges and pinch.
- Pour olive oil in a skillet and preheat over low heat.
- Break the egg in a small bowl, add a pinch salt. Mix and brush goat cheese Napoleons on all sides with egg wash and fry in skillet immediately. You have to be quick or filo pastry will stick to the dish!
- Fry on each side until goat cheese Napoleons are lightly browned and crispy (about 5 minutes).
- Arrange Napoleons on a bed of green salad seasoned with olive oil and balsamic vinegar and serve immediately.


text:
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text:
Idiots walking on Old Owingsville Road
Posted in the Hope Forum
United States
#1 Jan 28, 2013
Note to those who walk on Old Owingsville Road: I know you can see my car, but I can't see you walking in the road at night. Do you see a sidewalk on that road? No? Well that means it is NOT for pedestrians.
Since: Jan 13
#2 Jan 29, 2013
Whether on the street or sidewalk, pedestrians have the rightaway! As a driver you always expect the unexpected! Even though you would like to think so, you dont own the road!!!!
#3 Jan 29, 2013
Get your facts straight skully74 you are totally wrong.
#4 Feb 4, 2013
Pedestrians do have the right-of-way. Let's say you are driving on Old Owingsville Road and you hit and kill a pedestrian. You, my dear, may be charged with a crime, not the pedestrian. You may not be charged with murder, but possibly involuntary manslaughter. It depends on the circumstances. Doc, do you think that if you are driving on the interstate and someone runs into the road that you have no legal, ethical or moral responsibility to stop? You could never live in any major city, like NYC,(There are more pedestrians in NYC than vehicles!)You would be angry all the time.
#5 Feb 4, 2013
If you're driving down Old Owingsville Rd, and someone steps out in front of you. They are dead, and you are in absolutely NO trouble!
#6 Feb 5, 2013
Have you noticed? Most of those idiots wear dark colors. Yep Road Kill in the making. Weed out the dumbasses from the gene pool
Since: Dec 09
Falls of Rough, Kentucky
#7 Feb 5, 2013
Their just walking to work, I know several that used to walk to work at Nestle.
#8 Feb 5, 2013
I am ok with that. But hey bright hoodies are cheep.
#9 Feb 7, 2013
get used to it"doc" gas prices are too high so why not walk to save gas not to mention its better for the environment
#10 Feb 7, 2013
maybe you ought to stop and give some of these people a ride to work. atleast they're trying to get to work. maybe they cant afford a car right now or maybe they're just walking to the store or a friend/family members house that close by,obviously, so get over. are you too good to walk or are you so stuck up or embarassed to walk. whats wrong with walking somewhere... its good exercise, saves gas, and some people would rather just walk somewhere close by just to get out of the house and if your worried about people walking now just wait till summer when there will be a lot more people walking..get over youself
Since: Dec 09
Falls of Rough, Kentucky
#11 Feb 8, 2013
Need to slow down in that area anyway, many of the one walking on the side of the road are children or young teens. Don't tell me you didn't walk when you were younger or ride a bike and the do that to.
#12 Feb 9, 2013
i had a brother killed because some dumb-asses cant drive with sense.not evry one is in the position to drive where they need to go-give the pedestrians their space-i may just walk up and down old owingsville road myself with a fist full of broken sparks plug pieces just to teach u big mouths a lesson in yeilding-ever see what that does to glass? ask around
Since: Dec 09
Falls of Rough, Kentucky
#13 Feb 10, 2013
Some do drive like they are on the interstate, I have seen cars come through that area going 60 plus. What are they in that much of a hurry for anyway, I think that whole strip down that way is 35 you never see them going the speed limit. If you late for work everyday you need to start earlier, or get out of bed earlier.
#14 Feb 10, 2013
They do wear dark clothes. If your going to walk dress in lite colored clothes.
#15 Feb 11, 2013
It's a roadway not a walkway,you walk it at your own risk.And i agree some people do drive way to fast on that road.
Since: Dec 09
Falls of Rough, Kentucky
#16 Feb 11, 2013
Under the law the pedestrians have the right of way, It is not at your own risk. If someone happens to hit one of the pedestrians they will find that out the hard way. Kind of funny but a Amish horse and buggy has the right of way also under the law, many people are getting pissed about that to.
#17 Feb 12, 2013
The law says a pedestrian must walk on the shoulder of the road if there is no walkway,and allways walk towards oncoming traffic.It all so says you must where bright colored clothing,the only thing it says for the driver to do is honk the horn when coming upon a pedestrian.Under no ky state law could i find that the pedestrian has the complete right away other than marked walkways.So this is the way i see it by ky law,if two cars are going to pass each other on opposite lanes and there going the speed limit and there is someone walking out in the road,they will be 100% liable.It's a two way thing here people,but the pedestrian has the most laws to abide by and the most to loose.So be careful on both party's sake.
Since: Dec 09
Falls of Rough, Kentucky
#18 Feb 12, 2013
Here's what a law office has to say about the subject.
What protection does the law offer pedestrians against motor vehicles?
Pedestrians have the right of way, but that does not mean they do not need to exercise caution when on mixed-use roadways. Drivers bear the majority of responsibility for using caution because they are capable of inflicting serious injury or even death, but pedestrians need to remain aware of their surroundings and use streets in a respectful manner.
What if I was hit by a car while I wasnt in or near a crosswalk?
State law requires that vehicles yield to pedestrians crossing at intersections whether or not a crosswalk is present. Drivers are required to remain stopped until the pedestrian is safely on the other side of the road. However, if you are crossing illegally, against a red light, or outside of an intersection, you may be considered at least partially responsible for a pedestrian accident.
This will not necessarily make you ineligible to file a pedestrian accident lawsuit, but may have an impact on the amount of damages you are awarded.
What damages can be sought in a pedestrian accident lawsuit?
If you are hit by a car while on foot, you may be eligible to receive compensation for present and future medical bills associated with the accident, loss of earning capacity including present and future wages, pain, suffering, and loss of quality of life. Only an experienced pedestrian accident attorney can help you get the full amount you are due.
As you can see this is a serous matter, you need to think about what you are doing, wither a pedestrian or driver of a vehicle. The lawyers make good money on this type of thing against the drivers.
Since: Dec 09
Falls of Rough, Kentucky
#19 Feb 12, 2013
The web site talks about kids and such as pedestrians also.
#20 Feb 13, 2013
Yeah I see Thomas running down old owingsville road all the time. Must be running from Debra Alfrey chasing his ass out of all them women's beds he is in. Can't say I blame the man!
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My name is Jack, I work in the Participation department for England Hockey. Joy Elliott-Bowman of the Middlesex ...
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|At the recent Selection + Coaching Committee Meeting a full review of the current panel list was undertaken. As a result the following members have been promoted.
Graeme Hope
Peter Hodgson
Richard Gibson-Brown
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