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Municipal incivility: River Forest board meetings get heated, b...
There are 62 comments on the Chicago Tribune story from Apr 5, 2009, titled Municipal incivility: River Forest board meetings get heated, b.... In it, Chicago Tribune reports that:Chicago aldermen have leaped on desks and warily eyed each other for hidden recording devices, but these days the center of raw, WWE-worthy municipal incivility is River Forest , a well-heeled western suburb of broad lawns and acid tongues.
Join the discussion below, or Read more at Chicago Tribune.
#1 Apr 5, 2009
River Forest has changed. A lot of smart and rich Oak Parkers have moved into River Forest. The old RF is soon to be gone. I can see why Paris is stepping down. He has been messy that town up for years. I liked it better when Accardo ran things.
United States
#3 Apr 6, 2009
"Depending on the spin, the measure was either a bid to shine light on the clubby atmosphere of the village's ruling elite or a cynical pre-election publicity grab by a candidate vying to succeed Paris, who after four terms is stepping down."
As a RF resident and long time supporter of Mr. Paris I see it as the latter,i.e., "a cynical pre-election publicity grab by a candidate vying to succeed Paris." The first I ever heard of this guy Hoke was his obstructionist antics over the last two years. I urge all River Forest voters to go with the Rigas ticket. And by the way, who leaked this story and audio to the Tribune on the day before the election. Wake up Tribune, you're being used by a phony politician and yes, a NITWIT!
#4 Apr 6, 2009
Park Ridge has the same problem. Not as "thuggish" but certainly as inside-man driven. The mayor loves to be in the spotight, putting himself there at any chance he gets. And his mostly hand-picked alderman are basically shills for whatever his honor wants done. We'll see if people in these nice Chicago suburbs wake up and vote or if they are stupid enough to let power brokers in River Forest and Park Ridge simply lubricate their own egos with their elected public trust.
#5 Apr 6, 2009
The late Paul Harvey, a resident of River Forest, would have some great words for these well-heeled crooks.
Rich, poor, liberal, conservative, it doesn't matter. Cook County is a thugocracy, through and through.
#6 Apr 6, 2009
On a lighter note, Frank Paris bears an uncanny resmblance to Bella Lugosi! Photos of him seem to be rare but I saw a headshot of him in the late '90s in a community newspaper and was amazed at the similarity.
#7 Apr 6, 2009
Who can forget Frank's comment about sodomizing his parrot? You couldn't make this stuff up if you tried.
We're gonna miss this guy!
#8 Apr 6, 2009
Like everywere else, the Orcs and Trolls are taking charge. A few more breeding cycles and the homo sapiens will be extinct.
#9 Apr 6, 2009
Give them guns before the meeting. Lets see some real solutions to this problem.
#10 Apr 6, 2009
How old are they? Get rid of the little babies and replace them with adults who can actually do something without acting like spoiled litttle 6-graders.
United States
#11 Apr 6, 2009
#12 Apr 6, 2009
The people on those recordings and holding these meetings should be ultra-embarrassed, as well as, a few other things.
#13 Apr 6, 2009
Go get em Steve!
#14 Apr 6, 2009
Sounds like some of the message boards.
#15 Apr 6, 2009
The Trib has been waging war on political corruption for weeks. Why, then, did The Trib wait until the day before the election to point out the connection between Cathy Adduci and Al Ronan (who has been called "the poster boy for ethically challenged government in Illinois" by the Champaign Urbana News Gazette)? And why didn't the article ask why two Springfield legislators (Saviano and Harmon) have seen fit to endorse Adduci? I wish voters could have understood her connections long before the election and I hope they don't become more apparent afterwards.
United States
#16 Apr 6, 2009
Local politics at its best. As a rule of thumb, if someone has been on the job as long as Paris has you have to figure he's milking the system for his own benefit, either by way of money or political support. We have wide-open elections in Des Plaines tomorrow due to some fantastic term limits, which forces even the best of them to find something else to do every few years.
Either way, it's clear River Forest has a huge lack of leadership on both sides of the story.
#17 Apr 6, 2009
Pat O'Brien is a saint for putting up with these fools. Vote Rigas!!!
#18 Apr 6, 2009
Speaking as a former resident (born and raised) of the Oak Park-River Forest area, adults acting like adults simply isn't possible. The entire area has a terrible problem with alcohol. High school antics reign in this area.
Let OPRF deal with this mess. Don't try to make sense of it, just be glad your municipality isn't run by want to be mobsters and alcoholics (wait, maybe some of you do deal with this...)
#19 Apr 6, 2009
I have lived in RF for nine years and other then the people who live right next door to me I stay away from all the rest. My neighbor keeps telling me I should go to the meetings, and based on the Audio, why! would I want to do that. I will not be voting for any of these folks.
#20 Apr 6, 2009
I had the pleasure of being a trustee from 1995-1999. Mr. Paris was the president during that time. It was Mr. Paris, the trustees, and then village administrator Chuck Biondo who accomplished many things:paramedic service, River Forest Town Center, a new village hall, substantial contributions to school districts 90 and 200 via the TIF, plus we did not have deficit spending. It was village staff under Chuck Biondo who made our village an excellent place to live and for the kids to play. We had excellent contractors who collected our trash, revitalized our streets and alleys under contracts diligently drawn by our department heads. Our relationships with other boards in the village and Oak Park,Forest Park,Elmwood Park and Maywood were positive. There were no back door deals then nor am I aware that there were any ever while Mr. Paris was president and trustee. It was Mr. Paris who had the time,energy and connections to get things done always with the best intentions for River Forest in mind. Sure he had connections as any successful banker or businessman has. It is my personal belief that Mr. Paris did love our community yet due to two or three mal contents on the board his fervor has been soured. Now there are 3 well qualified canidates running for trustee Aducci,Gibbs and Winikates, and for president John Rigas. I was a trustee when John Rigas was on the board and from my experience know that John is ethical,thoughtful and will move the board agenda in the direction it needs to go.I know Mr. Gibbs who has the energy and enthusiasm to work to the best of his ability to research the task at hand. I don't personally know Miss Aducci but in hearing her speak at the canidates forum found her to be more than qualified to serve as a trustee. Mr. Winikates is needed on the board since his accounting background is crucial. Now the opposition to these fine people are using terms like clones and transparency which are phony characterisations at best. Transparency to me means to see thru. Let's see now the discussions are in public, the meetings are open to the public and the minutes are available to the public. There are closed door sessions during the board meetings because the board goes into executive session to discuss a myriad of private matters which cannot, by law, be discussed in public. The only way to make the meetings more transparent would be to telecast the meetings into the homes and you know what-It better be done at night so the viewer can quickly fall asleep. The word clone is comical when applied to these canidates. They are all successful and one does not become a clone by being a "yes" or "whatever you say sir" person. I won't take your time to rip into a trustee who has a personal vendetta due to his actions when he was a former park district president nor of the former firmeman who is seeking a second term. I hope that trustee Hoke stays on the board for 2 more years so that he can use his intelligence in a positive manner and learns to be civil to his fellow trustees and president. If this is the second comment you read from me it is because I didn't think the Tribune received my first one composed earlier today.
#21 Apr 6, 2009
The guy commenting above me is one of the worst people in the world. Seriously.
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Topeka's USD 501 school board talked budgets at a noon meeting Tuesday.
The board says it ended the current fiscal year with two and a half percent in contingency funds, but that would only run the district a few days.
They're waiting to hear if any new cuts come in light of the state's new revenue numbers.
The board also honored board member Betty Horton for her service on the board.
Horton lost her re-election bid but says she'll continue to be involved in the schools.
Hal Gardner will take Horton's place on the board.


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Gulf Shores Travel Guide: 104 reviews and 266 photos
In the winter of 2005-2006, we took a cruise from Baltimore to Florida and then crossed Florida to Texas staying a week at a time in Space-Available Condos. One of the places we stopped was Gulf Shores. From there we did excursions to Pensacola, Dauphin Island, and Bellingrath Gardens.
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Chembio Diagnostics Inc (CEMI US) was rated new "Speculative Buy" at Benchmark by equity analyst Raymond Myers. The 12-month target price is $1.75 per share.
Ray Myers' # is 267-513-1752 (that's philly) and firstname.lastname@example.com He'll probably e-mail it to you.
Looks like the report came out a month ago on April 24th. Here is a link that references the coveragehttp://www.streetinsider.com/New+Coverage/Benchmark+Starts+Chembio+Diagnostics+%28CEMI%29+at+Speculative+Buy%3B+Potential+Over-the-Counter+HIV+Resting+Market/7366424.html
Sorry, no link I just have a copy of the report. Also have the latest Zacks report, very positive
He was on the call. I mentioned him on this board right after I heard his questions. He is REAL. Was at Emerging Growth Equities outside of Philly. Well thought of. Institutionally oriented as opposed to retail.This is the beginning.
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Building 25
They exceeded their goal, and it's continued to sit there gathering dust. Slick scam.
Some background, blatantly stolen from the Internet: "Building 25 is one of the few remaining structures of the once flourishing rubber industry in Naugatuck that had its beginnings with the discovery of the vulcanization of rubber by Charles Goodyear. Originally known as the Goodyear India Rubber Glove Company, the company later was known as the United States Rubber Company and then Uniroyal. Building 25 served as the central office for the footwear division of the factory that at one time covered a large part of the downtown area. The building has fallen into disrepair despite efforts of the Naugatuck Historical Society to preserve the last vestige of what was once the town's largest employer. The Society has plans to turn Building 25 into a museum dedicated to the history of the rubber industry."


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Pharma Spends 40 Million On Lobbying
40 Million Spent in Three Months for Drug Lobbying
Anyone wondering why medication costs are so high might be interested in knowing that drug companies spent forty million dollars in the last three months lobbying Congress about health care. The analysis comes from NPR's Dollar Politics team, Andrea Seabrook and Peter Overby. Meanwhile, our President is trying to tighten the reins on healthcare spending.
Money spent by pharmaceutical companies to lobby in the last three months exceeds money spent lobbying on Capitol Hill on other healthcare issues, says the NPR team.
According to the report, forty million bought a lot of lobbyists. Keeping cheaper drugs from reaching patients in the US from Canada, and drug price control are key issues among pharmacy companies.
More than 300 lobbyists represent the pharmaceutical industry in Washington. The Pharmaceutical Research and Manufacturers of America trade group spent $6.15 million lobbying Congress from April to June this year. The group represents 32 brand name drug manufacturers.
Pharmaceutical companies are worried about healthcare reform, and it looks like they are willing to spend big to protect their interests. Pfizer spent $5.5 million. Amgen, Eli Lilly and GlaxoSmithKline spent about $3 million each.
Money spent for drug lobbying bought some resolution. Government regulation of drug pricing is already off the table, as is importation of drugs from Canada.
Jerry Avorn, a professor at Harvard Medical School says the drug companies are supportive about healthcare reform because they are getting what they want. He is not surprised that forty million has already been spent. "It's not surprising to learn this, because the pharmaceutical industry for years has been one of the most effective and powerful lobbying outfits in Washington, and it explains why we have a lot of drug policies in the U.S. that don't look like drug policies in any other industrialized country," says Avorn.


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The Bellingham Herald reports that Daniel Santiago Guerrero jumped in at Whatcom Falls Park with several other teens on Monday evening. He never resurfaced.
A city parks employee who lives across the street tried to save him, and found the boy's body with his feet. He and a firefighter pulled Guerrero up, but medics couldn't revive him.


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Makai Wars Resurfaces
Nippon Ichi takes its strategy games onto PlayStation 3.
This could mean Nippon Ichi's working up a hot little bit of connectivity between handheld and next-generation versions of its next strategy release, though we have nothing but pure speculation to back that up.
Part of the charm of the company's games has been its stylish anime-esque 2D visuals in an increasingly 3D dominant world. We can't honestly say Nippon Ichi will keep to that tradition as they move into next-generation development, but that sure would rule.
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Comments (5)
Nippon IchiPosted: Oct 12, 2005 12:00AM PST by JDove
I will look foward to this game coming out. I have been nothing but impressed with NIS since La Pucelle and I hope they don't stray from what makes their games unique and fun (2D sprites, great character voice acting, and immersive storyline to name a few). Even if they stray from the tactical RPG format, I am confident they will make it work. Atelier Iris was a beautiful game too, but is often looked over because it isn't really 'connected' to the tactical chain. I believe NIS will be around for a very long time and will continue to gain fanbase as long as they stick to their guns and keep doing what they do.
I agree with Daniel_JacksonPosted: Sep 17, 2005 12:00AM PST by VandalHeart
After playing through Disgaea, La Pucelle Tactics and Phantom Brave and based on what I've heard about Makai Kingdom, NIS really knows how to make super deep games. If Makai Wars turns out good, which it should, NIS could be on track to live up to their name! (when translated means "Japan's finest"
SweetPosted: Sep 17, 2005 12:00AM PST by makeamidget
So long as there are Prinnies, and it's sprite based. It would rule if they did sprites like the intro scene to Makai Kingdom for all the battles.. Kickass, it would
cool...Posted: Sep 16, 2005 12:00AM PST by sayno2evercrack
but will there be hell kitties and carrot men? That is what is most important.
Keep it DeepPosted: Sep 16, 2005 12:00AM PST by Daniel_Jackson
One of the aspects of NI TRPGs that has really won me over is the insane amounts of depth and customization that are available to your army. Hopefully, regardless of whatever graphical changes are made, this element of the gameplay is only more refined rather than changed.


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I was looking through the Gamestop ad and saw that this game was only $9.99 used. So of course I had to get it today at the nearest Gamestop during my lunch break. I've played only a little bit of it before... if I recall I think I made it to the 3rd chapter? Hmmm... I forgot. Oh well, it's time to give this game another go. Just hope I don't end up breaking a controller from the frustration.
- JoshSupreme


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Pseudomonas aeruginosa secretes the virulence factor alkaline protease (AprA) to enhance its survival. AprA cleaves one of the key microbial recognition molecules, monomeric flagellin, and thereby diminishes Toll-like receptor 5 activation. In addition, AprA degrades host proteins such as complement proteins and cytokines. P. aeruginosa encodes a highly potent inhibitor of alkaline protease (AprI) that is solely located in the periplasm where it is presumed to protect periplasmic proteins against secreted AprA. We set out to study the enzyme-inhibitor interactions in more detail in order to provide a basis for future drug development. Structural and mutational studies reveal that the conserved N-terminal residues of AprI occupy the protease active site and are essential for inhibitory activity. We constructed peptides mimicking the N-terminus of AprI; however, these were incapable of inhibiting AprA-mediated flagellin cleavage. Furthermore, we expressed and purified AprI of P. aeruginosa and the homologous (37% sequence identity) AprI of Pseudomonas syringae, which remarkably show species specificity for their cognate protease. Exchange of the first five N-terminal residues between AprI of P. syringae and P. aeruginosa did not affect the observed specificity, whereas exchange of only six residues located at the AprI surface that contacts the protease did abolish specificity. These findings are elementary steps toward the design of molecules derived from the natural inhibitor of the virulence factor AprA and their use in therapeutic applications in Pseudomonas and other Gram-negative infections.
This article was published in the following journal.
Name: Journal of molecular biology
Pages: 573-83
Relationship of Virulence Factors and Clinical Features in Keratitis Caused by Pseudomonas aeruginosa.
To examine bacterial virulence factors in Pseudomonas aeruginosa isolates from contact lens (CL) wearers and non-CL wearers with P. aeruginosa keratitis, and to investigate relationships between virul...
Correlation of quorum sensing and virulence factors in Pseudomonas aeruginosa isolates in Egypt.
Pseudomonas aeruginosa is one of the most virulent nosocomial pathogens worldwide. Quorum sensing (QS) regulates the production of pathogenic virulence factors and biofilm formation in P. aeruginosa. ...
Genome-wide Screen of Pseudomonas aeruginosa in Saccharomyces cerevisiae Identifies New Virulence Factors.
Pseudomonas aeruginosa is a human opportunistic pathogen that causes mortality in cystic fibrosis and immunocompromised patients. While many virulence factors of this pathogen have already been identi...
Quercetin is an effective inhibitor of quorum sensing, biofilm formation and virulence factors in Pseudomonas aeruginosa.
The study aimed to perform a systematic investigation of the effects of quercetin on biofilm formation and virulence factors in Pseudomonas aeruginosa.
RpoN Regulates Virulence Factors of Pseudomonas aeruginosa via Modulating the PqsR Quorum Sensing Regulator.
The alternative sigma factor RpoN regulates many cell functions, such as motility, quorum sensing, and virulence in the opportunistic pathogen Pseudomonas aeruginosa (P. aeruginosa). P. aeruginosa oft...
The Carrier Rates of Pseudomonas Aeruginosa in Family Members of Children With Cystic Fibrosis
Pseudomonas aeruginosa (Pa) is the bacterium that causes one of the most consequential lung infections in people with CF. Many young children do not have Pa in their lungs but will become ...
Effort to Prevent Nosocomial Pneumonia Caused by Pseudomonas Aeruginosa in Mechanically Ventilated Subjects
Clinical Trial looking to Evaluate the Efficacy and Safety of MEDI3902 in Mechanically Ventilated Patients for the Prevention of Nosocomial Pneumonia Caused by Pseudomonas aeruginosa
Open Label Extension to Bridging Study CTBM100C2303
This is an open-label, single arm (uncontrolled) study in subjects suffering from cystic fibrosis, who have completed their study participation in CTBM100C2303 (all visits) and who were pr...
Safety and Pharmacokinetics of KBPA-101 in Hospital Acquired Pneumonia Caused by O11 Pseudomonas Aeruginosa
The objectives of this open study are to assess the safety, tolerability, pharmacokinetics and clinical outcome of patients who have HAP caused by Pseudomonas aeruginosa serotype O11 after...
Phase II Randomized, Double-Blind, Placebo-Controlled Study of Intravenous Mucoid Exopolysaccharide Pseudomonas Aeruginosa Immune Globulin for Cystic Fibrosis
OBJECTIVES: I. Assess the efficacy of monthly intravenous mucoid exopolysaccharide Pseudomonas aeruginosa immune globulin (MEP IGIV) given over 1 year in reducing the frequency of acute p...
Pseudomonas Aeruginosa
A species of gram-negative, aerobic, rod-shaped bacteria commonly isolated from clinical specimens (wound, burn, and urinary tract infections). It is also found widely distributed in soil and water. P. aeruginosa is a major agent of nosocomial infection.
Antibiotic pigment produced by Pseudomonas aeruginosa.
Bacteriocins elaborated by mutant strains of Pseudomonas aeruginosa. They are protein or protein-lipopolysaccharide complexes lethal to other strains of the same or related species.
Pseudomonas Phages
Viruses whose host is Pseudomonas. A frequently encountered Pseudomonas phage is BACTERIOPHAGE PHI 6.
Reducing the SURFACE TENSION at a liquid/solid interface by the application of an electric current across the interface thereby enhancing the WETTABILITY of the surface.
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Drug Discovery
Clinical Approvals Clinical Trials Drug Approvals Drug Delivery Drug Discovery Generics Drugs Prescription Drugs In the fields of medicine, biotechnology and pharmacology, drug discovery is the process by which drugs are dis...
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Under the Sheen
The one word you don't want to use in a domestic violence case was used the other day -- when the prosecutor in Charlie Sheen's current court troubles told us his plea deal had "hit" a snag. Oh, that poor snag! When will the violence end? Seriously, the glitch -- whatever it may be -- came as "a big surprise" to those involved. Very curious, indeed. Click for more.Mark Ralston / Getty Images


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|David Jencks <djen...@apache.org>
|Re: Specs Question.
|Thu, 20 Jan 2005 07:12:31 GMT
On Jan 19, 2005, at 10:44 PM, Mark wrote: > Quick question regarding specs. > > My build just failed due to a missing dependency: > geronimo-spec-javamail-1.3.1-SNAPSHOT.jar. I went into the > geronimo\specs\javamail directory and ran maven which build the > missing jar file. I was under the impression that we didn't have to > explicitly build the specs anymore. Is this correct? That depends. Sometimes we find bugs in the implementations, and some of the specs are not completely implemented (mostly javamail). It looks like Jeremy has been working on this recently. Personally I always thought the time to rebuild the specs was a small price to pay for avoiding breakage due to spec module updates. thanks david jencks > > If needed the command line for the main build was: > > maven -Dmaven.test.skip=true -Dmaven.itest.skip=true clean default > > Thanks > Mark >
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Building Communities
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Biz Apartment Gärdet, Stockholm
- Free breakfast and free WiFi
Main amenities
- 173 smoke-free apartments
- Seasonal outdoor pool
- 24-hour business center
- 24-hour front desk
- Coffee/tea in a common area
- Front desk safe
- Laundry service
- Picnic area
- Free newspapers in the lobby
- Luggage storage
- TV in a common area
What's around
- In Ladugardsgardet
- Vasa Museum (1.5 mi / 2.4 km)
- Skansen (1.8 mi / 2.9 km)
- Royal Swedish Opera (2.3 mi / 3.6 km)
- National Museum (2.3 mi / 3.7 km)
- Millesgarden (2.4 mi / 3.9 km)
For families
- Cribs/infant beds available
- Kitchen
- Cookware, dishware, and utensils
- Stovetop
- Microwave
- Full-sized refrigerator/freezer
Biz Apartment Gärdet, Stockholm
Hotel Info: 866-539-8117from $94
- Studio Medium
- Studio Small
- Family Room
- Standard Apartment, 1 Bedroom, Terrace
- Standard Apartment, 1 Bedroom
- Studio Large
Also popular with travelers from the USA
At a glance
Key facts
Hotel size
- This hotel has 173 rooms
- This hotel is arranged over 3 floors
- Check-in time starts at 3 PM
- Check-out time is Noon
Required at check in
- Credit card or cash deposit required
- Government-issued photo ID required
- Minimum check-in age is 18
Travelling with others
- No pets or service animals allowed
- Pets allowed *
- Free WiFi in public areas
- Free WiFi and wired Internet access in rooms
- Discounted offsite parking
Other information
- Smoke-free property
- Resort fee included
Nearby Four Star Stockholm hotels
In the hotel
- Free breakfast
- Coffee/tea in a common area
- Outdoor seasonal pool
- Bicycle rentals nearby
- Hiking/biking trails nearby
- Cross-country skiing nearby
- 24-hour business center
- 24-hour front desk
- Dry cleaning/laundry service
- Laundry facilities
- Free newspapers in lobby
- Luggage storage
- Number of buildings/towers - 1
- Year Built 2010
- Elevator/lift
- Safe-deposit box at front desk
- Picnic area
- Television in common areas
- Accessible bathroom
In the room
- In-room climate control (air conditioning)
- Air conditioning
- Coffee/tea maker
- Iron/ironing board
- Blackout drapes/curtains
- Pillowtop mattress
- Separate dining area
- Separate sitting area
- Private bathroom
- Shower only
- Free toiletries
- Hair dryer
- 32-inch LCD TV
- Premium TV channels
- Desk
- Free WiFi
- Phone
- Full-sized refrigerator/freezer
- Microwave
- Kitchen
- Stovetop
- Cookware, dishware, and utensils
- Dishwasher
- Weekly housekeeping provided
Top Stockholm hotels
Recently reviewed hotels in Stockholm
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"We were just there for one night because we wanted to be near the airport. The restaurant was very good, the room had everything we wanted in good order and the shuttle was right…"Jun 17, 2016
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"Convenient location for sightseeing, shopping and commuting."Jun 16, 2016
- Motel LFrom
"This hotel is 5-6 T-nana stops + one tram stop away from T-central. It is clean and modern. Wifi works great. Free coffee after 11am in the lobby. Room is well sound proof, so no…"Jun 15, 2016
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"Our family of seven flew through Stockholm on our way to and from Santorini, Greece. We allocated four days on the return to visit Sweden for the first time. I read MANY Expedia…"Jun 14, 2016
Nearby hotels
Special features
Awards and affiliations
Green / Sustainable Property
This property participates in Green Key (nogle), a program that measures the property's impact on one or more of the following: environment, community, cultural-heritage, the local economy.
Biz Apartment Gärdet, Stockholm's small print
Also known as
- Biz Apartment
- Biz Apartment Gärdet Stockholm
- Biz Apartment Gärdet
- Biz Gärdet Stockholm
- Biz Gärdet
Only registered guests are allowed in the guestrooms.
Mandatory fees
The charges below are included in the total price displayed:
- Resort fee
Optional extras
Weekly housekeeping is provided; fees apply for additional cleaning
Pets are allowed for an extra charge of SEK 250 per accommodation, per week
We have included all charges provided to us by this hotel. However, charges can vary, for example, based on length of stay or the room you book.
Recent reviews
Excellent 4.3 /5 from 698 reviews
Our Wi-Fi signal was terrible and pretty much unusable. Other than that the hotel was fine.
We absolutely LOVED this place, the staff was off the charts fantastic!! Room was great, breakfast buffet was AWESOME!
Very quiet room, Except on Saturday nights, When the right opposite located Diskothek plays very loud, but good musik until 3 Am!!!!!!!! Best part of the Hotel ist the bus station, Right at the hotel, That brings you to downtown Stockholm within 20 minutes!! Remember!!!! Breakfast is in the 5th floor, But then you need to walk down stairs to the 4th floor!!! (It's Sweden!!!)
Outstanding value if you are comfortable using the superior Stockholm transit system. Staff were charming and professional. Spotlessly clean and efficient, well-designed rooms. Overall, a perfect base of operations for business and pleasure. Will definitely stay again.
Is the description of this hotel not correct? Tell us


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Hyskore® Dangerous Game® Machine Rest
Item # WX2-187026
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Hyskore® Dangerous Game® Machine Rest. For varmint-plugging precision or a dead-on zero, no one scores as high as Hyskore!
For everything from two-two-three to BMG, the Dangerous Game® takes the shock out of the shot! And, unlike other rests, the Dangerous Game absorbs shock just like your shoulder, so there's no need to fear damage to the stock, bedding or recoil lugs. In fact, when firmly anchored, your gun will return to battery (+/- 3 MOA) after EVERY shot.
Works with just about any rifle! You get 3 factory-calibrated nitrogen-filled compression dampeners: one light, one medium, and one heavy to handle any load. Welded steel construction. Impressive repeatability. Painless sight-in. And hands-free trigger release. It's the total package for serious shooters, at a price that won't empty your chamber!More:
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This is my third return to this motel, Margaret always make me very easy the reservation process, and always I am feeling she serve me very good.
My room was clean with all I need to enjoy the beach, clean room, clean and comfortable bed.
Outside you have a clean pool, BBQ place and an awesome beach.
After sunset you can enjoy the the beauty of starry sky from the terrace of the motel.
If you need to buy groceries, there is a Publix at one block north.
The motel supply me all the kitchen utensils and tableware.
You can have fun with savings if you make comparison with other similar places.
Excellent place for family, friends or couples.
- Official Description (provided by the hotel):
- Suncoast Motel is directly on the Gulf of Mexico. All rooms have been recently remodeled and the suite apartments have granite countertop kitchens! You will not find a better deal on Treasure Island. Our hotel is all about having clean rooms with the best environment and that is why we have so many repeat guests. ... more less
- Also Known As:
- Suncoast Hotel Treasure Island
- Suncoast Motel Treasure Island, Florida


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Winona Ryder's Style Evolution
Loraine Pavich
| October 25, 2012 - 3:05 pm
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Dorcas Bay Getaway
From $134 / night
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Description from the owner
Description from the owner
Bedrooms: 3/
Bathrooms: 2/
Sleeps: 8/
Type: Cottage
Book this 3 bedroom, 2 bathroom cottage in Tobermory today! A total of 8 people can sleep here comfortably. This property has been booked 51 times.
Guests can enjoy a deck, outdoor grill, and parking space among other amenities offered by this rental.
Travelers are sharing their opinions on this property. It has an overall rating of 5/5 thanks to an average of 15 reviews.
Costs vary, with the average weekly rate as low as $1,150.00, depending on travel dates.
The owner responds to 100% of inquiries and last updated the property's calendar 10 days ago.
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Item #22486
Product Description
With its hard lines and soft curves, our metal Derek 1-Light Outdoor Sconce combines industrial simplicity with sophisticated charm. A graceful hanging hook supports a cylinder of concentric rings with a flared shade and an intriguing light bulb cage. It's a perfect way to add a hint of modernity to a traditional home.
Product Details
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text:
|Publication number
|Publication type
|Application number
|Publication date
|Apr 9, 2002
|Filing date
|Apr 11, 2000
|Priority date
|Apr 11, 2000
|Fee status
|Also published as
|Publication number
|Wei-Chieh Hsu
|Original Assignee
|Vanguard International Semiconductor Corporation
|Export Citation
|BiBTeX, EndNote, RefMan
|Patent Citations (10), Referenced by (2), Classifications (8), Legal Events (4)
|External Links: USPTO, USPTO Assignment, Espacenet
(1) Technical Field
This invention relates to the polishing of semiconductor wafers of the type from which chips for integrated circuits and the like are made. More specifically in a chemical mechanical polishing (CMP) process in which a wafer is held by a tooling polishing head and is polished by contact with an abrasive material dispensed on a rotating polishing pad.
(2) Description of the Prior Art
The fabrication of integrated circuits on a semiconductor wafer involves a number of steps where patterns are transferred from photolithographic photomasks onto the wafer. The photomasking processing steps opens selected areas to be exposed on the wafer for subsequent processes such as inclusion of impurities, oxidation, or etching.
During the forming of integrated circuit structures, it has become increasingly important to provide structures having multiple metallization layers due to the continuing miniaturization of the circuit elements in the structure. Each of the metal layers is typically separated from another metal layer by an insulation layer, such as an oxide layer. To enhance the quality of an overlying metallization layer, one without discontinuities of other blemishes, it is imperative to provide an underlying surface for the metallization layer that is ideally planar.
Conventionally, during the fabrication of integrated circuit structures, planarizing of the overlying metallization layers is accomplished by CMP. The uniform removal of material from and the planarity of patterned and unpatterned wafers is critical to wafer process yield. Generally, the wafer to be polished is mounted on a tooling head which holds the wafer using a combination of vacuum suction or other means to contact the rear side of the wafer and a retaining lip or ring around the edge of the wafer to keep the wafer centered on the tooling head. The front side of the wafer, the side to be polished, is then contacted with an abrasive material such as a polishing pad or abrasive strip. The polishing pad or strip may have free abrasive fluid sprayed on it, may have abrasive particles affixed to it, or may have abrasive particles sprinkled on it.
The ideal wafer polishing process depends on several factors which includes; relative velocity and applied pressure between the wafer and the polishing pad, polishing pad roughness and pad elasticity, surface chemistry, abrasion effects, and contact area. As a result, the ideal CMP process should have constant cutting velocity over the entire wafer surface, sufficient pad elasticity, and a constant supply of polishing slurry. Additionally, control over the temperature and pH is critical and the direction of the relative pad/wafer velocity should be randomly distributed over the entire wafer surface.
Most current CMP machines fail to produce constant velocity distribution over the entire wafer surface which is necessary for uniform material removal and good flatness. A common type, shown in simplified form in FIG. 1, a wafer 10 is held by a tooling head 21 which rotates about the axis of the wafer 10. A large circular polishing pad 13 is rotated while contacting the rotating wafer being held by the tooling head. The rotating wafer contacts the larger rotating polishing pad in an area away from the center of the polishing pad. Thus, the relative motion between the wafer and the polishing pad has two components; one due to the rotating wafer and another due to the rotating polishing pad.
A major disadvantage with prior systems was related to the fact that a wafer moving in a particular direction would have a lower removal rate at its leading edge because of what is commonly referred to as "edge exclusion" caused by a ripple formed in the polishing pad 13 when applied pressure between the wafer and the polishing pad is made, refer to FIG. 2. Prior art systems which provide only certain polishing patterns can not be easily made to control the removal rates at the edges due to this effect. As shown in FIG. 2, the ripple formed on the surface of the polishing pad, during contact with the wafer excludes this leading edge segment from contact with the polishing pad, hence, becomes the major contributing factor for edge exclusion. To avoid this problem, see FIG. 3, a fixed floating ring 17 peripherally oriented about the outer edge of the tooling head 21, and fixedly mounted to the tooling head driver housing 18, was developed to displace the ripple in the polishing pad outwardly from the leading edge of the wafer to the leading edge of the fixed floating ring. The addition of the fixed floating ring reduced the effects of edge exclusion, however, its implementation tended to push away the polishing slurry, thereupon, lengthening the polishing cycle.
The primary challenge is to make the oxide removal rate constant across the top surface of the larger diameter wafers, as well as maintaining a constant oxide removal rate during successive wafer runs. Prior polishing techniques do not provide trouble free process control for producing device patterns. The oxide removal rate is not constant between wafers thereby reducing device yield during the fabrication process.
It is therefore a primary object of the present invention to provide a polishing device that can improve the uniformity and planarity of the surface of a wafer being polished by eliminating edge exclusion caused by a ripple occurring on the surface of the polishing pad, and by permitting a more constant availability of polishing slurry as a function of radial distance of the wafer's contact position on the polishing pad.
According to one aspect of the present invention, there is provided in a polishing device including a rotatable polishing platen having an upper surface on which a polishing pad is attached, a rotatable wafer polishing head assembly having a lower surface opposed to an upper surface of the polishing pad on the polishing plate, for holding a wafer to be polished on the lower surface and pressurizing means for applying a polishing pressure to the rotatable wafer polishing head assembly, whereby the wafer held by the polishing head assembly is rotatably pressed against the rotating upper surface of the polishing pad under the polishing pressure applied from the pressurizing means to perform polishing of the wafer, the improvement wherein the rotatable wafer polishing head assembly is created with a floatable ditch type ring that is coaxial to, yet non-rotating, relative to the rotatable wafer polishing head assembly. The floatable ditch type ring is pneumatically and mechanically urged onto the rotating upper surface of the polishing pad.
It is an object of the present invention to provide a novel process and apparatus for CMP planarization by displacing the ripple on the polishing pad that causes edge exclusion during CMP planarization.
It is another object of the present invention to provide the method and apparatus to enhance the flow of slurry as a function of radial distance of the wafer relative to the rotating polishing plate.
It is still another object of the present invention to provide the method capable of high yield in fabricating a semiconductor device.
It is an additional object of the present invention to provide the method and apparatus useful in a semiconductor device having large scale integration formed on large diameter wafers.
These and further constructional and operational characteristics of the invention will be more evident from the detailed description given hereafter with reference to the figures of the accompanying drawings which illustrate preferred embodiments and alternatives by way of non-limiting examples.
FIG. 1 is a schematic front view of a CMP apparatus according to the prior art.
FIG. 2 is an enlarged fragmented view of a ripple in the polishing cloth of the prior art.
FIG. 3 is a schematic front view of a CMP apparatus with a fixed floating ring, according to the prior art.
FIG. 4 is a schematic top view showing a positional relationship of a polishing cloth, wafer polishing head, and a dressing head of the prior art.
FIG. 5 shows a bottom view of a floatable ditch type ring, of the invention.
FIG. 6 is an enlarged cross-sectional view of the floatable ditch-type ring of the invention.
FIG. 7 is a partial front section view of the invention as related to the CMP polishing pad.
FIG. 8 a partial exploded cross-section view of FIG. 7 as related to the CMP polishing pad.
FIG. 9 is a schematic plan view showing the slurry flow pattern through radial grooves in the ditch type ring of the invention.
FIG. 10 is an enlarged detailed view of the floatable ditch-type ring of the invention.
Referring now to FIGS. 1 and 2 there is shown a schematic of a conventional CMP tool according to the prior art which illustrates the arrangement of a chemical mechanical polishing pad used for planarization of a top surface topology of a semiconductor wafer.
The polishing pad 13, a porous material, is attached to the upper surface of a polishing platen 14. The polishing platen is horizontally supported by a platen rotating shaft 15, and is rotationally driven through the platen rotating shaft during the polishing operation.
A polishing head assembly 21 having a lower surface opposed to the upper surface of the polishing pad 13 on the polishing platen 14. The nesting surface is formed by a ring 22 and backing film 23 which releasably holds a wafer 10 to be polished. Generally, when loading the wafer, the wafer is held using a combination of vacuum suction and adhering means provided by the backing film 23 contacting the rear side of the wafer along with the retaining ring around the edge of the wafer that keeps the wafer centered on the polishing head. During polishing, a backside gas pressure is applied to the wafer, thusly improving its polished uniformity by pushing against the backside of the wafer. The polishing head assembly 21 is mounted to a rotating shaft 24 through a universal joint 25 and is driven through the rotating shaft 24.
The CMP tool polishes the wafer 10 which is positioned face down and in firm contact, under pressure, with the rotating polishing pad 13 which is mounted to a rigid platen 14. The wafer is also rotated either about an axis coincident with its own center or offset from its own center, but not coincident with the axis of rotation of the polishing pad 13. The abrasive polishing slurry 27 is dispensed to the pad surface through a nozzle 26. As a result of the rotating contact and abrasion between the polishing pad 13 and of a top layer of the wafer 10, oxide on the wafers top layer is removed thereby planarizing the wafer. The rate of removal is closely proportional to the pressure applied to the wafer 10. Furthermore, the rate of removal depends upon the topography of the top layer of wafer 10, as higher features (extending further from the wafer surface) are removed faster than lower features. Several techniques are presently used to assist in oxide removal, for example, maintaining a fresh supply of polishing slurry on the polishing surface of the polishing pad and, maintaining a uniform polishing texture on the surface of the polishing pad.
One known method of adjusting the oxide removal rate is by altering the surface state of the polishing pad 13. Without such dressing, or in the alternative, without repeatedly changing the polishing pad 13, the oxide removal rate would continue to fall as more wafers are polished, since the surface roughness tends to decrease and such roughness determines, in large part, the overall abrasiveness of the polishing pad 13 and slurry 27.
FIG. 1 shows a type of dressing wheel 30 of the prior art. The dressing wheel rotates under a controlled pressure and about its central axis to cover the annular track width generated by the wafer polishing. This operation is usually done between polishing of successive wafers.
The operation of a CMP polishing tool will now be described;
A semiconductor wafer 10 is retained within a nesting surface by cohesion with a backing film 23 applied to the under surface of polishing head assembly 21 , and by a backside vacuum pressure. During polishing, the polishing platen 14 and the polishing head assembly 21 are rotationally driven through the rotating shafts 15 and 24 by driving means (not shown). The polishing slurry 27 is supplied from the polishing slurry supply system 28 through the nozzle 26 onto the polishing pad 13. The wafer 10 held by the polishing head assembly 21 is rotated and pressed against the surface of a rotating polishing pad 13 under a controlled polishing pressure applied from pressurizing means (not shown). Since the polishing pad is a thin fabric pad, the vertical pressing force of the wafer tends to compress the pad thus forming a ripple 29 at the wafer's edge. This is best illustrated in FIG. 2. The ripple 29 impedes the polishing uniformity and removal of micro-scratches along the area bordering the outside edge of the wafer.
Referring also to FIGS. 3 and 4 which illustrate a prior art method for displacing the ripple 29 away from the periphery of the wafer. FIG. 3 shows a front view of a CMP apparatus with a cylindrical actuator assembly 19 mounted from the bottom surface of stationary motor housing 18. The cylindrical actuator assembly comprises a ring 17 mounted to the distal ends of several cylindrical actuators. The ring adjacently surrounds the rotatable polishing head assembly 21 without making contact. The cylindrical actuator assembly urges the ring 17 towards the plane of the polishing pad 13 by mechanical-pneumatic means. This vertical freedom permits the cylindrical actuator assembly to adjust without impeding the polishing pressure applied to the wafer, while simultaneously transforming the ripple to the outside of ring 17. The ring is a sacrificial wearing member which is easily replaced. The polished surface of the wafer 10 is burnished by a fresh supply of a polishing slurry containing a mechanical granular silica. The stationary ring however, tends to scrape the polishing slurry from the rotating polishing pad thus accumulating slurry at the outside periphery of the ring, the amount accumulated depends on the applied downward force of ring 17. This action impedes the polishing process thus prolonging the polishing cycle.
There will now be described in detail with reference to the drawings some preferred embodiments of the present invention applied to a chemical mechanical polishing tool for planarizing of a semiconductor wafer. In the following description of the preferred embodiments, the same reference numerals as those in the prior art denote similar parts for convenience of illustration.
Referring still to FIGS. 3 and 4 which illustrate the prior art CMP polishing apparatus used for polishing a semiconductor wafer 10 and the method for displacing the ripple 29 away from the periphery of the wafer. FIG. 3 showing a front view of a CMP apparatus with a cylindrical actuator assembly 19 mounted to the bottom surface of a stationary motor housing 18. The cylindrical actuator assembly comprises a ring 17 mounted to the distal ends of several cylindrical actuators, the ring 17 adjacently surrounds the rotatable polishing head assembly 21 without making physical contact with it. The cylindrical actuators urges the ring 17 towards the plane of the polishing pad 13 using mechanical-pneumatic means. The vertical displacement of the cylindrical actuator assembly vertically adjust itself without impeding the pressure applied to the wafer while simultaneously transforming the ripple to the outside of the cylindrical housing area.
Referring now to FIGS. 5 through 9 showing the improvements of the invention. A ditched ring 40 replaces sacrificial ring 17, as illustrated in FIG. 3 of the prior art, and in FIG. 7 and 8 of the invention. The ditched ring 40 is mounted to the underside of cylindrical housing 19 in the same manner as sacrificial ring 17 and is easily replaceable. FIG. 5 shows the ditched ring 40 having a multiplicity of conduit grooves 41 formed in pairs, as each conduit pair is coequally formed at each side of a center axis 44 at radial positions defined by a multiplicity of radii, as examples, radii 46 through 60. The radially formed conduits 41 having a common center 43 are shaped to form the conduit grooves in annular member 45. Common center 43 is also the center of rotation of the polishing platen 14 driven by rotating shaft 15. Referring also to FIG. 6 illustrating an enlarged cross-section of ditched ring 40 showing annular member 45 being of a reduced wall thickness. Surface 47 of annular member 45 makes sacrificial contact with rotating polishing pad 13. Slurry contained on the rotating polishing pad flows through the conduit grooves in ditched ring 40 forming an annular ring pattern of slurry traveling towards the spinning wafer at unimpeded radial surface speeds. This is best illustrated in FIG. 9. Because of the common center 43 used for forming the radial conduits in annular member 45 and the center of polishing pad rotation tends to average and control the boundary layer of slurry available to the wafer. It has been established, by way of experiment and measurement, that this controlled metering of slurry through radially formed conduits improves the quality of CMP planarization and more specifically uniformity in removing micro-scratches.
FIG. 10 illustrates a detailed ditched ring 40, with dimensions, of the type used to show operability and to extract actual measurement data.
In summary, an apparatus for polishing a semiconductor wafer including a rotatable polishing platen having an upper surface, a polishing pad fixedly attached to the upper surface, a polishing slurry containing a mechanical abrasive deposited on the upper surface of the polishing pad. Mounted above the polishing pad is a rotatable polishing head assembly having a shallow recessed face adapted to centrally hold the upper back edge of the substrate, the recessed face is oriented substantially parallel to the upper surface of polishing platen. The rotatable polishing head assembly has its rotatable axis offset relative to the rotatable axis of the polishing platen. A non-rotatable cylindrical actuator assembly is coaxially oriented about the outer edge of the rotatable polishing head assembly with a ditched ring removably attached to the bottom surface of the fixed cylindrical ring. The ditched ring with a bottom section of a reduced wall thickness of approximately 5 mm. A multiplicity of conduit grooves are formed in the bottom section of the ditched ring that allows a boundary layer of abrasive slurry to travel unimpeded to the rotating semiconductor wafer. the conduit grooves formed in pairs, each groove formed on either side of the center coordinate axis of the ditched ring. The conduit grooves pairs are radially concentric and projected from a point outside of the ditched ring on its center axis. The center coordinate axis of these conduit grooves is coincident with the rotatable axis of the polishing platen.
The reduced wall thickness at the bottom of the ditched ring is configured to displace wrinkles from the outer edge of the wafer to the outer periphery of the ditched ring. This solves the edge exclusion problem, while the concentric conduit grooves allow unimpeded tracks of abrasive slurry to uniformly remove microscratches from the planarized surface of the wafer
While the invention has been particularly shown and described with reference to the preferred embodiments thereof, it will be understood by those skilled in the art that various changes in form and details may be made without departing from the spirit and scope of the invention.
|Cited Patent
|Filing date
|Publication date
|Sep 29, 1995
|Nov 11, 1997
|Seagate Technology, Inc.
|Selection of optimum write current in a disc drive to minimize the occurrence of repeatable read errors
|Jul 29, 1996
|Feb 24, 1998
|Kusbel; Paul F.
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|Seagate Technology, Inc.
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|Jul 11, 1997
|Oct 12, 1999
|Applied Materials, Inc.
|Carrier head with a flexible membrane for a chemical mechanical polishing system
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|Nov 30, 1999
|Applied Materials, Inc.
|Carrier head with a removable retaining ring for a chemical mechanical polishing apparatus
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|Jan 11, 2000
|Wyko, Inc.
|Expandable belt and tread drum
|Jan 25, 1999
|May 9, 2000
|Lucent Technologies Inc.
|Magnetic force carrier and ring for a polishing apparatus
|Jul 15, 1998
|Dec 12, 2000
|Aplex, Inc.
|Polishing head for a chemical mechanical polishing apparatus
|Jan 8, 1997
|May 1, 2001
|H & S Manufacturing Co., Inc.
|Forage box clutch mechanism
|Oct 20, 1995
|Aug 28, 2001
|Seagate Technology Llc
|Applying a ramped voltage source across an actuator coil to retract a disc drive actuator
|Citing Patent
|Filing date
|Publication date
|Mar 30, 2001
|Jan 21, 2003
|Cypress Semiconductor Corp.
|Method for polishing a semiconductor topography
|Jul 10, 2001
|Jul 13, 2004
|Cypress Semiconductor Corp.
|Method and system for spatial uniform polishing
|U.S. Classification
|438/689, 438/700, 438/691, 438/692, 438/693
|International Classification
|Cooperative Classification
|European Classification
|Apr 11, 2000
Owner name: VANGUARD INTERNATIONAL SEMICONDUCTOR CORPORATION,
Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNOR:HSU, WEI-CHIEH;REEL/FRAME:010754/0408
Effective date: 20000315
|Sep 9, 2005
|Fee payment
Year of fee payment: 4
|Sep 24, 2009
|Fee payment
Year of fee payment: 8
|Sep 27, 2013
|Fee payment
Year of fee payment: 12