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Join The Conversation
Jul 1 Posted 2 years ago
What Facebook did is absolutely unethical. You need to make a subject aware that a psychological experiment is being done to them prior to subjecting them to it. As to the legality of it - https://twitter.com/kashhill/status/483767776427798528 - they amended their terms to include 'research' four months after the study, though in the end they have a pretty blanket T&C so I'm sure that even without this addition, there will be no lawsuit.
Personally, I wonder how this effected people's personal lives (did those that received negative news feeds also experience a more negative work/home life)? It's definitely not shocking, but it's also sad that at the end of the day there will be very little to no adverse impact to Facebook.
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|No such thing as a small change
Re: regex anchoring issueby smls (Friar)
|on Feb 15, 2013 at 12:01 UTC ( #1018884=note: print w/ replies, xml )
|Need Help??
If you need your regex to match one of several possible text fragments of which at least one is longer than 1 character, you have to use an alternation (...|...|...) instead of a character class ([...]).
Some additional comments on your code:
In Section Seekers of Perl Wisdom

subset: commoncrawl


text:
A versatile ingredient in any liquor cabinet, schnapps come in just about every imaginable flavor. From peppermint shooters to jaffa schnapps, these easy cocktails made with schnapps are the hit of any party.See Popular Schnapps Recipes
White Strawberry SangriaBetter Homes and Gardens
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For this impressive dinner entree, roasted pork tenderloin is encased in flaky puff pastry with a tasty layer of mincemeat.
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For a nonalcoholic version, omit the applejack and schnapps and add 2 tablespoons cinnamon-flavored syrup, such as Torani brand.
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Now that Thanksgiving is behind us, it's officially -- officially -- holiday season, which means it's totally acceptable to drink hot chocolate for breakfast, lunch, dinner, and dessert. In between meals is fine, too. But why be boring about it?
Sangria Spikes up Summer Fun
Sangria isn't just a summer beverage. It's summer in a bowl, an excuse to use fresh strawberries, peaches, blackberries, and other fruits of the season that will show up later in a beautiful glass filled with the most refreshing of thirst-quenching coolers. Sangria is the classic drink of Spain and Portugal, and each frosty pitcher seems to burst with sunshine.
Counting Carbs? Count on Dessert! 8 Fabulous Low-Carb Desserts
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15 Candy Corn-Inspired Recipes for Halloween
Halloween is right around the corner which only means one thing: it's candy corn season! Try these inspired recipes from our food blogger friends.


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GQ is out with a profile of Texas Republican Ted Cruz. The story, by the excellent Jason Zengerle, looks at the junior senator's unlikely rise to power and D.C.'s love-hate relationship with him. We learn many formative facts about him, like that his nemesis on the speech and debate circuit was former Obama economic adviser Austan Goolsbee. And he has at least several enemies. Zengerle notes, "He's been likened to Joe McCarthy, accused of behaving like a schoolyard bully, and smeared by senior members of his own party. Is this any way to get ahead in Washington?" Is there any other way? Some highlights:
He's an Ivy snob:
"As a law student at Harvard, he refused to study with anyone who hadn't been an undergrad at Harvard, Princeton, or Yale. Says Damon Watson, one of Cruz's law-school roommates: 'He said he didn't want anybody from "minor Ivies" like Penn or Brown.' "
He likes to name-drop:
"…everyone from Reagan to Rawls (as in John, the late Harvard philosopher)…"
He's style-heavy, substance-light:
"So far Cruz has proposed no major legislation and has shown little interest in changing that. He seems content accomplishing nothing because, in Cruz's view of the federal government, nothing is the accomplishment."
He hoards sentimental tchotchkes:
"Even Cruz's favorite footwear, a pair of black ostrich-skin cowboy boots, serves as an advertisement for his credentials and connections. 'These are my argument boots,' he told me one morning this summer as we rode the subway car beneath the Capitol to a vote on the Senate floor. 'When I was Texas solicitor general, I did every argument in these boots….' "
He was actually born in Canada, but legal experts say it wouldn't impede a run for president in 2016:
"…by dint of his mother's American citizenship, he qualifies as a natural-born American citizen…"
He's a terrible mansplainer:
"…there was the moment, just a month later, when the Judiciary Committee was debating the assault-weapons ban: Cruz was trying to get it through Democratic senator Dianne Feinstein's thick skull that there was this thing called the Second Amendment and that it deserved the same respect as the rest of the Bill of Rights. He made his point by rattling off other amendments and the rights they protected until Feinstein bristled, 'I'm not a sixth grader. I've been on this committee for twenty years…. I've studied the Constitution myself. I am reasonably well educated, and I thank you for the lecture.' "
And yes, we did pull the video:
What We're Following See More »
"Wikileaks published more than 8,000 documents purportedly taken from the Democratic National Committee Friday, just days before the start of the party's convention in Philadelphia. The documents included briefings on off-the-record fundraisers and candid photographs."
Hillary Clinton "is widely expected to announce her choice" of vice president "in an email to supporters while on a campaign swing in Florida on Friday afternoon." The consensus: it'll be Sen. Tim Kaine of Virginia, although Sen. Cory Booker of New Jersey and Agriculture Secretary Tom Vilsack are also said to be in the running.
- A Rasmussen Reports poll shows Donald Trump ahead of Hillary Clinton, 43%-42%, the fourth week in a row he's led the poll (one of the few poll in which he's led consistently of late).
- A Reuters/Ipsos survey shows Clinton leading 40%-36%. In a four-way race, she maintains her four-point lead, 39%-35%, with Gary Johnson and Jill Stein pulling 7% and 3%, respectively.
- And the LA Times/USC daily tracking poll shows a dead heat, with Trump ahead by about half a percentage point.


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- Miss Florida 2017 stripped of crown days after win - US Weekly
- Lindsay Lohan steps out amid relationship drama - TMZ
- Was Taylor Swift snubbed by the VMAs? - Gossip Cop
- Rachel Platten sings "Fight Song" with lots of stars - Just Jared Jr
- Farrah Abraham sizzles in a revealing bikini - Radar
- New pics from the Clooneys' Italian summer - Lainey Gossip
- Fox News snubs major DNC moment - The Hollywood Reporter
17 September 2013 at 3:18 AM
Jared Leto: Rock in Rio Performance with Thirty Seconds to Mars!
About this photo set: Jared Leto rocks cool kicks while grabbing a dinner at a sushi restaurant on Saturday (September 14) in Rio de Janeiro, Brazil. Later in the night, the 41-year-old… Read More Here
Photo #: 2953743
Posted to Jared Leto, Thirty Seconds to Mars
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|Publication number
|Publication type
|Application number
|Publication date
|Sep 17, 2002
|Filing date
|May 19, 1999
|Priority date
|Nov 21, 1996
|Fee status
|Also published as
|Publication number
|Dov Zahavi, Natalie Levinsohn, Shay Ghilai
|Original Assignee
|Oramir Semiconductor Equipment Ltd.
|Export Citation
|BiBTeX, EndNote, RefMan
|Patent Citations (9), Referenced by (3), Classifications (17), Legal Events (4)
|External Links: USPTO, USPTO Assignment, Espacenet
This Application is a continuation of PCT/IL97/00365 filed Nov. 12, 19997.
The present invention relates to a process and apparatus for treating surfaces with laser light, particularly, though not necessarily, for the removal of foreign materials from substrate surfaces, e.g. removal of photoresist from semiconductor surfaces.
In the manufacturing of various products it is necessary to apply a layer of protective material on a surface, which must be removed after a specified manufacturing step has been concluded. An example of such process is the so-called "masking", where a pattern is created on a surface using a layer of protective material illuminated through a mask, and the surface is then treated with a developer which removes material from the unmasked portions of the surface, therefore leaving a predetermined pattern. The surface is then treated by ion implantation or by etching agents, which introduce the implanted species into the unmasked portions of the surface, or removes material from unmasked portions. Once these processes are completed, the role of the protecting mask ends and it must be removed. The process is conventional and well known in the art, and is described, e.g., in U.S. Pat. No. 5,114,834.
U.S. Pat. No. 5,114,834 describes photoresist removal by ablation, using laser UV radiation, in an oxidizing environment, as described. The ablation process is caused by strong absorption of the laser pulse energy by the photoresist. The process is a localized ejection of the photoresist layer to the ambient gas, associated with a blast wave due to chemical bonds breaking in the photoresist and instant heating. The partly gasified and partly fragmented photoresist is blown upwards away from the surface, and instantly heats the ambient gas. Fast combustion of the ablation products occurs, due to the blast wave and may also be due to the photochemical reaction of the UV laser radiation and the process gases. The main essence of the process is laser ablation with combustion of the ablated photoresist which occurs in a reactive gas flowing through an irradiation zone. The combination of laser radiation and fast combustion provides instantaneous lowering of the ablation threshold of hard parts of the photoresist (side walls). The combusted ablation products are then removed by vacuum suction, or by gas sweeping leaving a completelyclean surface.
Copending patent applications Nos. IL 115931 and IL 119246 (attorney's docket No. 4009) of the same applicant, the contents of which are incorporated herein by reference, describe and claim improved processes for laser removal of foreign materials from surfaces in the presence of reactive gases.
EP-A 0 200 089, corresponding to U.S. Pat. No. 4,670,639, discloses and claims a method for forming narrow metal-free strips in a metallic layer on a plastic sheet, from which capacitors are manufactured, which consists in moving the sheet relative to a plurality of pulse laser beams, arranged parallel to one another in a single plane parallel to the direction of translation of motion of the sheet, to successively generate metal-free areas which are overlapped to form a narrow, completely metal-free strip. The footprint of the laser beam is circular and therefore adjacent two prints overlap to form a wavy edge. The metal-free strips are spaced from one another to leave a metallized area between them. The plastic sheet is then divided into capacitor elements in correspondence to the metal-free strips, which constitute an insulating edge region of the metallization.
While reference is made in this specification to the ablation of photoresist from semiconductor wafers, this will be done for the sake of simplicity, and because it represents a well known and widely approached problem. It should be understood, however, that the invention described hereinafter is by no means limited to the stripping of photoresist from wafers, but it applies, mutatis mutandis, to many other applications, such as stripping and cleaning of photoresist from Flat Panel Displays (FPD) or removal of residues from different objects, such as lenses, semiconductor wafers, or photo-masks.
The laser treatment for the removal of foreign material from surfaces, developed by the art until now, have been found to present certain drawbacks.
One drawback consists in that, as the laser beam sweeps over the surface to be treated, the gases in contact with said surface become depleted of oxidizing components and therefore less effective for the treatment and the depleted gases diffuse beyond the zone which has undergone treatment to the neighboring zones, so that, as the laser beam sweeps over said surface, it encounters increasingly depleted and ineffective gases. Another drawback is that, as a zone of the body being treated is contacted by the laser beam and heated thereby, heat is transferred to some extent to neighboring zones, so that as the laser beam sweeps over the surface to be treated, it encounters zones increasingly heated by conduction, the temperature of which becomes increasingly higher than that required for the treatment. A further drawback is that relatively deep and narrow depressions of the surface to be treated, and particularly their side walls, are not reached by the laser beam as fully as desirable
It is a purpose of this invention to provide an improved process and apparatus for laser removal of foreign materials from surfaces.
It is another purpose of this invention to provide such a process and apparatus which eliminates the drawbacks of the known processes.
It is a further purpose of this invention to provide such a process and apparatus for laser treatment in the presence of reactive gases which permits to maintain an optimal composition of said gases over the treated zones.
It is a still further purpose of this invention to provide such a process and apparatus which avoids overheating of any portions of the treated body.
It is a still further purpose of this invention to provide such a method and apparatus that are based on simple and reliable optical means.
It is a still further purpose of this invention to provide such a method and apparatus that permits fully to treat the depressions of the treated surfaces, and in particular their side walls.
It is a still further purpose of this invention to provide a method and apparatus for the surface treatment of materials by laser pulses wherein which provide essentially stable conditions from pulse to pulse, without residual influence from previous pulses.
Other purposes and advantages of the invention will appear as the description proceeds.
The method of laser treatment of surfaces according to the invention comprises the steps of:
1) projecting onto the surface to be treated laser pulses defining a beam;
2) causing said beam and said surface to be treated to become relatively displaced in such a way that said beam will intersect at each number of pulses, preferably at each pulse, an area of said surface that is different from and non-adjacent to the area the beam intersected before said displacement; and
4) continuing to cause that the beam and said surface to be treated so to become relatively displaced, until all of said strips have thus been treated by the laser beam.
Preferably, the surface to be treated is ideally divided into a number of strips and said beam and said surface are caused to become relatively displaced in such a way that said beam will intersect at each number of pulses, preferably at each pulse, an area of said surface comprised in a strip that is different from and non-adjacent to the strip in which was comprised the area the beam intersected before said displacement.
The surface to be treated will be called hereinafter "the substrate surface". The substrate surfaces are generally not plane or smooth, but have projections and/or recesses created e.g. in the masking process or in another process used for imparting to said surface the desired pattern and properties. The expression "ideal surface corresponding to the surface to be treated" or "to the substrate surface", or, briefly "ideal surface", as used in this specification and claims, means the plane or smooth surface that would result from the smoothing out of said projections and/or recesses, or, in other words, the surface that existed before said masking or other process was carried out and would still exist had it not been carried out.
Preferably, the laser beam impinges on the ideal surface at an angle to the perpendicular to said surface.
In a preferred form of the invention, the relative displacement of the beam and said substrate surface comprises two displacement components: a switch of the beam from strip to strip and a scanning motion perpendicular of said strips. More preferably, the switch occurs between non-adjacent strips, and the scanning is continuous. Still more preferably, the switch is synchronous with the laser pulses and the scanning occurs at such a rate as to cause the laser beam to impinge a number of times on each point of substrate surface, said number of times being such as to cause the beam to apply to each such point a predetermined amount of energy.
The center lines of the strips can have any configuration, e.g. they may be circular, elliptical, spiral-shaped or have more complicated shapes. In a preferred embodiment of the invention, however, they are rectilinear.
While the last mentioned embodiment of the invention will be particularly described hereinafter, it should be understood that it constitutes only an example and that its description is not limitative in any way.
The relative scanning motion of the laser beam and of the substrate surface can be produced by displacing either the beam or the surface itself.
Preferably, the relative switches of the laser beam with respect to the substrate surface are synchronized with the laser pulses, generally so as to produce one switch for each passage from one pulse to the next.
In a preferred embodiment of the invention, the laser beam is firstly directed at any given portion of the substrate surface at a slant to one side of the perpendicular to the ideal surface and, after at least two switches, is directed to said portion or substantially thereto, at a second slant opposite to said first one. It can be said that, if α is the absolute value of the angle between the laser beam and said perpendicular, the beam is slanted alternatively by +α and by −α. α is chosen as a function of the expected "Aspect Ratio", which is the ratio of depth to width of the depressions of the surface to be treated. Angle α is higher if the Aspect Ratio is lower, and vice versa. Indicatively, α may be the angle the cotangent of which is equal to the expected Aspect Ratio. While in the embodiments described it is assumed to be about 20�,it could have different values and, e.g., could be as high as 60� or even higher. When said angle is 20�, the expected Aspect ratio is close to 3 (2.777).
When the invention is used in laser stripping processes which involve treatment is an oxidizing atmosphere, as hereinbefore recalled, the process comprises feeding a reactive gas to flow over the substrate surface. In this case, preferably, the gas flows parallel to the strips in which the substrate surface is ideally divided.
The apparatus for carrying out the said method comprises, in combination with means for generating a laser beam constituted by a succession of pulses, means for deviating the laser beam and directing it to impinge successively on different, non-adjacent zones of a surface to be treated, according to a predetermined displacement succession.
The aforesaid laser beam generating, deviating and directing means, together, will be called sometimes "the laser beam apparatus".
In a preferred form of the invention, the substrate surface is ideally divided into a number of strips, and the means for deviating the laser comprise means for switching the beam from strip to strip and means for generating a relative scanning motion perpendicular of said strips. More preferably, the switching means switch between non-adjacent strips, and the scanning motion is continuous. Still more preferably, the switching means are synchronous with the laser pulses and the scanning motion has such a speed occurs as to cause the laser beam to impinge a number of times on each point of substrate surface, said number of times being such as to cause the beam to apply to each such point a predetermined amount of energy.
The laser beain can be deviated e.g. by means of prisms or of mirrors or of a combination of prisms and mirrors, and these and all other deviating means, collectively called "the beam deviating means", are included in the scope of the invention.
Preferably, the laser beam deviating and directing means are such and are so synchronized with said succession of laser pulses that the laser beam impinges on each zone of the substrate surface twice and at opposite slants thereto.
A preferred form of the apparatus for carrying out the method of the invention comprises, in combination with means for generating a laser beam:
I—a movable support carrying a number of laser beam upper deviating means, such as upper prisms (or mirrors);
II—means for actuating said support, particularly to rotate, to move at a controlled speed;
III—means for directing the laser beam to an active position, that is successively occupied by each of said upper deviating means, as the support moves;
IV—a stationary laser beam deviating means assembly, comprising a number of pairs of lower deviating means, such as prisms (or mirrors);
V—said upper deviating means being so shaped or oriented that each one of them directs said laser beam to a different one of said lower deviating means;
VI—said lower deviating means being so shaped (or oriented) as to direct said deviated laser beam towards the surface to be treated;
VII—the two lower deviating means of each said pair directing the twice deviated laser beam to the same zone of said surface at opposite slants thereto; and
VII—means for relatively displacing said beam deviating means and said surface to be treated.
Preferably, said upper and lower deviating means are prisms or mirrors; and, more preferably, said means for actuating said support are so controlled that the frequency with which a prism (or mirror) occupies said active position is equal to the frequency of the laser pulses.
In a further preferred form of the apparatus, said support is a rotating wheel having a number of upper prisms (or mirrors) at its periphery, and the means for directing the laser beam to an active position successively occupied by each of said upper deviating means, as the support moves, are means for directing the laser beam to a position at said wheel periphery wherein it impinges successively on each of said prisms (or mirrors) as the wheel rotates.
Therefore, in such a form of the apparatus for carrying out the method of the invention comprises, in combination with means for generating a laser beam:
I—a rotating wheel having a number of upper beam deviating means at its periphery;
II—means for directing the laser beam to a position at said wheel periphery wherein it impinges successively on each of said beam deviating means as the wheel rotates;
III—a stationary beam deviating means assembly, comprising a number of pairs of lower beam deviating means;
IV—said upper beam deviating means being so shaped or oriented that each one of them refracts (or reflects) said laser beam to a different one of said lower beam deviating means;
V—said lower beam deviating means being so shaped (or oriented) as to refract (or reflect) said refracted (or reflected) laser beam towards the surface to be treated;
VI—the two lower beam deviating means of each said pair directing the twice refracted (or reflected) laser beam to the same elementary surface of said surface at opposite slants thereto; and
VII—means for relatively displacing said wheel, upper prisms and lower beam deviating means and said substrate surface.
When the invention is used in laser stripping processes, such as those hereinbefore recalled, the apparatus also comprises a device, generally a cassette, for holding the body of which the substrate surface is a part (which can be briefly called "treated body"), e.g. a wafer, and providing a reactive gas atmosphere, and the means for relatively displacing the laser beam and the substrate surface may be means for displacing said device for holding said treated body.
The method of the invention, however, could be implemented by means of apparatus different from that herein described and such implementations are within the scope of the invention and of the claims appended hereto.
In the drawings:
FIG. 1 is a schematic drawings which illustrates the intersection of the laser beam with the elementary portions of the substrate surfacing an embodiment of the method of the invention;
FIG. 2 is a schematic drawing illustrating the means by which the laser beam is directed onto the substrate surface in said embodiment;
FIG. 3 schematically illustrates the operation of the upper and lower prisms of an apparatus according to an embodiment of the invention;
FIG. 4 is a schematic cross-section of the rotating wheel carrying the upper prisms, taken along the plane passing through the axis of the wheel and two, diametrically opposite prisms, in an apparatus according to an embodiment of the invention;
FIG. 5 is a schematic perspective view of the assembly of lower prisms, in the same apparatus;
FIG. 6 is a partial cross-section of the assembly of FIG. 5 taken along plane VI—VI of FIG. 5;
FIG. 7 is a schematic perspective view illustrating another embodiment of the invention;
FIG. 8 geometrically illustrates the ideal division of the surface to be treated into different strips and elementary portions; and
FIG. 9 is similar to FIG. 8 and schematically illustrates a preferred variant of the invention.
FIG. 8 geometrically illustrates the division of the treated surface into strips and elementary portions and has the main purpose of clarifying the terms used hereinafter in the description of the invention. The surface to be treated is ideally divided into strips 10, one of which is evidenced by hatching. The direction of the axes of the strips will be called the Y-axis or Y-direction or "the transverse direction". The strips, therefore, are transversely directed. They are distinguished by ordinal numbers I, II, . . . etc. Their number of strips will be indicated by "N" and is eight in FIG. 8, but this is of course only an example and "N" may be any convenient number. Each strip is ideally divided into a number of elementary portions 11, which are rectangular, having one side parallel to the Y-axis and the other perpendicular thereto, viz. parallel to what will be called the X-axis or the X-direction or "the longitudinal direction". Two such elementary portions are evidenced by crosshatching. The number of elementary portions in each strip is undetermined in FIG. 8, since the treated surface is shown as broken off parallel to the X-axis. The elementary portions or cells 11 have no independent or physical existence: they are merely areas defined by the area of the intersection of the laser beam with the ideal surface to be treated or ideal substrate surface and reference is made to them for the purpose of describing the invention, on the one hand, and of determining certain parameters relevant to carrying it out, on the other hand. Actually, for the aforesaid purposes the cells are preferably assumed to be slightly smaller than the intersections of the laser beams with the ideal surface. The cells that are aligned perpendicularly to the aforesaid strips form a longitudinal, strip-like area of the substrate surface and will be referred to as a "(longitudinal) row" of cells. The side of each elementary portion parallel to the X-axis, which is the longer side in FIG. 8, will be called its "length", and the side parallel to the Y-axis will be called its width. This should not be construed as implying that the side parallel to the X-axis must be the longer side: this is true in the preferred embodiment of the invention that will be described, but in other embodiments the opposite might be true.
FIG. 1 schematically shows in perspective view a longitudinal row of cells or elementary portions 11, each belonging to a different transverse strip. Since in this embodiment said strips are in the number of eight, the elementary portions are identified by the ordinal number of the strip to which they belong, viz. by 11-I, 11-II, . . . , 11-VIII.
The laser beam, by which the substrate is treated, will switch longitudinally from strip to strip and will scan transversely along each strip in the manner which will be described, and always impinges on the substrate, or more accurately, on the ideal substrate, on an area having the dimensions of an elementary portion or slightly larger, as has been said. However, it does not impinge perpendicularly to the ideal substrate, but at a slant from two opposite directions. This is shown in FIG. 1, in which beams 15 impinging onto the substrate surface from one direction and beams 16 impinging onto it from the opposite directions are shown in schematic perspective view. As seen in FIG. 1, the slanted directions are such that one would pass from the one to the other by a rotation about an axis parallel to the X-axis, or, in other words, the beams are slanted towards each longitudinal row of cells from the two sides thereof. The X- and Y-axis (see FIG. 8) are indicated in FIG. 1. When the treatment is carried out in a reactive gas atmosphere, the gas flows in the direction of the Y-axis.
Various positions of the laser beam are indicated in FIG. 1. Although, as has been said hereinbefore, the dimensions of the beam are such that it intersects an area of the substrate surface that is slightly larger than the elementary portion, in FIG. 1, for the sake of simplicity, the beam is shown as intersecting exactly an elementary portion. In order to evidence the various positions of the beam, two cross-sections of a beam intersecting the same elementary portion 11-I at different slants are schematically shown in cross-hatching. If it is arbitrarily assumed that the slant is positive when the beam must be rotated clockwise with respect to the substrate surface in order to render it parallel to the perpendicular to the surface, and is negative when it must be rotated counterclockwise, then beam 15 is slanted at +α and beam 16 at −α.
The way in which the laser beam is switched from strip to strip can be exemplified as follows. Say that at the beginning the laser beam is directed to impinge on an elementary portion of the substrate surface with a positive slant at +α, and say, on cell 11-I. Then at the next pulse, the beam is shifted to impinge at the same slant on another cell of the same longitudinal row, comprised in another strip not adjacent to the preceding one. A succession of beam positions in different strips is established. A possible succession, in the case of FIG. 1, may be: 11-I, 11-IV, 11-VII, 11-II, 11-V, 11-VIII, 11-IlI, 11-VI. At this point all the cells 11 of the longitudinal row 12 that is being treated have been intersected by the beams at a slant +α. The slant is then reversed and the succession is repeated on the same longitudinal row 12 until all the cells 11 of said row 12 have been intersected by the beam at a slant −α. Then the entire row 12 has been treated and the beam must be transversely switched to treat another similar longitudinal row. However, while the (longitudinal) switch of the beam from one transverse strip to another occurs discontinuously, the (transverse) scanning motion of the beam from one longitudinal row to another occurs continuously, all by means that will be exemplified hereinafter. It will be understood that the means that produce the (longitudinal) switching also determine the length of the displacement that occur in each switch and that length, obviously, is the longitudinal dimension of each strip, viz. the length of a cell and depends on the parameters according to which the invention is carried out in each case. Thus each of the strips into which the substrate surface is ideally divided has a length—a transverse dimension—equal to one side of the substrate surface and a width—a longitudinal dimension—equal to the length of each switch of the laser beam. The transverse dimension depends on the size of the substrate surface; the longitudinal dimension depends on the process parameters.
FIG. 2 schematically illustrates how a laser beam, generated by any conventional generator, not illustrated, is directed at the desired slant onto the zones of the surface to be treated. Numeral 20 indicates a rotating wheel which has at its periphery a plurality of prisms 21 having different shapes, such as to produce the desired refraction effects that will be described. A laser beam 22, coming, for example, from a vertical direction as seen in the drawing, viz. parallel to the axis of wheel 20, will impinge on whatever prism 21 occupies at the moment a position along the path of the beam 22. Prism 21 will refract the laser beam producing a refracted beam. Two revolving prisms 21-21′, only one of which is shown in FIG. 2, are associated with a pair 23, 23′ of lower prisms, supported and assembled as will be described hereinafter. One of the two prisms 21-21′ will produce a ray 24 which impinges on prism 23, while the other of said two prisms will produce a refracted ray 24′ which impinges on the lower prism 23′. Prism 23 will refract the ray so that it produces a ray 25 which impinges on a given elementary portion of the substrate surface at a slant +α, while prism 23 will produce a refracted ray 25′ which will impinge on the same elementary portion at a slant −α. The substrate surface is indicated at 26 and is part of a body such as a wafer 27. As has been said, mirrors, or other beam deviating means can be used in place of prisms.
The rotational speed of the wheel is constant and is calculated so that, if one multiplies the number of beam deviating means by the revolutions per second, one gets the maximum pulse rate of the laser, thus maximizing utilization of the laser.
As each prism (or mirror) moves in place, a pulse is sent to the laser, triggering it so that when the laser pulse arrives, it passes through said prism (or impinges on said mirror) and is deflected in the desired direction. Since the beam deflecting means must permit to shift the beam to impinge successively to all the transverse strips and on each strip from both lateral slants, the number of deflecting means must be equal (at least and preferably) to twice the number of strips, viz. to 2N. In the embodiment described, there are 8 strips and the deflecting means must be (at least and preferably) 16.
As has been said, the laser beam, besides being switched from one transverse strip to another, must also be scanned in a longitudinal direction along each strip. As has been said, the scanning is preferably continuous, viz. due to a continuous relative motion between the laser beam apparatus and the substrate surface. The scanning speed depends on the amount of energy that it is wished to be applied to each point of the substrate surface. Knowing the energy of the laser, one can easily calculate how many times the laser should impinge on each point of the substrate surface to apply to it the desired energy amount. Let us say that each elementary portion or cell has a length 1 and a width w. Then the area on which the laser beam impinges on the substrate surface at each pulse is lw, and if the elementary laser is E, the average density is E/lw. Based on this figure, one can determine how many times the laser must impinge on each point of the substrate surface in each treatment. Let us say that said number is n/sec. The speed with which the beam deviating means succeed one another in the path of the beam determines the frequency with which the beam is deflected in a given direction. Let us say that it is deflected in each direction, with each of its two possible slants (positive and negative), n times per second. Then in order that it should impinge on each point of the substrate surface m times per second, the scanning speed must be nw/m.
Say, by way of example, that the laser is designed for 250 pulses per second and that the beam deflecting means, e.g., prisms, are carried by rotating wheel in a number of 16, the transverse strips of the substrate surface being 8. By way of example, each prism may be 40 mm wide and be spaced by 5 mm from its neighbor. In that case, the internal diameter of the wheel will be 230 mm. Each one of the 16 prisms deflects the laser beam so that it will impinge on the substrate surface from either +20� or −20. The rotational speed of the wheel carrying the beam deflecting means should then be 250/16 =15.625 revolutions per second, because at this rotational speed, a beam deflecting means will be in place 16�15.625=250 times per second, and each time this happens, the laser will be triggered. Let us assume, by way of example, that the length of each elementary portion is 25 mm and its width is 3.7 mm. In that case, the scanning speed should be 15.625�3.7/10=5.8 mm/sec.
The wheel—or any other moving element carrying the upper beam deflection means—is automatically synchronized with the laser. There is no need for continuously controlling the synchronism: it suffices that said moving element be actuated at such a rate that the laser, operating at its optimal pulse rate, should fire when the beam deflection means are in place. The apparatus is so designed and operated as to produce the shifts and changes of the inclination of the laser beam along each transverse strip of the substrate surface, as has been described hereinbefore. For this purpose, all the prisms must have a specific shape, easily determined by a person skilled in the art, and the diameter and number of revolutions of rotating wheel 20 must be such that the successive prisms of the rotating wheel come into contact with the laser beam with a frequency that is related to the frequency of the pulses of said beam.
FIG. 3 schematically illustrates the way in which the laser beam 22 impinges on a revolving prism 21 (or 21′) and is refracted by it as a beam 24 (or 24′), which impinges on a lower prism 23 (or 23′) to produce a ray 25 (or 25′) which finally impinges on the surface to be treated.
FIG. 4 is a schematic cross-section of an example of a rotating wheel 20, taken on an axial plane passing through two diametrically opposite prisms 21-21 a. 32 indicates the body of the wheel, which is keyed to a rotary shaft in any convenient way, not shown. Prisms 21-21 a are mounted on the wheel by means of upper retaining element 33 and lower retaining element 34, which are locked to one another by bolts, not shown in the drawing, passing through seats such as seats 35-36 and 37-38, and hold the prism firmly between them. It is apparent that many mechanical solutions can be adopted in structuring and mounting the wheel and securing the prisms to it, and that persons skilled in the art will have no difficulty in devising the best solutions for each particular case. Likewise, there will be no difficulty in mounting mirrors instead of prisms on the wheel.
FIG. 5 shows in perspective view an assembly of lower prisms which comprises eight pairs of prisms 23 and 23′, and FIG. 6 is partial cross-section thereof. The prisms numbered from 1 to 8: 23-1, 23-2, . . . , 23-8, and 23′-1, 23′-2, . . . , 23′-8. Prisms 23-1 and 23′-1 of the first pair are associated with the first cell 11-1 of each strip of the substrate surface, prisms 23-2 and 23′-2 of the second pair are associated with cell 11-2, and so forth. The prisms are supported in a housing generally indicated at 30, a part of which is broken off in the drawing for purposes of illustration. The upper part of the housing, which is not shown, has no influence on the optics of the apparatus and serves to mount the assembly in place. Therefore it may have any structure that is suitable for this purpose in each particular apparatus
The treated body can be supported in any suitable way in the desired positioned relationship with respect to container 30. It may be displaced relatively to it—and therefore to the entire laser beam apparatus, since the lower deviating means are in a fixed position with respect to the axis of the wheel carrying the upper deviating means and to the laser generating means—to provide the scanning motion. Or the treated body may be kept stationary and the whole laser beam apparatus—laser source, rotating wheel axis and lower deviating means assembly—be moved to provide the scanning motion. In any case, providing the mechanical means for producing the scanning motion is within the capabilities of skilled persons and such means may be conventional and therefore are not described.
Means for supporting a body, particularly a wafer, are known in the art. For instance, a cassette used for processing wafers by laser in the presence of another reactive gas is described in copending application of the same applicant No. 115934, the contents of which are incorporated herein by reference. However, other supports can be easily devised by persons skilled in the art, it only being sufficient that they should support the treated body and allow passage of the laser beam to impinge on it, and further that, if the laser treatment is carried out in the presence of a reactive gas, means be provided for causing the gas to flow over the treated body.
The invention provides an improvement over previously known processes and eliminates the drawbacks which have been pointed out hereinbefore. Say, for example, with reference to FIG. 1, that the laser beam has treated portion 11-IV and has now shifted to portion 11-VII. When the treatment is carried out in the presence of a reactive gas, it will have become depleted of oxidizing components in correspondence to portion 11-IV and to a lesser, but significant extent in correspondence of the adjacent portions 11-III and 11-V However, its composition will be quite intact in correspondence of portion 11-VII, which is now being treated by the laser beam. Some time will pass before the laser beam returns to section 11-IV: precisely the time required to treat six other portions. In this period of time, the gas, in correspondence of portion 11-IV, will have been fully replaced by fresh gas blown across the treated surface and will have the optimal composition. While portions 11-III and 11-V, in correspondence to which the gas has been partially depleted, will be treated before section 11-I, a replacement of partially depleted gas with fresh gas will have occurred to a sufficient extent before they are so treated.
Likewise, when the laser has treated section 11-IV, it will have partially heated sections 11-III and 11-V also. The effect of the partial heating, however, will have disappeared and the undesired heat will have been dissipated before the laser returns to section 11-IV or to neighboring sections. These features of the invention permit to operate with a greater frequency of pulsing, whereby the process has high yield and is particularly effective.
Further, the fact that the laser beam is directed at an angle to the perpendicular to the ideal surface, and, preferably, at two symmetrical angles thereto, permits the. beam to illuminate the side walls of depressions that have a high Aspect Ratio better than would a perpendicular beam. In this way, and because the slant of the laser beam is reversed in two successive impingements on the same zone, no portions of the actual treated surface are beyond its reach, nor are zones of shadow created in which the treatment would be ineffective. This is a very important feature, particularly in the semiconductor industry.
Another feature of the invention is that the beams illuminating each cell do not seem to come from a single point. Each cell is illuminated by two beams, at +20� and −20�, seeming to originate from a plane perpendicular to the substrate surface. This generates two lines virtual illuminating sources, equal in number to the number of cells, each of said sources illuminating its own cell.
It is seen therefore that the invention provides a substantial progress of the art.
It will be understood, from the following description, that, in view of the fact that the scanning motion is continuous, the laser beam never returns exactly to the same cell. It would be possible to cause it to so return by producing a scanning motion which is incremental and is such that the beam shifts, relatively to the substrate surface, in the direction of the Y axis after each "m" pulses. This variant is comprised in the invention. However, it involves mechanical complications and a continuous scanning motion is preferred. In this motion, the intersection of the laser beam with the substrate surface, which has the dimension of a cell, shifts continuously in the direction of the Y axis, so that the cells have no independent structure or functional existence, and are merely ideal process units used in calculating the parameters of the method and apparatus according to the invention.
It should be noted that if the scanning of the laser beam is begun from a longitudinal row 12 that is at an edge of the substrate surface, that row will not receive the same, full amount of energy that it is intended to apply to each row and that is in fact applied to the other rows. In order that said first row should be fully treated, it is necessary to start the scanning of the laser beam from an additional longitudinal row that is not part of the substrate surface and is located before the edge of said surface. This is illustrated in FIG. 9, which is similar to FIG. 8, and in which the first, marginal row 12 of the substrate surface is evidenced by hatching, and additional row 12′, not part of said surface, from which the scanning of the laser beam is begun, is shown in broken lines.
As has been said before, mirrors can be used in place of prisms. FIG. 7 illustrates in schematic perspective view, an embodiment using mirrors. A mirror wheel 40, rotatable by means not illustrated, carries on its periphery a number of mirrors 41, a laser beam 42 is so directed as to impinge on the periphery of the wheel to each prism when it reaches a certain angular position. The mirrors reflect the laser beam as indicated at 43 onto lower mirrors schematically indicated at 44 and 44′, which correspond to beam angles +α and −α and reflect the beam, e.g., as indicated at 46, onto the substrate surface schematically indicated at 45. In all respects other than the use of reflecting instead of refracting elements for deviating the laser beam, this embodiment need not differ from those previously described.
While specific examples of the invention have been described by way of illustration, it will be apparent that the invention can be carried out by persons skilled in the art with many modifications, variations and adaptations, without departing from its spirit or exceeding the scope of the claims.
|Cited Patent
|Filing date
|Publication date
|Apr 9, 1986
|Jun 2, 1987
|Siemens Aktiengesellschaft
|Method for the formation of narrow, metal-free strips in a metal layer on plastic sheets
|Jan 15, 1988
|Aug 15, 1989
|Metal Box Public Limited Company
|Continuous seam welding apparatus and methods
|Nov 8, 1988
|Apr 3, 1990
|University Of Southern California
|Method and apparatus for shaping articles using a laser beam
|Sep 14, 1989
|May 19, 1992
|Yehuda Nachshon
|Photoresist removal
|Jun 10, 1992
|Aug 3, 1993
|Fujitsu Limited
|Method of improving surface morphology of laser irradiated surface
|Feb 18, 1993
|Dec 12, 1995
|Method and system for scanning a laser beam for controlled distribution of laser dosage
|Title not available
|Title not available
|Sep 2, 1994
|Mar 16, 1995
|Uvtech Systems, Inc.
|Surface processing
|Citing Patent
|Filing date
|Publication date
|Oct 15, 2002
|Mar 7, 2006
|General Lasertronics Corp.
|Rotary scanning laser head with coaxial refractive optics
|Sep 26, 2003
|Apr 21, 2009
|Nuclear Decommissioning Authority
|Surface treatment of concrete
|Sep 26, 2003
|Jul 13, 2006
|Brown Stephen C N
|Surface treatment of concrete
|U.S. Classification
|134/1.3, 134/1, 134/902
|International Classification
|Cooperative Classification
|European Classification
|Dec 13, 1999
Owner name: ORAMIR SEMICONDUCTOR EQUIPMENT LTD., ISRAEL
Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:ZAHAVI, DOV;LEVINSOHN, NATATLIE;GHILAI, SHAY;REEL/FRAME:010477/0643;SIGNING DATES FROM 19990621 TO 19991208
|Apr 5, 2006
|Maintenance fee reminder mailed
|Sep 18, 2006
|Lapse for failure to pay maintenance fees
|Nov 14, 2006
|Expired due to failure to pay maintenance fee
Effective date: 20060917


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tag:sqlmonitor.uservoice.com,2008-02-07:/activity Red Gate Software on UserVoice 2016-07-15T15:26:12+08:00 tag:sqlmonitor.uservoice.com,2008-02-07:Event/38537901 2016-07-15T15:26:12+08:00 2016-07-15T15:26:12+08:00 Navigation for "rewind time" shouldn't hide navigation buttons [updated]
The navigation controls for "rewind time" autohide when actively using this feature. Please consider enabling until "live" is chosen again to simplify operation to move back and forth in time increments. Issue submitting first time. if duplicate please close.

Adam said:

We're hoping the new server overviews will be an improvement for you, as we have made changes to the controls for going back in time and they no longer autohide. It would be great to get your feedback

 Adam tag:sqlmonitor.uservoice.com,2008-02-07:Event/38317602 2016-07-08T22:57:14+08:00 2016-07-08T22:57:14+08:00 Filter "Blocking Process" alert by User or Application or Database
Anonymous suggested:
We frequently get high-severity "Blocking process" alerts via email for a SSRS database that I'd like to ignore. We sometimes get so many alerts that the new SQL Monitor sends, "You've received more than 30 of these alerts in the past 24 hours so we're going to stop sending them for a while." Unfortunately the alerts caused by the SSRS database mean our Inbox is full of noise and we miss our important application database alerts. Please add the ability to filter which User/Application/Database cause these alerts to be raised, similar to some other alerts that support Regular Expression filters.
 Anonymous tag:sqlmonitor.uservoice.com,2008-02-07:Event/38091984 2016-06-30T06:39:42+08:00 2016-06-30T06:39:42+08:00 It would be nice if we are able to create scheduled reports and Emailed.
Prasanth Matikana suggested:
Generate scheduled reports on every added instance. For example: A weekly health report or Weekly long running query report or monthly Database growth report etc.
 Prasanth Matikana tag:sqlmonitor.uservoice.com,2008-02-07:Event/38036361 2016-06-28T22:12:27+08:00 2016-06-28T22:12:27+08:00 Use extended events instead of trace when trace initialized due to alert [updated]
I have seen a related idea https://sqlmonitor.uservoice.com/forums/91743-suggestions/suggestions/5717202-use-extended-events-for-deadlock-tracing-instead However, I'm expanding this. If the SQL version is high enough the trace of current activity should be using extended events instead of a trace, this would reduce the total impact to the server performance while also expanding the available information.

Sheldon Hull said:

Followup. This is really important to support going forward. The overhead for servers is much lower, so the monitoring can actually be more detailed with less impact to server performance. Reducing the monitoring load while gathering more metrics would be a great gain. Any idea of the roadmap for this?

 Sheldon Hull tag:sqlmonitor.uservoice.com,2008-02-07:Event/38036298 2016-06-28T22:10:48+08:00 2016-06-28T22:10:48+08:00 Navigation for "rewind time" shouldn't hide navigation buttons
Sheldon Hull suggested:
The navigation controls for "rewind time" autohide when actively using this feature. Please consider enabling until "live" is chosen again to simplify operation to move back and forth in time increments. Issue submitting first time. if duplicate please close.
 Sheldon Hull tag:sqlmonitor.uservoice.com,2008-02-07:Event/38030484 2016-06-28T17:52:36+08:00 2016-06-28T17:52:36+08:00 add the table schema to alerts
Eric Moreau suggested:
On that alert (fragmented index), you see a table name. It would be helpful to see the schema to which that table belongs. Medium Fragmented indexes Raised on: XXXXXXXX > RedGateMonitor Time raised: 26 Jun 2016 1:00 AM (UTC-04) Details Database name: RedGateMonitor Total number of indexes: 332 Indexes above fragmentation threshold: 3 Indexes last checked: 26 Jun 2016 1:00 AM Fragmented indexes: Index Table name Fragmentation(%) No. of pages Cluster_SqlServer_ServerWaits_UnstableSamples_Id_CollectionDate Cluster_SqlServer_ServerWaits_UnstableSamples 96 1175 Cluster_SqlServer_SqlProcess_UnstableSamples_Id_CollectionDate Cluster_SqlServer_SqlProcess_UnstableSamples 96 3288 Cluster_SqlServer_TopQueries_UnstableSamples_Id_CollectionDate Cluster_SqlServer_TopQueries_UnstableSamples 99 1758
 Eric Moreau tag:sqlmonitor.uservoice.com,2008-02-07:Event/37708026 2016-06-17T03:37:06+08:00 2016-06-17T03:37:06+08:00 Add an option to schedule when custom metrics run against a given database. [updated]
Currently when a custom metric is executed can only be controlled by the frequency (daily, hourly, etc). My primary purpose is for daily. I would like to schedule the time of day a daily metric is run per database, or at least server. The custom metrics I pull back are time sensitive so controlling when the metric is returned is a must. A more advanced option to this would be going beyond simply choosing the time of day for daily runs, but rather the ability to build a custom schedule of run times. An example might be Custom Metric A runs against Database 1 at 1000, 1400, 1900 and runs against Database 2 at 1030, 1100, 1130, 1200...

Ram Vaishnapu said:

We need to schedule the custom metrics jobs to given time, We would like to run these jobs in non-business hours, so database performance will not impact on our production applications. Please consider this one as future enhancement.

 Ram Vaishnapu tag:sqlmonitor.uservoice.com,2008-02-07:Event/37693965 2016-06-16T17:50:48+08:00 2016-06-16T17:50:48+08:00 Use extended events for deadlock "tracing" instead of a trace flag [updated]
If the SQL Server version is high enough, using extended events to capture deadlock information would be preferred to using a trace flag.

Mathew Walters said:

It doesn't really make sense using trace flags for deadlock detection since extended events has been around. Using the system health session is good because it is already built into the product. I would also like the option of having SQL Monitor create a separate deadlock XE, this is because I have worked with a few servers where the system_health XE gets flooded with other notifications so it gets cycled every few minutes.

 Mathew Walters tag:sqlmonitor.uservoice.com,2008-02-07:Event/37644720 2016-06-14T22:37:35+08:00 2016-06-14T22:37:35+08:00 On the main dashboard please maintain a consistent ordering. [updated]
Dashboard element sorting should be fixed preferably in alphabetical order. The whole idea of a dashboard should be to provide an at a glance view of the state of your server set. When you change the order from servername when all is green to some other order because something has triggered an alert on a server I have to spend extra time figuring out which server has an issue because the sort order has changed.

matt.godfrey said:

Have you tried the pin functionality Sean to effectively watch something specific, or is it more about having all your monitored instances in a fixed position? If the later, this would obviously break the current ordering of severity/priority. Therefore, is it more important for you to have priority issues with across all MEs bubble to the top (irrespective of what they relate to) or to scan through a set that is fixed in order to identify issues relating to those MEs...thus doing your own prioritisation?

 matt.godfrey tag:sqlmonitor.uservoice.com,2008-02-07:Event/37642659 2016-06-14T21:03:19+08:00 2016-06-14T21:03:19+08:00 On the main dashboard please maintain a consistent ordering.
Sean Shanny suggested:
Dashboard element sorting should be fixed preferably in alphabetical order. The whole idea of a dashboard should be to provide an at a glance view of the state of your server set. When you change the order from servername when all is green to some other order because something has triggered an alert on a server I have to spend extra time figuring out which server has an issue because the sort order has changed.
 Sean Shanny tag:sqlmonitor.uservoice.com,2008-02-07:Event/37570383 2016-06-10T22:51:49+08:00 2016-06-10T22:51:49+08:00 Offer integration with power bi
Sheldon Hull suggested:
I've love the ability to integrate SQL monitor with Power Bi for building dashboards of analysis graphs. Since Power BI is offering a powerful way to setup dashboards with metrics users/managers care about this would be a great way to enhance many analytical report options by outsourcing the creation of those to users more and more, and offering the integration with power bi to make it easy to do. SQL Sentry offers an integration with their cloud product to work with their metrics and Power BI in case you want to evaluate how it might be used. https://www.sqlsentry.com/Company/News-Article/20150505-power-bi-content-pack-sql-sentry https://powerbi.microsoft.com/en-us/blog/monitoring-your-sql-sentry-data-with-power-bi/
 Sheldon Hull tag:sqlmonitor.uservoice.com,2008-02-07:Event/37568652 2016-06-10T21:46:43+08:00 2016-06-10T21:46:43+08:00 Monitor if all SQL Server related Windows services are running, especially Redgate SQL Backup Agent.
Trevor McComb suggested:
I have found that backup jobs fail, due to SQL Backup service not running. Knowing that the service has stopped would be a great metric to have. This could then be extended to monitor other Windows services.
 Trevor McComb tag:sqlmonitor.uservoice.com,2008-02-07:Event/37567863 2016-06-10T21:00:01+08:00 2016-06-10T21:00:01+08:00 Check the plan cache ad-hoc or on a schedule to report issues
Dennis Post suggested:
implicit conversion, scans, lookups and the index that didn't have the columns include missing indexes Parameter sniffing etc... Report the issues based on impact number
 Dennis Post tag:sqlmonitor.uservoice.com,2008-02-07:Event/37483209 2016-06-08T02:18:37+08:00 2016-06-08T02:18:37+08:00 Single sign on [updated]
Make it so that I can add an AD group to the settings, then enable AD Auth in IIS and not be prompted for username and password. LDAP settings should not be needed.

Murray said:

Agree with @Kenny: this is not completed. We are looking for out-of-the-box behavior identical to how it is done in DLM Dashboard, should be pretty easy actually.

 Murray tag:sqlmonitor.uservoice.com,2008-02-07:Event/37478745 2016-06-08T00:16:51+08:00 2016-06-08T00:16:51+08:00 Login via https
Brett Estes suggested:
Is there a configuration setting to force the SQL Monitor login page (or entire site, preferably) to https?
 Brett Estes tag:sqlmonitor.uservoice.com,2008-02-07:Event/37414776 2016-06-06T20:31:11+08:00 2016-06-06T20:31:11+08:00 Support for regular expressions [updated]
Most of the alarms need more granular support for excluding/including different things. Using regular expression is a good idea and should be extended further. For example you defenitly need to be able to filter out things from the alarm on the sql server errorlog. Without it's useless.

Tom Horner, SQL production DBA said:

I was asked to add to this item. I asked support: Is there any way to configure the "job duration unusual" alert to ignore certain jobs? In my case, I would like to ignore the transaction log backups SQL Agent jobs. Another alert allows one to ignore certain jobs, the "long running query" alert. Is there a way to do this for "job duration unusual" alert? I hope this planned change covers regular expressions for "job duration unusual" alerts also. Sometimes you have jobs that run long or slow compared to the average, but this is expected behavior and an alert is not necessary.

 Tom Horner, SQL production DBA tag:sqlmonitor.uservoice.com,2008-02-07:Event/37227747 2016-06-02T23:23:19+08:00 2016-06-02T23:23:19+08:00 Push 5.2 Alias down to Analysis and beyond [updated]
The write-up about the 5.2 Alias feature waxes almost lyrical about how much we would like it... Until you open the Analysis page and see the old names - in my case unintelligible I.P. addresses. Sad, very sad... Please make Aliases utterly pervasive, as in Analysis, Configuration => Monitored Servers (I.P. list), emails (just to make sure they're not overlooked).

matt.godfrey said:

Thanks Stephen. Interestingly we are seeing aliasing working in all places on the Analysis page. Could you possible provide some specific examples and ideally a screenshot we can work with?

 matt.godfrey tag:sqlmonitor.uservoice.com,2008-02-07:Event/37227660 2016-06-02T23:22:01+08:00 2016-06-02T23:22:01+08:00 Push 5.2 Alias down to Analysis and beyond [is now started]
The write-up about the 5.2 Alias feature waxes almost lyrical about how much we would like it... Until you open the Analysis page and see the old names - in my case unintelligible I.P. addresses. Sad, very sad... Please make Aliases utterly pervasive, as in Analysis, Configuration => Monitored Servers (I.P. list), emails (just to make sure they're not overlooked).
 matt.godfrey tag:sqlmonitor.uservoice.com,2008-02-07:Event/37227657 2016-06-02T23:22:01+08:00 2016-06-02T23:22:01+08:00 Push 5.2 Alias down to Analysis and beyond [updated]
The write-up about the 5.2 Alias feature waxes almost lyrical about how much we would like it... Until you open the Analysis page and see the old names - in my case unintelligible I.P. addresses. Sad, very sad... Please make Aliases utterly pervasive, as in Analysis, Configuration => Monitored Servers (I.P. list), emails (just to make sure they're not overlooked).

matt.godfrey (admin) responded:

We have already started a piece of works that attempts to plug a few gaps where aliases are not be displayed in various places in the UI.

 matt.godfrey tag:sqlmonitor.uservoice.com,2008-02-07:Event/37042338 2016-05-31T00:13:58+08:00 2016-05-31T00:13:58+08:00 Classic Dashboard Mode
Brian McCullough suggested:
The new global dashboard is great but it is harder to read at a glance then the old dashboard. Please add in a classic dashboard option.
 Brian McCullough tag:sqlmonitor.uservoice.com,2008-02-07:Event/36878133 2016-05-27T21:59:34+08:00 2016-05-27T21:59:34+08:00 Allow Groups to be created on Instance name rather than server name [updated]
For multiple instance hosts, each instance can have a separate functional purpose. However groups do not allow instance level granularity. It would be useful to have distinct instances from the same host in separate groups.

Eduardo Piairo said:

I have the same use case. Integration and Staging SQL instances in the same server. Grouping at instance level would be useful.

 Eduardo Piairo tag:sqlmonitor.uservoice.com,2008-02-07:Event/36740832 2016-05-26T00:35:51+08:00 2016-05-26T00:35:51+08:00 Alert History on new Overview - Don't show Cleared Alerts
Stephen A suggested:
The slide-out Alert pane is useful on the Overview IF, and ONLY IF, under *normal* circumstances we want to see NON-cleared Alerts, like the default filter on the Alerts page itself. Please make this pane behave like the Alert page's filter, and allow us to re-filter, to include cleared if we want to. But at the very least allow us to set a default filter (in my case NON-cleared). Thanks.
 Stephen A tag:sqlmonitor.uservoice.com,2008-02-07:Event/36698229 2016-05-25T02:14:07+08:00 2016-05-25T02:14:07+08:00 Alert Stats on the new Cards
Stephen A suggested:
Those new cards look very nice, BUT, they do not show anything about the alerts raised on the instance! That's a shocking omission, IMO. Please add something that shows the alerts, like the old Overview page did, like counts by severity, with colors!
 Stephen A tag:sqlmonitor.uservoice.com,2008-02-07:Event/36662853 2016-05-24T07:21:29+08:00 2016-05-24T07:21:29+08:00 Push 5.2 Alias down to Analysis and beyond
Stephen A suggested:
The write-up about the 5.2 Alias feature waxes almost lyrical about how much we would like it... Until you open the Analysis page and see the old names - in my case unintelligible I.P. addresses. Sad, very sad... Please make Aliases utterly pervasive, as in Analysis, Configuration => Monitored Servers (I.P. list), emails (just to make sure they're not overlooked).
 Stephen A tag:sqlmonitor.uservoice.com,2008-02-07:Event/36648432 2016-05-23T23:07:19+08:00 2016-05-23T23:07:19+08:00 Click on CPU part of the server block on global dashboard (version 5.2) leads me to serveroverview instead of graph
Eelco Drost suggested:
I would suspect to go to the graph (analysis tab) after I click on the CPU part of a serverblock (in Global Dashboard), instead of the server overview
 Eelco Drost tag:sqlmonitor.uservoice.com,2008-02-07:Event/36648354 2016-05-23T23:03:45+08:00 2016-05-23T23:03:45+08:00 Multiple group select on new Global Dashboard version 5.2
Eelco Drost suggested:
As an administrator, I want to be able to select one or more groups for displaying on the new global dashboard (added in version 5.2). Now you see all groups or one group.
 Eelco Drost tag:sqlmonitor.uservoice.com,2008-02-07:Event/36459738 2016-05-20T15:41:26+08:00 2016-05-20T15:41:26+08:00 It would be grand if I could change the time format.. 12 hour clocks just don't sit right with me. [updated]
It would be grand if I could change the time format.. 12 hour clocks just don't sit right with me.

MSt said:

Is this implemented now in 5.2? I can't find the option.

 MSt tag:sqlmonitor.uservoice.com,2008-02-07:Event/36378231 2016-05-18T23:38:26+08:00 2016-05-18T23:38:26+08:00 Additional parameters for filtering Long-running query alerts
SQLRich suggested:
Long-running query alerts Example: Creation of ability for you to filter the queries it alerts on based on a regular expression Source Ticket: https://redgatesupport.zendesk.com/hc/requests/65981 Possible closely related feature request: https://sqlmonitor.uservoice.com/forums/91743-suggestions/suggestions/11123559-triage-and-configure-repeating-alerts-more-efficie
 SQLRich tag:sqlmonitor.uservoice.com,2008-02-07:Event/36370713 2016-05-18T19:40:25+08:00 2016-05-18T19:40:25+08:00 Show deadlock alerts using the deadlock graph
Andrew Lackenby suggested:
Display deadlocks alerts in a more graphical and easier to understand way.
 Andrew Lackenby tag:sqlmonitor.uservoice.com,2008-02-07:Event/36319338 2016-05-17T02:44:43+08:00 2016-05-17T02:44:43+08:00 Configure Data Purge by Server/Instance or at least by Server group.
Ray Herring suggested:
I would like to keep production server performance data for a month or more but the dev server data can be purged after a couple of weeks.
 Ray Herring tag:sqlmonitor.uservoice.com,2008-02-07:Event/36314709 2016-05-16T23:36:07+08:00 2016-05-16T23:36:07+08:00 Customise alert messages for custom metrics
Andrew Lackenby suggested:
Add the ability to display the results of a query when generating an alert from a custom metric
 Andrew Lackenby tag:sqlmonitor.uservoice.com,2008-02-07:Event/36283191 2016-05-15T02:18:27+08:00 2016-05-15T02:18:27+08:00 I only have one SQL Server, take me to the instance Overview instead of global dashboard
Neal suggested:
I only have one SQL Server instance, instead of seeing one small bit of info and having to click that in the new global dashboard, take me directly into the instance so I can get relevant info on first login/site visit. Think about your design when we just have one server.
 Neal tag:sqlmonitor.uservoice.com,2008-02-07:Event/36244821 2016-05-13T22:08:22+08:00 2016-05-13T22:08:22+08:00 allow analysis graphs to update with realtime data without having to manually refresh them [updated]
We have SQLmonitor analysis graphs running on wallboards to show us data that is useful to us, but we continually need to click the button to "jump to present", as the timeline does not update as more data is collected to show the most recent history. We want the graph to move automatically to match the current time of day. Maybe a "play" button that would allow thye display to automatically refresh the graph along the timeline and a pause button should you want to drill deeper into a certain time period when investigating issues. Having the graph update automatically to see new data seems like such an obvious request, I can't understand why it's not there already.

Stephen Bovill said:

I agree that it shouldn't be the default, but defiantly should be a refresh every x minutes option which can be enabled, should keep the compare baseline and add another metric settings with it as well, sometimes a current graph can look fine but something has happened higher up the chain(web server going out) that can cut the traffic by half, the graph itself looks fine unless you look at the numbers. (not too bothered about the add another metric personally since they don't have a stable scale across each other it can be confusing.

 Stephen Bovill tag:sqlmonitor.uservoice.com,2008-02-07:Event/36212550 2016-05-12T23:40:09+08:00 2016-05-12T23:40:09+08:00 Add capability to export Alert information in csv, xml format for analysis [updated]
It would be good to be able to export Alert information for downstream analysis of frequency and timings for Alerts. E.g. Deadlocks over a period of several weeks - allows to identify hotspots and trends for certain Alerts

Ray Herring said:

What I would like is something that would help me find all of the "similar" deadlock, or blocked process, or .... events. It is tedious to page through the "older/new" even when there is a filter on a specific alert. Adding a filter for "Resource Name" or something similar would help a lot.

I usually see Deadlock and Blocked Process as "cluster bombs" with sometimes 5 or 6 reported alerts for what is essentially one event.

It is very tedious to page through 5 or 6 alerts to get find the needed data elements from each one.

 Ray Herring tag:sqlmonitor.uservoice.com,2008-02-07:Event/36212352 2016-05-12T23:32:10+08:00 2016-05-12T23:32:10+08:00 It would be grand if I could change the time format.. 12 hour clocks just don't sit right with me. [updated]
It would be grand if I could change the time format.. 12 hour clocks just don't sit right with me.

Ray Herring said:

It's interesting that in 5.2.0 you can use ISO 24 hour clock in the controls but the Tool tips still use 12 hour AM/PM :)

 Ray Herring tag:sqlmonitor.uservoice.com,2008-02-07:Event/36212079 2016-05-12T23:21:43+08:00 2016-05-12T23:21:43+08:00 allow analysis graphs to update with realtime data without having to manually refresh them [updated]
We have SQLmonitor analysis graphs running on wallboards to show us data that is useful to us, but we continually need to click the button to "jump to present", as the timeline does not update as more data is collected to show the most recent history. We want the graph to move automatically to match the current time of day. Maybe a "play" button that would allow thye display to automatically refresh the graph along the timeline and a pause button should you want to drill deeper into a certain time period when investigating issues. Having the graph update automatically to see new data seems like such an obvious request, I can't understand why it's not there already.

Ray Herring said:

I think I disagree with this idea as a default. I mainly use this display for Day over Day baseline comparisons and don't really want the time frame to change while I am comparing various values between Noon-and Noon today and last week.
If a R/T dashboard is desired then I think that is a different function/feature.

 Ray Herring tag:sqlmonitor.uservoice.com,2008-02-07:Event/36211941 2016-05-12T23:17:37+08:00 2016-05-12T23:17:37+08:00 I wish the mouse wheel did not automatically modify the date scale in the Analysis graph.
Ray Herring suggested:
I can't count the number of times I have unintentionally messed up a graph with the mouse wheel. It is quite annoying to me.
 Ray Herring tag:sqlmonitor.uservoice.com,2008-02-07:Event/36146364 2016-05-11T01:44:36+08:00 2016-05-11T01:44:36+08:00 Monitor SSAS databases
Anonymous suggested:
I would like to be able to monitor SSAS cubes and data structures in the same fashion as SQL databases.
 Anonymous tag:sqlmonitor.uservoice.com,2008-02-07:Event/36111666 2016-05-09T22:38:10+08:00 2016-05-09T22:38:10+08:00 Monitor SQL Server 2014 failover clusters with Cluster Shared Volumes [updated]
There is currently some trouble with monitoring a windows failover cluster with CSV - specifically, the error log is unreachable because base monitor apparently connects to the wrong network name to access files.

KYLE said:

Any update on this - having the same issue.

 KYLE tag:sqlmonitor.uservoice.com,2008-02-07:Event/36059772 2016-05-07T11:29:31+08:00 2016-05-07T11:29:31+08:00 Group / Sort custom metrics
Jason suggested:
We have a lot of custom metrics and the current interface is not robust, being able to group / sort metrics in folders or in a tree would be very useful. Also the selection box in the analysis tab is not large enough to navigate a useful number of custom metrics
 Jason tag:sqlmonitor.uservoice.com,2008-02-07:Event/35975304 2016-05-05T00:27:20+08:00 2016-05-05T00:27:20+08:00 Only receive emails for the most important alerts [updated]
CONTEXT: I review alerts raised by SQL Monitor in order to stay on top of my server activity, and I also have alert emails enabled in order to respond quickly to issues. PROBLEM: I only want to receive emails for issues that require immedate action or are otherwise noteworthy. I don't want to change the alert thresholds because for my triage, the "lower-priority" alerts are still interesting - but they shouldn't be sent as emails. EXAMPLE SOLUTIONS: • Send emails by alert priority - e.g. medium and high only • Alter the default alert behaviour to only send emails for high-priority alert types • Send emails for "new" alerts - such as a long-running query that hasn't been encountered before - but don't email about repeat offenders • implement an alternative triage view that lists significant events that happened on my servers independently of alerts getting raised - this way we can set higher alert thresholds without losing information. What do you think about these solutions? Got another idea? Let us know in the comments!

Jason Hannas said:

It's hard to believe this isn't available yet. I just want to trigger an email when a "HIGH" alert is raised...suppress emails on Medium or Low. Otherwise the emails are fairly useless.

 Jason Hannas tag:sqlmonitor.uservoice.com,2008-02-07:Event/35894031 2016-05-02T17:09:28+08:00 2016-05-02T17:09:28+08:00 Multiple Maintenance Windows [updated]
I would like to be able to set two maintenace windows every day.

Alexander Tschey said:

We could use an additional monthly window, due to long running index reorgs raising long running query alerts

 Alexander Tschey tag:sqlmonitor.uservoice.com,2008-02-07:Event/35692512 2016-04-27T06:14:48+08:00 2016-04-27T06:14:48+08:00 Receive an alert for the process that is blocking not the process being blocked.
Steve suggested:
We recently upgraded our SQL Monitor to version 5.1 and it appears there has been a change in the Blocking process metric. Before the upgrade we received an alert about a process that was blocking and after the upgrade it appears we receive an alert for each of the processes being blocked. We have set the threshold for 90 seconds and if there are three processes that are 30 seconds that total the 90 seconds, we receive an alert. However we don't want to receive an alert for the 30 second blocked processes. Is there a way we can understand this change or configure it so we don't get alerts that are blocked for less than 90 seconds?
 Steve tag:sqlmonitor.uservoice.com,2008-02-07:Event/35564031 2016-04-23T03:06:41+08:00 2016-04-23T03:06:41+08:00 SQL Monitor self update (or one click update)
Ricardo Corral suggested:
Instead of downloading and running a wizard, I would like to see a way for SQL Monitor to self update, or to have a 'one click' update button built in the interface.
 Ricardo Corral tag:sqlmonitor.uservoice.com,2008-02-07:Event/35442780 2016-04-19T22:52:28+08:00 2016-04-19T22:52:28+08:00 Quick view of whether Agent is up on all monitored servers
Nicole suggested:
If I go to the Configuration > Monitored servers tab, I can quickly see if all SQL Servers are up and running. It would be nice to also be able to quickly see if all SQL Server Agent services are up and running.
 Nicole tag:sqlmonitor.uservoice.com,2008-02-07:Event/35409975 2016-04-19T02:03:45+08:00 2016-04-19T02:03:45+08:00 Suppress performance-related alerts during maintenance periods [updated]
CONTEXT: I expect my system to slow down during routine maintenance tasks, which often leads to false postitives for performance-related alerts (long-running queries, High CPU...) in SQL Monitor. PROBLEM: While I could configure a maintenance window where alerts don't get raised, this would also suppress operational alerts (e.g. Machine unreachable, Job failed) - these are still relevant while maintenance is in progress EXAMPLE SOLUTIONS: • Allow to configure maintenance times for individual alerts • Change maintenance window behaviour so that operational alerts are still active during maintenance What do you think about these solutions? Got another idea? Let us know in the comments!

Abhi said:

I'm on SM v220.127.116.1139 and I don't yet see the new options for configuring maintenance times for individual alerts. Any word on when this might be released?

 Abhi tag:sqlmonitor.uservoice.com,2008-02-07:Event/35298891 2016-04-15T00:29:11+08:00 2016-04-15T00:29:11+08:00 Save and Export/Import sql monitor settings [updated]
Setting up custom alerts and servers is quite a bit of work. For example some jobs are more important than others. A different set of people get notified for some jobs. I have setup custom alert settings on many of the jobs this way. recently I had to move monitoring host to a different server and replicating same settings took me a lot of time. hence need ability to be able to export settings from one server and import to another. May be this will work through the monitoring database but I had to change the database from 2008 to 2005.

SQLRich said:

This would also apply to having multiple installations, due to security constraints from NIST 800-53. The ability to export "configurable items" on a regular recurring basis, such as custom alerts/metrics or alert settings from my lab settings to my production site, to maintain consistency, is crucial to the long term viable use of this tool.

 SQLRich tag:sqlmonitor.uservoice.com,2008-02-07:Event/35127303 2016-04-09T01:24:17+08:00 2016-04-09T01:24:17+08:00 Make SQL Monitor scale to more machines and networks [updated]
CONTEXT: We want to monitor many different servers in different domains and locations PROBLEM: Network configuration for cross-domain monitoring can be challenging, and SQL Monior can slow down if many servers are being mointored EXAMPLE SOLUTIONS: • Create a central web interface that can access multiple Base monitors • Provide an optional agent that can be deployed for easier network configuration • Make a single installation of SQL Monitor scale to a larger number of servers, and make network configuration easier

Stephen said:

"Something" really needs to be done to make this a whole lot easier. I've been a SQL Monitor user since the first v3 came out and am one of those Accidental DBAs who have a love-hate relationship with all things Windows and SQL Server security/Login/User stuff.

Having just reset a Windows box at Rackspace and using SQL Monitor on Azure, it took a half day to get SQL Monitor and that box to agree to being monitored.

Having had to erase everything to with the box's history from SQL Monitor and re-add it, rather than any re-deploy Action, I'm just glad that adding a box to SQLM isn't a daily chore/endurance/pain-in-the-posterior.

Even having read the SQLM documentation re Security, and the prior non-DBA's write-up (proved inaccurate), scaling to more than a few boxes is a limitation/weakness of the current SQLM iteration (5.1 BTW).

The far-end installer needs help to make it usable by A-DBA's like me.

The Host needs help with re-deployment. We absolutely need Friendly Name overrides on EVERY SINGLE PAGE - so tired of seeing a Group Name (friendly), then get stuck with an I.P. or a Rackspace device-ID on emails/subpages/configs at random... Even things like that will promote scalability by making the tool consistent/easier to use. It's often a case of "do I have to go over to SQLM to.....?" Sorry, but that's the truth...

 Stephen tag:sqlmonitor.uservoice.com,2008-02-07:Event/35126808 2016-04-09T01:06:35+08:00 2016-04-09T01:06:35+08:00 Bring back the ability to list fragments of T-SQL to reduce Blocking Process alerts, please
Stephen suggested:
By FAR the largest number of abject NUISANCE Blocking Process alerts I get across 17 servers is due to a simple "How is fragmentation going?" query from a 3rd party product (Idera Defrag Manager). Looks like this: use [DBName] declare @indexId int declare @dbId int declare @tblId int declare @partitionId int set @partitionId = 0 select @dbId = ISNULL(DB_ID(),-1) if @dbId=-1 RAISERROR( N'Database does not exist or permission denied: %s', 16, 1, '[DBName]' ) else begin select @tblId = ISNULL(OBJECT_ID('[DBName].[dbo].[TableName]') ,-1) if @tblId=-1 RAISERROR( N'Table does not exist or permission denied: %s', 16, 1, '[DBName].[dbo].[TableName]' ) else begin select @indexId=index_id from sys.indexes where object_id=@tblId and name='PK_tbl_Forecast' if @tblId=-1 OR @indexId IS NULL RAISERROR( N'Index does not exist or permission denied: %s', 16, 1, '[PK_tbl_Forecast]' ) else begin select avg_record_size_in_bytes, avg_page_space_used_in_percent, page_count, avg_fragmentation_in_percent from sys.dm_db_index_physical_stats(@dbId, @tblId, @indexId,@partitionId,'LIMITED') WHERE ([alloc_unit_type_desc] = 'IN_ROW_DATA') END END END Back in the days of SQL Monitor 3x, and maybe 4x, we could list fragments-to-ignore, and that reduced HUGE volumes of false-positive Alerts. Either my abilities to find the equivalent are sadly lacking, or RG has removed this feature. Please, please, either tell me where it's buried, or restore it! I honestly don't care if this type of monitoring query is being blocked. Neither, actually do I care if it is the victim of a Deadlock - "it will run at the next scheduled slot". Thanks, either way.
 Stephen tag:sqlmonitor.uservoice.com,2008-02-07:Event/35055789 2016-04-07T02:17:30+08:00 2016-04-07T02:17:30+08:00 Identify head blocker in a blocking chain [updated]
It would be quite useful and timesaving if one could identify the head blocker for a blocked process (as done in SSMS's Activity Monitor, Processes tab). Otherwise when get a lot of blocked process alerts, you have to manually figure out the head blocker by analysing all the alerts.

Stephen said:

As 5.1 is available, I'm wondering which of the points below applies to the "Planned for 5.1" change?

If this is fixed, it would make this a reason to upgrade.

Enhancements
• SRP-9520: On the alert details pages, the "Performance data" tabs now always cover the full duration of the alert (or, for active alerts, the duration up until the most recent collection time)
• SRP-9596: Decreased CPU and memory usage relating to unbound data retrieval
• SRP-9607: Updated the hardware and performance guidelines documentation to reflect current guidelines
• SRP-10194: Updated the styling on the manual license activation screen
• SRP-10407: Improved the wording in the banner displayed when you add a server, to show a "connecting" message instead of a green "success" message
• SRP-10409: Scheduled page refreshes for the overview pages and Alert Inbox no longer trigger a "Loading…" indicator
• SRP-10422: On the SQL Server instance overview page, under "Server properties", we now display the friendly version name and version number instead of the full Microsoft version number
• SRP-10452: Improved the labels in the "Blocking process" alert details, to clarify that the duration shown is the total duration for which all descendants have been blocked

Fixes
• SRP-2856: Fixed a "maxDate < minDate" issue that caused an unhelpful stack trace to be displayed
• SRP-9479: Performance counters are no longer collected as negative for Disk avg. read time. Previously, when this happened, the data was discarded
• SRP-9915: On the Configuration > Monitored servers screen, in the "More actions" menu, the "Remove servers" option is now enabled if you have at least one host machine selected
• SRP-9571: On the alert details page, for the "Job duration unusual" alert, the information displayed in the "User" field now matches the job owner
• SRP-9964: Corrected the breadcrumbs on the alert details page for availability group alerts
• SRP-10028: On the Availability group overview screen, the State and Failover columns are now sorted correctly
• SRP-10090: Fixed an issue where the styling sometimes took time to load properly in Internet Explorer
• SRP-10395: Clicking "Remove overrides" for a customized alert now correctly updates the number in brackets in the "Monitored servers" list
• SRP-10403: Fixed an issue that caused the "Long-running query" alert status to show as "Ended" when the query was still running
• SRP-10402/SRP-10405: Fixed issues that resulted in users being unable to open certain "Long running query" and "Blocking process" alerts
• SRP-10431: Navigating to the login page (when logged out) with an incorrect ReturnUrl no longer causes an error
• SRP-10432: Corrected the error message displayed when you try to add a server name containing an invalid character
• SRP-10447: SQL Monitor no longer throws an exception when you move a server out of a group and into "All Servers"
• SRP-10453: When alert emails are enabled, a successful job run following a "Job failing" alert will no longer generate an alert email with a status of None
• SRP-10457: The installer no longer displays a confusing error message if you try to create a database with the same name as an existing database
• SRP-10461: The database schema update warning in the installer is no longer truncated at 125% DPI

 Stephen


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