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Hotel Roma
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A 3 Part Memoire - Opulent Spectacle
It was easy for Jim and I to recognize Sao Roque. Its plain facade was almost an exact replication of the Jesuit church we tried to get into in Rome with John and Mary Ana. The church was built at the end of the 16th century. In 1742 when the Jesuits were at the height of their power the Chapel of St. John the Baptist was commissioned. Now that is a tale. The chapel was built in Rome then after it was consecrated by the pope it was dismantled and sent to Lisbon aboard three ships.
Overview of Day 11 - On the Bus to Porto
... originally from the Algarve region (southern coast), and for her study, there was no need for her to go any further than Lisbon.
We learned all about the library and how meticulously it has been maintained. We saw the chapels and met a university student, where we learned about her clothing, which was the inspiration for Harry Potter's academic dress.
We had ...
Out and about in Lisbon
... church down the street- adjoining the Monastery dos Jeronimos.As we exited, the skies opened up with torrential rains.Luckily, as soon as it starts to rain there are hawkers selling umbrellas- 5E. The streets were raging water. We were soaked. Stopped for a coffee and then the sun came out and we dried out. Crossed the street, and then we saw the Padrao dos ...
First stop, Lisboa
... was already a line when we got there so we waited on the pavement for about 20 minutes before getting in the door. It was a strange little place with a huge variety of seafood available. Yes, Jamie was even keen, her likeness for seafood slowly growing. It had very basic tables and d�cor with busy waiters rushing everywhere. We had a little table on the side and sat and watched as everyone around us smashed crab claws, sucking out prawn brains and trying to choose from ...
The start of a long two days
Today is the start of the huge trek to the first city of my South American leg, Montevideo, Uruguay. I was very excited by had low expectations.
Basically I just hung out at the Hostel until my two new Brazilian friends arrived so we could go to the station together.
We made out way to the train station & after waiting in line for what seemed an eternity I got my ...


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To understand how the microtubule motors, cytoplasmic dynein and kinesins, find and transport cargoes to specific cellular destinations, we need to know much more about how motors are attached to cargoes. The extended morphology of axons and dendrites makes post-mitotic neurons especially dependent on polarized transport and ideal for studying the regulation of transport. We recently showed that ss-spectrin mutations in humans that cause spinocerebellar ataxia type 5 (SCA5) impair motor-based transport of synaptic vesicles in a Drosophila model of neurodegeneration. In this application, we focus on an analysis of ss-spectrin and its role in mediating the attachment of dynactin and cytoplasmic dynein to cargoes in neurons. We will characterize the defective neuronal transport in our fly model and will pursue the gene products and mechanisms that regulate transport. The selective use of the proposed spectrin/ motor linkage in will be studied in the axons and dendrites of living neurons (Aim 1). New genetic modifiers of the SCA5 phenotypes and neuronal transport will be characterized in motility and biochemical assays (Aim 2), and the connection between neuronal transport, autophagy and neurodegeneration will be explored (Aim 3). Our work has important long-term implications for the understanding and treatment of spinal cord injuries, and the family of neurodegenerative diseases, including Amyotrophic lateral sclerosis, Huntington's Disease, and Alzheimer's Disease.
We are studying the molecular basis of intracellular transport. Our work focuses on the microtubule motors cytoplasmic dynein and kinesin and their function in neurons. We have developed a fly model for neurodegeneration in the disease Spinocerebellar ataxia type 5 and we will study how perturbations in intracellular transport contribute to neurodegenerative disease.
|Lorenzo, Damaris N; Li, Min-gang; Mische, Sarah E et al. (2010) Spectrin mutations that cause spinocerebellar ataxia type 5 impair axonal transport and induce neurodegeneration in Drosophila. J Cell Biol 189:143-58
|Boylan, Kristin L M; Mische, Sarah; Li, Mingang et al. (2008) Motility screen identifies Drosophila IGF-II mRNA-binding protein--zipcode-binding protein acting in oogenesis and synaptogenesis. PLoS Genet 4:e36
|Talbott, Matthew; Hare, Michael; Nyarko, Afua et al. (2006) Folding is coupled to dimerization of Tctex-1 dynein light chain. Biochemistry 45:6793-800
|Li, M; McGrail, M; Serr, M et al. (1994) Drosophila cytoplasmic dynein, a microtubule motor that is asymmetrically localized in the oocyte. J Cell Biol 126:1475-94
|Hays, T S; Porter, M E; McGrail, M et al. (1994) A cytoplasmic dynein motor in Drosophila: identification and localization during embryogenesis. J Cell Sci 107 ( Pt 6):1557-69
|Gibbons, B H; Asai, D J; Tang, W J et al. (1994) Phylogeny and expression of axonemal and cytoplasmic dynein genes in sea urchins. Mol Biol Cell 5:57-70
|Rasmusson, K; Serr, M; Gepner, J et al. (1994) A family of dynein genes in Drosophila melanogaster. Mol Biol Cell 5:45-55
|Gepner, J; Hays, T S (1993) A fertility region on the Y chromosome of Drosophila melanogaster encodes a dynein microtubule motor. Proc Natl Acad Sci U S A 90:11132-6


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A simple and configurable Flash clock. There is a widget, a shortcode and a template tag.
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Welcome to Our Home: Knit and Crochet Ideas from Red Heart
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"I like this vintage style Santa graphic, but I read that the designer used a cutting machine to cut a red vinyl decal to afix to the cream painted wood board. I don't know what kind of cutting machine she is talking about and I wonder how pricey it is? I'd like an alternative to getting that Santa on there."
"This wall decor is very chic with any message you write on it! And it couldn't be easier. However, another option to using foam core board would be to actually buy an old thrift store bulletin board and spray paint it black. I think it would give the wall art a little bit more of a lived-in rustic look as the cork board adds texture and interest."
"This DIY holiday project is something that I would like to do at home myself. This craft is not for everyone's taste, but if you like a certain minimalist decorating approach and you've got a creative eye then this is for you! At first I did not even notice the picture frame in the background. It's used to attach the branch to it. Cute idea!"
10 Free Knitting Patterns for the Kitchen
By: Caley Walsh
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Use these free knitting patterns to supply your kitchen with essentials such as dishcloths or potholders, and decorate your kitchen with fun accents. Easy and washable cotton dishcloths make perfect beginner knitting patterns. If prefer to loom knit, we have knitting loom patterns for the kitchen too. Why not decorate your kitchen with a knit rug, colorful coasters or even a knit punnet of strawberries?
Knitting Patterns for Kitchen Table of Contents
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joan 7244544
Feb 18, 2013
where can i find pattern for teapot cosy
punkin176 7559282
Jun 08, 2012
If you'll go to Google and type in "knitted dishcloth pattern with star", then click on Images, it will bring up hundreds of dishcloth patterns with a star on it. You've probably already found what you were looking for. I just realized that this was asked in June 22, 2010!!! :-)
Jun 22, 2010
I'm looking for a knitted dishcloth pattern with a star on it. Any help out there?
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Multiple patterning
Multiple patterning (or multi-patterning) is a class of technologies for manufacturing integrated circuits (ICs), developed for photolithography to enhance the feature density. It is expected to be necessary for the upcoming 10 nm and 7 nm node semiconductor processes and beyond. The premise is that a single lithographic exposure may not be enough to provide sufficient resolution. Hence additional exposures would be needed, or else positioning patterns using etched feature sidewalls (using spacers) would be necessary.
Although EUV has been projected to be the next-generation lithography of choice, it would still require more than one lithographic exposure, due to the foreseen need to first print a series of lines and then cut them.[1] It is also likely more than one cut would be needed, even for EUV.[2]
Even for electron beam lithography, single exposure appears insufficient at ~10 nm half-pitch, hence requiring double patterning.[3][4]
- 1 Pitch Splitting
- 2 Sidewall Image Transfer
- 3 Self-aligned contact/via patterning
- 4 Spacer-is-Dielectric (SID) SADP
- 5 Other multi-patterning techniques
- 6 Specific Implementations for Contact/Via Patterns
- 7 Industrial adoption
- 8 References
Pitch Splitting[edit]
The earliest form of multiple patterning involved simply dividing a pattern into two or three parts, each of which may be processed conventionally, with the entire pattern combined at the end in the final layer. This is sometimes called pitch splitting, since two features separated by one pitch cannot be imaged, so only skipped features can be imaged at once. It is also named more directly as "LELE" (Litho-Etch-Litho-Etch). This approach has been used for the 20 nm and 14 nm nodes. The additional cost of extra exposures was tolerated since only a few critical layers would need them. A more serious concern was the effect of feature-to-feature positioning errors (overlay). Consequently, the self-aligned sidewall imaging approach (described below) has succeeded this approach.
A "brute force" approach for patterning trenches involves a sequence of (at least) two separate exposures and etchings of independent patterns into the same layer. For each exposure, a different photoresist coating is required. When the sequence is completed, the pattern is a composite of the previously etched subpatterns. By interleaving the subpatterns, the pattern density can theoretically be increased indefinitely, the half-pitch being inversely proportional to the number of subpatterns used. For example, a 25 nm half-pitch pattern can be generated from interleaving two 50 nm half-pitch patterns, three 75 nm half-pitch patterns, or four 100 nm half-pitch patterns. The feature size reduction will most likely require the assistance of techniques such as chemical shrinks, thermal reflow, or shrink assist films. This composite pattern can then be transferred down into the final layer.
A possible application would be, for example, dividing the contact layer into two separate groups: gate contacts and source/drain contacts, each defining its own mask. IMEC recently used an approach like this to demonstrate a 45 nm node 6-transistor SRAM cell using dry lithography [3].
This is best described by considering a process example. A first exposure of photoresist is transferred to an underlying hardmask layer. After the photoresist is removed following the hardmask pattern transfer, a second layer of photoresist is coated onto the sample and this layer undergoes a second exposure, imaging features in between the features patterned in the hardmask layer. The surface pattern is made up of photoresist features edged between mask features, which can be transferred into the final layer underneath. This allows a doubling of feature density. The Interuniversity Microelectronics Centre (IMEC, Belgium) recently used this approach to pattern the gate level for its 32 nm half-pitch demonstration.[5]
A concern with the use of this approach is the discrepancy and delay between the second photoresist pattern and the first hardmask pattern, resulting in an additional source of variation.
A variation on this approach which eliminates the first hardmask etch is resist freezing,[4] which allows a second resist coating over the first developed resist layer. JSR has demonstrated 32 nm lines and spaces using this method,[5] where the freezing is accomplished by surface hardening of the first resist layer.
In recent years, the scope of the term 'pitch splitting' has gradually been expanded to include techniques involving sidewall spacers.
Sidewall Image Transfer[edit]
In spacer patterning, a spacer is a film layer formed on the sidewall of a pre-patterned feature. A spacer is formed by deposition or reaction of the film on the previous pattern, followed by etching to remove all the film material on the horizontal surfaces, leaving only the material on the sidewalls. By removing the original patterned feature, only the spacer is left. However, since there are two spacers for every line, the line density has now doubled. This is commonly referred to as Self-Aligned Doubled Patterning (SADP). The spacer technique is applicable for defining narrow gates at half the original lithographic pitch, for example.
As pitch splitting has become more difficult due to possible differences in feature positions between different exposed parts, sidewall image transfer (SIT) has become more recognized as the necessary approach. The SIT approach typically requires a spacer layer to be formed on an etched feature's sidewall. If this spacer corresponds to a conducting feature, then ultimately it must be cut at no less than two locations to separate the feature into two or more conducting lines as typically expected. On the other hand, if the spacer corresponds to a dielectric feature, cutting would not be necessary. The prediction of how many cuts would be needed for advanced logic patterns has been a large technical challenge. Many approaches for spacer patterning have been published (some listed below), all targeting the improved management (and reduction) of the cuts.
As spacer materials are commonly hardmask materials, their post-etch pattern quality tends to be superior compared to photoresist profiles after etch, which are generally plagued by line edge roughness.[6]
The main issues with the spacer approach are whether the spacers can stay in place after the material to which they are attached is removed, whether the spacer profile is acceptable, and whether the underlying material is attacked by the etch removing the material attached to the spacer. Pattern transfer is complicated by the situation where removal of the material adjacent to the spacers also removes a little of the underlying material. This results in higher topography on one side of the spacer than the other.[7] Any misalignment of masks or excursion in pre-patterned feature critical dimension (CD) will cause the pitch between features to alternate, a phenomenon known as pitch walking.[8]
The positioning of the spacer also depends on the pattern to which the spacer is attached. If the pattern is too wide or too narrow, the spacer position is affected. However, this would not be a concern for critical memory feature fabrication processes which are self-aligned.
Self-aligned contact/via patterning[edit]
Self-aligned contact and via patterning is an established method for patterning multiple contacts or vias from a single lithographic feature. It makes use of the intersection of an enlarged feature resist mask and underlying trenches which are surrounded by a pre-patterned hardmask layer. This technique is used in DRAM cells[9] and has been extended to patterning of active areas (more discussion below under "Industrial adoption"). It is also used for advanced logic to avoid multiple exposures of pitch-splitting contacts and vias.[10]
Spacer-is-Dielectric (SID) SADP[edit]
In self-aligned double patterning (SADP), the number of cut/block masks may be reduced or even eliminated in dense patches when the spacer is used to directly pattern inter-metal dielectric instead of metal features.[11][12] The reason is the cut/block locations in the core/mandrel features are already patterned in the first mask.
Other multi-patterning techniques[edit]
There have been numerous concerns that multiple patterning diminishes or even reverses the node-to-node cost reduction expected with Moore's Law. EUV is more expensive than three 193i exposures (i.e., LELELE), considering the throughput.[13] Moreover, EUV is more liable to print smaller mask defects not resolvable by 193i.[14]
Self-Aligned Triple Patterning (SATP)[edit]
Self-aligned triple patterning has been considered as a promising successor to SADP, due to its introduction of a second spacer offering additional 2D patterning flexibility and higher density.[15][16] A total of two masks (mandrel and trim) is sufficient for this approach.[17] The only added cost relative to SADP is that of depositing and etching the second spacer. The main disadvantage of SATP succeeding SADP is that it would only be usable for one node. For this reason, self-aligned quadruple patterning (SAQP) is more often considered.
Protrusion Spacer Cutting and Linking Features[edit]
Mandrel or spacer core patterns can be designed to cut their own spacer patterns. A pair of opposing line protrusions can effectively squeeze out any feature in between if a spacer with a thickness exceeding half the distance between the protrusions is deposited, followed by the feature deposition.[18] This is ideal for use in SID SADP schemes. A similar approach is the use of linked features, i.e., narrow constrictions which separate features in spacer patterning without cutting.[19]
The protrusion cutting technique helps reduce the amount of cutting that is needed, and also enables the grid routing method described by Toshiba.[11][12][20] The number of masks used for SAQP is the same as for SADP (1 mandrel/core, 1 trim/cut/block), since only pitch-doubled patterns need cutting. The remaining patterns do not need cutting or trimming, since they are patterned through the same initial exposure.
A similar approach to protrusion cutting is the concept of the linking feature.[21] The linking feature is a narrow constriction which separates features when the sidewall spacer is deposited and patterned. Line jogs, possibly track changing, are necessary to establish the linking feature.
Complementary polarity exposures[edit]
The method of complementary exposures proposed in 2012[22] is another way of reducing mask exposures for multiple patterning. Instead of multiple mask exposures for individual vias, cuts or blocks, two exposures are used of opposing or complementary polarity, so that one exposure removes portions of the previous exposure pattern.
EUV vs. Multiple Patterning[edit]
The cost of a single EUV mask exposure is more than 3x that of an immersion mask exposure, from the relative scanner throughput consideration (275 WPH vs. 85 WPH); the deposition and etch costs are relatively much lower. Higher doses to reduce shot noise would increase the cost of EUV dramatically. Other considerations, related to defect management, also bring up the cost of EUV mask exposure further.
Beyond 18 nm half-pitch, with no pellicle for EUV in its current state,[23] a cost-reduced SATP or SAQP is expected to be put in place; SAQP is already in use for NAND flash. SAQP is also able to be used from 18 to 12 nm half-pitch, while EUV cannot address the 12 nm half-pitch.
At the 2016 EUVL Workshop, ASML reported that the 0.33 NA NXE EUV tools would not be capable of standard single exposure patterning for the 11-13 nm half-pitch expected at the 5 nm node.[24] A higher NA of 0.55 would allow single exposure EUV patterning of fields which are half the 26 mm x 33 mm standard field size.[24] However, some products, such as NVIDIA's Pascal Tesla P100,[25] will be bisected by the half-field size, and therefore require stitching of two separate exposures.[26] In any case, two half-field scans consume twice as much acceleration/deceleration overhead as a single full-field scan.[24][27]
The existing 0.33 NA EUV tools are challenged below 16 nm half-pitch resolution,[28] hence more than a single EUV exposure would be needed at a minimum for the 7 nm and 5 nm nodes.
The use of EUV for cutting exposures is also problematic for feature sizes relevant to 7 nm node and below, as such features are also aggravated by the shot noise issue.[29]
Directed Self-Assembly[edit]
The number of masks may be reduced with the use of directed self-assembly (DSA) due to the provision of gridded cuts all at once within a printed area, which can then be selected with a final exposure.[30][31] Alternatively, the cut pattern itself may be generated as a DSA step.[32]
Much progress had been reported on the use of PMMA-PS block copolymers to define sub-20 nm patterns by means of self-assembly, guided by surface topography (graphoepitaxy) and/or surface chemical patterning (chemoepitaxy).[33] The key benefit is the relatively simple processing, compared to multiple exposures or multiple depositions and etching. The main drawback of this technique is the relatively limited range of feature sizes and duty cycles for a given process formulation. Typical applications have been regular lines and spaces as well as arrays of closely packed holes or cylinders.[34] However, random, aperiodic patterns may also be generated using carefully defined guiding patterns.[35]
The line edge roughness in block copolymer patterns is strongly dependent on the interface tension between the two phases, which in turn, depends on the Flory "chi" (χ) parameter.[36] A higher value of χ is preferred for reduced roughness; the interfacial width between domains is equal to 2a(6χ)−1/2, where a is the statistical polymer chain length.[37] Moreover, χN > 10.5 is required for sufficient phase segregation, where N is the degree of polymerization (number of monomer repeats in the chain). On the other hand, the half-pitch is equal to 2(3/π2)1/3aN2/3χ1/6. The fluctuations of the pattern widths are actually only weakly (square root) dependent on the logarithm of the half-pitch, so they become more significant relative to smaller half-pitches.
Specific Implementations for Contact/Via Patterns[edit]
Merged hole separation by etch shrink[edit]
Tokyo Electron Ltd (TEL) was able to resolve two merged contact holes by applying an etch shrink.[38] 31-32 nm contact half-pitch was achieved through this method.[39]
2D SID Spacer Patterning[edit]
The use of SID may be applied to 2D arrays, by iteratively adding features equidistant from the previously present features, doubling the density with each iteration.[40]
Triangular Spacer (Honeycomb Structure) Patterning[edit]
Samsung recently demonstrated DRAM patterning using a honeycomb structure (HCS) suitable for 20 nm and beyond.[41] Each iteration of spacer patterning triples the density, effectively reducing 2D pitch by a factor of sqrt(3).
Industrial adoption[edit]
Memory patterns are already patterned by quadruple patterning for NAND[42] and crossed quadruple/double patterning for DRAM.[43] These patterning techniques are self-aligned and do not require custom cutting or trim masks. For 2x-nm DRAM and flash, double patterning techniques should be sufficient.
Current EUV throughput is still more than 3x slower than 193 nm immersion lithography, thus allowing the latter to be extended by multiple patterning. Furthermore, the lack of an EUV pellicle is also prohibitive.
As of 2016, Intel is using SADP for its 10 nm node.[44] Intel is using triple patterning for some critical layers at its 14 nm node,[45] which is the LELELE approach.[46] Triple patterning is already demonstrated in 10 nm tapeout,[47] and is already an integral part of Samsung's 10 nm process.[48] TSMC is deploying 7 nm in 2017 with multiple patterning;[49] specifically, pitch-splitting, down to 40 nm pitch.[50] Beyond the 5 nm node, multiple patterning, even with EUV assistance, would be economically challenging, since the departure from EUV single exposure would drive up the cost even higher. However, at least down to 12 nm half-pitch, LELE followed by SADP (SID) appears to be a promising approach, using only two masks, and also using the most mature double patterning techniques, LELE and SADP.[51]
Patterning Costs[edit]
|Patterning Method
|Normalized Wafer Cost
|193i SE
|193i LELE
|193i LELELE
|193i SADP
|193i SAQP
Ref.: A. Raley et al., Proc. SPIE 9782, 97820F (2016).
Compared to 193i SADP, EUV SADP cost is dominated by the EUV tool exposure, while the 193i SAQP cost difference is from the added depositions and etches. The processing cost and yield loss at a lithographic tool is expected to be highest in the whole integrated process flow due to the need to move the wafer to specific locations at high speed. EUV further suffers from the shot noise limit, which forces the dose to increase going for successive nodes.[52] On the other hand, depositions and etches process entire wafers at once, without the need for wafer stage motion in the process chamber. In fact, multiple layers may be added under the resist layer for anti-reflection or etch hard-mask purposes, just for conventional single exposure.
Multi-Patterning Options[edit]
Cutting lines to form irregular patterns uses the maximum number of masks. 2D patterning is generally preferred, but requires sufficient exposed feature pitch, followed by sufficient splitting or division of the pitch. On the other hand, LELE, LELELE, and SADP (SID) can avoid line cuts, while SATP or SAQP with grid routing can minimize line cuts. EUV 2D patterning is limited to >32 nm pitch.[28] For 16-18 nm half-pitch, the horizontal-vertical bias is over 3 nm, close to a node difference.[53][54] Consequently, EUV would require double patterning for its introduction at 7 nm node below 20 nm half-pitch;[55] this may prove too costly to implement against the already established LELELE triple patterning, or the immersion-based combination of mature double patterning techniques LELE+SADP [51] or the implementation of SAQP, which is twice applied SADP, especially the SID form of SADP,[11] with LELE and SID SADP already established for 32 nm and 24 nm half-pitch, respectively.
|Logic Metal Half-pitch
|32 nm
|2D LELE[56] (2 193i masks)
|20-24 nm (no spacer)
|2D LELELE (3 193i masks)
|13-24 nm (single spacer)
|SADP (SID) + 193i block[57] (2 193i masks)
|13-18 nm (single spacer)
|193i LELE + SID[51] (2 193i masks)
|10-18 nm (SAQP)
|1D SAQP + block + keep[22] (3 193i masks)
Notes: LELE=Litho-(followed by)Etch 2 times; LELELE=Litho-(followed by)Etch 3 times; SADP=Self-Aligned (Spacer) Double Patterning; SID = Spacer-Is-Dielectric; SAQP=Self-Aligned Quadruple Patterning
From a lithographic quality point of view, pitch quartering with 193 nm immersion is better than EUV single exposure. For example, 18 nm half-pitch with 0.33 NA EUV has k1=0.44, while 4x18=72 nm half-pitch with 1.35 NA immersion gives k1=0.50. The ~14% advantage is always maintained across target pitch. The difficulty increases faster as k1 drops below 0.35. On the other hand, multiple passes would present another difficulty for quadruple patterning. Properly shaping the mandrel is not trivial.[58] Long lines running in one direction require the most cuts; a cut exposure and mask is needed for every path turn. In contrast, spacer patterns with path turns already included do not require cutting if they are used for encapsulating metal.[11]
As the number of masks for a given layer increases, the cost for patterning that layer also increases. It is especially severe when a layer previously requiring only one mask now requires two masks; in this case the cost may roughly be expected to be doubled. On the other hand, the reduced device area from the reduced pitch allows the cost per device to be reduced. The larger pitch reduction allows a larger reduction of cost per device, which counters the effect of increasing mask count.
Mask Costs[edit]
The mask cost strongly benefits from the use of multiple patterning. The EUV single exposure mask has smaller features which take much longer to write than the immersion mask. Even though mask features are 4x larger than wafer features, the number of shots is exponentially increased for much smaller features. Furthermore, the sub-100 nm features on the mask are also much harder to pattern, with absorber heights ~70 nm.[59]
Wafer Productivity[edit]
|WPH (wafers per hour)
|# tools
|# passes
|WPM (wafers per month)
|normalized WPM
Note: WPM = WPH * # tools * uptime / # passes * 24 hrs/day * 30 days/month. Normalized WPM = WPM/(WPM for EUV 1 pass)
Multiple patterning with immersion scanners can be expected to have higher wafer productivity than EUV, even with as many as 4 passes per layer, due to faster wafer exposure throughput (WPH), a larger number of tools being available, and higher uptime.
Multiple Patterning Specific Issues[edit]
|between 1st and 2nd exposures, especially where stitching
|among all three exposures, especially where stitching
|between core and cut exposures
|between core and cut exposures
|Exposed feature width
|(1) 1st exposure (2) 2nd exposure
|(1) 1st exposure (2) 2nd exposure (3) 3rd exposure
|core feature
|(1) core feature (2) cut shape
|Feature slimming target width
|1/4 exposure pitch
|1/6 exposure pitch
|1/4 core pitch
|1/8 core pitch
|Spacer width
|1 spacer
|(1) 1st spacer (2) 2nd spacer
Multiple patterning entails the use of many processing steps to form a patterned layer, where conventionally only one lithographic exposure, one deposition sequence and one etch sequence would be sufficient. Consequently, there are more sources of variations and possible yield loss in multiple patterning. Where more than one exposure is involved, e.g., LELE or cut exposures for SAQP, the alignment between the exposures must be sufficiently tight. Current overlay capabilities are ~0.6 nm for exposures of equal density (e.g., LELE) and ~2.0 nm for dense lines vs. cuts/vias (e.g., SADP or SAQP) on dedicated or matched tools.[61] In addition, each exposure must still meet specified width targets. Where spacers are involved, the width of the spacer is dependent on the initial deposition as well as the subsequent etching duration. Where more than one spacer is involved, each spacer may introduce its own width variation.
Mainstream Use in NAND Flash[edit]
Multiple patterning is routinely used for NAND Flash memory manufacturing. 14 nm is the smallest dimension achieved in 2016.[62] 3D NAND Flash also includes SADP.[63]
Another cost perspective comes from comparing patterning with multiple spacers vs. 3D NAND Flash fabrication, which requires at least 64 distinct layer depositions and etches of those same layers.[64] 16 nm planar NAND requires SAQP (2x SADP) and is the cheapest memory product offered in 2016.[65]
10nm FinFETs[edit]
Samsung announced mass production of 10 nm FinFETs in October 2016, featuring triple patterning.[66] Samsung also has developed self-aligned triple patterning (US Patent 9412604).
7nm and 5nm FinFETs[edit]
Self-aligned quadruple patterning is already the established process to be used for patterning fins for 7 nm and 5 nm FinFETs.[67] With SAQP, each patterning step gives a critical dimension uniformity (CDU) value in the sub-nanometer range (3 sigma).
- ^ E. van Setten et al., Proc. SPIE 9661, 96610G (2015).
- ^ http://www.eetimes.com/document.asp?doc_id=1327919 EUV 5nm test
- ^ Double patterning HSQ processes of zone plates for 10 nm diffraction limited performance
- ^ H. Duan, et al., JVST B8, c6c58 (2010).
- ^ IMEC double patterning
- ^ X. Hua et al., J. Vac. Sci. Tech. B, vol. 24, pp. 1850-1858 (2006).
- ^ Y-K Choi et al., J. Phys. Chem. B, vol. 107, pp. 3340-3343 (2003).
- ^ Chao, Robin; Kohli, Kriti K.; Zhang, Yunlin; Madan, Anita; Muthinti, Gangadhara Raja; Hong, Augustin J.; Conklin, David; Holt, Judson; Bailey, Todd C. (2014-01-01). "Multitechnique metrology methods for evaluating pitch walking in 14 nm and beyond FinFETs". Journal of Micro/Nanolithography, MEMS, and MOEMS. 13 (4): 041411–041411. doi:10.1117/1.JMM.13.4.041411. ISSN 1932-5150.
- ^ US Patent 6165880, assigned to TSMC.
- ^ Y. Loquet et al., Microelec. Eng. 107, 138 (2013).
- ^ a b c d C. Kodama et al., IEEE Trans. CAD Integ. Circ. and Sys., vol. 34, 753 (2015).
- ^ a b US Patent Application 20150021782, assigned to Kabushiki Kaisha Toshiba.
- ^ D. Civay et al., J. Micro/Nanolith. MEMS MOEMS 14, 023501 (2015).
- ^ K. Seki et al., Proc. SPIE 9658, 96580G (2015).
- ^ US Patent 7842601, assigned to Samsung.
- ^ Y. Chen et al., Proc. SPIE 7973, 79731P (2011).
- ^ M. Mirsaeedi et al., IEEE Trans. VLSI Syst. 22, 1170 (2014).
- ^ US Patent 8697538, assigned to Winbond.
- ^ US 20160181110, assigned to TSMC.
- ^ K. Nakayama et al., Proc. SPIE 8327, 83270V (2012).
- ^ U.S. Patent Application 20160181110, assigned to TSMC.
- ^ a b F. T. Chen et al., Proc. SPIE 8326, 83262L (2012).
- ^ EUVL 2016 Workshop update
- ^ a b c ASML High-NA EUV
- ^ NVIDIA Pascal Tesla P100 Unveiled - 15.3 Billion Transistors on a 610mm2 16nm Die
- ^ Microlithography: Science and Technology, 2nd ed., B. W. Smith and K. Suzuki (eds.), CRC Press, 2007, p. 94.
- ^ Handbook of Semiconductor Manufacturing Technology, Y. Nishi and R. Doering (eds.), CRC Press, 2000, p. 475.
- ^ a b T-B. Chiou et al., Proc. SPIE 9781, 978107 (2016).
- ^ EUV shot noise at 7nm node
- ^ Synopsis Presentation at Semicon West 2013
- ^ M. C. Smayling et al., Proc. SPIE 8683, 868305 (2013).
- ^ Z. Xiao et al., Proc. SPIE 8880, 888017-3 (2013).
- ^ S. H. Park et al., Soft Matter, 6, 120-125 (2010).
- ^ C. G. Hardy and C. Tang, J. Polymer Sci. Pt. B: Polymer Phys., vol. 51, pp. 2-15 (2013).
- ^ L-W. Chang et al.IEDM 2010 Technical Digest, 752-755 (2010).
- ^ NIST 2011 report on LER in PS-b-PMMA DSA
- ^ A. N. Semenov, Macromolecules 26, 6617 (1993).
- ^ K. Oyama et al., Proc. SPIE 9051, 90510V (2014).
- ^ M. C. Smayling et al., Proc. SPIE 9426, 94261U (2015).
- ^ B. Mebarki et al., U. S. Patent 8,084,310, assigned to Applied Materials.
- ^ J. M. Park et al., IEDM 2015, 676 (2015).
- ^ Hynix M1X NAND
- ^ U.S. Patent 9318369, assigned to Samsung.
- ^ Intel discusses 10nm
- ^ Intel goes to 7nm without EUV
- ^ [1]
- ^ Triple patterning is becoming common at 10nm
- ^ Samsung announces 10nm FinFET process for SoC
- ^ [2]
- ^ S.-Y. Wu et al., IEDM 2016, paper 2.6.
- ^ a b c F. T. Chen et al., Proc. SPIE 8683, 868311 (2013).
- ^ F. T. Chen et al., Proc. SPIE vol. 8326, 82362L (2012).
- ^ S. Hong et al., Proc. SPIE 8679, 867928 (2013).
- ^ G-J. Kim et al., J. Micro/Nanolith. MEMS MOEMS 15, 023503 (2016).
- ^ ASML 7nm EUV slide 46
- ^ H. Tomizawa et al., IITC 2011.
- ^ Y. Ban et al., Proc. SPIE 7974, 79740L (2011)
- ^ B. J. Lin, Microel. Eng. 143, 91 (2015).
- ^ R. R. Haque et al., Proc. SPIE 9776, 97760F (2016).
- ^ Samsung receives 24 immersion tools from ASML in 2010
- ^ Extending immersion lithography to 1xnm nodes
- ^ 14 nm NAND Flash from Samsung in 2016
- ^ Samsung 48L 3D NAND
- ^ 3D NAND process challenges
- ^ Return to planar NAND
- ^ Samsung announced triple patterning 10nm
- ^ SAQP for FinFETs


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Integra USDM To JDM ITR Front End Conversion W/ HID
Newly installed HID Kit for the USDM model then got into an accident days later. Perfect time for a front end conversion to get the real deal. Still looking like a project car though.
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i love my dc2
Erics DC2 Integra GSR build (paint)
Hey Guys, This is my 1996 integra GSR that i have been rebuilding. I am 17 and am using this car as my senior project. I painted the car Teffeta white, and the inside eletric blue. . Check out my other vids of my build
I roll offset
I roll offset i used x metals paint xxr 527 16x8.25 0offset teggy an civic has xxr 002's 15x8 0 offset


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JOIN the world's largest horse forum! Chat and learn from other experts about horse training, breeding, health, showing, riding, contests and use our free horse classifieds. Register Here
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Paul Schwake doesn't have any movies playing in theaters.
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Articles tagged michael chiklis
This might pretend to criticize our increasing reliance on technology, but it's really just the setting for a big dumb movie.READ more
11 Jan 2009 // 8:00 PM
The Year in TV was a lot like the US economy: struggling until summer and then tanking under the hope of a 2009 comeback. Still, our staff found 30 solid reasons to be cheerful come entertainment investment time.READ more
2 Oct 2008 // 2:44 PM
The 1960s and 1970s were the heyday of political thrillers. In these movies the people who ran the U.S. government were every bit asREAD more
28 Sep 2008 // 6:47 PM
Beware of Big Brother…blah, blah, blah. You can't pick up a publication nowadays, or listen to any number of broadcast pundits, and notREAD more
25 Sep 2008 // 9:59 PM
The nihilistic, morally blurred world of The Shield reflects the inner workings of its characters.READ more
8 Sep 2008 // 10:00 PM
From wars both past and present to a number of nail-biting thrillers, September is sizing up as a potentially profitable one.READ more
27 Nov 2007 // 8:59 PM
Not every comic book movie is geared toward the nearing middle aged geek - something naysayers of the Fantastic Four franchise fail to comprehend.READ more
18 Jun 2007 // 3:09 AM
The call to Mark Frost from his agent in 2003 started out, "This might seem like a crazy idea ..." The agent was suggesting that he thinkREAD more
18 Jun 2007 // 2:57 AM
He's a Christ figure on a flying surfboard. A chrome-plated philosopher. A herald of doom. The Oscar statuette come to life. Marvel Comics' SilverREAD more
15 Jun 2007 // 3:15 AM
At the start of Fantastic Four: Rise of the Silver Surfer, the now incorporated superheroes are negotiating endorsement contracts.READ more
8 May 2007 // 10:00 PM
Detective Vic Mackey kills cops, steals money, and beats suspects. How, then, can the man trying to bring him to justice be the "bad guy"?READ more
1 May 2007 // 9:59 PM
Apparently, as the sun's strongest rays finally settle over the movie going public, sequels are the remedy to cool down an overheated demographic. This month alone holds five examples of such redux refreshment. The rest of the choices are a variety pack of genres, ideas and possibilities.READ more
24 Jan 2006 // 12:00 AM
The betrayals work in all directions at once.READ more
23 Jan 2006 // 12:00 AM
Most of the brilliant fourth season is focused on the interplay of Vic with the two single-season 'heavyweights', Glenn Close as Captain Monica Rawling and Anthony Anderson as local kingpin Antwon Mitchell.READ more
12 Dec 2005 // 12:00 AM
The superpowers bring trauma, anger, and confusion, and eventually a sense of responsibility, as the crew decides to do good with what they've got.READ more
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As Marvel comics fans already know, being zapped by a radioactive cloud in outer space alters your DNA according to your sense of self.READ more
21 Mar 2005 // 12:00 AM
Vic is the man in every way: mean, impulsive, voluble, in love with his authority but resentful too, resisting his own responsibility.READ more
24 Feb 2005 // 12:00 AM
The Shield's moral center perpetually shifts, as the Team members struggle to maintain their sense of balance, caught between the outright villains and their own dishonesty.READ more
9 Mar 2004 // 12:00 AM
The Shield remains, shot for shot, TV's most compelling hour.READ more
Lana Del Rey "Love" (Singles Going Steady) // Music
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Big Bad Voodoo Daddy "Dinah" (audio) (premiere) // Music
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'Fire Emblem Heroes' Is a Bad Crossover
// Moving Pixels
"Fire Emblem Heroes desperately and shamelessly wants to monetize our love for these characters, yet it has no idea why we came to love them in the first place.READ the article


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Does anyone know where to find some nice and simple FOF synthesis tutorials for max msp?
Thanks ahead!
1- See "gabor-tutorials" folder in this package : http://ftm.ircam.fr/index.php/Gabor
2- See "singing-voice~.help" patcher in this package : http://cnmat.berkeley.edu/downloads
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Roses Are Red, Valentines Are Green: Five Eco-Friendly Romance Tips
By Josie Brown
On Valentine's Day, most people see red. Wouldn't it be great if they thought green, too?
As February 14th approaches, most of us are considering how we can best show our loved ones that they are special to us. But your romantic celebration doesn't necessarily mean using up Mother Nature's precious resources.
Here are five tips that will help save the environment while stoking the passion:
Tip #1: Get away—by staying in.
Start by setting up your bedroom as a love shack. Sprinkle your sheets with organic scents, like these from Pure Sense by Paula, or place lavender under your pillow.
Another sexy scenario: set up a treasure hunt in your home.
Write down clues—on recycled paper, of course—that lead your loved one to some heartfelt mementos. Items like photos of the two you, or old menus or matchboxes from your favorite haunts, will remind your significant other why he fell in love with you in the first place. Maybe the last clue leads him to a picnic for two, right there in your favorite room of the house: the bedroom. For an easy, tasty and romantic meal, do something creative with leftovers (of course).
Tip #2: Conserve water by bathing together.
A bubble bath—either before or after sex—is one of the most romantic acts a couple can do together. The key word here is togetherness. Sure, showers can be sensual, but bubble baths conserve more water—and are playful, too.
Tip #3: Why get roses when you can have a rose bush instead?
This year, tell him to forgo the usual dozen roses. Instead ask him to you give the gift that keeps giving, year after year. Rose plants come in all sizes—either as bushes or vines—it can thrive in something as small as an apartment deck, and can be grown organically, too. And colors range from pinks, corals, and deep reds, to yellows, golds, and whites. Remind him of your favorite color, then tell him to go for it. Or he can choose one with a name that resonates with you. For example, if you're a fashionista, you'll love the Miss Dior. If you're a Beatles fan, there's the Penny Lane. Bottom line: he can be creative.
Then again, many florists, like Organic Bouquet, are recognizing the importance of using organically grown flowers in their arrangements. If he wants to go this route, save the fallen rose petals for another luxurious bath.
Tip #4: Light his fire, with organically scented candles.
Sadly, burning wood in your fireplace sends out a lot of toxins. So instead, line up candles of all different shapes and sizes inside the fireplace—either beeswax, or soy, like these sold by Essere Organics—and have them lit when he gets home. He'll want to make love right then and there, by candlelight.
Tip #5: Tell him to make your Valentine's card.
He can use old photos that will pull at your heart strings. Perhaps one of your baby photos—next to his. Just remind him that what will win you over is the personal message he chooses to write inside—as opposed to typing it, or sending it via email. Sure, a quick IM would save paper, but on this day, the primary goal is to be romantic, right?
Another thing that will kill any kindled passion is recycling last year's Valentine's card.
My husband did this to me one year. He just crossed out the date, and wrote in a new one. That put him in the dog house until our anniversary. Being green is one thing. Being cheap or lazy is something altogether different.
Thinkin' Green? Then Check Out These Websites for Great Gifts and Sustainable Living Ideas, Every Day of the Year…
Great products for stylish living.
A great blog about easy living, while living green.
This site truly makes you think about sustainable living.
Proof that eco-friendly fashions can be fun.


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----- Original Message -----
To: firstname.lastname@example.com
Sent: Thursday, June 23, 2005 5:01
Subject: [iris-photos] 2003 Seedling
I think I might have posted this one before my daughter taught me how to
save to another file and shrink even more. It might have been
way to big for most to view it the first time back in May. Anyway
this is 23BS4; High Master X 99AD7 (Conjuration X Sweet Musette) I think
I'm introducing 99AD7 next year because it throws great branching in most
seedlings as evidence in the photo.
Bob in Denver
Iris4u Iris Garden
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Installation of a modular green roof that is about half an acre in size has begun at the New York Hospital Queens in New York City. The roof will consist of plant trays featuring sedum, and it is expected to reduce stormwater runoff from flowing into nearby waterways. Manhattan College will monitor the stormwater management performance of the roof.
Full Story:The Queens Gazette (N.Y.)


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They're no longer newborns, but they're definitely still babies. They seem so small and fragile – parents often find themselves concerned about the effects of the world on their baby: Is this medication safe? Should he have this vaccine? Is she sick or just hungry? Is he supposed to do that? Is she supposed to have that many poops in one day? Peruse the articles below, do a search, or ask Dr. Greene for advice if you don't find the answer to your questions.
Infant Health Top Story
Feelings: Does my baby really understand?
With each child I've learned a little more about parenting than I knew before, I guess they refer to that as earning your stripes. Sometimes your first child gets a little more attention just by the ...


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InlinePRO S2000 933rwhp :)
InlinePRO S2000 933rwhp 38psi
Full-Race Turbo RSX Type-S
THIS CAR IS NOW FOR SALE AS OF DECEMBER 2010. I have done a lot of work since this video was made. The motor was built, a lot of money has been put into the interior and exterior, etc. I have the car listed on 2 differen't for sale threads online. If you are interested message me or post on those threads or message me on Youtube. The for sale ads have all of the information about the car, including all of the modifications and lots of pictures. Thanks. http://www.k20a.org/forum/showthread.php?t=85127 http://forums.clubrsx.com/showthread.php?t=749229 http://forums.clubrsx.com/showthread.php?t=749232 THE CAR IS NOW ON EBAY!!!! http://cgi.ebay.com/ebaymotors/2006-Acura-RSX-Type-S-Highly-Modified-turbo-Custom-/280617397600?pt=US_Cars_Trucks&hash= item415619ad60
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Pineapple Pimento Cheese Salad
21 Jun 2009
|Lemon gelatin
|1 Tablespoon
|1⁄2 Cup (8 tbs)
|Boiling water
|1 Cup (16 tbs)
|Pimento cheese spread
|2 Cup (32 tbs)
|Crushed pineapple
|1 Can (10 oz)
|Dessert topping mix
|1 Cup (16 tbs)
Dissolve lemon gelatin and sugar in boiling water.
Cool until syrupy; beat in pimento cheese spread and pineapple.
Let congeal to syrupy stage; fold in prepared dessert topping mix.
Refrigerate until completely set.
Recipe Summary
Difficulty Level:Easy
Course:Side Dish, Fruit Dessert
Rate It
Nutrition Rank
Nutrition Facts
Serving size
Calories 181 Calories from Fat 42
% Daily Value*
Total Fat 5 g7.1%
Saturated Fat 0.5 g2.5%
Trans Fat 0 g
Cholesterol 0 mg
Sodium 15 mg0.6%
Total Carbohydrates 21 g7.1%
Dietary Fiber 0.31 g1.3%
Sugars 19.4 g
Protein 14 g28.7%
Vitamin A Vitamin C 6.3%
Calcium 0.1% Iron 0.01%
*Based on a 2000 Calorie diet
Pineapple Pimento Cheese Salad Recipe


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Would you like to go driving with Raymond Babbitt (portrayed by Dustin Hoffman in the 1988 movie Rain Man), go shrimping with Forrest Gump (Tom Hanks in the 1994 movie by the same name), or simply share the innocence of James Robert "Radio" Kennedy (Cuba Gooding Jr., 2003, Radio)?
Many publishers who have supported books about childhood disabilities (including Autism) have cautioned authors that personal experiences are not in demand. Over the past decade more than 100 books written by the family members (dominantly parents) of people with autism, Asperger's, and a few other disorders have been marketed. Generally these works emphasize the commitment of parents, the struggles and difficulties presented by living with and caring for and about persons with disabilities, challenges faced day to day including those presented by the systems to be navigated, and associated triumphs and related "cures."
Rain Boy is entirely different. There is no attempt to call attention to anyone but Shane and the evidence of how he is special through his communications with his father. The book, in fact, has a very refreshing focus and is fundamentally a celebration of the gifts and challenges accompanying the life of one child with autism.
The charm and tragedy are conveyed through a number of illustrative anecdotes. These vignettes highlighting Shane's disabilities, challenges, savant, and more were first shared with family and selected close friends. The anecdotes underscore some of the characteristics of his disorder.
It is unfortunate that countless other scenarios have eluded preservation and many more have been censored. The rationale to share with a broader audience now is to raise awareness and understanding, to find readers who empathize and recognize such stories put into the contexts of their own personal experiences, and to otherwise entertain all readers.


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The UCSF Graduate Program in Biomedical Sciences is an interdisciplinary program that trains students for research careers investigating the molecular basis of tissue and organ function in health and disease. It offers a novel integrative curriculum, designed specifically for graduate students, which provides a foundation in cell biology, molecular biology, genetics, and biochemistry as applied to research problems in human developmental biology, physiology, and disease. Training is supported by laboratory rotations, journal clubs, and research seminars. The program's faculty consists of 110 members drawn from both basic science and clinical departments. Their research interests are broad, but focused into eight thematic areas: Cancer Biology and Cell Signaling, Human Genetics, Vascular and Cardiac Biology, Developmental and Stem Cell Biology, Immunology, Microbial Pathogenesis and Virology, Neuroscience, and Tissue/Organ Biology and Endocrinology. Trainees are chosen from a national applicant pool, with special effort to include underrepresented minorities. The interdisciplinary spirit of the program reflects the interactive scientific culture at UCSF.
Trainees study multiple human diseases including cancer, cardiovascular disease, developmental disorders, infectious diseases (such as AIDS), immunological diseases (such as asthma), diabetes and neurological disorders. The broad training allows graduates to develop careers in academia identifying molecular and cellular underpinnings of major human diseases or in the biotech sector developing novel therapeutics.
|Southwell, Derek G; Nicholas, Cory R; Basbaum, Allan I et al. (2014) Interneurons from embryonic development to cell-based therapy. Science 344:1240622
|Johnson, Brett E; Mazor, Tali; Hong, Chibo et al. (2014) Mutational analysis reveals the origin and therapy-driven evolution of recurrent glioma. Science 343:189-93
|Smith, Robin P; Riesenfeld, Samantha J; Holloway, Alisha K et al. (2013) A compact, in vivo screen of all 6-mers reveals drivers of tissue-specific expression and guides synthetic regulatory element design. Genome Biol 14:R72
|Tsvetkov, Andrey S; Arrasate, Montserrat; Barmada, Sami et al. (2013) Proteostasis of polyglutamine varies among neurons and predicts neurodegeneration. Nat Chem Biol 9:586-92
|Bouhlal, Yosr; Martinez, Selena; Gong, Henry et al. (2013) Twin Mitochondrial Sequence Analysis. Mol Genet Genomic Med 1:174-186
|Fan, Qi-Wen; Cheng, Christine K; Gustafson, W Clay et al. (2013) EGFR phosphorylates tumor-derived EGFRvIII driving STAT3/5 and progression in glioblastoma. Cancer Cell 24:438-49
|Oksenberg, Nir; Ahituv, Nadav (2013) The role of AUTS2 in neurodevelopment and human evolution. Trends Genet 29:600-8
|Harris, R Alan; Wang, Ting; Coarfa, Cristian et al. (2010) Comparison of sequencing-based methods to profile DNA methylation and identification of monoallelic epigenetic modifications. Nat Biotechnol 28:1097-105
|Kirshner, J R; Staskus, K; Haase, A et al. (1999) Expression of the open reading frame 74 (G-protein-coupled receptor) gene of Kaposi's sarcoma (KS)-associated herpesvirus: implications for KS pathogenesis. J Virol 73:6006-14


text:
Result Karachi Board For 10 + 9 Class for 2010 - 2011|Karachi Board -BSEK SSC Supply Result 2011,Matric,Fcs,fa | www.bsek.edu.pk|
Posted In: Latest Exam Result 2011 - 2012 .
Karachi Board of Secondary Education -BSEK has been aanounced SSC Annual \Supply Examination Class X Science + Arts Result 2010 to 2011 and Karachi Board 10 Result for 2011. Result wouldbe available for download at due-dates. Merit list Position Science Group and Arts Group for Supply and Annual Examination-2010-2011 is Also Available here.
Student of 9,10,11,12,matric,ssc,hssc,1st year,2nd year,g.science,Can Download Karachi Board Result for BSEK Class X or 10th result Science @ www.bsek.edu.pk which is-official Website Of Karachi Board of Secondary Education Pakistan, BSEK SSC Result 2010 wouldbe in PDF File for download.
- Merit List Position for Science Groups Annual Examination-2010 to 2011.
- Matric Supply Result for 2011,X Science Result Annual Examination-2010 - 2011.
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… Back to Article
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Colonial and Postcolonial Fiction in English
An Anthology
By (author) Robert Ross
Edited by Robert Ross
Format: Hardback
Normal Price: $212.00
Your Price: $190.80 AUD, inc. GST
Shipping: $7.95 per order
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Colonial and Postcolonial Fiction in English by Robert Ross
Book DescriptionFirst published in 1999. Routledge is an imprint of Taylor & Francis, an informa company.
Buy Colonial and Postcolonial Fiction in English book by Robert Ross from Australia's Online Bookstore, Boomerang Books.
Book DetailsISBN: 9780815314318
(229mm x 152mm x 30mm)
Pages: 468
Imprint: Garland Publishing Inc
Publisher: Taylor & Francis Inc
Publish Date: 1-Sep-1999
Country of Publication: United States
Other Editions...
Books By Author Robert Ross
Borders of Race in Colonial South Africa, Paperback (February 2016)
This book provides a detailed narrative of the Kat River Settlement in the Eastern Cape of South Africa during the nineteenth century.
Twenty-First Century Seapower, Paperback (February 2014)
This text offers an assessment of the naval policies of emerging naval powers, and the implications for maritime security relations and the global maritime order. This work explores the underlying sources of maritime ambition through an analysis of various historical cases of naval expansionism.
Sermon, in Which the Union of the Colonies Is Considered and Recommended, and the Bad Consequences of Divisions Are Represented, Paperback / softback (February 2012)
American Grammar, Or, a Complete Introduction to the English and Latin Languages, Paperback / softback (February 2012)» View all books by Robert Ross
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The overall goal of this research is to reveal the missing substrate "X" and shed light on the reaction mechanism for a phenylalanine transfer RNA (tRNAPhe) modification enzyme TYW1. TYW1 catalyzes the N1- methylguanine (m1G) modification to imG-14, a guanine derivative with a tricyclic aromatic ring. This reaction is the key step in wybutosine (base Y) biosynthetic pathway. Malfunction of TYW1 is suggested in HIV infected cells, which leads to the absence of base Y in tRNAPhe and causes -1 frame shifting to increase 400% during translation. This frame shifting is the ONLY way for HIV to produce reverse transcriptase, the key enzyme for virus replication. Thus, elucidating the mechanism of TYW1 via fundamental research is of great significance to the understanding of AIDS development and could potentially provide a novel approach in battling this deadly disease. TYW1 is found to possess a C-X3-C-X2-C motif, which is the characteristic feature of the radical SAM superfamily. The enzymes in this family utilize a unique [4Fe-4S] cluster to reductively cleave the S- adenosylmethionine, generating the 52-deoxyadenosyl (52-dA) radical. However, how this 52-dA radical catalyzes the N1-methylguanine modification in TYW1 is unclear due to the unknown nature of the second enzyme substrate "X". This proposal is therefore devoted to revealing the substrate "X" and removing the last obstacle in mechanistic elucidation of this important enzyme. Chemical, biochemical, spectroscopic, and enzyme kinetic methods will be employed in our experimental approach. The TYW1 enzyme expressed from different resources will be utilized in this study. In addition, tRNAPhe containing either m1G or m1G analog prepared via chemical synthesis will be employed in our investigation as well. These experiments will enable us to uncover the nature of substrate "X". The revealed structure of "X" could additionally shed light on the reaction mechanism of TYW1, which will be tested in this proposal as well as in the future investigations after the R21 grant period.
Malfunction of enzyme TYW1 results in the absence of base Y, a guanine derivative, at the position 37 of phenylalanine transfer RNA, which subsequently enables the HIV to produce reverse transcriptase, the key enzyme for virus replication. The mechanistic elucidation of TYW1 is hindered by an unknown substrate X and this project is devoted to revealing its nature and removing the major obstacle in studying TYW1 catalysis. A better understanding of TYW1 may eventually enable its induction and resume the Y biosynthesis in the HIV infected cells, providing a novel approach to battle AIDS.


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We have a very old, hand-knotted oriental rug. Before we found it at
auction, someone had raggedly cut off the fringe on one end, so it was
cheap. Since that came to the house, cats sharpen their claws only on it
while inside. So far (10 years?) it is no worse for the experience. The old
cats liked the cardboard trays, but they wore them out very quickly.
Judy B
----- Original Message -----
From: "Kitty" <firstname.lastname@example.com>
To: <firstname.lastname@example.com>
Sent: Friday, December 26, 2003 7:04 PM
Subject: Re: [CHAT] OT:weather, cats
> Chris,
> Do your cats bother your fabric-covereed furniture? If they already have
> place to sharpen their claws nd haven't bothered furniture, I can't see
> they'd be drawn to a new piece because it's leather. I don't like leather
> furniture myself, so I don't have any experience with cats' attraction to
> it. If you have cardboard trays and sissel poles and have trained them to
> use them, you should be fine.
> Kitty
> ----- Original Message -----
> From: "Chris" <email@example.com>
> To: <email@example.com>
> Sent: Friday, December 26, 2003 4:32 PM
> Subject: RE: [CHAT] OT:weather, cats
> > For weather I go to :
> > http://weather.yahoo.com/
> >
> > On another topic, does anyone have any experience with cats and leather
> > furniture? I played all afternoon on a program that allowed me to
> > arrange the furniture in my family room- I did the kitchen too, just for
> > fun. Anyway, I'm considering getting a leather recliner, maybe Misson
> > Style, but I'm worried about my cats clawing it up.
> >
> > Any thoughts?
> >
> > Chris
> > Long Island, NY
> > Zone 7
> >
> > ---------------------------------------------------------------------
> > To sign-off this list, send email to email@example.com with the
> > message text UNSUBSCRIBE GARDENCHAT
> ---------------------------------------------------------------------
> To sign-off this list, send email to firstname.lastname@example.com with the
> message text UNSUBSCRIBE GARDENCHAT
To sign-off this list, send email to firstname.lastname@example.com with the
message text UNSUBSCRIBE GARDENCHAT


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The DLC Dilemma: Too Soon or Not Fast Enough?
How quickly should downloadable content follow a game's release?
This question came to mind yesterday when Bethesda Softworks announced that the first of three downloadable content packs for "Fallout 3" will be released in January. And the day before that, Lionhead Studios said they're planning to release a premium DLC pack with new quests, characters and items in mid-December for "Fable II." Last week, Rockstar Games said the first DLC for "Grand Theft Auto IV" will be out on February 17, with additional characters, missions, weapons and vehicles.
Both "Fable II" and "Fallout 3" came out at the end of October, and their first DLC will come less than two and three months, respectively, after their original releases. Meanwhile, "Grand Theft Auto IV"'s content will arrive about ten months after the title's initial release.
I've spent almost 20 hours in "Fallout 3" so far, and I'm nowhere near finished; as for "Fable II" and "GTA IV," there are still plenty of side missions to be completed.
Is the DLC for "Fallout" and "Fable" coming out too quickly? Or has the wait been too long for "GTA IV"? Judging by the number of used copies of "GTA IV" for Xbox 360 I saw at my local GameStop yesterday -- I counted 46 -- ten months may be a little too far out.
But what do you think? How swiftly do you need downloadable content for a game you've enjoyed playing? Do you want it as soon as you're finished or can you wait a while?
Related Posts:
Is This A Bad Sign For 'GTA IV' DLC?
First Screenshots Of 'Grand Theft Auto IV' Expansion


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Scab (2008)
- Studio: Independent
- Release: February 20, 2008
- Director: Koichi Iguchi
- Writer: Unknown or Not Available
- Cast: Eigo Kuriyama, Rikito Kikuchi, Takako Hayakawa, Serina Saito, Hidehiro Takehara, Akemi Unazawa
Video archive for the film Scab, which has a domestic theatrical release in the year of 2008. There is currently one video available for the film, of which zero are trailers, as listed below. Happy viewing!
Featured Movie John Wick: Chapter 2


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Ponce De Leon Hotel
No prices found through our partners. Please contact the business directly or check some of our recommended alternatives.
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TripAdvisor Reviews Ponce De Leon Hotel Saint Petersburg
Travel Blogs from Saint Petersburg
Tis the night before flight, only 1 creature remain stirring, while the other is with wine and close to his sight blurring. Only 4 1/2 hours away... wait, this d@m- autocorrect on this new phone keeps leading thou words astray...anyway... the creature still packs to the husband's dismay. To be connived...or ...
The Horseshoe
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I decided that I hadn't done any sight seeing since Marianne (That's a town I stayed in Martha fer da cripes sake) that I would go do ...
... and the parkway was there. Ok, I was expecting something more, but it was just another two lane road in a park. The road was good, very little in the way of warnings though. Then as I went up, the clouds and drizzle started and the temp dropped. It was 54 degrees. A few quiet pockets of clear, but then lots of drizzle. Decided that I had enough after the peak and the rain picked up. The drizzle stings ...
... squeals and giggles as we talk about our plans. He has requested to go to three places: Publix, Mexico and Outer Space.
He's nothing if not ambitious. However, a little creative thinking might get him all the things on his travel wish list... hee hee.
He is also more than a little fired up to go to Washington D.C. -- one of our stops later in the week. Not sure he gets the whole gist of what D.C. is, but as a kiddo who knows the Pledge ...
Dams Dubs Jams and Joys
... Abraxas, and later met up for dinner and split some truffles. We went bar hopping to some places Daniel knew about, because he has been coming here for twenty years and was very familiar with the city. It was an interesting night of people watching. We made it to many different places and met some very weird characters. We went back to visit one of the more intersting characters whom we had met a couple days before. He runs a sandwich shop in the heart of the red light ...


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"many places you would like to see are just off the map and many things you want to know are just out of sight or a little beyond your reach. But someday you'll reach them all, for what you learn today, for no reason at all, will help you discover all the wonderful secrets of tomorrow." Juster Norton
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Breaking News:
Now open - WILEY CHEMISTS PHARMACY Santa fe, NM - Owned and operated by T.S. WILEY (click here for info)
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In a message dated 7/17/2003 11:03:28 AM Central Standard Time,
email@example.com writes:
> Wow - they aren't that bad here. But maybe my birds eat them before I
> get home from work. And I'm glad we don't have Japanese beetles. Vicious
> little beasties.
So someone please explain the difference between the two?? So I know from
now on what folks are talking about.
As for the June bugs, Pam, they come out at dark only...and hang around porch
and street lights. Rarely see any during daylight times. Since my lights
around the house are automatic, and right next to the door, this is when I get
them tangled in my hair.......most horrible feeling.
zone 9
Texas Gulf Coast
To sign-off this list, send email to firstname.lastname@example.com with the
message text UNSUBSCRIBE GARDENCHAT


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THE GERBER BABY..... now 87 years old!! Can you still see that lil smiling face?
You can still see this adorable face on GROCERY STORE shelves to this DAY!! Now 87, ANN TURNER COOK is still as beautiful as her baby pics!! Kinda dope to see the original pics that the sketch was made from SO CUTE!!


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2011 Volkswagen Touareg Repair and Maintenance Costs
A guide to repairs, service, and maintenance costs for your 2011 Volkswagen Touareg
Never overpay. Check prices with our estimator
Ask a mechanic in our community
2011 Volkswagen Touareg ProblemsBrake Pads and Rotors May Wear Out Prematurely
Brake pads and rotors may wear out prematurely. This can be heavily dependent on driving style. Our technicians recommend regular brake inspections with replacement of pads and rotors as required.
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EPC light comes on and engine runs rough. When I turn engine off and re-start, it's OK again. This seems to happen at the start of the day, especially when it's been a damp night. What's going on? The guarantee has just run out, and I know that it will cost an arm and a leg just to g...
2011 Volkswagen Touareg RecallsBrake Pedal Separates
The brake pedal pivot pin may become dislodged, resulting in the brake pedal separating from the pedal arm. Dealers will inspect the brake pedal assembly clip and install a replacement clip if one is missing free of charge to resolve the concern.
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Nutritional Information
Prepare grill.
Combine 2 tablespoons vinegar and 1 teaspoon oil in a large zip-top plastic bag; add chicken to bag. Seal and marinate in refrigerator 10 minutes. Remove chicken from bag, and discard marinade. Place chicken on grill rack coated with cooking spray; cook 4 minutes on each side or until chicken is done. Cut into 1/4-inch-wide strips.
Heat 1 teaspoon oil in a large sauce-pan over medium heat. Add the potato; cook 10 minutes or until tender, stirring constantly. Stir in onion and next 5 ingredients (onion through garlic); cook 5 minutes, stirring occasionally. Stir in tomato and next 4 ingredients (tomato through pepper). Cook 3 minutes; remove from heat.
Place 1/2 cup vinegar in small saucepan. Bring to a boil; cook until reduced to 1/4 cup (about 3 minutes).
Spoon 1 cup cooked vegetables onto each of 4 plates. Arrange 1 sliced chicken breast half over vegetables. Drizzle 1 tablespoon reduced vinegar over each serving.


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Options that come with Private Company:
Individual Legal Lifestyle
General Assembly – Merely A secret organisation that is limited, may distribute with responsibilities to put on an annual assembly that is general
Share Money Limitations – optimum stock capital needs or no-minimum.
Minimal quantity of People: 2 Amount of People: 200
Minimal Money: Nil overlooked by Businesses (Modification) Work, 2015
Minimum volume of Administrators: 2
International expense permitted (susceptible to substance Sectoral Limit based on FDI guidelines)
Continuity of existence: company not affected from the proprietor's standing.
Procedure of private Minimal Company for Development
Acquire Electronic Signature Certification (DSC) for that recommended Overseer lacking DSC;
Acquire Administrators Id Number (noise) for recommended Overseer not implementing to have noise to Ministry of Corporate Matters (MCA) Inform DIR-3;
Requirement of Type DIR-3:
Identification Evidence: Backup of SKILLET Card (Tax Everlasting Account Quantity (SKILLET) is obligatory if there must be an event of Indian Nationwide as well as in such instances candidate particulars must certainly be according to tax SKILLET)
Tackle Evidence: Backup of Passport or Selection/Voter identification or Ration Card or Driving Permit ( the area having pin-code) or Energy/telephone (Resources) invoice or AADHAR Card. This should be "Title of Candidate" simply also it should not be much less unestablished than two weeks of recording of the from the day -from.
Picture (newest Passport Dimension in JPEG format)
*Current Profession
*Email Handle of the Candidate
*Mobile/Cell Phone Number
Certification that is *Educational
*Verification to become authorised by the Candidate.
Make an application for Booking of Title Inform INC-1 combined with the costs that are recommended.
You have to make a request for certification of development after obtaining title approval. You will find three types that are necessary to be submitted:-
Type INC – 7
Type INC – 22
Type DIR – 12
Requirement of Type INC- 7 – 22 -12:
Memorandum of Affiliation (MOA) & Posts of Affiliation (AOA).
INC-8 properly notarized
INC- 10 authorised or legitimately accordingly verified by Bank
Affidavit for low – verification of deposit
The complete handle of Police Stop under whose legislation the office that is allowed can be found.
Power Invoice (not more than eight weeks) of the registered office idea
Conveyance action/Lease Contract
NOC from the notion, if handled lease's operator
Type DIR-2
Administrators Directorship points in various Businesses of interest /LLPs if any.
Type INC- 7 INC-7 for Software for the development of the firm.
Type INC-22: Notice of change or scenario of the situation of authorised office-based about the choice selected Inform INC-7. Type INC-22 will be submitted on the day of Development of Pvt Ltd organisation within thirty days
Type DIR-12: Facts of the visit of the crucial managing employees and also administrators and also the modifications included in this.
On analysis and study of the formerly reported types, the concerned Registrar of Businesses (ROC) may matter Certification of Development of Organization combined with the Corporate Recognition Number (CIN).
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Have Your Say
Submit a Review
Have you been to Primi Seacastle in Camps Bay?
Let us know what you thought of the venue and how you enjoyed your visit to Atlantic Seaboard.
Quick Facts
GPS location
Latitude: -33.959
Longitude: 18.377208332666665
Closest airport(s)
Cape Town International - 50km
Children policy
Children of all ages are welcome.
Check-in/out times
Check-in from 14h00
Check-out by 11h00
Listed on SA-Venues.com
April 2010 - No guest reviews.


text: Insufferable Brown-Haired 20-Year-Old Believes She's The Second Coming of Ann CounterErin Gloria Ryan12/21/11 5:05pm554EditPromoteGo to permalink Great news, nobody! There's a new conservative talking head in town, and she's got "Baby Ann Coulter" written all over her. She's 20. She's perky. She hates poor people— a lot!— and she's flattered by marriage proposals from strangers.


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Can't wait till 2010 for a glimpse of Tim Burton's highly anticipated "Alice in Wonderland"? Well, neither could some folks over in Italy.
Badtaste.it has gotten their hands on some early images for Burton's take on the Lewis Carroll classic.
Included is a photo of Alice (Mia Wasikowska) peering down the rabbit hole, an image of the Mad Hatter's tea party — which will be presided over by Burton favorite Johnny Depp — and a silhoutte of Alice approaching the door behind the curtain in the long hallway.
Take a look at the Alice in Wonderland pics.
"Wonderland" has been shooting in England and Los Angeles. Also cast are Anne Hathaway, Helena Bonham Carter, Alan Rickman, Crispin Glover and Stephen Fry.
What do you think? Does it look nice and disturbing as it should be? Was Burton the right person to adapt this classic again?


text:
Pet Allies in Show Low AZ
Kittens, Kittens, Kittens - we have all kinds - some at the Shelter and some in Foster Care. They are healthy, playful and happy. Now's the time to adopt. Kittens can be pre-adopted and go home at 8 weeks of age. They will be spayed or neutered, have their first kitten vaccine, a microchip, veterinary exam, ear cleaning, toe nail trims, brushing, and be treated for worms and fleas if needed. All for $20!!! Can't beat that.
A home visit may be part of the adoption process. To start the adoption process, an online adoption application is available at http://www.petalliesaz.org/dogadopt.php
Pet Allies, also known as the home of the Barkin Basement Thrift Store at the corner of White Mountain Road and Fawnbrook in Show Low, finds non-lethal solutions to pet overpopulation by offering low-cost spay/neuter services and placing homeless pets in caring homes. Pet Allies, a non-profit organization, is funded by donations from the community, sales at the Barkin Basement Thrift Store, grants and adoptions. In October 2012 Pet Allies also entered into a contract with the City of Show Low to operate the City's animal control shelter where animals may be seen and adopted.
To visit animals in foster care, call Pet Allies Clinic to make an appointment.
Pet Allies Clinic & Barkin Basement Thrift Store: 4050 S White Mountain Road - Show Low AZ Phone: 928 532-1602
Show Low Animal Control Shelter Facility: 1181 E Thornton Avenue - Show Low AZ Phone: 928 537-8009
We operate a discount spay/neuter clinic for clients who are unable to afford full service prices, our goal being to stop the excess population of pets before they end up in shelters. We also foster a limited number of pets, mostly taken in through our spay/neuter clinic.
Shelter open hours are Thursday, Noon to 6 p.m.; Friday and Saturday, 11 a.m. to 4 p.m. If you would like to visit the shelter to adopt at another time, call (928) 537-8009.
We also have animals in our care being fostered by loving, caring families in their own homes. Are you interested in becoming a foster family? Visit our web site: www.petalliesaz.org
We also partner with PACC911 and attend adoption events in the Phoenix area and once a year in Flagstaff.
Thank You!
Your message has been sent to Pet Allies.
You'll receive a copy, too, at to help you keep track of which pets you've inquired about, and which shelters and rescues you've emailed.
NOTE: Some shelters have physical locations you can visit; some of these shelters may only have pets for a limited time, so please do not wait for a reply—just go visit the shelter! Other organizations are rescue groups run by busy volunteers who may take a while to reply. You can find information about the shelter or rescue group caring for this pet, and their adoption procedures, on the pet's details page on Adopt-a-Pet.com.


text:
Entering the Child's Mind
The Clinical Interview In Psychological Research and Practice
By (author) Herbert P. Ginsburg
Format: Hardback
Normal Price: $185.00
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Entering the Child's Mind by Herbert P. Ginsburg
Book DescriptionEntering the Child's Mind teaches a powerful technique for gaining insight into a child's way of thinking. In the tradition of Piaget and Vygotsky, Dr Herbert P. Ginsburg argues that standardized instruments of evaluation often fail to meet the challenges of complex cognition. He presents the 'clinical interview' as a powerful tool that, when understood and used properly, can provide psychologists with a profound appreciation for children's thinking. Dr Ginsburg aims to convince the reader that the method has important applications in research, clinical practice, and education. The clinical interview offers a degree of flexibility that allows psychologists to more closely assess the thinking of a particular child.
Buy Entering the Child's Mind book by Herbert P. Ginsburg from Australia's Online Bookstore, Boomerang Books.
Book DetailsISBN: 9780521496858
(216mm x 138mm x 21mm)
Pages: 296
Imprint: Cambridge University Press
Publisher: Cambridge University Press
Publish Date: 28-Nov-1997
Country of Publication: United Kingdom
Other Editions...
Books By Author Herbert P. Ginsburg
Preparing Early Childhood Educators to Teach Math, Paperback (June 2014)
This text is your key to planning and implementing effective professional development, .improving the way educators teach math to children ages 3 6."
Entering the Child's Mind, Paperback (November 1997)» View all books by Herbert P. Ginsburg
This is the first comprehensive treatment of the theory and practice of the clinical interview method.
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Yes, when you give birth in a hospital. But if you give birth at home the paperwork isn't automatically done for you, you need to do it yourself, hence the PITA hassles some people have faced.
|I still don't see how the little immunization card (which does not have a picture) establishes identity....
Right - and a medical record is identification in what way? Unless you are the only person in the country with your name and no one else has ever stolen your identity or lived before you with the same name, a medical record is not proof of anything, other than that someone who claimed to be named talk de jour received treatment from Dr. Vaxalot. Not sure what's so difficult to grasp about that.
Plus, frankly, a picture of a baby doesn't tell you a whole lot. Most parents would probably be able to pick out a picture of their baby from a line-up, and perhaps a civil servant might be able to conclude that the babe in arms is identical to the babe in picture, but then again they might not. Babies definitely tend to have certain similarities. Oh, and they change a lot. There is a reason why photo IDs are not yet proposed for newborns
WTF? DD has had a SS card since she was born and has never received a single vax. In the state where I lived at the time (MS), when you applied for a birth certificate while in the hospital, it automitically applied you for a SS card.
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