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Vanity Fair: A Novel Without a Hero
Dodd, Mead, 1924 - British - 753 pages
"A picture of society on a broad canvas, embracing a great variety of characters and interests, the object being to depict mankind with all its faults and meannesses, without idealization or romance ... The careers of Becky Sharp, the adventuress, and her husband, Rawdon Crawley, make an apt contrast to the humdrum lives of the good hero and heroine, Dobbin and Amelia. The nobility, fashionable people about town, the mercantile aristrocracy and the needy classes below them, are all portrayed in the most lifelike way ... Thackeray combines his comment with narrative ... To many readers, indeed, his sarcastic dissertations are the chief intellectual delight." Baker. Guide to the Best Fic. *** "Becky Sharp, one of the most resourceful, engaging, and amoral women in literature, is the heroine of this sparkling satirical panorama of British society during the Napoleonic Wars." *** "Becky Sharp and her husband stand in contrast to the lives of Dobbin and Amelia in this revelation of societal classes." *** "This book is a densely populated, multi-layered panorama of manners and human frailties ... The novel deals mainly with the interwoven fortune of two women, the wellborn, passive Amelia Sedley and the ambitious, essentially amoral Becky Sharp, the latter perhaps the more memorable character Thackeray created. The adventuress Becky is the character around whom all the men play their parts." Merriam-Webster's Ency of Lit. *** "A satirical look at Victorian manners recounting the experiences of two finishing school graduates, Becky Sharp and Amelia Sedley."
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LibraryThing ReviewUser Review - TheEditrix - LibraryThing
Read the first couple of chapters last night and ARDSJDSG MY GOODNESS this is going to be so good. It's been way too long since I last read a Victorian classic. Read full review
LibraryThing ReviewUser Review - benuathanasia - LibraryThing
Ok, I'm not going to lie, by and large I have little idea what this was about (it was kinda like shoving four seasons of a television sitcom into one weekend...). That being said, I found it hilarious ... Read full review


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Hope House Foundation Hope House Foundation
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To provide community based services and support for people with disabilities. Our services are based on the conviction that people with disabilities, regardless of their severity, have the right to participate in community life. We believe that community integration and inclusion should not be limited by level of functioning or attainment of certain skills, but only by available resources and technology. We strive to refine and broaden our resources and capabilities so that more people with varying degrees of disabilities can be served successfully in the community.
Nonprofit organization which provides supported living services for adults with developmental disabilities so that they may live in their own homes and play active roles in their communities.
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Here we see International Space Station crew member Terry Virts trapping antacid in a water bubble which turns it into a bubbly disco ball of science. The dissolving tablet grows tiny bubbles that are constantly moving and changing..and totally funky.
NASA used the experiment to test out new video equipment that's capable of shooting in up to 6K. The camera captured tiny little bubbles expelled from the effervescent ball with incredible detail. NASA plans to use the new camera to broadcast videos from the ISS as well as document continued lab experiments.
Check out the memorizing video after the break.
(NASA via io9 / GIF: That's Nerdalicious)


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The Bauer Hi-Lo Street replacement wheels are ideal for outdoor play. They are strong and soft enough to allow for solid grip on the asphalt or concrete.
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Please note that store inventory is updated online every 24 hours. As a result, do not hesitate to contact the store before going to confirm product availability.


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Versoul Raya Custom New
Product Code:
$ 8,350.00
An eye-catching solid body made by Finnish builder, Kari Nieminen. This glistening Versoul features real gold leaf on top of a 2 piece Alder body! The guitar has a warm, clear attack and freely resonating tone, due in large part to the custom Versoul Pickups.
- Body Wood -Two Piece Finnish Alder
- Fingerboard Wood -Rosewood
- Nut Width -43mm
- Scale Length -25.4"
- Pickup(s) -Original Versoul
- Case -Gig Bag


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McCall's 4691; ©1958; Misses' Sheath and Jacket. Square neck sheath dress and short box jacket. Dress is dart fitted, has back walking pleat and left side placket. Empire line suggested by high placed band and bow. Away-from-neck jacket has wide collar and revers, is fastened by one low placed button. Jacket is lined and entire back, front and collar are interfaced. 13 printed tissues.
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President Bush presents a clear and present danger to the rule of law. He cannot be trusted to conduct the war against global terrorism with a decent respect for civil liberties and checks against executive abuses. Congress should swiftly enact a code that would require Mr. Bush to obtain legislative consent for every counterterrorism measure that would materially impair individual freedoms.
Here's hoping that the US Congress gives Americans a generous set of constitutional presents for Christmas: appointing a Special Prosecutor to investigate Shrub; setting up a joint Congressional Committee of Inquiry; and enacting the law that Fein suggests. Otherwise we can expect continued contempt for the Constitution and the United States of America from its President.
...there are no checks on NSA errors or abuses, the hallmark of a rule of law as opposed to a rule of men. Truth and accuracy are the first casualties of war. President Bush assured the world Iraq possessed weapons of mass destruction before the 2003 invasion. He was wrong. President Franklin D. Roosevelt declared Americans of Japanese ancestry were security threats to justify interning them in concentration camps during World War II. He was wrong. President Lyndon Johnson maintained communists masterminded and funded the massive Vietnam War protests in the United States. He was wrong. To paraphrase President Ronald Reagan's remark to Soviet leader Mikhail Gorbachev, President Bush can be trusted in wartime, but only with independent verification.


text: Hey everyone, I am in the process of starting to get everything ready and organized so when mowing season is around I have everything ready to go. I am trying to get some ideas how to keep track of my equipment,handhelds, tools etc when I have 2 crews out working so everyone has their own tools and I want to make an inventory list to make remembering maintaince on time. I was thinking of getting a label maker and making a number system for everything and log it into a spreadsheet. Like label the mowers, blowers, trimmer 1,2,3...etc. does anyone have suggestions or ideas that would work better, is this idea difficult to keep up with and so on, Any input is appreciated! Thanks! Posted via Mobile Device


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Have Ford Questions? Ask a Mechanic for Answers ASAP
Would I be able to get a stronger hose from somewhere else? The factory hose is not strong enough when the temperature drops below -40 C. The fluid becomes thicker than ussual and the hose can burst. Do you have any suggestions?


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WR Sammy Watkins, RB Fred Jackson active for Bills
Both wide receiver Sammy Watkins and running back Fred Jackson are active for the Buffalo Bills against the Kansas City Chiefs on Sunday, the Bills announced.
Watkins and Jackson were questionable for the game due to groin injuries.
Watkins, a rookie, did not participate in practice on Thursday or Friday after leaving Wednesday's practice with the injury. He later said he's been bothered by it for two weeks, and said Friday that he was "clueless" about his status against the Chiefs.
• BELLER: Last-minute advice for Week 10 fantasy lineups
Jackson was limited in practice all week after originally sustaining the injury on Oct. 19. On Friday, head coach Doug Marrone said the running back currently was not ready to play.
Watkins has 38 receptions for 590 yards and five touchdowns through eight games this season, while Jackson has 239 yards and one touchdown on 55 carries.
Buffalo (5-3) hosts Kansas City (5-3) at 1 p.m. ET Sunday.
- Molly Geary


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Cooking with Pete and Barb Marczyk: Milwaukee "caviar"
Pete Marczyk and Barbara Macfarlane do not leave their work behind when they leave Marczyk Fine Foods and head for their great old Denver house with the big, new kitchen. They often bring some of their market's choicest ingredients home with them and cook up a feast.
Pete and Barb don't always cook dinner at their house -- sometimes they enjoy the luxury of having someone else cook for them, which was the case earlier this week. "Pete and I had dinner at Peter and Kristen Park's house -- they're good friends of ours from Milwaukee -- and in addition to her amazing fried chicken and French fries, Kristen also made an orzo salad that was terrific," says Barb. "As summer starts to unfurl, orzo salads are a must-have at most barbecues," she adds, "and this one takes it up a notch with a little sharpness from the feta, a little sweet from the currants and the pesto, which just makes it all come together."
See also: - Cooking with Pete and Barb Marczyk: Stracotto - Cooking with Pete and Barb Marczyk: Coq au vin - What's cooking? Pete Marczyk goes New Mex in the city with green chile
Milwaukee Caviar
1 pound cooked orzo 1 red pepper, chopped 1 orange pepper, chopped 1 long and skinny English cucumber, peeled, seeded and chopped 1/2 cup currants 1 package feta, crumbled 1/2 cup pine nuts, toasted Salt and pepper to taste
Mix all of the ingredients in a bowl and toss liberally with salt and pepper.
3 tablespoons prepackaged pesto 1 tablespoon olive oil 1 1/2 tablespoon fresh lemon juice or balsamic vinegar Freshly grated Pecorino
Thin the pesto with olive oil and add vinegar or lemon juice to taste. Toss dressing with pasta and sprinkle with Pecorino.
For more from Pete, Barbara and Marczyk Fine Foods, visit the market website. And be sure to check out Pete's blog and Marczyk Fine Wines.
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The Latin Products
The Latin Products is the largest store online with worldwide shipping available that sells Latin and Mexican products individually or wholesale. We offer products in different categories including: Latin and Mexican foods, cooking utensils, cooking equipment, health and beauty products, religious candles and statues, cleaning supplies, Mexican party items, and exclusive Jewelry. Latest The Latin Products coupon code here!
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Look at other dictionaries:
diffusedly — dif·fus·ed·ly … English syllables
diffusedly — adverb see diffused … Useful english dictionary
Labourd — ( Lapurdi in Basque; from Latin Lapurdum , Labord in Gascon) is a former French province and part of the present day Pyrénées Atlantiques département . It is historically one of the seven provinces of the traditional Basque Country.Labourd… … Wikipedia
diffused — /dəˈfjuzd/ (say duh fyoohzd) adjective 1. spread widely. 2. (of lighting) distributed evenly, without glare. –diffusedly /dəˈfjuzədli/ (say duh fyoohzuhdlee), adverb … Australian English dictionary


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text: Aruba Networks targets a Cloud first, mobile first approach to networking29 Oct 2015 05:38 PM Following its acquisition by HP, Aruba Networks aims to disrupt the industry by being the leader in agile application delivery from the data centre to the mobile edge in both wired and wireless LAN environmentsEnterprises and other organisations are increasingly shifting their networks away from the 'Gen Y' traditional model of hardware platform, Ethernet port and desktop PC to one that embraces mobile computing and communications via the cloud.This shift was the driving force behind HP's decision to acquire Wi-Fi manufacturer Aruba Networks on 2 March 2015 - a purchase completed on 19 May. HP has a vision for what it calls 'the unified wired and wireless campus' and it believes that by joining Aruba's wireless LAN infrastructure expertise with HP's strong presence in wired LAN, it can fulfil this vision.The arrival of Aruba into the HP fold also brings with it expertise in enterprise mobility software, security and orchestration solutions that can be integrated across this campus infrastructure. HP Aruba aims to provide a Cloud first, mobile first approach to networking.Aruba has been combined into the HP Networking business, which sits within HP's Enterprise Group, and is now referred to as Aruba Networks, an HP business. HP has been at pains to try and avoid the loss of drive and focus that can affect a relatively small, agile player when it is absorbed into a large enterprise.It has retained Aruba's executives, including CEO Dominic Orr, and in an effort to keep it agile and flexible, is treating the HP Networking/Aruba unit as if it were a 'start-up' – albeit one with revenues of US$3 billion.In a briefing on 7 October 2015 in London, Dominic Orr, president of Aruba Networks (pictured), outlined the company's strategy and future road map.Orr explained that for what Aruba calls 'GenMobile'- the new generation of mobile savvy employees entering the workplace - life and work is inseparable; they mix life and work apps on the same device – a process he referred to as 'ensumerisation'. GenMobile wants to be able to access everything via their devices anytime, anywhere.VirtualisationOrr said there are two kinds of virtualisation at work in networks today that are now making GenMobile's demands possible. 'First, the server is moved around; you don't know where the compute resources are that you are interfacing with.'The second is the virtualisation of the user identification. There used to be a one-to-one association between the user, the PC and the port. But now you can access that ID through multiple devices. You have a different persona as you get onto the network via different devices – this is virtualisation at the edge.'What this means, according to Orr, is that a very different infrastructure is required to enable a virtual user to interact with a virtual application in a situation where it doesn't matter where that user gets onto the network.But the challenge is being compounded by the growth of M2M/IoT communications, which have big ramifications for the IT infrastructure, as the predicted millions, if not billions, of connected devices will drastically stretch the underlying structure.'From client server computing we are moving to Cloud computing,' said Orr. 'We think the combination of HP and Aruba at this point will create a disruptive technology here. HP once stood for wired switching networks, but it is now leading the industry in open flow software switching – software defined networking (SDN).'Orr explained Aruba's mission is one where it wants to be the leader in:• Mobile first campus networking• Cloud first data centre networking• Deliver a very high growth, high margin business model• Build an elite networking workforce.He pointed out that the market opportunity is considerable: the Enterprise Networking market is worth about $20.1bn (HP/Aruba have a $2.5bn share); Data Centre Networking some $9.9bn (HP/Aruba - $200m); and the Network Access Control market is around $550m (where HP/Aruba's current share is around $68m).There is plenty of competition out there of course, so Orr said Aruba's way of differentiating itself is to provide agile application delivery from the data centre to the mobile edge.'It is complex and the key word here is agile,' he noted. 'We are the plumber of the network; we hook the pipes together. But what kind of plumbing is needed in the future? We store the compute power and memory in a server. But now these servers are not in your building; they are in massive data centres elsewhere and we access them via the Cloud.'Every time you click on a mobile app it calls on a different server and you need to get this to the edge; to the mobile device. How do we architect this and address the need for instant access?' Orr asked.Orr said a number of areas need to addressed to meet this challenge and for Aruba to differentiate itself in the market. He broke these down into four areas:• Agile Data Centre• Digital Workplace• Adaptive Trust• Mobile Engagement'This is not about routing and switching, which is all designed to serve the old network architecture, not the new one,' Orr asserted.Agile Data CentreOrr argued that the Agile Data Centre needs to be proven at scale and open at every layer.'We need an open system as the features of each application are going to be different, so this requires a composable per application computing infrastructure, where you release the necessary resources to handle the demands of a particular application – addressing priority, timing, bandwidth, etc. We are designing this and we believe we are the best in the world at this right now.'Digital WorkplaceThe new Digital Workplace is one dominated by wireless devices and Orr argued that networks have to get smarter. Aruba intends to differentiate itself here by providing a single architecture, tackling Layer 4-7 application services and providing application and user visibility.'We need to be constantly aware of who the users are, what apps need priority and what resources need to be marshalled to deal with them,' said Orr. He also argued that not all the traffic needs to be handled all the time.'We need to have the intelligence to decide what traffic needs to go through immediately and what can wait; who are the VIPs in the room? We have to preferentially disappoint – you know which apps or which people you must give preference to,' he said.Adaptive TrustReferring to older Gen Y network architectures, Orr noted that they feature trusted and untrusted zones. This outlet is in a safe area, but this port is facing the Internet, so it is not trusted. The traditional response is to put a firewall between that port and the company.'But companies are not so monolithic these days,' observed Orr. 'They have part time and temporary workers and guests inside the trusted zone with non-company devices. So, you assume everyone is bad and only provide a small hole in your network when you know who the user is, what device they have and what they want to do. When they finish, you block them out again – this is adaptive trust,' he explained.But he pointed out that it is hard to change a user's profile very quickly from trusted to untrusted. Aruba's ClearPass product is designed to tackle this as it provides a policy engine to deal with mobility; e.g. it is okay to do x and y in your office within these hours, but not after. Or, you can do some things in the public café, but not others – in short it enables an adaptive device and application management policy that in turn enables enterprises to meets the demands of the mobile workforce.Mobile EngagementAllowing anytime, anywhere access means that the majority of the access is in public environments such as venues and train stations. This means enterprises are in effect dealing with an all BYOD environment.'The plumbing is no longer the plumbing,' observed Orr. 'The key attribute of SDN is the interaction with the plumbing; the software defines the network according to the device or applications' need. SDN breaks the old model.'To enable this, Orr argued that mobile engagement needs to be simple and Cloud managed and it requires a rich SDK for application developers.As an illustration, Orr cited the example of a retail environment. 'We now have the opportunity to use the network to see who has come into the shop. We can see that a certain customer comes into a particular coffee shop every Monday to Friday between 8.00 and 8.15, but at the weekend goes to a branch somewhere else for two hours.'A company could use the data to increase the rent in one location, because they can prove the footfall is 40% greater in this branch than that one. It can also use this data to push information, vouchers, or a loyalty card to the customer – this is mobile engagement,' said Orr.Product PortfolioOutlining the combined HP/Aruba product portfolio, Orr said it comprised a range of offerings from the agile data centre to the mobile edge:• Software: management, policy & location-based services• Mobility Infrastructure• Campus Switching• Data Centre SwitchingIn term of building an elite networking workforce, Arbua has also developed what it calls its Airheads Community of 36,000 campus mobility engineers, working in different parts of the industry – in R&D, in the technical community, channel partners and so on, who can act as advocates to customers.Looking at Aruba's position in the industry, Orr cited some recent research into the wired and wireless LAN access infrastructure market undertaken in August 2015 by Gartner. HP Enterprise (Aruba Networks) was placed in the Leaders section of the Gartner Magic Quadrant, along with Cisco.HP Aruba came top in Gartner's analysis of critical capabilities for wired and wireless LAN access infrastructure for the following:• Enterprise unified wired and WLAN access• Enterprise wireless-only connectivity• SMB and/or small or remote branch office• Voice over WLAM• IaaS or managed service.It came second in a sixth capability - enterprise wired-only connectivity, behind Cisco. It was also ranked a close second in data centre networking in both Forrester's 2015 Wave report and Gartner's 2015 Magic Quadrant report.Summing up, Orr said the HP Aruba culture is focused on: profitable growth; innovation; customer first/last; and to be the 'biggest small company'. His closing message to enterprises was that they need to:• Transform to a hybrid infrastructure• Protect your digital enterprise• Enable workplace productivity• Empower a data drive organisation.Prospects for the EMEA marketAlain Carpentier, VP HP Networking and Aruba EMEA, outlined how the company intends to translate the strategy outlined by Dominic Orr on the ground in the EMEA region.Taking a look at the potential EMEA networking market from 2015-18, Carpentier said that the Networking market is expected to grow from $0.8bn to a $9.6bn business (a CAGR of +2.9%). Within this, WLAN and Campus are an opportunity and a key growth portion of the total, rising from $0.4bn in 2015 to $5.7bn in 2018 (a CAGR of +1.4%).WLAN on its own underpins this growth and the shift to mobile and the Cloud, rising from $0.5bn to $1.9bn (a CAGR of +11.5%). Carpentier argued that HPE Aruba is a solid growing challenger in this space behind market leader Cisco in both WLAN and the L2 and L3 enterprise Ethernet switch market in the EMEA region.'We are a solid No.2 in WLAN with an 11% market share, rising to 15% when HP's share is added. We are also a solid No.2 in the L2 and L3 enterprise Ethernet switch market with a 12.8% share,' he said. In Q2 2015, HP had a 12% of the data centre revenue market share and 16% of the port market share. 'So, we are in a good position in wireless, wired and data centres,' said Carpentier.HPE Aruba's EMEA strategy is to disrupt the industry. 'The installed base is very traditional, so they need to switch to a mobile first approach.' The approach required has to be simple, software defined, contextual and open.The goal on the mobility side is to deliver high quality applications that perform everywhere to boost workplace productivity. The tools for this include: mobile optimised networking, security and management products, and mobility software.'The HPE Enterprise sales force and the Aruba WLAN sales force will combine to sell the mobility concept in the SMB space,' said Carpentier. 'We want a big, agile sales force, plus the HP Enterprise sales forces to help penetrate the big customers and government organisations.'On the Cloud side the aim is deliver those applications faster with an agile development ecosystem using a hybrid infrastructure. This requires: disaggregate hardware and software; Cloud-optimised networking; and network virtualisation.'We had the Virtual Connect offering in the past, but we now use the Cloud for the virtual offering. HP is working with Alcatel-Lucent's SDN solutions unit Nuage Networks on virtualisation. We are introducing a lot of new open standards that work with the Cloud better than traditional data centre operations,' said Carpentier.The basis of the approach is that the Cloud will be the standard of the future. This will disrupt the traditional market and change the thinking of the customers, driving a shift from wired to wireless and from the data centre to the Cloud.Summing up, Carpentier said that mobility is transforming industry verticals and they want to be able to monetise this. HPE Aruba is targeting five key verticals:• Education – is producing a highly digitally educated workforce• Retail – is seeing a shift in the retail mindset: how to keep the customer in the store; use big data analysis to engage with them via their smartphones• Healthcare – digital knowledge domain, use wireless solutions, IoT – location and condition sensing• Hospitality – Wi-Fi cited as the most important amenity; therefore use it to drive more business; location based marketing• Venues/Events – Aruba has a lot of experience of digitalising venues such as stadia and museums, which helps to accelerate merchandising and food/beverage sales and provides a fast RoI for the customer.James Atkinson EditorLinkedIn |Google + |Email Leave a CommentPlease write code to prove you're humanMore on... Wi-Fi GeneralXirrus Wi-Fi deployed in London's St Pancras StationQualcomm unveils next gen 802.11ax Wi-Fi portfolioRuckus and Wifirst to provide Wi-Fi solution to hotels and campsitesMore on... Critical CommunicationsFinland and Norway sign cross-border TETRA communication dealCC Europe 2017: Hytera showcasing new base station and handheld radioLatest in Wi-FiXirrus Wi-Fi deployed in London's St Pancras StationQualcomm unveils next gen 802.11ax Wi-Fi portfolioRuckus and Wifirst to provide Wi-Fi solution to hotels and campsites


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Need help?
Contact us or call 0333 400 9500
Contact us or call 0333 400 9500
LED backlights contain no toxic mercury (Hg) to contaminate the environment, and offer substantially lower power consumption than traditional monitors, further reduced with user-selectable power-saving display modes and switch-off timer. A vivid contrast ratio of 20,000,000:1 DCR ensure clear visibility and vibrant images.
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Yen-Model Actress Model
Phillip Suddick RetouchRetoucher Male London, England, United Kingdom
My Website: Phillip Suddick Photographer & retoucher
Mayhem # 2634371
About MeFriendly, professional, reliable, published and affordable retoucher at your service.
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Have you worked with Phillip Suddick Retouch? Add Credits for Phillip Suddick Retouch! >>
Credit NotesMy projects - http://www.behance.net/phillipsuddick
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BROOKS – Reginald Greenleaf, 71, left his home Oct. 19, 2009, to enter his heavenly home. A memorial service will be held 1 p.m. Friday, Oct. 23, at Crabiel-Riposta Funeral Home, 182 Waldo Ave., Belfast. In lieu of flowers, donations may be sent to Emmanuel Baptist Church Building Fund, P.O. Box 529, Belfast, ME 04915. Online condolences may be placed at www.crabielripostafuneralhome.com.
Posted Oct. 20, 2009, at 7:54 p.m.


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The Ladies from Hell - The Black Watch- Royal Highland Regiment of Canada History MP3
The History of the Black Watch - Royal Highland Regiment of Canada From formation to disbanding at CFB Gagetown. My father is in the parade as a member of ...
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This is a military march of the 92nd Highland Regiment of Foot, also known as The 92nd Gordon Highlanders, which was created by The Duke of Gordon, who ...
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Church parade 2014 du Black Watch (Royal Highland Regiment of Canada) MP3
Défilé du Black Watch dans les rues de Montréal et consécration des drapeaux à l'église St-Andrew and St-Paul.
Upland Highland Regiment - Scotland the Brave - 2015 LACF Marching Band Competition MP3
http://uhrb.org From Upland, CA Upland High School Highland Regiment performing their musical selection entitled Scotland the Brave at the Los Angeles ...
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The Upland Highland Regiment, from Upland High School in Upland, California, performs their field show "Where the Sidewalk Ends" at the 2012 Western ...
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Video posted 90 minutes after performance and not meant for quality. Upland Highland Regiment "The Gates" Prelims 3rd place 93.95 High Music Finals 3rd ...
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Gecombineerd optreden van d'Iesselsingers-The Highland Regiment Pipes & Drums-Martin v/d Vrugt tijdens Deventer Open Podium op 4 maart 2012.
Upland Highland Regiment 2013 WBA MP3
Champions 4/5A Division.
Martin van de Vrugt (feat. The Highland Regiment Pipers) DOP 2012 MP3
Upland Highland Regiment - Scotland the Brave - 2014 L.A. County Fair Marching Band Competition MP3
http://uhrb.org From Upland, CA Upland High School Highland Regiment performing their musical selection entitled Scotland the Brave at the Los Angeles ...
Bundanoon Highland Gathering Inc., Presents 42nd Royal Highland Regiment Highlanders Australia MP3
42nd Royal Highland Regiment 1815 (Australia) Inc. ABN 96 515 982 714 E-Mail: [email protected] Website http://www.rhra.com.au/ The 42nd RHRA ...
a: Mingulay Boat Song. b: The Battle Of Killie Krankie.
The Black Watch (Royal Highland Regiment) of Canada Pipes and Drums New Years Performance part 2 MP3
The Black Watch (Royal Highland Regiment) of Canada perform songs during a fund raiser on New Years Eve 2014. Dancers perform the Highland Fling Sorry ...
Upland Highland Regiment 2008 - Beyond The Rainbow MP3
The Upland Highland Regiment from Upland, California performing "Beyond The Rainbow" at the WBA Championships on November 23, 2008. Upland ...
Upland Highland Regiment - 2011 Pasadena Bandfest MP3
http://uhrb.org Bandfest Pass & Review: http://www.youtube.com/watch?v=l-D2e9l_G3c Rose Parade: http://www.youtube.com/watch?v=hWHLVKO_Elk ...
4 Scots "The Highlanders" The Royal Regiment of Scotland, Homecoming Parade Aberdeen - 1-12-2011 MP3
The Highlanders, 4th Battalion The Royal Regiment of Scotland parade through Aberdeen, after return from tour of duty in Afghanistan.1st December 2011.
Massed bands of the Scottish Division - Highland Laddie and The Black Bear MP3
If you're interested in hearing a version that tends to be performed at the trooping of the colour, you can find the link here: ...
Royal Regiment of Scotland: Freedom of the Highlands MP3
[00:00] Parade through Inverness - music by the Pipes and Drums and Military Band [02:11] Parade enters Northern Meeting Park - music by the Pipes and ...
The Pipes and Drums of the 1st Battalion. a: Glendaruel Highlanders. b: Blue Bonnets Over the Border.
Upland Highland Regiment - Scotland the Brave - 2011 Pasadena Rose Parade MP3
http://uhrb.org Bandfest: http://www.youtube.com/watch?v=qD7OpzHmWV0 Bandfest Pass & Review: http://www.youtube.com/watch?v=l-D2e9l_G3c ...
Upland Highland Regiment 2013 - Kennedy MP3
2013 Kennedy Field Tournament.
Scots Wha Hae - 1st Battalion The Black Watch (Royal Highland Regiment) MP3
Upland Highland Regiment at the Ayala Field Tournament MP3
Upland High School's Highland Regiment marching band performs its 2011 field show, "The Gates," during the fifth annual Music in Motion WBA Field ...
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Marching around track.
Black Watch parade through Aberfeldy, Highland Perthshire MP3
The Black Watch, The Royal Regiment of Scotland on it return from Iraq and Afghanistan marched through Aberfeldy where it was founded in 1725, to counter ...
The Black Watch Regiment of Canada (R.H.R.) - 2010 Remembrance Day Parade 2010 MP3
The Black Watch (Royal Highland Regiment) of Canada 2010 Remembrance Day Parade was held in Montreal, QC Canada on November 11th, 2010.
Upland Highland Regiment 'Out to Sea' 2004 - 2005 MP3
Upland High School's WBA finals performance of 'Out to Sea' for the 2004-2005 marching band season in Concord, California.


text:
I *literally* cranked out a couple of sparkly bits the day it all arrived... Cece's own handmade lampwork was too much to resist! I put the glass together with findings and bead caps from the soup, and one of the gorgeous focals she sent....a lovely terra-cotta feather by Birgitta Lejonklou. (AngelWhisperer on Etsy). I'm definitely going to be adding more of her ceramic pieces to my work!
These two beauties are not only remaining in my personal collection, they've been worn almost daily since I made them!
But wait.... there's MORE.
With some of the bits and bobs and oddments, I put together a few pair of earrings. The dragonfly wings captivated me, and I think that I'll be restocking them when I finally run out!
Thanks again Cece!
You should definitely pop over to The Beading Yogini and have a look at what Cece did with the soup I sent her...I'm blown away!
Want to see more? You can find a complete list of participants here: http://www.prettythingsblog.com/2014/05/welcome-to-8th-bead-soup-blog-party.html


text:
Lock of John Lennon's hair set to net $10k at auction
A lock of hair snipped from the head of John Lennon as the Beatle prepared for a film role is expected to sell for $10,000 at a Dallas auction later this month.
Heritage Auctions said the four-inch lock was collected by a German hairdresser who trimmed Lennon's hair before he started shooting How I Won The War.
The dark comedy, released in 1967, follows the World War II misadventures of British troops led by an inept commander.
The auction will be held on February 20 and Heritage says it will include other rare items linked to the Beatles, such as a signed photograph of all four members.
Memorabilia from other artists such as Elvis Presley and Led Zeppelin will also be auctioned.


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About the Book
This book will help the beginner through the first couple seasons of GIANT pumpkin growing and help ensure success. Easy to follow from seeding to harvest I will show you the tips and tricks you need to get to get a 1000 pound pumpkin.
Features & Details
- Category Home & Garden
6×9 in, 15×23 cm
40 Pages
- Publish Date May 08, 2014
- Language English
- Tags world record, giant pumpkin, how to grow, giant vegetable, giant, pumpkin, extreme, gardening, vegetable, squash, gourd
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text:
On 06/23/2010 09:49 AM, Jason L Connor wrote:
On Wed, 2010-06-23 at 08:40 -0600, Jason L Connor wrote:On Wed, 2010-06-23 at 10:28 -0400, Jason Dobies wrote:Word, game on. I'll throw a note in the developer guide about that.Actually the magic variable __file__ is the full path to the file as found on the file system. It is *not* a package name. And while it does lend it self to refactoring it a lot of ways, I don't think that's what we're looking for, for the loggers.I think the variable you're looking for is: __name__
Oh, damn! You're right. I meant __name__ .
_______________________________________________ Pulp-list mailing list Pulp-list redhat com https://www.redhat.com/mailman/listinfo/pulp-list
Description: S/MIME Cryptographic Signature


text:
In JavaScript a function is not a "magical language structure", but a special kind of value.
The syntax that we used before is called Function Declaration:
function sayHi() {
alert( "Hello" );
There is another syntax of creating a function that is called Function Expression.
It looks like this:
let sayHi = function() {
alert( "Hello" );
Here the function is created and assigned to the variable explicitly, like any other value. No matter, how the function is defined – it's just a value, stored in the variable
The meaning of these code samples is the same: "create a function and put it into the variable
We can even print out that value using
Please note that the last line does not run the function, because there are no parentheses after
sayHi. There are programming languages where any mention of a function name causes the execution, but JavaScript is not like that.
In JavaScript, a function is a value and we can deal with that as a value. The code above shows its string representation, that is the source code.
It is a special value of course, in the sense that we can call it like
But it's still a value. So we can work with it like with other kinds of values.
We can copy a function to another variable:
That's what happens above in detail:
Function Declaration
(1)creates the function and puts it into the variable named
(2)copies it into variable
Please note again: there are no parentheses after
sayHi. If they were, then
func = sayHi()would write the result of the call
func, not the function
Now the function can be called both as
Note, that we could also have used a Function Expression to declare
sayHi, in the first line:
let sayHi = function() { ... };
let func = sayHi;
// ...
Everything would work the same. Even more obvious what's going on, right?
There might be a question, why Function Expression has a semicolon
; at the end, and Function Declaration does not:
function sayHi() {
// ...
let sayHi = function() {
// ...
The answer is simple:
- There's no need in
;at the end of code blocks and syntax structures that use them like
if { ... },
for { },
function f { }etc.
- A Function Expression is used inside the statement:
let sayHi = ...;, as a value. It's not a code block. The semicolon
;is recommended at the end of statements, no matter what is the value. So the semicolon here is not related to Function Expression itself in any way, it just terminates the statement.
Callback functions
Let's see more examples of passing functions as values and using function expressions.
We'll write a function
ask(question, yes, no) with three parameters:
- Text of the question
- Function to run if the answer is "Yes"
- Function to run if the answer is "No"
The function should ask the
question and, depending on the user's answer, call
yes() or
Before we'll explore how we can write it in a much shorter way, let's note that in the browser (and on the server-side in some cases) such functions are quite popular.
The major difference between a real-life implementation and the example above is that real-life functions use more complex ways to interact with the user than a simple
confirm. In the browser such a function usually draws a nice-looking question window. But that's another story.
The arguments of
ask are called callback functions or just callbacks. The idea is that we pass a function and expect it to be "called back" in certain circumstances.
showOk becomes the callback for the "yes" answer and
showCancel – for the "no" answer.
We can use Function Expressions to write the same much shorter:
Here functions are declared right inside the
ask(...) call. They have no name, and so are called anonymous. Such functions are not accessible outside of
ask (because they are not assigned to variables), but that's just what we want here.
Such code appears in our scripts very naturally, it's in the spirit of JavaScript.
Regular values like strings or numbers represent the data.
A function can be perceived as an action.
We can pass it between variables and run when we want.
Function Expression vs Function Declaration
Let's formulate the key differences between Function Declarations and Expressions.
First, the syntax: how to see what is what in the code.
Function Declaration: a function, declared as a separate statement, in the main code flow.
// Function Declaration function sum(a, b) { return a + b; }
Function Expression: a function, created inside an expression or inside another syntax construct.
Here the function is created at the right side of the "assignment expression =":
// Function Expression let sum = function(a, b) { return a + b; }
The more subtle difference is when a function is created by JavaScript engine.
Function Expression is created when the execution reaches it and is usable since then.
Once the execution flow passes to the right side of the assignment
let sum = function… – here we go, the function is created and can be used (assigned, called etc) from now on.
Function Declarations are different.
Function Declaration is usable in the whole script/code block.
In other words, when JavaScript prepares to run the script or a code block, it first looks for Function Declarations in it and creates the functions. We can think of it as an "initialization stage".
And after all Function Declarations are processed, the execution goes on.
As a natural effect, a function declared as Function Declaration can be called earlier than it is defined.
For example, this works:
Function Declaration
sayHi is created when JavaScript is preparing to start the script and is visible everywhere in it.
…And if there were Function Expression, then it wouldn't work:
Function Expressions are created when the execution reaches them. That would happen only in the line
(*). Too late.
Function Declaration in a block
When Function Declaration is made within a code block, it is visible everywhere inside that block. But not outside of it.
Sometimes that's handy to declare a local function only needed in that only block. But that feature may also cause problems.
For instance, let's imagine that we need to declare a function
welcome() depending on the
age variable that we get in run time. And then we plan to use it sometimes later.
The code below doesn't work:
The Function Declaration is visible only inside the code block where it resides.
We can call it from within the block, but not from outside:
let age = 16; // take 16 as an example
if (age < 18) {
welcome(); // \ (runs)
// |
function welcome() { // |
alert("Hello!"); // | Function Declaration is available
} // | everywhere in the block where it's declared
// |
welcome(); // / (runs)
} else {
// \
function welcome() { // |
alert("Greetings!"); // | if age=16, the the execution does not go here,
} // | so this "welcome" is never created
// /
// Here we're out of figure brackets,
// so we can not see Function Declarations made inside of them.
welcome(); // Error: welcome is not defined
What can we do to make
welcome visible outside of
The right thing would be to use a Function Expression and assign
welcome to the variable which is declared outside of
if and has the proper visibility:
Or we could simplify it even further using a question mark operator
As a rule of thumb, when we need to declare a function, the first to consider is Function Declaration syntax, the one we used before. It gives more freedom in how to organize our code, because we can call such functions before they are declared.
It's also a little bit easier to look up
function f(…) {…} in the code than
let f = function(…) {…}. Function Declarations are more "eye-catching".
…But if Function Declaration does not suit us for some reason (we've seen an example above), then Function Expression should be used.
Arrow functions
There's one more syntax for creating functions – very simple and concise. It's called "arrow functions", because it looks like this:
let func = (arg1, arg2, ...argN) => expression
…This creates a function
func that has arguments
arg1..argN, evaluates the
expression on the right side with their use and returns its result.
In other words, it's roughly the same as:
let func = function(arg1, arg2, ...argN) {
return expression;
…But much shorter.
Let's see the example:
Here the arrow function is a shorter form of:
let sum = function(a, b) {
return a + b;
If we have only one argument, then parentheses can be omitted, making that even shorter:
If there are no arguments, we can put empty parentheses:
Arrow functions can be used same way as Function Expressions.
For instance, here's the rewritten example with
The syntax may appear unfamiliar and not very readable at first, but that quickly changes as the eyes get used to the structure.
Arrow functions are very convenient for simple one-line actions, when we're just lazy to write many words.
The examples above took arguments from the left of
=> and evaluate the right-side expression with them.
Sometimes we need something a little bit more complex, like multiple expressions or statements. It is also possible, but we should enclose them in figure brackets. Then use a normal
return within them.
Like this:
Here we praised arrow functions for brevity. But that's not all! Arrow functions have other interesting features. We'll return to them later in the chapter Arrow functions revisited.
As for now, we can already use them for one-line actions and callbacks.
- Functions are values. They can be assigned, copied or declared in any place of the code.
- If the function is declared as a separate statement, in the main code flow – that's called "Function Declaration".
- If the function is created as a part of an expression – it's "Function Expression".
- Function Declarations are processed before the code block is executed. They are visible everywhere in the block.
- Function Expressions are created when the execution flow reaches them.
In most cases when we need to declare a function, Function Declaration is preferable, because it is visible prior to the declaration itself. That gives more flexibility in code organization. And is usually more readable.
So we should use Function Expression only when Function Declaration does not fit the task. We've seen a couple of examples of that in the chapter. And will see more in the future.
Arrow functions are handy for one-liners. The come in two flavors:
- Without figure brackets:
(...args) => expression– the right side is an expression: the function evaluates it and returns the result.
- With figure brackets:
(...args) => { body }– brackets allow to write multiple statements inside the function, but we need an explicit
returnto return something.


text:
Bishop Joseph P. McFadden of Harrisburg died Thursday in Philadelphia, where he was attending a meeting of Pennsylvania's Catholic bishops.
According to a Facebook posting from the diocese, McFadden awoke at the rectory where he was staying and felt ill. He was taken to a hospital and was pronounced dead at about 7:40 a.m.
No cause of death was immediately available. He was 65 and had been the bishop of Harrisburg for three years. He was also chairman of the U.S. bishops' Committee on Catholic Education.
Bishop McFadden was born May 22, 1947, in Philadelphia, the only boy of three children. He went to Catholic schools his whole life.
While studying at St. Joseph University in Philadelphia, he played on the freshman basketball team and started coaching basketball, including his high school alma mater, St. Thomas More High School for Boys.
Upon graduation from St. Joseph, he took a teaching job at West Catholic High School for Boys, and coached basketball and baseball teams there. He entered the seminary in 1976 and was ordained for the Archdiocese of Philadelphia in 1981.
In 1982, he was named administrative secretary to Cardinal John Krol of Philadelphia, a post he held until 1993. From 1993 to 2001, he was president of Cardinal O'Hara High School in Springfield, Pa.
In 2001, McFadden was named pastor of St. Joseph Parish in Downingtown, where he served until he was appointed an auxiliary bishop of Philadelphia in 2004. He served in that capacity until taking the reins of the Harrisburg diocese in June 2010.
McFadden called Catholic schools "centers for the new evangelization" in a Jan. 29 statement for Catholic Schools Week. "The unique atmosphere of our Catholic schools is a space and place where the new evangelization can reach out to parents and children in a way that is respectful of the human person, presents the teachings of the church, and supports family life," he said.
Also in January, he issued a one-page report on the implementation of the 1990 Vatican document "Ex Corde Ecclesiae" ("From the Heart of the Church"). "Bishops reported that they believe our institutions of Catholic higher education have made definite progress in advancing Catholic identity," the report said. "The relationship between bishops and presidents on the local level can be characterized as positive and engaged, demonstrating progress on courtesy and cooperation in the last 10 years."
At his 2010 installation Mass as bishop of Harrisburg, McFadden said, "I ask you to pray for me that I may be a good shepherd after the heart of Jesus. Pray that together we may be good builders of the kingdom of God here in Harrisburg."
McFadden also served on the bishops' Task Force on Faith Formation and Sacramental Practice.
No funeral information was immediately available.
Governance of the diocese passes to the diocesan College of Consultors upon McFadden's death. They have until May 10 to elect an administrator who will be in charge of the day-to-day operation of the diocese until a new bishop is appointed.
"I was shocked and deeply saddened" to learn of McFadden's death, said a statement Thursday from Archbishop Charles Chaput of Philadelphia. "I am grateful that I had the opportunity to be with him over the last few days," Chaput added, "and spend time in conversation with him."
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EUVL Infrastructure Development Center Inc., 16-1 Onogawa, Tsukuba-shi, Ibaraki-ken 305-8569, Japan
Patterned mask inspection for an etched multilayer (ML) extreme ultraviolet mask was investigated. In order to optimize the mask structure from the standpoint of a pattern inspection the mask structure not only from the standpoint of a pattern inspection by using a projection electron microscope but also by using a projection electron microscope but also by considering the other fabrication processes using electron beam techniques such as critical dimension metrology and mask repair, we employed a conductive layer between the ML and substrate. By measuring the secondary electron emission coefficients of the candidate materials for the conductive layer, we evaluated the image contrast and the influence of the charging effect. In the cases of 40-pair ML, 16-nm-sized extrusion and intrusion defects were found to be detectable more than 10 sigma in half pitch 44, 40, and 32 nm line-and-space patterns. Reducing 40-pair ML to 20-pair ML degraded the image contrast and the defect detectability. However, by selecting B4C as a conductive layer, 16-nm-sized defects and etching residues remained detectable. The 16-nm-sized defects were also detected after the etched part was refilled with Si. A double-layer structure with 2.5-nm-thick B4C on metal film used as a conductive layer was found to have sufficient conductivity and also was found to be free from the surface charging effect and influence of native oxide.
Extreme ultraviolet (EUV) lithography is the most advanced lithographic technology to fabricate 1× nm node devices. Pattern size shrinkage to ∼10 nm requires an exposure tool with a higher numerical aperture (NA), and the high NA leads to an increase in the chief ray angle (CRA) of EUV light as shown in Fig. 1(a).1 As a result, mask three-dimensional effects, such as the shadowing effect, become larger with a conventional stacked absorber-type EUV mask structure [Fig. 1(b)],2 and thus, the lithography process margin decreases. Recently, Kamo et al. proposed that the binary etched multilayer (ML) mask is very effective to overcome this issue as shown in Fig. 1(c).3–6
Schematic explanations of (a) relationship between CRA and high-NA exposure, (b) shadowing effect of conventional EUV mask, and (c) etched ML-EUV mask.
Moreover, Kim et al. also confirmed this observation by numerical analysis.7,8 However, the mask structure should be taken into account when dealing with the mask fabrication processes, such as patterned mask inspection,9–13 critical dimension measurement (CD metrology),14,15 mask repair,16,17 and cleaning.18 Takai et al. reported that the reduction of the ML stack down to 20 pairs effectively avoided the collapse of the lines by the cleaning process.19 However, patterned mask inspection, CD metrology, and repair of this mask structure continue to pose challenges that need to be addressed. In these processes, electron beam (EB) techniques are often used; therefore, charging effects tend to cause some degradation of process accuracy. Takai et al. also reported that a conductive layer between the SiO2 substrate [or some low thermal expansion material (LTEM)] and ML was effective to avoid an electrical floating of the EUV mask inside a black border of etched ML. With this approach, the EB image quality of the mask was effectively improved.20 As a result, the repeatability of metrology and the sensitivity of inspection for this type of EUV mask were also improved.20 However, the optimization of the material and structure of the conductive layer is critical, because this issue should be studied with taking into account the conductivity, durability for cleaning, oxidization, roughness, and etching selectivity of the material and the impact on the image contrast. We have learned that the image contrast is determined by the secondary electron emission coefficients (SEECs) of materials that the EUV mask is composed of and by the geometries involved. They also influence the defect detection sensitivity of a projection electron microscope (PEM) inspection system.21–25 The PEM has the advantage of a much higher throughput than what is achievable in the case of a conventional scanning electron microscope (SEM) type inspection system.9,11–13,21–26 That is because PEM probes a sample target with large field illumination, whereas SEM probes a sample with a spot beam. In this paper, we investigated the defect detectability of etched ML-EUV masks, and we propose a better and more feasible structure, which would improve the processing accuracy in working with EB systems.
Candidate materials to serve as the conductive layers were selected among the familiar materials used in photomasks. TaN, Ru, CrN, TiN, and Si are materials commonly used in EUV and conventional photomasks. B4C is also widely studied as an interdiffusion barrier between Mo and Si for EUV reflective ML mirrors,27 and as a capping layer of the ML.28 In order to evaluate the PEM image contrast of a line-and-space (L/S) pattern, the SEECs of these materials with 100 nm thickness deposited on quartz substrates were measured using a specially designed scanning Auger microscope.29 It should be noted that the obtained data were measured in as-is (as-deposited) conditions, with their native oxide films on their surface, in order to demonstrate the actual mask surface condition. The electrical resistivities of these films were measured by a four-point probe method with 0.3 mm spacings between the neighboring probes. In order to evaluate the defect detection sensitivity of a PEM inspection system, simulated PEM images were obtained using a CHARIOT Monte Carlo software (Abeam Technologies Inc.).30 The simulated PEM images take into account the characteristics of electron imaging optics, such as their aberrations, electron transmittance, and aperture stops, because these images are obtained at a conjugate image plane of the real application.25,26 For these simulations, the illumination and imaging system used were originally designed with an inspection capability for pattern sizes as narrow as half pitch (hp) 64 nm.26 Moreover, this system design allows the detection of defect sizes as small as 16 nm (on mask).26 Thus, based on the defect signal intensity of 16-nm-sized defects, the defect detectability in etched ML-EUV masks (of various structures) were evaluated and compared. The MLs consist of 20 and 40 pairs of 3-nm-thick Mo and 4-nm-thick Si with a 2.5-nm-thick Ru capping layer. The hp 44 to 32 nm L/S patterns on mask (corresponding to hp 11 to 8 nm technology on wafer) were utilized in anticipation of pattern sizes at high-NA exposure.1,2 A detailed method of simulated PEM image acquisition is described elsewhere.25,26 In order to improve the reliability of the simulation results, the SEECs of the utilized materials were employed for the calibration of the simulation results. The difference between the simulated PEM image with defects and that without defects is defined as the difference image. In order to define the sensitivity of defect detection, we identified the signal intensity in the difference image with more than 10 times the intensity of the standard deviation of the background intensity levels as a defect (10σ). Image processing operations were applied to the simulated image to enhance the to enhance the defect signal intensities.22,31 The image contrast of the L/S pattern is expressed as a modulation transfer function (MTF), defined as [(maximum value−minimum value)/(maximum value+minimum value)].
Figure 2(a) shows the experimentally obtained SEECs of TaN, CrN, TiN, Si, B4C films, and Ru-capped ML. The SEEC curves of CrN and TiN are almost identical, and the overall SEECs of B4C is the lowest among all these materials. These results make sense because the SEEC increases with the atomic number Z in general.32 We have learned that the SEEC difference between lines and spaces determines the gray level difference of the captured images corresponding to the material contrasts.22,24,25 As shown in Fig. 2(b), the SEEC difference between ML and B4C turns out to be the largest. In the case of TaN, the SEEC difference shows a negative value because the SEECs of TaN is larger than those of ML. This result indicates that the combination of Ru-capped ML and TaN exhibits the image contrast reversal as compared with the other materials.
(a) Experimentally obtained SEECs of 100-nm-thick TaN, CrN, TiN, Si, B4C films, and Ru-capped ML, and (b) their experimental SEEC difference (which was calculated by subtracting SEECs of these thin films from that of the Ru-capped ML), as functions of incident beam energy. All the materials were measured in as-is conditions.
The image contrast is also affected by the sample geometry. Especially for the etched ML mask, the aspect ratio of the L/S pattern is considerably high, as shown in Fig. 3.
Schematic illustrations of SEs from the bottom of the etched ML mask with hp (a) 44 nm, (b) 40 nm, and (c) 32 nm L/S patterns in 40-pair ML, and (d) 40 nm L/S pattern in 20-pair ML. The aspect ratios of the L/S patterns are 6.5, 7.2, 9.0, and 3.7, respectively.
The secondary electrons (SEs) generated from the bottom of the space are blocked by the sidewalls of the lines. Therefore, the SE signals from the space decrease as the aspect ratio becomes high.13,22,24,33 Hence, this effect enhances the L/S pattern image contrast when the SEEC of the space material (conductive layer) is lower than that of ML.
Figure 4 shows the apparent SEEC and SEEC difference change of a high aspect ratio pattern on the Si layer. SEEC itself is one of the physical constants. However, a decrease in the SE signals from the bottom of the space can be considered as an apparent SEEC decrease for a better understanding of the phenomenon. As the percentage of the SE signals from the bottom decreases, the apparent SEEC becomes low as shown in Fig. 4(a); while the apparent SEEC difference between ML and Si increases, and the peak of the curve is shifted to the lower incident beam energy as shown in Fig. 4(b). These results indicate that as the aspect ratio becomes high, the optimal incident beam energy to obtain the highest image contrast becomes low. Furthermore, when the SE signal from the bottom is extremely low (1%), the SEEC difference curve becomes identical to the SEEC curve of ML. As a result, the optimal condition is determined by the peak of the ML. This result is in good agreement with our previous work for the investigation of the optimal incident beam energy to detect the small intrusion defect.22,24 In order to confirm the impact of the conductive layer on the image contrast, simulated PEM images were obtained using a sample structure with an hp 40 nm L/S pattern in 40-pair-ML on various conductive layers as shown in Fig. 5. Incident beam energy of 300 eV creates the most sensitive condition for defect detection in this sample geometry. In the case of Ru, the L/S pattern is hardly identifiable in spite of the high aspect ratio of 7.2 because the material contrast between Ru-capped ML and Ru conductive layer is very low.23 Moreover, the MTF of the TaN sample is lower than that of the Ru one because the higher SEEC of TaN cancels out the effect of a high aspect ratio.
Apparent (a) SEEC and (b) SEEC difference change of high aspect ratio patterns on the Si layer. The graph legend "1%" means that only 1% of the total electrons emitted reach the detector. This is because 99% of electrons emitted from the bottom of the trench are blocked by the pattern sidewalls. By the same principle, the graph legend "100%" means that all the SEs reach the detector without any obstruction by the pattern sidewalls.
Simulated PEM image of etched 40-pair-ML EUV mask with hp 40 nm L/S pattern on the conductive layers of (a) Ru, (b) CrN or TiN, (c) Si, (d) B4C, (e) TaN, and (f) their schematic illustration. Incident beam energy and MTF of L/S pattern are shown on the upper and lower parts of the image.
On the other hand, by reducing 40-pair ML to 20-pair ML, the MTF value of the TaN sample increases, and the contrast of the L/S pattern is reversed as compared with the CrN, Si, and B4C samples as shown in Fig. 6. These image contrasts correspond to their material contrasts derived from the SEEC curves as shown in Fig. 2. Furthermore, the MTF values of Si and B4C show a significant difference for the case with 20-pair ML (0.22 and 0.25, respectively), whereas the values for the case with 40-pair ML are about the same (0.26 and 0.25, respectively). These results indicate that the conductive layer underlying 20-pair ML has a greater impact on the EB image contrast than in the case of 40-pair ML and that the B4C sample has the highest image contrast of the L/S pattern. It is also noted that the optimal incident beam energy for defect detection in the geometry of 20-pair-ML is higher than that of the 40-pair ML, due to an increase in the percentage of the detectable SEs from the conductive layer as shown in Fig. 4(b).
Simulated PEM image of etched 20-pair-ML EUV mask with hp 40 nm L/S pattern on the conductive layers of (a) Ru, (b) CrN or TiN, (c) Si, (d) B4C, and (e) TaN. Incident beam energy and MTF of the L/S pattern are shown on the upper and lower parts of the image.
In order to investigate the impact of the aspect ratio and conductive layer on the defect detectability of a PEM inspection system for etched ML-EUV masks, a die-to-die inspection is demonstrated using simulated PEM images with and without defects. Figure 7 shows the difference images for the cases of a 40-pair ML on an Si layer. A set of extrusion and intrusion defects with 22 and 16 nm sizes are detected more than 10σ in all the cases of hp 44, 40, and 32 nm L/S patterns. As shown in Figs. 3(a)–3(c), their aspect ratios are 6.5, 7.2, and 9.0, respectively. The illumination and the imaging systems used for this simulation are designed for an hp 64 nm L/S pattern (hp 16 nm on wafer). Therefore the spatial resolution is not sufficient for smaller hp L/S patterns, such as less than hp 40 nm (hp 10 nm on wafer). Thus, the defect detection sensitivity degrades along with the pattern size shrink in spite of the increase of aspect ratio. We have learned that the spatial resolution has a great impact on the defect detectability, especially for small defects.13 In order to increase the detectability, the spatial resolution needs to be improved, and we are now developing a new PEM inspection system designed for 11 nm node.34
(a) Top view of the schematic illustration of etched 40-pair-ML EUV mask with defects, and simulated difference images of (b) hp 44, (c) hp 40, and (d) hp 32 nm L/S patterns on the conductive layer of Si.
Figure 8 shows the difference images for the cases of 20-pair ML with an hp 40 nm L/S pattern on various conduction layers. By reducing 40-pair ML to 20-pair ML, 16-nm-sized extrusion defects on the Si layer become undetectable. Only in the case of the B4C sample, 16-nm-sized extrusion defects are detected more than 10σ. These results indicate that the selection of a conductive layer with higher material contrast is critical for high sensitivity pattern inspection of an etched 20-pair ML EUV mask. In order to confirm the threshold level for defect detection, the difference images with various threshold levels are shown in Fig. 9. In the case of 5σ, a 16 nm extrusion defect is detected even on Si, but some false defects are also observed in all samples. On increasing the threshold, the false defects decrease, and then, in the case of 10σ, a 16-nm-sized extrusion defect is detected without any false defects on the B4C sample. This result indicates that 10σ is the required condition for inspection without false defects.
Simulated difference images using etched 20-pair-ML EUV mask with hp 40 nm L/S pattern on the conductive layers of (a) CrN or TiN, (b) Si, (c) B4C, and (d) TaN.
Simulated difference images using etched 20-pair-ML EUV mask with hp 40 nm L/S pattern on the conductive layers of (a) CrN or TiN, (b) Si, and (c) B4C with various threshold levels.
In order to prevent any oxidation of the etched part, several researchers proposed that the etched part be replaced by other materials as shown in Fig. 10.7 In this study, Si is filled up to the same level as the Ru capping layer. In this case also, 16- and 22-nm-sized extrusion and intrusion defects are detected.
(a) Cross-sectional and (b) top view of the schematic illustration of the etched 20-pair-ML EUV mask with its spaces filled with Si, and (c) the simulated difference image. The incident beam energy is 600 eV.
It is to be noted that the optimal incident beam energy (600 eV) is different from the case of the as-etched (before Si is filled with the etched part) mask (500 eV). This energy shift can be explained by using Fig. 4(b). When the surface of Si is leveled with that of the ML, the SEs from the Si reach the detector without being blocked by the sidewalls of the trench [the case of 100% in Fig. 4(b)]. Therefore, the optimal condition is shifted toward the higher energy. It is also noteworthy that the 16-nm-sized extrusion defect is detected in the refilled structure, whereas the same defect is not detected in the Si conductive layer as shown in Fig. 8(b). However, the SEEC difference for the case of 100% (refilled structure) is lower than that of the 80% (40-pair ML as-etched). This phenomenon can be explained by the electron scattering near the edge of the etched ML. In the case of the as-etched structure, strongly scattered electrons near the edge become a source of noise, and they degrade the signal-to-noise ratio (SNR) of the defect signal. On the other hand, in the case of the refilled structure, no such electron scattering is encountered since in this case the surface happens to be flat. Hence, the SNR of the defect signal is improved. A detailed explanation of the phenomena was described earlier.24
By using a B4C conductive layer, a residual-type defect (etching residue)21,35,36 can also be detected with high sensitivity. However, the sensitivity depends on the surface material of the etching residue as shown in Fig. 11. When the surface of the defect is covered by Mo, only the 5-nm-thick defect is detectable, whereas in the case of Si, even a 10-nm-thick defect cannot be detected. This is because the SEEC difference between Mo and B4C is much larger than that between Si and B4C as shown in Fig. 12.
(a) Cross-sectional and (b) top view of the schematic illustration of the etched 20-pair-ML EUV mask with etching residues, and (c) the simulated difference image on the conductive layers of B4C. The surfaces of the etching residues with their thicknesses of 1, 5, and 10 nm are covered by Si, Mo, and Si, respectively.
Experimentally obtained SEEC difference between Mo and B4C, and between Si and B4C. The surfaces of Mo and Si are covered by their native oxide.
In the case of the real defect, the surface of the defect is often not flat but shows some slopes. Therefore, in most cases, both Mo and Si appear on the defect's surface. Hence, most of the real residual-type defects can be detected.
In order to investigate the electrical conductivity and surface charging effect of the candidate materials, electrical resistivity and the dependence of beam probe current on the SEEC are evaluated. Table 1 shows the resistivity of the candidate materials with various structures. TiN, CrN, and TaN have good conductivities. In the case of Si, the resistivity of p- or n-type crystal Si is known as 1.0 to 1.0×10−2 Ωcm. However, crystal layers are hardly grown on noncrystalline substrates such as quartz and LTEM. Especially for the case of sputtered films, amorphous Si with high resistivity tends to be deposited. On the other hand, B4C with 100 nm has a comparatively good conductivity, but the electric resistance of 5-nm-thick B4C film on SiO2 substrate goes up to an unmeasurable level. From the standpoint of EB repair technique, a resistivity should be as low as possible to demonstrate the precise repair process.16,17 These results show that an Si conductive layer has a technical problem with depositions onto photomask substrates, and a B4C film does not seem to be sufficiently conductive to maximize the accuracy of the repair process and CD metrology, and the sensitivity of pattern inspection. In order to maximize the effect of low SEEC and electrical conductivity, a conductive layer with double-layer structure with 2.5-nm-thick B4C on metal film is proposed. The resistivity of this type of conductive layer is better than those of TiN, CrN, and TaN. In order to reconfirm the conductivity and investigate the effect of surface charging when the electron beam is irradiated, the dependence of the beam current on the SEEC changes was examined for the three types of B4C samples as shown in Fig. 13.
Experimentally obtained SEECs of 100-nm-thick B4C film, 2.5-nm-thick B4C on metal film, and 5-nm-thick B4C film as functions of primary electron current with a beam energy of 200 eV (the maximum values of their yield curves). Diameter of the focused incident beam was estimated to be ∼1.2 μm at 2 nA with 200 eV.
The SEECs of 100-nm-thick B4C film and 2.5-nm-thick B4C on metal film remain almost constant as the incident electron beam current increases. On the other hand, the SEEC of the 5-nm-thick B4C film shows a significant decrease with the increasing beam current because the emitted SEs return back to the sample surface due to the strong positive charges involved as shown in Fig. 14.24,37,38
Schematic explanations of the charging and discharging effects for the samples of: (a) 100-nm-thick B4C film, (b) 2.5-nm-thick B4C on metal film, and (c) 5-nm-thick B4C film.
When the B4C film is sufficiently thick, the injected electrons or generated holes can be discharged through the thick B4C film. However, these charges are stored in the thin B4C film due to its extreme high resistance. On the other hand, in the case of the double-layer structure, the charges are discharged along with the underlying metal film. We have already reported that the SEEC of the nondoped Si layer with the resistivity of >1000 Ωcm shows a similar decrease along with the increasing beam current, whereas the SEECs of the Ru-capped ML remain almost constant.24 Moreover, the lateral and vertical conductivities of Ru-capped ML are empirically known to be sufficiently high to avoid any charging effect in spite of 4-nm-thick sputtered Si layers being included.20 These results indicate that the charging effect attributed to the 2.5-nm-thick B4C is negligibly small, and the SE signal from the double structured conductive layer is not changed regardless of the electron dosage.
In order to select the conductive layer, the following "other" items are to be taken into account: (1) influence of native oxide, (2) etching selectivity, and (3) additional phase defects.
Schematic explanations of (a1) and (a2) influence of native oxide, (b) etching selectivity, and (c) phase defects.
Patterned mask inspection for an etched ML-EUV mask was investigated. In order to optimize the mask structure not only from the standpoint of a pattern inspection using PEM but also considering other fabrication processes using EB technique such as CD metrology and mask repair, we focus on a conductive layer between the ML and substrate. Candidate materials to serve as the conductive layer were selected from the familiar materials used in photomasks, such as TaN, Ru, CrN, TiN, Si, and B4C. By measuring the SEECs of the candidate materials for the conductive layer, the combination of B4C conductive layer and Ru-capped ML was found to have the best pattern image contrast due to its highest SEEC difference. In the cases of 40-pair ML, 16-nm-sized extrusion and intrusion defects were found to be detectable more than 10σ in hp 44, 40, and 32 nm L/S patterns. Although reduction of 40-pair ML to 20-pair ML degraded the image contrast and the defect detectability, 16-nm-sized defects remained detectable in the case of B4C sample. These defects were detected after the etched part was refilled with Si. Moreover, the simulation shows a high sensitivity for detecting the residual-type defects (etching residues). In order to maximize the effect of low SEEC and electrical conductivity, a double-layer structured conductive layer with 2.5-nm-thick B4C on metal film was proposed. This conductive layer was found to have sufficient conductivity (<5.4×10−5 Ωcm) and also was found to be free from the surface charging effect and any influence of native oxide.
The authors would like to thank T. Kamo, K. Takai, M. Naka, R. Yoshikawa, S. Kanamitsu, and T. Hirano of Toshiba Corporation for useful discussions. This work was supported by the New Energy and Industrial Technology Development Organization.
Susumu Iida received his BS and MS degrees in 1995 and 1997, respectively, and in 2000, he earned his PhD in electronics, all from Shizuoka University, Japan. He joined the Research and Development Center at Toshiba Corporation. In 2011, he was assigned to EIDEC, and since then he has been engaged in the development of patterned mask inspection.
Susumu Iida ; Ryoichi Hirano ; Tsuyoshi Amano and Hidehiro Watanabe"Pattern inspection of etched multilayer extreme ultraviolet mask", J. Micro/Nanolith. MEMS MOEMS. 15(2), 021002 (Jan 29, 2016). ; http://dx.doi.org/10.1117/1.JMM.15.2.021002
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Overall, the choice of Imation's Defender F200 comes down to a matter of security options over performance. If you really like the idea of a biometrics reader, the F200 makes sense. But if you're concerned with performance, the IronKey has the F200 beat hands down.
Note: Pricing for this product is in US$.
Earlier this month, Imation launched its Defender series of USB flash drives aimed at the consumer portable storage and data backup market.
The drives have a range of features, including hardware-based 256-bit AES data encryption, and have (or are in the process of receiving) varying levels of FIPS (Federal Information Processing Standardization) 140-2 Level 3 validation.
The drives vary in form factor and size, including two flash drives, two hard drives and an optical line of disc drives. I thought the most useful one to review would the Defender F200, a biometric flash drive with all the bells and whistles, including a waterproof casing, a built-in fingerprint scanner and the ability to create multiple disk partitions.
The Defender is awaiting Level 3 FIPS validation, second only to Level 4 for overall security. To achieve FIPS Level 3, a device must have some form of physical tamper resistance, password authentication, and a physical or logical separation between the interfaces by which "critical security parameters" enter and leave a device and its other interfaces.
But all that security doesn't come cheap. The drive comes in capacities ranging from 1GB to 32GB and has a suggested retail price of $99 to $349, depending on its capacity. I find $99 for a 1GB flash drive outrageous, but if you need a device with the highest level of security, it may be worth it to you.
The Defender F200 drive is a bit beefier in size compared with a typical USB drive, but that's to make room for an ergonomically designed biometric finger scanner. The drive comes in a metal, "tamper-resistant" enclosure, which basically means there are no screws showing. However, you could easily slip a flat-head screwdriver between the joint where the upper and lower casing meet and force it open.
One thing I don't like is the large removable sleeve used to protect the finger scanner. I like USB drives that slide the body out or have flip-out hinges. That way, there's no cover to lose.
I don't think it's uncommon for people to leave USB drives in desk drawers, in the pockets of clothing headed for the wash, in car seats or under couch cushions. I've lost more than my share of flash drives to absentmindedness over the past several years, so I want any USB drive I own to have excellent security -- but still be simple to use. This drive absolutely fulfills that need.
The Defender F200 defends against unauthorized data access with two-factor identity authentication -- in other words, it demands two passwords -- and the aforementioned biometric finger scanner. The nice thing about this drive is that you can choose to use the security measures or eliminate the ones you don't want. For example, I chose to use only the fingerprint reader on my evaluation unit.
I've reviewed other drives with finger scanners, and while I don't prefer them over simple password encryption, there are some obvious advantages, the main one being that you don't have to remember a password. Also, no one's going to be able to duplicate your fingerprint unless he goes to the trouble of hacking off your finger. A hacker (no pun intended) can always attempt to guess a password and will sometimes succeed.
One of the reasons I'm not crazy about biometric finger scanners on a USB stick is that you need a USB extension cable in order to position the drive comfortably when sliding your finger over the scanner. Imation provided a 6-in. cable with the Defender F200 for that purpose.
Another cool but optional feature for this drive is antivirus and central management software; that's more for the corporate user than for the average consumer, but it's important to note that they're available.
Imation partnered with MXI Security for its data encryption technology, which is powered by MXI's Bluefly processor. Larry Hamid, chief technology officer at MXI Security, said the chip's FIPS 140-2 Level 3 tamper resistance is achieved by virtue of the chip packaging, which has no openings and must be physically damaged in order to gain access to the interior.
"Trying to gain access into the chip package will have a very high probability of rendering the chip inoperable, which meets all of the FIPS requirements," Hamid said.
Identity-based authentication is built into the processor's firmware, which manages up to 10 users and two roles, such as administrator and user. This means up to 10 people can enter their fingerprints and/or passwords to access data on the device. To register your biometric signature, you swipe a finger across the sensor five times. An LED light on the drive will then go from red to green, indicating that the fingerprint is now registered on the drive.
"Since the USB interface is used to communicate both data and critical security parameters, they are not physically separate. They are logically separated by encrypted and optionally authenticated secure channels," Hamid said. "The secure channel implementation in Bluefly uses a FIPS-validated key agreement scheme and allows for multiple simultaneous secure sessions to be active at any time."
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HP OfficeJet 250 Mobile Printer
The HP OfficeJet 250 Mobile Printer is a great device that fits perfectly into my fast paced and mobile lifestyle. My first impression of the printer itself was how incredibly compact and sleek the device was.
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Wireless printing from my iPhone was also a handy feature, the whole experience was quick and seamless with no setup requirements - accessed through the default iOS printing menu options.
HP OfficeJet Pro 8730
A smarter way to print for busy small business owners, combining speedy printing with scanning and copying, making it easier to produce high quality documents and images at a touch of a button.
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I've had a multifunction printer in the office going on 10 years now. It was a neat bit of kit back in the day -- print, copy, scan, fax -- when printing over WiFi felt a bit like magic. It's seen better days though and an upgrade's well overdue. This HP OfficeJet Pro 8730 looks like it ticks all the same boxes: print, copy, scan, and fax. (Really? Does anyone fax anything any more? I guess it's good to know the facility's there, just in case.) Printing over WiFi is more-or- less standard these days.
HP OfficeJet Pro 8730
As a freelance writer who is always on the go, I like my technology to be both efficient and effective so I can do my job well. The HP OfficeJet Pro 8730 Inkjet Printer ticks all the boxes in terms of form factor, performance and user interface.
Windows 10 for Business / Dell XPS 13
I'd happily recommend this touchscreen laptop and Windows 10 as a great way to get serious work done at a desk or on the road.