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Effects of [H2S]/[DMZn] Molar Ratio on ZnS Films Grown by Low-Pressure Metalorganic Chemical Vapor Deposition

Effects of [H2S]/[DMZn] molar ratio on the crystallinity and surface morphology of epitaxial ZnS films grown on glass substrate by low-pressure metalorganic chemical vapor deposition have been studied. The surface morphology has been evaluated and the results show it to be relatively flat and uniform. The crystallization has also been measured. We find that the samples deposited under the following conditions have better crystallinity: even after the deposition was completed, H2S flux was still introduced into the reactor until the substrate temperature fell to 200°C. From the experimental results, an optimum [H2S]/[DMZn] molar ratio can be concluded to exist somewhere near 20.