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Sputter Deposition of Nanostructured TiO2 Thin Films

A physical vapor deposition (PVD) method using plasma discharge-glancing angle deposition (GLAD), based on a variation of the particle's incidence angle to the substrate, enables the formation of TiO2 thin films with oriented columnar nanostructure. The incidence angle influences crystalline, nanostructure, and surface properties of the deposited films. Images illustrating the GLAD PVD method and scanning electron microscopy images of the TiO2 thin films deposited with different incidence angles α are presented.