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Fabrication and characterization of submicron gratings written in planar silica glass with a focused ion beam

Groove patterns with submicron lateral sizes and depths of several hundreds of nanometers have been defined in silica glass surfaces by focused ion beam implantation and differential wet etching in hydrofluoric acid solutions. Nonperiodic arbitrary patterns can be defined and variable depth achieved through local ion dose control. The fabrication of diffractive optical elements for excimer lasers in the ultraviolet is described.