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Swelling Analysis of Negative-tone Photosensitive Dielectric Materials for Fine Pitch Redistribution Layers

In this study, we investigated the impact of the molecular weight of the base polymers of negative-tone photosensitive dielectric materials (PSDMs) for fine pitch redistribution layers (RDLs) on the swelling and resulting pattern profile.We prepared two PSDMs: samples A and B, with different molecular weights of the base polymer. We monitored swelling during development using a quartz crystal microbalance (QCM), and observed that the samples exhibited significantly different swelling behaviors. It has been suggested that controlling the molecular weight of the base polymer is important for preventing swelling and achieving fine patterning. We controlled the molecular weight of the base polymer and realized 0.8-μm line/space (L/S) patterning with an aspect ratio of 3.8 formed using an i-line stepper with 0.5 numerical aperture (NA). In addition, we show that the PSDM has insulation reliability.