{'fraction_non_alphanumeric': 0.023542600896860985, 'fraction_numerical': 0.002242152466367713, 'mean_word_length': 4.993288590604027, 'pattern_counts': {'":': 0, '<': 0, '<?xml version=': 0, '>': 0, 'https://': 0, 'lorem ipsum': 0, 'www.': 0, 'xml': 0}, 'pii_count': 0, 'substrings_counts': 0, 'word_list_counts': {'cursed_substrings.json': 0, 'profanity_word_list.json': 0, 'sexual_word_list.json': 0, 'zh_pornsignals.json': 0}}
Fine line-width black matrix of a color filter by an advanced polishing method

Based on the high resolution and high aperture ratio needed for a liquid crystal display (LCD), we introduced advanced color filter polishing technology for processing a fine line-width black matrix (BM) for a color filter. A dimensional compensation method for the pattern-size design of photo-masks, according to the characteristics of the colorant resists, was described to rectify the line-width variation caused by the proximity aligner, the most popular exposure machine in color filter manufacturing. In this paper, we introduce color filter polishing and photo-mask compensation technologies into the present color filter process flows and equipment to meet the requirement for fine line-width BM to increase the aperture ratio of LCDs and to achieve a real color filter sample with 5.8 µm line-width BM.