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Reductive patterning of graphene oxide by vacuum–ultraviolet irradiation in high vacuum

A dry photoprocess for converting graphene oxide (GO) to reduced GO (rGO) by vacuum–ultraviolet (VUV) irradiation is reported. The rapid reduction of GO was achieved by irradiating a GO sheet in vacuum with 172 nm VUV light at a low power density of 10 mW·cm−2. This VUV reduction photochemistry was successfully applied to photolithography by which rGO lines could be drawn on a GO microsheet at a sub-micrometer resolution. This method will be promising for the fabrication of graphene-based microdevices.