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Microscopic evidence for pseudo-epitaxy in FCC (100) Co/Cu multilayers

The authors have grown FCC (100) Co/Cu multilayers on (100) silicon substrates, using a diode-RF sputtering technique. The in-plane texture of the films was studied in situ using reflection high-energy electron diffraction (RHEED). The microscopic layout of the (100) cobalt planes was investigated by means of nuclear magnetic resonance (NMR). Plots of the original NMR spectra against the direction of the applied static field are presented as microscopic evidence of a pseudo-epitaxial stack. The RHEED patterns obtained along the (011) and (001) azimuth of the copper planes support this interpretation.