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Solid solution disilicide thin films: formation, structure, properties and application

The mechanism of solid phase interaction of transition metals with silicon in quasibinary systems CrSi/sub 2/-MeSi/sub 2/ (Me-Ti,Ta,Mo, and other) for film structures was examined. The Cr-Me-Si layers have been prepared by sputtering from solid solution disilicide targets, produced by the method of powder metallurgy on vacuum technology. The methods of electronography, in situ measurements of electrical resistance, elevation of the annealing temperature are used to establish regularities in formation of films of the studied disilicide solid solution. The sample composition was determined using Auger electron spectroscopy.