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Deposition of High-Quality TiO 2 Films by RF Magnetron Sputtering with an Auxiliary Permanent Magnet

RF magnetron sputtering with an auxiliary permanent magnet was applied for the deposition of TiO2 films. An auxiliary magnet was installed under a grounded electrode and the magnetic field strength was intensified in the whole discharge space. The film prepared by this sputtering apparatus showed a high value of the refractive index equal to that of bulk TiO2 crystal. The results of several diagnostic techniques showed characteristic changes in the discharge structure. It was shown that a high current of substrate-incident ions brings about growth of high-quality TiO2 films.