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Fabrication of Bi3.25La0.75Ti3O12 thin film for FeRAM device using chemical solution deposition method

Abstract Recently, ferroelectric bismuth lanthanum titanate (Bi3.25La0.75Ti3O12) thin film has been expected as a novel material for FRAM device since it has a large polarization, is fatigue free, and can be crystallized at low temperature compared to SrBi2Ta2O9 material. The BLT thin film was fabricated successfully on Pt/Ti/SiO2/Si substrate by chemical solution deposition method. The films were crystallized in the temperature range of 600 ∼700°C using rapid thermal process and quartz tube furnace. X-ray diffraction shows a single-phase film. The spontaneous polarization (Ps) and the switching polarization of BLT film annealed at 700°C for 2 min are 16.75 and 26.28 uC/cm2, respectively.