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Optimization of Reactive Sputtering Technology for Hard Coatings Deposition

The paper presents the research work carried out in order to optimize the technology and reactive magnetron sputtering system used for the deposition of hard, multielemental, multiphase coatings. On the basis of a model of dynamic pressure developed and validated by us, regulatory structures for dynamic pressure inside the deposition chamber were designed and implemented. By using this optimization, extensive experiments involving nanostructured (Ti, Al, Si)N coatings, with a thickness of approx. 2 μm, were carried out. Using TEM microscopy, SAED and Vickers microhardness characterizations the results of deposition system optimization on the microstructure and microhardness of thin films were investigated.