{'fraction_non_alphanumeric': 0.016260162601626018, 'fraction_numerical': 0.0, 'mean_word_length': 6.008130081300813, 'pattern_counts': {'":': 0, '<': 0, '<?xml version=': 0, '>': 0, 'https://': 0, 'lorem ipsum': 0, 'www.': 0, 'xml': 0}, 'pii_count': 0, 'substrings_counts': 0, 'word_list_counts': {'cursed_substrings.json': 0, 'profanity_word_list.json': 0, 'sexual_word_list.json': 0, 'zh_pornsignals.json': 0}}
Relationship between microstructure and electronic properties of energetically deposited zinc tin oxide

Thin films of amorphous n-type zinc tin oxide have been energetically deposited from a filtered cathodic vacuum arc at moderate temperatures. The characteristics of these films span a range suitable for semiconductor devices and transparent conducting oxide interconnects with carrier concentration and mobility dependent on local bonding. X-ray photoelectron spectroscopy (XPS) and electron diffraction have revealed that acceptor-like Sn(II) bonding in the films decreased with increasing growth temperature, resulting in higher n-type carrier concentrations. XPS and in situ Ar plasma treatment showed that downward surface band bending resulted from OH attachment. Persistent photoconductivity was attributed to the photoionization of oxygen vacancies.