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P‐62: OLED Deposition Characteristics for 4th Generation Mass‐Production

The characteristics of the organic evaporation source and vapor distribution for 4th generation mass production OLED system were investigated. We simulated the heat distribution of the organic material evaporation source for mass production which could run for more than 2 days and could control each deposition rate stably during the doping process. The velocity distribution of gas and vapor from the injection head to each nozzle was also simulated to get preferable film uniformity and the size and pitch of the each nozzle was designed from the simulation results. Finally the best length and shape of the injection head were fixed. The film non‐uniformity was about ±4.0% with only a short deposition distance of 200∼300mm. During the process there was no thermal damage on the glass from heated injection head and its temperature variation was about Δ 3°C as the main shutter opened and closed repeatedly.