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High-speed electron beam data verification system using high-performance neural network accelerator board

We have developed a high speed automatic inspection system which verifies the validity of electron beam exposure data used for fabrication of VLSI photomasks. By employing neural network accelerator board and adopting a flexible verification scheme based on parallel processing, the system performs 100 times faster than the previous system running on a general purpose workstation. In this paper, the architecture of this system and some salient techniques implemented in the system are presented.