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Comparative study between the simulation and experimental results of H2 production from water vapour plasmolysis

In the present study, the kinetics of hydrogen production from water vapour using dielectric barrier discharge (DBD) plasma in a cylindrical reactor were analyzed. The simulation analysis was carried out for both models with and without the dissociative attachment reaction to predict and compare the concentration of produced hydrogen gas from water vapour. The effect of water vapour input temperature ranges of 523–623 K and plasma voltage in the range of 12–14 kV were investigated. It was revealed that the hydrogen concentration increased with the input water vapour temperature and plasma voltage increased in both the simulation models. It was seen that the H2 concentration results of the simulation model with the dissociative attachment reaction (H-) were nearly same as the H2 concentrations of the water vapour plasmolysis experimental results. Moreover, it can be concluded that the dissociative attachment reaction was controlled the H2 generation from water vapour plasmolysis. It was remarkable that the conversion rates of the simulation model included the dissociative attachment reaction has more acceptable results to the experimental data compared to the simulation model deselecting the dissociative attachment reaction (H-). Also, it was seen as the main reason for the difference between simulation and experimental results.