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High-speed source-heterojunction-MOS-transistor (SHOT) utilizing high-velocity electron injection

We have developed the source-heterojunction-MOS-transistor (SHOT), a novel high-speed MOSFET with relaxed-SiGe/strained-Si heterojunction source structures for quasi-ballistic or full-ballistic transistors. Using the band-offset energy at the source SiGe/strained-Si heterojunction, high velocity electrons can be injected into the strained-Si channel from the SiGe source region. For the first time, we have experimentally demonstrated that the transconductance is enhanced in SHOT for high applied drain voltage, compared to that of strained- and conventional silicon-on-insulator MOSFETs. We have also shown that the transconductance enhancement in SHOT depends on both the gate drive and the drain bias.