{'fraction_non_alphanumeric': 0.04992867332382311, 'fraction_numerical': 0.034236804564907276, 'mean_word_length': 4.7073170731707314, 'pattern_counts': {'":': 0, '<': 0, '<?xml version=': 0, '>': 0, 'https://': 0, 'lorem ipsum': 0, 'www.': 0, 'xml': 0}, 'pii_count': 0, 'substrings_counts': 0, 'word_list_counts': {'cursed_substrings.json': 0, 'profanity_word_list.json': 0, 'sexual_word_list.json': 0, 'zh_pornsignals.json': 0}}
Activation energies for the formation and evaporation of vacancy clusters in silicon.

The thermal evolution of vacancy-type defects in Czochralski (Cz-) and epitaxially grown (epi-) silicon has been investigated using variable-energy positron annihilation spectroscopy. Heating at 300-500 degrees C caused rapid migration of divacancies and clustering of the resulting defects with activation energies of 2.1(2) and 2.7(7) eV in epi- and Cz-Si. Clustering occurred more rapidly in Cz-Si, attributed to the seeding effect of impurities. Heating at 500-640 degrees C annealed the clusters with activation energies of 3.9(3) and 3.6(3) eV in epi- and Cz-Si, linked to the vacancy-cluster binding energy.