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Sputtering Deposition of Lead-free Piezoelectric (K, Na)NbO3 Thin Films

We fabricated composition gradient sodium potassium niobate [(K,Na)NbO3, KNN] thin films on (111)Pt/Ti/SiO2/Si by multi-target RF magnetron sputtering to optimize KNN film composition by combinatorial method. We successfully obtained c-axis oriented KNN thin films with perovskite structure on 6-inch Si wafers. The KNN film composition was measured by energy dispersive x-ray spectroscopy (EDX) and we confirmed composition gradient of K/(K+Na) ratio of the KNN thin film on Si wafer along with the line between KNbO3 and NaNbO3 targets. This result indicates that the combinatorial sputtering is useful for precise optimization of the deposition condition and film composition of the lead-free KNN thin films.