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Novel planar electroabsorption waveguide modulator for rf applications

Planar electroabsorption InP/InGaAsP waveguide modulators suitable for RF applications have been fabricated using the photoelastic effect. The planar device structure is achieved by using WNi thin film surface stressors for lateral waveguiding and helium implantation for electrical isolation between devices. These are the first reported frequency measurements on a photoelastic InP/InGaAsP waveguide modulator.