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Organogels for the cleaning of artifacts

Abstract The cleaning of artifacts must not alter the original properties of the objects. While the use of free solvents is risky, their confinement into polymeric networks can allow the safe removal of unwanted layers from artifacts. Recently, a methyl 2-methylprop-2-enoate (MMA)-based organogel was formulated as loaded with butan-2-one (MEK), and used to remove aged varnishes from canvas paintings. However, this formulation is not enough retentive to allow its use on paper, where higher retentiveness is needed to avoid the uncontrolled spreading of MEK and dissolved materials. Here, a new PMMA-MEK gel was designed to overcome this limitation. The amount of cross-linker and monomer used in the synthesis of the gel were tuned to achieve optimal retentiveness. Differential scanning calorimetry (DSC), differential thermogravimetry (DTG), small-angle X-ray scattering (SAXS) and attenuated total reflection fourier transform infrared spectroscopy (ATR-FTIR) provided information on the solvent content, release rate, and mesoporosity of the gel as compared to the previous system. The lower solvent release rate of the new formulation allowed the safe removal of wax that jeopardized a 19th century paper document. The removal was confirmed through optical microscopy and ATR-FTIR, which also highlighted the absence of gel residues on the treated surface.