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Effect of Ion Implantations and Post-treatments on Optical Transmission of Fluorozirconate Glass

This paper is devoted to the study of the optical transmission of fluorozirconate glass implanted with Ar, N and O ions, at low energies from 5 to 15 and high energies of 30, 50 and 100 keV to various dose levels. Ar- and N-ion implantations clearly reduced the transmittance. The transmittance reduction of Ar-ion-implanted glass can be effectively recovered by thermal treatment of the glass in oxygen atmosphere, but not by subsequent oxygen-ion implantation. On the other hand, post O-ion implantation can significantly improve the transmittance of N-ion-implanted glass but thermal oxidation is not effective. The energy and dose conditions do not significantly affect the transmittance of the O-ion-implanted samples, but give rise to the attenuation tail near the UV edge. The origin of the tail is considered to be mainly the defects arising from ion-bombardment-induced atomic displacement. The attenuation from light scattering is substantial only when the energy of implantation is high enough to cause serious surface roughness.