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High Anisotropy Y-Co Films on Thin Cu Underlayer

The role of Cu underlayer for preparing CaCu5-type high magnetic anisotropy YCo5 phase was studied. We prepared the Cu/YCo structure with a DC magnetron sputtering deposition system under elevated substrate temperatures. We successfully produced magnetic films which contains a high-Ku Y(Co, Cu)5 phase using a 7.5-nm-thick Cu underlayer, and under the growth temperature of 470 degC and above. The film has the perpendicular c-axis orientation with spread of 3deg. At 470 degC growth temperature, the film consists of a crystalline Cu-rich Y(Co, Cu)5 phase and an amorphous Co-rich Y(Co, Cu)5 phase. A rather thin Cu underlayer thickness of 7.5 nm was sufficient for obtaining a good perpendicular c-axis orientation, and the high-Ku phase production