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Novel target holder for RF sputtering systems

A novel target-holder construction for sputtering machines was developed and found to be most useful and effective for multi-target processes. The main advantages of this target holder are that it guarantees a good contact between the target material and the water cooled surface of the target-holder, it enables a quick target replacement, it provides a shielding protection against the rest of the non operative areas of the target holder and it improves the sputtering machine maintenance process.