{'fraction_non_alphanumeric': 0.03397612488521579, 'fraction_numerical': 0.0027548209366391185, 'mean_word_length': 5.337209302325581, 'pattern_counts': {'":': 0, '<': 0, '<?xml version=': 0, '>': 0, 'https://': 0, 'lorem ipsum': 0, 'www.': 0, 'xml': 0}, 'pii_count': 0, 'substrings_counts': 0, 'word_list_counts': {'cursed_substrings.json': 0, 'profanity_word_list.json': 0, 'sexual_word_list.json': 0, 'zh_pornsignals.json': 0}}
Effects of Sputtering Gas and Metallic Thin Film on the Growth of Carbon Nanostructures

Effects of different sputtering gases and metallic thin films on the growth of carbon-based nanostructures (CNSs) have been studied in detail. Aligned carbon nanowalls (CNWs) and multi-walled carbon nanotubes (MWCNTs) were synthesized on glass substrate at a low temperature in atmospheric pressure via thermal chemical vapor deposition (TCVD) techniques. The Iron (Fe) and Aluminum (Al) thin film is prepared using DC Magnetron Sputtering method with certain voltage, time and optimized deposition pressure. Surface morphologies of the films have been studied by atomic force microscopic (AFM).When the sputtering gas convert from Argon (Ar) to Nitrogen (N ), the deposited carbon material changes from carbon nanowalls 2 (CNWs) to multi-walled carbon nanotubes (MWCNTs). Additionally, the density of carbon nanostructures has changed by different metallic thin film. Acetylene (C H ) as a hydrocarbonic gas with Ammonia as a dilution 22 gas was applied during the activation and deposition process.