{'fraction_non_alphanumeric': 0.012089810017271158, 'fraction_numerical': 0.0, 'mean_word_length': 6.25, 'pattern_counts': {'":': 0, '<': 0, '<?xml version=': 0, '>': 0, 'https://': 0, 'lorem ipsum': 0, 'www.': 0, 'xml': 0}, 'pii_count': 0, 'substrings_counts': 0, 'word_list_counts': {'cursed_substrings.json': 0, 'profanity_word_list.json': 0, 'sexual_word_list.json': 0, 'zh_pornsignals.json': 0}}
Deposition of conventional and gradient optical coatings by ECR plasma-enhanced chemical vapor deposition

The computer-controlled electron cyclotron resonance plasma enhanced chemical vapor deposition of SiOxNy was used for the manufacturing of optical interference coatings with inhomogeneous and traditional multilayer refractive index profiles. Such complex structures as triple-band rugate optical interference filters and graded refractive index antireflection coatings were grown. The design of coatings was performed using measured optical constants of the SiOxNy-system.