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Improvement of the spatial resolution of ion imaging system using thinned sensor substrate

We proposed an addressable potentiometric sensor for ion imaging using a focused electron beam instead of the light. The electron beam can be easily focused to a spot of several nanometer, and it enable to improve the spatial resolution. The electron beam for imaging the ion concentration distribution is scattered in a sensor substrate and the spatial resolution is reduced. Therefore, it is necessary to reduce the scattering in order to realize a high spatial resolution. In order to reduce scattering, the acceleration voltage of the electron beam and the film thickness of the sensor substrate were examined.