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Replication of patterns on nanometric polymer films obtained by photopolymerization by evanescent waves

In this paper, the process of thin film photopolymerization using evanescent waves is used and the adaptability of this process to pattern replication is studied. Variable frequency patterns are copied on film by an imaging process. After photopolymerization, a thin polymer image is obtained, and the shape of the polymer parts is studied. The main limitation to this process is the loss of fidelity between the light profile just after the target and after the imaging set-up. Taking into account optical considerations, the theoretical shape of the polymer parts obtained by this method is calculated and then compared with experimental results. The general shape can be predicted by this approach, but a finer analysis indicates that the response of the formulation has also to be taken into account.