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DESIRE technology with electron-beam resists: fundamentals, experiments, and simulation

The paper deals with the application of DESIRE techniques on e-beam lithography. The authors propose the basic statements for designing e-beam resists in order to apply properly the silylation method. The preliminary experiments with the designed resist prove the silylation capabilities of PMMA/P(tert-Butyl)MA copolymer. A mathematical model is built which emphasizes the role of Tg in diffusion. The simulation results are presented.