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Effects of Preparing Conditions on NO2-Sensing Properties of Sputtered WO3 Nano-Films

WO3 nano-films were deposited on Al2O3 substrate by dc reactive magnetron sputtering method. The effects of preparing conditions, such as the discharge gas ratio (Ar:O2), working pressure, sputtering time and annealing temperature on microstructure, crystalline state and NO2-sensing properties of WO3 nano-films were investigated by orthogonal trial experiment method. The optimum technological conditions were determined by orthogonal test and extreme difference analysis. The crystallization, morphology and composition of WO3 thin film obtained at the optimal parameters were studied by XRD, SEM and XPS. The gas sensing mechanism was also studied. WO3 nano-film shows high sensitivity, fast response, good selectivity at the best operating temperature 200°C.