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Development of Planar Slow-Wave Structures for Low-Voltage Millimeter-Band Vacuum Tubes

A novel technology for microfabrication of millimeter-band planar microstrip slow-wave structures (SWS) is proposed. The technology is based on magnetron sputtering and laser ablation methods. V-band (50–70 GHz) and W-band (75–110 GHz) meander-line SWSs are fabricated and characterized by scanning electron and optical microscopy. Electromagnetic parameters of the developed SWSs are studied by numerical simulation and cold-test measurement. Small-signal and large-signal gain is calculated.