{'fraction_non_alphanumeric': 0.023399014778325122, 'fraction_numerical': 0.0012315270935960591, 'mean_word_length': 5.504, 'pattern_counts': {'":': 0, '<': 0, '<?xml version=': 0, '>': 0, 'https://': 0, 'lorem ipsum': 0, 'www.': 0, 'xml': 0}, 'pii_count': 0, 'substrings_counts': 0, 'word_list_counts': {'cursed_substrings.json': 0, 'profanity_word_list.json': 0, 'sexual_word_list.json': 0, 'zh_pornsignals.json': 0}}
Selective Deposition of Hafnium Oxide Nano-Thin Films on OTS Patterned Si

The patterning of thin films is of considerable scientific and technological interest. Various ways to obtain micro/nano patterns of thin films have been thoroughly investigated. Soft lithography is the method to make micro/nano size patterns and structures simply using organic materials without involving high energy. In particular, microcontact printing (μCP) is a very convenient, nonphotolithographic technique that can generate patterned features of self-assembled monolayers (SAMs) on both planar and nonplanar surfaces. Moreover, the μCP technique shows that hydrophobic patterns with micro/nano dimensions can be formed on hydrophilic surfaces. In this study, we carried out the selective deposition of HfO2nano-thin films on Si