{'fraction_non_alphanumeric': 0.020905923344947737, 'fraction_numerical': 0.0, 'mean_word_length': 5.682170542635659, 'pattern_counts': {'":': 0, '<': 0, '<?xml version=': 0, '>': 0, 'https://': 0, 'lorem ipsum': 0, 'www.': 0, 'xml': 0}, 'pii_count': 0, 'substrings_counts': 0, 'word_list_counts': {'cursed_substrings.json': 0, 'profanity_word_list.json': 0, 'sexual_word_list.json': 0, 'zh_pornsignals.json': 0}}
Laser irradiation, ion implantation, and e-beam writing of integrated optical structures

Much attention is currently being paid to the materials and processes that allow one to directly write or to imprint waveguiding structures and/or diffractive elements for optical integrated circuits by exposure from a source of photons, electrons or ions. Here a brief overview of the results achieved in our laboratories is presented, concerning the fabrication and characterization of optical guiding structures based on different materials and exposure techniques. These approaches include: electron and ion beam writing of waveguides in (poly)-crystalline lithium fluoride, uv-laser printing of waveguides and gratings in photorefractive glass thin films, and fs-laser writing in tellurite glasses. Properties and perspectives of these approaches are also discussed.