{'fraction_non_alphanumeric': 0.021518987341772152, 'fraction_numerical': 0.0037974683544303796, 'mean_word_length': 5.084615384615384, 'pattern_counts': {'":': 0, '<': 0, '<?xml version=': 0, '>': 0, 'https://': 0, 'lorem ipsum': 0, 'www.': 0, 'xml': 0}, 'pii_count': 0, 'substrings_counts': 0, 'word_list_counts': {'cursed_substrings.json': 0, 'profanity_word_list.json': 0, 'sexual_word_list.json': 0, 'zh_pornsignals.json': 0}}
Rapid growth of nanostructure on tungsten thin film by exposure to helium plasma


 A fiberform nanostructure (FN) was synthesized by exposing high-density helium plasma to a 100-nm-thick tungsten thin film in the linear plasma device NAGDIS-II. After helium plasma exposure, the cross-section of samples was observed by a scanning electron microscope, a transmission electron microscope, and a focused ion beam scanning electron microscope. It is shown that the thickness of the nanostructured layer increases significantly for only a short irradiation time. The optical absorptivity remains high, even though exposed to helium plasma for a short time. The usage of the thin film can shorten the processing time for nanostructure growth, which will be beneficial for commercial production.