{'fraction_non_alphanumeric': 0.017278617710583154, 'fraction_numerical': 0.009359251259899209, 'mean_word_length': 5.465116279069767, 'pattern_counts': {'":': 0, '<': 0, '<?xml version=': 0, '>': 0, 'https://': 0, 'lorem ipsum': 0, 'www.': 0, 'xml': 0}, 'pii_count': 0, 'substrings_counts': 0, 'word_list_counts': {'cursed_substrings.json': 0, 'profanity_word_list.json': 0, 'sexual_word_list.json': 0, 'zh_pornsignals.json': 0}}
Synthesis of High-Quality Monolayer MoS2 by Direct Liquid Injection.

We report the synthesis of high-quality single monolayer MoS2 samples using a novel technique that utilizes direct liquid injection (DLI) for delivery of precursors. The DLI system vaporizes a liquid consisting of a selected precursor dissolved in a solvent into small, micron-sized droplets in an expansion chamber maintained at a selected temperature and pressure, before delivery to the deposition chamber. We demonstrate synthesis of monolayer MoS2 on SiO2/Si substrates using the DLI technique with film quality superior to exfoliated samples or those grown by traditional tube furnace chemical vapor deposition (CVD) methods. Photoluminescence measurements of DLI monolayers exhibit consistently brighter emission, narrower line width and higher emission energy than their exfoliated and CVD counterparts. Conductive atomic force microscopy identifies a defect density of 8.3 x 10^11/cm2 in DLI MoS2, lower than the measured density in CVD material and nearly an order of magnitude improvement over the exfoliated MoS2 investigated under the same conditions. The DLI method is directly applicable to many other van der Waals materials which require the use of challenging low vapor pressure precursors, to growth of alloys, and sequential growths of dissimilar materials leading to van der Waals heterostructures.