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Laser-specific photochemistry and lithography of DNQ-4-sulfonic-acid-ester-based photoresists

The photolysis of DNQ-4-sulfonic acid esters yields 3- indenecarboxylic acid-1-sulfonic ester (3-ICA-1-SE). 3-ICA-1- SE reacts to the corresponding sulfonic acid. The rate of the ester cleavage is fast at exposure and slow in the dark. The deep UV lamp or laser exposure using low intensity is most effective for acid generation, pH change and network formation (image reversal).