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In-situ formation of magnesium silicide nanoparticles on the surface of the hydrogenated silicon films

The magnesium silicide nanoparticles were formed on the surface of hydrogenated silicon thin films by thermal evaporation, annealing and hydrogen plasma treatment. The high reactivity of silicon and magnesium leads to the self-formation of magnesium silicide nanoparticles (NPs). The reaction is stimulated in-situ by the low pressure hydrogen plasma. The presence of Mg2Si NPs was confirmed by SEM and Raman spectroscopy. The photothermal deflection spectroscopy (PDS) shows the enhanced optical absorption in the near infrared spectrum. The diode structures with insitu embedded Mg2Si NPs were characterized by the volt-ampere measurements in dark and under AM1.5 spectrum.