{'fraction_non_alphanumeric': 0.03429355281207133, 'fraction_numerical': 0.03292181069958848, 'mean_word_length': 4.703125, 'pattern_counts': {'":': 0, '<': 0, '<?xml version=': 0, '>': 0, 'https://': 0, 'lorem ipsum': 0, 'www.': 0, 'xml': 0}, 'pii_count': 0, 'substrings_counts': 0, 'word_list_counts': {'cursed_substrings.json': 0, 'profanity_word_list.json': 0, 'sexual_word_list.json': 0, 'zh_pornsignals.json': 0}}
Preparation of As-Deposited 80 K-Phase Bi–Sr–Ca–Cu–O Films by RF Magnetron Sputtering

We prepared the as-deposited 80 K-phase Bi–Sr–Ca–Cu–O (BSCCO) films using the rf magnetron sputtering method with a single target. When the substrates were set at the position parallel to the target, the as-deposited 80 K-phase BSCCO films with the zero-resistance temperature of 65 K were prepared at the substrate temperatures from 630 to 650°C under the total gas pressure of 200 mTorr, where the ratio of oxygen to total gas pressure was from 75 to 100%. The regions of substrate temperature and total gas pressure for obtaining the 80 K-phase BSCCO film were extended by setting the substrate at the position perpendicular to the target.