{'fraction_non_alphanumeric': 0.035146443514644354, 'fraction_numerical': 0.018410041841004185, 'mean_word_length': 4.98, 'pattern_counts': {'":': 0, '<': 0, '<?xml version=': 0, '>': 0, 'https://': 0, 'lorem ipsum': 0, 'www.': 0, 'xml': 0}, 'pii_count': 0, 'substrings_counts': 0, 'word_list_counts': {'cursed_substrings.json': 0, 'profanity_word_list.json': 0, 'sexual_word_list.json': 0, 'zh_pornsignals.json': 0}}
Electrochromic nickel oxide films made by reactive r.f. sputtering from different targets

We describe the preparation and optical–electrical characterization of thin electrochromic layers based on nickel oxide (NiOx). These layers were deposited by reactive radiofrequency (r.f.) sputtering from nickel or nickel oxide targets, maintaining the r.f. power and varying the oxygen flow in a gas mixture of Ar and O2 from 5% up to 30%. The Ni/O ratio in the deposited thin films was determined by Rutherford backscattering spectroscopy (RBS) and the microstructure was investigated by x‐ray diffraction. The deposition rate was found to be strongly dependent on the type of target used. The electrochromic behaviour in aqueous alkaline electrolyte (0.1 N KOH solution) was investigated by electrochemical cyclization. Samples deposited by the NiO target exhibited the lowest N/O ratio (0.5) and the highest value of intercalated charge (∼4.9 × 10−2 mC cm−2 nm−1). Among the same samples the highest value of the intercalated charge was found for those deposited at low oxygen flow, but these samples exhibit the smallest reversible changes in optical absorption in the wavelength range 330–1200 nm.