{'fraction_non_alphanumeric': 0.03099630996309963, 'fraction_numerical': 0.006642066420664207, 'mean_word_length': 5.679802955665025, 'pattern_counts': {'":': 0, '<': 0, '<?xml version=': 0, '>': 0, 'https://': 0, 'lorem ipsum': 0, 'www.': 0, 'xml': 0}, 'pii_count': 0, 'substrings_counts': 0, 'word_list_counts': {'cursed_substrings.json': 0, 'profanity_word_list.json': 0, 'sexual_word_list.json': 0, 'zh_pornsignals.json': 0}}
Growth of a Surface-Tethered, All-Carbon Backboned Fluoropolymer by Photoactivated Molecular Layer Deposition.

The synthesis of an all-carbon backboned fluoropolymer using photoactivated molecular layer deposition (pMLD) is developed. pMLD is a vapor-phase, layer-by-layer, organic thin film synthesis method utilizing UV light, allowing for the creation of materials previously unavailable via thermal MLD. The carbon backbone is achieved by reacting an iodine-containing fluorocarbon monomer (1,4-diiodooctafluorobutane) and a diene monomer (1,5-hexadiene) under UV irradiation in a step-growth polymerization sequence. The polymerization occurs with a growth rate of 1.3 Å/cycle, forming a copolymer containing hydrocarbon and fluorocarbon segments. X-ray photoelectron spectroscopy (XPS) was used to confirm the formation of new carbon-carbon bonds and quantify the final film composition. In situ XPS thermal annealing experiments confirm the film stability up to 400 °C. The ability to pattern the fluoropolymer on a surface is demonstrated using a photomask, suggesting that these films could be incorporated into photolithographic processes. Together, these results demonstrate that pMLD can be used to synthesize carbon backboned films with photopatterning ability, expanding the available chemistries and potential applications of MLD polymers.