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Anodization process of aluminum microelectrode for a single-electron transistor operating at room temperature

A technology for fabricating nanostructures has been extensively studied in order to develop electronic or photonic devices based on new types of mechanisms such as quantum effects. There are generally two complementary approaches to fabrication of nanostructures. One is a top-down process as typified by a lithography technique widely used in LSI technology and the other is a bottom-up process such as a self-organization process. In the case of the conventional lithography technique, it is not easy to fabricate nanostructures although it is suitable for controlling their positions. In contrast, a self-organization process does not control positions of nanostructures though it can easily produce nanostructures. Therefore, it is important to develop a hybrid technique of these complementary techniques.