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Computational lithography work flows and design rule exploration automation

Lithography development has become extremely computationally intensive. For a particular technology node being developed, it is critical to determine the optimum source and OPC/RET for each layer. In this paper we present a flexible new computation system for automation of source, OPC and RET optimization of advanced lithography layers. Of course, before determining the optimum source/RET/OPC of any layer, it is equally critical to determine the design rules which can be manufactured at a particular technology node. The design rule computational lithography problem is a superset of the source/OPC/RET optimization problem. With an automated methodology, time for process development can be reduced dramatically if a process development engineer can determine the design rules through accurate, automated simulation of the entire flow.