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The effects of capacitively coupled CH4 plasma on the reduction of the graphene oxide film

ABSTRACT In this study, the reduced graphene oxide (rGO) films were fabricated at room temperature using capacitively coupled CH4 plasma treatment of the spin-coated graphene oxide (GO) films. The variations of the rGO films were evaluated according to the treatment positions (bulk plasma region (Rb) and sheath region (Rs)) and the treatment time. The reduction of the GO films began immediately after the CH4 plasma was exposed to both regions. However, as the treatment time increased, the physical properties of rGO films became different. The reduction in the Rb was effective to modify the rGO films for transparent conducting films.