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Plasma diagnostics in industry

Plasma processing forms an invaluable part of semiconductor device manufacturing. For the most part, commercial tools have relied on an empirical process for their evolution and relied exclusively on plasma characterization only at the development stage. As this industry advances there is the need to provide non-invasive plasma characterization and diagnostics on the processing equipment, in order to provide more control over the plasma properties. We outline some of the typical configurations used in the industry and describe two of the measurement techniques we have developed for the characterization of these industrial plasma sources.