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An Undergraduate Microchip Fabrication Facility

A microchip fabrication facility for teaching the elements of semiconductor processing to a multidisciplinary cohort of about 500 students per year from all areas of engineering, science, and even the humanities is described. The laboratory comprises an approximately 1,800 ft, Class 10,000 cleanroom with house vacuum, distributed process gases (Ar, O2 and N2), and an 18.3 MΩ de-ionized water system. It has been equipped with an oxidation module, two diffusion modules (nand p-type), a photolithography module, a physical vapor deposition (PVD) module, a wet development station, a wet etch station, two wafer test modules, optical microscopes, and a thin film characterization system. A four-mask process from which resistors, operating p-n junctions, enhancement mode n-MOSFETs, and some simple circuits are created on 4-inch (100 mm), p-type wafers using 100 μm rules has been created. A laboratory information management system (LIMS) is being developed in order to operate as a completely paperless facility. In addition to learning the basic unit operations of microchip fabrication, students are taught safety and cleanroom protocols that are rigorously followed. Although designed and built to Class 10,000 cleanroom standards, with strong support from the Virginia semiconductor industry, the facility is operated as if it were a Class 1000 facility in order to prepare students for the mindset necessary to successfully work in both our advanced research facility and in the semiconductor industry where they co-op and seek employment.