{'fraction_non_alphanumeric': 0.021986353297952996, 'fraction_numerical': 0.0, 'mean_word_length': 5.9109947643979055, 'pattern_counts': {'":': 0, '<': 0, '<?xml version=': 0, '>': 0, 'https://': 0, 'lorem ipsum': 0, 'www.': 0, 'xml': 0}, 'pii_count': 0, 'substrings_counts': 0, 'word_list_counts': {'cursed_substrings.json': 0, 'profanity_word_list.json': 0, 'sexual_word_list.json': 0, 'zh_pornsignals.json': 0}}
Replication of diffractive optics

In recent years surface-relief Diffractive Optical Elements (DOEs), a specialized class of diffractive optical elements, have revolutionized design of optical systems and instruments. Surface-relief diffractive optical components improve performance of the existing optical systems and increase systems compactness and reliability. Surface-relief DOEs can be fabricated as multilevel binary optical elements, or as continuous surface-relief optical elements. A surface-relief DOE is being designed such that incident light interacts with the topography of the surface-relief microstructure including the size and shape characteristics of surface profile features such as indentations and projections as well as their dimensional relationship, to perform a desired optical function. Binary optical elements are being made by the same microlithographic and ion etching techniques used to produce VLSI circuits. Computer-generated continuous surface-relief DOE is recorded by direct laser-beam or e-beam writing in photoresist. Continuous surface-relief DOE can be also recorded in photoresist by interferometric (holographic) technique. After development recorded in photoresist surface-relief microstructures are being ion-beam etched into quartz or other inorganic optical substrates.