{'fraction_non_alphanumeric': 0.0171875, 'fraction_numerical': 0.0, 'mean_word_length': 5.819148936170213, 'pattern_counts': {'":': 0, '<': 0, '<?xml version=': 0, '>': 0, 'https://': 0, 'lorem ipsum': 0, 'www.': 0, 'xml': 0}, 'pii_count': 0, 'substrings_counts': 0, 'word_list_counts': {'cursed_substrings.json': 0, 'profanity_word_list.json': 0, 'sexual_word_list.json': 0, 'zh_pornsignals.json': 0}}
Characteristic three-dimensional structure of resist's distribution after drying a resist solution coated on a flat substrate: analysis using the extended dynamical model of the drying process

We extend the former dynamical model of drying process of a resist solution coated on a flat substrate to three-dimensional one. And through numerical simulation of the extended dynamical model we clarified characteristic three-dimensional structure of resist's thickness distribution after drying. And we confirmed characteristic thickness distribution of resist thin film obtained by two-dimensional model through three-dimensional model again.