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Influence of Discharge Gas Pressure on Structural Properties of SnO2 Thin Films Deposited by Reactive Magnetron Sputtering

The influence of discharge gas pressure on the structural properties of SnO2 thin films deposited by reactive magnetron sputtering at room temperature was investigated by X-ray diffraction, field emission scanning electron microscopy, and by the measurement of film density and physical adsorption isotherms. As the pressure increased, the grain size increased and the crystallite size decreased; simultaneously, a void structure developed, and the film became porous, indicating a lower film density. According to the results of physical adsorption isotherms, the effective surface area and the porosity increased with increasing discharge gas pressure.