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Metal Replacement Causing Interference in Stripping Analysis of Multiple Heavy Metal Analytes: Kinetic Study on Cd(II) and Cu(II) Electroanalysis via Experiment and Simulation.

Although it has been recognized that the interference between heavy metal ions (HMIs) becomes a severe problem for the simultaneous electroanalysis of multiple HMIs, the factor leading to the interference is still difficult to identify, due to the limited understanding of the electroanalytic kinetics. In this work, a kinetic model is built for the electroanalysis of HMIs and the electroanalytic results are simulated for Cd(II), Cu(II) and their mixture as examples for the interference investigation. The mutual interference between Cd and Cu is observed on the glassy carbon electrode. By applying the kinetic model, the replacement of deposited Cd by Cu(II) at the co-deposition stage is regarded as the main reason for the interference and the corresponding suggestion for selecting suitable electrode materials to avoid such interference is also provided.