{'fraction_non_alphanumeric': 0.015432098765432098, 'fraction_numerical': 0.0, 'mean_word_length': 5.904255319148936, 'pattern_counts': {'":': 0, '<': 0, '<?xml version=': 0, '>': 0, 'https://': 0, 'lorem ipsum': 0, 'www.': 0, 'xml': 0}, 'pii_count': 0, 'substrings_counts': 0, 'word_list_counts': {'cursed_substrings.json': 0, 'profanity_word_list.json': 0, 'sexual_word_list.json': 0, 'zh_pornsignals.json': 0}}
Improved sputter depth resolution in Auger composition‐depth profiling of polycrystalline thin film systems using single grain depth profiling

Today in‐depth profiling of microelectronics thin film systems is one of the important applications of Auger electron spectroscopy. It is used to monitor the elemental in‐depth composition after different manufacturing processes to control the quality of these processes. For instance, the layer interdiffusion and reactions with various process gases are analyzed. In addition, interface contaminations have to be controlled, because they strongly influence the properties of the whole thin film system.