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Alignment Considerations for Precise Large Area Imaging and EDS Mapping

SEM imaging and EDS mapping of geological and extraterrestrial materials usually require analyzing at relatively high magnifications to investigate microscale features and a representative area to minimize the heterogeneity induced by grain size and phase distributions across the entire sample (Figure 1). Modern SEM and EDS enable precise large area imaging and EDS mapping by collecting individual high magnification/resolution images and maps through a grid pattern over a large sample surface and stitching them into a montage [1]. The basic requirement for such applications is ensuring good alignment of edge features of individual images and maps with respect to neighbors. While it is possible to adjust focus with working distance (WD) or Z stage movement, it is also recommended to keep a constant working distance throughout the entire imaging/analyzing area to reduce errors. This study discusses relatively easy practices to check and satisfy alignment considerations in preparation for collecting large area images and EDS maps.