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Control of Plasma Density Distribution by Adjusting Parallel Variable Capacitor in an Inductively Coupled Plasma

As antenna length increases for the large-area plasma source, problems occur, which cause non-uniform distribution of the plasma density due to the increase of the antenna inductance. Uniform plasmas are essential for plasma processing, because the distribution of the plasma density is directly related to the processing uniformity. In order to reduce the inductance of an antenna and generate uniform plasma, a parallel antenna is used. However, even if the parallel is used, high uniformity of the plasma density cannot be achieved. This is because larger currents flow to the inner coil than to the outer coil. In this study, a LC parallel circuit is added to the inner coil to control the current flowing through the inner coil. By adjusting the capacitance of the LC parallel circuit, the radial distribution of the plasma density can be controlled.