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Characterization of nanocrystalline silicon films

The hydrogenated nanocrystalline silicon films have been prepared with plasma enhanced chemical vapor deposition method. The microstructure of these films has been studied by high resolution transmission electron microscopy, Raman scattering spectra and x-ray diffraction analysis methods. The films are especially valuable for some devices, for example, quantum dots, luminescence devices, and film pressure sensors etc. The nc-Si:H films show texture structure. The fractal dimension of this microstructure has been calculated with a Fourier filtered image. The microstructure properties of the films are discussed.