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Monolithic fabrication and performance control of multilayered, polarization sensitive, guided-mode resonance filters

An efficient monolithic fabrication technique of multiple Guided-Mode Resonance Filter (GMRF) devices on a single substrate is presented. The devices consist of two crossed linear sub-wavelength grating (SWG) dielectric layers, formed by etching deposited silicon oxide films, separated by a silicon nitride waveguide. The buried SWG duty cycle is lithographically modulated to control the device resonance wavelengths, independent of the top SWG. This is because the buried SWG acts as a tunable effective index layer, controlling the waveguide mode coupling wavelength into the silicon nitride waveguide layer. The two SWG have different spatial periods, to further reduce resonance coupling between them. The fabrication is accomplished using existing photolithographic technology, and conventional PECVD coating techniques.