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Uniform illumination in SCALPEL by imaging the angular distortion

An investigation is presented of the possibility to improve electron-beam uniformity of the SCALPEL system by imaging the angular distribution. First, some calculations are carried out which suggest that this angular distribution image should be corrected to enlarge the area of the beam that is uniform within the specifications. Then an optical system is introduced with which this could be done using spherical aberration, and computer simulation results are presented to illustrate the possibilities of such a system.