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In Situ Control of CVD Synthesis of Graphene Film on Nickel Foil

Here we present a detailed study of the chemical vapor deposition (CVD) method used in a real‐time regime for graphene film fabrication on nickel foils. Thin films with a wide range of thicknesses (from 3 up to 53 layers and more) have been obtained. A home‐made cold‐wall chamber for CVD realization is demonstrated in this work. It is supplied with tools for in situ monitoring the temperature‐dependent electrical resistance of nickel substrate to obtain a desired number of graphene layers in the sample synthesized. An area of 1 × 1 cm2 appeared to be covered by graphene. Raman spectroscopy and optical absorption spectroscopy are used to estimate the quality of graphene films fabricated and the graphene layer number.