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Electron Detachment from Negative Ions of SF6 in Xenon and Methane

The coefficient for electron detachment from negative SF6 ions in xenon and methane was measured as a function of E/N. Photo electrons were injected into mixtures of Xe/1%SF6 and CH4/1%SF6 where attachment led to the formation of negative ions. A novel field impulse method was employed for the detection and measurement of the detachment process.