{'fraction_non_alphanumeric': 0.027726432532347505, 'fraction_numerical': 0.0073937153419593345, 'mean_word_length': 4.73015873015873, 'pattern_counts': {'":': 0, '<': 0, '<?xml version=': 0, '>': 0, 'https://': 0, 'lorem ipsum': 0, 'www.': 0, 'xml': 0}, 'pii_count': 0, 'substrings_counts': 0, 'word_list_counts': {'cursed_substrings.json': 0, 'profanity_word_list.json': 0, 'sexual_word_list.json': 0, 'zh_pornsignals.json': 0}}
Treatment of tantalum using argon glow discharge plasma for applied purposes

The main purpose of this work is to use a low-cost DC plasma discharge to enhance the material properties. The source of the DC glow discharge plasma was the Batorm device. By using a low-pressure argon gas, the best operating conditions of the plasma were obtained at a pressure [Formula: see text] and a breakdown voltage of 160 V. Electrical parameters of the plasma have been experimentally estimated at two different pressures [Formula: see text] and [Formula: see text]. Tantalum material has been chosen to be treated along this work due to its great importance in industry. In addition, it is used as a cathode for the ion source inside the Egyptian cyclotron at the Egyptian Atomic Energy Authority (EAEA). A U-shaped tantalum sample, exactly like the cyclotron filament, was exposed to plasma created from [Formula: see text] and 250 V for 30 min. At these low conditions, the obtained results were promising where the surface treatment of the sample caused cleaning and increased its hardness.