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Ellipsometry as Testing Method of Properties of Nano-Scale Films

Ellipsometry is power instrument for testing several properties of thin films. Advantage and attractiveness of these optical studies consist in that they are non-destructive and non-disturbing. High sensitivity to surface state allows us to monitoring properties of films beginning from atomic scale as in-situ and as ex situ. Ellipsometry give us information about film thickness, and film composition, and its surface morphology. From analysis of ellipsometric spectra it is possible get data about zone structure of semiconductor materials, such as energy of critical points, absorption edge location, and crystallinity. Speed of data acquisition is sufficient high to test dynamic of film growth. Ellipsometric measurements are quite simple but its interpretation requires special software. In this paper some possibilities of ellipsometric method are demonstrated in examples film polymorphism.