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Study of improvement of imaging quality in project photolithography with amplitude phase compound filtering

In accordance with the disadvantages of focus depth decrease caused by the large enough numerical aperture of the project photolithography imaging system and larger optical energy loss of amplitude filtering, the improvements in imaging resolution, focus depth and the availability of optical energy by means of amplitude phase compound filtering are studied in detail. The fact that corresponding optimal compound filters should be designed according to the different mask pattern designs has been proposed. The calculation analysis and experimental results show that amplitude phase compound filtering can improve the imaging resolution and focus depth of project photolithography by a big margin. At the same time the availability of optical energy can be improved and this is good for the improvement of production efficiency.