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Photolithographic Process for Creating Micro-Grating on Silicon Substrate for Biosensor Application

In this work, we use photolithography in order to fabricate micro-grating structures on silicon. The first step of device was coated by 3.5 μm thick silicon dioxide (SiO2) film on top side, whereas the bottom side was coated with 4.5 μm. Next, we deposited silicon nitride (Si3N4) film of 2 μm by plasma-enhanced chemical vapor deposition, and used photolithography to prepare the gratings. We compared micro-grating period sizes of 1 μm, 0.8 μm and 0.5 μm, and found the 0.5 μm gave the best sensitivity. These devices can be applied with detection in biosensing in the future.