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Variable angle spectroscopic ellipsometry for deep UV characterization of dielectric coatings

Fluorides and oxides are classical materials for optical coatings. At present fundamental improvements of film properties are necessary especially for optical components of high power excimer lasers and other applications in the UV spectral region. The optical properties and the laser damage threshold of the films are determined by the thin-film microstructure and by contaminations inside the films. Strong connections between optical losses and laser stability on the one hand and the film microstructure on the other hand have been shown. Therefore sensitive optical characterization techniques in the UV have to be used. We report on first results of deep UV spectroscopic ellipsometric measurement of fluoride and oxide films.