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Effect of simultaneous Ne+ ion bombardments on bonding structure of carbon films deposited from thermally evaporated C60 fullerene

Carbon thin films have been deposited on Si(111) wafers through thermally evaporated C60 with simultaneous bombardments of Ne+ ions. C60 film can be prepared for Ne+ ion energy up to 500 eV, indicating the high stability of the cagelike structure of the C60 molecule. The conversion from C60 structure into amorphous carbon takes place on increasing Ne+ ion energies to 700 eV, in which a morphological change from a nodule-like surface to featureless structure is observed. With further increase of Ne+ ion energies from 1 to 5 keV, the surface roughness of the amorphous carbon films is enhanced, while a higher fraction of sp3 bonding and a larger optical bandgap are obtained at relatively low Ne+ ion energies. These suggest that the ion sputtering is not only responsible for the surface roughening but also has significant influence on the bonding structure in ion-assisted amorphous carbon films.