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TiZrN thin films under CO2 and thermal treatment characterized by x-ray photoelectron spectroscopy

TiZrN thin films were prepared by DC magnetron sputtering on silicon (111) substrates. Samples were subjected to different temperature conditions (200, 400, and 600 °C) under a flow of carbon dioxide to emulate a corrosive atmosphere. Each treatment was performed in situ. X-ray photoelectron spectroscopy was used to examine the surface chemical changes on TiZrN thin films before and after the treatments. Survey spectra and C 1s, O 1s, N 1s, Ti 2p, and Zr 3d core level spectra were measured for each sample. Results show remarkable differences in all spectra when the sample was heated over 400 °C. At these temperatures, it is evident that the coating undergoes the greatest chemical change since metals cease to be nitrides and oxidize.TiZrN thin films were prepared by DC magnetron sputtering on silicon (111) substrates. Samples were subjected to different temperature conditions (200, 400, and 600 °C) under a flow of carbon dioxide to emulate a corrosive atmosphere. Each treatment was performed in situ. X-ray photoelectron spectroscopy was used to examine the surface chemical changes on TiZrN thin films before and after the treatments. Survey spectra and C 1s, O 1s, N 1s, Ti 2p, and Zr 3d core level spectra were measured for each sample. Results show remarkable differences in all spectra when the sample was heated over 400 °C. At these temperatures, it is evident that the coating undergoes the greatest chemical change since metals cease to be nitrides and oxidize.