{'fraction_non_alphanumeric': 0.04361370716510903, 'fraction_numerical': 0.004672897196261682, 'mean_word_length': 4.953703703703703, 'pattern_counts': {'":': 0, '<': 0, '<?xml version=': 0, '>': 0, 'https://': 0, 'lorem ipsum': 0, 'www.': 0, 'xml': 0}, 'pii_count': 0, 'substrings_counts': 0, 'word_list_counts': {'cursed_substrings.json': 0, 'profanity_word_list.json': 0, 'sexual_word_list.json': 0, 'zh_pornsignals.json': 0}}
Relative domination between Cl/sup +/ and Cl2/sup +/ ions in time-modulated inductively coupled Cl2 plasma investigated with laser-induced fluorescence technique

Time-modulated plasma etching has been newly applied to the etching of semiconductor devices. In this etching technique, the electron temperature is lowered by cutting-off plasma discharge periodically. In this study, we simultaneously measure the relative densities of Cl/sub 2//sup +/ and metastable chlorine atomic ions Cl/sup +*/ in the time-modulated ICP and CW plasma by laser-induced fluorescence (LIF) technique and discuss their relative importance in the positive ions.