{'fraction_non_alphanumeric': 0.030978934324659233, 'fraction_numerical': 0.023543990086741014, 'mean_word_length': 4.65034965034965, 'pattern_counts': {'":': 0, '<': 0, '<?xml version=': 0, '>': 0, 'https://': 0, 'lorem ipsum': 0, 'www.': 0, 'xml': 0}, 'pii_count': 0, 'substrings_counts': 0, 'word_list_counts': {'cursed_substrings.json': 0, 'profanity_word_list.json': 0, 'sexual_word_list.json': 0, 'zh_pornsignals.json': 0}}
Micrometer-Scale Local-Oxidation Lithography Using Scanning Probe Microscopy

We have studied micrometer-scale scanning probe microscopy (SPM) local-oxidation lithography on Si. In order to perform large-scale oxidation, an SPM tip with a contact area of 2.5 ×1.9 µm2, which is about 12,000 times larger than that of a conventional SPM tip, was prepared. The width of the Si oxide produced was clearly determined by the contact length of the tip. Furthermore, the throughput reached 125 µm2/s, which is 10,000 times larger than that of conventional SPM local oxidation. The SPM tip with a larger contact area may increase the spatial dimension of the water meniscus, resulting in a larger oxidized area. It is suggested from our results that SPM local oxidation can be upscaled by using a larger tip radius.