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Effect Of Ion Implantation On The Reflectivity Of Silica

The feasibility of creating anti-reflective silica by ion implanting buried, high refractive index layers below the surface of the glass has been investigated. The implantation of Al and Ti appears to increase significantly the index of the buried layers, although not enough to allow anti-reflective glass to be fabricated; excessive absorption in the layers was also encountered. Additional processing steps are suggested which may overcome these problems.