{'fraction_non_alphanumeric': 0.01559792027729636, 'fraction_numerical': 0.0, 'mean_word_length': 5.282608695652174, 'pattern_counts': {'":': 0, '<': 0, '<?xml version=': 0, '>': 0, 'https://': 0, 'lorem ipsum': 0, 'www.': 0, 'xml': 0}, 'pii_count': 0, 'substrings_counts': 0, 'word_list_counts': {'cursed_substrings.json': 0, 'profanity_word_list.json': 0, 'sexual_word_list.json': 0, 'zh_pornsignals.json': 0}}
Multilayer X-Ray Optics Produced By Atomic Layer Epitaxy

Atomic layer epitaxy is a new deposition technique which is ideally suited to producing multilayer x-ray optics with very small d-spacings. ALE allows monolayer control of film thickness, produces sharp interfaces and results in high crystalline perfection of multilayers. We have established criteria for selecting pairs of materials which can be deposited by ALE and have experimentally measured these criteria. We have also developed computer codes which predict x-ray reflectivity from multilayers deposited by ALE.