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Enhanced X-ray reflectivity from Pt-coated silicon micropore optics prepared by plasma atomic layer deposition

We report the enhancement of Pt-coated silicon micropore X-ray optics using plasma atomic layer deposition (ALD). High-aspect-ratio micropores of width 20 μm and depth 300 μm were coated with ∼20 nm Pt and ∼10 nm Al2O3. The estimated surface roughnesses, determined from X-ray reflectivity curves for Al Kα 1.49 keV radiation, were 1.2 − 1.0 + 0.6 and 1.6 ± 0.1 nm rms before and after the plasma ALD, respectively. The plasma ALD-coated Pt film shows no significant change compared to the underlying silicon and better surface roughness than our previous study of thermal ALD. We also discuss future improvements with plasma ALD.