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Electrical and optical testing system for microplasma in scanning plasma etching

In scanning plasma etching process, characteristic parameters of microplasma are the most important influencing factors. Based on the fundamental principle of microplasma etching and the device we fabricated, a set of electrical and optical testing system for our microplasma device was presented in this paper. The electrical and optical signals were collected in the vacuum chamber, then exported to the outside and connected to the testing circuit and optical spectrum analyzer separately. At last, some primary experiment results were given which proved the feasibility and effectivity of this system.