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Hybrid mask lithography for fabrication of micro-pattern with nano-pillars

This paper presents the fabrication process of nano-pillar with micro-pattern simultaneously. We proposed the hybrid mask of micro-pattern photo mask and nano-particle mask to obtain the simple fabrication of nano-pillar with micro-pattern. The features of this process are summarized as follows. (1) It is possible to fabricate arbitrary 2D pattern using photolithography. (2) We can get nano-pillar whose size was diffraction-limited by using nano-particle mask. (3) We can control the density of the nano-pillar by changing the weight ratio of nano-particle. (4) We can control the height of the pillar as same the micro-pattern which is the original surface of the substrate.