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Corrosion Properties of DLC Film in Weak Acid and Alkali Solutions

As an important joint material, tantalum (Ta) needs to be studied intensively in terms of wear and corrosion resistance. Two films of Ta/Ti/DLC (diamond-like carbon) (referred to as TD film) and Ta/Ti/TiN/Ti/DLC (referred to as TTTD film) were prepared by magnetron sputtering technology, and their electrochemical corrosion performance in lactic acid and sodium bicarbonate solutions was also investigated. The morphology observation, electrochemical corrosion experiment, and static contact angle measurement were carried out using a scanning electron microscope, electrochemical workstation, and a contact angle meter. This paper mainly discusses and analyzes the corrosion influencing factors and corrosion mechanisms of these two films under two different environments. The 20-day immersion experiments show that the TD film in both solutions results in severe surface corrosion due to its loose structure and many internal defects. In contrast, the surface of the TTTD film with a dense structure, a multilayer structure, and a thicker thickness is not corroded under the same conditions. The electrochemical corrosion experiments show that the corrosion resistance of the TD film is worse than that of the Ta substrate, while the TTTD film has the strongest corrosion resistance, improving the corrosion resistance of the Ta substrate. Although the TD film had a higher sp3 content than the TTTD film, it does not provide protection to the Ta substrate due to increased structural defects in the TD film. The results of the contact angle show that the contact angle of the TTTD film is smaller than that of the TD film in both solutions. However, the TTTD film has the lowest roughness and the densest structure, and thus the TTTD film is more resistant to corrosion. It is finally concluded that the surface morphology and internal structure of the films are the main factors affecting corrosion resistance. This provides an important reference for the application of DLC film in weak alkaline and weak acid environments.