{'fraction_non_alphanumeric': 0.02564102564102564, 'fraction_numerical': 0.008012820512820512, 'mean_word_length': 5.188118811881188, 'pattern_counts': {'":': 0, '<': 0, '<?xml version=': 0, '>': 0, 'https://': 0, 'lorem ipsum': 0, 'www.': 0, 'xml': 0}, 'pii_count': 0, 'substrings_counts': 0, 'word_list_counts': {'cursed_substrings.json': 0, 'profanity_word_list.json': 0, 'sexual_word_list.json': 0, 'zh_pornsignals.json': 0}}
Evaluation of lattice curvature and crystalline homogeneity for 2-inch GaN homo-epitaxial layer

We evaluated the lattice curvature, crystallinity, and crystalline homogeneity of a GaN layer on a free standing GaN substrate using lattice orientation measurements, θ rocking curves, and reciprocal space mapping from synchrotron X-ray diffraction topography, and X-ray diffraction. The lattice curvature of the 2-inch GaN homo-epitaxial layer was a concave bend, which had a curvature radius of approximately 20.7 m. The GaN layer was epitaxially grown on the GaN substrate and had good crystallinity with a high homogeneity.