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Effect of Temperature on TiO2/ZnO Nanostructure Thin Films

TiO2/ZnO nanostructured thin films were grown using sol-gel route. The nanostructured thin films were deposited by dip coating method on glass substrates and calcined at different temperatures (400°C, 500°C, and 600°C). The thin films were characterized using X-Ray Diffraction method (XRD), Atomic Force Microscope (AFM), and Ultraviolet Visible Spectroscopy (UV-Vis). The XRD pattern showed that the crystallinity of the calcined thin films had improved when the calcination temperature was increased. According to AFM observation and analysis, surface roughness of the thin films controllable via growth condition. While the transmittance percentage of ultraviolet by Titanium Dioxide (TiO2) thin films through UV-Vis could be improved by combination with Zinc Oxide (ZnO). The percentage of transmittance by TiO2/ZnO nanostructured thin films continue to improve as the calcination temperature were increased.