{'fraction_non_alphanumeric': 0.016927083333333332, 'fraction_numerical': 0.0, 'mean_word_length': 5.6869565217391305, 'pattern_counts': {'":': 0, '<': 0, '<?xml version=': 0, '>': 0, 'https://': 0, 'lorem ipsum': 0, 'www.': 0, 'xml': 0}, 'pii_count': 0, 'substrings_counts': 0, 'word_list_counts': {'cursed_substrings.json': 0, 'profanity_word_list.json': 0, 'sexual_word_list.json': 0, 'zh_pornsignals.json': 0}}
Process Sensitivity Analysis: Application to Photolithography

A computer program has been developed for the purpose of estimating process sensitivity and improving process robustness. In this paper the linewidth of polysilicon gates as a function of the photolithographic process parameters is analyzed. First, a model of the linewidth is obtained using the method of Statistical Design of Experiments and the Response Surface Methodology (RSM). Using such models, the program computes the breadth of linewidth variations that can result from simultaneous variations in the process parameters. This method of doing the sensitivity analysis offers significant advantages over one-parameter at a time studies, Taguchi methods, and contour plots of desirability regions.