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Pyroelectric photodetector based on ferroelectric crystal-semiconductor thin film heterostructure

Very important advantage of ZnO thin films is an opportunity of use in the composite heterostructures opening opportunities for development of ZnO-based optoelectronics devices. In this work we report the preparation of ferroelectric crystal - ZnO thin film heterostructures by vacuum deposition method and creation of new type of pyroelectric photodetector. The ferroelectric field effect transistor has been prepared using ZnO:Li films as transistor channel and LiNbO3 and TGS crystals as pyroelectric sensitive element. The photoelectric properties (currents ratio, charge carriers mobility, ampere-watt sensitivity in IR diapason, NEP sensitivity, and photocurrent kinetics) of prepared heterostructures were investigated and first samples of novel pyroelectric photodetector with high sensitivity and detectability were prepared.