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Uphill Diffusion Induced Point Contact Reaction in Si Nanowires.

The events of repeating nucleation in point contact reactions between nanowires of Si and Ni or Co have been revisited here due to uphill diffusion as well as an extremely high supersaturation, over a factor of 1000, needed for the nucleation. Also what is the diameter of the point contact needs to be defined. The stepwise growth of nanoscale epitaxial silicide can occur because the repeating nucleation events are restricted in nanoscale wires.