{'fraction_non_alphanumeric': 0.0529500756429652, 'fraction_numerical': 0.028744326777609682, 'mean_word_length': 4.6581196581196584, 'pattern_counts': {'":': 0, '<': 0, '<?xml version=': 0, '>': 0, 'https://': 0, 'lorem ipsum': 0, 'www.': 0, 'xml': 0}, 'pii_count': 0, 'substrings_counts': 0, 'word_list_counts': {'cursed_substrings.json': 0, 'profanity_word_list.json': 0, 'sexual_word_list.json': 0, 'zh_pornsignals.json': 0}}
Photochemical processes induced by 157-nm light in H(2)-impregnated glassy SiO(2):OH.

F(2) excimer-laser irradiation induces two major changes in SiO(2): OH glass impregnated with H(2) molecules. First, the vacuum-UV optical absorption edge is bleached, and the absorption at 157 nm decreases from 0.95 to 0.68 cm(-1) . Second, preexisting free SiOH groups and interstitial H(2) are photochemically converted to hydrogen-bonded hydroxyl groups. It is suggested that the bleaching of the UV-absorption edge is caused by a change of OH groups from a free to a hydrogen-bonded state and by photolysis of distorted Si-O bonds that are absorbing in the edge region.