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RAFT polymerization of 2‐hydroxyethyl methacrylate in a deep eutectic solvent

The deep eutectic solvents (DESs) are a new class of ionic liquids usually made of environmentally degradable components. In this communication, the authors report the first time use of a DES, made of choline chloride and urea, as a solvent for the RAFT polymerization of HEMA and its block copolymerization with MMA. Interestingly, the morphology studies show that DES is a potential solvent for polymerization induced self‐assembly.