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Thin-film deposition process by pulsed ion-beam generated ablation plasma

Pulsed ion-beam evaporation (IBE) is a practical technique of thin film deposition. In this paper, the process of IBE is studied with concentration on the importance of physical properties of the target material. The experiments were carried out by using different kinds of metal targets. The results have helped us in understanding the physical relation between the ablation plasma behavior and the thin-film surface morphology.