{'fraction_non_alphanumeric': 0.03526448362720403, 'fraction_numerical': 0.0327455919395466, 'mean_word_length': 4.4520547945205475, 'pattern_counts': {'":': 0, '<': 0, '<?xml version=': 0, '>': 0, 'https://': 0, 'lorem ipsum': 0, 'www.': 0, 'xml': 0}, 'pii_count': 0, 'substrings_counts': 0, 'word_list_counts': {'cursed_substrings.json': 0, 'profanity_word_list.json': 0, 'sexual_word_list.json': 0, 'zh_pornsignals.json': 0}}
High-Rate Deposition of Ferrite Films in Aqueous Solution by Light-Enhanced Ferrite Plating

By irradiating the substrate surface with a Xe-lamp at 450 W/cm2, the deposition rate of Fe3O4 film in ferrite plating was increased by a factor of 10 (from ∼30 nm/min to ∼320 nm/min). The high deposition rate in light-enhanced ferrite plating cannot be simply ascribed to the increase of thermal energy.