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Structural Properties of Iron Silicide Nanostructures Grown by Reactive Deposition Epitaxy

Iron silicide particles were grown on Si(100) by reactive deposition epitaxy. By maintaining the thickness of the deposited Fe down to 2 nm, silicide particles with diameters of less than 100 nm were formed on Si(100) substrates. Type B FeSi(CsCl) or γ-FeSi2 nanoparticles and a few β-FeSi2 nanoparticles were formed at 500 °C. Type A and B γ-FeSi2, α-FeSi2, and β-FeSi2 nanoparticles coexisted in the samples deposited at 600 °C. The α-FeSi2 phase was predominant in the sample that was deposited at 700 °C. Among these iron silicide nanoparticles, α-FeSi2 and β-FeSi2 nanoparticles tended to protrude out of the Si substrate and FeSi(CsCl) and γ-FeSi2 nanoparticles preferred to embed in the Si substrate. The mechanism of the formation of a faceted nanoparticle was discussed on the basis of the minimization of total surface energy.