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Microwave plasma-assisted diamond synthesis reactor design for large deposition areas at high rates

The Microwave plasma assisted CVD synthesis of diamond was first demonstrated during the early 1980s by Kamo et al [1]. Diamond synthesis was achieved in a small ( 2–4 cm ), tubular reactor where microwave energy was coupled into a quartz tube that was inserted through a waveguide. This reactor produced high radical densities and high quality diamond films and was inexpensive, simple to design, construct and operate. Hence it was utilized by many early diamond researchers to experimentally investigate and understand CVD diamond synthesis. However this reactor type had a number of inherent limitations such as small deposition area and low operating pressure regime. Since these early investigations the significant potential of industrial applications of CVD diamond synthesis has spurred numerous, innovative, microwave plasma reactor designs.