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Fabrication of micro-optical surface profiles by using grayscale masks

The fabrication of surface profile may become an interesting technology in the field of micro optics and micromachining. Recently, surface profiles are known and widely used in optics, especially in diffractive optics. In the last few years the demand on deep and arbitrarily shape profiles increased drastically. Laser beam writing and e-beam writing are technologies suitable for the fabrication of such profiles, but only for a limited range of profile depth. Photolithography is also able to realize surface profiles, much deeper profiles can be realized by combining of different technologies. In this paper we report about a strategy for arbitrary deep profile generation as well as results we achieved by using single and combined technologies of special gray scale masks (based on HEBS glass), e-beam lithography and photolithography.