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Optical Diagnostic of AR-O2 and AR-N2 Mixture Plasma with Fully Relativistic Electron Impact Fine-Structure Cross Sections

The trace addition of reactive molecular gases (RMG) viz. O2/N2 in inert gas (Argon) plasma provides reactive species/radicals that are required for plasma processing and plays a prime role in many application e.g. etching, surface modification and sterilization. In such plasma the production of atomic radicles can be influenced by the excited states of argon. To further understand this behavior it is essential to study in more detail how the mixture of O2/N2 in argon influences the plasma parameters, such as the electron density and electron temperature, which behave differently depending on the quantity of O2/N2 introduced in the plasma. In order to characterize these mixture plasma we coupled the optical emission spectroscopic (OES) measurements of Jogi et al1 for Ar-O2 and Lock et al2 Ar-N2 with a suitable population-kinetic models. In the present work, we have developed collisional radiative models for low temperature Ar-O2 and Ar-N2 plasma by incorporating all relevant populating and depopulating possesses occurring in the mixture plasma.