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Pattern quality analysis in a digital lithography system using scanning point array method

In this paper, we perform the simulation of arbitrary pattern to be recorded using the point array technique. At first, it is assumed that lithography is performed by forming an array spot based on a DMD device that is turned at a specific angle. The simulation was constructed in two steps: creating images for DMD and predicting pattern results. In the simulation process, we reflect the parameter of the each spot in point array. The parameters are consist of spot position, spot size, and spot intensity profile.