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Performance analysis of an infrared sensor (metal/ferroelectric/semiconductor) with high-speed response

In this paper, a thin PbTiO3-n-p+ silicon switch sensor has been developed, in which the switching voltage (the turned-on voltage) changes in proportion to the infrared light power. The sensor has a rapid response time of 0.65 μs compared with other conventional infrared sensors. It is attributed to the rapid switching device structure and the smaller pyroelectric layer thickness, 50 nm. Meanwhile in this paper, we have successfully analyzed the rapid switching transient response by using heat conduction and switching theory. The experimental results are in agreement with the theoretical analysis.