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Kinetics Of Laser-Assisted Oxidation Of Metallic Films

Oxidation of thin metallic films on glass substrates exposed to cw Ar+ laser irradiation is studied. The evolution of the oxide thickness, x, with time, t, is measured via the reflectivity of a probed He-Ne laser beam. Under certain conditions, the temperature of the irradiated zone is measured via the reflectivity of the glass substrate. Therefore, the x(t) and dx(T)/dt are deduced. This permits to obtain a much better kinetics of oxidation than for previous works, where oxidation rates were measured from the positions of the minima and maxima of reflectivity. Evidence for a temperature threshold for laser-assisted oxidation of vanadium film is obtained. This threshold is independent on laser fluence.