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Controllability of refractive index of optical thin films and its application in antireflective coatings of multi-junction solar cells

The oblique angle incident deposition method is a novel method for preparing thin films. The vapor deposition of the film at different angles is used to change the structure of the material to control its refractive index, so that the selection of the optical film is more extensive. In this paper, the relationship between the deposition angle of the titanium oxide and silicon oxide materials in the oblique vapor deposition process and the refractive index of the film was studied by electron beam evaporation coating method using a self-made angle evaporation device. silicon oxide low refractive index film having a refractive index of 1.07 was obtained.Based on this, a refractive index gradual anti-reflection film for multi-junction GaAs solar cells with a weighted average reflectance of less than 2% was designed.