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Hydrogen diffusion in amorphous silicon

Abstract Hydrogen diffusion in doped and compensated a-Si:H has been measured by secondary-ion mass spectrometry profiling in the temperature range 155-300°C. Doping reduces the activation energy and enhances the diffusion coefficient by up to three orders of magnitude at 200°C, and a correlation between the diffusion coefficient and the dangling-bond density is found. An analysis of three different diffusion models indicates that the breaking of weak Si – Si bonds by hydrogen may be an important process. The relation between the diffusion results and the thermal equilibration of the electronic structure is discussed. The hydrogen diffusion coefficient in a-Si:H has been measured over the temperature range 155-300°C, with particular emphasis on the effects of doping and compensation. In all cases D H is thermally activated with an energy 1[sdot]2-1[sdot]5 eV. The diffusion coefficient decreases slowly with time which is attributed to the disorder-induced variation in site energies. We find that D H is gre...