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Control of surface wettability of hydroxyapatite thin films by way of crystal imperfections

The wettability of hydroxyapatite (HAp) films can be controlled by process conditions and substrates. C-plane-terminated HAp films on Si(100) substrate were hydrophobic. Only when sputter deposition with Ar was carried out with H2O vapor, followed by solid-phase crystallization at 500–700 °C, did highly hydrophilic films with water contact angles between 10 and 20° form. The hydrophilic property was characterized by H2O bending mode signals at 1595 cm−1 in infrared spectroscopy. Preferentially c- or (310)-plane-oriented epitaxial HAp films on sapphire c-planes were hydrophobic, whereas randomly oriented polycrystalline HAp films on sapphire a-planes were moderately hydrophilic.