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Ultrafine motion detection of micromechanical structures using optical moire patterns

The use of optical moire patterns for motion and microtribology detection of micromechanical devices has been proposed and demonstrated. Using a very simple image processing technique, 50-nm in-plane motion of a micromechanical sensor has been detected. With an improved device design, the spatial resolution for in-plane motion detection will be able to reach 10 nm, meeting the most stringent requirement for any known applications for microelectromechanical systems (MEMS).