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Angle‐resolved XPS: a critical evaluation for various applications

Angle‐resolved X‐ray photoelectron spectroscopy (ARXPS) is widely accepted as a useful tool for nondestructive in‐depth analysis of near surface regions. In the present paper, it is shown for a variety of applications which kind of qualitative and quantitative information can be derived from ARXPS measurements in conjunction with appropriate mathematical modeling. The method is limited mainly by problems arising from contamination, roughness or preparation‐induced damage. Furthermore, especially for more complex surface structures, it must be considered that the information content of ARXPS is strongly limited and the calculations have to be supported by other knowledge. Copyright © 2006 John Wiley & Sons, Ltd.