{'fraction_non_alphanumeric': 0.013888888888888888, 'fraction_numerical': 0.012962962962962963, 'mean_word_length': 5.039106145251397, 'pattern_counts': {'":': 0, '<': 0, '<?xml version=': 0, '>': 0, 'https://': 0, 'lorem ipsum': 0, 'www.': 0, 'xml': 0}, 'pii_count': 0, 'substrings_counts': 0, 'word_list_counts': {'cursed_substrings.json': 0, 'profanity_word_list.json': 0, 'sexual_word_list.json': 0, 'zh_pornsignals.json': 0}}
Structural Analysis of Nanocrystalline Cu2O Prepared by Electrodeposition at Different Temperatures

The results of structural and phase analyses of Cu 2 O films electrodeposited at different temperatures are reported in this paper. The electrodeposition temperature was varied to obtain a single-phase Cu 2 O film. Structural information and the phase composition were extracted from X-ray diffraction patterns using a general structure analysis system (GSAS) to perform Rietveld refinement. Increasing the deposition temperature decreased the crystallite size and increased the lattice strain in the films. A preferential orientation was found at relatively high deposition temperatures. The Cu 2 O phase began to form above room temperature, and a single phase of nanocrystalline Cu 2 O with a fine crystallite size of 34 nm was grown at a deposition temperature of 75  C. This pure Cu 2 O film had a uniform surface morphology with a direct bandgap energy of 2.18 eV. These results show how temperature controls the structure and phase composition of electrodeposited Cu 2 O.