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Comparison of surface PSDs calculated from both AFM profiles and scatter data

The paper reviews the process for comparing PSD's generated by profile measurements and scatter measurements. Rayleigh scatter as a noise source is reviewed and a new polarization based measurement is presented for discrimination between roughness scatter and particulate scatter. AFM results are compared for both a molybdenum mirror and a silicon wafer. The mirror compares well but 2D detrending technique used impacts the results for the wafer.