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Deep-UV KrF lithography for the fabrication of Bragg gratings on SOI rib waveguides

In this Paper we present a deep ultra-violet lithography (248nm) based double patterning technique for the fabrication of Bragg gratings on SOI rib waveguides. The principle of the used double patterning technique is presented, as well the influence of the process variation on the device performances. The influence of the overlay error was identified as a possibly limiting factor for the application of this technique. Usable structures were realized, in spite of small overlay error and non-rectangular grating profile. The optical characterization showed that the presented technique is capable to provide high performance Si waveguides and Bragg gratings.