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Ionized-cluster-beam deposition of optical interference coatings.

Ionized-cluster-beam (ICB) deposition has been used to form metal, dielectric, and compound films for optical coatings. In ICB deposition, it is possible to control the mechanical, crystallographic, and optical properties of films by varying the acceleration voltage and the ion content in the total flux. Experimental results of film deposition by ICB show that optical properties can be improved through proper selection of acceleration voltage and ionization ratio. Applications such as high-reflectance mirrors, AR coatings, and other optical devices have been demonstrated.