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Solution-based CdS thin film transistors with low temperature-processed Al2O3-GPTMS-PMMA as hybrid dielectric gate

Herein, we report the low-temperature fabrication process and the electrical response of n-type cadmium sulfide (CdS)-based thin-film transistors (TFTs) with an Al2O3-GPTMS-polymethylmethacrylate (PMMA) hybrid dielectric gate. The TFTs with bottom-gate structure were assembled on ITO (indium-tin-oxide)-coated glass substrates employing solution processes for the deposition of both the dielectric gate and semiconductor layers. The hybrid dielectric layers were deposited by the sol-gel process and subsequently annealed at 150 °C. The FTIR and XPS analysis of the hybrid films demonstrated a proper link between Al2O3 and PMMA through the cross-linking agent 3-glycidoxy(propyltrimethoxysilane) silane (GPTMS). The surface characteristics were obtained by contact angle and atomic force microscope studies, the results show that the surface of hybrid films displays a hydrophobic behavior with a smooth surface. The CdS active layer was deposited on the hybrid dielectric gate at room temperature by a simple photochemical bath deposition using a 313 nm UV lamp. The CdS-TFTs showed outstanding electrical performance with a low threshold voltage of 1.3 V, I ON /I OFF of 104, subthreshold swing of 440 mV dec−1, and remarkable high mobility value of 64.4 cm2 V−1 s−1. Ultimately, the feature of these completely solution-based CdS TFTs is the maximum processing temperature of 150 °C, and the findings of this study are very promising for potential low-cost solution-processed TFTs.