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EUV Exposure Systems

EUV lithography exposure systems are conceptually similar to optical ones, involving light sources (discussed in the previous chapter), illumination and projection optics, alignment and focus systems, wafer stages, and sub-systems to mechanically handle wafers and reticles. Most of these need to be designed to meet the specific requirements for operation at EUV wavelengths, and the focus of this chapter is on those aspects specific to EUV lithography.