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In situ investigations of thin film formation by reactive sputtering

Surface sensitive, grazing incidence reflection mode x-ray absorption spectra were conducted in order to study the reactive sputtering processes in situ. The spectra were measured in the Quick-scanning EXAFS (QEXAFS) mode, so that, beginning from the initial stages of thin film formation, all the growth processes can be followed with a time resolution of about 30 s. The experiments were performed in a small sputter chamber with a magnetron source. In the present study, the growth of amorphous Ta-oxide films is studied.