{'fraction_non_alphanumeric': 0.02091503267973856, 'fraction_numerical': 0.0, 'mean_word_length': 5.778761061946903, 'pattern_counts': {'":': 0, '<': 0, '<?xml version=': 0, '>': 0, 'https://': 0, 'lorem ipsum': 0, 'www.': 0, 'xml': 0}, 'pii_count': 0, 'substrings_counts': 0, 'word_list_counts': {'cursed_substrings.json': 0, 'profanity_word_list.json': 0, 'sexual_word_list.json': 0, 'zh_pornsignals.json': 0}}
A low-cost fabrication method of nanostructures by ultraviolet proximity exposing lithography

The lithography contact/proximity printing technique is widely used in the fabrication of microelectronic components, optical devices, and micro-fluidic chips. However, the fabrication of nano-sized structures requires high-cost equipment. This paper proposes a low-cost method to manufacture nanostructures by ultraviolet proximity exposing lithography through a microphotomask on a conventional lithographic aligner. The influence of exposure distance on photoresist pattern size is studied, and the standing wave effect on the photoresist layer is reduced by post-baking. This cost effective method can be widely applied to fabricate patterns with a nanofeature size.