{'fraction_non_alphanumeric': 0.029411764705882353, 'fraction_numerical': 0.014231499051233396, 'mean_word_length': 5.512345679012346, 'pattern_counts': {'":': 0, '<': 0, '<?xml version=': 0, '>': 0, 'https://': 0, 'lorem ipsum': 0, 'www.': 0, 'xml': 0}, 'pii_count': 0, 'substrings_counts': 0, 'word_list_counts': {'cursed_substrings.json': 0, 'profanity_word_list.json': 0, 'sexual_word_list.json': 0, 'zh_pornsignals.json': 0}}
Controllable Defect Engineering in 2D-MoS2 for high-performance, threshold switching memristive devices

Two-dimensional (2D) materials and their hetero structures are promising for memristive applications due to their extreme scalability and high performance.1 Threshold switching in 2D-Transition Metal Dichalcogenide (TMDC) memristors has been previously identified for neuromorphic applications.2 On the other hand, accurate control of defect concentration in 2D-TMDC films is necessary for optimized performance of the memristive devices. In this work, we explore a chemical route to control defect concentration in 2D-MoS2 films. We demonstrate that the defect concentration in 2D-MoS2 can be tuned by H2O2 treatment. We then optimize the resistance switching behavior of Au/MoS2/Ag/Au memristors to obtain reliable threshold resistance switching with high on/ off ratio, low operating voltages and self-compliance behavior. This work offers promise for a low-cost, scalable approach to develop 2D-TMDC based high-performance neuromorphic hardware.