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LP‐H: Late‐News Poster: New Photo‐Alignment Materials with High Sensitivity to Near‐UV Light

We developed new photo alignment materials based on chalcone structure with the high photo reactivity and high sensitivity to near UV light. Poly(4‐methacryloyloxy chalcone), PM4Ch, and its derivatives exhibited good LC alignment capability upon near UV exposure. The LC alignment capability was preserved when the LC cells were annealed at 170°C. The possible photochemical degradation by deep UV can be prevented by using these new materials.