{'fraction_non_alphanumeric': 0.01976470588235294, 'fraction_numerical': 0.0, 'mean_word_length': 5.422960725075528, 'pattern_counts': {'":': 0, '<': 0, '<?xml version=': 0, '>': 0, 'https://': 0, 'lorem ipsum': 0, 'www.': 0, 'xml': 0}, 'pii_count': 0, 'substrings_counts': 0, 'word_list_counts': {'cursed_substrings.json': 0, 'profanity_word_list.json': 0, 'sexual_word_list.json': 0, 'zh_pornsignals.json': 0}}
Automated CAD/CAM-based nanolithography using a custom atomic force microscope

We report the development of a novel nanolithographic system that combines the design capabilities of computer-aided design/computer-aided manufacturing (CAD/CAM) software with the nanolithographic abilities of the atomic force microscope (AFM). The AFM is a powerful tool for research at the nanoscale and can be used to perform a variety of serial nanolithographic techniques. A custom-built three-axis AFM system, designed to execute nanolithography, has been constructed and interfaced with a CAD/CAM design environment. This technique utilizes the CAD/CAM software to create, in a virtual design environment, the desired nanoscale patterns. Then, using a G-code interpreter and software algorithms to control the three-dimensional motion of the system, the design is replicated automatically by using conventional nanolithographic procedures. In this report, AFM-based anodization lithography on a silicon wafer and subsequent AFM imaging is used to confirm the successful automatic replication of the desired nanoscale patterns. Note to Practitioners-The impetus for this research was based on the desire to create a custom nanolithographic platform that could be changed and manipulated as per the users specifications and operated easily by anyone. Commercial atomic force microscopes (AFMs) that are used for nanolithography and other studies have their own specific software that enables little or no change to the workings of the system, rendering prototyping of new research techniques to be difficult. These closed AFM instruments can be difficult to operate and are user unfriendly. This report delineates our construction of an AFM system and how we have incorporated very familiar software environments and common computer-aided-design programming language to conduct nanolithography. A brief verification of how our system performs is included; we have deposited and imaged a series of surface features in a direct write fashion on a silicon surface using a common lithographic technique that exists in the research environment.