{'fraction_non_alphanumeric': 0.026595744680851064, 'fraction_numerical': 0.0, 'mean_word_length': 5.547826086956522, 'pattern_counts': {'":': 0, '<': 0, '<?xml version=': 0, '>': 0, 'https://': 0, 'lorem ipsum': 0, 'www.': 0, 'xml': 0}, 'pii_count': 0, 'substrings_counts': 0, 'word_list_counts': {'cursed_substrings.json': 0, 'profanity_word_list.json': 0, 'sexual_word_list.json': 0, 'zh_pornsignals.json': 0}}
Double EWMA controller for semiconductor manufacturing processes with time-varying metrology delay

Double Exponentially weighted moving average (dEWMA) is a typical Run-to-run (RtR) control in the semiconductor manufacturing process. The performance of dEWMA is determined by the measurement of process output real-time. However, it is impossible to obtain the output online owing to restriction of measurement tool and cost. Based on the logical relationship among the wafer quality, actually measured time-delay, estimated time-delay and the drift of process, a estimated algorithm for time-varying metrology delay is proposed by using the Bayesian statistical analysis. The simulated example demonstrates the performance of the presented algorithm.