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Formation of InGaAs Quantum Disks Using Droplet Lithography

We demonstrate a nanolithography technique using droplet epitaxy and wet-chemical etching. The etching process is performed with buried InGaAs quantum well structures on which self-assembled In droplets were grown by molecular beam epitaxy. The In droplets act as a mask for the etching, engendering the formation of submicron-scale mesa structures with InGaAs quantum disks (QDisks). High-yield photoluminescence emissions from single InGaAs QDisks in a mesa structure are observed by micro-photoluminescence measurement. This nanolithography technique is promising for the formation of high-quality mesa structures using simple processes.