{'fraction_non_alphanumeric': 0.02574002574002574, 'fraction_numerical': 0.010296010296010296, 'mean_word_length': 4.893939393939394, 'pattern_counts': {'":': 0, '<': 0, '<?xml version=': 0, '>': 0, 'https://': 0, 'lorem ipsum': 0, 'www.': 0, 'xml': 0}, 'pii_count': 0, 'substrings_counts': 0, 'word_list_counts': {'cursed_substrings.json': 0, 'profanity_word_list.json': 0, 'sexual_word_list.json': 0, 'zh_pornsignals.json': 0}}
Comparison of glow ion nitriding of tantalum tungsten alloy

The tantalum tungsten alloys, Ta-2.5 W and Ta-10 W, were treated with isothermal ion nitriding and two-stage ion nitriding experiments to obtain a nitride layer. After the treatment, the hardness of both alloys has been remarkably improved, which can be attributed to the formation of nitride phase θ-TaN in the surface layer according to the XRD pattern. Comparing with isothermal ion nitriding, the two-stage ion nitriding experiment achieved greater microhardness and thickness of the nitride layer. In addition, T-2.5 W alloy showed a greater layer thickness and microhardness than Ta-10 W alloy with the same treatment, which indicates that the nitriding process decreases with the increase of tungsten content.