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Sub‐Wavelength Antireflection Coatings From Nanostructure Sculptured Thin Films

Nanostructure sculptured thin films from SiO2 are grown on quartz substrates by ion beam sputter deposition using rotating substrate motion accommodated to an oblique angle of incidence for the particle flux. Structural peculiarities of sculptured thin films have an intriguing impact on the optical response upon reflection of light with different wavelengths. The reflectivity of quartz substrates coated with SiO2 sub‐wavelength nanostructures is simulated by means of effective medium theory and antireflection is predicted for the deep ultraviolet spectral region. Spectroscopic ellipsometry and reflectivity measurements are performed on SiO2 sculptured thin films and antireflection near λ = 193 nm is found. (© 2007 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)