{'fraction_non_alphanumeric': 0.038381742738589214, 'fraction_numerical': 0.02074688796680498, 'mean_word_length': 4.514285714285714, 'pattern_counts': {'":': 0, '<': 0, '<?xml version=': 0, '>': 0, 'https://': 0, 'lorem ipsum': 0, 'www.': 0, 'xml': 0}, 'pii_count': 0, 'substrings_counts': 0, 'word_list_counts': {'cursed_substrings.json': 0, 'profanity_word_list.json': 0, 'sexual_word_list.json': 0, 'zh_pornsignals.json': 0}}
Er-doped glass ridge-waveguide amplifiers fabricated with a collimated sputter deposition technique

We report a new fabrication process for Er-doped glass ridge waveguides. The process does not require etching of an Er-doped film in defining the lateral dimension of a waveguide, but involves a liftoff process using polyimide as a sacrificial layer. An Er-doped soda-lime silicate glass film (1.5 /spl mu/m thick) was deposited at 350/spl deg/C using a collimated sputtering technique. Conventional sputtering techniques have been known to be incompatible with a liftoff process. The collimated sputtering, however, allowed us easy liftoff of Er-doped films, and produced well-defined ridges with smooth surface profiles. A 1.7-cm-long waveguide thus fabricated shows a 1.55-/spl mu/m signal enhancement of 15.4 dB with a 980-nm pump power of 40 mW. This enhancement fully compensates for both Er absorption and waveguide losses, and results in a gain of 7.2 dB.