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Circuit-Performance Implications for Double-Gate MOSFET Scaling below 25 nm

Circuit-performance implications for double-gate MOSFET scaling in the sub-25 nm gate length regime are investigated. The optimal gate-to-source/drain overlap needed to maximize drive current is found to be different than that needed to minimize FO-4 inverter delay due to parasitic capacitances. It is concluded that the effective channel length must be slightly larger than the physical gate length in order to achieve optimal circuit performance.