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Advantages of variable-shaped e-beam writers for mask making

The constantly growing metrology requirements on photomasks in conjunction with an explosion of pattern file sizes have renewed the interest in alternative electron beam writer approaches. One possible way to cope with these requirements is an e-beam writer employing the variable shaped beam principle. Besides the straightforward reduction in pattern file sizes in general, this approach also seems the ideal way to incorporate the optical proximity correction features that are characteristic for many of the high-end applications the mask making industry has been confronted with recently. By designing a new e-beam system for industrial use compactness and ease of operation have been a central concern in order to get rid of the problems electron beam lithography systems have been notorious for in the past. A lithography system for use around the turn of this century should be able to expose the next standard reticle sizes, consequently the ZBA31H is already available with a large glass option incorporating the Leica 300 mm stage subsystem.