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Diffusion-limited aggregation-like structure induced in Co thin films by carbon ion implantation

Fractal structure of a diffusion-limited aggregation (DLA) type was observed in a Co thin film after 50 keV carbon ion implantation to a dose of 2.5*1017 cm-2 at room temperature. The authors simulation showed that the structure and the aggregating process could be well described within the framework of the DLA model with the following observations. The atoms in the matrix not only play the role of randomizing the track of mobile particles but also take part in the aggregation. The number of steps each particle undergoes is very limited whether it contacts the aggregate or not. Moreover, the particles may be randomly launched anywhere. The correlation dimension of the structure was determined to be about 1.82+or-0.01.